JPS5099249A - - Google Patents

Info

Publication number
JPS5099249A
JPS5099249A JP49109893A JP10989374A JPS5099249A JP S5099249 A JPS5099249 A JP S5099249A JP 49109893 A JP49109893 A JP 49109893A JP 10989374 A JP10989374 A JP 10989374A JP S5099249 A JPS5099249 A JP S5099249A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49109893A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5099249A publication Critical patent/JPS5099249A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/30—Time-delay networks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02614—Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves
    • H03H9/02622—Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves of the surface, including back surface
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02818—Means for compensation or elimination of undesirable effects
    • H03H9/02866—Means for compensation or elimination of undesirable effects of bulk wave excitation and reflections
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49005—Acoustic transducer

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
JP49109893A 1973-12-28 1974-09-24 Pending JPS5099249A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US429476A US3887887A (en) 1973-12-28 1973-12-28 Acoustic bulk mode suppressor

Publications (1)

Publication Number Publication Date
JPS5099249A true JPS5099249A (ja) 1975-08-06

Family

ID=23703422

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49109893A Pending JPS5099249A (ja) 1973-12-28 1974-09-24

Country Status (5)

Country Link
US (1) US3887887A (ja)
JP (1) JPS5099249A (ja)
DE (1) DE2459670A1 (ja)
FR (1) FR2256547B1 (ja)
GB (1) GB1491896A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6250856B1 (ja) * 2016-07-20 2017-12-20 信越化学工業株式会社 表面弾性波デバイス用複合基板及びその製造方法とこの複合基板を用いた表面弾性波デバイス
JP2019510391A (ja) * 2016-02-01 2019-04-11 ソイテック 表面音響波デバイスのためのハイブリッド構造

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1438777A (en) * 1973-09-04 1976-06-09 Mullard Ltd Electromechanical propagation devices and the manufacture thereof
JPS5426349B2 (ja) * 1973-10-26 1979-09-03
FR2261654B1 (ja) * 1974-02-15 1978-01-06 Thomson Csf
FR2261653B1 (ja) * 1974-02-15 1978-01-06 Thomson Csf
US4270105A (en) * 1979-05-14 1981-05-26 Raytheon Company Stabilized surface wave device
JPS56132806A (en) * 1980-03-22 1981-10-17 Murata Mfg Co Ltd Elastic surface wave equipment
EP0622897B1 (en) * 1993-04-28 2001-03-07 Matsushita Electric Industrial Co., Ltd. Surface acoustic wave device and method of manufacturing the same
DE19548043A1 (de) * 1995-12-21 1997-07-03 Siemens Matsushita Components Verfahren zur Strukturierung von Substraten von mit akustischen Oberflächenwellen arbeitenden Bauelementen - OFW-Bauelemente -
DE19626410A1 (de) * 1996-07-01 1998-01-08 Siemens Matsushita Components Substrat für mit akustischen Oberflächenwellen arbeitende Bauelemente
TW528907B (en) * 2000-05-22 2003-04-21 Benq Corp Method of performing a uniform illumination pattern in a back-light plate using sand-blasting
US20050108869A1 (en) * 2003-05-16 2005-05-26 Shuen-Shing Hsiao Method for manufacturing teeth of linear step motors
JP4517992B2 (ja) * 2005-09-14 2010-08-04 セイコーエプソン株式会社 導通孔形成方法、並びに圧電デバイスの製造方法、及び圧電デバイス
DE102007028288B4 (de) * 2007-06-20 2013-06-06 Epcos Ag Mit akustischen Wellen arbeitendes MEMS Bauelement und Verfahren zur Herstellung
FR2922696B1 (fr) * 2007-10-22 2010-03-12 St Microelectronics Sa Resonateur a ondes de lamb
JP5466102B2 (ja) * 2010-07-08 2014-04-09 セイコーインスツル株式会社 貫通電極付きガラス基板の製造方法及び電子部品の製造方法
US10177734B2 (en) 2015-08-25 2019-01-08 Avago Technologies International Sales Pte. Limited Surface acoustic wave (SAW) resonator
US10020796B2 (en) * 2015-08-25 2018-07-10 Avago Technologies General Ip (Singapore) Pte. Ltd. Surface acoustic wave (SAW) resonator
US10469056B2 (en) 2015-08-25 2019-11-05 Avago Technologies International Sales Pte. Limited Acoustic filters integrated into single die
US10090822B2 (en) * 2015-08-25 2018-10-02 Avago Technologies General Ip (Singapore) Pte. Ltd. Surface acoustic wave (SAW) resonator
US10536133B2 (en) 2016-04-22 2020-01-14 Avago Technologies International Sales Pte. Limited Composite surface acoustic wave (SAW) device with absorbing layer for suppression of spurious responses
US20170063330A1 (en) * 2015-08-25 2017-03-02 Avago Technologies General Ip (Singapore) Pte. Ltd. Surface acoustic wave (saw) resonator
US10523178B2 (en) * 2015-08-25 2019-12-31 Avago Technologies International Sales Pte. Limited Surface acoustic wave (SAW) resonator
US9991870B2 (en) 2015-08-25 2018-06-05 Avago Technologies General Ip (Singapore) Pte. Ltd. Surface acoustic wave (SAW) resonator
US10177735B2 (en) 2016-02-29 2019-01-08 Avago Technologies International Sales Pte. Limited Surface acoustic wave (SAW) resonator

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3564461A (en) * 1968-11-04 1971-02-16 Us Navy Process for making an ultrasonic delay cell
US3781721A (en) * 1972-11-30 1973-12-25 Hughes Aircraft Co Acoustic surface wave device eliminating spurious end reflections

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019510391A (ja) * 2016-02-01 2019-04-11 ソイテック 表面音響波デバイスのためのハイブリッド構造
JP2021100282A (ja) * 2016-02-01 2021-07-01 ソイテック 表面音響波デバイスのためのハイブリッド構造
US11335847B2 (en) 2016-02-01 2022-05-17 Soitec Hybrid structure for a surface acoustic wave device
JP6250856B1 (ja) * 2016-07-20 2017-12-20 信越化学工業株式会社 表面弾性波デバイス用複合基板及びその製造方法とこの複合基板を用いた表面弾性波デバイス
WO2018016314A1 (ja) * 2016-07-20 2018-01-25 信越化学工業株式会社 表面弾性波デバイス用複合基板及びその製造方法とこの複合基板を用いた表面弾性波デバイス
JP2018061226A (ja) * 2016-07-20 2018-04-12 信越化学工業株式会社 表面弾性波デバイス用複合基板及びその製造方法とこの複合基板を用いた表面弾性波デバイス
CN109417376A (zh) * 2016-07-20 2019-03-01 信越化学工业株式会社 表面声波器件用复合基板及其制造方法和使用该复合基板的表面声波器件
US10886890B2 (en) 2016-07-20 2021-01-05 Shin-Etsu Chemical Co., Ltd. Composite substrate for surface acoustic wave device, method of producing composite substrate for surface acoustic wave device, and surface acoustic wave device using composite substrate
CN109417376B (zh) * 2016-07-20 2023-05-02 信越化学工业株式会社 表面声波器件用复合基板及其制造方法和使用该复合基板的表面声波器件

Also Published As

Publication number Publication date
US3887887A (en) 1975-06-03
FR2256547A1 (ja) 1975-07-25
FR2256547B1 (ja) 1978-07-07
GB1491896A (en) 1977-11-16
DE2459670A1 (de) 1975-07-10

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