JPS52122476A - Aligning method of reticles - Google Patents

Aligning method of reticles

Info

Publication number
JPS52122476A
JPS52122476A JP3826576A JP3826576A JPS52122476A JP S52122476 A JPS52122476 A JP S52122476A JP 3826576 A JP3826576 A JP 3826576A JP 3826576 A JP3826576 A JP 3826576A JP S52122476 A JPS52122476 A JP S52122476A
Authority
JP
Japan
Prior art keywords
reticles
aligning method
reticle
aligning
reticle plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3826576A
Other languages
Japanese (ja)
Inventor
Joichiro Kageyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3826576A priority Critical patent/JPS52122476A/en
Publication of JPS52122476A publication Critical patent/JPS52122476A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To achieve the improvement in accuracy through automation and the prevention of contamination by bonding a reticle plate so that of the reticle plate protrudes to the outside of a frame and aligning the reticle to the reference position of a repeater at the protruding part.
COPYRIGHT: (C)1977,JPO&Japio
JP3826576A 1976-04-07 1976-04-07 Aligning method of reticles Pending JPS52122476A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3826576A JPS52122476A (en) 1976-04-07 1976-04-07 Aligning method of reticles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3826576A JPS52122476A (en) 1976-04-07 1976-04-07 Aligning method of reticles

Publications (1)

Publication Number Publication Date
JPS52122476A true JPS52122476A (en) 1977-10-14

Family

ID=12520482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3826576A Pending JPS52122476A (en) 1976-04-07 1976-04-07 Aligning method of reticles

Country Status (1)

Country Link
JP (1) JPS52122476A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59170841A (en) * 1983-03-17 1984-09-27 Nippon Seiko Kk Positioning device of exposing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59170841A (en) * 1983-03-17 1984-09-27 Nippon Seiko Kk Positioning device of exposing device

Similar Documents

Publication Publication Date Title
JPS5313424A (en) Photosensitive element of selenium for electronic photography
JPS5228875A (en) Mask
JPS5211774A (en) Method of detecting relative position of patterns
JPS5396674A (en) Photo mask
JPS52126136A (en) Disfigurement detecting system using figure outline information
JPS51120792A (en) Device for detecting metals mixed in fluids
JPS52122476A (en) Aligning method of reticles
JPS5258374A (en) Improvement in sensitivity of positive type photo resist
JPS5373073A (en) Treatment method for photo resist
JPS525270A (en) Photo-mask
JPS5216171A (en) Mask fitting device
JPS5413783A (en) Photoelectric transducer
JPS5418572A (en) Device for correcting error of work in inductrial robot
JPS526438A (en) Digital differential analyzer
JPS5419674A (en) Checking mechanism of photo repeaters
JPS5354675A (en) Positioning detecting method
JPS52106771A (en) Drift correction circuit
JPS5347821A (en) Microfish locator
JPS52143771A (en) Aligning method for reticle datum plane
JPS52117569A (en) Electronic beam exposure unit
JPS5359372A (en) Mask alignment
JPS5441070A (en) Semiconductor element
JPS53124073A (en) Sealing unit for glass sealing type semiconductor device
JPS5316631A (en) Photographic exposure method
JPS5362522A (en) Determining device for exposure requirements