JPH11337700A - Electron beam irradiator - Google Patents
Electron beam irradiatorInfo
- Publication number
- JPH11337700A JPH11337700A JP14287398A JP14287398A JPH11337700A JP H11337700 A JPH11337700 A JP H11337700A JP 14287398 A JP14287398 A JP 14287398A JP 14287398 A JP14287398 A JP 14287398A JP H11337700 A JPH11337700 A JP H11337700A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- vibration
- conveyor
- cooling water
- granular material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は粉体を処理する電
子線照射装置の搬送部分の改良に関する。電子線照射装
置は真空中で発生した電子線を電子線照射窓から通して
大気中へ取り出し被処理物に照射する装置である。電線
高分子被覆架橋、樹脂の硬化、塗膜の硬化、医療器具殺
菌、などさまざまの用途に用いられる。被処理物は従
来、定形固体のものがほとんどであった。固体の被処理
物は無端周回コンベヤによって筐体の内部を運ばれ電子
線照射窓の下を通る時に電子線照射を受けるようになっ
ている。小さい固体の被処理物の場合はトレイに入れて
コンベヤに置かれる事もある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a transport portion of an electron beam irradiation apparatus for processing powder. An electron beam irradiation apparatus is an apparatus that takes out an electron beam generated in a vacuum through an electron beam irradiation window, takes it out to the atmosphere, and irradiates an object to be processed. It is used for various applications such as cross-linking of electric wire polymer coating, curing of resin, curing of coating film, and sterilization of medical equipment. Conventionally, most of the objects to be treated have a fixed solid shape. The solid object to be processed is carried inside the housing by an endless orbiting conveyor, and receives an electron beam when passing under an electron beam irradiation window. Small solid objects may be placed in trays and placed on conveyors.
【０００２】電子線照射装置には電子線分布の違う２種
類のものがある。電子線を走査する走査型と、走査しな
い非走査型（エリア型）である。走査型は電子線を交番
磁界の作用によって搬送方向（ｘ方向）と直角の方向
（ｙ方向）に電子線を走査する。これはエネルギーの高
い場合に良く用いられる。[0002] There are two types of electron beam irradiation devices having different electron beam distributions. A scanning type that scans an electron beam and a non-scanning type (area type) that does not scan. The scanning type scans an electron beam in the direction (y direction) perpendicular to the transport direction (x direction) by the action of an alternating magnetic field. This is often used when the energy is high.
【０００３】非走査型は広い実効面積を持つフィラメン
トから電子線を発生させ広い断面積のビームを得て加速
し被処理物に照射するものである。比較的エネルギーの
低い電子線を照射するものである。加速エネルギーが低
いから加速の為の距離が短く、走査しないので装置を小
型にできる。In the non-scanning type, an electron beam is generated from a filament having a wide effective area, a beam having a wide cross-sectional area is obtained, accelerated, and irradiated to an object to be processed. It irradiates an electron beam with relatively low energy. Since the acceleration energy is low, the distance for acceleration is short, and scanning is not performed, so that the apparatus can be downsized.
【０００４】電子線の発生加速は真空中で行われる。被
処理物は大気中を搬送される。その間には照射窓があ
る。これはＴｉやＡｌの金属箔を貼った窓である。窓箔
によって電子線発生部加速部の真空を維持する。窓箔は
薄いので電子線を透過させる。透過した電子線が大気中
の被処理物に照射される。電子線は高い運動エネルギー
を持つので箔を通過できるが透過損失がある。損失エネ
ルギーは熱になる。窓箔はそのために強く加熱される。
窓箔の溶融破損を避けるためは風または水によって冷却
される。[0004] The acceleration of generation of electron beams is performed in a vacuum. The object is transported in the atmosphere. There is an irradiation window between them. This is a window on which a metal foil of Ti or Al is stuck. The vacuum in the electron beam generating part accelerating part is maintained by the window foil. Since the window foil is thin, it transmits electron beams. The transmitted electron beam is applied to the object in the atmosphere. The electron beam has a high kinetic energy and can pass through the foil but has a transmission loss. The lost energy becomes heat. The window foil is heated strongly for that purpose.
The window foil is cooled by wind or water to avoid melting damage.
【０００５】搬送装置は函体の内部を無限周回運動する
コンベヤが一般に用いられる。電子線がコンベヤや被処
理物に衝突するとオゾンとＸ線が発生する。何れも有害
な物質である。有害な物質や放射線が外部に出てはいけ
ない。それで閉じた函体によってコンベヤを囲む。無端
周回コンベヤは幾つものローラによって接触支持されて
おり上下に何度か曲がるようになっている。ローラに回
転駆動力が掛かっているからコンベヤは一定方向に一定
速度で進行する。自在に速度調節もできる。また函体は
幾つもの金属板によって仕切られる。金属板には幾つも
の通し穴が開けられており通し穴をコンベヤが通過す
る。コンベヤの通る通し穴が一直線状に並ばないように
なっている。これはＸ線が外部に漏れないためである。
照射窓の直下には窒素ガスなどが循環するようになって
いる。オゾンを除くためである。酸素がなければオゾン
は発生しない。A conveyor is generally used as a conveyor that moves infinitely around the inside of a box. When an electron beam collides with a conveyor or an object to be processed, ozone and X-rays are generated. All are harmful substances. Harmful substances and radiation must not come out. The closed box surrounds the conveyor. The endless orbiting conveyor is supported in contact by a number of rollers and is bent up and down several times. Since a rotational driving force is applied to the rollers, the conveyor moves at a constant speed in a constant direction. Speed can be adjusted freely. The box is separated by several metal plates. The metal plate has a number of through holes, through which the conveyor passes. The through holes of the conveyor are not aligned in a straight line. This is because X-rays do not leak to the outside.
Nitrogen gas and the like are circulated immediately below the irradiation window. This is to remove ozone. Without oxygen, no ozone is generated.
【０００６】[0006]
【従来の技術】これまで電子線照射装置の処理の対象と
なっていたものは寸法形状の決まった固体であった。固
体の場合は大抵、表面処理が目的である。だからある表
面だけに電子線が当たれば良いと言う事が多い。かなり
の寸法があり形状の決まっている固体の場合はコンベヤ
に直接に置いて入口からコンベヤ経路を進行させ照射窓
で処理を受け、出口までそのまま搬送することができ
る。形状寸法がコンベヤにそのまま置くに適しない場合
は適当なトレイに入れてコンベヤに載せて搬送する。2. Description of the Related Art Conventionally, objects to be processed by an electron beam irradiation apparatus have been solids having a fixed size and shape. In the case of solids, the purpose is usually surface treatment. Therefore, it is often the case that the electron beam should only hit a certain surface. Solids of considerable dimensions and shapes can be placed directly on the conveyor, proceed through the conveyor path from the entrance, undergo processing at the irradiation window, and be transported directly to the exit. If the shape and dimensions are not suitable for placing on a conveyor as they are, they are placed in an appropriate tray and transported on the conveyor.
【０００７】ところが近年になって電子線照射装置によ
って粉体を殺菌処理したいという要望が寄せられるよう
になってきた。粉体は無定形であるのでそのままコンベ
ヤに載せるという訳には行かない。ビニール袋につめ、
押さえて薄くしてコンベヤに載せ、照射窓直下で電子線
を当てるようにするという方法がある。粉体の場合は粉
体の全部に電子線が当たらないといけないが電子線の透
過距離は数ミリ〜１ｃｍの程度で極浅いものである。そ
れで袋詰めして押さえて数ミリの厚さにして電子線処理
をする必要がある。コンベヤを搬送手段に使うが一旦袋
詰めし電子線処理した後は袋から出す。粉体の場合袋詰
めする手間と袋から粉体を取り出すという手間がかか
る。袋詰めに伴う損失もある。このように固体と粉体で
は搬送形態にかなりの相違がある。[0007] In recent years, however, there has been a demand for sterilizing powder by an electron beam irradiation apparatus. Since the powder is amorphous, it cannot be simply put on a conveyor. Put it in a plastic bag,
There is a method of holding down, thinning, placing it on a conveyor, and applying an electron beam right below the irradiation window. In the case of powder, the entire surface of the powder must be irradiated with an electron beam, but the transmission distance of the electron beam is as small as several millimeters to 1 cm. Therefore, it is necessary to pack the bag and hold it down to a thickness of several millimeters and to perform electron beam treatment. The conveyor is used as a transport means, but once it is packed in a bag and processed with an electron beam, it is taken out of the bag. In the case of powder, it takes time to pack the bag and take the powder out of the bag. There are also losses associated with bagging. As described above, there is a considerable difference in the transport form between the solid and the powder.
【０００８】[0008]
【発明が解決しようとする課題】さらに定形固体でも無
定形粉体でもない粒状物体も電子線処理したいという新
たな要望が出てきた。粉体と粒体は同じようなものであ
るから、粉体と同様の方法で電子線を照射できるであろ
うと、思われるかもしれない。しかしそれは誤りであ
る。粒体は直径が数ミリの不定形の粒状体である。粉体
の直径にくらべて格段に大きい。したがって袋づめにし
て電子線を照射するとまったく電子線が照射されない粒
体ができる。むしろ照射されない粒体のほうが多いとい
えよう。これでは、なんのために電子線照射しているか
わからない。もっと効率の良く粒体に電子線照射できる
装置を考えなくてはならない。例えばコンベヤの両側に
***を付けてこぼれないようにすれば無限周回コンベヤ
で搬送できよう。Further, there has been a new demand for the treatment of granular objects which are neither regular solids nor amorphous powders with an electron beam. Since the powder and the granules are similar, it might seem that the electron beam could be irradiated in the same way as the powder. But that is wrong. The granules are irregular granules having a diameter of several millimeters. It is much larger than the diameter of the powder. Therefore, when an electron beam is irradiated in a closed bag, particles which are not irradiated with the electron beam at all are formed. Rather, it can be said that more particles are not irradiated. With this, it is not clear why the electron beam is being irradiated. It is necessary to consider a device that can more efficiently irradiate the particles with electron beams. For example, if the conveyor is provided with bumps on both sides to prevent spillage, it can be conveyed by an infinite orbiting conveyor.
【０００９】しかしそのようにした実績はない。そもそ
も粒状物質を電子線処理するということ自体が新規な要
望であって処理した実績はない。新しい要求であるから
新しい対策が必要であろう。粒状物質には表裏の別がな
い。粒状物質の場合全表面に電子線を当てる必要があ
る。つまりある面だけでなくその裏面にも側面にも電子
線を当てる必要がある。これが粒状物質の電子線処理に
困難さをもたらす。However, there is no record of doing so. In the first place, the treatment of particulate matter with an electron beam is a new demand itself, and there is no record of such treatment. Because it is a new requirement, new measures will be needed. There is no distinction between front and back of particulate matter. In the case of particulate matter, it is necessary to irradiate the entire surface with an electron beam. That is, it is necessary to irradiate not only a certain surface but also the back surface and the side surface of the electron beam. This creates difficulties in electron beam processing of particulate matter.
【００１０】電子線の侵入深さｄより直径Ｄが小さい場
合は（Ｄ＜ｄ）裏面まで電子線が到達できる。電子線加
速エネルギーを高くすればこれは可能であろう。しかし
そうすると粒状体の内部まで電子線が入ってしまう。と
ころがものによって内部は電子線被爆しない方が良いと
いうことがある。その場合粒状体の内部まで電子線によ
る変質を及ぼしてはならない。粒状対象の場合、内部に
電子線がはいらず、全周面に電子線をあてなければなら
ない。ところがそれは容易でない。 単に粒状物体をザ
ザーとコンベヤに投入して運ぶようにしても上になって
いる面に電子線が当たるだけで裏面には当たらない。し
かもホッパから少しづつコンベヤに粒状体を投下しても
粒状体の群が固まって山を作る。山になると最上部の粒
にしか電子線が当たらない。かといって粒状物を１層だ
けコンベヤに敷き詰めるというようなことは簡単にはで
きない。つまり粒状物を電子線処理するという場合、粒
状物を互いに重ならず１層だけコンベヤに敷き裏面にも
電子線を当てる、という殆ど不可能のような事が要求さ
れる。When the diameter D is smaller than the penetration depth d of the electron beam (D <d), the electron beam can reach the back surface. This would be possible if the electron beam acceleration energy was increased. However, when this is done, the electron beam penetrates into the inside of the granular material. However, it is sometimes better not to be exposed to electron beams inside. In this case, the inside of the granular material must not be altered by the electron beam. In the case of a granular object, there is no electron beam inside, and the electron beam must be applied to the entire peripheral surface. However, it is not easy. Even if the granular object is simply thrown into the zaza and the conveyor and carried, the electron beam hits the upper surface but not the back surface. Moreover, even if the granules are dropped onto the conveyor little by little from the hopper, the groups of granules solidify to form a mountain. At the peak, the electron beam hits only the top grain. However, it is not easy to spread only one layer of granular material on a conveyor. That is, in the case where the granular material is subjected to the electron beam treatment, it is almost impossible that the granular material is not overlapped with each other and only one layer is laid on the conveyor and the electron beam is applied to the back surface.
【００１１】これができないこともあって、現在も尚、
粒状物を処理できる電子線照射装置は存在しない。粒状
対象物を処理できる電子線照射装置を提供する事が本発
明の第１の目的である。粒状物が互いに重なって電子線
を遮る事のないようにした電子線照射装置を提供する事
が本発明の第２の目的である。粒状物の表面も、側面も
裏面も一様に電子線を当てる事のできる電子線照射装置
を提供する事が本発明の第３の目的である。[0011] There are times when this is not possible,
There is no electron beam irradiation device that can process particulate matter. It is a first object of the present invention to provide an electron beam irradiation apparatus capable of processing a granular object. It is a second object of the present invention to provide an electron beam irradiator in which the granular materials do not overlap each other to block the electron beam. It is a third object of the present invention to provide an electron beam irradiation apparatus capable of uniformly irradiating an electron beam on both the front surface, the side surface and the back surface of the granular material.
【００１２】[0012]
【課題を解決するための手段】本発明は粒状物を搬送す
るために振動コンベヤを用いる。しかも振動コンベヤの
裏面に冷却水の経路を設け直接に振動コンベヤを冷却す
る。ホッパから粒状物を振動コンベヤに落下させると、
振動コンベヤは板面の振動によって粒状物を一定方向に
送る。入口から照射窓直下の照射位置を経て出口まで延
びる振動コンベヤがあるので、振動とともに粒状物が一
定方向に進行してゆく。SUMMARY OF THE INVENTION The present invention uses a vibrating conveyor to convey particulate matter. In addition, a cooling water path is provided on the back surface of the vibrating conveyor to directly cool the vibrating conveyor. Dropping the granular material from the hopper onto the vibrating conveyor,
The vibrating conveyor sends the granular material in a certain direction by vibrating the plate surface. Since there is a vibrating conveyor extending from the entrance to the exit through the irradiation position immediately below the irradiation window, the granular material proceeds in a certain direction with the vibration.
【００１３】無端周回コンベヤと違ってそれ自体は進行
せず振動によって粒状物を運ぶ。振動するから粒子が回
転し表裏反転するからどの面にもほぼ均一に電子線が当
たる。これが重要な長所である。弱い電子線であっても
全面に電子線を当てることができ内部にまで入らないよ
うにできる。またたとえ一時的に山になったとしても振
動によって山がつぶれ結局１層の分布になるから全部の
粒体が等しく全面に電子線を浴びることができる。Unlike an endless orbiting conveyor, it does not move itself but carries the granular material by vibration. Because of the vibration, the particles rotate and turn over, so that the electron beam hits almost uniformly on any surface. This is an important advantage. Even if the electron beam is weak, the electron beam can be applied to the entire surface and can be prevented from entering the inside. Even if the peaks are temporarily formed, the peaks are collapsed by the vibration and eventually become one layer distribution, so that all the particles can be equally exposed to the electron beam over the entire surface.
【００１４】電子線照射によってコンベヤが加熱される
が冷却水を直接に板面の裏面に流すので有効に板面が冷
却される。周回コンベヤと違って同じ部位が常に電子線
を受けて加熱されるので冷却はひときわ重要である。本
発明は冷却水を直接に板裏面に流す事によって十分な冷
却を行う。The conveyor is heated by the electron beam irradiation, but the cooling water flows directly to the back surface of the plate surface, so that the plate surface is effectively cooled. Cooling is particularly important because the same part is always heated by receiving an electron beam unlike a rotating conveyor. In the present invention, sufficient cooling is performed by flowing cooling water directly to the back surface of the plate.
【００１５】[0015]
【発明の実施の形態】図１は本発明の実施例にかかる電
子線照射装置の概略縦断面図である。横長の筐体１は鉄
板、鉛板など金属板で作られ内部を被処理物の搬送空間
としている。その中間部には電子線発生装置２が設けら
れる。ここで非走査型の電子線発生装置２を示している
が、走査型の装置であっても良い。電子線発生装置２は
真空チャンバ３と内部に設けられたフィラメント４と電
子線を外部へ取り出す照射窓５とを含む。フィラメント
４には直流の電流が流れて発熱する。温度が上がるので
熱電子が出る。また真空チャンバ３に対して負のバイア
スが掛かっているので熱電子は照射窓５の方向に引き出
される。FIG. 1 is a schematic longitudinal sectional view of an electron beam irradiation apparatus according to an embodiment of the present invention. The horizontally long casing 1 is made of a metal plate such as an iron plate or a lead plate, and the inside is a space for transporting an object to be processed. An electron beam generator 2 is provided in the middle. Although the non-scanning type electron beam generator 2 is shown here, it may be a scanning type device. The electron beam generator 2 includes a vacuum chamber 3, a filament 4 provided inside, and an irradiation window 5 for taking out an electron beam to the outside. A direct current flows through the filament 4 to generate heat. As the temperature rises, thermoelectrons are emitted. Since a negative bias is applied to the vacuum chamber 3, thermoelectrons are extracted in the direction of the irradiation window 5.
【００１６】照射窓５は角型の開口である。ここにはＴ
ｉ或いはＡｌの窓箔６が貼ってある。窓箔の上は真空で
あって下は大気圧である。極薄いものの窓箔６は電子線
７の一部を吸収する。これによって発熱するから空気な
どを吹き付けて冷却するのが普通である。しかしここで
は窓箔冷却装置は図示しない。The irradiation window 5 is a rectangular opening. Here T
Window foil 6 of i or Al is stuck. There is a vacuum above the window foil and an atmospheric pressure below. Although very thin, the window foil 6 absorbs a part of the electron beam 7. Because of this, heat is generated, so that it is common to blow air or the like to cool. However, the window foil cooling device is not shown here.
【００１７】筐体の内部には搬送機構がある。これが通
常の無端周回コンベヤではない。そうではなくて振動コ
ンベヤ８が搬送機構となっている。これが本発明の特徴
である。電子線照射の被処理物は粒状物９である。筐体
１の一端には粒状物９を筐体に導くための入口ホッパ１
０がある。入口ホッパ１０から粒状物は筐体１の入口領
域１１に入る。振動コンベヤ８は振動底板１２、振動側
板１３、支柱１４、振動発生装置１５などよりなる。支
柱１４は前後左右において振動底板１２を振動可能に支
持する。支柱１４の一部は防震ゴム１６になっていて振
動底板１２が上下に振動すること許すようになってい
る。振動発生装置１５は例えばモータと偏心カムなどに
よって構成される。或いは超音波振動子などによっても
振動を与えることができる。これによって、振動底板１
２が振動するが僅かな傾斜があるので粒状物は一定方向
に前進する。傾斜がなくても振動モードを前後非対称に
することによって一定方向に前進させることもできる。
また振動底板１２に特別の表面形状を与えることによっ
て一方向へのみ搬送するようにすることもできる。There is a transport mechanism inside the housing. This is not a normal endless conveyor. Instead, the vibrating conveyor 8 is a transport mechanism. This is a feature of the present invention. The object to be processed by the electron beam irradiation is the granular material 9. At one end of the housing 1 is an entrance hopper 1 for guiding the granular material 9 to the housing.
There is 0. From the inlet hopper 10 the particulates enter the inlet area 11 of the housing 1. The vibration conveyor 8 includes a vibration bottom plate 12, a vibration side plate 13, a support 14, a vibration generator 15, and the like. The columns 14 support the vibrating bottom plate 12 so that it can vibrate in the front, rear, left, and right directions. A part of the support 14 is made of an anti-vibration rubber 16 to allow the vibration bottom plate 12 to vibrate up and down. The vibration generating device 15 includes, for example, a motor and an eccentric cam. Alternatively, the vibration can be given by an ultrasonic vibrator or the like. Thereby, the vibration bottom plate 1
2 vibrates but has a slight inclination, so that the granular material advances in a certain direction. Even if there is no inclination, the vibration mode can be advanced in a certain direction by making the vibration mode asymmetric.
Also, by providing the vibration bottom plate 12 with a special surface shape, it is possible to convey only in one direction.
【００１８】振動底板１２の上を前進（ｘ方向）すると
粒状物はやがて照射窓５の直下にいたる。ここで粒状物
９は電子線照射を受ける。電子線によって粒状物に適当
な処理がなされる。振動底板１２の直下には冷却水管１
７が設けられる。電子線７を受けることによって振動底
板１２が発熱する。そのまま放置すると底板１２が焼損
する。これを避けるために冷却するのである。図２に冷
却水管１７の部分の横断平面図を示す。When moving forward (in the x direction) on the vibrating bottom plate 12, the granular material eventually reaches directly below the irradiation window 5. Here, the granular material 9 receives an electron beam irradiation. The granular material is subjected to an appropriate treatment by an electron beam. Immediately below the vibration bottom plate 12, the cooling water pipe 1
7 are provided. Upon receiving the electron beam 7, the vibration bottom plate 12 generates heat. If left as it is, the bottom plate 12 will burn out. Cool to avoid this. FIG. 2 is a cross-sectional plan view of the cooling water pipe 17.
【００１９】この例では冷却水管１７が底板１８、側壁
１９、前壁２０、後壁２１をもち、内部に蛇行状の流路
を形成するために隔壁２２、２２…が設けられている。
流路の始端には冷却水入口２３があり、終端には冷却水
出口２４がある。入口２３から出口２４に至る蛇行流路
ができる。この中を冷却水２５が蛇行しながら通って行
く。冷却水管１７は直接に振動底板１２を冷却する。In this embodiment, the cooling water pipe 17 has a bottom plate 18, a side wall 19, a front wall 20, and a rear wall 21. Partitions 22, 22... Are provided inside to form a meandering flow path.
At the beginning of the flow path there is a cooling water inlet 23 and at the end there is a cooling water outlet 24. A meandering channel from the inlet 23 to the outlet 24 is created. In this, the cooling water 25 passes while meandering. The cooling water pipe 17 directly cools the vibration bottom plate 12.
【００２０】電子線照射によって発生した熱は冷却水の
作用によって冷却される。冷却水の方は加熱されて出口
２４から排出される。振動コンベヤによって粒状物を搬
送すると、図３に示すように振動によって粒状物が前後
左右に転動する。微小な振動であるが上下前後左右に振
動するので粒状物が飛び上がり転がり廻る。粒状物は転
動しているから電子線に向かう面はつねに変動する。だ
からどの面も等しく電子線照射を受ける。電子線エネル
ギーが低くて粒状物の内部には電子線が入らないにする
がコロコロと振動コンベヤで転がるので全ての面が電子
線処理を受ける。これはまことに好都合な性質である。
振動しない通常の無端周回コンベヤではこのようなわけ
にはゆかない。The heat generated by electron beam irradiation is cooled by the action of cooling water. The cooling water is heated and discharged from the outlet 24. When the granular material is transported by the vibrating conveyor, the granular material rolls back and forth and right and left by the vibration as shown in FIG. Although it is a minute vibration, it vibrates up and down, back and forth and right and left, so that the granular material jumps up and rolls around. Since the granular material is rolling, the surface facing the electron beam always changes. Therefore, all surfaces receive electron beam irradiation equally. Although the electron beam energy is low and the electron beam does not enter the inside of the granular material, all surfaces are subjected to the electron beam treatment because they are rolled by the roller and the vibration conveyor. This is a very favorable property.
This is not the case with ordinary endless conveyors that do not vibrate.
【００２１】振動コンベヤの終端の筐体の出口領域２６
までくると粒状物はここから落下する。出口ホッパ２７
を通り次段のコンベヤ２８に落下する。このコンベヤに
よって次の工程の装置へと搬送される。The exit area 26 of the housing at the end of the vibrating conveyor
When it reaches, the particulates fall from here. Exit hopper 27
, And falls to the next conveyor 28. By this conveyor, it is conveyed to the apparatus of the next process.
【００２２】[0022]
【発明の効果】本発明は筐体内部での粒状物の搬送に振
動コンベヤを使っている。通常の無端周回コンベヤと違
って、粒状物に上下左右の運動が加わるので粒状物が転
がり廻る。ために上から照射されるだけの電子線を全面
に受けることができる。粒状物表面に等しく電子線が当
たるので理想的な表面処理がなされる。According to the present invention, a vibrating conveyor is used for conveying granular materials inside the housing. Unlike a normal endless conveyor, the granular material rolls up and down because the granular material is moved up, down, left and right. Therefore, the entire surface can receive an electron beam that is irradiated only from above. An ideal surface treatment is performed because the electron beam is equally applied to the surface of the granular material.
【００２３】また水冷のための装置を振動コンベヤの底
板に設けているから電子線によって発熱しても熱を逃が
す事ができて底板が熱損傷を受けない。粒状物自体もあ
まり加熱すると変質する可能性があるが本発明は冷却水
によって底板の冷却を行っているから粒状物の温度が過
度に上がらないようにすることができる。Further, since a device for water cooling is provided on the bottom plate of the vibrating conveyor, even if heat is generated by an electron beam, heat can be released and the bottom plate is not thermally damaged. The granular material itself may be deteriorated if heated too much. However, in the present invention, since the bottom plate is cooled by the cooling water, the temperature of the granular material can be prevented from excessively rising.
【図１】本発明の実施例にかかる電子線照射装置の概略
の縦断面図。FIG. 1 is a schematic longitudinal sectional view of an electron beam irradiation apparatus according to an embodiment of the present invention.
【図２】振動底板の直下に設けた冷却水管の横断平面
図。FIG. 2 is a cross-sectional plan view of a cooling water pipe provided immediately below a vibration bottom plate.
【図３】振動底板の一部の縦断面図。FIG. 3 is a longitudinal sectional view of a part of a vibration bottom plate.
１ 筐体 ２ 電子線発生装置 ３ 真空チャンバ ４ フィラメント ５ 照射窓 ６ 窓箔 ７ 電子線 ８ 振動コンベヤ ９ 粒状物 １０ 入口ホッパ １１ 入口領域 １２ 振動底板 １３ 振動側板 １４ 支柱 １５ 振動発生装置 １６ 防震ゴム １７ 冷却水管 １８ 底壁 １９ 側壁 ２０ 前壁 ２１ 後壁 ２２ 隔壁 ２３ 冷却水入口 ２４ 冷却水出口 DESCRIPTION OF SYMBOLS 1 Case 2 Electron beam generator 3 Vacuum chamber 4 Filament 5 Irradiation window 6 Window foil 7 Electron beam 8 Vibration conveyor 9 Granular material 10 Inlet hopper 11 Inlet area 12 Vibration bottom plate 13 Vibration side plate 14 Column 15 Vibration generator 16 Vibration-proof rubber 17 Cooling water pipe 18 Bottom wall 19 Side wall 20 Front wall 21 Rear wall 22 Partition wall 23 Cooling water inlet 24 Cooling water outlet
Claims (1)
筐体と、筐体の一部に設けられ真空中において電子線を
発生する電子線発生装置と、筐体と電子線発生装置の境
界にあって窓箔を設けた照射窓と、筐体の内部にあって
被処理物を載せて振動によって搬送する振動コンベヤ
と、振動コンベヤの下側に設けられる冷却機構とを含む
事を特徴とする電子線照射装置。1. A housing for accommodating a mechanism for transporting an object to be processed, an electron beam generator provided in a part of the housing for generating an electron beam in a vacuum, and a housing and an electron beam generator. It is characterized by including an irradiation window provided with a window foil at the boundary, a vibrating conveyor inside the housing for carrying an object to be processed and vibrating, and a cooling mechanism provided below the vibrating conveyor. Electron beam irradiation device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14287398A JP3648537B2 (en) | 1998-05-25 | 1998-05-25 | Electron beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14287398A JP3648537B2 (en) | 1998-05-25 | 1998-05-25 | Electron beam irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11337700A true JPH11337700A (en) | 1999-12-10 |
| JP3648537B2 JP3648537B2 (en) | 2005-05-18 |
Family
ID=15325590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14287398A Expired - Fee Related JP3648537B2 (en) | 1998-05-25 | 1998-05-25 | Electron beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3648537B2 (en) |
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