JPS5222881A - Thin film etching system on semiconductor base plate - Google Patents
Thin film etching system on semiconductor base plateInfo
- Publication number
- JPS5222881A JPS5222881A JP9895075A JP9895075A JPS5222881A JP S5222881 A JPS5222881 A JP S5222881A JP 9895075 A JP9895075 A JP 9895075A JP 9895075 A JP9895075 A JP 9895075A JP S5222881 A JPS5222881 A JP S5222881A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- base plate
- semiconductor base
- etching system
- film etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To cleanly and accurately perform selective etching on multi-crystal silicon layer containing oxygen or nitrogen which has superior characters as an surface stabilizer layer or optical coating layer for a semiconductor unit.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9895075A JPS5823931B2 (en) | 1975-08-14 | 1975-08-14 | How to use a hand hacking tool |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9895075A JPS5823931B2 (en) | 1975-08-14 | 1975-08-14 | How to use a hand hacking tool |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5222881A true JPS5222881A (en) | 1977-02-21 |
JPS5823931B2 JPS5823931B2 (en) | 1983-05-18 |
Family
ID=14233367
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9895075A Expired JPS5823931B2 (en) | 1975-08-14 | 1975-08-14 | How to use a hand hacking tool |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5823931B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5594697U (en) * | 1978-12-22 | 1980-07-01 | ||
US5281544A (en) * | 1990-07-23 | 1994-01-25 | Seiko Epson Corporation | Method of manufacturing planar type polar transistors and combination bipolar/MIS type transistors |
US5404043A (en) * | 1990-07-23 | 1995-04-04 | Seiko Epson Corporation | Semiconductor devices of the planar type bipolar transistors and combination bipolar/MIS type transistors |
US5560857A (en) * | 1993-10-19 | 1996-10-01 | Nippon Steel Corporation | Solution for cleaning silicon semiconductors and silicon oxides |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61176340U (en) * | 1985-04-20 | 1986-11-04 | ||
JPS6221245U (en) * | 1985-07-20 | 1987-02-07 | ||
JPH0323935Y2 (en) * | 1986-03-31 | 1991-05-24 |
-
1975
- 1975-08-14 JP JP9895075A patent/JPS5823931B2/en not_active Expired
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5594697U (en) * | 1978-12-22 | 1980-07-01 | ||
JPS5919711Y2 (en) * | 1978-12-22 | 1984-06-07 | 川崎製鉄株式会社 | Furnace wall cooling device |
US5281544A (en) * | 1990-07-23 | 1994-01-25 | Seiko Epson Corporation | Method of manufacturing planar type polar transistors and combination bipolar/MIS type transistors |
US5404043A (en) * | 1990-07-23 | 1995-04-04 | Seiko Epson Corporation | Semiconductor devices of the planar type bipolar transistors and combination bipolar/MIS type transistors |
US5560857A (en) * | 1993-10-19 | 1996-10-01 | Nippon Steel Corporation | Solution for cleaning silicon semiconductors and silicon oxides |
Also Published As
Publication number | Publication date |
---|---|
JPS5823931B2 (en) | 1983-05-18 |
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