JPS51481B1 - - Google Patents
Info
- Publication number
- JPS51481B1 JPS51481B1 JP4274871A JP4274871A JPS51481B1 JP S51481 B1 JPS51481 B1 JP S51481B1 JP 4274871 A JP4274871 A JP 4274871A JP 4274871 A JP4274871 A JP 4274871A JP S51481 B1 JPS51481 B1 JP S51481B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4274871A JPS51481B1 (en) | 1971-06-15 | 1971-06-15 | |
| CA144,506A CA958273A (en) | 1971-06-15 | 1972-06-13 | Photosensitive composition |
| GB2791772A GB1392076A (en) | 1971-06-15 | 1972-06-14 | Photosensitive polymers and elements |
| FR7221370A FR2141902A1 (en) | 1971-06-15 | 1972-06-14 | |
| DE19722229302 DE2229302A1 (en) | 1971-06-15 | 1972-06-15 | LIGHT SENSITIVE DIMENSIONS |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4274871A JPS51481B1 (en) | 1971-06-15 | 1971-06-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS51481B1 true JPS51481B1 (en) | 1976-01-08 |
Family
ID=12644621
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4274871A Pending JPS51481B1 (en) | 1971-06-15 | 1971-06-15 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS51481B1 (en) |
| CA (1) | CA958273A (en) |
| DE (1) | DE2229302A1 (en) |
| FR (1) | FR2141902A1 (en) |
| GB (1) | GB1392076A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2549303B2 (en) * | 1988-09-21 | 1996-10-30 | 富士写真フイルム株式会社 | Photosensitive composition |
| US7271283B2 (en) * | 2003-08-29 | 2007-09-18 | General Electric Company | High refractive index, UV-curable monomers and coating compositions prepared therefrom |
| CN101613276B (en) * | 2009-06-23 | 2012-12-26 | 苏州苏大欧罗新材料科技有限公司 | Color photoresist for color filter |
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1971
- 1971-06-15 JP JP4274871A patent/JPS51481B1/ja active Pending
-
1972
- 1972-06-13 CA CA144,506A patent/CA958273A/en not_active Expired
- 1972-06-14 FR FR7221370A patent/FR2141902A1/fr not_active Withdrawn
- 1972-06-14 GB GB2791772A patent/GB1392076A/en not_active Expired
- 1972-06-15 DE DE19722229302 patent/DE2229302A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1392076A (en) | 1975-04-23 |
| CA958273A (en) | 1974-11-26 |
| FR2141902A1 (en) | 1973-01-26 |
| DE2229302A1 (en) | 1973-01-11 |