JPS5222991A - Method of controlling plasma type ion source - Google Patents

Method of controlling plasma type ion source

Info

Publication number
JPS5222991A
JPS5222991A JP50098611A JP9861175A JPS5222991A JP S5222991 A JPS5222991 A JP S5222991A JP 50098611 A JP50098611 A JP 50098611A JP 9861175 A JP9861175 A JP 9861175A JP S5222991 A JPS5222991 A JP S5222991A
Authority
JP
Japan
Prior art keywords
ion source
type ion
plasma type
controlling plasma
controlling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50098611A
Other languages
Japanese (ja)
Inventor
Hiroshi Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50098611A priority Critical patent/JPS5222991A/en
Publication of JPS5222991A publication Critical patent/JPS5222991A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Particle Accelerators (AREA)

Abstract

PURPOSE:To enable always constant ion current to be obtained despite variation in its characteristics with time, by identifying the characteristics of an ion source.
JP50098611A 1975-08-15 1975-08-15 Method of controlling plasma type ion source Pending JPS5222991A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50098611A JPS5222991A (en) 1975-08-15 1975-08-15 Method of controlling plasma type ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50098611A JPS5222991A (en) 1975-08-15 1975-08-15 Method of controlling plasma type ion source

Publications (1)

Publication Number Publication Date
JPS5222991A true JPS5222991A (en) 1977-02-21

Family

ID=14224378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50098611A Pending JPS5222991A (en) 1975-08-15 1975-08-15 Method of controlling plasma type ion source

Country Status (1)

Country Link
JP (1) JPS5222991A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5978431A (en) * 1982-10-26 1984-05-07 Hitachi Ltd Electron impact, field emission type ion source
JP2007048588A (en) * 2005-08-10 2007-02-22 Jeol Ltd Method for setting gas flow rate and ion beam processing apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5978431A (en) * 1982-10-26 1984-05-07 Hitachi Ltd Electron impact, field emission type ion source
JPH0369137B2 (en) * 1982-10-26 1991-10-31 Hitachi Ltd
JP2007048588A (en) * 2005-08-10 2007-02-22 Jeol Ltd Method for setting gas flow rate and ion beam processing apparatus

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