JPS508658B1 - - Google Patents

Info

Publication number
JPS508658B1
JPS508658B1 JP5384770A JP5384770A JPS508658B1 JP S508658 B1 JPS508658 B1 JP S508658B1 JP 5384770 A JP5384770 A JP 5384770A JP 5384770 A JP5384770 A JP 5384770A JP S508658 B1 JPS508658 B1 JP S508658B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5384770A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5384770A priority Critical patent/JPS508658B1/ja
Priority to DE19712130283 priority patent/DE2130283A1/en
Publication of JPS508658B1 publication Critical patent/JPS508658B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP5384770A 1970-06-19 1970-06-19 Pending JPS508658B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP5384770A JPS508658B1 (en) 1970-06-19 1970-06-19
DE19712130283 DE2130283A1 (en) 1970-06-19 1971-06-18 Photosensitive compns - contg alkali-soluble vinyl polymers and ortho-quinonone diazides developable in alkaline

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5384770A JPS508658B1 (en) 1970-06-19 1970-06-19

Publications (1)

Publication Number Publication Date
JPS508658B1 true JPS508658B1 (en) 1975-04-05

Family

ID=12954149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5384770A Pending JPS508658B1 (en) 1970-06-19 1970-06-19

Country Status (2)

Country Link
JP (1) JPS508658B1 (en)
DE (1) DE2130283A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013504097A (en) * 2009-09-08 2013-02-04 イーストマン コダック カンパニー Positive radiation sensitive imageable element

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (en) * 1972-05-05 1974-11-27
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
EP0077057B2 (en) * 1981-10-09 1989-08-16 Dai Nippon Insatsu Kabushiki Kaisha Negative-type resist sensitive to ionizing radiation
JPS58134631A (en) * 1982-01-08 1983-08-10 Konishiroku Photo Ind Co Ltd Photosensitive composition
US5264319A (en) * 1985-05-10 1993-11-23 Hitachi, Ltd. Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor
DE4235151A1 (en) * 1992-10-19 1994-04-21 Hoechst Ag Polyvinyl acetals which can form emulsifier-free aqueous dispersions and redispersible dry powders, processes for their preparation and their use
US8048609B2 (en) * 2008-12-19 2011-11-01 Eastman Kodak Company Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013504097A (en) * 2009-09-08 2013-02-04 イーストマン コダック カンパニー Positive radiation sensitive imageable element

Also Published As

Publication number Publication date
DE2130283A1 (en) 1971-12-23

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