JPS5294388A - Photopolymerizable composition and preparation thereof - Google Patents

Photopolymerizable composition and preparation thereof

Info

Publication number
JPS5294388A
JPS5294388A JP994776A JP994776A JPS5294388A JP S5294388 A JPS5294388 A JP S5294388A JP 994776 A JP994776 A JP 994776A JP 994776 A JP994776 A JP 994776A JP S5294388 A JPS5294388 A JP S5294388A
Authority
JP
Japan
Prior art keywords
preparation
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP994776A
Other languages
Japanese (ja)
Other versions
JPS5425957B2 (en
Inventor
Ei Ripuson Merubuin
Zadooa Yuujin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dynachem Corp
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to ZA00757984A priority Critical patent/ZA757984B/en
Priority to SE7600431A priority patent/SE7600431L/en
Priority to DE2602410A priority patent/DE2602410C2/en
Priority to FR7602048A priority patent/FR2339185B1/en
Priority to NL7600794.A priority patent/NL160004C/en
Priority to GB3624/76A priority patent/GB1521372A/en
Priority to BE163988A priority patent/BE838135A/en
Application filed by Dynachem Corp filed Critical Dynachem Corp
Priority to JP994776A priority patent/JPS5294388A/en
Priority to DD191055A priority patent/DD125491A5/xx
Priority to BR7601434A priority patent/BR7601434A/en
Publication of JPS5294388A publication Critical patent/JPS5294388A/en
Publication of JPS5425957B2 publication Critical patent/JPS5425957B2/ja
Priority to JP59257283A priority patent/JPS61134756A/en
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
JP994776A 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof Granted JPS5294388A (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US51192974A 1974-10-04 1974-10-04
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Publications (2)

Publication Number Publication Date
JPS5294388A true JPS5294388A (en) 1977-08-08
JPS5425957B2 JPS5425957B2 (en) 1979-08-31

Family

ID=27582848

Family Applications (2)

Application Number Title Priority Date Filing Date
JP994776A Granted JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
JP59257283A Granted JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP59257283A Granted JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Country Status (10)

Country Link
JP (2) JPS5294388A (en)
BE (1) BE838135A (en)
BR (1) BR7601434A (en)
DD (1) DD125491A5 (en)
DE (1) DE2602410C2 (en)
FR (1) FR2339185B1 (en)
GB (1) GB1521372A (en)
NL (1) NL160004C (en)
SE (1) SE7600431L (en)
ZA (1) ZA757984B (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57196231A (en) * 1981-05-20 1982-12-02 Hoechst Ag Mixture able to be polymerized by radiation and copying material mainly composed thereof
JPS6011840A (en) * 1983-06-06 1985-01-22 ダイナケム・コ−ポレ−シヨン Soft and quickly treatable photopolymerizing composition
JPS6455551A (en) * 1987-08-26 1989-03-02 Hitachi Chemical Co Ltd Photosensitive resin composition
JPS6456442A (en) * 1987-08-27 1989-03-03 Okamoto Kagaku Kogyo Kk Production of printing plate
JPH01227141A (en) * 1988-02-26 1989-09-11 Hercules Inc Photopolymerizable composition
JPH025061A (en) * 1988-02-24 1990-01-09 Hoechst Ag Radiation polymerizable component and radiation sensitive recording material
JPH03164742A (en) * 1989-09-21 1991-07-16 Hoechst Ag Method of manufacturing irradiation polymerizing mixture and solder resist mask

Families Citing this family (135)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4208211A (en) * 1978-05-23 1980-06-17 Bell Telephone Laboratories, Incorporated Fabrication based on radiation sensitive resists and related products
EP0097864B1 (en) * 1982-06-21 1986-11-12 Hoechst Aktiengesellschaft Photopolymerizable mixture and photopolymerizable copying material produced therewith
DE3223104A1 (en) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt PHOTOPOLYMERIZABLE MIXTURE AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
DD250593A1 (en) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb PHOTOPOLYMERIZABLE MATERIAL
JPH0642073B2 (en) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 Photopolymerizable resin composition
JPS638735A (en) * 1986-06-30 1988-01-14 Tokyo Ohka Kogyo Co Ltd Photosensitive resin plate for pattern formation
JP2826329B2 (en) * 1988-12-15 1998-11-18 ダイセル化学工業株式会社 Photopolymerizable composition
JP2776522B2 (en) * 1988-12-15 1998-07-16 ダイセル化学工業株式会社 Photopolymerizable composition
JP2826330B2 (en) * 1988-12-15 1998-11-18 ダイセル化学工業株式会社 Photopolymerizable composition
JP2856746B2 (en) * 1988-12-15 1999-02-10 ダイセル化学工業株式会社 Photopolymerizable composition
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JPS5425957A (en) * 1977-07-29 1979-02-27 Nippon Zeon Co Ltd Curable rubber composition having excellent resistance to rancid gasoline

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JPS57196231A (en) * 1981-05-20 1982-12-02 Hoechst Ag Mixture able to be polymerized by radiation and copying material mainly composed thereof
JPH0447812B2 (en) * 1981-05-20 1992-08-05 Hoechst Ag
JPS6011840A (en) * 1983-06-06 1985-01-22 ダイナケム・コ−ポレ−シヨン Soft and quickly treatable photopolymerizing composition
JPH0422508B2 (en) * 1983-06-06 1992-04-17 Dynachem Corp
JPS6455551A (en) * 1987-08-26 1989-03-02 Hitachi Chemical Co Ltd Photosensitive resin composition
JPS6456442A (en) * 1987-08-27 1989-03-03 Okamoto Kagaku Kogyo Kk Production of printing plate
JPH025061A (en) * 1988-02-24 1990-01-09 Hoechst Ag Radiation polymerizable component and radiation sensitive recording material
JPH01227141A (en) * 1988-02-26 1989-09-11 Hercules Inc Photopolymerizable composition
JPH03164742A (en) * 1989-09-21 1991-07-16 Hoechst Ag Method of manufacturing irradiation polymerizing mixture and solder resist mask

Also Published As

Publication number Publication date
FR2339185A1 (en) 1977-08-19
DE2602410C2 (en) 1985-11-21
JPS61134756A (en) 1986-06-21
JPH0359416B2 (en) 1991-09-10
DD125491A5 (en) 1977-04-20
NL160004B (en) 1979-04-17
BE838135A (en) 1976-05-14
JPS5425957B2 (en) 1979-08-31
NL7600794A (en) 1977-07-29
ZA757984B (en) 1976-12-29
NL160004C (en) 1979-09-17
BR7601434A (en) 1977-09-06
SE7600431L (en) 1977-07-17
GB1521372A (en) 1978-08-16
FR2339185B1 (en) 1980-03-14
DE2602410A1 (en) 1977-07-28

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