JPH1123840A - Double refractive plate - Google Patents
Double refractive plateInfo
- Publication number
- JPH1123840A JPH1123840A JP9174909A JP17490997A JPH1123840A JP H1123840 A JPH1123840 A JP H1123840A JP 9174909 A JP9174909 A JP 9174909A JP 17490997 A JP17490997 A JP 17490997A JP H1123840 A JPH1123840 A JP H1123840A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- dielectric material
- double refractive
- wavelength
- birefringent plate
- Prior art date
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、円偏光、直線偏
光、楕円偏光を必要とする光学機器及び、光学素子に適
用されるものであり、広帯域で効率的に機能する複屈折
板を提供するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is applied to optical devices and optical elements that require circularly polarized light, linearly polarized light, and elliptically polarized light, and provides a birefringent plate that functions efficiently over a wide band. Things.
【０００２】[0002]
【従来の技術】従来の複屈折板のほとんどは、無機光学
単結晶、あるいは高分子延伸フィルムにより作られてい
る。しかし、無機光学単結晶は波長板として、性能、耐
久性、信頼性に優れるものの、原材料費、加工コストが
高い。2. Description of the Related Art Most conventional birefringent plates are made of an inorganic optical single crystal or a stretched polymer film. However, although the inorganic optical single crystal is excellent in performance, durability, and reliability as a wave plate, the raw material cost and the processing cost are high.
【０００３】また高分子延伸フィルムは、熱やＵＶ光線
に対して劣化しやすく耐久性に問題があるという欠点を
有している。[0003] Further, the stretched polymer film has a drawback that it is easily deteriorated by heat and UV rays and has a problem in durability.
【０００４】一方、斜め柱状構造をもつ斜方蒸着膜（斜
方蒸着波長板）は、原理的に膜厚を調整することによっ
て任意の位相差を設定でき、大面積化が比較的容易であ
ると共に、大量生産により低コスト化の可能性がある。On the other hand, an obliquely deposited film (obliquely deposited wave plate) having an oblique columnar structure can set an arbitrary phase difference by adjusting the film thickness in principle, and it is relatively easy to increase the area. At the same time, there is a possibility of cost reduction by mass production.
【０００５】しかしながら、従来の単一材料を用いた斜
方蒸着では、位相差の波長分散特性により、波長板とし
てはある特定波長に対してのみ機能するものであった。However, in the conventional oblique deposition using a single material, the wavelength plate functions only for a specific wavelength due to the wavelength dispersion characteristic of the phase difference.
【０００６】[0006]
【発明が解決しようとする課題】前述したように従来の
単一材料で構成された斜方蒸着膜は、位相差の波長分散
特性が可視光域において入射光波長が長波長になるに連
れて概ね単調減少の曲線となるため、ある特定の単一波
長に対してのみ波長板として機能していた。As described above, in the conventional obliquely deposited film made of a single material, the wavelength dispersion characteristic of the phase difference increases as the incident light wavelength becomes longer in the visible light region. Since the curve was almost monotonically decreasing, it functioned as a wave plate only for a specific single wavelength.
【０００７】これを改善するために本発明は、斜方蒸着
により発現、機能する複屈折膜を複数種類蒸着すること
によって複屈折板を形成し、位相差の加成性を利用する
ことにより、広帯域で効率的に機能する複屈折板を提供
するものである。In order to improve this, the present invention provides a birefringent plate formed by depositing a plurality of types of birefringent films exhibiting and functioning by oblique deposition, and utilizing the additive property of a phase difference. An object of the present invention is to provide a birefringent plate that functions efficiently in a wide band.
【０００８】[0008]
【課題を解決するための手段】上記目的を達成するため
に、複屈折率Δｎの波長分散値α（α＝Δｎ(450nm)／
Δｎ(650nm)）の関係が異なる誘電体材料を用い、αA＞
αBである誘電体材料Ａ及びＢを積層した複屈折板にお
いて、各層の位相差Ｒの関係がＲA＜ＲBであり、各遅相
軸が直交していることを特徴とする。In order to achieve the above object, the wavelength dispersion value of the birefringence .DELTA.n (.alpha. =. DELTA.n (450 nm) /
Δn (650 nm) ) using dielectric materials having different relationships, α A >
In a birefringent plate obtained by laminating dielectric materials A and B each having α B , the relation of the retardation R of each layer is R A <R B , and the slow axes are orthogonal to each other.
【０００９】また該複屈折板は、固体基板に誘電体材料
を該基板面法線に対して斜め方向から蒸着して形成した
斜方蒸着膜からなる複屈折板であって、前記蒸着膜は少
なくとも２層から成ることを特徴とする複屈折板であ
り、その作製方法において、各層の誘電体材料の基板に
対する蒸着方向を直交させて積層することを特徴とす
る。Further, the birefringent plate is a birefringent plate comprising an obliquely deposited film formed by depositing a dielectric material on a solid substrate in a direction oblique to the normal to the substrate surface. A birefringent plate comprising at least two layers, and in a method for manufacturing the birefringent plate, the layers are stacked so that a direction of vapor deposition of a dielectric material on a substrate is orthogonal to the layer.
【００１０】また蒸着に用いられる材料としては、誘電
体材料が金属酸化物、金属フッ化物及び金属硫化物のう
ち少なくとも１つを用いることを特徴とする。Further, as a material used for vapor deposition, the dielectric material is characterized by using at least one of a metal oxide, a metal fluoride and a metal sulfide.
【００１１】更に該固体基板上に誘電体材料を介しての
表面に反射防止膜が形成されていると良い。Further, it is preferable that an anti-reflection film is formed on the surface of the solid substrate via a dielectric material.
【００１２】[0012]
【発明の実施の形態】前記斜方蒸着によって形成される
複屈折板は、基板に対して斜め方向から粒子を蒸着する
ことによって斜め柱状構造膜を形成し、その基板に垂直
に入射する光線に対して複屈折性を有するものである。DESCRIPTION OF THE PREFERRED EMBODIMENTS The birefringent plate formed by the oblique vapor deposition forms an oblique columnar structure film by vapor-depositing particles from an oblique direction with respect to a substrate, and is provided for a light beam which is perpendicularly incident on the substrate. On the other hand, it has birefringence.
【００１３】斜方蒸着では、蒸着の初期段階においてよ
く知られているような核形成がなされるが、核が成長し
ある程度の高さをもつようになると、図４のように斜め
方向から蒸着物質が飛来してくるために、蒸着物質の入
射方向から見て核の後ろ側に、蒸着物質が直接付着でき
ない陰ができる。これは一般にセルフ・シャドーイング
効果と呼ばれ（文献：薄膜作製応用ハンドブック参照：
株式会社エヌ・ティー・エス発行：１９９５年）、斜方
蒸着膜が特異な形態を示す主要因の一つである。In oblique deposition, nucleation is formed in a well-known manner in the initial stage of deposition. However, when the nucleus grows and has a certain height, the deposition is performed from an oblique direction as shown in FIG. Since the material comes flying, behind the nucleus when viewed from the incident direction of the deposition material, there is a shadow to which the deposition material cannot directly adhere. This is generally called the self-shadowing effect (refer to the literature: Handbook for Thin Film Fabrication Application:
(NTS Co., Ltd., published in 1995), and the oblique deposition film is one of the main factors showing a unique form.
【００１４】このセルフ・シャドーイング効果によって
基板面法線から測って蒸着角θより小さい角度αで傾斜
した柱状組織が成長する。この柱状組織は粒子の入射面
と平行な方向に粗く、垂直な方向に密に分布しているた
め、前者方向で屈折率が最小、後者方向で屈折率が最大
となり、蒸着粒子の入射方向から見て光学的異方性媒質
を形成している。これにより基板面法線方向から入射す
る光線に対しても、屈折率楕円体の断面は楕円体となり
複屈折が生じる。By this self-shadowing effect, a columnar structure inclined at an angle α smaller than the deposition angle θ as measured from the normal to the substrate surface grows. Since this columnar structure is coarse in the direction parallel to the incident surface of the particles and densely distributed in the perpendicular direction, the refractive index is the smallest in the former direction, the refractive index is the largest in the latter direction, and from the incident direction of the deposited particles. Seemingly, it forms an optically anisotropic medium. As a result, the cross section of the refractive index ellipsoid becomes an ellipsoid even for a light ray incident from the normal direction of the substrate surface, and birefringence occurs.
【００１５】更に位相差の波長分散特性の異なる材料を
用い、該複屈折膜の遅相軸が基板表面で直交するように
斜方蒸着膜を形成し、多層構造に積層する。ここで遅相
軸は、該複屈折媒体の光学軸つまり該基板に対する蒸着
方向と一致するため、該基板表面で蒸着方向を直交させ
れば良く、つまり図３において蒸発源３１で所望の膜厚
を形成した後、続いて蒸発源３４から異なる材料を同様
に所望の膜厚を形成すればよい。Further, an oblique deposition film is formed by using materials having different wavelength dispersion characteristics of the phase difference so that the slow axis of the birefringent film is orthogonal to the substrate surface, and is laminated in a multilayer structure. Here, since the slow axis coincides with the optical axis of the birefringent medium, that is, the direction of vapor deposition on the substrate, the direction of vapor deposition may be made orthogonal to the surface of the substrate. That is, in FIG. Then, a different material from the evaporation source 34 may be similarly formed to a desired film thickness.
【００１６】これにより、蒸着材料の異なる複屈折膜の
位相差の加成性を利用することにより、該複屈折膜の波
長分散特性を改善し、広帯域波長板を実現することが可
能となる。Thus, by utilizing the additivity of the phase difference between the birefringent films of different vapor deposition materials, the wavelength dispersion characteristics of the birefringent films can be improved, and a broadband wave plate can be realized.
【００１７】尚、各蒸着膜の膜厚、蒸着角（基板表面に
対する法線と蒸着粒子の飛来する方向）は、該蒸着膜に
要求される位相差により異なり、所望の波長板として機
能するように最適化する必要がある。The thickness and the deposition angle (the normal to the substrate surface and the direction in which the deposited particles fly) of each deposited film differ depending on the phase difference required for the deposited film, and may function as a desired wavelength plate. Need to be optimized.
【００１８】[0018]
【実施例】以下、具体的な実施例により本発明を説明す
る。図１は、本発明に用いられる蒸着装置の一例を示す
真空蒸着装置の側面図である。The present invention will be described below with reference to specific examples. FIG. 1 is a side view of a vacuum evaporation apparatus showing an example of an evaporation apparatus used in the present invention.
【００１９】図１に示す真空蒸着装置について説明する
と、この真空蒸着装置は図示していない排気ポンプによ
り内部を真空に排気されるベルジャー１６と、各種蒸着
材料を蒸発させるための蒸発源１５と、その上部に設け
られた基板ホルダー１２等から構成されている。尚、蒸
発源１５に関しては、その種類を問わず抵抗加熱や、電
子ビーム、レーザービーム等を用いて局部的に加熱する
ものを用いてもかまわない。The vacuum evaporation apparatus shown in FIG. 1 will be described. The vacuum evaporation apparatus has a bell jar 16 whose inside is evacuated by an exhaust pump (not shown), an evaporation source 15 for evaporating various evaporation materials, and It is composed of a substrate holder 12 and the like provided on the upper part. Regarding the evaporation source 15, any type may be used, regardless of its type, such as resistance heating, heating locally using an electron beam, a laser beam, or the like.
【００２０】また、ベルジャー１６の内部は、排気孔１
４を介して図示していない排気ポンプと連結されてお
り、排気ポンプによって１０-6Torrオーダーまで排気で
きるようになっている。The inside of the bell jar 16 is provided with the exhaust hole 1.
The pump 4 is connected to an exhaust pump (not shown) through the pump 4 so that the exhaust pump can exhaust air to the order of 10 -6 Torr.
【００２１】図１に示す装置を用い、固体基板１１に、
蒸着材料である五酸化タンタル（Ｔａ2Ｏ5）を、蒸着角
７０゜で下層２２として成膜した後、図２に示すように
蒸着粒子の入射面を基板法線において９０゜変えて蒸着
材料フッ化ランタン（ＬａＦ3）蒸着し、その際の蒸着
角を同様に７０゜で上層２１として成膜して図２に示す
複屈折板を得た。Using the apparatus shown in FIG. 1, a solid substrate 11 is
After depositing tantalum pentoxide (Ta 2 O 5 ) as a deposition material at a deposition angle of 70 ° as the lower layer 22, as shown in FIG. Lanthanum fluoride (LaF 3 ) was vapor-deposited, and the vapor deposition angle at that time was similarly set to 70 ° to form a film as the upper layer 21 to obtain the birefringent plate shown in FIG.
【００２２】以下に示す実施例では、誘電体材料として
五酸化タンタル（Ｔａ2Ｏ5）とフッ化ランタン（ＬａＦ
3）を用いたが、これらは可視光に対して透明な材料で
あればよく、その他にＣｅＯ2、ＷＯ3、Ｂｉ2Ｏ3、Ｓｎ
Ｏ2、ＺｎＳ、ＮｄＦ3等を用いることができるが、各蒸
着膜の位相差の波長分散特性を考慮した上で、位相差の
加成性を利用し最適化可能な誘電体材料を選ばなければ
ならない。In the following embodiments, tantalum pentoxide (Ta 2 O 5 ) and lanthanum fluoride (LaF) are used as dielectric materials.
Although 3 ) was used, these may be any material that is transparent to visible light, and may be CeO 2 , WO 3 , Bi 2 O 3 , Sn
O 2 , ZnS, NdF 3, etc. can be used. However, in consideration of the wavelength dispersion characteristics of the phase difference of each vapor-deposited film, a dielectric material that can be optimized by using the additivity of the phase difference must be selected. Must.
【００２３】また、蒸着膜は多層構造にしても良いが、
各層において柱状組織が十分成長していること、更に位
相差の波長分散特性が適切となるよう各層の膜厚を最適
化する必要がある。The deposited film may have a multilayer structure.
It is necessary to optimize the thickness of each layer so that the columnar structure is sufficiently grown in each layer and the wavelength dispersion characteristics of the retardation are appropriate.
【００２４】以下具体的な実施例を説明する。尚本実施
例では、その製造方法の一例について述べるがこれに限
るものではない。 （実施例１）図１において、固体基板１１にガラス基板
を用い、該ガラス基板に対して蒸着粒子が傾き角θ＝７
０゜で入射するように設定した。蒸着材料にはＴａ2Ｏ5
（五酸化タンタル）を用いた。蒸着材料Ｔａ2Ｏ5のαA
＝Δｎ(450nm)／Δｎ(650nm)は、１．１８であった。蒸
発物質Ｔａ2Ｏ5を抵抗加熱用ボートに電流を流すことに
よって加熱して蒸発させ、五酸化タンタルの薄膜を入射
光波長λ＝５５０nmでの位相差ＲA（５５０ｎｍ）＝１
３７．５ｎｍになるように、膜厚１．７μｍ形成した。A specific embodiment will be described below. In this embodiment, an example of the manufacturing method will be described, but the present invention is not limited to this. (Example 1) In FIG. 1, a glass substrate was used as the solid substrate 11, and the deposition particles had an inclination angle θ = 7 with respect to the glass substrate.
It was set to enter at 0 °. Ta 2 O 5
(Tantalum pentoxide) was used. Α A of evaporation material Ta 2 O 5
= Δn (450 nm) / Δn (650 nm) was 1.18. The evaporating substance Ta 2 O 5 is heated and evaporated by passing a current through a resistance heating boat, and the thin film of tantalum pentoxide is converted into a phase difference RA (550 nm) = 1 at an incident light wavelength λ = 550 nm.
A film having a thickness of 1.7 μm was formed to have a thickness of 37.5 nm.
【００２５】次に、該ガラス基板を蒸着粒子の入射面が
基板面において、前記入射面に垂直になるように設置し
（図３参照）、傾き角θ＝７０度に設定した。蒸着材料
にＬａＦ3（フッ化ランタン）を入れ、同様に抵抗加熱
用ボートによって加熱して蒸発させ、フッ化ランタンの
薄膜を入射光波長λ＝５５０nmでの位相差ＲB(550nm)＝
２７５ｎｍになるように、４．０μｍ積層した。蒸着材
料ＬａＦ3のαB＝Δｎ(450nm)／Δｎ(650nm)は、１．０
４であった。さらに該蒸着膜の上に、ＭｇＦ2を約０．
１７μｍ形成し、反射防止膜とした。Next, the glass substrate was set so that the incident surface of the vapor deposition particles was perpendicular to the incident surface on the substrate surface (see FIG. 3), and the inclination angle θ was set to 70 °. LaF 3 (lanthanum fluoride) is put into the vapor deposition material, similarly heated and evaporated by a resistance heating boat, and a thin film of lanthanum fluoride is converted into a phase difference R B (550 nm) at an incident light wavelength λ = 550 nm =
The film was laminated to a thickness of 4.0 μm so that the thickness became 275 nm. Α B = Δn (450 nm) / Δn (650 nm) of the vapor deposition material LaF 3 is 1.0
It was 4. Further, MgF 2 was added to the vapor-deposited film in a thickness of about 0.1 μm.
17 μm was formed to form an antireflection film.
【００２６】（比較例１）実施例１と同様にして、固体
基板１１にガラス基板を用い、該ガラス基板に対して蒸
着粒子が傾き角θ＝７０゜で入射するように設定し、蒸
発物質Ｔａ2Ｏ5を抵抗加熱用ボートに電流を流すことに
よって加熱して蒸発させ、五酸化タンタルの薄膜を入射
光波長λ＝５５０nmでの位相差ＲA(550nm)＝１３７．５
ｎｍになるように膜厚１．７μｍ形成することにより、
Ｔａ2Ｏ5を単一材料として用い、斜方蒸着膜１層のみか
らなるλ／４波長板を得た。(Comparative Example 1) In the same manner as in Example 1, a glass substrate was used as the solid substrate 11, and the evaporation particles were set so as to enter the glass substrate at an inclination angle θ = 70 °. Ta 2 O 5 is heated and evaporated by passing an electric current through a resistance heating boat, and a thin film of tantalum pentoxide is converted into a phase difference R A (550 nm) at an incident light wavelength λ = 550 nm of 137.5.
By forming a film having a thickness of 1.7 μm to be
Using Ta 2 O 5 as a single material, a λ / 4 wavelength plate consisting of only one obliquely deposited film was obtained.
【００２７】実施例１と比較例１で得られたλ／４波長
板の波長分散特性を図５及び図６に示す。FIGS. 5 and 6 show the wavelength dispersion characteristics of the λ / 4 wavelength plates obtained in Example 1 and Comparative Example 1. FIG.
【００２８】（実施例１の効果）図６において、理想的
な広帯域λ／４波長板として機能するためには、各波長
に対してΔｎｄ／λが０．２５となれば良い。ここで本
実施例と比較例を比べると、青色の波長（λ＝４８０ｎ
ｍ）において、０．３１→０．２８となり約５０％、ま
た赤色の波長（λ＝６５６ｎｍ）においては、０．２０
→０．２１となり約２０％それぞれ改善され、広帯域で
機能性に優れたλ／４波長板として提供することができ
る。(Effect of Embodiment 1) In FIG. 6, Δnd / λ should be 0.25 for each wavelength in order to function as an ideal broadband λ / 4 wavelength plate. Here, when comparing the present example with the comparative example, the blue wavelength (λ = 480 n
m) is 0.31 → 0.28, which is about 50%, and 0.20 at the red wavelength (λ = 656 nm).
→ 0.21, which is improved by about 20%, and can be provided as a λ / 4 wavelength plate excellent in functionality over a wide band.
【００２９】（実施例２）図１において、蒸着材料にＴ
ａ2Ｏ5を入れ同様に斜方蒸着を行い、ガラス基板上に、
入射光波長λ＝５５０nmでの位相差ＲA(550nm)＝６８．
８ｎｍになるように、厚さ０．８５μｍのＴａ2Ｏ5薄膜
を形成し、同様に該ガラス基板を蒸着粒子の入射面が基
板面において、前記入射面に垂直になるように設置し
（図３参照）斜方蒸着行い、厚さ２．０μｍのＬａＦ3
蒸着膜を積層した。更に前期同様ＭｇＦ2を、入射光波
長λ＝５５０nmでの位相差ＲA(550nm)＝１３７．５ｎｍ
になるように、約０．１７μｍ形成し反射防止膜を形成
した。(Example 2) In FIG.
a 2 O 5 was added and oblique vapor deposition was performed in the same manner.
Phase difference R A (550 nm) at incident light wavelength λ = 550 nm = 68.
A Ta 2 O 5 thin film having a thickness of 0.85 μm is formed so as to have a thickness of 8 nm, and the glass substrate is similarly placed such that the incident surface of the vapor deposition particles is perpendicular to the incident surface on the substrate surface (see FIG. 3) LaF 3 with 2.0 μm thickness by oblique deposition
A deposited film was laminated. Further, as in the previous case, MgF 2 was replaced with a phase difference RA (550 nm) of 137.5 nm at an incident light wavelength λ = 550 nm.
Was formed to a thickness of about 0.17 μm to form an antireflection film.
【００３０】（比較例２）実施例２と同様にして、蒸着
材料にＴａ2Ｏ5を入れ同様に斜方蒸着を行い、ガラス基
板上に、入射光波長λ＝５５０nmでの位相差ＲA(550nm)
＝６８．８ｎｍになるように、厚さ０．８５μｍのＴａ
2Ｏ5薄膜を形成することにより、Ｔａ2Ｏ5を単一材料と
して用い、斜方蒸着膜１層のみからなるλ／８波長板を
得た。(Comparative Example 2) In the same manner as in Example 2, Ta 2 O 5 was added to the vapor deposition material and oblique vapor deposition was performed in the same manner, and a phase difference RA at an incident light wavelength λ = 550 nm was formed on a glass substrate. (550nm)
= 0.85 μm of Ta so that = 68.8 nm
By forming a 2 O 5 thin film, a λ / 8 wavelength plate consisting of only one obliquely deposited film was obtained using Ta 2 O 5 as a single material.
【００３１】実施例２と比較例２で得られたλ／８波長
板の波長分散特性を図７及び図８に示す。FIGS. 7 and 8 show the wavelength dispersion characteristics of the λ / 8 wave plate obtained in Example 2 and Comparative Example 2. FIG.
【００３２】（実施例２の効果）図８において、理想的
な広帯域λ／８波長板として機能するためには、各波長
に対してΔｎｄ／λが０．１２５となれば良い。ここで
本実施例と比較例を比べると、青色の波長（λ＝４８０
ｎｍ）において、０．１５３→０．１３８となり約５０
％、また赤色の波長（λ＝６５６ｎｍ）においては、
０．１００→０．１０７となり約３０％それぞれ改善さ
れ、広帯域で機能性に優れたλ／８波長板として提供す
ることができる。(Effect of Embodiment 2) In FIG. 8, in order to function as an ideal broadband λ / 8 wavelength plate, Δnd / λ should be 0.125 for each wavelength. Here, when the present embodiment and the comparative example are compared, the blue wavelength (λ = 480)
nm), it becomes 0.153 → 0.138, which is about 50
%, And at the red wavelength (λ = 656 nm),
0.100 → 0.107, which is improved by about 30%, and can be provided as a λ / 8 wavelength plate having excellent functionality over a wide band.
【００３３】[0033]
【発明の効果】以上、要するに本発明は、位相差の波長
分散特性が異なる誘電体材料を用いた斜方蒸着膜を利用
する複屈折板であって、少なくとも２層から構成され、
各遅相軸が直交し積層構造を形成したものである。As described above, the present invention is basically a birefringent plate using an obliquely deposited film using a dielectric material having a different wavelength dispersion characteristic of retardation, and is composed of at least two layers.
Each of the slow axes is orthogonal to form a laminated structure.
【００３４】実施例に詳述したように、本発明の複屈折
板を用いた波長板は、従来の機能を維持しながらも、単
一波長に対する波長板としての機能だけでなく、広帯域
においても効率的に機能するよう改善されたものであ
る。As described in detail in the embodiments, the wave plate using the birefringent plate of the present invention not only functions as a wave plate for a single wavelength but also in a wide band while maintaining the conventional function. It has been improved to work efficiently.
【図１】 本発明の複屈折板製造方法を実施するための
真空蒸着装置の１例を示す側面図である。FIG. 1 is a side view showing one example of a vacuum evaporation apparatus for carrying out a method for producing a birefringent plate of the present invention.
【図２】 本発明の複屈折板の積層構造を示す図であ
る。FIG. 2 is a diagram showing a laminated structure of a birefringent plate of the present invention.
【図３】 本発明の蒸着角θと基板の位置関係を示す図
である。FIG. 3 is a diagram showing a positional relationship between a deposition angle θ and a substrate according to the present invention.
【図４】 本発明の蒸着角θと柱状構造の傾斜角αの関
係を示す図である。FIG. 4 is a diagram showing a relationship between a deposition angle θ and an inclination angle α of a columnar structure according to the present invention.
【図５】 本発明の実施例１の波長板の波長分散特性を
示す図である。FIG. 5 is a diagram illustrating wavelength dispersion characteristics of the wave plate according to the first embodiment of the present invention.
【図６】 同実施例の波長板の機能性の波長分散特性を
示す図である。FIG. 6 is a diagram showing wavelength dispersion characteristics of the functionality of the wave plate of the example.
【図７】 本発明の実施例２の波長板の波長分散特性を
示す図である。FIG. 7 is a diagram illustrating a wavelength dispersion characteristic of a wave plate according to a second embodiment of the present invention.
【図８】 同実施例の波長板の機能性の波長分散特性を
示す図である。FIG. 8 is a diagram showing the wavelength dispersion characteristics of the functionality of the wave plate of the example.
１１ ・・・固体基板 １２ ・・・基板ホルダー １３ ・・・加熱用電源 １４ ・・・排気孔 １５ ・・・蒸発源 １６ ・・・ベルジャー １７ ・・・蒸着材料 １８ ・・・蒸発粒子 ２１ ・・・上層蒸着膜 ２２ ・・・下層蒸着膜 ２３ ・・・固体基板 ２４ ・・・上層蒸着膜の遅相軸 ２５ ・・・下層蒸着膜の遅相軸 ２６ ・・・基板面法線 ３１ ・・・蒸発源 ３２ ・・・固体基板 ３３ ・・・斜方蒸着膜 ３４ ・・・蒸発源 ４１ ・・・固体基板 ４２ ・・・入射角θ ４３ ・・・柱状組織の傾斜角α ４４ ・・・蒸着物質の入射方向 ４５ ・・・柱状組織の傾斜方向 ４６ ・・・基板面法線 ４７ ・・・斜方蒸着膜 DESCRIPTION OF SYMBOLS 11 ... Solid substrate 12 ... Substrate holder 13 ... Heating power supply 14 ... Exhaust hole 15 ... Evaporation source 16 ... Bell jar 17 ... Evaporation material 18 ... Evaporated particles 21 ··· Upper layer deposited film 22 ··· Lower layer deposited film 23 ··· Solid substrate 24 ··· Slow axis of upper layer deposited film 25 ··· Slow axis of lower layer deposited film 26 ··· Normal to substrate surface 31 ··· ..Evaporation source 32: solid substrate 33: obliquely deposited film 34: evaporation source 41: solid substrate 42: incident angle θ 43: inclination angle α of columnar structure 44・ Injection direction of deposition material 45 ・ ・ ・ Inclination direction of columnar structure 46 ・ ・ ・ Substrate surface normal 47 ・ ・ ・ Oblique deposition film
Claims (5)
(450nm)／Δｎ(650nm)）の関係が、αA＞αBである誘電
体材料Ａ及びＢを固体基板上に積層した複屈折板におい
て、各層の位相差Ｒの関係がＲA＜ＲBであり、各遅相軸
が直交していることを特徴とする複屈折板。1. A wavelength dispersion value α (α = Δn) of a birefringence index Δn.
(450 nm) / Δn (650 nm) ) In a birefringent plate in which dielectric materials A and B satisfying α A > α B are laminated on a solid substrate, the relationship of the phase difference R of each layer is R A <R. B. A birefringent plate, wherein each slow axis is orthogonal.
斜め方向から蒸着して形成した斜方蒸着膜からなる誘電
体材料である請求項１記載の複屈折板。2. The birefringent plate according to claim 1, wherein the dielectric material is a dielectric material comprising an obliquely deposited film formed by being deposited obliquely with respect to the normal to the solid substrate surface.
及び金属硫化物のうち少なくとも１つからなる誘電体材
料である請求項１又は２記載の複屈折板。3. The birefringent plate according to claim 1, wherein the dielectric material is a dielectric material comprising at least one of a metal oxide, a metal fluoride, and a metal sulfide.
防止膜が形成されていることを特徴とする、請求項１記
載の複屈折板。4. The birefringent plate according to claim 1, wherein an antireflection film is formed on the solid substrate via a dielectric material.
屈折板の作製方法において、各層の誘電体材料の基板に
対する蒸着方向を直交させて作製することを特徴とする
複屈折板の作製方法。5. A method for producing a birefringent plate comprising at least two layers of a dielectric material, wherein the method comprises producing the dielectric material of each layer in a direction perpendicular to the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9174909A JPH1123840A (en) | 1997-06-30 | 1997-06-30 | Double refractive plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9174909A JPH1123840A (en) | 1997-06-30 | 1997-06-30 | Double refractive plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1123840A true JPH1123840A (en) | 1999-01-29 |
Family
ID=15986824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9174909A Pending JPH1123840A (en) | 1997-06-30 | 1997-06-30 | Double refractive plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1123840A (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001083326A (en) * | 1999-07-13 | 2001-03-30 | Sumitomo Chem Co Ltd | Composite phase-contrast plate |
| JP2006171327A (en) * | 2004-12-15 | 2006-06-29 | Fuji Photo Film Co Ltd | Phase difference compensation element, and liquid crystal display device and liquid crystal projector using same |
| JP2006235543A (en) * | 2005-02-28 | 2006-09-07 | Sony Corp | Reflecting polarizer, manufacturing method and machine thereof, and liquid crystal display |
| WO2007007858A1 (en) * | 2005-07-11 | 2007-01-18 | Fujifilm Corporation | Phase difference compensating element, liquid crystal device, and projection type display apparatus |
| WO2011148465A1 (en) * | 2010-05-25 | 2011-12-01 | ソニーケミカル＆インフォメーションデバイス株式会社 | Wave plate and wave plate manufacturing method |
| JP2012256024A (en) * | 2011-05-16 | 2012-12-27 | Dexerials Corp | Phase difference element |
| JP2013137394A (en) * | 2011-12-28 | 2013-07-11 | Nippon Zeon Co Ltd | Method for manufacturing retardation film |
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-
1997
- 1997-06-30 JP JP9174909A patent/JPH1123840A/en active Pending
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001083326A (en) * | 1999-07-13 | 2001-03-30 | Sumitomo Chem Co Ltd | Composite phase-contrast plate |
| JP2006171327A (en) * | 2004-12-15 | 2006-06-29 | Fuji Photo Film Co Ltd | Phase difference compensation element, and liquid crystal display device and liquid crystal projector using same |
| JP4595586B2 (en) * | 2005-02-28 | 2010-12-08 | ソニー株式会社 | REFLECTIVE POLARIZER AND METHOD FOR MANUFACTURING THE SAME, APPARATUS FOR PRODUCING REFLECTIVE POLARIZER, AND LIQUID CRYSTAL DISPLAY |
| JP2006235543A (en) * | 2005-02-28 | 2006-09-07 | Sony Corp | Reflecting polarizer, manufacturing method and machine thereof, and liquid crystal display |
| WO2007007858A1 (en) * | 2005-07-11 | 2007-01-18 | Fujifilm Corporation | Phase difference compensating element, liquid crystal device, and projection type display apparatus |
| US7760275B2 (en) | 2005-07-11 | 2010-07-20 | Fujifilm Corporation | Phase difference compensating element, liquid crystal device, and projection type display apparatus |
| JP2007017890A (en) * | 2005-07-11 | 2007-01-25 | Fujifilm Holdings Corp | Phase difference compensating element, liquid crystal apparatus and projection type display apparatus |
| TWI396907B (en) * | 2005-07-11 | 2013-05-21 | Fujifilm Corp | Phase difference compensation element, and liquid crystal device and projective display device |
| WO2011148465A1 (en) * | 2010-05-25 | 2011-12-01 | ソニーケミカル＆インフォメーションデバイス株式会社 | Wave plate and wave plate manufacturing method |
| JP5490891B2 (en) * | 2010-05-25 | 2014-05-14 | デクセリアルズ株式会社 | Wave plate and method for manufacturing the wave plate |
| US9989687B2 (en) | 2010-05-25 | 2018-06-05 | Dexerials Corporation | Wave plate having consistent birefringence properties across the visible spectrum and manufacturing method for same |
| JP2012256024A (en) * | 2011-05-16 | 2012-12-27 | Dexerials Corp | Phase difference element |
| JP2013137394A (en) * | 2011-12-28 | 2013-07-11 | Nippon Zeon Co Ltd | Method for manufacturing retardation film |
| US10317599B2 (en) | 2015-03-19 | 2019-06-11 | Dexerials Corporation | Wavelength plate and optical device |
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