JPS52116897A - Forming transparent conductive film on organic substrate - Google Patents

Forming transparent conductive film on organic substrate

Info

Publication number
JPS52116897A
JPS52116897A JP3423776A JP3423776A JPS52116897A JP S52116897 A JPS52116897 A JP S52116897A JP 3423776 A JP3423776 A JP 3423776A JP 3423776 A JP3423776 A JP 3423776A JP S52116897 A JPS52116897 A JP S52116897A
Authority
JP
Japan
Prior art keywords
conductive film
transparent conductive
organic substrate
forming transparent
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3423776A
Other languages
Japanese (ja)
Inventor
Yasuhiro Shimizu
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3423776A priority Critical patent/JPS52116897A/en
Publication of JPS52116897A publication Critical patent/JPS52116897A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated

Abstract

PURPOSE:To form a transparent conductive film of superior characteristic on organic high molecular forming substrate of low melting point below about 150-200 deg C, by operating a degas processing with organic material substrate being previously heated.
JP3423776A 1976-03-29 1976-03-29 Forming transparent conductive film on organic substrate Pending JPS52116897A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3423776A JPS52116897A (en) 1976-03-29 1976-03-29 Forming transparent conductive film on organic substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3423776A JPS52116897A (en) 1976-03-29 1976-03-29 Forming transparent conductive film on organic substrate

Publications (1)

Publication Number Publication Date
JPS52116897A true JPS52116897A (en) 1977-09-30

Family

ID=12408536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3423776A Pending JPS52116897A (en) 1976-03-29 1976-03-29 Forming transparent conductive film on organic substrate

Country Status (1)

Country Link
JP (1) JPS52116897A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60131712A (en) * 1983-12-20 1985-07-13 住友ベークライト株式会社 Method of producing transparent conductive film
JPH02247383A (en) * 1989-03-17 1990-10-03 Matsushita Electric Ind Co Ltd Production of thin film
JP2013517382A (en) * 2010-01-22 2013-05-16 ユーロプラズマ Method for coating adaptive nano-coating by low-pressure plasma process

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60131712A (en) * 1983-12-20 1985-07-13 住友ベークライト株式会社 Method of producing transparent conductive film
JPH0345486B2 (en) * 1983-12-20 1991-07-11 Sumitomo Bakelite Co
JPH02247383A (en) * 1989-03-17 1990-10-03 Matsushita Electric Ind Co Ltd Production of thin film
JPH089782B2 (en) * 1989-03-17 1996-01-31 松下電器産業株式会社 Thin film manufacturing method
JP2013517382A (en) * 2010-01-22 2013-05-16 ユーロプラズマ Method for coating adaptive nano-coating by low-pressure plasma process

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