JPS5177074A - Handotainoetsuchingu - Google Patents

Handotainoetsuchingu

Info

Publication number
JPS5177074A
JPS5177074A JP14168075A JP14168075A JPS5177074A JP S5177074 A JPS5177074 A JP S5177074A JP 14168075 A JP14168075 A JP 14168075A JP 14168075 A JP14168075 A JP 14168075A JP S5177074 A JPS5177074 A JP S5177074A
Authority
JP
Japan
Prior art keywords
handotainoe
tsuchingu
handotainoe tsuchingu
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14168075A
Other languages
English (en)
Other versions
JPS5622368B2 (ja
Inventor
Furuumu Josurin
Deebitsudo Guriin Piitaa
Jooji Baatoramu Hitsu Harorudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Micronas GmbH
Original Assignee
Deutsche ITT Industries GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsche ITT Industries GmbH filed Critical Deutsche ITT Industries GmbH
Publication of JPS5177074A publication Critical patent/JPS5177074A/ja
Publication of JPS5622368B2 publication Critical patent/JPS5622368B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3063—Electrolytic etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3063—Electrolytic etching
    • H01L21/30635—Electrolytic etching of AIIIBV compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
JP14168075A 1974-11-28 1975-11-28 Handotainoetsuchingu Granted JPS5177074A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5157474A GB1469005A (en) 1974-11-28 1974-11-28 Standard telephones cables ltd semiconductor device manufacture

Publications (2)

Publication Number Publication Date
JPS5177074A true JPS5177074A (ja) 1976-07-03
JPS5622368B2 JPS5622368B2 (ja) 1981-05-25

Family

ID=10460546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14168075A Granted JPS5177074A (ja) 1974-11-28 1975-11-28 Handotainoetsuchingu

Country Status (3)

Country Link
JP (1) JPS5177074A (ja)
DE (1) DE2551444A1 (ja)
GB (1) GB1469005A (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6047725B2 (ja) * 1977-06-14 1985-10-23 ソニー株式会社 フエライトの加工法
GB8426915D0 (en) * 1984-10-24 1984-11-28 Marconi Instruments Ltd Fabricating devices on semiconductor substrates
DE3889830D1 (de) * 1987-09-30 1994-07-07 Siemens Ag Verfahren zum Ätzen von (100) Silizium.
US6401009B1 (en) 1999-02-16 2002-06-04 Suzette M. Chandonnet Sundry article vending apparatus

Also Published As

Publication number Publication date
GB1469005A (en) 1977-03-30
DE2551444A1 (de) 1976-08-12
JPS5622368B2 (ja) 1981-05-25

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