JPS5221783A - Unit and producing system of semiconductor - Google Patents

Unit and producing system of semiconductor

Info

Publication number
JPS5221783A
JPS5221783A JP9748575A JP9748575A JPS5221783A JP S5221783 A JPS5221783 A JP S5221783A JP 9748575 A JP9748575 A JP 9748575A JP 9748575 A JP9748575 A JP 9748575A JP S5221783 A JPS5221783 A JP S5221783A
Authority
JP
Japan
Prior art keywords
semiconductor
unit
producing system
suing
glass layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9748575A
Other languages
Japanese (ja)
Other versions
JPS5929137B2 (en
Inventor
Hiroshi Nakasone
Teruo Yoneyama
Yasuo Iizuka
Noboru Okuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP9748575A priority Critical patent/JPS5929137B2/en
Priority to GB32879/76A priority patent/GB1504484A/en
Priority to DE2636383A priority patent/DE2636383C2/en
Publication of JPS5221783A publication Critical patent/JPS5221783A/en
Publication of JPS5929137B2 publication Critical patent/JPS5929137B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Formation Of Insulating Films (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To prevent stage cutting of wound body and crack causing by suing glass layer having the fixed content of B2O3, P2O5.
JP9748575A 1975-08-13 1975-08-13 Semiconductor device and its manufacturing method Expired JPS5929137B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9748575A JPS5929137B2 (en) 1975-08-13 1975-08-13 Semiconductor device and its manufacturing method
GB32879/76A GB1504484A (en) 1975-08-13 1976-08-06 Semiconductor device and a method for manufacturing the same
DE2636383A DE2636383C2 (en) 1975-08-13 1976-08-12 Method for manufacturing a MOS field effect transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9748575A JPS5929137B2 (en) 1975-08-13 1975-08-13 Semiconductor device and its manufacturing method

Publications (2)

Publication Number Publication Date
JPS5221783A true JPS5221783A (en) 1977-02-18
JPS5929137B2 JPS5929137B2 (en) 1984-07-18

Family

ID=14193563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9748575A Expired JPS5929137B2 (en) 1975-08-13 1975-08-13 Semiconductor device and its manufacturing method

Country Status (1)

Country Link
JP (1) JPS5929137B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS594170A (en) * 1982-06-30 1984-01-10 Mitsubishi Electric Corp Manufacture of semiconductor device
JPS6031500A (en) * 1983-07-29 1985-02-18 大成建設株式会社 Hydraulic jack for stretching
JPH02374A (en) * 1988-12-01 1990-01-05 Mitsubishi Electric Corp Non-volatile semiconductor storage device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS594170A (en) * 1982-06-30 1984-01-10 Mitsubishi Electric Corp Manufacture of semiconductor device
JPS636155B2 (en) * 1982-06-30 1988-02-08 Mitsubishi Electric Corp
JPS6031500A (en) * 1983-07-29 1985-02-18 大成建設株式会社 Hydraulic jack for stretching
JPH02374A (en) * 1988-12-01 1990-01-05 Mitsubishi Electric Corp Non-volatile semiconductor storage device

Also Published As

Publication number Publication date
JPS5929137B2 (en) 1984-07-18

Similar Documents

Publication Publication Date Title
BE847788A (en) PROCESS FOR THE MANUFACTURE OF LAMINATED SAFETY GLASS,
JPS5221783A (en) Unit and producing system of semiconductor
JPS5221784A (en) Production system for semiconductor unit
JPS5221785A (en) Unit and production system for semiconductor
JPS53114355A (en) Manufacture of semiconductor device
JPS5270779A (en) Manufacture of complementary-type integrated circuit
JPS5245277A (en) Method for production of complementary mis-ic
JPS51132902A (en) Frequency speciality compensation method of the light fiber
JPS5218888A (en) Preparation of fortimicin c
AU527512B2 (en) Manufacture of laminates
JPS529421A (en) Speaker equalizer and its production method
JPS527698A (en) Evacation guiding system
CA613635A (en) Method for the manufacture of fire-retardant, shatterproof compound or safety glass
JPS5390886A (en) Wiring structure
JPS51134056A (en) High-speed direct-connected differential amplifier
JPS51136618A (en) Process for preparation of tartaric acids
CA622789A (en) Method for the manufacture of tempered safety glass
AU1851676A (en) Producing composite glass body
JPS5218103A (en) Voice response system
JPS5378084A (en) Snow repulsion wire
JPS51113739A (en) Continuous production method of optical fiber which has triple layers
JPS51146406A (en) Purification of aminoalcohols
CA811076A (en) Method of producing low oxygen, oriented silicon-iron
CA649262A (en) Opal, 96% silica glass and method of production
AU244441B2 (en) Manufacture of laminated safety glass