JPS50134579A - - Google Patents
Info
- Publication number
- JPS50134579A JPS50134579A JP4117174A JP4117174A JPS50134579A JP S50134579 A JPS50134579 A JP S50134579A JP 4117174 A JP4117174 A JP 4117174A JP 4117174 A JP4117174 A JP 4117174A JP S50134579 A JPS50134579 A JP S50134579A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4117174A JPS50134579A (ja) | 1974-04-13 | 1974-04-13 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4117174A JPS50134579A (ja) | 1974-04-13 | 1974-04-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS50134579A true JPS50134579A (ja) | 1975-10-24 |
Family
ID=12600969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4117174A Pending JPS50134579A (ja) | 1974-04-13 | 1974-04-13 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS50134579A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5454577A (en) * | 1977-10-11 | 1979-04-28 | Hitachi Ltd | Material working method with photo resist |
JPS5690537A (en) * | 1979-12-22 | 1981-07-22 | Fujitsu Ltd | Formation of wiring layer |
JPS56114319A (en) * | 1980-02-14 | 1981-09-08 | Fujitsu Ltd | Method for forming contact hole |
JPS6292480A (ja) * | 1985-10-18 | 1987-04-27 | Sanyo Electric Co Ltd | 化合物半導体装置の製造方法 |
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1974
- 1974-04-13 JP JP4117174A patent/JPS50134579A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5454577A (en) * | 1977-10-11 | 1979-04-28 | Hitachi Ltd | Material working method with photo resist |
JPS6238852B2 (ja) * | 1977-10-11 | 1987-08-20 | Hitachi Ltd | |
JPS5690537A (en) * | 1979-12-22 | 1981-07-22 | Fujitsu Ltd | Formation of wiring layer |
JPS56114319A (en) * | 1980-02-14 | 1981-09-08 | Fujitsu Ltd | Method for forming contact hole |
JPS6292480A (ja) * | 1985-10-18 | 1987-04-27 | Sanyo Electric Co Ltd | 化合物半導体装置の製造方法 |