JPS495923A - - Google Patents
Info
- Publication number
- JPS495923A JPS495923A JP47045867A JP4586772A JPS495923A JP S495923 A JPS495923 A JP S495923A JP 47045867 A JP47045867 A JP 47045867A JP 4586772 A JP4586772 A JP 4586772A JP S495923 A JPS495923 A JP S495923A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Polyesters Or Polycarbonates (AREA)
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47045867A JPS5745785B2 (en) | 1972-05-11 | 1972-05-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47045867A JPS5745785B2 (en) | 1972-05-11 | 1972-05-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS495923A true JPS495923A (en) | 1974-01-19 |
| JPS5745785B2 JPS5745785B2 (en) | 1982-09-29 |
Family
ID=12731141
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47045867A Expired JPS5745785B2 (en) | 1972-05-11 | 1972-05-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5745785B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57137364A (en) * | 1981-02-20 | 1982-08-24 | Mitsui Toatsu Chem Inc | Chipping-resistant coating resin composition |
| JPS5888742A (en) * | 1981-11-12 | 1983-05-26 | バスフ アクチェン ゲゼルシャフト | Photosensitive material suitable for manufacturing typographic plate and anastatic plate and manufacture of typographic and anastatic plates using it |
| JPS6429836A (en) * | 1987-06-13 | 1989-01-31 | Basf Ag | Heating type keep plate cross linkable by photopolymerization |
| JPS6428630A (en) * | 1987-06-13 | 1989-01-31 | Basf Ag | Resin composition cross linkable by photopolymerization |
| US6136507A (en) * | 1998-03-12 | 2000-10-24 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| US6238841B1 (en) | 1998-05-12 | 2001-05-29 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| JP2002012797A (en) * | 2000-04-27 | 2002-01-15 | Dainippon Ink & Chem Inc | Active energy ray curable aqueous coating composition, coated metal material having cured film of the composition, manufacturing method and welding method of coated metal material |
| JP2017078096A (en) * | 2015-10-19 | 2017-04-27 | Dic株式会社 | Photocurable alkali-developable resin composition and cured product thereof |
-
1972
- 1972-05-11 JP JP47045867A patent/JPS5745785B2/ja not_active Expired
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57137364A (en) * | 1981-02-20 | 1982-08-24 | Mitsui Toatsu Chem Inc | Chipping-resistant coating resin composition |
| JPH0153309B2 (en) * | 1981-02-20 | 1989-11-13 | Mitsui Toatsu Chemicals | |
| JPS5888742A (en) * | 1981-11-12 | 1983-05-26 | バスフ アクチェン ゲゼルシャフト | Photosensitive material suitable for manufacturing typographic plate and anastatic plate and manufacture of typographic and anastatic plates using it |
| JPH0419540B2 (en) * | 1981-11-12 | 1992-03-30 | Basf Ag | |
| JPS6429836A (en) * | 1987-06-13 | 1989-01-31 | Basf Ag | Heating type keep plate cross linkable by photopolymerization |
| JPS6428630A (en) * | 1987-06-13 | 1989-01-31 | Basf Ag | Resin composition cross linkable by photopolymerization |
| US6136507A (en) * | 1998-03-12 | 2000-10-24 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| US6322952B1 (en) | 1998-03-12 | 2001-11-27 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| US6475702B2 (en) | 1998-03-12 | 2002-11-05 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| US6238841B1 (en) | 1998-05-12 | 2001-05-29 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| JP2002012797A (en) * | 2000-04-27 | 2002-01-15 | Dainippon Ink & Chem Inc | Active energy ray curable aqueous coating composition, coated metal material having cured film of the composition, manufacturing method and welding method of coated metal material |
| JP2017078096A (en) * | 2015-10-19 | 2017-04-27 | Dic株式会社 | Photocurable alkali-developable resin composition and cured product thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5745785B2 (en) | 1982-09-29 |