JPS5286779A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5286779A JPS5286779A JP280876A JP280876A JPS5286779A JP S5286779 A JPS5286779 A JP S5286779A JP 280876 A JP280876 A JP 280876A JP 280876 A JP280876 A JP 280876A JP S5286779 A JPS5286779 A JP S5286779A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- aligning
- drain
- self
- extremely small
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To eliminate mask aligning and make elements extremely small by forming source, drain, gate insulator films and conductor materials through self-aligning by specified procedures.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP280876A JPS5286779A (en) | 1976-01-14 | 1976-01-14 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP280876A JPS5286779A (en) | 1976-01-14 | 1976-01-14 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5286779A true JPS5286779A (en) | 1977-07-19 |
Family
ID=11539674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP280876A Pending JPS5286779A (en) | 1976-01-14 | 1976-01-14 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5286779A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5664467A (en) * | 1979-10-31 | 1981-06-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Mos type semiconductor device |
JPS58179A (en) * | 1981-06-25 | 1983-01-05 | Seiko Epson Corp | Manufacturing method for semiconductor device |
JPH07254701A (en) * | 1994-03-15 | 1995-10-03 | Nec Corp | Semiconductor device and its manufacturing |
-
1976
- 1976-01-14 JP JP280876A patent/JPS5286779A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5664467A (en) * | 1979-10-31 | 1981-06-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Mos type semiconductor device |
JPS58179A (en) * | 1981-06-25 | 1983-01-05 | Seiko Epson Corp | Manufacturing method for semiconductor device |
JPH07254701A (en) * | 1994-03-15 | 1995-10-03 | Nec Corp | Semiconductor device and its manufacturing |
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