JPH11302387A - Surface modification - Google Patents

Surface modification

Info

Publication number
JPH11302387A
JPH11302387A JP10725298A JP10725298A JPH11302387A JP H11302387 A JPH11302387 A JP H11302387A JP 10725298 A JP10725298 A JP 10725298A JP 10725298 A JP10725298 A JP 10725298A JP H11302387 A JPH11302387 A JP H11302387A
Authority
JP
Japan
Prior art keywords
fluororesin
acetylene
film
adhesive
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10725298A
Other languages
Japanese (ja)
Inventor
Yoshinari Takayama
嘉也 高山
Junji Yoshida
純二 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP10725298A priority Critical patent/JPH11302387A/en
Publication of JPH11302387A publication Critical patent/JPH11302387A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To improve treating rate and surface modifying effect by modifying the surface of a fluororesin by carrying out discharge treatment under an atmosphere containing a hydrocarbon. SOLUTION: The surface of a fluororesin is modified by a discharge treatment producing plasma under an atmosphere containing one or more kinds of hydrocarbons selected from 2-4C alkynes, preferably containing acetylene in an inert gas, preferably under 500-1,000 Torr pressure. The concentration of acetylene is preferably 0.01-10 vol.%. A film or sheet-like material is preferable as a form of the fluororesin to be treated. The fluororesin includes polytetrafluoroethylene or its modified materials. The fluororesin film, or the like, may be laminated and the lamination method includes e.g. a method applying a dispersion containing a particulate fluororesin and a surfactant to a fluororesin film and carrying out drying and heat-melting of the dispersion.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、各種放電処理によ
りフッ素樹脂の表面を改質するための表面改質方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface modification method for modifying the surface of a fluororesin by various discharge treatments.

【0002】[0002]

【従来の技術】フッ素樹脂は防汚性、耐熱性、耐薬品
性、透明性、耐紫外線劣化性、耐候性、撥水撥油性など
他の樹脂に見られない優れた特性を有している。その反
面、フッ素樹脂はその特徴である難接着性のため、他の
材料との複合化が困難である。また、フッ素樹脂に他の
材料を被着させるには、接着剤を介して行なう必要が有
るが、この接着剤との密着性も悪く、そのためフッ素樹
脂側の接着表面を改質し、接着剤の密着性を高める試み
がなされている。
2. Description of the Related Art Fluororesins have excellent properties that are not found in other resins, such as antifouling properties, heat resistance, chemical resistance, transparency, ultraviolet light degradation resistance, weather resistance, and water and oil repellency. . On the other hand, fluororesins are difficult to combine with other materials due to their characteristic poor adhesion. In addition, in order to apply another material to the fluororesin, it is necessary to carry out through an adhesive, but the adhesion with the adhesive is poor, and therefore, the adhesive surface on the fluororesin side is modified, and Attempts have been made to increase the adhesiveness of the material.

【0003】フッ素樹脂の表面改質方法としては、特公
昭63−10176号公報に記載の火炎処理、金属ナト
リウム処理に代表される化学処理や、プラズマ、エキシ
マレーザー等による放電処理が知られている。しかしな
がら金属ナトリウム処理では引火の危険性や溶剤の多量
使用による環境への問題や、改質された部分が紫外線や
熱に弱いという特性上の問題があった。また、放電処理
においても液体を用いる方法(特開平6−240026
号公報、特開平6−228343号公報等)では、処理
面積が小さくランニングコストが高いという欠点が有
る。
As a method of modifying the surface of a fluororesin, a chemical treatment represented by a flame treatment and a metal sodium treatment described in JP-B-63-10176, and a discharge treatment by plasma, excimer laser or the like are known. . However, the treatment with metallic sodium has a danger of ignition, a problem with the environment due to the use of a large amount of solvent, and a problem with characteristics that the modified portion is vulnerable to ultraviolet rays and heat. Also, a method using a liquid in the discharge treatment (JP-A-6-240026)
Japanese Patent Application Laid-Open No. Hei 6-228343) has the disadvantage that the processing area is small and the running cost is high.

【0004】[0004]

【発明が解決しようとする課題】このため、混合ガスを
用いて各種放電処理を行う方法が、種々提案されている
が、それぞれ次のような問題点を有する。例えば、特開
平6−192452号公報のように、ヒドラジンN2
4 を含む気相下でエキシマレーザーを照射する方法で
は、化学反応性の高い反応中間体を利用するため、有害
危険性の点で問題となる。
For this reason, various methods for performing various discharge treatments using a mixed gas have been proposed, but each has the following problems. For example, as disclosed in JP-A-6-192452, hydrazine N 2 H
The method of irradiating an excimer laser in the gas phase containing 4 uses a reaction intermediate having high chemical reactivity, and thus poses a problem in terms of harmfulness.

【0005】また、表面改質法として注目されている大
気圧プラズマ処理についても、例えば、特開平5−92
530号公報では、相手材である接着剤の官能基と同じ
か親和性がある官能基を有する有機化合物を含む不活性
ガス雰囲気中で、フッ素フィルムを放電処理している
が、この方法によると常温常圧で液状の有機化合物を放
電空間にガス状及び微粒子状にして供給する際、雰囲気
中の不活性ガスより比重が重いことから均一分散性が悪
く、また液状物の気化と言う点で有害危険性も増す。更
に、有機化合物は放電空間でフラグメンテーションされ
出発物質の状態を維持するのが難しく、そのため所望の
官能基をフッ素フィルム表面に形成しにくいと言う問題
もある。
[0005] Atmospheric pressure plasma treatment, which has attracted attention as a surface modification method, is disclosed in, for example, Japanese Patent Application Laid-Open No. 5-92.
In Japanese Patent Publication No. 530, a fluorine film is subjected to discharge treatment in an inert gas atmosphere containing an organic compound having a functional group having the same or an affinity as a functional group of an adhesive as a partner material. When supplying a liquid organic compound in the form of gas and fine particles to a discharge space at normal temperature and normal pressure, the specific gravity is heavier than the inert gas in the atmosphere, so the uniform dispersibility is poor, and the liquid substance is vaporized. Harmful hazards also increase. Further, the organic compound is fragmented in the discharge space, and it is difficult to maintain the state of the starting material, and therefore, there is a problem that it is difficult to form a desired functional group on the surface of the fluorine film.

【0006】また、特開平5−125202号公報で
は、ヘリウムガス雰囲気中における大気圧グロープラズ
マ法でフッ素系部材を処理したものと、ゴム組成物とを
接合し複合材を作る方法を開示しているが、雰囲気ガス
が不活性なヘリウムだけだとフッ素樹脂表面に生成され
る官能基の量が少なく、未処理に比べて接着力は上がっ
たとしても、その効果が少ないと言う問題がある。
Japanese Unexamined Patent Publication (Kokai) No. 5-125202 discloses a method of forming a composite material by bonding a fluorine-based member treated with an atmospheric pressure glow plasma method in a helium gas atmosphere to a rubber composition. However, if the atmosphere gas is only inert helium, the amount of the functional group generated on the surface of the fluororesin is small, and there is a problem that even if the adhesive strength is increased as compared with the untreated, the effect is small.

【0007】また、特開平6−107828号公報で
は、接着性に優れたフッ素フィルムの大気圧プラズマに
よる表面改質方法として、処理室の雰囲気がHe、N
e、Ar、Kr、Xeの少なくとも1種類の希ガス70
モル%以上と、CO2 と、Cn 2n+2(n=1〜4)で
示される炭化水素のすくなくとも1種類とを含み、酸素
濃度500ppm以下、100〜1000torrの圧
力という条件を示しているが、ガス系が複雑で制御が難
しく、また添加ガスとしての炭化水素は反応性に乏しい
飽和炭化水素のため、良好な接着力を維持するにはあま
り処理速度が上げられないと言う問題がある。
Further, Japanese Patent Laid-Open No. 6-107828 discloses
Is suitable for atmospheric pressure plasma of fluorine film with excellent adhesion
As a surface modification method, the atmosphere in the processing chamber is He, N
at least one rare gas 70 of e, Ar, Kr, Xe
Mole% or more and COTwo And Cn H 2n + 2(N = 1 ~ 4)
Oxygen containing at least one of the indicated hydrocarbons
Concentration 500 ppm or less, pressure of 100 to 1000 torr
Although it shows the condition of force, the gas system is complicated and control is difficult
And the reactivity of hydrocarbons as additive gas is poor
Because of the saturated hydrocarbons, it is not enough to maintain good adhesion.
There is a problem that the processing speed cannot be increased.

【0008】更に、特開平6−41337号公報ではプ
ラスチックの表面エネルギー制御法として、疎水性を付
与する含フッ素化合物と親水性を付与する酸素、水素、
窒素、Ar、He、Ne等の不活性ガスとの混合ガスを
導入するプラズマ或いはコロナ処理を開示しているが、
酸素、水素等の単分子では官能基の生成量が少なく、接
着特性の向上効果が少ないと言う問題がある。
Further, Japanese Patent Application Laid-Open No. 6-41337 discloses a method of controlling the surface energy of plastics, in which a fluorine-containing compound for imparting hydrophobicity and oxygen and hydrogen for imparting hydrophilicity are used.
Although a plasma or corona treatment for introducing a mixed gas with an inert gas such as nitrogen, Ar, He, and Ne is disclosed,
There is a problem that a single molecule of oxygen, hydrogen, or the like generates a small amount of a functional group and has little effect of improving the adhesive property.

【0009】本発明は、かかる従来技術の諸問題点に鑑
みなされたものであり、その目的は、表面改質に有効な
反応を促進させることにより、処理速度の向上や表面改
質効果の向上が図れる表面改質法を提供することにあ
る。
The present invention has been made in view of the above-mentioned problems of the prior art, and an object of the present invention is to improve a processing speed and a surface modification effect by promoting a reaction effective for surface modification. It is an object of the present invention to provide a surface modification method that can achieve the above.

【0010】[0010]

【課題を解決するための手段】本発明者らは、上記目的
を達成すべく、各種気体を用いた放電処理について鋭意
研究したところ、炭素数2〜4のアルキンから選ばれる
1種以上を含有する雰囲気下で放電処理することによ
り、上記目的が達成できることを見出し、本発明を完成
するに至った。
Means for Solving the Problems The present inventors have conducted intensive studies on the discharge treatment using various gases in order to achieve the above object, and have found that they contain at least one selected from alkynes having 2 to 4 carbon atoms. It has been found that the above objects can be achieved by performing a discharge treatment in an atmosphere in which the present invention is performed, and the present invention has been completed.

【0011】即ち、本発明の表面改質方法は、炭化水素
を含有する雰囲気下での放電処理によりフッ素樹脂の表
面を改質する表面改質方法において、前記炭化水素が炭
素数2〜4のアルキンから選ばれる1種以上であること
を特徴とするものである。
That is, the surface modification method of the present invention is a surface modification method for modifying the surface of a fluororesin by a discharge treatment in an atmosphere containing a hydrocarbon, wherein the hydrocarbon has 2 to 4 carbon atoms. It is one or more kinds selected from alkynes.

【0012】前記雰囲気としては、後述のように種々の
ものが挙げられるが、前記雰囲気が、不活性ガス中にア
セチレンを含有するものであることが好ましい。また、
前記放電処理の種類としては、後述のように低圧下で行
われるものも含めて種々の形態が挙げられるが、前記放
電処理が500〜1000torrの圧力下でプラズマ
を生じさせるもの(以下、「大気圧プラズマ処理」とい
う)であることが好ましい。
As the atmosphere, various ones can be mentioned as described later, and it is preferable that the atmosphere contains acetylene in an inert gas. Also,
As the type of the discharge treatment, there are various forms including a treatment performed under a low pressure as described later. The discharge treatment generates a plasma under a pressure of 500 to 1000 torr (hereinafter, referred to as “large”). Pressure plasma treatment ").

【0013】また、前記アセチレンの濃度は、放電雰囲
気の圧力や放電の形態に応じて、適宜設定されるが、大
気圧プラズマ処理の場合、前記アセチレンの濃度が、
0.01〜10体積%であることが好ましい。
The concentration of the acetylene is appropriately set according to the pressure of the discharge atmosphere and the form of the discharge. In the case of the atmospheric pressure plasma treatment, the concentration of the acetylene is
It is preferably 0.01 to 10% by volume.

【0014】〔作用効果〕そして、本発明の表面改質方
法によると、後述の実施例の結果が示すように、処理速
度の向上や表面改質効果の向上を図ることができる。そ
の理由の詳細は明らかではないが次のように考えられ
る。つまり、炭素数2〜4のアルキンは炭素間三重結合
を有するため、放電処理部における他の気体分子やフッ
素樹脂等との反応性が高く、しかも表面改質に不利とな
る反応を引き起しにくいため、全体として表面改質に有
効な反応を促進することができると推定される。
[Effects] According to the surface modification method of the present invention, it is possible to improve the processing speed and the surface modification effect as shown in the results of the examples described later. Although the details of the reason are not clear, it is considered as follows. In other words, since alkynes having 2 to 4 carbon atoms have a triple bond between carbon atoms, the alkyne has high reactivity with other gas molecules, fluororesin, and the like in the discharge treatment part, and causes a reaction that is disadvantageous for surface modification. It is presumed that it is difficult to promote a reaction effective for surface modification as a whole.

【0015】前記雰囲気が、不活性ガス中にアセチレン
を含有するものであり、かつ前記放電処理が500〜1
000torrの圧力下でプラズマを生じさせるもので
ある場合、いわゆる大気圧プラズマ処理のため、低温プ
ラズマがかかえている設備費や処理コストが大きくなる
といった経済的な問題や処理における発熱等の機能的な
問題が少なく、表面改質法として特に優れたものとな
る。また、上記アルキンのなかでも特に反応性が良好な
アセチレンを使用するため、上記の作用効果が特に顕著
になる。
The above-mentioned atmosphere contains acetylene in an inert gas, and the discharge treatment is performed in a range of 500 to 1
In the case where plasma is generated under a pressure of 2,000 torr, so-called atmospheric pressure plasma processing causes economical problems such as an increase in equipment costs and processing costs associated with low-temperature plasma, and functional problems such as heat generation in processing. It has few problems and is particularly excellent as a surface modification method. Further, among the above-mentioned alkynes, acetylene having particularly good reactivity is used, so that the above-mentioned effects are particularly remarkable.

【0016】その際、前記アセチレンの濃度が、0.0
1〜10体積%である場合、形成される官能基の量が十
分で、接着剤との接着力も良好になり、また、粉状分解
物の堆積により、接着力が低下するのを防止することが
できる。
At this time, the concentration of the acetylene is 0.0
When the content is 1 to 10% by volume, the amount of the formed functional group is sufficient, the adhesion to the adhesive becomes good, and the adhesion is prevented from lowering due to the accumulation of powdery decomposition products. Can be.

【0017】[0017]

【発明の実施の形態】処理されるフッ素樹脂の形態とし
ては、フィルム状、シート状、板状、チューブ状、バル
ク状など種々の形態が挙げられるが、放電電極間へ配置
して効率良く処理が行えることから、フィルム又はシー
ト状物が好ましい。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The form of the fluororesin to be treated includes various forms such as a film, a sheet, a plate, a tube, and a bulk. Can be carried out, and a film or sheet is preferable.

【0018】フッ素樹脂としては、分子内にフッ素原子
を含むものであればよく、特に限定されるものではな
い。具体的にはポリテトラフルオロエチレン(PTF
E)とその変性物、テトラフルオロエチレン−パーフル
オロアルキルビニルエーテル共重合体(PFA)、テト
ラフルオロエチレン−エチレン共重合体(ETFE)、
テトラフルオロエチレン−ヘキサフルオロプロピレン共
重合体(FEP)、テトラフルオロエチレン−フッ化ビ
ニリデン共重合体(TFE/VdF)、テトラフルオロ
エチレン−ヘキサフルオロプロピレン−パーフルオロア
ルキルビニルエーテル共重合体(EPA)、ポリクロロ
トリフルオロエチレン(PCTFE)、クロロトリフル
オロエチレン−エチレン共重合体(ECTFE)、クロ
ロトリフルオロエチレン−フッ化ビニリデン共重合体
(CTFE/VdF)、ポリフッ化ビニリデン(PVd
F)、ポリフッ化ビニル(PVF)などが挙げられる。
The fluororesin is not particularly limited as long as it contains a fluorine atom in the molecule. Specifically, polytetrafluoroethylene (PTF
E) and its modified products, tetrafluoroethylene-perfluoroalkylvinyl ether copolymer (PFA), tetrafluoroethylene-ethylene copolymer (ETFE),
Tetrafluoroethylene-hexafluoropropylene copolymer (FEP), tetrafluoroethylene-vinylidene fluoride copolymer (TFE / VdF), tetrafluoroethylene-hexafluoropropylene-perfluoroalkylvinyl ether copolymer (EPA), poly Chlorotrifluoroethylene (PCTFE), chlorotrifluoroethylene-ethylene copolymer (ECTFE), chlorotrifluoroethylene-vinylidene fluoride copolymer (CTFE / VdF), polyvinylidene fluoride (PVd)
F), polyvinyl fluoride (PVF) and the like.

【0019】フッ素樹脂フィルム等は、これらが積層さ
れていても良く、その場合の積層法としては、母材とな
るフッ素樹脂フィルムに粒子状のフッ素樹脂と界面活性
剤を含むディスパージョンをコーティングし、乾燥と加
熱融着を行なう方法や2種類のフッ素樹脂フィルムをそ
のまま貼り合せ加熱融着する方法などが挙げられる。融
着温度はフッ素樹脂フィルムの融点付近まで上げること
が好ましく、融点以下だと密着強度が得られず、融点以
上だとしわになりやすい傾向がある。また積層法を用い
て大気圧プラズマで発生する裏抜けに対処することもで
きる。大気圧プラズマ等により放電処理した時に、接地
電極ロールからわずかでも浮くとフィルム裏面側も処理
されてしまい、粘着剤を付与したテープにした場合に巻
き戻し力が高くなる傾向がある。2枚の同一種類の処理
フィルムを融点の半分程度の温度で加熱圧着して貼り合
せ、これを大気圧プラズマで処理した後、再度分離すれ
ば電極ロールからの浮きに関係なくフィルム裏面が処理
されず対象面のみ処理される。
The fluororesin film and the like may be laminated. In this case, the lamination method is to coat a fluororesin film as a base material with a dispersion containing a particulate fluororesin and a surfactant. And a method in which drying and heat fusion are performed, and a method in which two types of fluororesin films are directly bonded and heat-fused. The fusing temperature is preferably raised to around the melting point of the fluororesin film. If the fusing temperature is lower than the melting point, adhesion strength cannot be obtained, and if the fusing temperature is higher than the melting point, the film tends to be wrinkled. In addition, strike-through generated by atmospheric pressure plasma can be dealt with by using a lamination method. When a discharge treatment is performed by atmospheric pressure plasma or the like, even if the film slightly floats from the ground electrode roll, the back surface of the film is also treated, and when the tape is applied with an adhesive, the rewinding force tends to increase. Two sheets of the same type of processing film are bonded together by heating and pressing at a temperature of about half the melting point, and after processing with atmospheric pressure plasma, if separated again, the film back surface is processed regardless of floating from the electrode roll. Only the target surface is processed.

【0020】放電処理の形態としては、グロー放電、コ
ロナ放電などのプラズマを生じさせ得る各種放電(いわ
ゆるプラズマ放電)や、その他、気相中の分子又はフッ
素樹脂等を活性化させることができる各種放電がいずれ
も採用可能である。これらは、特公昭37−17485
号公報、特公昭49−12900号公報、米国特許第3
296011号明細書等に開示されている。また、放電
雰囲気の圧力としては、上記各種放電に応じた圧力を設
定すればよい。そして、放電処理を行う表面改質装置
も、各種放電処理の形態や圧力に応じた装置を適宜選定
すればよい。
Examples of the form of the discharge treatment include various kinds of discharges (so-called plasma discharges) that can generate plasma such as glow discharge and corona discharge, and various kinds of substances that can activate molecules in a gas phase or fluororesin. Either discharge can be employed. These are Japanese Patent Publication No. 37-17485.
Gazette, Japanese Patent Publication No. 49-12900, U.S. Pat.
No. 296011 and the like. Further, the pressure of the discharge atmosphere may be set to a pressure corresponding to the above-described various discharges. As the surface reforming device for performing the discharge treatment, a device according to the form and pressure of various kinds of discharge treatment may be appropriately selected.

【0021】上記放電処理が行われる雰囲気は、炭素数
2〜4のアルキンから選ばれる1種以上を含有するもの
であるが、かかるアルキンとしては、アセチレン、メチ
ルアセチレン、1−ブチン、2−ブチン等が挙げられ
る。なかでも、前述の理由より、アセチレンが最も好ま
しい。
The atmosphere in which the discharge treatment is performed contains at least one selected from alkynes having 2 to 4 carbon atoms. Examples of such alkynes include acetylene, methylacetylene, 1-butyne and 2-butyne. And the like. Among them, acetylene is most preferable for the above-mentioned reason.

【0022】また、放電雰囲気中に含有される他の成分
としては、ヘリウム、アルゴン、ネオン、クリプトン、
キセノン等の希ガスや窒素等の不活性ガスが挙げられ
る。また、上記アルキンの添加による本発明の効果を損
なわない範囲で、反応性の有機化合物、又は無機化合物
を含有してもよい。
Other components contained in the discharge atmosphere include helium, argon, neon, krypton, and the like.
A rare gas such as xenon or an inert gas such as nitrogen may be used. Further, a reactive organic compound or an inorganic compound may be contained as long as the effect of the present invention by addition of the alkyne is not impaired.

【0023】以下、本発明の好ましい形態である、フッ
素樹脂フィルムを大気圧プラズマ処理する例を挙げて説
明する。図1は、大気圧プラズマ処理に用いられる装置
の一例の概略構成図である。当該装置は、プラズマ放電
を形成するための高電圧印加手段と、ガスの導入・排出
を行って酸素濃度と圧力を維持する処理室11と、アセ
チレン又はアセチレンを含む混合ガスを放電空間に導入
するための供給手段と、フッ素樹脂フィルム1を搬送し
つつ繰り出し及び巻き取りを行う搬送機構の4つの要素
から構成されている。
Hereinafter, a preferred embodiment of the present invention will be described with reference to an example in which a fluororesin film is subjected to an atmospheric pressure plasma treatment. FIG. 1 is a schematic configuration diagram of an example of an apparatus used for atmospheric pressure plasma processing. The apparatus includes a high-voltage applying means for forming a plasma discharge, a processing chamber 11 for introducing and discharging a gas to maintain an oxygen concentration and a pressure, and introducing acetylene or a mixed gas containing acetylene into a discharge space. And a transport mechanism for feeding and winding the fluororesin film 1 while transporting it.

【0024】高電圧印加手段は、高周波電源9に接続さ
れ誘電体3aで被覆された高電圧印加側電極3と、主ロ
ール2のシリコンゴム層2bの下層に設けた接地側電極
2aで構成される。処理室11には、不活性ガスボンベ
10bが流量計10aを介して接続されると共に、排気
口8より排気が行われ、真空計6と酸素濃度計7とによ
り、酸素濃度と圧力とが監視される。アセチレン等の供
給手段は、アセチレン等のガスボンベ4c、流量計4
b、及びノズル4cで構成されている。搬送機構は、図
示してないフッ素樹脂フィルム1の繰り出し部及び巻き
取り部と、処理室11の入口と出口に設けた回転ロール
5aと、高電圧印加側電極3に対向する主ロール2と、
その前後に設けた支持ロール5bとにより構成される。
The high voltage application means is composed of a high voltage application side electrode 3 connected to a high frequency power supply 9 and covered with a dielectric 3a, and a ground side electrode 2a provided below the silicon rubber layer 2b of the main roll 2. You. An inert gas cylinder 10b is connected to the processing chamber 11 via a flow meter 10a, exhausted from an exhaust port 8, and an oxygen concentration and a pressure are monitored by a vacuum gauge 6 and an oxygen concentration meter 7. You. A supply means of acetylene or the like includes a gas cylinder 4c of acetylene or the like, a flow meter 4
b and the nozzle 4c. The transport mechanism includes a feeding unit and a winding unit (not shown) of the fluororesin film 1, a rotating roll 5 a provided at an entrance and an exit of the processing chamber 11, and a main roll 2 facing the high-voltage application side electrode 3.
It is composed of support rolls 5b provided before and after that.

【0025】高圧印加電極3の形状は特に限定されるも
のではないが、被処理物が広幅のフィルムの場合、棒状
のものが均一な処理が施せるため好ましい。接地電極2
a(主ロール2)は、被処理物であるフッ素樹脂フィル
ム1を搬送する機能も有するため筒状が好ましい。また
電極間距離は1〜5mmに設定し、設定値に対し−10
%〜+10%に保つことが放電を安定させる上で好まし
い。1mm未満では電極間距離の均一性を維持するのが
難しく、5mmより大きいと電圧の負荷が大きくなる傾
向がある。電極間距離のバラツキが設定値に対し−10
%〜+10%を上回ると電極間の最短部分で短絡する傾
向がある。電圧印加には高周波電源9を用いるが、周波
数は低周波(kHz)、高周波(MHz)、マイクロ波
(GHz)と任意に選択することができるが、周波数を
高くすると放電の制御が難しくなるので低周波が好まし
い。低周波の場合でもアーク放電を防止するため電極の
片方または両方にガラス、ゴム、セラミックス等の誘電
体で被覆するのが好ましい。
The shape of the high-voltage application electrode 3 is not particularly limited, but when the object to be processed is a wide film, a rod-like one is preferable because a uniform treatment can be performed. Ground electrode 2
The a (main roll 2) preferably has a cylindrical shape because it also has a function of transporting the fluororesin film 1, which is an object to be processed. The distance between the electrodes is set to 1 to 5 mm, and -10 to the set value.
% To + 10% is preferable for stabilizing discharge. If it is less than 1 mm, it is difficult to maintain the uniformity of the distance between the electrodes, and if it is more than 5 mm, the voltage load tends to increase. The variation of the distance between the electrodes is -10 against the set value.
If it exceeds% to + 10%, a short circuit tends to occur at the shortest part between the electrodes. The high-frequency power supply 9 is used for voltage application, and the frequency can be arbitrarily selected from low frequency (kHz), high frequency (MHz), and microwave (GHz). Low frequencies are preferred. One or both of the electrodes is preferably coated with a dielectric such as glass, rubber or ceramics to prevent arc discharge even at low frequencies.

【0026】処理室11はアルゴン、へリウム、窒素等
の不活性ガスを充満して酸素濃度と圧力を調整するため
に、不活性ガスの導入系とアセチレンを有する添加ガス
とその分解ガスを排出するための排気系を設置した密閉
型が好ましい。このため、接処理物であるフッ素樹脂フ
ィルム1を処理外部の大気中から導く場合、空気の混入
を防止するため、搬送の入口と出口にはクロムめっき等
摩擦抵抗が少ない金属で被覆された回転ロール5aでフ
ィルムを挟み込むのが好ましい。入口、出口のいずれも
ゴムのように摩擦抵抗の大きいロールでフィルムを挟ん
で搬送した場合、処理後の接着力が低下する傾向があ
る。
The processing chamber 11 is filled with an inert gas such as argon, helium, or nitrogen to adjust the oxygen concentration and the pressure, and discharges an inert gas introduction system, an additive gas containing acetylene, and its decomposition gas. It is preferable to use a hermetic type in which an exhaust system is installed for the purpose. For this reason, when the fluororesin film 1 to be treated is guided from the atmosphere outside the processing, the entrance and the exit of the conveyance are coated with a metal having a low frictional resistance such as chrome plating to prevent air from being mixed. It is preferable to sandwich the film between the rolls 5a. When the film is conveyed between rolls having a large frictional resistance such as rubber at both the entrance and the exit, the adhesive strength after treatment tends to decrease.

【0027】処理室11の酸素濃度は1〜1000pp
mに設定するのが良く、好ましくは5〜200ppmで
ある。1ppm未満では酸素濃度の調整が難しく、10
00ppmより大きいと接着剤との接着力が低下する傾
向がある。また圧力は500〜1000torrが好ま
しい。500torr未満では圧力調整が難しく、10
00torrより大きいと放電が安定しにくい傾向があ
る。なお、後述の実施例の結果に見られるカルボニル基
(C=O)等の酸素原子は、処理室中の酸素成分、又は
処理後に接する空気中酸素成分等に由来するものと考え
られる。
The oxygen concentration in the processing chamber 11 is 1 to 1000 pp
m, preferably 5 to 200 ppm. If it is less than 1 ppm, it is difficult to adjust the oxygen concentration.
If it is more than 00 ppm, the adhesive strength with the adhesive tends to decrease. The pressure is preferably 500 to 1000 torr. If the pressure is less than 500 torr, it is difficult to adjust the pressure.
If it is larger than 00 torr, the discharge tends to be difficult to stabilize. Note that oxygen atoms such as a carbonyl group (C = O) found in the results of Examples described later are considered to be derived from an oxygen component in the processing chamber or an oxygen component in the air that comes into contact after the processing.

【0028】ノズル4aの吹き出し位置は、アセチレン
等の導入量にもよるが、ノズルの吹き出し口が、プラズ
マ放電の領域に向いていること及びプラズマ放電領域と
フッ素樹脂フィルムの交わる部分から1〜50mmの距
離に吹き出し口が存在することが好ましい。1mmより
小さいとプラズマ領域におけるアセチレンの分布格差が
大きくなり、これが処理バラツキ、接着特性バラツキに
繋がる傾向がある。また50mmより大きいと処理の均
一性は増すが、ガス濃度が希薄になり接着特性を低下さ
せる傾向がある。なお、このような濃度低下を解消する
ために、放電領域の近傍にカバー体を設けて、その内部
にアセチレン等を供給しつつ、一部が排気されるように
構成してもよい。
The blowing position of the nozzle 4a depends on the introduction amount of acetylene or the like, but the blowing port of the nozzle is directed to the plasma discharge region and 1 to 50 mm from the intersection of the plasma discharge region and the fluororesin film. It is preferable that the outlet is present at a distance of. If it is less than 1 mm, the distribution difference of acetylene in the plasma region becomes large, and this tends to lead to variations in processing and adhesive characteristics. If it is larger than 50 mm, the uniformity of the treatment increases, but the gas concentration tends to be low and the adhesive properties tend to be low. In order to eliminate such a decrease in concentration, a cover may be provided in the vicinity of the discharge region so that acetylene or the like is supplied into the cover and a part of the cover is exhausted.

【0029】更に、アセチレン導入量は、プラズマ放電
領域と処理速度によって異なるが、基材幅250mmの
フッ素樹脂フィルムを厚さ20mm、幅300mmのア
ルミ電極と直径100mm、幅400mmの接地電極の
間のプラズマ領域に搬送速度1m/minで通過させ処
理する場合、アセチレン導入量は0.1〜10L/mi
nが好ましい。0.1L/min未満では形成される官
能基の量が少なく、接着剤との接着力も低下する傾向が
ある。10L/minより大きいと粉状の分解物が堆積
しやすくなり これによって接着力が発現しにくい傾向
がある。このような導入量は、放電領域におけるアセチ
レンの濃度で、0.01〜10体積%にほぼ相当する。
Further, the amount of acetylene introduced varies depending on the plasma discharge region and the processing speed. When passing through the plasma region at a transport speed of 1 m / min for processing, the amount of acetylene introduced is 0.1 to 10 L / mi.
n is preferred. If it is less than 0.1 L / min, the amount of the functional group formed is small, and the adhesive strength with the adhesive tends to decrease. If it is more than 10 L / min, a powdery decomposition product is apt to be deposited, whereby the adhesive strength tends to be hardly developed. Such an introduction amount substantially corresponds to 0.01 to 10% by volume in the concentration of acetylene in the discharge region.

【0030】大気圧プラズマ処理されたフッ素樹脂フィ
ルムは擦れなどによる機械的強度が弱いため、プラズマ
処理後、直ちに接着剤を塗工するのが好ましい。
Since the fluorine resin film subjected to the atmospheric pressure plasma treatment has low mechanical strength due to rubbing or the like, it is preferable to apply an adhesive immediately after the plasma treatment.

【0031】接着剤の種類は相手材であるゴム、粘着剤
の種類に応じて適宜選択すれば良い。相手材がNR、N
BRのゴムではハロゲンポリマーベースの接着剤をシリ
コン系、フッ素系ゴムではシランカップリング剤をまた
ウレタン系ゴムではフェノールベースの接着剤を用いる
ことができる。
The kind of the adhesive may be appropriately selected according to the kind of the rubber or the adhesive as the mating material. The partner material is NR, N
For BR rubber, a halogen polymer-based adhesive can be used as a silicone-based adhesive, for a fluorine-based rubber, a silane coupling agent can be used, and for a urethane-based rubber, a phenol-based adhesive can be used.

【0032】接着剤の塗工法としては所定の厚さに均一
に塗れれば特に限定されないが、スプレー法、リバース
コーター、コンマコーター、刷毛等が挙げられる。
The method of applying the adhesive is not particularly limited as long as it can be uniformly applied to a predetermined thickness, and examples thereof include a spray method, a reverse coater, a comma coater, and a brush.

【0033】接着剤の塗布厚は接着剤の種類にもよるが
1〜100μmに設定するのが良く、好ましくは10〜
50μmである。1μm未満では擦れに対する接着力の
低下が大きくなる傾向がある。100μmより大きいと
フレキシブルなフッ素樹脂フィルムを巻き付け等により
曲げた時、接着剤層にクラツクが生じる傾向がある。
The thickness of the adhesive applied depends on the type of the adhesive, but is preferably set to 1 to 100 μm, preferably 10 to 100 μm.
50 μm. If it is less than 1 μm, the decrease in adhesive strength against rubbing tends to increase. If it is larger than 100 μm, cracks tend to occur in the adhesive layer when the flexible fluororesin film is bent by winding or the like.

【0034】[0034]

【実施例】以下に本発明の具体的な構成と効果を示す実
施例等について説明する。なお、各実施例等における評
価データは、下記の評価方法によるものである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments and the like showing specific structures and effects of the present invention will be described below. In addition, the evaluation data in each Example etc. is based on the following evaluation method.

【0035】(エポキシ接着力)エポキシ接着剤(コニ
シ社製,ボンドE)の主剤と硬化剤を1:1で混合した
ものを用いて、鋼板とフィルムとをローラーで貼り合わ
せた後、100℃1時間加熱して両者を接着した。その
後、フィルムを180°の角度でピールし、その際の剥
離強度を測定した。
(Epoxy Adhesive Strength) A steel plate and a film are bonded by a roller using a mixture of a main agent of epoxy adhesive (Bond E, manufactured by Konishi Co., Ltd.) and a curing agent in a ratio of 1: 1. Heating was performed for 1 hour to bond them. Thereafter, the film was peeled at an angle of 180 °, and the peel strength at that time was measured.

【0036】(シリコン粘着剤投錨力)シリコン粘着剤
(東レ・ダウコーニング社製,SD−4570)をフィ
ルムの処理面に塗工後、210℃で5分で加熱乾燥させ
た。このシリコン粘着剤面にカプトンテープ(日東電工
(株)製,No.360)を貼り合わせ、常温で1日放
置した。その後、各フィルムを90°の角度でピール
し、その際の剥離強度を測定した。
(Silicon pressure-sensitive adhesive anchoring force) A silicon pressure-sensitive adhesive (manufactured by Dow Corning Toray Co., Ltd., SD-4570) was applied to the treated surface of the film, and then dried by heating at 210 ° C. for 5 minutes. A Kapton tape (No. 360, manufactured by Nitto Denko Corporation) was attached to the surface of the silicone pressure-sensitive adhesive, and left at room temperature for one day. Thereafter, each film was peeled at an angle of 90 °, and the peel strength at that time was measured.

【0037】実施例1 図1に示す装置を用い、不活性ガスとして窒素を100
L/minで処理室に導入し、酸素濃度を50ppmに
した。フッ素テープで被覆した棒状のアルミ電極とシリ
コンゴムで被覆した接地ロール電極の間に、周波数5k
Hzの交流電圧(約20kV)を印加し放電させた。こ
の放電空間にアセチレンガスを流量2L/minで導入
し(放電領域のアセチレン濃度は約2体積%)、同時に
厚さ250μmのFEPの押出しフィルムを速度1m/
minで搬送した。
Example 1 Using the apparatus shown in FIG.
L / min was introduced into the processing chamber, and the oxygen concentration was adjusted to 50 ppm. A frequency of 5k is applied between a rod-shaped aluminum electrode covered with fluorine tape and a ground roll electrode covered with silicon rubber.
Hz AC voltage (about 20 kV) was applied for discharging. Acetylene gas was introduced into the discharge space at a flow rate of 2 L / min (the acetylene concentration in the discharge area was about 2% by volume), and at the same time, a 250 μm-thick FEP extruded film was fed at a speed of 1 m / min.
min.

【0038】処理後の180°ピールのエポキシ接着力
は2.7kg/cmとなった。またシリコン粘着剤との
投錨力は0.8kg/cmとなった。更にFEPの処理
前後の表面形態を原子間力顕微鏡を用いて分析すると、
未処理のFEPの最大高低差=50nm、表面積率=
1.02に対し、処理後のFEPの最大高低差=100
nm、表面積率=1.07となった。外観的には未処理
FEPが不定形で滑らかな面に対し処理後のFEPには
底面の直径20〜200nm、高さ5〜60nmの円錐
形の突起が点在していた。またFT−IRで官能基を比
較すると未処理のFEPでは親水性官能基は検出されな
かったが、処理したFEPではC=Oの官能基がFEP
の吸光度に対し0.0006の比率で検出された。
The epoxy adhesive strength of the 180 ° peel after the treatment was 2.7 kg / cm. The anchoring force with the silicone adhesive was 0.8 kg / cm. Furthermore, when the surface morphology before and after the FEP treatment is analyzed using an atomic force microscope,
Maximum height difference of untreated FEP = 50 nm, surface area ratio =
1.02, maximum FEP difference after treatment = 100
nm, and the surface area ratio was 1.07. In terms of appearance, the untreated FEP was irregular and had a smooth surface, and the treated FEP had dotted bottoms having a diameter of 20 to 200 nm and a height of 5 to 60 nm in conical projections. When the functional groups were compared by FT-IR, no hydrophilic functional group was detected in the untreated FEP, but in the treated FEP, the C = O functional group was FEP.
Was detected at a ratio of 0.0006 to the absorbance.

【0039】実施例2 実施例1の搬送速度を7m/minにする以外は同様の
条件で処理した。その結果、エポキシ接着力は2.4k
g/cmでシリコン粘着剤投錨力は0.8kg/cmと
なった。
Example 2 Processing was performed under the same conditions as in Example 1 except that the transport speed was 7 m / min. As a result, the epoxy adhesive strength is 2.4k
At g / cm, the silicon adhesive anchoring force was 0.8 kg / cm.

【0040】比較例1 実施例1のアセチレンをエタンにする以外は実施例1と
同様に処理を行った。その結果、エポキシ接着力は2.
1kg/cmでシリコン粘着剤投錨力は0.8kg/c
mとなった。更にFEPの処理前後の表面状態を原子間
力顕微鏡を用いて分析すると、FEPの最大高低差=5
0nm、表面積率=1.03となり、外観的には不定形
で滑らかな面であった。またFT−IRの結果ではC=
O官能基がFEPの吸光度に対し0.0003の比率で
検出された。
Comparative Example 1 The procedure of Example 1 was repeated, except that acetylene of Example 1 was replaced with ethane. As a result, the epoxy adhesive strength is 2.
Silicone adhesive anchoring force is 0.8kg / c at 1kg / cm
m. Further, when the surface state before and after the FEP treatment was analyzed using an atomic force microscope, the maximum height difference of the FEP was 5
0 nm, the surface area ratio was 1.03, and the surface was irregular and smooth in appearance. In the result of FT-IR, C =
O functional groups were detected at a ratio of 0.0003 to the absorbance of FEP.

【0041】比較例2 実施例2のアセチレンをエタンにする以外は実施例2と
同様に処理を行った。その結果、エポキシ接着力は1.
6kg/cmでシリコン粘着剤投錨力は0.6kg/c
mとなった。
Comparative Example 2 A treatment was carried out in the same manner as in Example 2 except that acetylene of Example 2 was changed to ethane. As a result, the epoxy adhesive strength was 1.
Silicone adhesive anchoring force is 0.6kg / c at 6kg / cm
m.

【0042】実施例3 不活性ガスとして窒素を100L/minで処理室に導
入し、酸素濃度を50ppmにした。フッ素テープで被
覆した棒状のアルミ電極とシリコンゴムで被覆した接地
ロール電極の間に、周波数5kHzの交流電圧(約20
kV)を印加し放電させた。この放電空間にアセチレン
ガスを流量0.5L/minで導入した(放電領域のア
セチレン濃度は約0.5体積%)。更に200μm厚の
PTFEにディスパージョン方法でFEPを厚さ2μm
積層した基材を放電空間に速度4m/minで搬送し、
FEP面を処理した。処理後、直ちに東洋化学研究所社
の接着剤メタロツクGを乾燥後の厚さが8μmになる様
に処理面に塗工した。次に鋼板にメタロツクGを塗工し
乾燥後、硫黄2.5phr、カーボン35phr、酸化
亜鉛2種5phr、ステアリン酸1phr、及びノクセ
ラーCZ(大内新興化学製)1phrを含む未加硫の天
然ゴム(NR)よりなる厚さ2mmのシートを載せ、更
にこのNRとPTFE/FEP積層基材のメタロックG
を施した面を当接させ、プレス圧力50kg/cm2
温度150℃、時間10minでNRを加硫し厚さ1.
5mmにした。鋼板とPTFE/FEP積層基材を18
0°ピールで剥離した時の剥離強度は3.5kg/cm
で剥離モードはゴムの凝集破壊となった。またNRの代
わりにクロロプレンゴム(CR)を用いた場合4kg/
cmとなった。この時の剥離モードもゴムの凝集破壊と
なった。
Example 3 Nitrogen as an inert gas was introduced into the processing chamber at 100 L / min, and the oxygen concentration was adjusted to 50 ppm. An AC voltage (about 20 kHz) having a frequency of 5 kHz is applied between a rod-shaped aluminum electrode covered with fluorine tape and a ground roll electrode covered with silicon rubber.
kV) was applied to discharge. Acetylene gas was introduced into the discharge space at a flow rate of 0.5 L / min (the acetylene concentration in the discharge region was about 0.5% by volume). Further, a 200 μm thick PTFE is coated with a 2 μm thick FEP by a dispersion method.
The laminated substrate is transported to the discharge space at a speed of 4 m / min,
The FEP surface was treated. Immediately after the treatment, the treated surface was coated with an adhesive Metalloc G from Toyo Chemical Laboratory Co., Ltd. so that the thickness after drying was 8 μm. Then, a metal plate G is coated on a steel sheet and dried, and then unvulcanized natural rubber containing 2.5 phr of sulfur, 35 phr of carbon, 5 phr of two kinds of zinc oxide, 1 phr of stearic acid, and 1 phr of Noxeller CZ (manufactured by Ouchi Shinko Chemical). (NR), a 2 mm thick sheet is placed thereon, and the NR and Metalok G of the PTFE / FEP laminated base material are further placed.
The surface subjected to the abutting is pressed, and the pressing pressure is 50 kg / cm 2 ,
The NR was vulcanized at a temperature of 150 ° C. for a time of 10 min to form
It was 5 mm. 18 steel sheets and PTFE / FEP laminated base material
The peel strength when peeled at 0 ° peel is 3.5 kg / cm
In the release mode, the cohesive failure of the rubber occurred. When chloroprene rubber (CR) is used instead of NR, 4 kg /
cm. The peeling mode at this time also resulted in cohesive failure of the rubber.

【0043】比較例3 実施例3のFEP面を処理した後に、処理面をベンコッ
ト(旭化成製,コットンセルロース70%−ポリエステ
ル30%繊維よりなる布)を用いて荷重15g/cm
2 、速度5m/minで10回擦ること以外は、実施例
3と同じ処理を行なった。その結果、NR、CRでの剥
離強度は0.7kg/cmとなり、剥離モードはプライ
マーとPTFE/FEP積層基材の界面破壊となった。
Comparative Example 3 After treating the FEP surface of Example 3, the treated surface was treated with Bencott (a cloth made of Asahi Kasei Corporation, 70% cotton cellulose-30% polyester fiber) with a load of 15 g / cm.
2. Except for rubbing 10 times at a speed of 5 m / min, the same process as in Example 3 was performed. As a result, the peel strength in NR and CR was 0.7 kg / cm, and the peel mode was interface failure between the primer and the PTFE / FEP laminated base material.

【0044】以上のような実施例と比較例とを対比する
ことにより、本発明により次の効果が得られることが分
かった。即ち、実施例1と比較例1との対比、及び実施
例2と比較例2との対比から、本発明によりエポキシ接
着力が向上することが分かった。また、搬送速度1m/
minの実施例1におけるエポキシ接着力が、搬送速度
7m/minの比較例1におけるエポキシ接着力より高
いことから、本発明により処理速度の向上が図れること
が分かった。更に、実施例3と比較例3との対比から、
本発明によりゴムとの接着力も向上することが分かっ
た。
By comparing the above Examples and Comparative Examples, it was found that the following effects were obtained by the present invention. That is, from the comparison between Example 1 and Comparative Example 1 and the comparison between Example 2 and Comparative Example 2, it was found that the epoxy adhesive strength was improved by the present invention. The transport speed is 1m /
Since the epoxy adhesive force in Example 1 with the minimum speed was higher than the epoxy adhesive force in Comparative Example 1 with the transfer speed of 7 m / min, it was found that the processing speed could be improved by the present invention. Furthermore, from the comparison between Example 3 and Comparative Example 3,
It has been found that the present invention also improves the adhesion to rubber.

【図面の簡単な説明】[Brief description of the drawings]

【図1】大気圧プラズマ処理に用いられる装置の一例の
概略構成図
FIG. 1 is a schematic configuration diagram of an example of an apparatus used for atmospheric pressure plasma processing.

【符号の説明】[Explanation of symbols]

1 フッ素樹脂フィルム 2a 接地側電極 3 高電圧印加側電極 4c アセチレン等のガスボンベ DESCRIPTION OF SYMBOLS 1 Fluororesin film 2a Grounding electrode 3 High voltage application side electrode 4c Gas cylinder of acetylene etc.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 炭化水素を含有する雰囲気下での放電処
理によりフッ素樹脂の表面を改質する表面改質方法にお
いて、 前記炭化水素が、炭素数2〜4のアルキンから選ばれる
1種以上であることを特徴とする表面改質方法。
1. A surface modification method for modifying the surface of a fluororesin by a discharge treatment in an atmosphere containing a hydrocarbon, wherein the hydrocarbon is at least one selected from alkynes having 2 to 4 carbon atoms. A method for modifying a surface, the method comprising:
【請求項2】 前記雰囲気が、不活性ガス中にアセチレ
ンを含有するものであり、かつ前記放電処理が500〜
1000torrの圧力下でプラズマを生じさせるもの
である請求項1記載の表面改質方法。
2. The atmosphere contains acetylene in an inert gas, and the discharge treatment is performed in a range of 500 to 500.
2. The method according to claim 1, wherein plasma is generated under a pressure of 1000 torr.
【請求項3】 前記アセチレンの濃度が、0.01〜1
0体積%である請求項2記載の表面改質方法。
3. The acetylene concentration of 0.01 to 1
The surface modification method according to claim 2, wherein the amount is 0% by volume.
JP10725298A 1998-04-17 1998-04-17 Surface modification Pending JPH11302387A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10725298A JPH11302387A (en) 1998-04-17 1998-04-17 Surface modification

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10725298A JPH11302387A (en) 1998-04-17 1998-04-17 Surface modification

Publications (1)

Publication Number Publication Date
JPH11302387A true JPH11302387A (en) 1999-11-02

Family

ID=14454347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10725298A Pending JPH11302387A (en) 1998-04-17 1998-04-17 Surface modification

Country Status (1)

Country Link
JP (1) JPH11302387A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021187456A1 (en) * 2020-03-19 2021-09-23 Agc株式会社 Method for producing surface-modified tetrafluoroethylene-based polymer, method for producing modified powder, liquid composition, method for producing modified molded article, and modified molded article
WO2022044506A1 (en) * 2020-08-25 2022-03-03 富士フイルム株式会社 Microchannel device, droplet production method, bubble production method, microcapsule production method, multiple emulsion production method, method for producing droplets including bubbles, and microchannel device manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021187456A1 (en) * 2020-03-19 2021-09-23 Agc株式会社 Method for producing surface-modified tetrafluoroethylene-based polymer, method for producing modified powder, liquid composition, method for producing modified molded article, and modified molded article
WO2022044506A1 (en) * 2020-08-25 2022-03-03 富士フイルム株式会社 Microchannel device, droplet production method, bubble production method, microcapsule production method, multiple emulsion production method, method for producing droplets including bubbles, and microchannel device manufacturing method

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