JPH11248650A - X-ray diffraction microscope device - Google Patents
X-ray diffraction microscope deviceInfo
- Publication number
- JPH11248650A JPH11248650A JP10055373A JP5537398A JPH11248650A JP H11248650 A JPH11248650 A JP H11248650A JP 10055373 A JP10055373 A JP 10055373A JP 5537398 A JP5537398 A JP 5537398A JP H11248650 A JPH11248650 A JP H11248650A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- slit
- diffraction
- sample
- rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、Ｘ線源からのＸ線
を結晶性の試料の各位置に照射したときにこれら各位置
から生ずる回折Ｘ線をこれら各位置に対応させて検出す
ることによって試料の各位置の結晶状態を調べるＸ線回
折顕微装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of detecting X-rays emitted from an X-ray source at each position of a crystalline sample by irradiating the X-ray source with the X-ray source at each position. The present invention relates to an X-ray diffraction microscope for examining a crystal state at each position of a sample.
【０００２】[0002]
【従来の技術】図３は、従来のＸ線回折顕微装置の構成
を示す図である。図３に示されるように、Ｘ線源１から
出射した照射Ｘ線Ｘｏは第１スリット２及び第２スリッ
ト３によって発散角が制限された後、試料４に照射され
る。試料４は、照射Ｘ線Ｘｏの進行方向に対してこの試
料の特定の結晶格子面による回折Ｘ線Ｘｄが生ずる角度
関係に設定される。試料４からの回折Ｘ線Ｘｄは、第３
スリット５を介してＸ線フィルム６によって検出（撮
影）される。第３スリット５は、そのスリット幅が回折
Ｘ線Ｘｄを通過させるに必要十分な幅に設定され、回折
Ｘ線Ｘｄは通過させるが照射Ｘ線Ｘｏの通過は阻止す
る。そして、第３スリット５は固定したままで、試料４
とＸ線フィルム６とを上記設定角度関係を維持しながら
互いに平行な方向にそれぞれ同期しながら移動されるよ
うになっている。これにより、例えば、シリコン等の半
導体結晶その他の結晶性試料の各位置における回折像が
Ｘ線フィルム６に記録され、各位置における結晶欠陥の
有無等の結晶状態を調べることができる。2. Description of the Related Art FIG. 3 is a diagram showing a configuration of a conventional X-ray diffraction microscope. As shown in FIG. 3, the irradiation X-ray Xo emitted from the X-ray source 1 is applied to the sample 4 after the divergence angle is limited by the first slit 2 and the second slit 3. The sample 4 is set to have an angular relationship with respect to the traveling direction of the irradiation X-ray Xo, in which a diffraction X-ray Xd by a specific crystal lattice plane of the sample is generated. The diffraction X-ray Xd from the sample 4
It is detected (photographed) by the X-ray film 6 through the slit 5. The third slit 5 has a slit width set to a width that is necessary and sufficient to allow the diffracted X-rays Xd to pass, and allows the diffracted X-rays Xd to pass therethrough but blocks the irradiation X-rays Xo from passing through. Then, while the third slit 5 remains fixed, the sample 4
The X-ray film 6 and the X-ray film 6 are moved in synchronization with each other in directions parallel to each other while maintaining the above-mentioned set angle relationship. Thereby, for example, a diffraction image at each position of a semiconductor crystal such as silicon or another crystalline sample is recorded on the X-ray film 6, and a crystal state such as the presence or absence of a crystal defect at each position can be examined.
【０００３】[0003]
【発明が解決しようとする課題】ところが、上記従来の
Ｘ線回折顕微装置においては、照射Ｘ線Ｘｏの発散角を
制限する第２スリット３から発生する散乱Ｘ線Ｘｓが試
料４を透過した後第３スリット５を通過してＸ線フィル
ム６に達することを防ぐことはできなかった。このため
試料の回折像にこの散乱Ｘ線によるバックグランド（か
ぶり）が生じ、良好な回折像を得ることが困難であっ
た。However, in the above conventional X-ray diffraction microscope, after the scattered X-rays Xs generated from the second slit 3 for limiting the divergence angle of the irradiated X-rays Xo pass through the sample 4, It was not possible to prevent the X-ray film 6 from reaching the X-ray film 6 through the third slit 5. For this reason, a background (fog) due to the scattered X-rays is generated in the diffraction image of the sample, and it is difficult to obtain a good diffraction image.
【０００４】本発明は、上述の背景のもとでなされたも
のであり、照射Ｘ線の発散角を制限するスリット等から
発生する散乱Ｘ線その他のノイズが回折Ｘ線の検出手段
に到達することを防止して良好な回折像を得ることがで
きるＸ線回折顕微装置を提供することを目的とするもの
である。The present invention has been made under the above-mentioned background, and scattered X-rays and other noises generated from a slit or the like for limiting a divergence angle of irradiated X-rays reach a diffraction X-ray detecting means. It is an object of the present invention to provide an X-ray diffraction microscope capable of preventing such a phenomenon and obtaining a good diffraction image.
【０００５】[0005]
【課題を解決するための手段】上述の課題を解決するた
めの手段として、請求項１に記載の発明は、Ｘ線源から
のＸ線を結晶性の試料の各位置に照射したときにこれら
各位置から生ずる回折Ｘ線をこれら各位置に対応させて
検出することによって試料の各位置の結晶状態を調べる
Ｘ線回折顕微装置において、前記試料からの回折Ｘ線を
検出する際に試料と回折Ｘ線検出手段との間に設けられ
るスリット手段であって回折Ｘ線は通過させるが照射Ｘ
線や散乱Ｘ線の通過は制限するスリット手段として、ス
リット手段を構成する少なくとも一対のＸ線遮蔽体の一
方と他方とを、前記回折Ｘ線を通過させるために必要な
スリット幅を確保しつつ前記回折Ｘ線の進行方向におい
て互いにずらして配置してなるスリット手段を用いるこ
とを特徴とするＸ線回折顕微装置。Means for Solving the Problems As means for solving the above-mentioned problems, the invention according to claim 1 is characterized in that when an X-ray from an X-ray source is irradiated on each position of a crystalline sample, the X-rays are irradiated with the X-rays. In an X-ray diffraction microscope for examining the crystal state at each position of the sample by detecting the diffracted X-rays generated from each position in correspondence with each of these positions, when the X-ray diffraction from the sample is detected, the sample is diffracted. A slit means provided between the X-ray detecting means, which allows diffracted X-rays to pass therethrough but emits X-rays.
As slit means for restricting the passage of X-rays and scattered X-rays, one and the other of at least a pair of X-ray shields constituting the slit means, while securing a slit width necessary for passing the diffracted X-rays. An X-ray diffraction microscope, characterized by using slit means arranged so as to be shifted from each other in the direction of travel of the diffracted X-rays.
【０００６】請求項２の発明は、前記スリット手段を構
成する一対のＸ線遮蔽体は、少なくともこれらによって
形成されるスリット幅を調整できるようにそれぞれ独立
に移動できる移動手段を有することを特徴とする請求項
１に記載のＸ線回折顕微装置である。The invention of claim 2 is characterized in that the pair of X-ray shields constituting the slit means have moving means which can be moved independently so that at least the slit width formed by these can be adjusted. The X-ray diffraction microscope according to claim 1.
【０００７】請求項３の発明は、前記スリット手段を試
料と回折Ｘ線検出手段との間に複数対設けたことを特徴
とする請求項１に記載のＸ線回折顕微装置である。The invention according to claim 3 is the X-ray diffraction microscope according to claim 1, wherein a plurality of pairs of the slit means are provided between the sample and the diffraction X-ray detection means.
【０００８】[0008]
【発明の実施の形態】図１は本発明の一実施の形態に係
るＸ線回折顕微装置の構成を示す図である。以下、図１
を参照にしながら一実施の形態を説明する。なお、この
実施の形態は、図３に示した従来例と共通する部分が多
いので、共通する部分には同一の符号を付して説明す
る。FIG. 1 is a diagram showing the configuration of an X-ray diffraction microscope according to one embodiment of the present invention. Hereinafter, FIG.
An embodiment will be described with reference to FIG. In this embodiment, since many parts are common to the conventional example shown in FIG. 3, the common parts will be described with the same reference numerals.
【０００９】図１において、Ｘ線源１から出射した照射
Ｘ線Ｘｏは第１スリット２及び第２スリット３によって
発散角が制限された後、試料４に照射されるようになっ
ている。試料４は、シリコンウエハ等の板状をなした結
晶性の試料である。試料４は照射Ｘ線Ｘｏの進行方向に
対してこの試料の特定の結晶格子面による回折Ｘ線Ｘｄ
が生ずる角度関係に設定される。図示しないが、上記角
度関係が設定できるように、試料４に対する照射Ｘ線Ｘ
ｏの入射角を調整できる角度調節手段が設けられてい
る。また、上記試料４は、該試料表面に平行な方向に移
動できるようになっており、図示しないが、試料４を図
の矢印ｐ方向に移動できる移動手段が設けられている。In FIG. 1, an irradiation X-ray Xo emitted from an X-ray source 1 is irradiated on a sample 4 after a divergence angle is limited by a first slit 2 and a second slit 3. The sample 4 is a plate-like crystalline sample such as a silicon wafer. The sample 4 has a diffracted X-ray Xd due to a specific crystal lattice plane of the sample with respect to the traveling direction of the irradiated X-ray Xo.
Is set to an angle relationship where Although not shown, the irradiation X-ray X-
An angle adjusting means for adjusting the incident angle of o is provided. The sample 4 can be moved in a direction parallel to the surface of the sample, and a moving means (not shown) for moving the sample 4 in the direction of arrow p in the figure is provided.
【００１０】また、回折Ｘ線Ｘｄの進行方向下流に向か
って順次スリット手段５０及びＸ線フィルム６が配置さ
れる。スリット手段５０は、ともに板状のＸ線遮蔽部材
からなる第１のＸ線遮蔽体５１と第２のＸ線遮蔽体５２
とによって構成される。この実施の形態においては、こ
れら第１のＸ線遮蔽体５１及び第２のＸ線遮蔽体５２
は、板状の試料４に平行になるように配置され、かつ、
回折Ｘ線Ｘｄの進行方向に対して互いにずらして配置し
てある。また、第１のＸ線遮蔽体５１及び第２のＸ線遮
蔽体５２は、回折Ｘ線を通過させる幅を変えたり、どの
格子面からの回折Ｘ線を通過させるかを選択することが
できるように、各々独立に図の矢印方向（この実施の形
態では試料４の表面に平行な方向）に移動調節できるよ
うになっている。すなわち、これら第１のＸ線遮蔽体５
１及び第２のＸ線遮蔽体５２は、図示しないが、これら
をそれぞれ独立に移動できる移動手段が設けられてい
る。Further, a slit means 50 and an X-ray film 6 are sequentially arranged toward the downstream in the traveling direction of the diffracted X-ray Xd. The slit means 50 includes a first X-ray shield 51 and a second X-ray shield 52 both formed of plate-shaped X-ray shield members.
It is constituted by and. In this embodiment, the first X-ray shield 51 and the second X-ray shield 52
Are arranged so as to be parallel to the plate-shaped sample 4, and
They are arranged shifted from each other with respect to the traveling direction of the diffracted X-ray Xd. In addition, the first X-ray shield 51 and the second X-ray shield 52 can change the width through which the diffracted X-rays pass, or select which grating plane from which the diffracted X-rays pass. As described above, the movement can be adjusted independently in the direction of the arrow in the figure (in this embodiment, the direction parallel to the surface of the sample 4). That is, these first X-ray shields 5
Although not shown, the first and second X-ray shields 52 are provided with moving means capable of independently moving them.
【００１１】Ｘ線フィルム６は、この実施の形態ではそ
の撮像面が試料４の表面に平行になるように設置されて
いる。また、Ｘ線フィルム６も試料４の移動方向と平行
な方向に移動できるようになっている。すなわち、図示
しないが、Ｘ線フィルム６も該Ｘ線フィルム６を上記方
向に移動する移動手段に取り付けられている。In this embodiment, the X-ray film 6 is set so that its imaging surface is parallel to the surface of the sample 4. Further, the X-ray film 6 can be moved in a direction parallel to the moving direction of the sample 4. That is, although not shown, the X-ray film 6 is also attached to the moving means for moving the X-ray film 6 in the above direction.
【００１２】上述の構成において、Ｘ線源１から出射し
た照射Ｘ線Ｘｏは第１スリット２及び第２スリット３に
よって発散角が制限された後、試料４に照射される。試
料４から生じた回折Ｘ線Ｘｄは、スリット手段５０を通
過し、Ｘ線イルム６に到達して検出（撮影）される。In the above configuration, the irradiation X-ray Xo emitted from the X-ray source 1 is applied to the sample 4 after the divergence angle is limited by the first slit 2 and the second slit 3. The diffracted X-ray Xd generated from the sample 4 passes through the slit means 50, reaches the X-ray film 6, and is detected (photographed).
【００１３】ここで、スリット手段５０を構成する第１
のＸ線遮蔽体５１及び第２のＸ線遮蔽体５２は、図示し
ない移動手段によってその位置を測定目的に応じて適切
な位置に設定される。すなわち、測定の際には、まず試
料４から生ずる回折Ｘ線のうち、どの結晶格子面からの
回折Ｘ線を通過させて撮影するかが決定される。これに
よって回折Ｘ線Ｘｄの進行方向が決まる。また、同時
に、その決定された特定の回折Ｘ線のビーム幅も決ま
る。そこで、この決まった条件を満たして必要十分な回
折Ｘ線ＸｄがＸ線フィルム６に到達するように第１のＸ
線遮蔽体５１及び第２のＸ線遮蔽体５２の位置をそれぞ
れ移動して最適な位置に設定する。Here, the first part of the slit means 50 is described.
The positions of the X-ray shields 51 and the second X-ray shields 52 are set to appropriate positions by a moving unit (not shown) according to the measurement purpose. That is, at the time of measurement, first, out of the diffraction X-rays generated from the sample 4, it is determined from which crystal lattice plane the diffraction X-rays from which to pass are taken. This determines the traveling direction of the diffracted X-ray Xd. At the same time, the determined specific X-ray beam width is also determined. Therefore, the first X-ray beam is transmitted to the X-ray film 6 so that the necessary and sufficient diffracted X-ray beam Xd satisfies the predetermined condition.
The position of the line shield 51 and the position of the second X-ray shield 52 are moved and set to optimal positions.
【００１４】そして、試料４及びＸ線フィルム６を互い
に平行な方向（図の矢印ｐ方向）に所定の速度関係で移
動させながら撮影を行なう。これにより、試料４の各位
置における回折像がＸ線フィルム６に記録され、各位置
における結晶欠陥の有無等の結晶状態がＸ線フィルム６
に記録される。Then, an image is taken while moving the sample 4 and the X-ray film 6 in a direction parallel to each other (the direction of the arrow p in the drawing) at a predetermined speed relationship. Thereby, a diffraction image at each position of the sample 4 is recorded on the X-ray film 6, and the crystal state such as the presence or absence of a crystal defect at each position is changed to the X-ray film 6.
Will be recorded.
【００１５】上述の実施の形態によれば、照射Ｘ線Ｘｏ
の一部は試料４を透過してＸ線フィルム６に向かって直
進するが、第２のＸ線遮蔽体５２によって遮られてＸ線
フィルム６には到達できない。また、第２スリット３に
おいて照射Ｘ線Ｘｏによって散乱Ｘ線Ｘｓが生じ、これ
が試料４を透過してＸ線フィルム６に向かって直進する
が、この実施の形態では、この散乱Ｘ線Ｘｓも第２のＸ
線遮蔽体５２によって遮られてＸ線シルム６に到達する
ことはできない。したがって、この実施の形態によれ
ば、照射Ｘ線Ｘｏの発散角を制限する第２スリット３か
ら発生する散乱Ｘ線ＸｓがＸ線フィルム６に到達するの
をほぼ完全に防止することができ、良好な回折像を得る
ことが可能になる。According to the above embodiment, the irradiation X-ray Xo
Is transmitted straight through the sample 4 toward the X-ray film 6, but cannot reach the X-ray film 6 because it is blocked by the second X-ray shield 52. Further, scattered X-rays Xs are generated by the irradiated X-rays Xo in the second slit 3 and pass through the sample 4 and travel straight toward the X-ray film 6, but in this embodiment, the scattered X-rays Xs 2 X
The X-ray film 6 cannot be blocked by the line shield 52. Therefore, according to this embodiment, it is possible to almost completely prevent the scattered X-rays Xs generated from the second slit 3 that limits the divergence angle of the irradiated X-rays Xo from reaching the X-ray film 6, A good diffraction image can be obtained.
【００１６】図２は本発明の実施の形態の変形例を示す
図である。図２に示されるように、図１における第１の
Ｘ線遮蔽体５１及び第２のＸ線遮蔽体５２のそれぞれと
通常のスリット形成するように同様のＸ線遮蔽体５１ａ
及びＸ線遮蔽体５２ａを各々設けてもよい。この変形例
によれば、上述の実施の形態の効果を維持しつつさらに
試料４等から生ずる二次的な散乱Ｘ線がＸ線フィルム６
に到達することを防止する効果も得られ、より鮮明な回
折像を得ることを可能にする。FIG. 2 is a diagram showing a modification of the embodiment of the present invention. As shown in FIG. 2, each of the first X-ray shield 51 and the second X-ray shield 52 in FIG. 1 has the same X-ray shield 51a as a normal slit.
And an X-ray shield 52a. According to this modification, the secondary scattered X-rays generated from the sample 4 and the like are further reduced while maintaining the effects of the above-described embodiment.
Is also obtained, and a clearer diffraction image can be obtained.
【００１７】また、図示しないが、スリット手段５０を
回折Ｘ線Ｘｄの進行方向に沿って複数設けもよい。Although not shown, a plurality of slit means 50 may be provided along the traveling direction of the diffracted X-ray Xd.
【００１８】なお、以上説明した実施の形態では、移動
調節等の制御を容易にする意味で、試料４の表面に対し
て第１のＸ線遮蔽体５１、第２のＸ線遮蔽体５２及びＸ
線フィルム６を全て平行に配置する例を掲げたが、これ
らは必ずしも平行である必要はなく、必要なスリット効
果並びに撮像効果を得られる範囲で任意の角度配置関係
でもよい。In the embodiment described above, the first X-ray shield 51, the second X-ray shield 52, and the second X-ray shield 52 with respect to the surface of the sample 4 are provided in order to facilitate control such as movement adjustment. X
Although the example in which all the line films 6 are arranged in parallel has been described, they need not necessarily be parallel, and may have an arbitrary angle arrangement relationship as long as a necessary slit effect and an imaging effect can be obtained.
【００１９】また、回折Ｘ線検出手段として上述の実施
の形態では、Ｘ線フィルムを用いた例を掲げたが、Ｘ線
フィルムと同様の機能を有する二次元検出手段であれば
Ｘ線フィルムに限定されるものではない。Ｘ線フィルム
以外の二次元検出手段としては例えば、Ｘ線テレビカメ
ラや輝尽性螢光体プレート（例えば、富士写真フィルム
株式会社から市販されている商品名「イメージングプレ
ート」等がある）等を挙げることができる。In the above embodiment, an example using an X-ray film has been described as the diffracted X-ray detecting means. However, any two-dimensional detecting means having the same function as the X-ray film may be used as the X-ray film. It is not limited. Examples of the two-dimensional detecting means other than the X-ray film include an X-ray television camera and a stimulable phosphor plate (for example, a product name “Imaging plate” commercially available from Fuji Photo Film Co., Ltd.). Can be mentioned.
【００２０】[0020]
【発明の効果】以上詳述したように、本発明は、Ｘ線回
折顕微装置において、試料と回折Ｘ線検出手段との間に
設けられるスリット手段として、スリット手段を構成す
る少なくとも一対のＸ線遮蔽体の一方と他方とを、前記
回折Ｘ線を通過させるために必要なスリット幅を確保し
つつ前記回折Ｘ線の進行方向において互いにずらして配
置してなるスリット手段を用いることを特徴とするもの
で、これにより、照射Ｘ線の発散角を制限するスリット
等から発生する散乱Ｘ線その他のノイズが回折Ｘ線の検
出手段に到達することを防止して良好な回折像を得るこ
とができるＸ線回折顕微装置を得ている。As described above in detail, according to the present invention, in an X-ray diffraction microscope, at least one pair of X-rays constituting a slit means is provided as a slit means provided between a sample and a diffracted X-ray detecting means. A slit means is used in which one and the other of the shields are arranged so as to be shifted from each other in a traveling direction of the diffracted X-ray while securing a slit width necessary for passing the diffracted X-ray. Thereby, it is possible to prevent scattered X-rays and other noises generated from a slit or the like for limiting the divergence angle of the irradiated X-rays from reaching the diffraction X-ray detection means and obtain a good diffraction image. An X-ray diffraction microscope has been obtained.
【図１】本発明の一実施の形態に係るＸ線回折顕微装置
の構成を示す図である。FIG. 1 is a diagram showing a configuration of an X-ray diffraction microscope according to an embodiment of the present invention.
【図２】本発明の実施の形態の変形例を示す図である。FIG. 2 is a diagram showing a modification of the embodiment of the present invention.
【図３】従来のＸ線回折顕微装置の構成を示す図であ
る。FIG. 3 is a diagram showing a configuration of a conventional X-ray diffraction microscope.
１…Ｘ線源、２…第１スリット、３…第２スリット、４
…試料、５…第３スリット、６…Ｘ線フィルム、５０…
スリット手段、５１…第１のＸ線遮蔽体、５２…第２の
Ｘ線遮蔽体、５１ａ，５２ａ…Ｘ線遮蔽体。DESCRIPTION OF SYMBOLS 1 ... X-ray source, 2 ... 1st slit, 3 ... 2nd slit, 4
... sample, 5 ... third slit, 6 ... X-ray film, 50 ...
Slit means, 51: first X-ray shield, 52: second X-ray shield, 51a, 52a: X-ray shield.
Claims (3)
置に照射したときにこれら各位置から生ずる回折Ｘ線を
これら各位置に対応させて検出することによって試料の
各位置の結晶状態を調べるＸ線回折顕微装置において、 前記試料からの回折Ｘ線を検出する際に試料と回折Ｘ線
検出手段との間に設けられるスリットであって回折Ｘ線
は通過させるが照射Ｘ線の通過を阻止するとともに散乱
Ｘ線その他のノイズとなるＸ線の通過を制限するスリッ
ト手段として、スリット手段を構成する少なくとも一対
のＸ線遮蔽体の一方と他方とを、前記回折Ｘ線を通過さ
せるために必要なスリット幅を確保しつつ前記回折Ｘ線
の進行方向において互いにずらして配置してなるスリッ
ト手段を用いることを特徴とするＸ線回折顕微装置。1. When an X-ray from an X-ray source is irradiated on each position of a crystalline sample, diffracted X-rays generated from each position are detected in correspondence with each position, thereby detecting each position on the sample. In an X-ray diffraction microscope for examining a crystal state, a slit provided between a sample and a diffraction X-ray detecting means for detecting a diffraction X-ray from the sample, the diffraction X-ray passing therethrough, but the irradiation X-ray As slit means for blocking the passage of scattered X-rays and other noise-causing X-rays, and passing the diffracted X-rays through at least one of a pair of X-ray shields constituting the slit means. An X-ray diffraction microscope using slit means which are arranged so as to be shifted from each other in the traveling direction of the diffracted X-ray while securing a slit width necessary for the X-ray diffraction.
遮蔽体は、少なくともこれらによって形成されるスリッ
ト幅を調整できるようにそれぞれ独立に移動できる移動
手段を有することを特徴とする請求項１に記載のＸ線回
折顕微装置。2. The apparatus according to claim 1, wherein said pair of X-ray shields constituting said slit means have moving means which can move independently so as to adjust at least a slit width formed by them. The X-ray diffraction microscope described in the above.
手段との間に複数対設けたことを特徴とする請求項１に
記載のＸ線回折顕微装置。3. The X-ray diffraction microscope according to claim 1, wherein a plurality of pairs of the slit means are provided between the sample and the diffraction X-ray detection means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10055373A JPH11248650A (en) | 1998-03-06 | 1998-03-06 | X-ray diffraction microscope device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10055373A JPH11248650A (en) | 1998-03-06 | 1998-03-06 | X-ray diffraction microscope device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11248650A true JPH11248650A (en) | 1999-09-17 |
Family
ID=12996691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10055373A Pending JPH11248650A (en) | 1998-03-06 | 1998-03-06 | X-ray diffraction microscope device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11248650A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009025234A (en) * | 2007-07-23 | 2009-02-05 | Rigaku Corp | Method for evaluating hard tissue |
| CN105403580A (en) * | 2015-12-28 | 2016-03-16 | 清华大学 | Collimator and inspection system |
-
1998
- 1998-03-06 JP JP10055373A patent/JPH11248650A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009025234A (en) * | 2007-07-23 | 2009-02-05 | Rigaku Corp | Method for evaluating hard tissue |
| CN105403580A (en) * | 2015-12-28 | 2016-03-16 | 清华大学 | Collimator and inspection system |
| WO2017113834A1 (en) * | 2015-12-28 | 2017-07-06 | 清华大学 | Collimator and inspection system |
| CN105403580B (en) * | 2015-12-28 | 2018-10-09 | 清华大学 | Collimator and inspection system |
| US10658088B2 (en) | 2015-12-28 | 2020-05-19 | Tsinghua University | Collimator and inspection system having the same |
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