JPH11134613A - Magnetic disk device - Google Patents
Magnetic disk deviceInfo
- Publication number
- JPH11134613A JPH11134613A JP9296693A JP29669397A JPH11134613A JP H11134613 A JPH11134613 A JP H11134613A JP 9296693 A JP9296693 A JP 9296693A JP 29669397 A JP29669397 A JP 29669397A JP H11134613 A JPH11134613 A JP H11134613A
- Authority
- JP
- Japan
- Prior art keywords
- film
- head
- peeling
- thin
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、信頼性の高い薄膜
磁気ヘッドを搭載した磁気ディスク装置に関する。The present invention relates to a magnetic disk drive equipped with a highly reliable thin-film magnetic head.
【０００２】[0002]
【従来の技術】近年、磁気ディスク装置の高記録密度化
に伴って、磁気記録を記録媒体に記録，再生する磁気ヘ
ッドには薄膜磁気ヘッドが使われるようになり、特に最
近は、記録を従来のコイルの電磁誘導を利用したインダ
クティブヘッドで行い、再生を外部磁界により電流を流
したときの抵抗値が変化する磁気抵抗効果を示す素子を
利用した磁気抵抗効果型ヘッドで行う複合型磁気ヘッド
が使われるようになってきている。2. Description of the Related Art In recent years, as the recording density of magnetic disk devices has increased, thin-film magnetic heads have been used as magnetic heads for recording and reproducing magnetic recording on and from a recording medium. A composite magnetic head that performs with an inductive head using electromagnetic induction of a coil and performs reproduction with a magnetoresistive effect type head using an element exhibiting a magnetoresistive effect in which a resistance value changes when a current is applied by an external magnetic field. It is being used.
【０００３】薄膜をスパッタリングなどにより成膜する
と真性応力と呼ばれる応力が発生することが知られてい
る。さらにヘッド製造過程では磁場中アニールなどの工
程で２００℃程度の高温となる工程があり、その工程に
おいては大きな熱応力が発生する。この真性応力と熱応
力が原因で製造工程中に膜のはく離が発生することがあ
り歩留まりに影響する。It is known that when a thin film is formed by sputtering or the like, a stress called intrinsic stress is generated. Furthermore, in the head manufacturing process, there is a step of raising the temperature to about 200 ° C. in a step such as annealing in a magnetic field, and a large thermal stress is generated in that step. Due to the intrinsic stress and the thermal stress, peeling of the film may occur during the manufacturing process, which affects the yield.
【０００４】これを解決する手段として例えば特開平8
−106612号公報(以下文献１とする）のように膜の真性
応力を低減する方法がある。文献１ではインダクティブ
ヘッドを構成する膜のひとつ上部磁性膜の材料をコント
ロールして真性応力を低減し、上部磁性膜のはく離を防
ぐ方法が示されている。As means for solving this, for example, Japanese Patent Laid-Open No.
There is a method for reducing the intrinsic stress of a film as disclosed in JP-A-106612 (hereinafter referred to as Reference 1). Document 1 discloses a method of controlling the material of an upper magnetic film, which is one of the films constituting an inductive head, to reduce intrinsic stress and prevent peeling of the upper magnetic film.
【０００５】[0005]
【発明が解決しようとする課題】文献１では上部磁性膜
のはく離を防ぐ方法を示している。しかし文献１のよう
に上部磁性膜の真性応力を低減しても、上部磁性膜のは
く離は発生する。Document 1 discloses a method for preventing peeling of the upper magnetic film. However, even if the intrinsic stress of the upper magnetic film is reduced as in Document 1, the upper magnetic film is peeled off.
【０００６】本発明の目的は上記課題に対し、はく離を
防止する構造を持つ薄膜磁気ヘッドを搭載した磁気ディ
スク装置を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a magnetic disk drive equipped with a thin-film magnetic head having a structure for preventing peeling.
【０００７】[0007]
【課題を解決するための手段】上部磁性膜のはく離が生
じる原因は、薄膜の成膜により発生する真性応力と、製
造工程中の高温になる際に発生する熱応力である。熱応
力によるはく離は、高温時に、上部磁性膜などの金属膜
や、上部磁性膜とインダクティブヘッドのコイル導体と
の絶縁を確保するためのコイル絶縁膜などが熱膨張によ
り膨張するのに対して、最外層にあるアルミナの保護膜
はこれら材料に比較して線膨張係数が小さく膨張量が小
さいために、相対的に高温時に収縮するような形にな
り、その結果保護膜以外の前記上部磁性膜などをはく離
させようとする方向、膜が積層されている面に垂直な方
向に引っ張りの応力が生じるために起こる。The causes of peeling of the upper magnetic film are the intrinsic stress generated by the formation of the thin film and the thermal stress generated when the temperature becomes high during the manufacturing process. Peeling due to thermal stress, at high temperatures, the metal film such as the upper magnetic film, or the coil insulating film to ensure insulation between the upper magnetic film and the coil conductor of the inductive head, expands due to thermal expansion, Since the alumina protective film in the outermost layer has a smaller linear expansion coefficient and a smaller expansion amount than these materials, it contracts at a relatively high temperature. As a result, the upper magnetic film other than the protective film is formed. This occurs because tensile stress is generated in the direction in which the film is to be peeled off, or in the direction perpendicular to the surface on which the film is laminated.
【０００８】文献１のように真性応力を低減してもはく
離が起こるのは、ヘッド微細化により熱応力が大きくな
っているためである。本発明は保護膜とインダクティブ
ヘッドの間にはく離抑止膜を設けることによりはく離を
防止する。The reason why peeling occurs even if the intrinsic stress is reduced as in Document 1 is that the thermal stress has increased due to the miniaturization of the head. The present invention prevents peeling by providing a peeling prevention film between the protective film and the inductive head.
【０００９】はく離抑止膜の材料は、ヤング率が保護膜
と比較して小さく、線膨張係数が保護膜に比較して大き
い材料である。はく離抑止膜は、ヤング率が小さいため
に応力緩衝材として働くと同時に、線膨張係数が大きい
ために製造工程中の高温となる過程で熱膨張し、はく離
しようとする膜を押さえつけてはく離を抑制する働きを
する。またはく離抑止膜は、接触する各膜との密着力が
ある程度強い材料で、はく離してしまわない材料でなけ
ればならない。The material of the peeling-preventing film is a material having a smaller Young's modulus than the protective film and a larger linear expansion coefficient than the protective film. The peel-prevention film acts as a stress buffer due to its small Young's modulus, and at the same time, has a large linear expansion coefficient, which thermally expands during the high temperature process in the manufacturing process, and suppresses the peeling by holding down the film to be peeled. Work. Alternatively, the peeling-preventing film must be a material that has a certain degree of adhesion to the contacting films and does not peel off.
【００１０】はく離抑止膜の具体的な材料の候補とし
て、フォトレジストがあげられる。フォトレジスト材は
前記のヤング率と線膨張係数に対する要求を満たし、密
着力に対する要求も満たす。またフォトレジストは、薄
膜素子のパターンを形成する際に、薄膜磁気ヘッドの製
造工程において一般的に使用されている材料で、コイル
絶縁膜としても使用される材料である。そのため現在の
製造装置，材料などを新たに調達しなくてもよいという
利点がある。As a specific material candidate for the peeling-preventing film, there is a photoresist. The photoresist material satisfies the above requirements for Young's modulus and coefficient of linear expansion, and also satisfies the requirement for adhesion. Photoresist is a material generally used in the process of manufacturing a thin-film magnetic head when forming a pattern of a thin-film element, and is also used as a coil insulating film. Therefore, there is an advantage that it is not necessary to newly procure the current manufacturing equipment and materials.
【００１１】ポリイミド膜もヤング率，線膨張係数の条
件を満たす材料で、候補としてあげられる。ポリイミド
膜は薄膜磁気ヘッドの製造工程中に一般的に使用されて
いる材料ではないが、フォトレジスト材よりも強い密着
力が期待できるという利点がある。A polyimide film is also a candidate material which satisfies the conditions of Young's modulus and coefficient of linear expansion. The polyimide film is not a material generally used during the manufacturing process of the thin film magnetic head, but has an advantage that a stronger adhesive force can be expected than a photoresist material.
【００１２】[0012]
【発明の実施の形態】以下、本発明を採用した磁気ディ
スク装置の一実施例を詳しく説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of a magnetic disk drive according to the present invention will be described in detail.
【００１３】磁気ディスク装置は図２のような構造とな
っている。スピンドルモータ１６により回転する記録媒
体１７に対し、サーボ１３，アクチュエータ１４により
駆動するヘッド支持バネ１５の先端に記録媒体１７に対
向するように装着された薄膜磁気ヘッド２３が記録媒体
１７の円盤面上を走行しながら磁気信号の記録，再生を
行う。The magnetic disk drive has a structure as shown in FIG. A thin-film magnetic head 23 attached to the tip of a head support spring 15 driven by a servo 13 and an actuator 14 so as to face the recording medium 17 is provided on a recording medium 17 rotated by a spindle motor 16. The recording and reproduction of the magnetic signal are performed while traveling.
【００１４】薄膜磁気ヘッドのうち、再生は磁気抵抗効
果を利用して行う磁気抵抗効果型ヘッドを用い、記録は
コイルの電磁誘導を利用して行うインダクティブヘッド
を用いる薄膜磁気ヘッドを複合型磁気ヘッドと呼ぶ。本
発明の磁気ディスク装置は、複合型磁気ヘッドを改良し
た薄膜磁気ヘッド２３を搭載する。薄膜磁気ヘッド２３
の外観を図３に示す。薄膜磁気ヘッド２３は、基板１８
に多数の薄膜がスパッタリングなどにより積層された構
造となっている。Among the thin-film magnetic heads, a thin-film magnetic head using a magneto-resistance effect type head for reproducing by utilizing the magneto-resistance effect and a recording type using a magnetic head using an inductive head using electromagnetic induction of a coil are combined magnetic heads. Call. The magnetic disk drive of the present invention mounts a thin-film magnetic head 23 which is an improved composite type magnetic head. Thin-film magnetic head 23
Is shown in FIG. The thin-film magnetic head 23 is
Has a structure in which many thin films are stacked by sputtering or the like.
【００１５】磁気抵抗効果センサ１９が現れている面
が、記録媒体１７と対向して磁気信号の記録，再生を行
う面で、以下浮上面と呼ぶ。浮上面に垂直な基板上の一
面（以下ヘッド素子パターン面と呼ぶ。）に磁気抵抗効
果センサ１９を含む多数の薄膜を積層して構成される磁
気抵抗効果型ヘッドが形成され、さらにこの磁気抵抗効
果型ヘッドに上部磁性膜９を含む多数の薄膜を積層して
構成されるインダクティブヘッドが積層され、このイン
ダクティブヘッドに保護膜１１が積層されている。The surface on which the magnetoresistive sensor 19 is exposed faces the recording medium 17 for recording and reproducing magnetic signals, and is hereinafter referred to as a floating surface. A magnetoresistive head is formed by laminating a number of thin films including a magnetoresistive sensor 19 on one surface of a substrate (hereinafter, referred to as a head element pattern surface) perpendicular to the air bearing surface. An inductive head constituted by laminating a number of thin films including the upper magnetic film 9 is laminated on the effect type head, and a protective film 11 is laminated on the inductive head.
【００１６】ヘッド素子パターン面外観を図４に示す。
また、浮上面のセンサ部分近傍の外観を図５に示す。図
４線分Ａ−Ｂによる断面を拡大した図を図１に示す。セ
ラミックスの基板１８のヘッド素子パターンが形成され
る面にアルミナのベース材１が厚さ約１０μｍ形成さ
れ、これにＣｏ系合金の下部シールド２が１〜２μｍ、
アルミナの絶縁膜３が約０.５μｍ 、Ｎｉ系合金の上部
シールド４が２〜３μｍ、アルミナのギャップ膜５が約
０.５μｍ 、レジスト材のコイル絶縁膜６，７，８が各
々３〜４μｍ、Ｃｕのコイル導体１２が約３μｍ、Ｆｅ
Ｎｉの上部磁性膜９が３〜４μｍなど積層され、最外層
にアルミナの保護膜１１が約５０μｍ形成されている。FIG. 4 shows the appearance of the head element pattern surface.
FIG. 5 shows the appearance of the air bearing surface near the sensor portion. FIG. 1 is an enlarged view of a cross section taken along line AB in FIG. An alumina base material 1 is formed to a thickness of about 10 μm on the surface of the ceramic substrate 18 on which the head element pattern is formed, and a lower shield 2 made of a Co-based alloy is formed to a thickness of 1 to 2 μm.
The alumina insulating film 3 is about 0.5 μm, the Ni-based alloy upper shield 4 is 2 to 3 μm, the alumina gap film 5 is about 0.5 μm, and the resist coil insulating films 6, 7, and 8 are 3 to 4 μm each. , Cu coil conductor 12 is about 3 μm, Fe
An upper magnetic film 9 of Ni is laminated in a thickness of 3 to 4 μm, and a protective film 11 of alumina is formed in an outermost layer of about 50 μm.
【００１７】下部シールド２と上部シールド４に挟まれ
て、ＮｉＦｅなど数１０ｎｍの薄膜からなる再生用の磁
気抵抗効果センサ１９が存在する。上部シールド４と上
部磁性膜９を含めて、上部シールド４と上部磁性膜９に
挟まれる部分が記録用のインダクティブヘッド、下部シ
ールド２と上部シールド４を含めて、下部シールド２と
上部シールド４に挟まれる部分が再生用の磁気抵抗効果
型ヘッドである。保護膜１１とインダクティブヘッドの
間に、はく離を防止するはく離抑止膜１０が適切な膜厚
（例えば数μｍ）で設けられる。浮上面のセンサ部分を
拡大した図を図８に示す。はく離抑止膜１０はヘッド素
子パターン面全面を覆う形で形成されている。Between the lower shield 2 and the upper shield 4, there is a reproducing magnetoresistive sensor 19 made of a thin film of several tens of nm such as NiFe. The portion sandwiched between the upper shield 4 and the upper magnetic film 9 including the upper shield 4 and the upper magnetic film 9 is the inductive head for recording, and the lower shield 2 and the upper shield 4 including the lower shield 2 and the upper shield 4. The portion sandwiched is the reproducing magnetoresistive head. Between the protective film 11 and the inductive head, a separation preventing film 10 for preventing separation is provided with an appropriate thickness (for example, several μm). FIG. 8 is an enlarged view of the sensor portion on the air bearing surface. The peel prevention film 10 is formed so as to cover the entire surface of the head element pattern.
【００１８】従来の薄膜磁気ヘッドの、図１に相当する
部分断面図を図６に、図８に相当する部分拡大図を図７
に示す。従来の薄膜磁気ヘッドには，保護膜１１とイン
ダクティブヘッドの間にはく離抑止膜は存在しない。そ
のため製造工程中高温になり、線膨張係数差によって図
１４のように保護膜１１が相対的に収縮すると、上部磁
性膜９をはく離させようとする力が働き、はく離が起こ
る。FIG. 6 is a partial cross-sectional view corresponding to FIG. 1, and FIG. 7 is a partial enlarged view corresponding to FIG.
Shown in In the conventional thin film magnetic head, there is no separation preventing film between the protective film 11 and the inductive head. Therefore, when the temperature rises during the manufacturing process and the protective film 11 relatively contracts as shown in FIG. 14 due to a difference in linear expansion coefficient, a force for peeling the upper magnetic film 9 acts, and peeling occurs.
【００１９】これに対し本発明による薄膜磁気ヘッドで
は、はく離抑止膜１０がはく離を抑制する。はく離抑止
膜１０は前述したように、ヤング率が保護膜と比較して
小さく、線膨張係数が保護膜と比較して大きい材料であ
る。はく離抑止膜１０はヤング率が小さいために、製造
工程中の高温となる過程で保護膜により生じる熱応力、
および保護膜の真性応力の影響を緩和する応力緩衝材の
役割を果たすと同時に、線膨張係数が大きいために高温
時に膨張して、はく離しようとする膜を押さえつけては
く離を抑制する。またヤング率が小さいので、余計な応
力を発生して、他の悪い影響を引き起こす恐れも少な
い。ただしはく離抑止膜１０は、接触する各膜との密着
力がある程度強く、自身のはく離が生じない材料でなけ
ればならない。On the other hand, in the thin-film magnetic head according to the present invention, the peeling suppressing film 10 suppresses the peeling. As described above, the peeling prevention film 10 is a material having a smaller Young's modulus than the protective film and a larger linear expansion coefficient than the protective film. Since the peeling-preventing film 10 has a small Young's modulus, the thermal stress generated by the protective film during the high temperature process during the manufacturing process,
In addition, it functions as a stress buffering material for alleviating the influence of the intrinsic stress of the protective film, and at the same time, has a large linear expansion coefficient, so that it expands at a high temperature and suppresses the film to be peeled, thereby suppressing the peeling. Further, since the Young's modulus is small, it is less likely that an unnecessary stress is generated to cause other adverse effects. However, the peeling-preventing film 10 must be made of a material that has a certain degree of adhesion to the contacting films and does not cause peeling of the film itself.
【００２０】はく離抑止膜１０を設けてはく離を防止す
る本発明による方法では、はく離抑止膜に接する、また
は近接する全ての膜のはく離を抑えることができる。例
えば、下部シールド２と絶縁膜３との界面２２（図７）
でも、高温時にはく離が起こることがあるが、この部分
のはく離も抑制することができる。In the method according to the present invention for providing the peel-inhibiting film 10 to prevent the peeling, it is possible to suppress the peeling of all the films in contact with or in proximity to the peel-inhibiting film. For example, the interface 22 between the lower shield 2 and the insulating film 3 (FIG. 7)
However, peeling may occur at high temperatures, but peeling of this portion can also be suppressed.
【００２１】はく離抑止膜１０の具体的な材料として
は、フォトレジスト材やポリイミド膜のような樹脂材料
が候補としてあげられる。フォトレジスト材はヤング率
と線膨張係数に対する要求を満たし、密着力に対する要
求も満たす。同時にフォトレジストは、薄膜素子のパタ
ーンを形成する際に、薄膜磁気ヘッドの製造工程におい
て一般的に使用されている材料で、コイル絶縁膜６，
７，８としても使用される材料である。そのため現在の
製造装置，材料などを新たに調達しなくてもよいという
利点がある。ポリイミド膜もヤング率，線膨張係数の条
件を満たす。ポリイミド膜は薄膜磁気ヘッドの製造工程
中に一般的に使用されている材料ではないが、フォトレ
ジスト材よりも強い密着力が期待できるという利点があ
る。As a specific material of the peeling prevention film 10, a resin material such as a photoresist material or a polyimide film is a candidate. The photoresist material satisfies the requirements for Young's modulus and coefficient of linear expansion, as well as the requirements for adhesion. At the same time, the photoresist is a material generally used in the manufacturing process of the thin film magnetic head when forming the pattern of the thin film element.
It is a material also used as 7 and 8. Therefore, there is an advantage that it is not necessary to newly procure the current manufacturing equipment and materials. The polyimide film also satisfies the conditions of Young's modulus and linear expansion coefficient. The polyimide film is not a material generally used during the manufacturing process of the thin film magnetic head, but has an advantage that a stronger adhesive force can be expected than a photoresist material.
【００２２】上部磁性膜９のはく離と下部シールド２と
絶縁膜３との界面２２のはく離を抑制するためであれ
ば、図１，図８の様にヘッド素子パターン面全面をはく
離抑止膜１０で覆う必要はなく、図９，図１０または図
１１の応用例の様に、はく離を防止したい部分を含む範
囲で覆えばよい。また、上部磁性膜９とギャップ膜５の
界面でのはく離の防止だけを目的とするならば、図１
２，図１３の応用例の様に、上部磁性膜９の先端のみを
はく離抑止膜１０で覆う形態も考えられる。これら応用
例では、はく離抑止膜として使う材料が少なくてすむと
いう利点がある。逆に図１の実施例ではヘッド素子パタ
ーン面全面にはく離抑止膜を塗布するので、パターンを
形成する必要がなく、形成が容易であるという利点があ
る。In order to suppress the peeling of the upper magnetic film 9 and the peeling of the interface 22 between the lower shield 2 and the insulating film 3, the peeling-preventing film 10 is provided on the entire surface of the head element pattern as shown in FIGS. It is not necessary to cover, and it suffices to cover in a range including a portion where peeling is to be prevented as in the application example of FIG. 9, FIG. 10 or FIG. Further, if the purpose is only to prevent peeling at the interface between the upper magnetic film 9 and the gap film 5, FIG.
2, a form in which only the tip of the upper magnetic film 9 is covered with the peel-off suppressing film 10 as in the application example of FIG. In these application examples, there is an advantage that the material used as the peeling prevention film can be reduced. Conversely, in the embodiment shown in FIG. 1, since the peeling prevention film is applied to the entire surface of the head element pattern, there is an advantage that it is not necessary to form a pattern and the formation is easy.
【００２３】前記実施例および応用例では，いずれもは
く離抑止膜１０が浮上面などヘッド素子パターン面に垂
直な面の表面に露出している。そのため、はく離抑止膜
１０は、この表面に露出している他のアルミナの膜や金
属膜と比較して、ヤング率の小さい柔らかい材料なの
で、浮上面を研磨する際に、均等に研磨されず、段差が
発生してしまう恐れがある。浮上面の段差は、稼動時に
ゴミがたまって記録，再生のエラー発生，故障の原因と
なるので、望ましくない。また、はく離抑止膜１０が吸
湿して、ヘッド素子に悪影響を与える恐れもある。そこ
で、図１５，図１６の応用例のように、浮上面などヘッ
ド素子パターン面に垂直な面の表面にはく離抑止膜１０
が露出しないようにパターニングして対策する方法が考
えられる。In each of the above-described embodiments and application examples, the peeling prevention film 10 is exposed on the surface perpendicular to the head element pattern surface, such as the air bearing surface. Therefore, the peeling prevention film 10 is a soft material having a small Young's modulus as compared with the other alumina film or metal film exposed on the surface. There is a risk that a step will occur. The step on the air bearing surface is undesirable because dust accumulates during operation and causes errors in recording and reproduction and causes failure. In addition, there is a possibility that the peeling-preventing film 10 absorbs moisture and adversely affects the head element. Therefore, as in the application examples of FIGS. 15 and 16, the peeling prevention film 10 is formed on the surface perpendicular to the head element pattern surface such as the air bearing surface.
There is a method of patterning so as not to be exposed and taking measures.
【００２４】[0024]
【発明の効果】本発明によれば、製造工程中の高温とな
る際の上部磁性膜のはく離や下部シールドと絶縁膜の界
面などのはく離を抑制することができる。According to the present invention, the peeling of the upper magnetic film and the peeling of the interface between the lower shield and the insulating film when the temperature becomes high during the manufacturing process can be suppressed.
【図１】本発明の一実施例に係る薄膜磁気ヘッドの図４
のＡ−Ｂ線断面図。FIG. 1 shows a thin-film magnetic head according to one embodiment of the present invention; FIG.
AB sectional drawing of FIG.
【図２】本発明の一実施例に係る磁気ディスク装置の構
造を示す平面図。FIG. 2 is a plan view showing the structure of a magnetic disk drive according to one embodiment of the present invention.
【図３】本発明の一実施例に係る薄膜磁気ヘッドの斜視
図。FIG. 3 is a perspective view of a thin-film magnetic head according to one embodiment of the present invention.
【図４】本発明の一実施例に係るヘッド素子パターン面
の外観図。FIG. 4 is an external view of a head element pattern surface according to one embodiment of the present invention.
【図５】本発明の一実施例に係る浮上面２のセンサ近傍
部分の側断面図。FIG. 5 is a side sectional view of a portion near a sensor on a floating surface 2 according to an embodiment of the present invention.
【図６】従来の薄膜磁気ヘッドの側断面図。FIG. 6 is a side sectional view of a conventional thin film magnetic head.
【図７】従来の薄膜磁気ヘッドの浮上面のセンサ部分を
拡大した側断面図。FIG. 7 is an enlarged side sectional view of a sensor portion on a floating surface of a conventional thin film magnetic head.
【図８】本発明の一実施例の応用例に係る浮上面のセン
サ部分を拡大した側断面図。FIG. 8 is an enlarged side sectional view of a sensor portion on a floating surface according to an application example of an embodiment of the present invention.
【図９】本発明の一実施例の応用例に係るヘッド素子パ
ターン面の外観図。FIG. 9 is an external view of a head element pattern surface according to an application example of an embodiment of the present invention.
【図１０】本発明の一実施例の応用例に係る浮上面のセ
ンサ部分を拡大した側断面図。FIG. 10 is an enlarged side sectional view of a sensor portion on a floating surface according to an application example of an embodiment of the present invention.
【図１１】本発明の一実施例の応用例に係るヘッド素子
パターン面の外観図。FIG. 11 is an external view of a head element pattern surface according to an application example of an embodiment of the present invention.
【図１２】本発明の一実施例の応用例に係る図４のＡ−
Ｂ線断面図。FIG. 12 is a diagram illustrating an example of application of the embodiment of the present invention;
B sectional drawing.
【図１３】本発明の一実施例の応用例に係る浮上面のセ
ンサ部分を拡大した側断面図。FIG. 13 is an enlarged side sectional view of a sensor portion on a floating surface according to an application example of an embodiment of the present invention.
【図１４】はく離発生のメカニズムを示す側断面図。FIG. 14 is a side sectional view showing a mechanism of occurrence of peeling.
【図１５】本発明の一実施例であるはく離抑止膜を設け
たヘッド素子の側断面図。FIG. 15 is a side sectional view of a head element provided with a peeling-inhibiting film according to an embodiment of the present invention.
【図１６】図１５の外観図。FIG. 16 is an external view of FIG.
１…ベース材、２…下部シールド、３…絶縁膜、４…上
部シールド、５…ギャップ膜、６，７，８…コイル絶縁
膜、９…上部磁性膜、１０…はく離抑止膜、１１…保護
膜、１２…コイル導体、１３…サーボ、１４…アクチュ
エータ、１５…ヘッド支持バネ、１６…スピンドルモー
タ、１７…記録媒体、１８…基板、１９…磁気抵抗効果
センサ、２２…界面。DESCRIPTION OF SYMBOLS 1 ... Base material, 2 ... Lower shield, 3 ... Insulating film, 4 ... Upper shield, 5 ... Gap film, 6, 7, 8 ... Coil insulating film, 9 ... Upper magnetic film, 10 ... Peeling suppression film, 11 ... Protection Film: 12: coil conductor, 13: servo, 14: actuator, 15: head support spring, 16: spindle motor, 17: recording medium, 18: substrate, 19: magnetoresistive sensor, 22: interface.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 今中 律 神奈川県小田原市国府津2880番地 株式会 社日立製作所ストレージシステム事業部内 (72)発明者 小柳 広明 神奈川県小田原市国府津2880番地 株式会 社日立製作所ストレージシステム事業部内 (72)発明者 中村 雄喜 神奈川県小田原市国府津2880番地 株式会 社日立製作所ストレージシステム事業部内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Ritsu Imanaka 2880 Kozu, Kozuhara, Kanagawa Prefecture Inside the Storage Systems Division, Hitachi, Ltd. (72) Hiroaki Koyanagi 2880 Kozu, Kozu, Odawara, Kanagawa Prefecture Hitachi, Ltd. Within the Storage System Division (72) Inventor Yuki Nakamura 2880 Kozu, Odawara-shi, Kanagawa Prefecture Storage System Division, Hitachi, Ltd.
Claims (1)
記録媒体を回転させるスピンドルモータと、前記記録媒
体の記録面に対向して磁気信号の記録，再生を行う薄膜
磁気ヘッドと、前記薄膜磁気ヘッドが先端部に装着さ
れ、前記薄膜磁気ヘッドを支持するヘッド支持バネと、
前記ヘッド支持バネを取り付けて前記薄膜磁気ヘッドを
支持し駆動するアームを構成するアクチュエータと、前
記アームを支持し駆動するサーボからなる磁気ディスク
装置において、前記薄膜磁気ヘッドは、基板と前記記録
媒体に対向する面と垂直な一面に多数の薄膜で構成され
る磁気信号の再生を行う磁気抵抗効果型ヘッドと、前記
磁気抵抗効果型ヘッドに多数の薄膜を積層して構成され
る磁気信号の記録を行うインダクティブヘッドと、前記
インダクティブヘッドに積層される前記磁気抵抗効果型
ヘッドと前記インダクティブヘッドを保護する保護膜
と、前記保護膜と前記インダクティブヘッドの間に構成
される薄膜のはく離を防止するはく離抑止膜とで構成さ
れていることを特徴とする磁気ディスク装置。A disc-shaped recording medium having a recording surface; a spindle motor for rotating the recording medium; a thin-film magnetic head for recording and reproducing magnetic signals facing the recording surface of the recording medium; A thin-film magnetic head mounted on the tip end, a head support spring for supporting the thin-film magnetic head,
In a magnetic disk device comprising an actuator for supporting and driving the thin-film magnetic head by attaching the head support spring and a servo for supporting and driving the arm, the thin-film magnetic head includes a substrate and the recording medium. A magnetoresistive head for reproducing a magnetic signal composed of a number of thin films on one surface perpendicular to the opposing surface, and recording of a magnetic signal composed of a number of thin films laminated on the magnetoresistive head. An inductive head to be performed, a protective film for protecting the magnetoresistive head and the inductive head laminated on the inductive head, and a delamination prevention for preventing a thin film formed between the protective film and the inductive head from peeling. A magnetic disk drive characterized by comprising a film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9296693A JPH11134613A (en) | 1997-10-29 | 1997-10-29 | Magnetic disk device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9296693A JPH11134613A (en) | 1997-10-29 | 1997-10-29 | Magnetic disk device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11134613A true JPH11134613A (en) | 1999-05-21 |
Family
ID=17836869
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9296693A Pending JPH11134613A (en) | 1997-10-29 | 1997-10-29 | Magnetic disk device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11134613A (en) |
-
1997
- 1997-10-29 JP JP9296693A patent/JPH11134613A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6842308B1 (en) | Thermal compensation for head protrusion in a magnetic drive | |
| US5896243A (en) | Magneto-resistive effect type head with step or protrusion for reducing thermal asperity | |
| KR0181708B1 (en) | An integrated magnetoresistive head mounted on a slider with mr strife, its manufacturing methodand magnetic medium drive including the unit | |
| US5771571A (en) | Method for manufacturing thin film slider with on-board multi-layer integrated circuit | |
| US5473486A (en) | Air bearing thin film magnetic head with a wear-resistant end cap having alternating laminations | |
| US7403358B2 (en) | Thin film magnetic head, magnetic head device, magnetic recording/reproducing device and method for fabricating a thin film magnetic head | |
| JPH10255235A (en) | Magneto-resistive reading/inductive writing magnetic head assembly and it manufacture | |
| WO1998012696A1 (en) | Magnetic head slider and method of production thereof | |
| JP2004079090A (en) | Recording and reproduction separation type magnetic head | |
| JPH11134613A (en) | Magnetic disk device | |
| US6650519B1 (en) | ESD protection by a high-to-low resistance shunt | |
| US10614842B1 (en) | Thin-film piezoelectric-material element with protective film composition and insulating film through hole exposing lower electrode film | |
| US10607641B1 (en) | Head gimbal assembly thin-film piezoelectric-material element arranged in step part configuration with protective films | |
| JPH07282419A (en) | Thin-film magnetic head | |
| JPS63108516A (en) | Structure of protecting film for thin film magnetic head | |
| US11289641B2 (en) | Thin-film piezoelectric-material element, method of manufacturing the same, head gimbal assembly and hard disk drive | |
| JP3090014B2 (en) | Thin film magnetic head and method of manufacturing the same | |
| JP3344028B2 (en) | Manufacturing method of magnetoresistive head | |
| JPH10112008A (en) | Magnetic disk device | |
| JPH05120628A (en) | Thin-film magnetic head | |
| JPH0349131B2 (en) | ||
| JPH11213335A (en) | Thin film magnetic head and magnetic storage device | |
| JPH06168415A (en) | Thin film magnetic head and multichannel thin film magnetic head | |
| JPH07118056B2 (en) | Thin film magnetic head | |
| JPS61227210A (en) | Thin film magnetic head |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 6 Free format text: PAYMENT UNTIL: 20080920 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 6 Free format text: PAYMENT UNTIL: 20080920 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090920 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090920 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100920 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110920 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110920 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120920 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120920 Year of fee payment: 10 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120920 Year of fee payment: 10 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120920 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 10 Free format text: PAYMENT UNTIL: 20120920 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130920 Year of fee payment: 11 |
|
| EXPY | Cancellation because of completion of term |