JPS52136578A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS52136578A
JPS52136578A JP5315776A JP5315776A JPS52136578A JP S52136578 A JPS52136578 A JP S52136578A JP 5315776 A JP5315776 A JP 5315776A JP 5315776 A JP5315776 A JP 5315776A JP S52136578 A JPS52136578 A JP S52136578A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
magnetic field
negates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5315776A
Other languages
Japanese (ja)
Inventor
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5315776A priority Critical patent/JPS52136578A/en
Publication of JPS52136578A publication Critical patent/JPS52136578A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To achieve the evening of the magnetic field of an electron beam exposure apparatus by detecting the variation of the magnetic field and flowing the current which negates this in a Helmholtz's coil.
COPYRIGHT: (C)1977,JPO&Japio
JP5315776A 1976-05-12 1976-05-12 Electron beam exposure apparatus Pending JPS52136578A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5315776A JPS52136578A (en) 1976-05-12 1976-05-12 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5315776A JPS52136578A (en) 1976-05-12 1976-05-12 Electron beam exposure apparatus

Publications (1)

Publication Number Publication Date
JPS52136578A true JPS52136578A (en) 1977-11-15

Family

ID=12935000

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5315776A Pending JPS52136578A (en) 1976-05-12 1976-05-12 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS52136578A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5869934U (en) * 1981-11-05 1983-05-12 東芝機械株式会社 Magnetic shield cover for electron beam lithography equipment
JPH0282612A (en) * 1988-09-20 1990-03-23 Hitachi Ltd Apparatus and method of correcting external magnetism of electron beam lithography equipment
JPH0636741A (en) * 1992-07-10 1994-02-10 Shimadzu Corp Magnetic field type mass spectrometer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5869934U (en) * 1981-11-05 1983-05-12 東芝機械株式会社 Magnetic shield cover for electron beam lithography equipment
JPH0282612A (en) * 1988-09-20 1990-03-23 Hitachi Ltd Apparatus and method of correcting external magnetism of electron beam lithography equipment
JPH0636741A (en) * 1992-07-10 1994-02-10 Shimadzu Corp Magnetic field type mass spectrometer

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