JPH1185396A - Low reflection glass for substrate of touch panel - Google Patents
Low reflection glass for substrate of touch panelInfo
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- JPH1185396A JPH1185396A JP24552797A JP24552797A JPH1185396A JP H1185396 A JPH1185396 A JP H1185396A JP 24552797 A JP24552797 A JP 24552797A JP 24552797 A JP24552797 A JP 24552797A JP H1185396 A JPH1185396 A JP H1185396A
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、各種表示装置等に
配置される抵抗膜式タッチパネル、すなわち、可撓性を
有する透明表層板の裏面に導電膜を形成し、その下の透
明基板の上面に導電膜パターンを形成し、表層板の適所
を押圧することにより、前記両板の導電膜が接触して導
通、入力する方式のタッチパネルの基板用低反射ガラス
に関し、特に前記透明ガラス基板上に透明導電膜を施し
た該基板の光反射率を低減し、透視性を良好にした、タ
ッチパネルの基板用低反射ガラスに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resistive touch panel disposed on various display devices and the like, that is, a conductive film is formed on the back surface of a flexible transparent surface plate and the upper surface of a transparent substrate thereunder. A conductive film pattern is formed on the surface layer plate, and by pressing a proper place on the surface plate, the conductive films of the two plates are brought into contact with each other, and the conductive film is input. The present invention relates to a low-reflection glass for a substrate of a touch panel, in which the light reflectance of the substrate provided with a transparent conductive film is reduced and the transparency is improved.
【０００２】[0002]
【従来技術および解決すべき課題】表示装置等におい
て、ガラス基板表面の入射光に低反射膜を形成したり、
微細凹凸を施すノングレア加工をすることにより、グレ
アー感（ギラツキ感）を抑え、透視性を良好とすること
は公知である。2. Description of the Related Art In a display device or the like, a low reflection film is formed on incident light on a glass substrate surface,
It is known that by performing non-glare processing for providing fine unevenness, glare (glare) is suppressed and transparency is improved.
【０００３】タッチパネルに関しては、特開平７−2099
3 号に、タッチパネルを構成する上下パネルに被着した
抵抗シート（透明導電膜）表面に微細凹凸を設けるノン
グレア加工をすることにより、干渉縞（ニュートンリン
グ）の発生を防止し、透視性を良好にすることが開示さ
れている。As for the touch panel, Japanese Patent Laid-Open No. 7-2099
In No. 3, non-glare processing, which provides fine irregularities on the surface of the resistive sheet (transparent conductive film) attached to the upper and lower panels that make up the touch panel, prevents interference fringes (Newton rings) and improves visibility Is disclosed.
【０００４】特開平５−127882号には、タッチパネルに
おける可動基板の表面に、１／４λ位相差板、偏光板、
ノングレア処理フィルムを積層することにより、表面反
射を小さくし、防眩性や、画像コントラスト等を高める
ことが開示されている。Japanese Patent Application Laid-Open No. 5-127882 discloses that a λλ retardation plate, a polarizing plate,
It is disclosed that by laminating a non-glare-treated film, surface reflection is reduced, and antiglare properties, image contrast, and the like are improved.
【０００５】特開平６−124159号には、タッチパネル
（タッチキー）における透明基板のITO 膜上に、ごく薄
い ITO層と、ごく薄いSiOx層との交互層を形成すること
により、光透過率を高めることが開示されている。[0005] Japanese Patent Application Laid-Open No. 6-124159 discloses a method of forming a thin ITO layer and a very thin SiOx layer alternately on an ITO film on a transparent substrate in a touch panel (touch key) to reduce light transmittance. It is disclosed to enhance.
【０００６】本発明は、それら公知例とは構成を異に
し、効率的な手段で、特定屈折率、膜厚の透明酸化物か
らなる複層膜を形成し、それにより光反射を低減し、グ
レアー感を解消し、透視性を増大したタッチパネルの基
板用低反射ガラスを提供するものである。The present invention is different from those of the known examples in that a multilayer film made of a transparent oxide having a specific refractive index and a specific thickness is formed by efficient means, thereby reducing light reflection. An object of the present invention is to provide a low-reflection glass for a substrate of a touch panel, which eliminates glare and has increased transparency.
【０００７】[0007]
【課題を解決するための手段】本発明は、透明ガラス基
板のタッチパネルの表層板側の表面（以下「上面」とい
う）に、基板から第１層目として、屈折率n1が2.05〜2.
25、膜厚d1が20〜50nmの透明酸化物膜、次いでその上の
第２層目として屈折率n2が1.43〜1.47、膜厚d2が60〜90
nmの透明酸化物膜を成膜し、更に透明導電膜を膜厚d3が
約10〜25nmの範囲で膜形成し、一方、透明ガラス基板の
上面と反対側の面（以下「裏面」という）に、基板から
第１' 層目として、屈折率n1' が1.70〜1.90、膜厚d1'
が60〜90nmの透明酸化物膜、次いでその上の第２' 層目
として屈折率n2' が1.43〜1.47、膜厚d2' が80〜 110nm
の透明酸化物膜を成膜し、前記透明導電膜面側の可視光
線反射率を 2.0％以下としたタッチパネルの基板用低反
射ガラスである。According to the present invention, a transparent glass substrate has a refractive index n1 of 2.05 to 2.0 as a first layer on the surface of a touch panel on a surface layer side (hereinafter referred to as an "upper surface") of a touch panel.
25, a transparent oxide film having a film thickness d1 of 20 to 50 nm, and then a second layer having a refractive index n2 of 1.43 to 1.47 and a film thickness d2 of 60 to 90
a transparent oxide film having a thickness of 10 nm, and a transparent conductive film having a thickness d3 in the range of about 10 to 25 nm. On the other hand, a surface opposite to the upper surface of the transparent glass substrate (hereinafter referred to as a “back surface”). Further, as a first 'layer from the substrate, the refractive index n1' is 1.70 to 1.90 and the film thickness d1 '
Is a transparent oxide film having a thickness of 60 to 90 nm, and then has a refractive index n2 'of 1.43 to 1.47 and a film thickness d2' of 80 to 110 nm as a second layer thereon.
A low-reflection glass for a substrate of a touch panel in which a transparent oxide film is formed and the visible light reflectance on the transparent conductive film surface side is 2.0% or less.
【０００８】また、本発明は、透明ガラス基板のタッチ
パネルの表層板側の表面（上面）に、基板から第１層目
として、屈折率n1が2.05〜2.25、膜厚d1が80〜 110nmの
透明酸化物膜、次いでその上の第２層目として屈折率n2
が1.43〜1.47、膜厚d2が15〜50nmの透明酸化物膜を成膜
し、更に透明導電膜を膜厚d3が約10〜25nmの範囲で膜形
成し、一方、透明ガラス基板の裏面に、基板から第１'
層目として、屈折率n1' が1.70〜1.90、膜厚d1' が60〜
90nmの透明酸化物膜、次いでその上の第２' 層目として
屈折率n2' が1.43〜1.47、膜厚d2' が80〜 110nmの透明
酸化物膜を成膜し、前記透明導電膜面側の可視光線反射
率を 2.0％以下としたタッチパネルの基板用低反射ガラ
スである。The present invention also provides a transparent glass substrate having a refractive index n1 of 2.05 to 2.25 and a film thickness d1 of 80 to 110 nm as a first layer on the surface (upper surface) of the touch panel on the surface layer side of the touch panel. An oxide film, and then a second layer thereon, the refractive index n2
A transparent oxide film having a thickness of 1.43 to 1.47 and a thickness d2 of 15 to 50 nm is formed, and a transparent conductive film is further formed with a thickness d3 in a range of about 10 to 25 nm. , The first from the substrate
As a layer, the refractive index n1 'is 1.70 to 1.90, and the film thickness d1' is 60 to
A transparent oxide film having a thickness of 90 nm, and then a transparent oxide film having a refractive index n2 ′ of 1.43 to 1.47 and a thickness d2 ′ of 80 to 110 nm as a second layer on the transparent oxide film, Is a low reflection glass for touch panel substrates with a visible light reflectance of 2.0% or less.
【０００９】なお、前記において、第１層目の膜が、Ti
O2、またはTiO2もしくはTa2O5 に、SiO2、ZrO2、Al2O3
を適宜混合したものであること、第１’層目の膜が、Si
O2、TiO2、ZrO2、Al2O3 、およびTa2O5 を適宜混合調製
したものであること、第２層目および第２’層目の膜
が、SiO2、またはSiO2に、TiO2、ZrO2、Al2O3、Ta2O5
のうちの１種以上を混合したものであること、更に、第
１層および第２層の膜が、ゾルゲル法により成膜するこ
と、が好ましい。In the above, the first layer is made of Ti
O 2 , TiO 2 or Ta 2 O 5 with SiO 2 , ZrO 2 , Al 2 O 3
Are appropriately mixed, and the film of the first 'layer is made of Si
O 2 , TiO 2 , ZrO 2 , Al 2 O 3 , and Ta 2 O 5 are appropriately mixed and prepared. The second layer and the 2 ′ layer are formed of SiO 2 or SiO 2 , TiO 2 , ZrO 2 , Al 2 O 3 , Ta 2 O 5
It is preferable that at least one of the above is mixed, and that the films of the first layer and the second layer are formed by a sol-gel method.
【００１０】[0010]
【発明の実施の形態】図４は表示装置における一般的な
抵抗膜式タッチパネルの概略部分構造を示したものであ
り、液晶表示装置等の本体１の画像表示側には、ITO 等
の透明導電膜パターン２を形成した基板用ガラス３と、
スペーサー４を介し、ITO 等の透明導電膜５を形成した
薄板ガラス、樹脂等の可撓性の透明表層板６からなり、
上方から指やタッチペン等７で透明表層板６を押圧して
撓ませることにより、該表層板６の透明導電膜５と、前
記基板用ガラス３の透明導電膜パターン２が接して入力
されるものである。FIG. 4 shows a schematic partial structure of a general resistive touch panel in a display device. A transparent conductive material such as ITO is provided on an image display side of a main body 1 of a liquid crystal display device or the like. A substrate glass 3 on which a film pattern 2 is formed;
A transparent transparent surface plate 6 made of thin glass, resin or the like on which a transparent conductive film 5 such as ITO is formed via a spacer 4;
By pressing and bending the transparent surface plate 6 with a finger or a touch pen 7 from above, the transparent conductive film 5 of the surface plate 6 and the transparent conductive film pattern 2 of the glass for a substrate 3 come in contact with each other and are input. It is.
【００１１】ところで、通常タッチパネルの基板用ガラ
スに常用される透明クリアーなフロート板ガラス（主と
してソーダ石灰系ガラス：屈折率 1.5〜 1.6程度）にお
いては、ガラス厚み1mm 前後において、可視光線透過率
91％オーダー、可視光線反射率 8％オーダーである。な
お、該基板用ガラスとしては、上記ソーダ石灰系ガラス
をはじめ、アルミノ珪酸系ガラス、硼珪酸系ガラス等も
採用されるが、それらの屈折率は殆ど 1.5〜1.6 の範囲
であり、厚みは 0.2mm弱〜３mm程度のものが採用され
る。Incidentally, in the case of a transparent and clear float plate glass (mainly a soda-lime glass: a refractive index of about 1.5 to 1.6) which is usually used for a substrate glass of a touch panel, the visible light transmittance is about 1 mm in glass thickness.
It is on the order of 91% and the visible light reflectance is on the order of 8%. In addition, as the glass for the substrate, in addition to the above-mentioned soda-lime glass, aluminosilicate glass, borosilicate glass and the like are also used, but their refractive indexes are almost in the range of 1.5 to 1.6, and the thickness is 0.2. Those having a size of a little less than mm to about 3 mm are employed.
【００１２】基板用ガラスに施す透明導電膜としては、
ネサ（SnO2）膜を採用するケースもあるが、パターニン
グの容易さ、導電性、透明、透視性等の観点からITO 膜
（屈折率1.95前後）が多く使用され、その厚みは、タッ
チパネルとして好適な膜抵抗値、透視性等を勘案する
と、ほぼ10〜25nmとなる。As the transparent conductive film applied to the glass for a substrate,
In some cases, a Nesa (SnO 2 ) film is used, but an ITO film (refractive index: around 1.95) is often used from the viewpoints of ease of patterning, conductivity, transparency, transparency, etc., and its thickness is suitable for touch panels. Taking into account the film resistance, transparency, etc., it is about 10 to 25 nm.
【００１３】図２に示すように、前記厚み1.1mm のフロ
ート板ガラスをタッチパネルの基板用ガラス３として、
その上面に透明導電膜、すなわち ITO膜２（屈折率n3＝
1.95、膜厚d3＝10〜25nm）を成膜した場合は、 ITO膜面
側（図示矢印８側：以下の例においても同様である）に
おいて可視光線透過率が90％以下、また、可視光線反射
率も８％を越える等、視認性が劣り、グレアー感が強
く、基板用ガラスとしては適当とはいえない。As shown in FIG. 2, the float plate glass having a thickness of 1.1 mm is used as a substrate glass 3 for a touch panel.
A transparent conductive film, that is, an ITO film 2 (refractive index n3 =
1.95, a film thickness d3 = 10 to 25 nm), the visible light transmittance is 90% or less on the ITO film surface side (arrow 8 side in the drawing: the same applies to the following examples), and the visible light The visibility is inferior, such as a reflectance of more than 8%, the glare is strong, and it is not suitable as a glass for a substrate.
【００１４】また、図３に示すように、同様の厚み1.1m
m のフロート板ガラスをタッチパネルの基板用ガラス３
として、その両面に１層の低反射用膜９を形成したうえ
で、上面にITO 膜２（屈折率n3＝1.95、膜厚d3＝10〜25
nm）を成膜した場合は、 ITO膜や低反射用膜の表裏面に
おける多重反射において、各反射波の干渉による打消し
合いを考慮して、低反射膜２の屈折率を1.45程度、膜厚
を70nm程度としたケースにおいても、 ITO膜面側におい
て可視光線透過率が90％を若干上回る程度であり、ま
た、可視光線反射率も８％を越える等、やはり視認性が
劣り、グレアー感が強く、基板用ガラスとしては適当と
はいえない。Further, as shown in FIG.
m float glass to touch panel substrate glass 3
After forming one layer of low-reflection film 9 on both surfaces, an ITO film 2 (refractive index n3 = 1.95, film thickness d3 = 10 to 25) is formed on the upper surface.
nm), the refractive index of the low-reflection film 2 is set to about 1.45 and the refractive index of the low-reflection film 2 is set to about 1.45 in consideration of cancellation by interference of each reflected wave in the multiple reflection on the front and back surfaces of the ITO film and the low reflection film. Even in the case of a thickness of about 70 nm, the visible light transmittance slightly exceeds 90% on the ITO film side, and the visible light reflectance exceeds 8%. It is not suitable as glass for substrates.
【００１５】それらに対し本発明は、図１に示すよう
に、タッチパネル用の基板ガラス３の上面側に、第１層
９、第２層10からなる低反射用積層膜、裏面側に、第
１’層９’、第２’層10’からなる低反射用積層膜を形
成し、更に第２層10の上に透明導電膜を形成するもの
で、低反射用積層膜は、第１層９および第１’層９’相
互の屈折率および／または膜厚を、第２層10および第
２’層10’相互の屈折率および／または膜厚を変えるこ
とにより、透明導電膜面側の可視光線反射率を２％以下
に抑えることができ、透視性の向上、グレアー感の低減
に著しい効果を発現するものである。On the other hand, in the present invention, as shown in FIG. 1, a low-reflection laminated film composed of a first layer 9 and a second layer 10 is provided on the upper surface of a substrate glass 3 for a touch panel, A low-reflection laminated film composed of a 1 ′ layer 9 ′ and a second ′ layer 10 ′ is formed, and a transparent conductive film is further formed on the second layer 10. The low-reflection laminated film is formed of the first layer By changing the refractive index and / or the film thickness of the second layer 10 and the second 'layer 10', the refractive index and / or the film thickness of the second layer 10 'can be changed. The visible light reflectance can be suppressed to 2% or less, and a remarkable effect is exhibited in improving the transparency and reducing the glare.
【００１６】本発明における一つの態様として、基板
（上面）から第１層目として、屈折率n1が2.05〜2.25、
膜厚d1が20〜50nmの透明酸化物膜、次いでその上の第２
層目として屈折率n2が1.43〜1.47、膜厚d2が60〜90nmの
透明酸化物膜を成膜したのに対し、別の態様として、基
板（上面）から第１層目として、屈折率n1が前記態様同
様の2.05〜2.25ではあるが、膜厚d1を80〜 110nmの透明
酸化物膜とし、その上の第２層目として、屈折率n2が前
記態様同様の1.43〜1.47ではあるが、膜厚d2を15〜50nm
の透明酸化物膜としたのは、いずれのケースにおいても
第１層目と第２層目の膜における反射光が、その上の透
明導電膜の反射光とも相互に干渉し合って可視光線反射
率を大幅に低減できるためである。In one embodiment of the present invention, as a first layer from the substrate (upper surface), the refractive index n1 is 2.05 to 2.25,
A transparent oxide film having a thickness d1 of 20 to 50 nm, and then a second
While a transparent oxide film having a refractive index n2 of 1.43 to 1.47 and a film thickness d2 of 60 to 90 nm was formed as a layer, as another mode, the refractive index n1 was formed as a first layer from the substrate (upper surface). Although the same as the above embodiment is 2.05 to 2.25, the thickness d1 is a transparent oxide film of 80 to 110 nm, and as a second layer thereon, the refractive index n2 is 1.43 to 1.47 as in the above embodiment, Thickness d2 15 ~ 50nm
In any case, the reflected light from the first and second layers of the film intersects with the reflected light from the transparent conductive film on the transparent oxide film so that visible light is reflected. This is because the rate can be significantly reduced.
【００１７】なお、成膜手段は物理的蒸着（ＰＶＤ）
法、化学的気層成長（ＣＶＤ）法、塗布液をスプレイ、
ディッピング、ローラーコート、フローコート、スピン
コート等により塗布し、加熱硬化する方法、前記塗布液
として有機金属塩の溶液を用いる方法等、随意である
が、膜厚コントロールが容易で、付着強度の高い積層膜
を得るうえで好適な手段としては、金属アルコキシドや
金属βジケトナート等を出発原料とし、それらをゾル化
した溶液を用い、基板に塗布後、加熱焼成して膜形成す
るいわゆるゾルゲル法を採用し、かつ前記塗布手段とし
てディッピングによる方法が推奨できる。The film forming means is physical vapor deposition (PVD).
Method, chemical vapor deposition (CVD) method, spray coating solution,
Coating by dipping, roller coating, flow coating, spin coating, and the like, and a method of curing by heating, a method of using a solution of an organic metal salt as the coating liquid, and the like are optional, but the film thickness can be easily controlled and the adhesion strength is high. As a preferable means for obtaining a laminated film, a so-called sol-gel method is used in which a metal alkoxide, a metal β-diketonate, or the like is used as a starting material, a sol-ized solution thereof is applied to a substrate, and then heated and fired to form a film. A dipping method can be recommended as the coating means.
【００１８】以下実施例により具体的に説明する。Hereinafter, the present invention will be described in detail with reference to examples.
【００１９】[0019]
【実施例】実施例１ タッチパネルの基板用ガラスとして、サイズ 300mm× 4
00mm、厚み 1.1mmのフロート法製板によるところのソー
ダ石灰系ガラス（屈折率1.52）を準備し、その両面をセ
リアで研磨し、水濯ぎし、さらにイソプロピルアルコー
ルを浸した布で払拭した。これを温度25℃、湿度50％に
保ったクリーンルーム内において、ゾルゲル−ディッピ
ング法により基板ガラスの上面側に低反射用第１層、第
２層の膜を形成し、更にその裏面に低反射用第１’層、
第２’層の膜を形成した。更に、前述した第１、２層上
に、CVD 法によりITO 膜を形成した。 Example 1 Example 1 As a glass for a substrate of a touch panel, a size of 300 mm × 4
A soda-lime glass (refractive index: 1.52) prepared by a float plate made of 00 mm and having a thickness of 1.1 mm was prepared, and both surfaces thereof were polished with ceria, rinsed with water, and further wiped with a cloth soaked with isopropyl alcohol. In a clean room maintained at a temperature of 25 ° C. and a humidity of 50%, first and second low-reflection films are formed on the upper surface side of the substrate glass by a sol-gel dipping method, and further, a low-reflection film is formed on the back surface. 1st layer,
A film of the second 'layer was formed. Further, an ITO film was formed on the first and second layers by the CVD method.
【００２０】第１層用の膜形成原料として、イソプロピ
ルチタナートをイソプロピルアルコールで希釈した溶液
に、微量の酸触媒と水を加えて撹拌し、更に酸化物換算
の溶質濃度が約0.35wt％になるように更にイソプロピル
アルコールを加えて調製し、チタニアのゾル溶液を得
た。この溶液の粘度は約2.5mPa・s であった。また、前
記ガラス基板の裏面をマスキングテープで覆い裏面に塗
布液が付着しないようにし、前記溶液を入れた槽内にこ
のガラス基板を浸漬し、速度約 0.9mm／s で引上げて焼
成後の厚みが所望厚みになるようにし、成膜後にマスキ
ングテープを剥がし、ガラス基板上面のみに塗布液を膜
付けした。更にこれを 270℃で15分間加熱して、チタニ
アゲル膜を形成した。As a film forming raw material for the first layer, a small amount of an acid catalyst and water are added to a solution obtained by diluting isopropyl titanate with isopropyl alcohol, and the mixture is stirred, and the solute concentration in terms of oxide is reduced to about 0.35 wt%. It was further prepared by adding isopropyl alcohol to obtain a sol solution of titania. The viscosity of this solution was about 2.5 mPa · s. Further, the back surface of the glass substrate is covered with a masking tape so that the coating liquid does not adhere to the back surface, the glass substrate is immersed in a bath containing the solution, pulled up at a rate of about 0.9 mm / s, and fired to a thickness after firing. Was formed to have a desired thickness, the masking tape was peeled off after the film formation, and the coating liquid was applied only on the upper surface of the glass substrate. This was further heated at 270 ° C. for 15 minutes to form a titania gel film.
【００２１】第２層用の膜形成原料として、テトラエト
キシシランをイソプロピルアルコールで希釈した溶液に
微量の酸触媒と水を加えて撹拌し、さらに溶質濃度約0.
30wt％になるようにイソプロピルアルコールを加えて調
製しシリカのゾル溶液を得た。この溶液の粘度は約2.4m
Pa・s であった。この溶液を入れた槽内に、同様に裏面
にマスキングした前記第１層膜形成ガラス基板を浸漬
し、約 4.4mm／s の速度で引上げて焼成後の膜厚が所望
厚みになるようにして第１層膜付ガラス基板上に塗布液
を膜付けした後、マスキングをはがし、約 270℃で15分
間加熱してガラス上面のチタニアゲル膜上にシリカゲル
膜を形成した。As a material for forming a film for the second layer, a small amount of an acid catalyst and water are added to a solution obtained by diluting tetraethoxysilane with isopropyl alcohol, and the mixture is stirred.
Isopropyl alcohol was added to adjust to 30 wt% to obtain a silica sol solution. The viscosity of this solution is about 2.4m
Pa · s. The above-mentioned glass substrate on which the first layer film is formed is similarly immersed in the bath containing the solution and pulled up at a speed of about 4.4 mm / s so that the film thickness after firing becomes the desired thickness. After coating the coating solution on the glass substrate with the first layer film, the masking was removed and heated at about 270 ° C. for 15 minutes to form a silica gel film on the titania gel film on the glass upper surface.
【００２２】ついで、第１’層用の膜形成原料として、
テトラエトキシシランをイソプロピルアルコールで希釈
した溶液に、微量の酸触媒と水を加えて撹拌し、別にイ
ソプロピルチタナートをイソプロピルアルコールで希釈
した溶液に、微量の酸触媒と水を加えて撹拌し、さらに
これら両溶液を、酸化物に換算したモル比が50：50にな
るように混合し、酸化物換算の溶質濃度が約0.42wt％に
なるように更にイソプロピルアルコールを加えて調製
し、シリカ・チタニアのゾル溶液を得た。この溶液の粘
度は約2.5mPa・s であった。前記上面にゲル膜を積層し
たガラス基板の成膜面にマスキングし、この溶液を入れ
た槽内にこのマスキングしたガラス基板を浸漬し、速度
約 3.9mm／s で引上げて焼成後の厚みが所望厚みになる
ようにして、その後マスキングテープを剥がし、更にこ
れを 270℃で15分間加熱して、前記ゲル膜を積層したガ
ラス基板の反対面である裏面にシリカ・チタニアゲル膜
を形成した。Next, as a film forming raw material for the first 'layer,
To a solution of tetraethoxysilane diluted with isopropyl alcohol, a small amount of an acid catalyst and water are added and stirred, and separately to a solution of isopropyl titanate diluted with isopropyl alcohol, a small amount of an acid catalyst and water are added and stirred. These two solutions are mixed so that the molar ratio in terms of oxide becomes 50:50, and isopropyl alcohol is further added so that the solute concentration in terms of oxide becomes about 0.42% by weight. Was obtained. The viscosity of this solution was about 2.5 mPa · s. Masking the film-forming surface of the glass substrate having the gel film laminated on the upper surface, immersing the masked glass substrate in a bath containing the solution, and pulling up at a speed of about 3.9 mm / s to obtain a desired thickness after firing. Then, the masking tape was peeled off and heated at 270 ° C. for 15 minutes to form a silica-titania gel film on the back surface opposite to the glass substrate on which the gel film was laminated.
【００２３】更に、同様にゲル膜を第１、２層を成膜し
たガラス面にマスキングし、前記第２層用の溶液を入れ
た槽内に、このガラス基板を浸漬し、約 3.9mm／s の速
度で引上げて第１’層膜付ガラス基板に塗布液を膜付け
した後、マスキングを剥がし、約 270℃で15分間加熱し
てシリカ・チタニアゲル膜上にシリカゲル膜を形成し
た。Further, similarly, a gel film is masked on the glass surface on which the first and second layers have been formed, and the glass substrate is immersed in a tank containing the solution for the second layer, and is then about 3.9 mm / The coating solution was applied to the glass substrate with the first 'layer film by pulling up at a speed of s, the masking was peeled off, and heated at about 270 ° C. for 15 minutes to form a silica gel film on the silica / titania gel film.
【００２４】さらに該ガラス基板を 470℃で30分加熱焼
成して、ガラスの上面に第１層のチタニア膜、第２層の
シリカ膜からなる低反射膜を、また、その裏面に第１’
層のチタニア・シリカ膜、第２’層のシリカ膜からなる
低反射膜を完成した。Further, the glass substrate is heated and baked at 470 ° C. for 30 minutes to form a first layer of a titania film and a second layer of a low-reflection film made of a silica film on the upper surface of the glass, and a first ′ film on the back surface thereof.
A low-reflection film composed of a layer of titania-silica and a layer 2 'of silica was completed.
【００２５】このゲル膜を成膜したガラス基板の第２層
目上に、インジウム塩、錫塩をエアロゾル化したものを
導き、約 500℃で熱分解させ、いわゆるCVD −パイロゾ
ル法によるITO 膜を形成し、タッチパネルの基板用低反
射ガラスを完成した。On the second layer of the glass substrate on which the gel film has been formed, an aerosolized indium salt or tin salt is led, and thermally decomposed at about 500 ° C. to form an ITO film by a so-called CVD-pyrosol method. The low reflection glass for the substrate of the touch panel was completed.
【００２６】なお該低反射ガラスの上面は、第１層膜と
して屈折率n1が2.15、膜厚d1が30nmのTiO2膜、第２層膜
として屈折率n2が1.45、膜厚d2が75nmのSiO2膜、更に透
明導電膜として屈折率n3が1.95、膜厚d3が19nmのITO 膜
からなる。また、低反射ガラスの裏面は、第１’層膜と
して屈折率n1'が1.79、膜厚d1'が77nmのSiO2・TiO2膜、
第２層膜として屈折率n2'が1.45、膜厚d2'が95nmのSiO2
膜からなる。The upper surface of the low-reflection glass is a TiO 2 film having a refractive index n1 of 2.15 and a film thickness d1 of 30 nm as a first layer film, and a refractive index n2 of 1.45 and a film thickness d2 of 75 nm as a second layer film. It is composed of an SiO 2 film and an ITO film having a refractive index n3 of 1.95 and a thickness d3 of 19 nm as a transparent conductive film. On the back surface of the low reflection glass, a SiO 2 TiO 2 film having a refractive index n1 ′ of 1.79 and a thickness d1 ′ of 77 nm as a first layer film,
SiO 2 having a refractive index n2 ′ of 1.45 and a thickness d2 ′ of 95 nm as a second layer film
Consists of a membrane.
【００２７】該タッチパネルの基板用低反射ガラスは、
垂直入射での可視光線透過率98.4％、可視光線反射率
1.1％であり、 単にガラス板に直接19nmのITO 膜を成膜
した場合に比べ可視光線反射率を約10％低減でき、また
可視光線透過率も約10％向上でき、格段に視認性がよく
グレアー感が抑えられたものであった。The low reflection glass for the substrate of the touch panel is as follows:
98.4% visible light transmittance at normal incidence, visible light reflectance
1.1%, visible light reflectance can be reduced by about 10% and visible light transmittance can be improved by about 10% compared to a 19-nm ITO film formed directly on a glass plate. The glare was suppressed.
【００２８】実施例２ 実施例１同様のフロート法製板のガラス板を、実施例１
同様に清浄にし、また、裏面にマスキングした。 Example 2 A glass plate manufactured by the same float method as in Example 1 was used.
Similarly, it was cleaned and the backside was masked.
【００２９】第１層の膜形成原料としてタンタルエトキ
シドをイソプロピルアルコールで希釈し、酸触媒、水等
を加えた。更にシリコンエトキシドをイソプロピルアル
コールで希釈し、同様に酸触媒、水等を加えた溶液に
し、先に調合したタンタルエトキシド溶液を混ぜ、タン
タルとシリコンを酸化物換算のモル比で85：15に混合
し、更にイソプロピルアルコールを加えて溶質濃度を0.
40wt％に調製して酸化タンタル、シリカのゾル溶液を得
た。この溶液の粘度は約2.8mPa・s であった。この溶液
の入った槽内に前記ガラス基板を浸漬し、約 4.2mm／s
の速度で引上げた後、マスキングをはがし、その後約 3
00℃で10分間加熱し、ガラス上面に第１層目の酸化タン
タル−シリカ複合ゲル膜を形成した。Tantalum ethoxide as a film forming material for the first layer was diluted with isopropyl alcohol, and an acid catalyst, water and the like were added. Further, silicon ethoxide is diluted with isopropyl alcohol, and a solution containing an acid catalyst, water, and the like is similarly added. The tantalum ethoxide solution prepared above is mixed, and tantalum and silicon are brought to a molar ratio of 85:15 in terms of oxide. Mix and add isopropyl alcohol to reduce solute concentration to 0.
It was adjusted to 40 wt% to obtain a sol solution of tantalum oxide and silica. The viscosity of this solution was about 2.8 mPa · s. The glass substrate is immersed in a bath containing this solution, and
Remove the masking after pulling up at the speed of
After heating at 00 ° C. for 10 minutes, a first layer of a tantalum oxide-silica composite gel film was formed on the upper surface of the glass.
【００３０】次に実施例１の２層目に使用したシリカゾ
ル溶液中に、再び裏面をマスキングした前記１層膜付き
ガラス基板を浸漬し、約 0.9mm／s の速度で引上げた
後、マスキングを剥がし、約 300℃で10分間加熱して酸
化タンタル−シリカ複合ゲル膜上にシリカゲル膜を形成
した。Next, the glass substrate with the single-layer film whose back surface was masked was immersed again in the silica sol solution used for the second layer of Example 1, and pulled up at a speed of about 0.9 mm / s. It was peeled off and heated at about 300 ° C. for 10 minutes to form a silica gel film on the tantalum oxide-silica composite gel film.
【００３１】次に、イソプロピルアルコールにジルコニ
ウムテトラエトキシドを溶解して酸触媒、水等を加え調
整したものに、同様に調整したシリコンエトキシドのイ
ソプロピルアルコール溶液を加え、金属成分のモル比で
80：20に混合し、更に溶質濃度を0.30wt％に調整し、ジ
ルコニア・シリカのゾル溶液を得た。この溶液の粘度は
約3.0mPa・s であり、第１’層目の液とした。先に成膜
したガラス基板のゲル膜成膜面をマスキングし、この第
１’層目の溶液の入った槽内に前記ガラス基板を浸漬
し、約 4.0mm／s の速度で引上げた後、約 300℃で10分
間加熱し、ガラス裏面に第１’層目のジルコニア・シリ
カ複合ゲル膜を形成した。Next, to a solution prepared by dissolving zirconium tetraethoxide in isopropyl alcohol and adding an acid catalyst, water and the like, a similarly prepared solution of silicon ethoxide in isopropyl alcohol was added, and the molar ratio of the metal component was changed.
The mixture was mixed at 80:20 and the solute concentration was further adjusted to 0.30 wt% to obtain a zirconia-silica sol solution. This solution had a viscosity of about 3.0 mPa · s and was used as the liquid of the first layer. After masking the gel film formation surface of the glass substrate formed previously, the glass substrate is immersed in a bath containing the solution of the first 'layer, pulled up at a speed of about 4.0 mm / s, By heating at about 300 ° C. for 10 minutes, a zirconia-silica composite gel film of the first layer was formed on the back surface of the glass.
【００３２】また、同様にゲル膜を２層積層した基板の
上面にマスキングし、実施例１と同条件で第２’層膜を
成膜、加熱した。Similarly, a mask was formed on the upper surface of the substrate on which two gel films were laminated, and a second film was formed and heated under the same conditions as in Example 1.
【００３３】更に該ガラス基板を 470℃で30分加熱焼成
して、ガラスの上面に第１層の酸化タンタル（85モル
％）・シリカ（15モル％）複合膜、第２層のシリカ膜か
らなり、また、その裏面に第１’層としてジルコニア・
シリカ膜を、第２’層としてシリカ膜からなる低反射膜
を完成した。Further, the glass substrate is heated and fired at 470 ° C. for 30 minutes to form a first layer of tantalum oxide (85 mol%)-silica (15 mol%) composite film and a second layer of silica film on the upper surface of the glass. Zirconia on the back surface as the first layer.
A low-reflection film made of a silica film was completed using the silica film as a second 'layer.
【００３４】この２層膜付けガラス基板の第１、２層膜
上に、実施例１同様に CVD法によるITO 膜を形成し、タ
ッチパネルの基板用低反射ガラスを完成した。An ITO film was formed on the first and second layers of the glass substrate provided with a two-layer film by the CVD method in the same manner as in Example 1 to complete a low reflection glass for a substrate of a touch panel.
【００３５】なお該低反射ガラスは、第１層膜として屈
折率n1が2.15、膜厚d1が 95nmのTa2O5・SiO2膜、第２層
膜として屈折率n2が1.45、膜厚d2が35nmのSiO2膜、更に
上面の透明導電膜として屈折率n3が1.95、膜厚d3が19nm
のITO 膜からなる。また、低反射ガラスの裏面は、第
１’層膜として屈折率n1'が1.79、膜厚d1'が77nmのZrO2
・TiO2膜、第２層膜として屈折率n2'が1.45、膜厚d2'が
95nmのSiO2膜からなる。[0035] Incidentally low reflection glass has a refractive index n1 is 2.15 as the first layer film, the film thickness d1 is 95nm Ta 2 O 5 · SiO 2 film, the refractive index n2 as a second layer film is 1.45, the thickness d2 Is a 35 nm SiO 2 film, the refractive index n3 as a transparent conductive film on the upper surface is 1.95, the film thickness d3 is 19 nm
Consisting of ITO film. The back surface of the low-reflection glass is made of ZrO 2 having a refractive index n1 ′ of 1.79 and a thickness d1 ′ of 77 nm as a first layer film.
-The refractive index n2 'is 1.45 and the film thickness d2' is TiO 2 film and second layer film.
It consists of a 95 nm SiO 2 film.
【００３６】該タッチパネルの基板用低反射ガラスは、
垂直入射での可視光線透過率98.2％、可視光線反射率
1.3％であり、単にガラス板に直接19nmのITO 膜を成膜
した場合に比べ可視光線反射率を 約9.5％低減でき、ま
た可視光線透過率も 約9.5％向上でき、視認性がよくグ
レアー感が抑えられたものであった。The low reflection glass for the substrate of the touch panel is as follows:
98.2% visible light transmittance at normal incidence, visible light reflectance
1.3%, the visible light reflectance can be reduced by about 9.5% and the visible light transmittance can be improved by about 9.5%, compared to a case where a 19nm ITO film is simply formed directly on a glass plate. Was suppressed.
【００３７】比較例１ 実施例１同様のガラス基板に、低反射用積層膜を形成す
ることなく、直接基板上面に実施例１同様の CVD法によ
り ITO膜を19nm厚で成膜し、タッチパネルの基板用ガラ
スを形成した。（図２参照） Comparative Example 1 An ITO film having a thickness of 19 nm was formed directly on the upper surface of a glass substrate by the same CVD method as in Example 1 without forming a low-reflection laminated film on the same glass substrate as in Example 1. A glass for a substrate was formed. (See Fig. 2)
【００３８】このガラスの垂直入射での可視光線反射率
は 10.7％、可視光線透過率は 88.7％であった。これを
タッチパネルとして表示装置に組込んだところ、周囲の
背景が反射映像として写し出され、またグレアー感があ
ってきわめて画面が見辛く、違和感、疲労感をもよおす
ものであり、タッチパネル用としては不適当であった。The visible light reflectance of this glass at normal incidence was 10.7%, and the visible light transmittance was 88.7%. When this is incorporated into a display device as a touch panel, the surrounding background is reflected as a reflected image, and the screen is very hard to see with glare, making it uncomfortable and tired, making it unsuitable for touch panels. Met.
【００３９】比較例２ 実施例１同様のガラス基板を準備した。第１層および第
１’層用の膜形成原料として、イソプロピルチタナート
とエチルシリケートを、酸化物換算のモル比で50：50で
混合し、イソプロピルアルコール溶媒下溶質濃度が0.42
wt％になるように調製し、チタニア−シリカ複合ゾル溶
液を得た。 Comparative Example 2 A glass substrate similar to that of Example 1 was prepared. As film forming raw materials for the first layer and the first 'layer, isopropyl titanate and ethyl silicate were mixed at a molar ratio of 50:50 in terms of oxide, and the solute concentration was 0.42 in an isopropyl alcohol solvent.
It was adjusted to be wt% to obtain a titania-silica composite sol solution.
【００４０】この溶液の入った槽に、前記ガラス基板の
片面をマスキングすることなく、該ガラス基板を浸漬
し、約 3.9mm／s の速度で引上げた後、約 270℃で15分
間加熱し、ガラス両面に第１層および第１’層目のチタ
ニア−シリカ複合ゲル膜を形成した。The glass substrate was immersed in a bath containing the solution without masking one side of the glass substrate, pulled up at a speed of about 3.9 mm / s, and then heated at about 270 ° C. for 15 minutes. The first layer and the 1'th layer of the titania-silica composite gel film were formed on both surfaces of the glass.
【００４１】第２層および第２’層用の膜形成原料とし
ての、実施例１同様のシリカゾル溶液（但し溶質濃度0.
40wt％）を調製し、該溶液の入った槽内に、前記第１、
第１’層膜形成ガラス基板をそのまま浸漬し、約 3.9mm
／s の速度で引上げた後、約270℃で15分間加熱してチ
タニア−シリカ複合ゲル膜上にシリカゲル膜を形成し
た。The same silica sol solution as in Example 1 (however, the solute concentration was 0.1%) was used as a film forming material for the second layer and the 2 ′ layer.
40 wt%), and the first and the second were placed in a tank containing the solution.
Immerse the glass substrate with the 1 'layer film as it is, and
After pulling up at a rate of / s, the mixture was heated at about 270 ° C. for 15 minutes to form a silica gel film on the titania-silica composite gel film.
【００４２】更に該ガラス基板を 470℃で30分加熱し
て、ガラスの両面に第１、第１’層のチタニア・シリカ
複合膜、第２、第２’層のシリカ膜からなる２層膜を形
成した。Further, the glass substrate is heated at 470 ° C. for 30 minutes to form a two-layer film comprising a titania-silica composite film of the first and first 'layers and a silica film of the second and second' layers on both surfaces of the glass. Was formed.
【００４３】該２層膜付けガラスは、第１、第１’層膜
として屈折率n1が1.79、膜厚d1が77nmのSiO2・TiO2膜、
第２、第２’層膜として屈折率n2が1.45、膜厚d2が95nm
のSiO2膜からなり、可視光線反射率は 0.8％ときわめて
低反射性に富んだものであった。The glass with a two-layer film is a SiO2.TiO2 film having a refractive index n1 of 1.79 and a thickness d1 of 77 nm as the first and first 'layer films,
The second and second 'layers have a refractive index n2 of 1.45 and a thickness d2 of 95 nm.
And a very low reflectivity of 0.8% for visible light.
【００４４】この２層膜付けガラス基板の上面上に、実
施例１同様に、CVD 法によるITO 膜を形成し、タッチパ
ネル用基板ガラスを完成した。An ITO film was formed on the upper surface of the glass substrate provided with a two-layer film by the CVD method in the same manner as in Example 1 to complete a substrate glass for a touch panel.
【００４５】ところが該ガラスは、可視光線反射率が
8.1％と未成膜のガラス同様に高く、タッチパネル用と
しては不適当であった。However, the glass has a visible light reflectance.
It was 8.1%, which is as high as unformed glass, and was unsuitable for touch panels.
【００４６】比較例３ 実施例１同様のガラス基板を準備した。実施例１同様の
２層目のシリカゾル溶液に、ガラス基板を片面をマスキ
ングすることなく、そのまま浸漬し、4.0mm/sの速度で
引上げて膜付けし、270℃で15分加熱してシリカゲル膜
形成後、更に480℃で30分熱処理してガラス基板両面に
シリカ膜を得た。（図３参照） Comparative Example 3 A glass substrate similar to that of Example 1 was prepared. A glass substrate was immersed in the same second-layer silica sol solution as in Example 1 without masking one surface, and pulled up at a speed of 4.0 mm / s to form a film, and heated at 270 ° C. for 15 minutes to form a silica gel film. After formation, heat treatment was further performed at 480 ° C. for 30 minutes to obtain silica films on both surfaces of the glass substrate. (See Fig. 3)
【００４７】この両面シリカ膜付きガラスの上面に、実
施例１と同様に CVD法で ITO膜を形成した。その結果、
ガラス板両面に屈折率1.45、膜厚70nmのシリカ膜を、更
に上面に屈折率1.95、膜厚19nmのITO 膜を形成したタッ
チパネルの基板用ガラスを完成した。An ITO film was formed on the upper surface of the glass with the silica film on both sides by the CVD method in the same manner as in Example 1. as a result,
A glass for a touch panel substrate was completed in which a silica film having a refractive index of 1.45 and a film thickness of 70 nm was formed on both sides of a glass plate and an ITO film having a refractive index of 1.95 and a film thickness of 19 nm was formed on the upper surface.
【００４８】該成膜したタッチパネルの基板用ガラス
は、可視光線透過率91.3％、可視光線反射率 8.2％であ
り、各実施例のタッチパネルの基板用ガラスに比べて反
射率がきわめて高く、また、透過光の主波長は 570nmと
黄色であり、タッチパネル用としては好ましくないもの
であった。The glass for a substrate of the touch panel on which the film was formed had a visible light transmittance of 91.3% and a visible light reflectance of 8.2%, which were extremely higher than those of the glass for a touch panel substrate of each embodiment. The main wavelength of transmitted light was 570 nm, which was yellow, which was not preferable for touch panels.
【００４９】[0049]
【発明の効果】本発明のタッチパネルの基板用低反射ガ
ラスは、ガラス基板に特定屈折率、膜厚の透明酸化物か
らなる複層膜を形成し、それにより光反射を低減し、グ
レアー感を解消し、透視性を増大することができるとい
う効果を奏するものである。The low-reflection glass for a substrate of a touch panel according to the present invention is formed by forming a multilayer film made of a transparent oxide having a specific refractive index and film thickness on a glass substrate, thereby reducing light reflection and giving a glare feeling. Thus, there is an effect that the transparency can be increased.
【図１】本発明の、ガラス基板の上面、裏面夫々に低反
射用の２層膜を積層し、更に上面側に透明導電膜を形成
したタッチパネルの基板用低反射ガラスを示す断面図で
ある。FIG. 1 is a cross-sectional view showing a low-reflection glass for a touch panel substrate according to the present invention, in which a two-layer film for low reflection is laminated on each of an upper surface and a rear surface of a glass substrate, and a transparent conductive film is further formed on the upper surface side. .
【図２】比較例の、ガラス基板の上面に直接透明導電膜
を形成したタッチパネルの基板用ガラスを示す断面図で
ある。FIG. 2 is a cross-sectional view showing a glass for a touch panel substrate of a comparative example in which a transparent conductive film is directly formed on the upper surface of a glass substrate.
【図３】比較例の、ガラス基板の上面、裏面夫々に低反
射用の膜を膜付けし、更に上面側に透明導電膜を形成し
たタッチパネルの基板用射ガラスを示す断面図である。FIG. 3 is a cross-sectional view of a glass substrate for a touch panel according to a comparative example, in which a film for low reflection is formed on each of the upper and lower surfaces of a glass substrate, and a transparent conductive film is formed on the upper surface side.
【図４】表示装置における一般的な抵抗膜式タッチパネ
ルの概略部分構造を示した断面図である。FIG. 4 is a sectional view showing a schematic partial structure of a general resistive touch panel in a display device.
２ 透明導電膜 ３ 基板用ガラス ９ 第１層の膜 ９’ 第１’層の膜 10 第２層の膜 10’ 第２’層の膜 Reference Signs List 2 transparent conductive film 3 substrate glass 9 first layer film 9 'first' layer film 10 second layer film 10 'second' film
Claims (2)
側の表面に、基板から第１層目として、屈折率n1が2.05
〜2.25、膜厚d1が20〜50nmの透明酸化物膜、次いでその
上の第２層目として屈折率n2が1.43〜1.47、膜厚d2が60
〜90nmの透明酸化物膜を成膜し、更に透明導電膜を膜厚
d3が約10〜25nmの範囲で膜形成し、一方、透明ガラス基
板の裏面に、基板から第１' 層目として、屈折率n1' が
1.70〜1.90、膜厚d1' が60〜90nmの透明酸化物膜、次い
でその上の第２' 層目として屈折率n2' が1.43〜1.47、
膜厚d2' が80〜 110nmの透明酸化物膜を成膜し、前記透
明導電膜面側の可視光線反射率を 2.0％以下としたこと
を特徴とするタッチパネルの基板用低反射ガラス。1. A transparent glass substrate having a refractive index n1 of 2.05 as a first layer from a surface of a touch panel on a surface layer side of a touch panel.
~ 2.25, a transparent oxide film having a thickness d1 of 20 to 50 nm, and then a second layer having a refractive index n2 of 1.43 to 1.47 and a thickness d2 of 60
A transparent oxide film of ~ 90 nm is formed, and the thickness of the transparent conductive film is further increased.
A film is formed with d3 in the range of about 10 to 25 nm. On the other hand, on the back surface of the transparent glass substrate, the refractive index n1 'is defined as the first layer from the substrate.
1.70 to 1.90, a transparent oxide film having a thickness d1 ′ of 60 to 90 nm, and then a second layer having a refractive index n2 ′ of 1.43 to 1.47,
A low-reflection glass for a touch panel substrate, wherein a transparent oxide film having a thickness d2 'of 80 to 110 nm is formed, and the visible light reflectance on the transparent conductive film surface side is 2.0% or less.
側の表面に、基板から第１層目として、屈折率n1が2.05
〜2.25、膜厚d1が80〜 110nmの透明酸化物膜、次いでそ
の上の第２層目として屈折率n2が1.43〜1.47、膜厚d2が
15〜50nmの透明酸化物膜を成膜し、更に透明導電膜を膜
厚d3が約10〜25nmの範囲で膜形成し、一方、透明ガラス
基板の裏面に、基板から第１' 層目として、屈折率n1'
が1.70〜1.90、膜厚d1' が60〜90nmの透明酸化物膜、次
いでその上の第２' 層目として屈折率n2' が1.43〜1.4
7、膜厚d2' が80〜 110nmの透明酸化物膜を成膜し、前
記透明導電膜面側の可視光線反射率を 2.0％以下とした
ことを特徴とするタッチパネルの基板用低反射ガラス。2. The transparent glass substrate has a refractive index n1 of 2.05 as a first layer on the surface of the touch panel on the surface layer side of the touch panel.
~ 2,25, a transparent oxide film having a thickness d1 of 80 to 110 nm, and then a second layer having a refractive index n2 of 1.43 to 1.47 and a thickness d2 of
A transparent oxide film having a thickness of 15 to 50 nm is formed, and a transparent conductive film is further formed with a film thickness d3 in a range of about 10 to 25 nm. On the other hand, on the back surface of the transparent glass substrate, as a first 'layer from the substrate. , Refractive index n1 '
Is 1.70 to 1.90, the film thickness d1 'is a transparent oxide film having a thickness of 60 to 90 nm, and the second layer thereon has a refractive index n2' of 1.43 to 1.4.
7. A low-reflection glass for a touch panel substrate, wherein a transparent oxide film having a thickness d2 'of 80 to 110 nm is formed and the visible light reflectance on the transparent conductive film surface side is 2.0% or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24552797A JPH1185396A (en) | 1997-09-10 | 1997-09-10 | Low reflection glass for substrate of touch panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24552797A JPH1185396A (en) | 1997-09-10 | 1997-09-10 | Low reflection glass for substrate of touch panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1185396A true JPH1185396A (en) | 1999-03-30 |
Family
ID=17135021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24552797A Pending JPH1185396A (en) | 1997-09-10 | 1997-09-10 | Low reflection glass for substrate of touch panel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1185396A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000070550A1 (en) * | 1999-05-13 | 2000-11-23 | Nissha Printing Co., Ltd. | Low reflection touch panel |
| JP2002307594A (en) * | 2001-04-17 | 2002-10-23 | Nof Corp | Transmissive hue correction material and use thereof |
| JP2006330883A (en) * | 2005-05-24 | 2006-12-07 | Gunze Ltd | Haze adjusting film and touch panel using it |
| JP2012132048A (en) * | 2010-12-20 | 2012-07-12 | Sharp Corp | Substrate with transparent conductive film |
| JP2013507682A (en) * | 2009-10-08 | 2013-03-04 | エルジー イノテック カンパニー リミテッド | Plate member for touch panel and manufacturing method thereof |
| JP2013507683A (en) * | 2009-10-08 | 2013-03-04 | エルジー イノテック カンパニー リミテッド | Plate member for touch panel, manufacturing method thereof, and touch panel |
| CN103472955A (en) * | 2013-09-27 | 2013-12-25 | 苏州胜利光学玻璃有限公司 | Anti-reflection touch screen |
| CN104271345A (en) * | 2012-05-21 | 2015-01-07 | 东丽株式会社 | Substrate and touch panel member using same |
-
1997
- 1997-09-10 JP JP24552797A patent/JPH1185396A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000070550A1 (en) * | 1999-05-13 | 2000-11-23 | Nissha Printing Co., Ltd. | Low reflection touch panel |
| JP2002307594A (en) * | 2001-04-17 | 2002-10-23 | Nof Corp | Transmissive hue correction material and use thereof |
| JP2006330883A (en) * | 2005-05-24 | 2006-12-07 | Gunze Ltd | Haze adjusting film and touch panel using it |
| JP2013507682A (en) * | 2009-10-08 | 2013-03-04 | エルジー イノテック カンパニー リミテッド | Plate member for touch panel and manufacturing method thereof |
| JP2013507683A (en) * | 2009-10-08 | 2013-03-04 | エルジー イノテック カンパニー リミテッド | Plate member for touch panel, manufacturing method thereof, and touch panel |
| US9760191B2 (en) | 2009-10-08 | 2017-09-12 | Lg Innotek Co., Ltd. | Plate member for touch panel and method of manufacturing the same, and touch panel |
| JP2012132048A (en) * | 2010-12-20 | 2012-07-12 | Sharp Corp | Substrate with transparent conductive film |
| CN104271345A (en) * | 2012-05-21 | 2015-01-07 | 东丽株式会社 | Substrate and touch panel member using same |
| CN103472955A (en) * | 2013-09-27 | 2013-12-25 | 苏州胜利光学玻璃有限公司 | Anti-reflection touch screen |
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