JPH112327A - O-ring and device therewith - Google Patents
O-ring and device therewithInfo
- Publication number
- JPH112327A JPH112327A JP15406897A JP15406897A JPH112327A JP H112327 A JPH112327 A JP H112327A JP 15406897 A JP15406897 A JP 15406897A JP 15406897 A JP15406897 A JP 15406897A JP H112327 A JPH112327 A JP H112327A
- Authority
- JP
- Japan
- Prior art keywords
- ring
- base plate
- container
- present
- cross
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Gasket Seals (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、Ｏリング、及びこ
れを具備するＯリングを備えた装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an O-ring and an apparatus provided with the O-ring.
【０００２】[0002]
【従来の技術】部材と部材を組み合わせて真空容器等を
構成する場合、メンテナンス等を考慮しＯリングを介し
て密閉性を確保している。このとき、Ｏリングは弾性体
で断面形状は円形のものが用いられる。図１６及び図１
７に従来のＯリングを示す。図１６はＯリングを具備す
る装置を上面からみた上面図で、図１７はＯリングを具
備する装置の断面図である。その構成を説明すると、１
０１はベースプレート、１０２は容器、１０３はベース
プレート１０１に設置されたＯリング枠、２００はＯリ
ング、２０１はＯリングの合成ゴム製の部位をそれぞれ
示している。2. Description of the Related Art When a vacuum vessel or the like is constructed by combining members with each other, hermeticity is ensured via an O-ring in consideration of maintenance and the like. At this time, the O-ring is an elastic body having a circular cross section. FIG. 16 and FIG.
7 shows a conventional O-ring. FIG. 16 is a top view of the device including the O-ring as viewed from above, and FIG. 17 is a cross-sectional view of the device including the O-ring. The structure is described as follows.
01 is a base plate, 102 is a container, 103 is an O-ring frame installed on the base plate 101, 200 is an O-ring, and 201 is a synthetic rubber part of the O-ring.
【０００３】容器内部に反応性の高い物質が有る場合材
質には、合成ゴム製のＯリングに代えて、フッ素系の高
分子材料を用いている。例えば、プラズマエッチング装
置では真空中に反応ガスを導入し高周波印加によりプラ
ズマ化するが、真空のシールドに合成ゴム製のＯリング
を用いた場合、プラズマに曝された部分は徐々に劣化し
パーティクルを生じ、最後には亀裂が生じ真空を維持で
きなくなるからである。[0003] When a highly reactive substance is present in the container, a fluorine-based polymer material is used instead of the synthetic rubber O-ring. For example, in a plasma etching apparatus, a reaction gas is introduced into a vacuum and turned into plasma by applying a high frequency. When an O-ring made of synthetic rubber is used for a vacuum shield, a portion exposed to the plasma gradually deteriorates and particles are removed. This is because, in the end, a crack is formed and it becomes impossible to maintain a vacuum.
【０００４】また、特開平４−１９３９７０号の図１で
は、真空容器とこれに覗き窓を組合わせた装置を開示し
ており、真空容器の覗き窓に接触する面に切られた溝部
にゴム製のＯリング１２を配置し、かつ、容器の覗き窓
と接する内壁のテーパ部に金属製リングあるいは耐腐食
性の高い材料からなるリングを配置するようにして、Ｏ
リングがプラズマエッチングガス等から保護することを
記載している。FIG. 1 of Japanese Patent Laid-Open No. 4-193970 discloses an apparatus in which a vacuum vessel and a viewing window are combined with each other. A metal ring or a ring made of a material having high corrosion resistance is arranged on the tapered portion of the inner wall in contact with the viewing window of the container.
It describes that the ring protects from a plasma etching gas or the like.
【０００５】[0005]
【発明が解決しようとする課題】上述したように、一般
に用いられる合成ゴム系のＯリングは柔軟な弾性体であ
り容器の外気遮断性に富む反面、耐薬品・耐プラズマ性
が低い。合成ゴム系のＯリングにかえて、耐腐食性を有
するフッ素樹脂からなるＯリングを使用した場合には、
弾性が低く外気遮断性が低くなってしまう。そのためフ
ッ素含有の合成ゴム等も開発されているが、高価であっ
たり、物理的な強度も低かったりする。容器内部に反応
性の高い物質が有る場合Ｏリングの材質は限られ、フッ
素系の合成ゴムを用いる場合等があるが通常の合成ゴム
系のＯリングに比べ１００倍から１０００倍ものコスト
がかかる。また、耐熱性に劣る物が多く交換品度も多く
なる等の問題点を有していた。As described above, generally used synthetic rubber-based O-rings are flexible and elastic and have a good barrier property against outside air, but have low chemical and plasma resistance. When an O-ring made of a fluororesin having corrosion resistance is used instead of a synthetic rubber O-ring,
The elasticity is so low that the outside air blocking performance is low. For this reason, fluorine-containing synthetic rubbers and the like have been developed, but they are expensive and have low physical strength. When there is a highly reactive substance inside the container, the material of the O-ring is limited, and there are cases where a fluorine-based synthetic rubber is used. However, the cost is 100 to 1000 times that of a normal synthetic rubber-based O-ring. . In addition, there is a problem that many of the materials have poor heat resistance and the degree of replacement is increased.
【０００６】さらに、特開平４−１９３９７０号に記載
した方法では金属製あるいは耐腐食性の高い材料からな
るＯリングを容器内壁に保持する方法が困難である。Further, in the method described in JP-A-4-193970, it is difficult to hold an O-ring made of metal or a material having high corrosion resistance on the inner wall of the container.
【０００７】また、容器が例えばガラスのように壊れや
すい場合、特に真空装置である場合Ｏリングのつぶれに
より容器とベースプレートが当接して破損することがあ
った。Further, when the container is fragile like glass, for example, especially in the case of a vacuum device, the container may come into contact with the base plate due to the collapse of the O-ring, and the container may be damaged.
【０００８】[0008]
【課題を解決するための手段】本発明のＯリングは、平
面形状は環状である弾性体で断面形状は円形であるＯリ
ングであって、前記Ｏリングは環状の突起部を有するこ
とを特徴とする。An O-ring according to the present invention is an O-ring having an annular planar shape and an O-ring having a circular cross-section, wherein the O-ring has an annular projection. And
【０００９】また、本発明のＯリングを具備した装置
は、平面形状は環状である弾性体で断面形状は円形であ
るＯリングを具備した装置であって、前記Ｏリングは環
状の突起部を有することを特徴とする。Further, the device provided with the O-ring of the present invention is a device provided with an O-ring having a ring-shaped elastic body and a circular cross-section, wherein the O-ring has a ring-shaped projection. It is characterized by having.
【００１０】さらに、本発明のＯリングは、突起部が耐
腐食性材料からなることを特徴とする。Further, the O-ring of the present invention is characterized in that the projection is made of a corrosion-resistant material.
【００１１】[0011]
【作用】本発明によれば、Ｏリングの弾性が無くなって
つぶれた場合も突起部が容器間にクッション的に入って
いるため容器破損の心配がない。また、容器の破損によ
りＯリングが損傷することも防止できるため、Ｏリング
の寿命を飛躍的に伸ばすことができる。また、容器内・
外部に反応性の高い物質が有る場合、耐腐食性材料の突
起が合成ゴム製のＯリングを保護するため腐食に強く、
合成ゴムの弾力性で気密性を高くできるという効果を奏
する。According to the present invention, even when the O-ring loses its elasticity and is crushed, there is no fear of breakage of the container because the protrusion is provided as a cushion between the containers. Further, since the O-ring can be prevented from being damaged due to the breakage of the container, the life of the O-ring can be drastically extended. In addition, in container
If there is a highly reactive substance on the outside, the protrusion of the corrosion resistant material protects the synthetic rubber O-ring to resist corrosion,
This has the effect that the airtightness can be increased by the elasticity of the synthetic rubber.
【００１２】[0012]
【発明の実施の形態】以下、本発明の実施の形態を図面
に基づいて説明する。Embodiments of the present invention will be described below with reference to the drawings.
【００１３】図１乃至図１５において、図中に示すＯリ
ングは図の左側がＯリングの内周側として説明する。In FIGS. 1 to 15, the O-ring shown in the drawings will be described on the assumption that the left side of the drawing is the inner peripheral side of the O-ring.
【００１４】図１乃至図１０を用いて、本願の第１の実
施例を説明する。図２、図４、図６、図８及び図１０は
Ｏリングの断面図を、図１、図３、図５、図７、図９
は、それぞれ、図２、図４、図６、図８、図１０に示し
たＯリングを備えた装置を示す。その構成を説明する
と、１０１はベースプレート、１０２は容器、１０３は
ベースプレート１０１に設置されたＯリング枠、２０１
は合成ゴム製のＯリングを示す。A first embodiment of the present invention will be described with reference to FIGS. 2, 4, 6, 8, and 10 are cross-sectional views of the O-ring, and FIGS. 1, 3, 5, 7, and 9 are sectional views of the O-ring.
Shows an apparatus provided with the O-ring shown in FIGS. 2, 4, 6, 8, and 10, respectively. Explaining the structure, 101 is a base plate, 102 is a container, 103 is an O-ring frame installed on the base plate 101, 201
Indicates an O-ring made of synthetic rubber.
【００１５】図２に示すＯリングはＯリング内周側に、
図４のＯリングはＯリング外周側に、図６のＯリングは
Ｏリングの内周側と外周側の両方に、図８のＯリングは
Ｏリングの上部と下部に、図１０のＯリングはＯリング
下部に突起部が形成されている。図２、図４、図６、図
８、図１０のような突起部を持つＯリングを、それぞれ
図１、図３、図５、図７、図９の様に装置へ組み込み、
真空装置又は外気圧により容器１０２が、ベースプレー
ト１０１に押さえ付けられたとき、Ｏリングはベースプ
レートに垂直な方向に押しつぶされ、容器とベースプレ
ートの隙間にはＯリングの突起部がクッションとして介
在するため、直接容器とベースプレートが接触しない。
よって、容器とベースプレートの接触による容器の破損
が起こらず、また、容器とベースプレートが接触するこ
とによるパーティクルの発生も防止出来る。The O-ring shown in FIG.
The O-ring of FIG. 4 is on the outer peripheral side of the O-ring, the O-ring of FIG. 6 is on both the inner peripheral side and the outer peripheral side of the O-ring, the O-ring of FIG. Has a projection formed below the O-ring. The O-rings having the protruding portions as shown in FIGS. 2, 4, 6, 8, and 10 are incorporated into the apparatus as shown in FIGS. 1, 3, 5, 7, and 9, respectively.
When the container 102 is pressed against the base plate 101 by a vacuum device or an external pressure, the O-ring is crushed in a direction perpendicular to the base plate, and a protrusion of the O-ring is interposed as a cushion in a gap between the container and the base plate. There is no direct contact between the container and the base plate.
Therefore, damage of the container due to contact between the container and the base plate does not occur, and generation of particles due to contact between the container and the base plate can be prevented.
【００１６】図１１乃至図１５を用いて、本願発明の第
２の実施例を説明する。A second embodiment of the present invention will be described with reference to FIGS.
【００１７】図１１乃至図１５はＯリングの断面図を示
しており、２０１はＯリングの合成ゴム製の部位、２０
２はＯリングのフッ素樹脂等の耐腐食性材料でできた板
状突起部位である。図１１では、板状突起部位が、Ｏリ
ング内周に沿って環状に設置されている。図１２では、
Ｏリングの外周に沿って板状突起部位が環状に設置さ
れ、図１３ではＯリングの内周、外周の両方に沿って板
状突起部位が環状に設置され、図１４ではＯリング下部
に沿って板状突起部位が環状に設置され、図１５ではＯ
リング上下部に沿って板状突起部位が環状に設置されて
いる例を示す。FIGS. 11 to 15 are sectional views of the O-ring, and 201 is a synthetic rubber portion of the O-ring.
Reference numeral 2 denotes a plate-like projection portion made of a corrosion-resistant material such as a fluororesin of the O-ring. In FIG. 11, the plate-like projections are provided in an annular shape along the inner circumference of the O-ring. In FIG.
Plate-shaped projections are provided annularly along the outer circumference of the O-ring, in FIG. 13 plate-shaped projections are provided annularly along both the inner circumference and the outer circumference of the O-ring, and in FIG. The plate-like projection portion is installed in an annular shape, and in FIG.
An example is shown in which plate-shaped projections are installed in a ring along the upper and lower portions of the ring.
【００１８】実施例１と同様に、真空装置又は外気圧に
より容器１０２が、ベースプレート１０１に押さえ付け
られたとき、Ｏリングはベースプレートに垂直な方向に
押しつぶされ、容器とベースプレートの隙間にはＯリン
グの突起部が介在するようになるため、板状突起部位が
クッションとして働き、容器とベースプレートとが直接
接触することを防止する。As in the first embodiment, when the container 102 is pressed against the base plate 101 by a vacuum device or an external pressure, the O-ring is crushed in a direction perpendicular to the base plate, and the O-ring is formed in the gap between the container and the base plate. Since the projections are interposed, the plate-like projections function as cushions, thereby preventing the container and the base plate from directly contacting each other.
【００１９】さらに、これらのＯリングについては、特
に耐薬品・耐プラズマ性が高い。例えばプラズマエッチ
ング装置では真空中に反応ガスを導入し高周波印加によ
りプラズマ化するが、これらの突起部を有するＯリング
を、反応雰囲気側に突起部が来るように設置すると、圧
力２Ｔｏｒｒで酸素１３００ＳＣＣＭを導入しマイクロ
波９００Ｗで励起した場合、Ｏリングは使用一年後でも
パーティクルの発生はなく真空の保持も十分行えた。ま
た、容器として、石英のベルジャーを使用した場合、突
起部のないＯリングを用いると、三ヶ月程度で石英の欠
け等が発生するが、本実施例によればベースプレートに
当たることなく運用できた。またこれらのＯリングは、
従来のＯリング溝の改造をせずに使えた。Furthermore, these O-rings are particularly high in chemical resistance and plasma resistance. For example, in a plasma etching apparatus, a reaction gas is introduced into a vacuum and turned into plasma by applying a high frequency. When an O-ring having these projections is installed such that the projections come to the reaction atmosphere side, 1300 SCCM oxygen is applied at a pressure of 2 Torr. When introduced and excited by microwaves of 900 W, the O-ring did not generate particles even after one year of use, and was able to sufficiently maintain the vacuum. When a quartz bell jar is used as the container, if an O-ring without a projection is used, chipping of the quartz or the like occurs in about three months, but according to the present embodiment, the operation could be performed without hitting the base plate. These O-rings
It can be used without modifying the conventional O-ring groove.
【００２０】また、コスト的にもフッ素樹脂等の反応性
の高い樹脂自体は手に入りやすい価格であり、２０ｃｍ
の環状板で合成ゴムと組み合わせた場合、フッ素含有ゴ
ムの２から３桁安価に用意できる。Also, in terms of cost, highly reactive resins such as fluororesins themselves are easily available and have a cost of 20 cm.
When it is combined with synthetic rubber using the annular plate, fluorine-containing rubber can be prepared two to three orders of magnitude cheaper.
【００２１】以上、本願発明の第１の実施例及び第２の
実施例ではプラズマ装置について説明しているが、一例
でありこれらに限られるわけではなく薬品の容器や、真
空容器、等様々な応用が可能である。また、本願発明の
Ｏリング及びＯリングを備えた装置は、既存のＯリング
用溝を使え装置の改造が必要なく拡張性に優れた物であ
る。Although the first and second embodiments of the present invention have been described with reference to the plasma apparatus, this is merely an example, and the present invention is not limited thereto. Application is possible. Further, the O-ring and the device provided with the O-ring according to the present invention are excellent in expandability without using any existing O-ring groove and requiring modification of the device.
【００２２】[0022]
【発明の効果】以上述べたように、本発明のＯリング及
びＯリングを備えた装置によれば、Ｏリングのつぶれに
よる交換頻度を飛躍的に延ばせた。また、ガラス容器、
石英容器やセラミック容器等の破損しやすい部品との組
み合わせにおいて、破損の回避が実現できた。As described above, according to the O-ring and the device provided with the O-ring of the present invention, the replacement frequency due to the collapse of the O-ring can be greatly increased. Also, glass containers,
In combination with easily breakable parts such as a quartz container and a ceramic container, breakage could be avoided.
【００２３】低コストで耐薬品・耐プラズマ性の高いの
シールドが実現でき、Ｏリングの劣化によるパーティク
ルの発生を抑え、真空の保持等にも優れた特性を得られ
る。It is possible to realize a shield with high chemical resistance and high plasma resistance at low cost, to suppress generation of particles due to deterioration of the O-ring, and to obtain excellent characteristics such as vacuum maintenance.
【図１】本発明の一実施の形態を示すＯリングを備えた
装置の断面図。FIG. 1 is a cross-sectional view of an apparatus having an O-ring according to an embodiment of the present invention.
【図２】本発明の一実施の形態を示すＯリングの断面
図。FIG. 2 is a cross-sectional view of an O-ring showing one embodiment of the present invention.
【図３】本発明の一実施の形態を示すＯリングを備えた
装置の断面図。FIG. 3 is a cross-sectional view of an apparatus having an O-ring according to an embodiment of the present invention.
【図４】本発明の一実施の形態を示すＯリングの断面
図。FIG. 4 is a cross-sectional view of an O-ring showing one embodiment of the present invention.
【図５】本発明の一実施の形態を示すＯリングを備えた
装置の断面図。FIG. 5 is a cross-sectional view of an apparatus including an O-ring according to an embodiment of the present invention.
【図６】本発明の一実施の形態を示すＯリングの断面
図。FIG. 6 is a cross-sectional view of an O-ring showing one embodiment of the present invention.
【図７】本発明の一実施の形態を示すＯリングを備えた
装置の断面図。FIG. 7 is a cross-sectional view of an apparatus having an O-ring according to an embodiment of the present invention.
【図８】本発明の一実施の形態を示すＯリングの断面
図。FIG. 8 is a cross-sectional view of an O-ring showing one embodiment of the present invention.
【図９】本発明の一実施の形態を示すＯリングを備えた
装置の断面図。FIG. 9 is a cross-sectional view of an apparatus including an O-ring according to an embodiment of the present invention.
【図１０】本発明の一実施の形態を示すＯリングの断面
図。FIG. 10 is a sectional view of an O-ring showing one embodiment of the present invention.
【図１１】本発明の一実施の形態を示すＯリングの断面
図。FIG. 11 is a cross-sectional view of an O-ring showing one embodiment of the present invention.
【図１２】本発明の一実施の形態を示すＯリングの断面
図。FIG. 12 is a cross-sectional view of an O-ring showing one embodiment of the present invention.
【図１３】本発明の一実施の形態を示すＯリングの断面
図。FIG. 13 is a cross-sectional view of an O-ring showing one embodiment of the present invention.
【図１４】本発明の一実施の形態を示すＯリングの断面
図。FIG. 14 is a cross-sectional view of an O-ring showing one embodiment of the present invention.
【図１５】本発明の一実施の形態を示すＯリングの断面
図。FIG. 15 is a cross-sectional view of an O-ring showing one embodiment of the present invention.
【図１６】従来の形態を示すＯリングの上面図。FIG. 16 is a top view of an O-ring showing a conventional mode.
【図１７】従来の形態を示すＯリングを備えた装置の断
面図。FIG. 17 is a cross-sectional view of a device including an O-ring showing a conventional mode.
【符号の説明】 １０１．ベースプレート １０２．容器 １０３．Ｏリング枠 ２００．Ｏリング ２０１．合成ゴム製のＯリング ２０２．耐腐食性材料のＯリング[Description of Signs] 101. Base plate 102. Container 103. O-ring frame 200. O-ring 201. O-ring made of synthetic rubber 202. O-ring of corrosion resistant material
Claims (4)
円形であるＯリングであって、前記Ｏリングは環状の突
起部を有することを特徴とするＯリング。1. An O-ring, wherein the planar shape is an O-ring having an annular elastic body and a circular cross-section, wherein the O-ring has an annular projection.
円形であるＯリングを具備した装置であって、前記Ｏリ
ングは環状の突起部を有することを特徴とするＯリング
を具備した装置。2. An apparatus comprising an O-ring having an annular elastic body and a circular cross-section, said O-ring having an annular projection. apparatus.
円形であるＯリングであって、前記Ｏリングは耐腐食性
材料の環状の突起部を有することを特徴とするＯリン
グ。3. The O-ring according to claim 1, wherein the O-ring has an annular elastic body and a circular cross-sectional shape, and the O-ring has an annular projection made of a corrosion-resistant material.
円形であるＯリングを具備した装置であって、前記Ｏリ
ングは耐腐食性材料の環状の突起部を有することを特徴
とするＯリングを具備した装置。4. An apparatus provided with an O-ring having an annular elastic body and a circular cross-sectional shape, wherein the O-ring has an annular projection made of a corrosion-resistant material. Device with O-ring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15406897A JPH112327A (en) | 1997-06-11 | 1997-06-11 | O-ring and device therewith |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15406897A JPH112327A (en) | 1997-06-11 | 1997-06-11 | O-ring and device therewith |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH112327A true JPH112327A (en) | 1999-01-06 |
Family
ID=15576199
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15406897A Withdrawn JPH112327A (en) | 1997-06-11 | 1997-06-11 | O-ring and device therewith |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH112327A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100643510B1 (en) | 2005-01-20 | 2006-11-10 | 박현문 | An apparatus for manufacturing semiconductor device for a large o-ring and thereby manufactured a semiconductor device for a large o-ring |
| JP2007251223A (en) * | 2001-06-01 | 2007-09-27 | Tokyo Electron Ltd | Plasma processing device |
| JP2007295001A (en) * | 2001-06-01 | 2007-11-08 | Tokyo Electron Ltd | Plasma processing apparatus |
| JP2020149925A (en) * | 2019-03-15 | 2020-09-17 | オムロン株式会社 | Sensor |
| JP2021036530A (en) * | 2016-03-29 | 2021-03-04 | Ｓｐｐテクノロジーズ株式会社 | Plasma processing apparatus |
-
1997
- 1997-06-11 JP JP15406897A patent/JPH112327A/en not_active Withdrawn
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007251223A (en) * | 2001-06-01 | 2007-09-27 | Tokyo Electron Ltd | Plasma processing device |
| JP2007295001A (en) * | 2001-06-01 | 2007-11-08 | Tokyo Electron Ltd | Plasma processing apparatus |
| KR100643510B1 (en) | 2005-01-20 | 2006-11-10 | 박현문 | An apparatus for manufacturing semiconductor device for a large o-ring and thereby manufactured a semiconductor device for a large o-ring |
| JP2021036530A (en) * | 2016-03-29 | 2021-03-04 | Ｓｐｐテクノロジーズ株式会社 | Plasma processing apparatus |
| JP2020149925A (en) * | 2019-03-15 | 2020-09-17 | オムロン株式会社 | Sensor |
| WO2020189412A1 (en) * | 2019-03-15 | 2020-09-24 | オムロン株式会社 | Sensor |
| KR20210114048A (en) * | 2019-03-15 | 2021-09-17 | 오므론 가부시키가이샤 | sensors and electronics |
| US11776770B2 (en) | 2019-03-15 | 2023-10-03 | Omron Corporation | Sensor and electronic device |
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