JPS4988603A - - Google Patents

Info

Publication number
JPS4988603A
JPS4988603A JP253873A JP253873A JPS4988603A JP S4988603 A JPS4988603 A JP S4988603A JP 253873 A JP253873 A JP 253873A JP 253873 A JP253873 A JP 253873A JP S4988603 A JPS4988603 A JP S4988603A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP253873A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP253873A priority Critical patent/JPS4988603A/ja
Priority to DE2364631A priority patent/DE2364631A1/de
Publication of JPS4988603A publication Critical patent/JPS4988603A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP253873A 1972-12-29 1972-12-29 Pending JPS4988603A (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP253873A JPS4988603A (de) 1972-12-29 1972-12-29
DE2364631A DE2364631A1 (de) 1972-12-29 1973-12-24 Entwicklerzusammensetzung fuer ein lichtempfindliches lithographisches druckmaterial

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP253873A JPS4988603A (de) 1972-12-29 1972-12-29

Publications (1)

Publication Number Publication Date
JPS4988603A true JPS4988603A (de) 1974-08-24

Family

ID=11532143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP253873A Pending JPS4988603A (de) 1972-12-29 1972-12-29

Country Status (2)

Country Link
JP (1) JPS4988603A (de)
DE (1) DE2364631A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
CN111308866A (zh) * 2020-04-01 2020-06-19 烟台核晶陶瓷新材料有限公司 一种用于坩埚检测的显影溶液及其制备方法和使用方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2817256A1 (de) * 1977-05-06 1978-11-09 Allied Chem Verfahren zur entwicklung einer mit fotoaetzgrund bedeckten flaeche
DE2809774A1 (de) * 1978-03-07 1979-09-13 Hoechst Ag Verfahren und entwicklerloesung zum entwickeln von belichteten lichtempfindlichen kopierschichten
DE2849894A1 (de) * 1978-11-17 1980-05-29 Hoechst Ag Verfahren zum reinigen von kupfer enthaltenden metalloberflaechen
JPS5587151A (en) * 1978-12-25 1980-07-01 Mitsubishi Chem Ind Ltd Developing solution composition for lithographic printing plate
DE2941960A1 (de) * 1979-10-17 1981-04-30 Hoechst Ag, 6000 Frankfurt Entwicklergemisch und verfahren zum entwickeln von von belichteten lichtempfindlichen kopierschichten
US4670372A (en) * 1984-10-15 1987-06-02 Petrarch Systems, Inc. Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant
DE3543961A1 (de) * 1984-12-12 1986-06-12 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa Verfahren zur herstellung trockener druckplatten fuer den flachdruck und entwicklerloesung zur verwendung in demselben
US4592992A (en) * 1985-04-11 1986-06-03 American Hoechst Corporation Developer compositions for lithographic plates
DE3523176A1 (de) * 1985-06-28 1987-01-08 Hoechst Ag Strahlungsempfindliche beschichtungsloesung und verfahren zur herstellung einer strahlungsempfindlichen schicht auf einem schichttraeger

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition
CN111308866A (zh) * 2020-04-01 2020-06-19 烟台核晶陶瓷新材料有限公司 一种用于坩埚检测的显影溶液及其制备方法和使用方法
CN111308866B (zh) * 2020-04-01 2023-08-22 烟台核晶陶瓷新材料有限公司 一种用于坩埚检测的显影溶液及其制备方法和使用方法

Also Published As

Publication number Publication date
DE2364631A1 (de) 1974-07-04

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