JPS516562B2 - - Google Patents

Info

Publication number
JPS516562B2
JPS516562B2 JP46101680A JP10168071A JPS516562B2 JP S516562 B2 JPS516562 B2 JP S516562B2 JP 46101680 A JP46101680 A JP 46101680A JP 10168071 A JP10168071 A JP 10168071A JP S516562 B2 JPS516562 B2 JP S516562B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP46101680A
Other languages
Japanese (ja)
Other versions
JPS4868302A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP46101680A priority Critical patent/JPS516562B2/ja
Priority to GB5819672A priority patent/GB1411966A/en
Priority to FR7244824A priority patent/FR2163703B1/fr
Priority to DE19722261494 priority patent/DE2261494C2/en
Publication of JPS4868302A publication Critical patent/JPS4868302A/ja
Priority to GB5190974A priority patent/GB1463900A/en
Publication of JPS516562B2 publication Critical patent/JPS516562B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/42—Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Graft Or Block Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP46101680A 1971-12-15 1971-12-15 Expired JPS516562B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP46101680A JPS516562B2 (en) 1971-12-15 1971-12-15
GB5819672A GB1411966A (en) 1971-12-15 1972-12-15 Photosensitive polyamide compositions
FR7244824A FR2163703B1 (en) 1971-12-15 1972-12-15
DE19722261494 DE2261494C2 (en) 1971-12-15 1972-12-15 Light-sensitive polyamide preparation
GB5190974A GB1463900A (en) 1971-12-15 1974-11-29 Photosensitive polyamide composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46101680A JPS516562B2 (en) 1971-12-15 1971-12-15

Publications (2)

Publication Number Publication Date
JPS4868302A JPS4868302A (en) 1973-09-18
JPS516562B2 true JPS516562B2 (en) 1976-02-28

Family

ID=14307047

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46101680A Expired JPS516562B2 (en) 1971-12-15 1971-12-15

Country Status (4)

Country Link
JP (1) JPS516562B2 (en)
DE (1) DE2261494C2 (en)
FR (1) FR2163703B1 (en)
GB (2) GB1411966A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6030965U (en) * 1983-08-05 1985-03-02 三菱重工業株式会社 Refrigeration equipment
JPH0225096Y2 (en) * 1983-04-20 1990-07-10

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49127708A (en) * 1973-04-16 1974-12-06
JPS5092996A (en) * 1973-12-22 1975-07-24
JPS50105126A (en) * 1974-01-26 1975-08-19
JPS50108003A (en) * 1974-02-01 1975-08-26
JPS5149803A (en) * 1974-10-28 1976-04-30 Unitika Ltd KANKOSEIJUSHISOSEIBUTSUNO NENCHAKUSEIBOSHIHOHO
CA1149985A (en) * 1980-04-26 1983-07-12 Takashi Okamoto Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
JPS5967258U (en) * 1982-10-27 1984-05-07 東レ株式会社 stamp
GB2235927B (en) * 1989-09-14 1992-10-21 Asahi Chemical Ind A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
EP0636940B1 (en) * 1993-07-20 1998-10-07 Toray Industries, Inc. Photosensitive polymer composition
KR100220662B1 (en) * 1994-08-09 1999-09-15 야마모토 카즈모토 Adhesive padding cloth, method of manufacyuring the same and bonding agent for adhesive cloths
US6010821A (en) 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
US6890701B2 (en) * 2001-09-11 2005-05-10 Fuji Photo Film Co., Ltd. Photopolymerizable composition
DE502006001196D1 (en) * 2005-02-10 2008-09-04 Bozzetto Gmbh NETWORKABLE MELT ADHESIVE MIXTURE
DE102006017346B4 (en) * 2006-04-11 2011-01-27 Cpp Creative - Polymers - Produktions Gmbh Migration-stable masterbatch with improved crosslinking properties, process for its preparation and use thereof
JP2008273453A (en) * 2007-05-02 2008-11-13 Hinomoto Osaka:Kk Wheel for bag
US9828467B2 (en) 2016-02-05 2017-11-28 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0225096Y2 (en) * 1983-04-20 1990-07-10
JPS6030965U (en) * 1983-08-05 1985-03-02 三菱重工業株式会社 Refrigeration equipment

Also Published As

Publication number Publication date
GB1463900A (en) 1977-02-09
DE2261494A1 (en) 1973-07-05
DE2261494C2 (en) 1982-03-04
FR2163703B1 (en) 1981-06-26
JPS4868302A (en) 1973-09-18
FR2163703A1 (en) 1973-07-27
GB1411966A (en) 1975-10-29

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