JPS5271224A - Positive type light sensitive composition - Google Patents

Positive type light sensitive composition

Info

Publication number
JPS5271224A
JPS5271224A JP14770175A JP14770175A JPS5271224A JP S5271224 A JPS5271224 A JP S5271224A JP 14770175 A JP14770175 A JP 14770175A JP 14770175 A JP14770175 A JP 14770175A JP S5271224 A JPS5271224 A JP S5271224A
Authority
JP
Japan
Prior art keywords
type light
light sensitive
positive type
sensitive composition
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14770175A
Other languages
Japanese (ja)
Inventor
Kiyokatsu Jinno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14770175A priority Critical patent/JPS5271224A/en
Publication of JPS5271224A publication Critical patent/JPS5271224A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To provide a composition for a photoresist material capable of forming a photosensitive layer superior in adhesion to a support, flexibility, and mechanical stregth, by mixing an ester compound of o-quinonediazidesulfonic acid with a specified phenol resin base.
JP14770175A 1975-12-11 1975-12-11 Positive type light sensitive composition Pending JPS5271224A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14770175A JPS5271224A (en) 1975-12-11 1975-12-11 Positive type light sensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14770175A JPS5271224A (en) 1975-12-11 1975-12-11 Positive type light sensitive composition

Publications (1)

Publication Number Publication Date
JPS5271224A true JPS5271224A (en) 1977-06-14

Family

ID=15436288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14770175A Pending JPS5271224A (en) 1975-12-11 1975-12-11 Positive type light sensitive composition

Country Status (1)

Country Link
JP (1) JPS5271224A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS57172337A (en) * 1981-04-17 1982-10-23 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition
JPS61217034A (en) * 1985-03-22 1986-09-26 Fuji Photo Film Co Ltd Photosensitive composition and photosensitive material
JPS61228439A (en) * 1985-04-01 1986-10-11 Fuji Photo Film Co Ltd Photosensitive composition and photosensitive material
US4732840A (en) * 1985-03-22 1988-03-22 Fuji Photo Film Co., Ltd. Planographic printing plate method using light sensitive material including phenolic resol with dibenzylic ether groups
WO1994008275A1 (en) * 1992-09-28 1994-04-14 Hoechst Celanese Corporation Positive-working photoresist composition
US5371169A (en) * 1992-09-28 1994-12-06 Hoechst Celanese Corporation Novolak resin mixtures

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS5654621B2 (en) * 1978-10-20 1981-12-26
JPS57172337A (en) * 1981-04-17 1982-10-23 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition
JPH0337174B2 (en) * 1981-04-17 1991-06-04 Tokyo Ohka Kogyo Co Ltd
JPS61217034A (en) * 1985-03-22 1986-09-26 Fuji Photo Film Co Ltd Photosensitive composition and photosensitive material
US4732840A (en) * 1985-03-22 1988-03-22 Fuji Photo Film Co., Ltd. Planographic printing plate method using light sensitive material including phenolic resol with dibenzylic ether groups
JPS61228439A (en) * 1985-04-01 1986-10-11 Fuji Photo Film Co Ltd Photosensitive composition and photosensitive material
WO1994008275A1 (en) * 1992-09-28 1994-04-14 Hoechst Celanese Corporation Positive-working photoresist composition
US5371169A (en) * 1992-09-28 1994-12-06 Hoechst Celanese Corporation Novolak resin mixtures

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