JPS50140272A - - Google Patents
Info
- Publication number
- JPS50140272A JPS50140272A JP4793674A JP4793674A JPS50140272A JP S50140272 A JPS50140272 A JP S50140272A JP 4793674 A JP4793674 A JP 4793674A JP 4793674 A JP4793674 A JP 4793674A JP S50140272 A JPS50140272 A JP S50140272A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4793674A JPS50140272A (de) | 1974-04-27 | 1974-04-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4793674A JPS50140272A (de) | 1974-04-27 | 1974-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50140272A true JPS50140272A (de) | 1975-11-10 |
Family
ID=12789247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4793674A Pending JPS50140272A (de) | 1974-04-27 | 1974-04-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS50140272A (de) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59124139A (ja) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | パタ−ン保証検査方法 |
| JPS60235424A (ja) * | 1984-04-24 | 1985-11-22 | エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド | ウエハパターンとこのウエハ上に投影されたマスクパターンとの間のオーバレイ誤差測定装置 |
| JPS6213027A (ja) * | 1985-07-10 | 1987-01-21 | Matsushita Electronics Corp | フォトマスクの欠陥検査方法 |
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1974
- 1974-04-27 JP JP4793674A patent/JPS50140272A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59124139A (ja) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | パタ−ン保証検査方法 |
| JPH0524668B2 (de) * | 1982-12-29 | 1993-04-08 | Fujitsu Ltd | |
| JPS60235424A (ja) * | 1984-04-24 | 1985-11-22 | エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド | ウエハパターンとこのウエハ上に投影されたマスクパターンとの間のオーバレイ誤差測定装置 |
| JPH0533525B2 (de) * | 1984-04-24 | 1993-05-19 | Esu Bui Jii Ritogurafuii Shisutemuzu Inc | |
| JPS6213027A (ja) * | 1985-07-10 | 1987-01-21 | Matsushita Electronics Corp | フォトマスクの欠陥検査方法 |