JPS52109373A - Method of deflecting and scanning electron beam - Google Patents
Method of deflecting and scanning electron beamInfo
- Publication number
- JPS52109373A JPS52109373A JP2591776A JP2591776A JPS52109373A JP S52109373 A JPS52109373 A JP S52109373A JP 2591776 A JP2591776 A JP 2591776A JP 2591776 A JP2591776 A JP 2591776A JP S52109373 A JPS52109373 A JP S52109373A
- Authority
- JP
- Japan
- Prior art keywords
- deflecting
- electron beam
- scanning electron
- scanning
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2591776A JPS52109373A (en) | 1976-03-10 | 1976-03-10 | Method of deflecting and scanning electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2591776A JPS52109373A (en) | 1976-03-10 | 1976-03-10 | Method of deflecting and scanning electron beam |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52109373A true JPS52109373A (en) | 1977-09-13 |
JPS546476B2 JPS546476B2 (en) | 1979-03-28 |
Family
ID=12179118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2591776A Granted JPS52109373A (en) | 1976-03-10 | 1976-03-10 | Method of deflecting and scanning electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52109373A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54137977A (en) * | 1978-04-19 | 1979-10-26 | Hitachi Ltd | Electron-beam exposure unit |
JPS57181122A (en) * | 1981-04-16 | 1982-11-08 | Control Data Corp | Electron beam array lithographic method and device |
JPS5825235A (en) * | 1981-05-21 | 1983-02-15 | コントロ−ル・デ−タ・コ−ポレ−シヨン | Multiple channel electron beam array lithographic device |
JPS61192444U (en) * | 1986-05-01 | 1986-11-29 |
-
1976
- 1976-03-10 JP JP2591776A patent/JPS52109373A/en active Granted
Non-Patent Citations (1)
Title |
---|
DENSHI TOKYO=1975 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54137977A (en) * | 1978-04-19 | 1979-10-26 | Hitachi Ltd | Electron-beam exposure unit |
JPS57181122A (en) * | 1981-04-16 | 1982-11-08 | Control Data Corp | Electron beam array lithographic method and device |
JPS5825235A (en) * | 1981-05-21 | 1983-02-15 | コントロ−ル・デ−タ・コ−ポレ−シヨン | Multiple channel electron beam array lithographic device |
JPS61192444U (en) * | 1986-05-01 | 1986-11-29 |
Also Published As
Publication number | Publication date |
---|---|
JPS546476B2 (en) | 1979-03-28 |
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