JPH11323194A - Preparation process for a composite material having a hydrophilic photocatalytic surface, a photocatalytic hydrophilic composite material, and a photocatalytic hydrophilic coating composition - Google Patents
Preparation process for a composite material having a hydrophilic photocatalytic surface, a photocatalytic hydrophilic composite material, and a photocatalytic hydrophilic coating compositionInfo
- Publication number
- JPH11323194A JPH11323194A JP10363347A JP36334798A JPH11323194A JP H11323194 A JPH11323194 A JP H11323194A JP 10363347 A JP10363347 A JP 10363347A JP 36334798 A JP36334798 A JP 36334798A JP H11323194 A JPH11323194 A JP H11323194A
- Authority
- JP
- Japan
- Prior art keywords
- photocatalytic
- hydrophilic
- coating composition
- substrate
- composite material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 80
- 239000002131 composite material Substances 0.000 title claims abstract description 30
- 239000008199 coating composition Substances 0.000 title claims abstract description 24
- 238000002360 preparation method Methods 0.000 title abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000000463 material Substances 0.000 claims abstract description 40
- 238000000576 coating method Methods 0.000 claims abstract description 27
- 239000011248 coating agent Substances 0.000 claims abstract description 26
- 239000012790 adhesive layer Substances 0.000 claims abstract description 24
- 239000003960 organic solvent Substances 0.000 claims abstract description 24
- 239000002344 surface layer Substances 0.000 claims abstract description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 22
- 229920001296 polysiloxane Polymers 0.000 claims description 19
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- -1 polyethylene terephthalate Polymers 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 6
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 6
- 230000005284 excitation Effects 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 230000001747 exhibiting effect Effects 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 239000011941 photocatalyst Substances 0.000 description 20
- 239000003973 paint Substances 0.000 description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 17
- 239000010410 layer Substances 0.000 description 17
- 239000002904 solvent Substances 0.000 description 15
- 238000012360 testing method Methods 0.000 description 13
- 150000003376 silicon Chemical class 0.000 description 12
- 235000019441 ethanol Nutrition 0.000 description 10
- 238000007865 diluting Methods 0.000 description 9
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 7
- 230000001443 photoexcitation Effects 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000002585 base Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 229920002050 silicone resin Polymers 0.000 description 5
- 229920002799 BoPET Polymers 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 125000000962 organic group Chemical group 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- 239000005751 Copper oxide Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 229910000431 copper oxide Inorganic materials 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229910052809 inorganic oxide Inorganic materials 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 239000002772 conduction electron Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910001923 silver oxide Inorganic materials 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- DAJFVZRDKCROQC-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)CCCOCC1CO1 DAJFVZRDKCROQC-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- JZYAVTAENNQGJB-UHFFFAOYSA-N 3-tripropoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCCO[Si](OCCC)(OCCC)CCCOC(=O)C(C)=C JZYAVTAENNQGJB-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- QMHXOYJCPWNKOY-UHFFFAOYSA-N C(C)O[SiH3].C(CC)[Si](OC)(OC)OC Chemical compound C(C)O[SiH3].C(CC)[Si](OC)(OC)OC QMHXOYJCPWNKOY-UHFFFAOYSA-N 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- 241000588731 Hafnia Species 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
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- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 241001074085 Scophthalmus aquosus Species 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(III) oxide Inorganic materials O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 1
- 238000012661 block copolymerization Methods 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- WXONGBQFFCVVCX-UHFFFAOYSA-N butoxy(propan-2-yl)silane Chemical compound CCCCO[SiH2]C(C)C WXONGBQFFCVVCX-UHFFFAOYSA-N 0.000 description 1
- OQCQMXUAGXYAGL-UHFFFAOYSA-N butoxy(propyl)silane Chemical compound CCCCO[SiH2]CCC OQCQMXUAGXYAGL-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 235000012255 calcium oxide Nutrition 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000004567 concrete Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- KUCGHDUQOVVQED-UHFFFAOYSA-N ethyl(tripropoxy)silane Chemical compound CCCO[Si](CC)(OCCC)OCCC KUCGHDUQOVVQED-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000013532 laser treatment Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- RJMRIDVWCWSWFR-UHFFFAOYSA-N methyl(tripropoxy)silane Chemical compound CCCO[Si](C)(OCCC)OCCC RJMRIDVWCWSWFR-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- OTCVAHKKMMUFAY-UHFFFAOYSA-N oxosilver Chemical class [Ag]=O OTCVAHKKMMUFAY-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- FABOKLHQXVRECE-UHFFFAOYSA-N phenyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C1=CC=CC=C1 FABOKLHQXVRECE-UHFFFAOYSA-N 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- SZEGZMUSBCXNLO-UHFFFAOYSA-N propan-2-yl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C(C)C SZEGZMUSBCXNLO-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000001356 surgical procedure Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- GIHPVQDFBJMUAO-UHFFFAOYSA-N tributoxy(ethyl)silane Chemical compound CCCCO[Si](CC)(OCCCC)OCCCC GIHPVQDFBJMUAO-UHFFFAOYSA-N 0.000 description 1
- GYZQBXUDWTVJDF-UHFFFAOYSA-N tributoxy(methyl)silane Chemical compound CCCCO[Si](C)(OCCCC)OCCCC GYZQBXUDWTVJDF-UHFFFAOYSA-N 0.000 description 1
- INUOIYMEJLOQFN-UHFFFAOYSA-N tributoxy(phenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C1=CC=CC=C1 INUOIYMEJLOQFN-UHFFFAOYSA-N 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- BJDLPDPRMYAOCM-UHFFFAOYSA-N triethoxy(propan-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)C BJDLPDPRMYAOCM-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LGROXJWYRXANBB-UHFFFAOYSA-N trimethoxy(propan-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)C LGROXJWYRXANBB-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- VUWVDNLZJXLQPT-UHFFFAOYSA-N tripropoxy(propyl)silane Chemical compound CCCO[Si](CCC)(OCCC)OCCC VUWVDNLZJXLQPT-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、部材表面を高度の
親水性になし、かつ維持する技術に関する。より詳しく
は、本発明は、鏡、レンズ、ガラス、プリズムその他の
透明部材の表面を高度に親水化することにより、部材の
曇りや水滴形成を防止する防曇技術に関する。本発明
は、また、建物や窓ガラスや機械装置や物品の表面を高
度に親水化することにより、表面が汚れるのを防止し、
又は表面を自己浄化（セルフクリ−ニング）し若しくは
容易に清掃する技術に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for making a member surface highly hydrophilic and maintaining it. More specifically, the present invention relates to an anti-fog technology for preventing the fogging and water droplets from forming on a mirror, lens, glass, prism or other transparent member by making the surface of the member highly hydrophilic. The present invention also prevents the surface from being stained by highly hydrophilizing the surface of a building, a window glass, a mechanical device or an article,
Alternatively, the present invention relates to a technique of self-cleaning (self-cleaning) or easily cleaning a surface.
【０００２】[0002]
【従来の技術】寒冷時に自動車その他の乗物の風防ガラ
スや窓ガラス、建物の窓ガラス、眼鏡のレンズ、および
各種計器盤のカバーガラスが凝縮湿分で曇るのはしばし
ば経験されることである。また、浴室や洗面所の鏡や眼
鏡のレンズが湯気で曇ることも良く遭遇される。部材の
表面に曇りが生じるのは、表面が雰囲気の露点以下の温
度に置かれると雰囲気中の湿分が凝縮して表面に結露
し、水滴状に成長するからである。凝縮水滴が充分に細
かく、それらの直径が可視光の波長の１／２程度であれ
ば、水滴は光を散乱し、ガラスや鏡は見掛け上不透明と
なり、やはり可視性が失われる。2. Description of the Prior Art It is often experienced that in cold weather, windshields and glazings of automobiles and other vehicles, glazings of buildings, lenses of glasses, and cover glasses of various instrument panels are fogged by condensed moisture. In addition, mirrors and eyeglass lenses in bathrooms and washrooms are often fogged by steam. The reason why the surface of the member is fogged is that when the surface is placed at a temperature lower than the dew point of the atmosphere, moisture in the atmosphere condenses and condenses on the surface, and grows like water droplets. If the condensed water droplets are sufficiently fine and their diameter is about half the wavelength of visible light, the water droplets will scatter light and the glass or mirror will be apparently opaque, again losing visibility.
【０００３】湿分の凝縮が更に進行し、細かい凝縮水滴
が互いに融合してより大きな離散した水滴に成長すれ
ば、水滴と表面との界面並びに水滴と空気との界面にお
ける光の屈折により、それらの表面は翳り、ぼやけ、斑
模様になり、或いは曇る。その結果、ガラスのような透
明物品では透視像が歪んで透視性が低下し、鏡では反射
像が乱される。[0003] If the condensation of moisture further progresses and fine condensed water droplets fuse with each other and grow into larger discrete water droplets, the refraction of light at the water droplet-surface interface and the water droplet-air interface will cause these droplets to refract. The surface is dark, blurred, mottled, or cloudy. As a result, in a transparent article such as glass, the perspective image is distorted and the transparency is reduced, and the reflected image is disturbed by a mirror.
【０００４】更に、車両の風防ガラスや窓ガラス、建物
の窓ガラス、車両のバックミラー、眼鏡のレンズ、マス
クやヘルメットのシールドが降雨や水しぶきを受け、離
散した多数の水滴が表面に付着すると、それらの表面は
翳り、ぼやけ、斑模様になり、或いは曇り、やはり可視
性が失われる。言うまでもなく、上記“曇り”は安全性
や種々の作業の能率に深い影響を与える。例えば、車両
の風防ガラスや窓ガラス、車両のバックミラーが、寒冷
時や雨天に翳り或いは曇ると、視界の確保が困難とな
り、交通の安全性が損われる。内視鏡レンズやデンタル
ミラー、歯科用レーザー治療器の集束レンズが曇ると、
的確な診断、手術、処置の障害となる。計器盤のカバー
ガラスが曇るとデータの読みが困難となる。Further, when a windshield or a window glass of a vehicle, a window glass of a building, a rearview mirror of a vehicle, a lens of eyeglasses, a shield of a mask or a helmet are subjected to rainfall or splashing, and a large number of discrete water droplets adhere to the surface, Their surface may be dark, blurred, mottled, or cloudy, again losing visibility. Needless to say, the above "clouding" has a profound effect on safety and efficiency of various operations. For example, if the windshield or window glass of the vehicle or the rearview mirror of the vehicle is overcast or cloudy in cold weather or rainy weather, it is difficult to secure a view, and traffic safety is impaired. If the focusing lens of an endoscope lens, dental mirror, or dental laser treatment device becomes cloudy,
It hinders accurate diagnosis, surgery, and treatment. When the cover glass of the instrument panel becomes cloudy, it becomes difficult to read the data.
【０００５】他方、建築および塗料の分野においては、
環境汚染に伴い、建築外装材料や屋外建造物やその塗膜
の汚れが問題となっている。大気中に浮遊する煤塵や粒
子は晴天には建物の屋根や外壁に堆積する。堆積物は降
雨に伴い雨水により流され、建物の外壁を流下する。更
に、雨天には浮遊煤塵は雨によって持ち運ばれ、建物の
外壁や屋外建造物の表面を流下する。その結果、表面に
は、雨水の道筋に沿って汚染物質が付着する。表面が乾
燥すると、表面には縞状の汚れが現れる。On the other hand, in the fields of construction and paint,
With environmental pollution, stains on building exterior materials, outdoor buildings, and their coatings have become a problem. Dust and particles suspended in the air accumulate on the roof and outer walls of buildings in fine weather. Sediment is washed away by rainwater as it rains and flows down the building's outer walls. Furthermore, in the rain, the floating dust is carried by the rain and flows down on the outer wall of the building or the surface of the outdoor building. As a result, contaminants adhere to the surface along the path of rainwater. When the surface dries, striped stains appear on the surface.
【０００６】上記の問題を解決すべく、各種基材に防曇
性や流滴性を付与する試みが種々為されている。基材に
防曇性や流滴性を付与する手法の一つとして、基材表面
の親水性を向上させる手法があり、様々の手法が提案さ
れている。例えば実開平3-129357には、基材の表面にポ
リマー層を設け、この層に紫外線を照射した後アルカリ
水溶液により処理することにより高密度の酸性基を生成
し、これによりポリマー層の表面を親水性にすることか
らなる鏡の防曇方法が開示されている。また実開平5-68
006には、親水基を有するアクリル系モノマーと疎水基
を有するモノマーとのグラフト重合体からなる防曇性フ
ィルムが開示されている。また特開昭55-56177にはコロ
イダルシリカと非イオン性界面活性剤および/又はアニ
オン性界面活性剤を含有する水性分散液からなる防曇剤
が開示されている。また特開平10-60665には金属酸化物
ゾルを含む複合溶液を基材の表面に塗布後亜焼成するこ
とによる親水性皮膜が開示されている。また特開昭57-1
47525には基材表面に無機質水性ゾルの粒子を沈着させ
た後に、無機質コロイド粒子および界面活性剤を含む無
滴材を塗布する無滴性に優れた合成樹脂成形物の製造方
法が開示されている。またPCT/WO96/29375には基材表面
に光触媒含有層を形成することにより、前記光触媒の光
励起に応じて前記表面に親水性を付与する方法が開示さ
れている。[0006] In order to solve the above-mentioned problems, various attempts have been made to impart antifogging properties and dropping properties to various substrates. As one of the methods for imparting anti-fogging property and dropping property to the substrate, there is a method for improving the hydrophilicity of the substrate surface, and various methods have been proposed. For example, in Japanese Utility Model Application Laid-Open No. 3-129357, a polymer layer is provided on the surface of the base material, and this layer is irradiated with ultraviolet light and then treated with an aqueous alkali solution to generate high-density acidic groups, thereby forming a surface of the polymer layer. A method for anti-fog mirrors comprising making them hydrophilic is disclosed. In addition, 5-68
No. 006 discloses an antifogging film comprising a graft polymer of an acrylic monomer having a hydrophilic group and a monomer having a hydrophobic group. JP-A-55-56177 discloses an antifogging agent comprising an aqueous dispersion containing colloidal silica and a nonionic surfactant and / or an anionic surfactant. Japanese Patent Application Laid-Open No. 10-60665 discloses a hydrophilic film formed by applying a composite solution containing a metal oxide sol to the surface of a base material and then sub-baking it. In addition, Japanese Patent Application Laid-Open
No. 47525 discloses a method for producing a synthetic resin molded article having excellent drip-free properties by applying a drip-free material containing inorganic colloid particles and a surfactant after depositing inorganic aqueous sol particles on a substrate surface. I have. PCT / WO96 / 29375 discloses a method of forming a photocatalyst-containing layer on the surface of a substrate to impart hydrophilicity to the surface in response to photoexcitation of the photocatalyst.
【０００７】[0007]
【発明が解決しようとする課題】しかしながらこれらの
基材表面に親水性を付与する方法については、基材に防
曇性や流滴性を付与するほどの高度の親水性を発現でき
なかったり、親水性を付与するのに複雑な工程や高額の
費用や大規模な設備を必要としたり、熱処理工程が必要
となるために耐熱性が劣る基材に適用できなかったり、
親水性の効果が短期間しか持続しなかったり、親水性を
付与するために基材表面に設けられた塗膜の耐久性や耐
摩耗性が劣っていたり、塗膜によって基材の色調や透明
性が変化して違和感を与えるといった問題点が一つ又は
それ以上伴っていた。However, these methods of imparting hydrophilicity to the surface of a substrate cannot provide a substrate with a high degree of hydrophilicity that imparts anti-fogging properties or dripping properties, In order to impart a hydrophilic property requires a complicated process and expensive costs and large-scale equipment, or it can not be applied to a substrate with poor heat resistance because a heat treatment process is required,
The effect of hydrophilicity lasts only for a short time, the durability and abrasion resistance of the coating film provided on the substrate surface to impart hydrophilicity are poor, and the color tone and transparency of the substrate depending on the coating film One or more problems, such as a change in gender and a sense of incongruity, were involved.
【０００８】本発明は上記事情を鑑みてなされたもので
あり、工程が簡便で高額の費用や大規模な設備を必要と
せず、高温の熱処理工程を必要とせず、親水性の持続期
間が長く、親水性を付与するために基材表面に設けられ
た塗膜の耐久性や耐摩耗性に優れ、塗膜によって基材の
色調や透明性がほとんど変化せず、基材表面に防曇性や
流滴性を発現するだけの高度な親水性を付与するための
基材表面のコーティング方法、および表面にコーティン
グされた基材、コーティング組成物を提供することを目
的とする。The present invention has been made in view of the above circumstances, has a simple process, does not require expensive and large-scale facilities, does not require a high-temperature heat treatment process, and has a long hydrophilicity duration. Excellent durability and abrasion resistance of the coating film provided on the substrate surface to impart hydrophilicity, little change in color and transparency of the substrate by the coating film, anti-fog properties on the substrate surface It is an object of the present invention to provide a method for coating the surface of a substrate for imparting a high degree of hydrophilicity sufficient to develop a liquid droplet or a droplet, and a substrate and a coating composition coated on the surface.
【０００９】[0009]
【課題を解決するための手段】本発明では上記課題を解
決するために光触媒性材料と溶解度パラメーターが９か
ら１４．８の間の有機溶剤とを含む光触媒性コーティン
グ組成物、光触媒性材料と溶解度パラメーターが９から
１４．８の間の有機溶剤とを含む光触媒性コーティング
組成物を塗布することで親水性の光触媒性表面を備えた
複合材を得る製造方法、光触媒性材料と溶解度パラメー
ターが９から１４．８の間の有機溶剤とを含む光触媒性
コーティング組成物を塗布することで親水性の光触媒性
表面を備えた複合材を提供する。ここで言う溶解度パラ
メーターとは液体の蒸発なエネルギーをＥ、モル体積を
Ｖとしたときδ＝√(Ｅ／Ｖ)により定義される量δを言
う。According to the present invention, there is provided a photocatalytic coating composition comprising a photocatalytic material and an organic solvent having a solubility parameter of from 9 to 14.8. A method for producing a composite with a hydrophilic photocatalytic surface by applying a photocatalytic coating composition comprising an organic solvent having a parameter between 9 and 14.8, wherein the photocatalytic material and the solubility parameter are from 9 to 14.8. Applying a photocatalytic coating composition comprising between 14.8 and an organic solvent to provide a composite with a hydrophilic photocatalytic surface. The solubility parameter referred to here is an amount δ defined by δ = √ (E / V), where E is the energy of evaporation of the liquid and V is the molar volume.
【００１０】請求項１に記載の親水性の光触媒性表面を
備えた複合材の製造方法は、基材を準備する工程と、該
基材の表面に接着層を被覆する工程と、該接着層の表面
に光触媒性材料と溶解度パラメーターが９から１４．８
の間の有機溶剤とを含む光触媒性コーティング組成物を
塗布し、該光触媒性材料の光励起に応じて親水性を呈す
る表面層を形成する工程と、からなることを特徴とす
る。[0010] The method for producing a composite material having a hydrophilic photocatalytic surface according to claim 1 includes a step of preparing a substrate, a step of coating the surface of the substrate with an adhesive layer, and a step of coating the adhesive layer. The surface has a photocatalytic material and a solubility parameter of 9 to 14.8.
And applying a photocatalytic coating composition containing an organic solvent to form a surface layer exhibiting hydrophilicity in response to photoexcitation of the photocatalytic material.
【００１１】上記課題を解決するために、請求項２に記
載の親水性の光触媒性表面を備えた複合材の製造方法
は、請求項１の表面層が光触媒性材料とシリコーンを含
有する層であることを特徴とする。[0011] In order to solve the above-mentioned problems, a method for producing a composite material having a hydrophilic photocatalytic surface according to claim 2 is characterized in that the surface layer according to claim 1 is a layer containing a photocatalytic material and silicone. There is a feature.
【００１２】また、上記課題を解決するために、請求項
３に記載の親水性の光触媒性表面を備えた複合材の製造
方法は、請求項１の有機溶剤がエタノール又はノルマル
プロピルアルコールであることを特徴とする。According to a third aspect of the present invention, there is provided a method for producing a composite material having a hydrophilic photocatalytic surface, wherein the organic solvent is ethanol or normal propyl alcohol. It is characterized by.
【００１３】また、上記課題を解決するために、請求項
４に記載の親水性の光触媒性表面を備えた複合材の製造
方法は、請求項１の接着層がアクリル変性シリコンであ
ることを特徴とする。According to a fourth aspect of the present invention, there is provided a method for manufacturing a composite material having a hydrophilic photocatalytic surface, wherein the adhesive layer is made of acrylic-modified silicon. And
【００１４】また、上記課題を解決するために、請求項
５に記載の親水性の光触媒性表面を備えた複合材の製造
方法は、請求項１の基材が樹脂であることを特徴とす
る。According to a fifth aspect of the present invention, there is provided a method for producing a composite material having a hydrophilic photocatalytic surface, wherein the base material is a resin. .
【００１５】また、上記課題を解決するために、請求項
６に記載の親水性の光触媒性表面を備えた複合材の製造
方法は、請求項１の基材がポリエチレンテレフタレート
であることを特徴とする。According to a sixth aspect of the present invention, there is provided a method for producing a composite material having a hydrophilic photocatalytic surface, wherein the base material is a polyethylene terephthalate. I do.
【００１６】また、上記課題を解決するために請求項７
に記載の光触媒性材料と溶解度パラメーターが９．０か
ら１４．８の間の有機溶剤とを含む光触媒性コーティン
グ組成物を塗布することで得られる、親水性の光触媒性
表面を備えた複合材であることを特徴とする。According to another aspect of the present invention, there is provided a semiconductor device comprising:
A composite having a hydrophilic photocatalytic surface, obtained by applying a photocatalytic coating composition comprising the photocatalytic material described in 1 above and an organic solvent having a solubility parameter between 9.0 and 14.8. There is a feature.
【００１７】また、上記課題を解決するために請求項８
に記載の親水性の光触媒性表面を備えた複合材において
請求項７記載の表面層が光触媒性材料とシリコーンを含
有する層であることを特徴とする。According to another aspect of the present invention, there is provided an electronic apparatus comprising:
In the composite material having a hydrophilic photocatalytic surface according to the above item, the surface layer according to the seventh aspect is a layer containing a photocatalytic material and silicone.
【００１８】また、上記課題を解決するために請求項９
に記載の親水性の光触媒性表面を備えた複合材において
請求項７記載の有機溶剤がエタノールまたはノルマルプ
ロピルアルコールであることを特徴とする。According to another aspect of the present invention, there is provided a semiconductor device comprising:
The composite material having a hydrophilic photocatalytic surface according to the above item, wherein the organic solvent according to the item 7 is ethanol or normal propyl alcohol.
【００１９】また、上記課題を解決するために請求項１
０記載の親水性の光触媒性表面を備えた複合材基材と光
触媒材料の間に接着層がアクリル変性シリコンである請
求項７に記載の親水性の光触媒性表面を備えた複合材で
あることを特徴とする。[0019] In order to solve the above-mentioned problems, a first aspect is provided.
The composite material having a hydrophilic photocatalytic surface according to claim 7, wherein the adhesive layer is an acrylic-modified silicon between the composite material substrate having a hydrophilic photocatalytic surface and the photocatalytic material according to claim 0. It is characterized by.
【００２０】また、上記課題を解決するために請求項１
１に記載の親水性の光触媒性表面を備えた複合材におい
て基材が樹脂である請求項７に記載の親水性の光触媒性
表面を備えた複合材であることを特徴とする。[0020] In order to solve the above-mentioned problems, a first aspect is provided.
The composite material having a hydrophilic photocatalytic surface according to claim 1, wherein the substrate is a resin, wherein the composite material is provided with a hydrophilic photocatalytic surface according to claim 7.
【００２１】また、上記課題を解決するために請求項１
２に記載の親水性の光触媒性表面を備えた複合材におい
て基材がポリエチレンテレフタレートである請求項７に
記載の親水性の光触媒性表面を備えた複合材であること
を特徴とする。[0021] In order to solve the above-mentioned problems, a first aspect is provided.
The composite material having a hydrophilic photocatalytic surface according to claim 7, wherein the base material is polyethylene terephthalate in the composite material having a hydrophilic photocatalytic surface according to claim 2.
【００２２】また、上記課題を解決するために請求項１
３に記載の光触媒性親水性コーティング組成物は光触媒
性材料と溶解度パラメーターが９から１４．８の間の有
機溶剤を含むことを特徴とする。[0022] In order to solve the above-mentioned problems, a first aspect is provided.
The photocatalytic hydrophilic coating composition according to item 3, is characterized by comprising a photocatalytic material and an organic solvent having a solubility parameter between 9 and 14.8.
【００２３】また、上記課題を解決するために請求項１
４に記載の光触媒性親水性コーティング組成物は光触媒
性材料と溶解度パラメーターが９から１４．８の間の有
機溶剤とシリコーンとを含むことを特徴とする。[0023] In order to solve the above-mentioned problems, a first aspect is provided.
The photocatalytic hydrophilic coating composition according to item 4, is characterized by comprising a photocatalytic material, an organic solvent having a solubility parameter between 9 and 14.8, and silicone.
【００２４】また、上記課題を解決するために請求項１
５に記載の光触媒性親水性コーティング組成物は請求項
１３記載の有機溶剤がエタノールまたはノルマルプロピ
ルアルコールであることを特徴とする。[0024] In order to solve the above-mentioned problems, a first aspect is provided.
The photocatalytic hydrophilic coating composition according to the fifth aspect is characterized in that the organic solvent according to the thirteenth aspect is ethanol or normal propyl alcohol.
【００２５】また、上記課題を解決するために請求項１
６記載の光触媒性親水性コーティング組成物は請求項１
３記載の基材と光触媒性材料の間に接着層がアクリル変
性シリコンであることを特徴とする。[0025] In order to solve the above-mentioned problems, a first aspect is provided.
6. The photocatalytic hydrophilic coating composition according to claim 6, wherein
3. The adhesive layer between the substrate and the photocatalytic material according to item 3 is acrylic-modified silicon.
【００２６】また、上記課題を解決するために請求項１
７に記載の光触媒性親水性コーティング組成物は請求項
１３に基材が樹脂であることを特徴とする。[0026] In order to solve the above-mentioned problems, a first aspect is provided.
The photocatalytic hydrophilic coating composition according to the seventh aspect is characterized in that the substrate is a resin according to the thirteenth aspect.
【００２７】また、上記課題を解決するために請求項１
８に記載の光触媒性親水性コーティング組成物は請求項
１３記載の基材がポリエチレンテレフタレートであるこ
とを特徴とする。[0027] In order to solve the above-mentioned problems, a first aspect is provided.
The photocatalytic hydrophilic coating composition according to claim 8, wherein the substrate according to claim 13 is polyethylene terephthalate.
【００２８】[0028]
【発明の実施の形態】本発明に示される光触媒とは伝導
電子帯と価電子との間のエネルギーギャップよりも大き
なエネルギー（すなわち短い波長）の光（励起光）を照
射したときに価電子中の電子の励起（光励起）によっ
て、伝導電子と正孔を生成しうるものをいい、アナター
ゼ型酸化チタン、ルチル型酸化チタン、酸化錫、酸化亜
鉛、三酸化二ビスマス、三酸化タングステン、酸化第二
鉄、チタン酸ストロンチウム等が利用可能である。BEST MODE FOR CARRYING OUT THE INVENTION The photocatalyst shown in the present invention is characterized in that when irradiated with light (excitation light) having an energy (ie, shorter wavelength) larger than the energy gap between the conduction electron band and the valence electrons, That can generate conduction electrons and holes by the excitation of electrons (photoexcitation), such as anatase-type titanium oxide, rutile-type titanium oxide, tin oxide, zinc oxide, bismuth trioxide, tungsten trioxide, and secondary oxide Iron, strontium titanate and the like can be used.
【００２９】光触媒の光励起に用いる光源としては蛍光
灯、白熱電灯、メタルハライドランプ、水銀ランプのよ
うな室内照明、太陽光それらの光源からの光を低損失の
ファイバーで誘導した光源等がりようできる。The light source used for photoexcitation of the photocatalyst may be a room light such as a fluorescent lamp, an incandescent lamp, a metal halide lamp, or a mercury lamp, or a light source in which light from the light source is guided by a low-loss fiber.
【００３０】光触媒の光励起により基材表面が高度に親
水化させるためには、励起光の照度は０．００１ｍＷ／
ｃｍ2以上あればよいが、０．０１ｍＷ／ｃｍ2以上だと
好ましく、０．１ｍＷ／ｃｍ2以上だとより好ましい。In order to make the substrate surface highly hydrophilic by photoexcitation of the photocatalyst, the illuminance of the excitation light is 0.001 mW /
cm 2 suffices above, but preferably that it 0.01 mW / cm 2 or more, and more preferably it 0.1 mW / cm 2 or more.
【００３１】アクリル変性シリコンはアクリル樹脂とシ
リコーン樹脂と複合化し、ブロック共重合させたもの、
グラフト重合させたもの、ポリメタクリレート樹脂とシ
リコーン樹脂を複合化させたもの等である。樹脂中のシ
リコン成分の含有量は、光触媒による酸化劣化に対して
強固であれば良いが、５％から８０％が好ましく、中で
も１０％から６０％が特に好ましい。表面硬度を高めた
り、柔軟性を高める目的でアクリル変性シリコン中にシ
リカを添加したり、アクリル変性シリコンを２種以上混
合したり、シリコーン系樹脂を添加してもよい。ここに
用いるシリコーン系樹脂はシリコーン樹脂、アルキド変
性シリコン、ウレタン変性シリコン、ポリエステル変性
シリコン、エポキシ変性シリコン等が利用できる。アク
リル変性シリコンを光触媒性材料表面と基材の間に介す
ることで、基材と表面層の密着性が向上する。この傾向
は特に基材がプラスチックの場合において顕著である。
また、アクリル変性シリコンを介することで、基材がプ
ラスチックのように酸化により劣化されやすい物質から
なる場合でも、光触媒性材料層と基材とが直接接触する
ことがなく好ましい。アクリル変性シリコンは光安定剤
を混合すると耐久性の向上に効果がある。光安定剤とし
てはヒンダードアミン系、トリアゾール等の紫外線吸収
剤を単独、あるいは混合して利用することができる。ア
クリル変性シリコンの膜形成方法としてはバーコート、
フローコート、スプレーコートなど塗料の一般的な塗布
方法と同様な方法が可能である。熱処理により硬化させ
ることも可能であり、常温にて硬化させることも可能で
ある。尚、接着層としてはアクリル変性シリコン以外
に、アルキド変性シリコン、ウレタン変性シリコン、ポ
リエステル変性シリコン、エポキシ変性シリコン等が使
用できる。Acrylic-modified silicone is obtained by compounding an acrylic resin and a silicone resin and subjecting them to block copolymerization.
Examples thereof include those obtained by graft polymerization and those obtained by compounding a polymethacrylate resin and a silicone resin. The content of the silicon component in the resin is not particularly limited as long as it is strong against oxidative deterioration caused by the photocatalyst, but is preferably 5% to 80%, and particularly preferably 10% to 60%. For the purpose of increasing the surface hardness or the flexibility, silica may be added to the acryl-modified silicon, two or more acryl-modified silicons may be mixed, or a silicone resin may be added. As the silicone resin used here, silicone resin, alkyd-modified silicone, urethane-modified silicone, polyester-modified silicone, epoxy-modified silicone and the like can be used. By interposing the acryl-modified silicon between the photocatalytic material surface and the substrate, the adhesion between the substrate and the surface layer is improved. This tendency is particularly remarkable when the substrate is plastic.
Further, it is preferable that the photocatalytic material layer and the substrate do not come into direct contact with each other even when the substrate is made of a substance which is easily degraded by oxidation, such as plastic, via the acryl-modified silicon. Acrylic-modified silicon is effective in improving durability when mixed with a light stabilizer. As the light stabilizer, an ultraviolet absorber such as a hindered amine or triazole can be used alone or as a mixture. Bar coating is used as the method of forming the acrylic-modified silicon film.
A method similar to a general method of applying a paint such as a flow coat or a spray coat can be used. Curing by heat treatment is also possible, and curing at room temperature is also possible. In addition, besides acrylic-modified silicon, alkyd-modified silicon, urethane-modified silicon, polyester-modified silicon, epoxy-modified silicon and the like can be used as the adhesive layer.
【００３２】本発明の好ましい形態においては、表面層
にさらにシリカあるいはシリコーンが含有されているよ
うにする。シリカあるいはシリコーンが含有されてるこ
とにより、表面の水との接触角が０度に近い高度の親水
性を呈しやすくなるとともに、暗所に保持したときの親
水性の維持性が向上する。その理由はシリカは構造中に
水を蓄えることができることと関係し、シリコーンはシ
リコーン中のケイ素原子に結合する有機基の少なくとも
一部が水酸基に置換され、その上に物理吸着水層が形成
されることによると考えられる。In a preferred embodiment of the present invention, the surface layer further contains silica or silicone. By containing silica or silicone, the surface can easily exhibit a high degree of hydrophilicity at which the contact angle with water is close to 0 °, and the maintainability of the hydrophilicity when held in a dark place is improved. The reason is related to the fact that silica can store water in its structure, and silicone has a structure in which at least a part of the organic groups bonded to the silicon atoms in the silicone are replaced by hydroxyl groups, on which a physically adsorbed water layer is formed. It is thought that it depends.
【００３３】本発明の光触媒性材料を含む表面層にシリ
カ及び／又はケイ素原子に結合する有機基の少なくとも
一部が水酸基に置換されたシリコ−ンが含有されること
により、暗所における親水維持性能が向上する。The surface layer containing the photocatalytic material of the present invention contains silica in which at least a part of the organic groups bonded to silica and / or silicon atoms are substituted with hydroxyl groups, thereby maintaining hydrophilicity in a dark place. Performance is improved.
【００３４】ケイ素原子に結合する有機基の少なくとも
一部が水酸基に置換されたシリコ−ンとしては、加水分
解性シラン、アルキルシリケ−ト、それらの（部分）加
水分解物、加水分解・縮合物などが使用できる。ここで
加水分解性シランとしては、メチルトリメトキシシラ
ン、エチルトリメトキシシラン、メチルトリエトキシシ
ラン、エチルトリエトキシシラン、メチルトリプロポキ
シシラン、エチルトリプロポキシシラン、ｎ−プロピル
トリメトキシシラン、ｎ−プロピルトリエトキシシラ
ン、ｎ−プロピルトリプロポキシシラン、イソプロピル
トリメトキシシラン、イソプロピルトリエトキシシラ
ン、イソプロピルトリプロポキシシラン、メチルトリブ
トキシシラン、エチルトリブトキシシラン、ｎ−プロピ
ルブトキシシラン、イソプロピルブトキシシラン、フェ
ニルトリメトキシシラン、フェニルトリエトキシシラ
ン、フェニルトリプロポキシシラン、フェニルトリブト
キシシラン、γ−グリシドキシプロピルトリメトキシシ
ラン、γ−グリシドキシプロピルトリエトキシシラン、
γ−グリシドキシプロピルトリプロポキシシラン、γ−
メタクリロキシプロピルトリメトキシシラン、γ−メタ
クリロキシプロピルトリエトキシシラン、γ−メタクリ
ロキシプロピルトリプロポキシシラン、β−（３、４−
エポキシシクロヘキシル）エチルトリメトキシシラン、
β−（３、４−エポキシシクロヘキシル）エチルトリエ
トキシシラン、γ−アミノプロピルトリメトキシシラ
ン、γ−アミノプロピルトリエトキシシラン、γ−メル
カプトプロピルトリメトキシシラン、γ−メルカプトプ
ロピルトリエトキシシラン、トリフルオロプロピルトリ
メトキシシラン、トリフルオロプロピルトリエトキシシ
ラン、フェニルメチルジエトキシシラン、ジメチルジメ
トキシシラン、ジメチルジエトキシシラン、ジエチルジ
エトキシシラン、フェニルメチルジメトキシシラン、ジ
フェニルジメトキシシラン、ジフェニルジエトキシシラ
ン等の加水分解性オルガノシラン、テトラエトキシシラ
ン、テトライソプロポキシシラン、テトラｎ−プロポキ
シシラン、テトラブトキシシラン、テトラメトキシシラ
ン、ジメトキシジエトキシシラン等のテトラアルコキシ
シランなどが使用できる。アルキルシリケ−トとして
は、メチルシリケ−ト、エチルシリケ−ト、プロピルシ
リケ−ト、ブチルシリケ−トなどが使用できる。Examples of the silicone in which at least a part of the organic group bonded to the silicon atom is substituted with a hydroxyl group include hydrolyzable silanes, alkyl silicates, (partial) hydrolysates thereof, hydrolyzates / condensates, etc. Can be used. Here, as the hydrolyzable silane, methyltrimethoxysilane, ethyltrimethoxysilane, methyltriethoxysilane, ethyltriethoxysilane, methyltripropoxysilane, ethyltripropoxysilane, n-propyltrimethoxysilane, n-propyltrimethoxysilane Ethoxysilane, n-propyltripropoxysilane, isopropyltrimethoxysilane, isopropyltriethoxysilane, isopropyltripropoxysilane, methyltributoxysilane, ethyltributoxysilane, n-propylbutoxysilane, isopropylbutoxysilane, phenyltrimethoxysilane, Phenyltriethoxysilane, phenyltripropoxysilane, phenyltributoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxy Cypropyltriethoxysilane,
γ-glycidoxypropyltripropoxysilane, γ-
Methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-methacryloxypropyltripropoxysilane, β- (3,4-
Epoxycyclohexyl) ethyltrimethoxysilane,
β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, trifluoropropyl Hydrolyzable organos such as trimethoxysilane, trifluoropropyltriethoxysilane, phenylmethyldiethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldiethoxysilane, phenylmethyldimethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, etc. Silane, tetraethoxysilane, tetraisopropoxysilane, tetra-n-propoxysilane, tetrabutoxysilane, tetramethoxysilane, dimethoxydiethoxy Tetraalkoxysilanes such as silane can be used. As the alkyl silicate, methyl silicate, ethyl silicate, propyl silicate, butyl silicate and the like can be used.
【００３５】本発明の光触媒性材料を含む表面層には、
他の無機酸化物も添加できる。無機酸化物としてはセリ
ア、ジルコニア、アルミナ、無定型酸化チタン、酸化
錫、マグネシア、カルシア、イットリア、酸化マンガ
ン、クロミア、酸化バナジウム、酸化銅、酸化コバル
ト、酸化ニッケル、酸化ルテニウム、ハフニア、酸化ス
トロンチウム、酸化銀の群から選ばれる１種又は２種以
上等が挙げられる。これら無機酸化物は充填剤として被
膜の強度を向上させる。さらに、このうちジルコニアを
添加すると耐水性が向上する。またアルミナ、セリア、
イットリアを添加すると暗所親水維持性が向上する。ま
た酸化ルテニウム、酸化銅を添加すると酸化還元力が向
上する。また、酸化銀、酸化銅を添加すると抗菌性が向
上する。The surface layer containing the photocatalytic material of the present invention includes:
Other inorganic oxides can also be added. As inorganic oxides, ceria, zirconia, alumina, amorphous titanium oxide, tin oxide, magnesia, calcia, yttria, manganese oxide, chromia, vanadium oxide, copper oxide, cobalt oxide, nickel oxide, ruthenium oxide, hafnia, strontium oxide, One or two or more selected from the group of silver oxides may be mentioned. These inorganic oxides improve the strength of the coating as a filler. Further, when zirconia is added, the water resistance is improved. Also alumina, ceria,
Addition of yttria improves the hydrophilicity in a dark place. The addition of ruthenium oxide or copper oxide improves the redox power. The addition of silver oxide or copper oxide improves antibacterial properties.
【００３６】本発明の光触媒性材料を含む表面層には、
銀、銅、パラジウム、白金、ロジウム、プラチウム、ル
テニウム、金、亜鉛、コバルト、鉄、ニッケル、ナトリ
ウム、リチウム、ストロンチウム、カリウム、カルシウ
ム、マグネシウム又はそれら金属の化合物の群から選ば
れる１種以上が添加してもよい。銀、銅、亜鉛又はそれ
ら金属の化合物の群から選ばれる１種以上を添加するこ
とで、抗菌性を付与することができる。パラジウム、白
金、ロジウム、プラチウム、ルテニウム、金、コバル
ト、鉄、ニッケル又はそれら金属の化合物の群から選ば
れる１種以上を添加することで、光半導体の光励起によ
る酸化還元触媒性能を向上させることができる。ナトリ
ウム、リチウム、ストロンチウム、カリウム、カルシウ
ム、マグネシウム又はそれら金属の化合物の群から選ば
れる１種以上を添加することで、光半導体の光励起に応
じた親水化性能を向上させることができる。The surface layer containing the photocatalytic material of the present invention includes:
One or more selected from the group consisting of silver, copper, palladium, platinum, rhodium, platinum, ruthenium, gold, zinc, cobalt, iron, nickel, sodium, lithium, strontium, potassium, calcium, magnesium or compounds of these metals May be. Antibacterial properties can be imparted by adding at least one selected from the group consisting of silver, copper, zinc and compounds of these metals. By adding at least one selected from the group consisting of palladium, platinum, rhodium, platinum, ruthenium, gold, cobalt, iron, nickel or a compound of these metals, it is possible to improve the oxidation-reduction catalytic performance of the optical semiconductor by photoexcitation. it can. By adding at least one selected from the group consisting of sodium, lithium, strontium, potassium, calcium, magnesium and a compound of these metals, the hydrophilicity of the optical semiconductor according to photoexcitation can be improved.
【００３７】本発明で使用される有機溶剤は溶解度パラ
メーターが９から１４．８のものが有効である。９以下
の場合密着性が得られるが親水化性能が得られることが
できず、１４．８より大きい場合親水化性能が得られる
が、密着性はほとんど得られないことが知見として得ら
れている。As the organic solvent used in the present invention, those having a solubility parameter of 9 to 14.8 are effective. When the value is 9 or less, the adhesion is obtained, but the hydrophilicity cannot be obtained. When the value is more than 14.8, the hydrophilicity can be obtained, but the adhesion is hardly obtained. .
【００３８】この有機溶剤としては酢酸エチル、ブチラ
ール、ベンゼン、テトラヒドロフラン、トリクロロエチ
レン、メチルエチルケトン、クロロホルム、、メチルイ
ソブチルケトン、テトラクロルエタン、酢酸メチル、イ
ソアミルアルコール、塩化メチレン、アセトン、セロソ
ルブ、ピリジン、ニトロエタン、ｎ−ブタノール、ノル
マルプロピルアルコール、イソプロピルアルコール、ア
セトニトリル、アニリン、ジメチルホルムアミド、酢
酸、エタノール、エチレングリコール、メタノール等が
使用可能である。Examples of the organic solvent include ethyl acetate, butyral, benzene, tetrahydrofuran, trichloroethylene, methyl ethyl ketone, chloroform, methyl isobutyl ketone, tetrachloroethane, methyl acetate, isoamyl alcohol, methylene chloride, acetone, cellosolve, pyridine, nitroethane, n -Butanol, normal propyl alcohol, isopropyl alcohol, acetonitrile, aniline, dimethylformamide, acetic acid, ethanol, ethylene glycol, methanol and the like can be used.
【００３９】塗布に際して環境、基材の設置条件などに
より有機溶剤は単独の場合でも、２種以上の混合の使用
でも可能である。なかでもエタノール、ノルマルプロピ
ルアルコールを有機溶剤と使用した場合表面層での水と
の接触角を０度に近い高度の親水性を呈しやすくなり、
密着性も兼ね備えた性能を呈する。この理由はエタノー
ル、ノルマルプロピルアルコールを使用した場合、接着
層に適度に溶解することで、密着性と親水性を兼ね備え
たものとなるためと考えられる。The organic solvent may be used alone or in a mixture of two or more kinds depending on the environment, the installation conditions of the substrate and the like at the time of coating. Above all, when ethanol and normal propyl alcohol are used as an organic solvent, the contact angle with water in the surface layer tends to exhibit a high degree of hydrophilicity close to 0 degrees,
It exhibits performance that also has adhesion. It is considered that the reason for this is that when ethanol and normal propyl alcohol are used, they can have both adhesion and hydrophilicity by being appropriately dissolved in the adhesive layer.
【００４０】本発明が適用可能な基材としての材質は、
例えば金属、セラミックス、ガラス、プラスチックス、
木、石、セメント、コンクリート、繊維、布、それらの
組合せ、それらの積層体が好適に利用できる。適用可能
な基材を用途でいえば、建材、建物外装、建物内装、窓
枠、窓ガラス、構造部材、乗り物の外装、および塗装、
機械装置や物品の外装、防塵カバー、および塗装、交通
標識、各種表示装置、広告塔、道路用防音壁、鉄道用防
音壁、橋梁、ガードレールの外装、および塗装、トンネ
ル内装、および塗装、碍子、太陽電池カバー、太陽熱温
水器集熱カバー、ビニールハウス、車両用照明灯のカバ
ー、住宅設備、便器、浴槽、洗面台、照明器具、照明カ
バー、台所用品、食器、食器洗浄機、食器乾燥機、流
し、調理レンジ、キッチンフード、換気扇、および上記
物品表面に貼付させるためのフィルムを含む。The material as a substrate to which the present invention can be applied is
For example, metals, ceramics, glass, plastics,
Wood, stone, cement, concrete, fiber, cloth, combinations thereof, and laminates thereof can be suitably used. Speaking of applicable substrates, applications include building materials, building exteriors, building interiors, window frames, windowpanes, structural members, vehicle exteriors, and painting,
Exterior of machinery and equipment, dust cover, and paint, traffic signs, various display devices, advertising towers, road noise barriers, railway noise barriers, bridges, guard rail exteriors and paint, tunnel interiors, paint, insulators, Solar battery cover, solar water heater heat collecting cover, greenhouse, vehicle lighting cover, housing equipment, toilet bowl, bathtub, wash basin, lighting fixture, lighting cover, kitchenware, tableware, dishwasher, dish dryer, Includes sinks, cooking ranges, kitchen hoods, ventilation fans, and films for application to the surface of the article.
【００４１】[0041]
【実施例】実施例１ 光触媒層用の塗料は以下の要領で準備を行う。光触媒性
材料としてはＴｉＯ2（昭和電工製 ＦＴ−１ 固形分
１０％）を使用し、ＳｉＯ2はエチルシリケート（コル
コート製 ＥＳ４０）をメタノール、硝酸にて加水分解
したものを用いる。エチルシリケート（コルコート製
ＥＳ４０）の加水分解は以下の要領で行う。エチルシリ
ケート（コルコート製 ＥＳ４０）を６．０ｇ、メタノ
ール（ＪＩＳ試薬特級）４４．７ｇ、２％硝酸水溶液
（試薬特級） ９．３ｇの混合物を３０℃で保温し、５
時間攪拌したものを用いる。ＴｉＯ2（昭和電工製 Ｆ
Ｔ−１ 固形分１０％）を４０ｇ、ＳｉＯ2を２５ｇ、
希釈溶剤としてエチルアルコールを４３５ｇの重量比に
て混合する。これらの混合物をさらに３０℃で保温し、
２時間攪拌し光触媒用塗料とした。光触媒用塗料はすべ
て固形分を１．０％、ＴｉＯ２とＳｉＯ２の重量比は
４：１とした。Example 1 A coating material for a photocatalyst layer is prepared in the following manner. As a photocatalytic material, TiO 2 (FT-1 solid content 10%, manufactured by Showa Denko) is used, and SiO 2 is obtained by hydrolyzing ethyl silicate (ES40, manufactured by Colcoat) with methanol and nitric acid. Ethyl silicate (Colcoat made
The hydrolysis of ES40) is performed as follows. A mixture of 6.0 g of ethyl silicate (ES40 manufactured by Colcoat), 44.7 g of methanol (special grade of JIS reagent) and 9.3 g of a 2% aqueous nitric acid solution (special grade of reagent) was kept at 30 ° C.
Use what was stirred for hours. TiO 2 (Showa Denko F
T-1 10% solids) and 40 g, a SiO 2 25 g,
Ethyl alcohol is mixed at a weight ratio of 435 g as a diluting solvent. The mixture is further incubated at 30 ° C.
The mixture was stirred for 2 hours to obtain a coating for photocatalyst. All the photocatalyst paints had a solid content of 1.0% and a weight ratio of TiO2 to SiO2 of 4: 1.
【００４２】接着層塗料の調整を以下の要領で準備す
る。シリコン成分量１０〜２０％、アクリル成分量８０
〜９０％のアクリルシリコン塗料（鐘淵化学製 ゼムラ
ック ＹＣ３９１８）を有機スズ系硬化触媒（鐘淵化学
製、 ＢＴ１２０Ｓ）と重量比で１０：１となるように
計りとり、接着層塗料とする。Preparation of the adhesive layer paint is prepared in the following manner. Silicon component amount 10-20%, acrylic component amount 80
A 90% acrylic silicone paint (Zemurac YC3918 manufactured by Kane-buchi Chemical Co., Ltd.) is weighed out with an organotin-based curing catalyst (BT120S manufactured by Kane-buchi Chemical Co., Ltd.) so as to have a weight ratio of 10: 1 to obtain an adhesive layer paint.
【００４３】試験片の作成 １００ミリ角に裁断したＰＥＴフィルム（ダイアホイル
ヘキスト製、Ｓ１００）に上記のように調整した接着層
を塗布する。塗布の方法はバーコート、フローコート、
スプレーコートなど塗料の一般的な塗布方法と同様な方
法が可能である。接着層を塗布したＰＥＴフィルムを１
００℃の空気中で２０分間乾燥する。室温まで冷却させ
てから、表１で調整した光触媒塗料をバーコート方によ
り塗布する。光触媒塗料を塗布したＰＥＴフィルムを１
２０℃の空気中で３０分で乾燥させ、実施例１の試験片
を得た。Preparation of Test Piece An adhesive layer adjusted as described above is applied to a PET film (manufactured by Diafoil Hoechst, S100) cut into a 100 mm square. The method of application is bar coating, flow coating,
A method similar to a general method of applying a paint such as a spray coat can be used. 1 PET film coated with adhesive layer
Dry in air at 00 ° C. for 20 minutes. After cooling to room temperature, the photocatalyst paint prepared in Table 1 is applied by a bar coating method. 1 PET film coated with photocatalytic paint
The test piece of Example 1 was obtained by drying in air at 20 ° C. for 30 minutes.
【００４４】実施例２〜５ 実施例２〜５は、実施例１の光触媒層用の塗料に使用す
る希釈溶剤が異なる以外は、実施例１の試験片の作成と
同一である。実施例２は希釈溶剤としてメチルアルコー
ルを、 実施例３はイソプロピルアルコールを、実施例
４はノルマルプロピルアルコールを、実施例５はジアセ
トンアルコールを、実施例１と同様の４３５ｇ使用す
る。Examples 2 to 5 Examples 2 to 5 are the same as the preparation of the test piece of Example 1 except that the diluting solvent used for the coating for the photocatalyst layer of Example 1 is different. Example 2 uses methyl alcohol as a diluting solvent, Example 3 uses isopropyl alcohol, Example 4 uses normal propyl alcohol, Example 5 uses diacetone alcohol, and uses 435 g as in Example 1.
【００４５】比較例１〜２ 比較例１は、実施例１の光触媒層用の塗料に使用する希
釈溶剤を水を４３５ｇとした以外は、実指例１の試験片
の作成と同一である。比較例１は、実施例１の光触媒層
用の塗料に使用する希釈溶剤をキシレンを４３５ｇとし
た以外は、実指例１の試験片の作成と同一である。Comparative Examples 1 and 2 Comparative Example 1 was the same as the preparation of the test piece of Actual Example 1, except that 435 g of water was used as the diluting solvent used for the coating for the photocatalyst layer of Example 1. Comparative Example 1 is the same as the preparation of the test piece of Actual Example 1 except that xylene was used as the diluting solvent for the photocatalyst layer coating material of Example 1 and 435 g of xylene.
【００４６】親水性の評価 作成した試験片の親水性を水との接触角により評価し
た。なお接触角測定には協和界面科学製 ＣＸ−１５０
を使用した。試験片は紫外線（ＢＬＢランプにより紫外
線照度１．０ｍＷ／ｃｍ2） を２４時間照射した後の水
との接触角とした。Evaluation of hydrophilicity The hydrophilicity of the prepared test piece was evaluated by the contact angle with water. The contact angle was measured by Kyowa Interface Science CX-150.
It was used. The test piece had a contact angle with water after being irradiated with ultraviolet rays (ultraviolet illuminance 1.0 mW / cm 2 by a BLB lamp) for 24 hours.
【００４７】密着性の評価 作成した試験片の基材（ＰＥＴフィルム）との密着性を
以下のように評価した。作成した試験片の塗装膜の上か
らカッターで1ｍｍ幅の碁盤目の切り込みを入れる。大
きさは１ｃｍ角にし、碁盤目の数を１００個とする。そ
の後その碁盤目を完全に覆うようにセロハンテープを貼
付ける。その後すばやく引き剥がして、付着して残って
いる碁盤目の数を数える。密着性の指標としては引き剥
がした後に付着している碁盤目の数／１００（初期の碁
盤目の数）で表すものとする。各試験片の親水化性能、
密着性能を表１に示す。Evaluation of Adhesion The adhesion of the prepared test piece to the substrate (PET film) was evaluated as follows. A 1-mm-wide cross cut is made with a cutter from above the coating film of the prepared test piece. The size is 1 cm square, and the number of grids is 100. After that, a cellophane tape is stuck so as to completely cover the grid. After that, peel off quickly and count the number of grids remaining on the grid. The index of adhesion is represented by the number of grids attached after peeling / 100 (the number of initial grids). Hydrophilization performance of each test piece,
Table 1 shows the adhesion performance.
【００４８】[0048]
【表１】 [Table 1]
【００４９】この表１によりエタノールが最も水との接
触角が低く、密着性が高いことがが確認できた。キシレ
ンでは高い密着性が得られるが、親水性は全く得られな
いことが確認できた。水を溶媒に用いると親水性は得ら
れるものの密着性は全く得られなかった。From this Table 1, it was confirmed that ethanol has the lowest contact angle with water and the highest adhesiveness. It was confirmed that xylene provided high adhesiveness but no hydrophilicity. When water was used as the solvent, hydrophilicity was obtained, but no adhesion was obtained.
【００５０】実施例６ 光触媒層用の塗料は以下の要領で準備を行う。光触媒性
材料としてはＴｉＯ2（日産化学製 ＴＡ−１５ 固形
分１５％）を使用し、ＳｉＯ2はエチルシリケート（コ
ルコート製 ＥＳ４０）をメタノール、硝酸にて加水分
解したものを用いる。エチルシリケート（コルコート製
ＥＳ４０）の加水分解は以下の要領で行う。エチルシ
リケート（コルコート製 ＥＳ４０）を６．０ｇ、メタ
ノール（ＪＩＳ試薬特級）４４．７ｇ、２％硝酸水溶液
（試薬特級） ９．３ｇの混合物を３０℃で保温し、５
時間攪拌したものを用いる。ＴｉＯ2（日産化学製 Ｔ
Ａ−１５ 固形分１５％）を２７ｇ、ＳｉＯ2を２５
ｇ、希釈溶剤としてエチルアルコールを４８．４ｇの重
量比にて混合する。これらの混合物をさらに３０℃で保
温し、２時間攪拌し光触媒用塗料とした。光触媒用塗料
はすべて固形分を５．０％、ＴｉＯ２とＳｉＯ２の重量
比は４：１とした。接着層塗料の調整を以下の要領で準
備する。シリコン成分量１０〜２０％、アルキド樹脂成
分量８０〜９０％のアルキド変性シリコン塗料（東レダ
ウコーニングシリコーン製 ＳＲ２１１４）を接着層塗
料とする。Example 6 A paint for a photocatalyst layer is prepared in the following manner. As the photocatalytic material, TiO 2 (TA-15 manufactured by Nissan Chemical Co., Ltd., solid content: 15%) is used, and SiO 2 obtained by hydrolyzing ethyl silicate (ES40 manufactured by Colcoat) with methanol and nitric acid is used. Hydrolysis of ethyl silicate (ES40 manufactured by Colcoat) is performed in the following manner. A mixture of 6.0 g of ethyl silicate (ES40 manufactured by Colcoat), 44.7 g of methanol (JIS reagent special grade) and 9.3 g of a 2% aqueous nitric acid solution (reagent special grade) was kept at 30 ° C.
Use what was stirred for hours. TiO 2 (Nissan Chemical T
A-15 (solid content 15%) 27 g, SiO 2 25
g, 48.4 g of ethyl alcohol as a diluting solvent are mixed at a weight ratio of 48.4 g. The mixture was further kept at 30 ° C. and stirred for 2 hours to obtain a coating for photocatalyst. All the photocatalyst paints had a solid content of 5.0% and a weight ratio of TiO2 to SiO2 of 4: 1. The preparation of the adhesive coating is prepared as follows. An alkyd-modified silicone paint (SR2114 manufactured by Dow Corning Toray Silicone) having a silicon component amount of 10 to 20% and an alkyd resin component amount of 80 to 90% is used as the adhesive layer paint.
【００５１】実施例７〜１０ 実施例７〜１０は、実施例１の光触媒層用の塗料に使用
する希釈溶剤が異なる以外は、実施例１の試験片の作成
と同一である。実施例７は希釈溶剤としてアセトンを、
実施例８はメチルアルコールを、実施例９はノルマル
プロピルアルコールを、実施例１０はジアセトンアルコ
ールを、実施例６と同様の４８．４ｇ使用する。Examples 7 to 10 Examples 7 to 10 are the same as the preparation of the test piece of Example 1 except that the diluting solvent used for the coating for the photocatalyst layer of Example 1 is different. Example 7 used acetone as a diluting solvent,
Example 8 uses methyl alcohol, Example 9 uses normal propyl alcohol, Example 10 uses diacetone alcohol, and 48.4 g as in Example 6.
【００５２】比較例３〜４ 比較例３は、実施例６の光触媒層用の塗料に使用する希
釈溶剤を水を４４．８ｇとした以外は、実施例１の試験
片の作成と同一である。比較例４は、実施例１の光触媒
層用の塗料に使用する希釈溶剤をエチルエーテルを４
４．８ｇとした以外は、実施例１の試験片の作成と同一
である。水との接触角、密着性を表２に示す。Comparative Examples 3 and 4 Comparative Example 3 was the same as the preparation of the test piece of Example 1 except that water was used as the diluting solvent for the photocatalyst layer coating material of Example 6 and 44.8 g of water. . In Comparative Example 4, ethyl ether was used as the diluent solvent used in the coating for the photocatalyst layer of Example 1.
It is the same as the preparation of the test piece of Example 1 except that it was 4.8 g. Table 2 shows the contact angle with water and the adhesion.
【００５３】[0053]
【表２】 [Table 2]
【００５４】この表２によりエタノールが最も水との接
触角が低く、密着性が高いことがが確認できた。エチル
エーテルでは高い密着性が得られるが、親水性は全く得
られないことが確認できた。水を溶媒に用いると親水性
は得られるものの密着性は全く得られなかった。From Table 2, it was confirmed that ethanol had the lowest contact angle with water and the highest adhesiveness. It was confirmed that ethyl ether provided high adhesiveness but no hydrophilicity. When water was used as the solvent, hydrophilicity was obtained, but no adhesion was obtained.
【００５５】[0055]
【発明の効果】接着層に光触媒層を塗布する際に光触媒
塗料の溶剤を接着層の溶解度パラメーターを９から１
４．８の間の有機溶剤を用いることで密着性の高い光触
媒材料を簡便に得ることが可能となった。光触媒塗料の
溶剤を接着層の溶解度パラメーターを９から１４．８の
間の有機溶剤を用いて得られた光触媒材料の密着性は溶
解度パラメーターが１４．８より大きいものと比較し、
格段に向上することが可能となり、親水化性能について
は溶解度パラメーターが９以下のものと比較し、格段に
向上することが可能となった。When the photocatalyst layer is applied to the adhesive layer, the solvent of the photocatalytic paint is adjusted to a solubility parameter of the adhesive layer of 9 to 1.
The use of an organic solvent having a molecular weight of 4.8 makes it possible to easily obtain a photocatalytic material having high adhesion. The adhesion of the photocatalytic material obtained using an organic solvent having a solubility parameter of the adhesive layer between 9 and 14.8 as a solvent of the photocatalytic paint was compared with that of a solvent having a solubility parameter of greater than 14.8.
It was possible to significantly improve, and it became possible to significantly improve the hydrophilicity performance as compared with those having a solubility parameter of 9 or less.
フロントページの続き (51)Int.Cl.6 識別記号 ＦＩ Ｂ３２Ｂ 9/00 Ｂ３２Ｂ 9/00 Ａ Ｃ０８Ｊ 7/04 ＣＦＤ Ｃ０８Ｊ 7/04 ＣＦＤＴ 7/06 7/06 Ｚ Ｃ０９Ｄ 1/00 Ｃ０９Ｄ 1/00 183/07 183/07 Ｃ０９Ｊ 183/07 Ｃ０９Ｊ 183/07 Continued on the front page (51) Int.Cl. 6 Identification symbol FI B32B 9/00 B32B 9/00 A C08J 7/04 CFD C08J 7/04 CFDT 7/06 7/06 Z C09D 1/00 C09D 1/00 183 / 07 183/07 C09J 183/07 C09J 183/07
Claims (18)
製造方法であって、基材を準備する工程と、該基材の表
面に接着層を被覆する工程と、該接着層の表面に光触媒
性材料と溶解度パラメーターが９から１４．８の間の有
機溶剤とを含む光触媒性コーティング組成物を塗布する
工程、からなる製造方法。1. A method for producing a composite material having a hydrophilic photocatalytic surface, comprising: a step of preparing a substrate; a step of coating the surface of the substrate with an adhesive layer; Applying a photocatalytic coating composition comprising a photocatalytic material and an organic solvent having a solubility parameter of between 9 and 14.8 to the composition.
にさらにシリコーンを含んだことを特徴とする請求項１
記載の製造方法。2. The photocatalytic hydrophilic coating composition according to claim 1, further comprising silicone.
The manufacturing method as described.
プロピルアルコールあることを特徴とする請求項１又は
２記載の製造方法。3. The method according to claim 1, wherein the organic solvent is ethanol or normal propyl alcohol.
ることを特徴とする請求項１〜３記載の製造方法。4. The method according to claim 1, wherein said adhesive layer is made of acrylic-modified silicon.
請求項１〜４記載の製造方法。5. The method according to claim 1, wherein the substrate is a resin.
であることを特徴とする請求項５記載の製造方法。6. The method according to claim 5, wherein said base material is polyethylene terephthalate.
おいて、基材と、該基材の表面に被覆された接着層と、
該接着層の表面に被覆された光触媒性材料と溶解度パラ
メーターが９から１４．８の間の有機溶剤とを含む表面
層と、からなることを特徴とする光触媒性親水性複合
材。7. A composite material having a hydrophilic photocatalytic surface, comprising: a base material; an adhesive layer coated on the surface of the base material;
A photocatalytic hydrophilic composite material, comprising: a photocatalytic material coated on the surface of the adhesive layer; and a surface layer containing an organic solvent having a solubility parameter of 9 to 14.8.
ることを特徴とする請求項７記載の光触媒性親水性複合
材。8. The photocatalytic hydrophilic composite according to claim 7, wherein the surface layer further contains silicone.
プロピルアルコールあることを特徴とする請求項７又は
８記載の光触媒性親水性複合材。9. The photocatalytic hydrophilic composite according to claim 7, wherein the organic solvent is ethanol or normal propyl alcohol.
あることを特徴とする請求項７〜９記載の光触媒性親水
性複合材。10. The photocatalytic hydrophilic composite material according to claim 7, wherein said adhesive layer is made of acrylic-modified silicon.
る請求項７〜１０記載の光触媒性親水性複合材。11. The photocatalytic hydrophilic composite according to claim 7, wherein the substrate is a resin.
トであることを特徴とする請求項１１記載の光触媒性親
水性複合材。12. The photocatalytic hydrophilic composite according to claim 11, wherein said base material is polyethylene terephthalate.
に被覆するための光触媒性親水性コーティング組成物で
あって、光触媒性材料と溶解度パラメーターが９から１
４．８の間の有機溶剤とを含むことを特徴とする光触媒
性親水性コーティング組成物。13. A photocatalytic hydrophilic coating composition for coating the surface of a substrate on the surface of a coated adhesive layer, wherein the photocatalytic material and the solubility parameter are from 9 to 1.
4.8. A photocatalytic hydrophilic coating composition comprising between 4.8 and an organic solvent.
物がさらにシリコーンを含んでいることを特徴とする請
求項１３記載の光触媒性親水性コーティング組成物。14. The photocatalytic hydrophilic coating composition according to claim 13, wherein the photocatalytic hydrophilic coating composition further contains silicone.
ルプロピルアルコールあることを特徴とする請求項１３
又は１４記載の光触媒性親水性コーティング組成物。15. The organic solvent according to claim 13, wherein the organic solvent is ethanol or normal propyl alcohol.
Or the photocatalytic hydrophilic coating composition according to 14.
あることを特徴とする請求項１３〜１５記載の光触媒性
親水性コーティング組成物。16. The photocatalytic hydrophilic coating composition according to claim 13, wherein the adhesive layer is made of acrylic-modified silicon.
る請求項１３〜１６記載の光触媒性親水性コーティング
組成物。17. The photocatalytic hydrophilic coating composition according to claim 13, wherein the substrate is a resin.
トであることを特徴とする請求項１７記載の光触媒性親
水性コーティング組成物。18. The photocatalytic hydrophilic coating composition according to claim 17, wherein the substrate is polyethylene terephthalate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10363347A JPH11323194A (en) | 1998-03-18 | 1998-12-21 | Preparation process for a composite material having a hydrophilic photocatalytic surface, a photocatalytic hydrophilic composite material, and a photocatalytic hydrophilic coating composition |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10-89524 | 1998-03-18 | ||
| JP8952498 | 1998-03-18 | ||
| JP10363347A JPH11323194A (en) | 1998-03-18 | 1998-12-21 | Preparation process for a composite material having a hydrophilic photocatalytic surface, a photocatalytic hydrophilic composite material, and a photocatalytic hydrophilic coating composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11323194A true JPH11323194A (en) | 1999-11-26 |
Family
ID=26430944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10363347A Pending JPH11323194A (en) | 1998-03-18 | 1998-12-21 | Preparation process for a composite material having a hydrophilic photocatalytic surface, a photocatalytic hydrophilic composite material, and a photocatalytic hydrophilic coating composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11323194A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6692794B2 (en) | 2000-10-03 | 2004-02-17 | Murakami Corporation | Composite and manufacturing method therefor |
| JP2020536996A (en) * | 2017-10-04 | 2020-12-17 | エムシーエス・インダストリーズ・インコーポレイテッド | Anti-fog coating and application method |
-
1998
- 1998-12-21 JP JP10363347A patent/JPH11323194A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6692794B2 (en) | 2000-10-03 | 2004-02-17 | Murakami Corporation | Composite and manufacturing method therefor |
| JP2020536996A (en) * | 2017-10-04 | 2020-12-17 | エムシーエス・インダストリーズ・インコーポレイテッド | Anti-fog coating and application method |
| US11673827B2 (en) | 2017-10-04 | 2023-06-13 | Mcs Industries, Inc. | Anti-fogging coating and application process |
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