JPS5218320A - Image forming method - Google Patents
Image forming methodInfo
- Publication number
- JPS5218320A JPS5218320A JP50094260A JP9426075A JPS5218320A JP S5218320 A JPS5218320 A JP S5218320A JP 50094260 A JP50094260 A JP 50094260A JP 9426075 A JP9426075 A JP 9426075A JP S5218320 A JPS5218320 A JP S5218320A
- Authority
- JP
- Japan
- Prior art keywords
- image forming
- forming method
- image
- photoengraved
- irradiating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE: To form a photoengraved image of high sensitivity and high resolution by irradiating a support plate provided with a positive photoresist and a metallic film layer on its surface by light.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50094260A JPS5218320A (en) | 1975-08-04 | 1975-08-04 | Image forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50094260A JPS5218320A (en) | 1975-08-04 | 1975-08-04 | Image forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5218320A true JPS5218320A (en) | 1977-02-10 |
Family
ID=14105302
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50094260A Pending JPS5218320A (en) | 1975-08-04 | 1975-08-04 | Image forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5218320A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5430827A (en) * | 1977-06-30 | 1979-03-07 | Ibm | Method of forming thin film pattern having large aspect ratio opening in resist structure |
WO1998040790A1 (en) * | 1997-03-07 | 1998-09-17 | Clariant International | Photosensitive quinolone compounds and a process of preparation |
-
1975
- 1975-08-04 JP JP50094260A patent/JPS5218320A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5430827A (en) * | 1977-06-30 | 1979-03-07 | Ibm | Method of forming thin film pattern having large aspect ratio opening in resist structure |
JPS6055825B2 (en) * | 1977-06-30 | 1985-12-06 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method for forming thin film patterns with large aspect ratio openings in resist structures |
WO1998040790A1 (en) * | 1997-03-07 | 1998-09-17 | Clariant International | Photosensitive quinolone compounds and a process of preparation |
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