JPS51129882A - Process for liquid phase epitaxial growth - Google Patents

Process for liquid phase epitaxial growth

Info

Publication number
JPS51129882A
JPS51129882A JP5387675A JP5387675A JPS51129882A JP S51129882 A JPS51129882 A JP S51129882A JP 5387675 A JP5387675 A JP 5387675A JP 5387675 A JP5387675 A JP 5387675A JP S51129882 A JPS51129882 A JP S51129882A
Authority
JP
Japan
Prior art keywords
epitaxial growth
liquid phase
phase epitaxial
iiiw
scratches
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5387675A
Other languages
Japanese (ja)
Other versions
JPS5318465B2 (en
Inventor
Yoshiharu Horikoshi
Yoshitaka Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP5387675A priority Critical patent/JPS51129882A/en
Publication of JPS51129882A publication Critical patent/JPS51129882A/en
Publication of JPS5318465B2 publication Critical patent/JPS5318465B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PURPOSE: In a process for liquid epitaxial growth of a semiconductor made of IIIW V groups compounds by use of a rotary boat, surface of the epitaxial layer is prevented from scratches and pollution with impurities in gas by pushing out melt.
COPYRIGHT: (C)1976,JPO&Japio
JP5387675A 1975-05-07 1975-05-07 Process for liquid phase epitaxial growth Granted JPS51129882A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5387675A JPS51129882A (en) 1975-05-07 1975-05-07 Process for liquid phase epitaxial growth

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5387675A JPS51129882A (en) 1975-05-07 1975-05-07 Process for liquid phase epitaxial growth

Publications (2)

Publication Number Publication Date
JPS51129882A true JPS51129882A (en) 1976-11-11
JPS5318465B2 JPS5318465B2 (en) 1978-06-15

Family

ID=12954936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5387675A Granted JPS51129882A (en) 1975-05-07 1975-05-07 Process for liquid phase epitaxial growth

Country Status (1)

Country Link
JP (1) JPS51129882A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5171882A (en) * 1974-12-20 1976-06-22 Nippon Telegraph & Telephone

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5171882A (en) * 1974-12-20 1976-06-22 Nippon Telegraph & Telephone

Also Published As

Publication number Publication date
JPS5318465B2 (en) 1978-06-15

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