JPS52112196A - Electron beam exposure apparatus - Google Patents
Electron beam exposure apparatusInfo
- Publication number
- JPS52112196A JPS52112196A JP2849776A JP2849776A JPS52112196A JP S52112196 A JPS52112196 A JP S52112196A JP 2849776 A JP2849776 A JP 2849776A JP 2849776 A JP2849776 A JP 2849776A JP S52112196 A JPS52112196 A JP S52112196A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure apparatus
- beam exposure
- patterns
- microsize
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:In the electron beam exposure apparatus for use in forming microsize patterns, to shorten the time required per unit area by applying scanning shaped like a belt with a certain width, and, at the same time, to prevent the patterns from being deformed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2849776A JPS52112196A (en) | 1976-03-16 | 1976-03-16 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2849776A JPS52112196A (en) | 1976-03-16 | 1976-03-16 | Electron beam exposure apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52112196A true JPS52112196A (en) | 1977-09-20 |
JPS548071B2 JPS548071B2 (en) | 1979-04-12 |
Family
ID=12250299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2849776A Granted JPS52112196A (en) | 1976-03-16 | 1976-03-16 | Electron beam exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52112196A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5463681A (en) * | 1977-10-29 | 1979-05-22 | Nippon Aviotronics Kk | Electron beam exposure device |
EP0367496A2 (en) * | 1988-10-31 | 1990-05-09 | Fujitsu Limited | Charged particle beam lithography system and a method thereof |
US5173582A (en) * | 1988-10-31 | 1992-12-22 | Fujitsu Limited | Charged particle beam lithography system and method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5320391A (en) * | 1976-08-09 | 1978-02-24 | Becton Dickinson Co | Blood inspection apparatus |
-
1976
- 1976-03-16 JP JP2849776A patent/JPS52112196A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5320391A (en) * | 1976-08-09 | 1978-02-24 | Becton Dickinson Co | Blood inspection apparatus |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5463681A (en) * | 1977-10-29 | 1979-05-22 | Nippon Aviotronics Kk | Electron beam exposure device |
JPS626341B2 (en) * | 1977-10-29 | 1987-02-10 | Nippon Avionics Co Ltd | |
EP0367496A2 (en) * | 1988-10-31 | 1990-05-09 | Fujitsu Limited | Charged particle beam lithography system and a method thereof |
US5173582A (en) * | 1988-10-31 | 1992-12-22 | Fujitsu Limited | Charged particle beam lithography system and method |
Also Published As
Publication number | Publication date |
---|---|
JPS548071B2 (en) | 1979-04-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EG11980A (en) | Apparatus with flexible pressurizing sheet and related method for processing cloth,especially knitted cloth | |
JPS5412675A (en) | Electon beam exposure method | |
JPS5388280A (en) | Pin inserting device and method therefor | |
JPS5213064A (en) | Each independent taking-up motion in a slitter | |
JPS5313616A (en) | Method and apparatus for treating articles by flidic operation | |
NZ182997A (en) | Stabilising biologically active compounds,and apparatus for performing tests | |
SE7608571L (en) | SPRAYER FOR GRAIN MATERIAL | |
JPS52112196A (en) | Electron beam exposure apparatus | |
JPS5249570A (en) | Transport apparatus | |
JPS5218667A (en) | Apparatus for conveying sheet roll | |
JPS5330396A (en) | Ticket inspecting machine of automatic fare adjustment type | |
NL171493C (en) | METHOD AND APPARATUS FINE DISTRIBUTED MATERIAL IN A ROTATING OVEN. | |
IT8022926A0 (en) | PRINTING APPARATUS AND METHOD FOR DOING THE SAME. | |
JPS51145270A (en) | Method of errosive-printing elaborate pattern on metal plate, semicond uctor, etc. | |
JPS52130052A (en) | Irradiation width-variable irradiating device | |
JPS5333272A (en) | Apparatus for treating sheet or long size material | |
DE2860834D1 (en) | Process and apparatus for continuously stretching a synthetic polymeric film in the longitudinal direction. | |
SU524188A1 (en) | Apparatus for determining a random process dissipant | |
JPS5220564A (en) | Constant tension apparatus | |
JPS5212522A (en) | Information processing device | |
JPS5434290A (en) | Defect inspecting apparatus | |
JPS521673A (en) | Guide device in press machine,etc. | |
FR2340145A1 (en) | GUIDING DEVICE FOR BARS IN THE ROLLING PROCESS | |
JPS51138875A (en) | Intermittent elmination | |
JPS52132261A (en) | Intermittent driving method and its apparatus |