JPS5078401A - - Google Patents

Info

Publication number
JPS5078401A
JPS5078401A JP13039073A JP13039073A JPS5078401A JP S5078401 A JPS5078401 A JP S5078401A JP 13039073 A JP13039073 A JP 13039073A JP 13039073 A JP13039073 A JP 13039073A JP S5078401 A JPS5078401 A JP S5078401A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13039073A
Other languages
Japanese (ja)
Other versions
JPS5236042B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13039073A priority Critical patent/JPS5236042B2/ja
Priority to DE19742454676 priority patent/DE2454676C3/en
Priority to FR7439296A priority patent/FR2251838A1/en
Publication of JPS5078401A publication Critical patent/JPS5078401A/ja
Publication of JPS5236042B2 publication Critical patent/JPS5236042B2/ja
Priority to US05/843,850 priority patent/US4187112A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Graft Or Block Polymers (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
JP13039073A 1973-11-19 1973-11-19 Expired JPS5236042B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP13039073A JPS5236042B2 (en) 1973-11-19 1973-11-19
DE19742454676 DE2454676C3 (en) 1973-11-19 1974-11-19 Photosensitive mixture
FR7439296A FR2251838A1 (en) 1973-11-19 1974-11-29 Light-sensitive compsn. contg. polymer with ammonium gps. - in main or side chain for printing plate mfr. etc.
US05/843,850 US4187112A (en) 1973-11-19 1977-10-20 Photosensitive plate containing nitrogen containing condensation type polyesters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13039073A JPS5236042B2 (en) 1973-11-19 1973-11-19

Publications (2)

Publication Number Publication Date
JPS5078401A true JPS5078401A (en) 1975-06-26
JPS5236042B2 JPS5236042B2 (en) 1977-09-13

Family

ID=15033163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13039073A Expired JPS5236042B2 (en) 1973-11-19 1973-11-19

Country Status (3)

Country Link
JP (1) JPS5236042B2 (en)
DE (1) DE2454676C3 (en)
FR (1) FR2251838A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5177171A (en) * 1989-09-14 1993-01-05 Asahi Kasei Kogyo Kabushiki Kaisha Sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
WO1993003423A1 (en) * 1991-08-09 1993-02-18 Toyo Ink Manufacturing Co., Ltd. Photosensitive resin composition, production thereof, and flexographic plate material

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2104232B (en) * 1981-07-27 1985-02-27 Toyo Bosenki Kk Photosensitive resin composition
DE3131448A1 (en) * 1981-08-07 1983-02-24 Basf Ag, 6700 Ludwigshafen PHOTOPOLYMERIZABLE RECORDING MEASURES SUITABLE FOR THE PRODUCTION OF PHOTORESIS LAYERS
DE19501726A1 (en) * 1995-01-20 1996-07-25 Merck Patent Gmbh Polymerizable derivatives of polyamides

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2274831A (en) * 1939-07-20 1942-03-03 Du Pont Polyamides and process for their preparation
US2887376A (en) * 1956-01-26 1959-05-19 Eastman Kodak Co Photographic reproduction process using light-sensitive polymers
NL219906A (en) * 1956-08-14
DE1447017B2 (en) * 1963-10-26 1971-08-12 Kalle AG, 6202 Wiesbaden Biebrich PROCESS FOR MANUFACTURING PRINTING FORMS OF PRINTED CIRCUITS OR METAL ETCHES
DE1772722A1 (en) * 1968-06-26 1971-06-03 Basf Ag Process for the production of relief forms for printing purposes
SU363066A1 (en) * 1971-04-20 1972-12-30 Авторы изобретени витель ALL-UNION

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5177171A (en) * 1989-09-14 1993-01-05 Asahi Kasei Kogyo Kabushiki Kaisha Sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
WO1993003423A1 (en) * 1991-08-09 1993-02-18 Toyo Ink Manufacturing Co., Ltd. Photosensitive resin composition, production thereof, and flexographic plate material

Also Published As

Publication number Publication date
DE2454676B2 (en) 1980-01-31
FR2251838A1 (en) 1975-06-13
FR2251838B1 (en) 1981-12-31
DE2454676C3 (en) 1985-08-29
DE2454676A1 (en) 1975-05-22
JPS5236042B2 (en) 1977-09-13

Similar Documents

Publication Publication Date Title
AR201758A1 (en)
AU476761B2 (en)
AU465372B2 (en)
AR201235Q (en)
AR201231Q (en)
AU474593B2 (en)
AU474511B2 (en)
AU474838B2 (en)
AU465453B2 (en)
AU465434B2 (en)
AU471343B2 (en)
AU450229B2 (en)
AU476714B2 (en)
AR201229Q (en)
AU472848B2 (en)
AU476696B2 (en)
AU466283B2 (en)
AU477823B2 (en)
AR200885A1 (en)
AU477824B2 (en)
AU476873B1 (en)
AR196382A1 (en)
AU461342B2 (en)
AR210729A1 (en)
AU447540B2 (en)