JPS52123174A - Specimen scanning method for ion implantation - Google Patents
Specimen scanning method for ion implantationInfo
- Publication number
- JPS52123174A JPS52123174A JP3935876A JP3935876A JPS52123174A JP S52123174 A JPS52123174 A JP S52123174A JP 3935876 A JP3935876 A JP 3935876A JP 3935876 A JP3935876 A JP 3935876A JP S52123174 A JPS52123174 A JP S52123174A
- Authority
- JP
- Japan
- Prior art keywords
- ion implantation
- scanning method
- specimen scanning
- specimen
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To make the concentration of the ions to be implanted uniform by disposing specimens on the inside wall surface of a rotating cylinder and implanting impurity ions from the outside through the slits provided on the wall face of the cylinder.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3935876A JPS52123174A (en) | 1976-04-09 | 1976-04-09 | Specimen scanning method for ion implantation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3935876A JPS52123174A (en) | 1976-04-09 | 1976-04-09 | Specimen scanning method for ion implantation |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52123174A true JPS52123174A (en) | 1977-10-17 |
Family
ID=12550839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3935876A Pending JPS52123174A (en) | 1976-04-09 | 1976-04-09 | Specimen scanning method for ion implantation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52123174A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5941828A (en) * | 1982-09-01 | 1984-03-08 | Hitachi Ltd | Ion implanter |
JPS6048234U (en) * | 1983-09-09 | 1985-04-04 | セイコーインスツルメンツ株式会社 | Ion implantation device |
JPS61116746A (en) * | 1984-09-19 | 1986-06-04 | アプライド マテリアルズ インコ−ポレ−テツド | Apparatus and method for ion plantation of semiconductor wafer |
JPS63109166A (en) * | 1986-10-23 | 1988-05-13 | イオネツクス/エツチイ−アイ コ−ポレ−シヨン | Ion implantation apparatus |
-
1976
- 1976-04-09 JP JP3935876A patent/JPS52123174A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5941828A (en) * | 1982-09-01 | 1984-03-08 | Hitachi Ltd | Ion implanter |
JPH0136696B2 (en) * | 1982-09-01 | 1989-08-02 | Hitachi Ltd | |
JPS6048234U (en) * | 1983-09-09 | 1985-04-04 | セイコーインスツルメンツ株式会社 | Ion implantation device |
JPS61116746A (en) * | 1984-09-19 | 1986-06-04 | アプライド マテリアルズ インコ−ポレ−テツド | Apparatus and method for ion plantation of semiconductor wafer |
JPH06111752A (en) * | 1984-09-19 | 1994-04-22 | Applied Materials Inc | Method and apparatus for ion implantation of semiconductor wafer |
JPS63109166A (en) * | 1986-10-23 | 1988-05-13 | イオネツクス/エツチイ−アイ コ−ポレ−シヨン | Ion implantation apparatus |
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