JPH1116529A - Sample fixing method for low vacuum scanning electron microscope and apparatus - Google Patents
Sample fixing method for low vacuum scanning electron microscope and apparatusInfo
- Publication number
- JPH1116529A JPH1116529A JP9163707A JP16370797A JPH1116529A JP H1116529 A JPH1116529 A JP H1116529A JP 9163707 A JP9163707 A JP 9163707A JP 16370797 A JP16370797 A JP 16370797A JP H1116529 A JPH1116529 A JP H1116529A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- chamber
- scanning electron
- electron microscope
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は低真空走査電子顕微
鏡の試料固定方法及び装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for fixing a sample of a low vacuum scanning electron microscope.
【０００２】[0002]
【従来の技術】試料の帯電防止処理や固定・脱水処理と
いったような処理なしで試料を観察するために、その観
察を試料室を他の部分よりも低い真空度に保った状態で
行う低真空走査電子顕微鏡が多用されている。このよう
な走査電子顕微鏡において用いられる試料が高分子軟弱
試料のように軟弱である場合は、その試料を液状の導電
性ペ−ストや導電性両面テ−プを用いて試料台に固定す
ることが一般的である。2. Description of the Related Art In order to observe a sample without treatment such as antistatic treatment and fixing / dehydration treatment of the sample, the observation is performed with the sample chamber kept at a lower degree of vacuum than other parts. Scanning electron microscopes are frequently used. When the sample used in such a scanning electron microscope is soft, such as a soft polymer sample, the sample should be fixed to the sample table using a liquid conductive paste or a conductive double-sided tape. Is common.
【０００３】[0003]
【発明が解決しようとする課題】しかし、そのような軟
弱試料の場合は、試料の試料台に対する密着性が不十分
なため観察中に微動により像がシフトしてしまい、その
画像が流れて写真撮影を行うのが困難であった。また、
液状の導電性ペ−ストや導電性両面テ−プはガスを放出
して試料表面に吸着し、それによって試料が汚染される
という問題もあった。However, in the case of such a soft sample, the image shifts due to slight movement during the observation due to insufficient adhesion of the sample to the sample table, and the image flows and the photograph It was difficult to shoot. Also,
The liquid conductive paste or the conductive double-sided tape emits a gas and is adsorbed on the surface of the sample, thereby contaminating the sample.
【０００４】本発明の目的は軟弱試料の場合でもその固
定のためにガス放出材料を用いることなしに簡単な構成
で試料の微動を防止するのに適した低真空走査電子顕微
鏡の試料固定方法及び装置を提供することにある。SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for fixing a sample of a low vacuum scanning electron microscope suitable for preventing a fine movement of a sample with a simple structure without using a gas releasing material for fixing even a weak sample. It is to provide a device.
【０００５】[0005]
【課題を解決するための手段】本発明は、低真空走査電
子顕微鏡においては試料室と鏡体部との間に圧力差があ
ることに着目し、その圧力差を利用して試料を試料台に
密着させて固定するものである。The present invention focuses on the fact that there is a pressure difference between a sample chamber and a mirror in a low vacuum scanning electron microscope, and uses the pressure difference to move a sample to a sample stage. It is to be fixed in close contact with.
【０００６】[0006]
【発明の実施の形態】図１は本発明にもとづく試料固定
装置を有する低真空走査電子顕微鏡の一実施例を示す。
その低真空走査電子顕微鏡は大きくは試料室１、その上
段の鏡体部２並びに試料室１及び鏡体部２の内部をそれ
ぞれ排気する排気系３を含み、鏡体部２は更に電子銃部
４及びレンズ系部５を含む。FIG. 1 shows an embodiment of a low vacuum scanning electron microscope having a sample fixing device according to the present invention.
The low-vacuum scanning electron microscope generally includes a sample chamber 1, an upper mirror 2 and an exhaust system 3 for exhausting the interior of the sample chamber 1 and the mirror 2, respectively. The mirror 2 further includes an electron gun. 4 and a lens system section 5.
【０００７】電子銃部４の電子銃６からは電子ビ−ムが
放出され、レンズ系部５のコンデンサレンズ７及び対物
レンズ８によって試料室１内の試料９に収束される。図
では省略されているが、電子ビ−ムはレンズ系部５に設
けられた走査用偏向器によって二次元的に偏向され、そ
れによって試料９は収束された電子ビ−ムで２次元的に
走査される。An electron beam is emitted from the electron gun 6 of the electron gun section 4 and is converged on the sample 9 in the sample chamber 1 by the condenser lens 7 and the objective lens 8 of the lens system section 5. Although not shown in the drawing, the electron beam is two-dimensionally deflected by a scanning deflector provided in the lens system 5, whereby the sample 9 is two-dimensionally converged by the converged electron beam. Scanned.
【０００８】試料室１と鏡体部２とは真空的にはオリフ
ィス１０を介して連通しており、試料室１内は１〜２７
０Ｐａの低真空に、鏡体部２内は１０-4Ｐａの高真空に
それぞれ維持されるように排気系３によって差動排気さ
れる。もちろん、その両方を１０-4Ｐａの高真空に排気
することもできる。試料室１には試料ステ−ジ１１が設
けられ、該試料ステ−ジには試料９を固定し、保持する
試料台１２が取り付けられている。The sample chamber 1 and the mirror unit 2 communicate with each other via an orifice 10 in a vacuum.
Differential exhaust is performed by the exhaust system 3 so as to maintain a low vacuum of 0 Pa and a high vacuum of 10 −4 Pa in the mirror body 2. Of course, both can be evacuated to a high vacuum of 10 -4 Pa. A sample stage 11 is provided in the sample chamber 1, and a sample stage 12 for fixing and holding the sample 9 is attached to the sample stage.
【０００９】試料９が電子ビ−ムで走査されると、試料
９からは反射電子や２次電子等が発生し、そのうちの反
射電子は反射電子検出器１３によって検出される。検出
された反射電子は電気信号に変換され、図示しない表示
装置に輝度変調信号として導入される。その表示装置の
表示面は試料９の２次元的走査と同期して走査される。
したがって、表示装置の表示面には試料の反射電子にも
とづく像が表示される。When the sample 9 is scanned by the electron beam, reflected electrons and secondary electrons are generated from the sample 9, and the reflected electrons are detected by the reflected electron detector 13. The detected backscattered electrons are converted into an electric signal and introduced into a display device (not shown) as a luminance modulation signal. The display surface of the display device is scanned in synchronization with the two-dimensional scanning of the sample 9.
Therefore, an image based on the backscattered electrons of the sample is displayed on the display surface of the display device.
【００１０】排気系３は、試料室１及び鏡体部２を同じ
１０-4Ｐａの高真空に排気する場合は次のように動作す
る。まず、バルブ１４及び１５を開き、予備排気用ロ−
タリポンプ１６により排気路２７及び１７〜２１を介し
て鏡体部２の電子銃部４及びレンズ系部５並びに試料室
１の内部を予備排気（粗引き排気）する。同時に、バル
ブ２２を開いて、高真空用油拡散ポンプ２３の排気路を
油拡散ポンプ排気用ロ−タリポンプ２４により排気す
る。これは常時実施する。次いで、鏡体部２の電子銃部
４及びレンズ系部５並びに試料室１の内部が所定の所定
の真空度（約１０Ｐａ）になったら、バルブ１４を閉
じ、バルブ２５を開いて、油拡散ポンプ２３により排気
路１８〜２１を介して鏡体部２の電子銃部４及びレンズ
系部５並びに試料室１の内部を排気する。これによって
鏡体部２の電子銃部４及びレンズ系部５並びに試料室１
の内部は１０-4Ｐａの真空に排気され、維持される。The exhaust system 3 operates as follows when the sample chamber 1 and the mirror 2 are evacuated to the same high vacuum of 10 -4 Pa. First, the valves 14 and 15 are opened, and the auxiliary exhaust
Preliminary evacuation (rough evacuation) of the electron gun unit 4 and the lens system unit 5 of the mirror unit 2 and the inside of the sample chamber 1 is performed by the tally pump 16 through the evacuation paths 27 and 17 to 21. At the same time, the valve 22 is opened, and the exhaust path of the high vacuum oil diffusion pump 23 is exhausted by the oil diffusion pump exhaust rotary pump 24. This is always performed. Next, when the inside of the electron gun section 4 and the lens system section 5 of the mirror section 2 and the inside of the sample chamber 1 reach a predetermined degree of vacuum (about 10 Pa), the valve 14 is closed, the valve 25 is opened, and oil diffusion is performed. The pump 23 exhausts the electron gun section 4 and the lens system section 5 of the mirror section 2 and the inside of the sample chamber 1 through the exhaust paths 18 to 21. Thereby, the electron gun unit 4 and the lens system unit 5 of the mirror unit 2 and the sample chamber 1
Is evacuated to a vacuum of 10 -4 Pa and maintained.
【００１１】この状態で、鏡体部２の電子銃部４及びレ
ンズ系部５の内部を１０-4Ｐａの高真空にそのまま維持
し、試料室１内を１〜２７０Ｐａの低真空に排気し、維
持するためには、排気系３は次のように動作する。ま
ず、バルブ１８を閉じ、バルブ２６を開いて、ロ−タリ
ポンプ１６により試料室１内を排気路１７及び２８を介
して排気する。次いで、バルブ２９を開いて低真空用コ
ントロ−ルバルブ３０により試料室１内の真空を１〜２
７０Ｐａうちの任意の値に調節する。その調節が終了
し、その設定が完了したら、バルブ２９を閉じ、コント
ロ−ルバルブ３０の動作を止める。これによって、試料
室１内は１〜２７０Ｐａのうちの任意の低真空に排気さ
れ、維持されると共に、鏡体部２の電子銃部４及びレン
ズ系部５の内部は１０-4Ｐａの真空に排気され、維持さ
れる。In this state, the inside of the electron gun section 4 and the lens system section 5 of the mirror section 2 is maintained at a high vacuum of 10 -4 Pa, and the inside of the sample chamber 1 is evacuated to a low vacuum of 1 to 270 Pa. , The exhaust system 3 operates as follows. First, the valve 18 is closed, the valve 26 is opened, and the inside of the sample chamber 1 is exhausted by the rotary pump 16 through the exhaust passages 17 and 28. Next, the valve 29 is opened, and the vacuum in the sample chamber 1 is reduced by 1 to 2 by the low vacuum control valve 30.
Adjust to an arbitrary value within 70 Pa. When the adjustment is completed and the setting is completed, the valve 29 is closed and the operation of the control valve 30 is stopped. Thus, the inside of the sample chamber 1 is evacuated and maintained at an arbitrary low vacuum of 1 to 270 Pa, and the inside of the electron gun unit 4 and the lens system unit 5 of the mirror unit 2 is maintained at a vacuum of 10 -4 Pa. Exhausted and maintained.
【００１２】図２は試料９、試料台１２及び試料ステ−
ジ１１の関係を示す。試料９は軟弱性のもので、その形
状はコンタクトレンズ状をなしている。低真空走査電子
顕微鏡ではこのような軟弱な試料が扱われることが多
い。試料台１２は試料ステ−ジ１１にＯリング３１を介
して取り付けられ、その表面は試料９の形状に合わせて
半球状をなしている。図３及び４に詳細が示されている
ように、試料台１２は中空部３２をもっていると共に、
この中空部３２と試料台１２の表面とに通じる複数の孔
（貫通孔）３３をもっている。中空部３２は排気路３
４、１９、２０及び２１を介して鏡体部２の電子銃部４
及びレンズ系部５の内部と連通している（図１参照）。
これにより、試料固定用バルブ３５を開けば、中空部３
２は鏡体部２の電子銃部４及びレンズ系部５の内部と同
じ１０-4Ｐａの高真空にされる。したがって、試料室１
内は中空部３２内の圧力よりも高くなるから、その圧力
差が試料台１２の表面に複数の孔３３を覆うように密接
している試料９に作用し、これによって、試料９は試料
台１２の表面に密着して固定される。FIG. 2 shows a sample 9, a sample stage 12, and a sample stage.
FIG. Sample 9 is soft and has a contact lens shape. Such a weak sample is often handled in a low vacuum scanning electron microscope. The sample stage 12 is attached to the sample stage 11 via an O-ring 31, and its surface has a hemispherical shape according to the shape of the sample 9. As shown in detail in FIGS. 3 and 4, the sample stage 12 has a hollow portion 32 and
It has a plurality of holes (through holes) 33 communicating with the hollow portion 32 and the surface of the sample table 12. The hollow part 32 is the exhaust path 3
4, 19, 20 and 21, the electron gun section 4 of the mirror section 2
And the inside of the lens system 5 (see FIG. 1).
Thus, when the sample fixing valve 35 is opened, the hollow portion 3 is opened.
Reference numeral 2 denotes a high vacuum of 10 -4 Pa, which is the same as the inside of the electron gun unit 4 and the lens system unit 5 of the mirror unit 2. Therefore, sample chamber 1
Since the pressure in the inside becomes higher than the pressure in the hollow portion 32, the pressure difference acts on the sample 9 which is in close contact with the surface of the sample table 12 so as to cover the plurality of holes 33, whereby the sample 9 is 12 and is fixed in close contact with the surface thereof.
【００１３】このように、試料９は試料台１２に密着状
態で固定されるので、像観察中の試料の微動、したがっ
てその微動にもとづく像シフトが防止される。また、試
料９の固定にガス放出材料を用いていないため、試料汚
染の問題も生じない。更に、試料９の固定に、基本的に
は試料室１内の低真空（高圧力）と鏡体部２内の高真空
（低圧力）との差を利用しているだけであるため、その
固定のための構成が非常に簡単であることが理解され
る。As described above, since the sample 9 is fixed to the sample table 12 in close contact with the sample table, fine movement of the sample during image observation, and therefore, image shift based on the fine movement are prevented. Further, since no gas releasing material is used for fixing the sample 9, there is no problem of sample contamination. Further, since only the difference between the low vacuum (high pressure) in the sample chamber 1 and the high vacuum (low pressure) in the mirror unit 2 is basically used for fixing the sample 9, It is understood that the configuration for the fixation is very simple.
【００１４】試料９が三角形状断面をもつ場合は、図５
及び６に示されるように、試料９を、その形状に合わせ
て三角形状断面の表面をもつ試料台１２に密着して固定
するとよい。また、試料９が平坦な断面をもつ場合は、
図７及び８に示されるように、試料９を、その形状に合
わせて平坦な断面の表面をもつ試料台１２に密着して固
定するとよい。When the sample 9 has a triangular cross section, FIG.
As shown in (6) and (6), the sample 9 may be fixed in close contact with a sample stage 12 having a triangular cross-section surface according to its shape. When the sample 9 has a flat cross section,
As shown in FIGS. 7 and 8, the sample 9 may be fixed in close contact with a sample stage 12 having a flat cross section surface according to its shape.
【００１５】図９及び１０は試料９の試料台１２に対す
る密着面が凸凹をなしており、しかもその横幅寸法が複
数の孔３３が設けられている領域よりも小さい場合の試
料固定の例を示す。試料９の両側に試料固定板３６を設
け、ストッパ３７と試料固定板３６との間にばね３８を
挿入し、試料９を、そのばね圧力で軽く押さえた状態で
試料室１内の圧力と鏡体部２内の圧力との差により試料
保持台１２の平坦な表面に密着して固定している。複数
の孔３３が設けられている領域のうちの試料９によって
カバ−されない部分は試料固定板３６によって塞がれて
おり、したがって、その部分を通しての試料室１と中空
部３２との間の流通は防止される。FIGS. 9 and 10 show an example of fixing a sample in the case where the contact surface of the sample 9 with respect to the sample table 12 is uneven, and the width of the sample 9 is smaller than the area where the plurality of holes 33 are provided. . A sample fixing plate 36 is provided on both sides of the sample 9, a spring 38 is inserted between the stopper 37 and the sample fixing plate 36, and the sample 9 is lightly pressed by the spring pressure and the pressure in the sample chamber 1 and the mirror are adjusted. Due to the difference from the pressure in the body 2, the sample holder 12 is fixed to the flat surface of the sample holder 12 in close contact. The portion of the region where the plurality of holes 33 are provided, which is not covered by the sample 9, is closed by the sample fixing plate 36, and therefore, the flow between the sample chamber 1 and the hollow portion 32 through that portion. Is prevented.
【００１６】[0016]
【発明の効果】本発明によれば、軟弱試料の場合でもそ
の固定のためにガス放出材料を用いることなしに簡単な
構成で試料の微動を防止するのに適した低真空走査電子
顕微鏡の試料固定方法及び装置が提供される。According to the present invention, even in the case of a soft sample, a sample of a low vacuum scanning electron microscope suitable for preventing a fine movement of the sample with a simple configuration without using a gas releasing material for fixing the sample. A securing method and apparatus are provided.
【図１】本発明にもとづく試料固定装置を有する低真空
走査電子顕微鏡の縦断面図。FIG. 1 is a longitudinal sectional view of a low vacuum scanning electron microscope having a sample fixing device according to the present invention.
【図２】図１の試料、試料台及び試料ステ−ジの関係を
示す縦断面図。FIG. 2 is a longitudinal sectional view showing a relationship among a sample, a sample stage, and a sample stage in FIG. 1;
【図３】図２の試料台の縦断面図。FIG. 3 is a longitudinal sectional view of the sample stage of FIG. 2;
【図４】図３の平面図。FIG. 4 is a plan view of FIG. 3;
【図５】図３に対応するも一つの実地例を示す試料台の
縦断面図。FIG. 5 is a longitudinal sectional view of a sample stage showing one practical example corresponding to FIG. 3;
【図６】図５の平面図。FIG. 6 is a plan view of FIG. 5;
【図７】図３に対応する更にもう一つの実地例を示す試
料台の縦断面図。FIG. 7 is a longitudinal sectional view of a sample stage showing still another practical example corresponding to FIG. 3;
【図８】図７の平面図。FIG. 8 is a plan view of FIG. 7;
【図９】本発明にもとづくもう一つの実施例を示す試料
固定装置の縦断面図。FIG. 9 is a longitudinal sectional view of a sample fixing device showing another embodiment according to the present invention.
【図１０】図９の平面図。FIG. 10 is a plan view of FIG. 9;
１：試料室、２：鏡体部、３：排気系、４：電子銃部、
５レンズ系部、６：電子銃、７：クンデンサレンズ、
８：対物レンズ、９：試料、１０：オリフィス、１１：
試料ステ−ジ、１２：試料台、１３：反射電子検出器、
１４、１５、２２、２５、２６、２９、３５：バルブ、
１６：予備排気用ロ−タリポンプ、１７〜２１、２７、
２８、３４：排気路、２３：高真空用油拡散ポンプ、２
４：油拡散ポンプ排気用ロ−タリポンプ、３０：コント
ロ−ルバルブ、３１：Ｏリング、３２：中空部、３３：
孔（貫通孔）、３５：試料固定用バルブ、３６：試料固
定板、３７：ストッパ、３８：ばね。1: sample chamber, 2: mirror unit, 3: exhaust system, 4: electron gun unit,
5 lens system, 6: electron gun, 7: Kundensa lens,
8: objective lens, 9: sample, 10: orifice, 11:
Sample stage, 12: sample stage, 13: backscattered electron detector,
14, 15, 22, 25, 26, 29, 35: valves,
16: Rotary pump for preliminary exhaust, 17-21, 27,
28, 34: exhaust path, 23: high vacuum oil diffusion pump, 2
4: Rotary pump for exhausting oil diffusion pump, 30: control valve, 31: O-ring, 32: hollow, 33:
Holes (through holes), 35: sample fixing valve, 36: sample fixing plate, 37: stopper, 38: spring.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 鈴木 猛夫 茨城県ひたちなか市堀口字長久保832番地 ２ 日立計測エンジニアリング株式会社内 (72)発明者 和田 正夫 茨城県ひたちなか市堀口字長久保832番地 ２ 日立計測エンジニアリング株式会社内 ──────────────────────────────────────────────────続 き Continuing from the front page (72) Inventor Takeo Suzuki 832 Nagakubo, Horiguchi, Hitachinaka-shi, Ibaraki Prefecture Within Hitachi Measurement Engineering Co., Ltd. (72) Inventor Masao Wada 832 Nagakubo, Horiguchi, Hitachinaka-city, Ibaraki 2 Hitachi Measurement Engineering Inside the corporation
Claims (4)
ジに取り付けられた試料台に試料を固定し、その試料を
前記試料室よりも高真空に維持された鏡体部から前記試
料室に入射する電子ビ−ムで照射し、それによって前記
試料から発生する、該試料を特徴づける情報信号を検出
する低真空走査電子顕微鏡の試料固定方法であって、前
記鏡体部内の圧力と前記試料室内の圧力との差を利用し
て前記試料を前記試料台に密着させて固定することを特
徴とする低真空走査電子顕微鏡の試料固定方法。1. A sample stage in a sample chamber maintained at a low vacuum.
A sample is fixed to a sample table attached to a sample holder, and the sample is irradiated with an electron beam incident on the sample chamber from a mirror body maintained at a higher vacuum than the sample chamber, thereby removing the sample from the sample chamber. A method for fixing a sample of a low-vacuum scanning electron microscope that generates an information signal characterizing the sample, wherein the sample is formed by utilizing a difference between a pressure in the mirror unit and a pressure in the sample chamber. A sample fixing method for a low-vacuum scanning electron microscope, wherein the sample is fixed by being closely attached to a table.
の試料台の複数の孔を覆うように前記試料を密接させる
と共に前記複数の孔を前記鏡体に連通させて、前記鏡体
部内の圧力と前記試料室内の圧力との差にもとづいて前
記試料を前記試料台の表面に密着させて固定することを
特徴とする請求項１に記載された低真空走査電子顕微鏡
の試料固定方法。2. The method according to claim 1, further comprising bringing the sample into close contact with a surface of the sample stage so as to cover a plurality of holes of the sample stage communicating with the surface, and communicating the plurality of holes with the mirror. 2. A method for fixing a sample in a low vacuum scanning electron microscope according to claim 1, wherein the sample is fixed to the surface of the sample table in close contact with the sample based on a difference between a pressure in a section and a pressure in the sample chamber. .
て前記鏡体部に連通させることを特徴とする請求項２に
記載された低真空走査電子顕微鏡の試料固定方法。3. The method according to claim 2, wherein the plurality of holes communicate with the mirror via a hollow portion of the sample stage.
ジに取り付けられた試料台に試料を固定し、その試料を
前記試料室よりも高真空に維持された鏡体部から前記試
料室に入射する電子ビ−ムで照射し、それによって前記
試料から発生する、該試料を特徴づける情報信号を検出
する低真空走査電子顕微鏡の試料固定装置であって、前
記鏡体部と連通する排気路を備え、前記試料台は前記排
気路と連通する中空部と、前記試料台の表面と前記中空
部とに通じる複数の孔とを有し、それによって、前記試
料は前記鏡体部内の圧力と前記試料室内の圧力との差に
もとづいて前記複数の孔を覆うように前記試料台表面に
密着して固定されることを特徴とする低真空走査電子顕
微鏡の試料固定装置。4. A sample stage in a sample chamber maintained at a low vacuum.
A sample is fixed to a sample table attached to a sample holder, and the sample is irradiated with an electron beam incident on the sample chamber from a mirror body maintained at a higher vacuum than the sample chamber, thereby removing the sample from the sample chamber. A sample fixing device for a low-vacuum scanning electron microscope that detects an information signal generated and characterizes the sample, the sample fixing device including an exhaust path communicating with the mirror body, wherein the sample stage is a hollow part communicating with the exhaust path. And a plurality of holes communicating with a surface of the sample stage and the hollow portion, whereby the sample is provided with a plurality of holes based on a difference between a pressure in the mirror body portion and a pressure in the sample chamber. A sample fixing device for a low-vacuum scanning electron microscope, wherein the sample fixing device is closely fixed to the surface of the sample table so as to cover the sample stage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9163707A JPH1116529A (en) | 1997-06-20 | 1997-06-20 | Sample fixing method for low vacuum scanning electron microscope and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9163707A JPH1116529A (en) | 1997-06-20 | 1997-06-20 | Sample fixing method for low vacuum scanning electron microscope and apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1116529A true JPH1116529A (en) | 1999-01-22 |
Family
ID=15779112
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9163707A Pending JPH1116529A (en) | 1997-06-20 | 1997-06-20 | Sample fixing method for low vacuum scanning electron microscope and apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1116529A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012109171A (en) * | 2010-11-19 | 2012-06-07 | Hitachi High-Technologies Corp | Scanning electron microscope |
| CN111725041A (en) * | 2020-07-01 | 2020-09-29 | 中国科学院自然科学史研究所 | Sample stage and electron microscope |
-
1997
- 1997-06-20 JP JP9163707A patent/JPH1116529A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012109171A (en) * | 2010-11-19 | 2012-06-07 | Hitachi High-Technologies Corp | Scanning electron microscope |
| CN111725041A (en) * | 2020-07-01 | 2020-09-29 | 中国科学院自然科学史研究所 | Sample stage and electron microscope |
| CN111725041B (en) * | 2020-07-01 | 2024-05-28 | 中国科学院自然科学史研究所 | Sample stage and electron microscope |
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