JPH11104954A - Polishing carrier and polishing method - Google Patents
Polishing carrier and polishing methodInfo
- Publication number
- JPH11104954A JPH11104954A JP9287986A JP28798697A JPH11104954A JP H11104954 A JPH11104954 A JP H11104954A JP 9287986 A JP9287986 A JP 9287986A JP 28798697 A JP28798697 A JP 28798697A JP H11104954 A JPH11104954 A JP H11104954A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- carrier
- polished
- thin glass
- thin plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、薄板ガラスの表面
を高精度の平坦面に研磨する研磨用キャリヤ及びそれを
用いた研磨方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing carrier for polishing a thin glass surface to a highly accurate flat surface and a polishing method using the same.
【０００２】[0002]
【従来の技術】近年、液晶ディスプレイ、エレクトロル
ミネッセンスディスプレイ、プラズマディスプレイなど
の平面ディスプレイには、矩形で厚さ０．５〜１．５ｍ
ｍの薄い板ガラスが用いられており、この薄板ガラスに
は、高精度の平坦性が要求される。2. Description of the Related Art In recent years, a flat display such as a liquid crystal display, an electroluminescence display, and a plasma display has a rectangular shape having a thickness of 0.5 to 1.5 m.
m is used, and high precision flatness is required for the thin glass.
【０００３】周知の工業的な成形法により製造された薄
板ガラスには、表面に微小な欠陥、うねり、凹凸が存在
し、そのままでは平面ディスプレイに使用できる平坦性
を有していないため、成形された薄板ガラスは、その表
面を研磨装置を用いて所望の高精度な平坦性を有するよ
うに研磨される。[0003] Thin glass produced by a well-known industrial molding method has minute defects, undulations and irregularities on the surface, and does not have flatness that can be used for a flat display as it is. The thin glass sheet is polished to have a desired high-precision flatness using a polishing apparatus.
【０００４】従来、薄板ガラスの研磨には、オスカー式
研磨装置と呼ばれるものが一般に使用されている。この
研磨装置は、下面に研磨される薄板ガラスを嵌入保持す
る保持部を有する研磨ヘッドを備えており、その研磨ヘ
ッドに保持した薄板ガラスを回転研磨盤に押しつけた状
態で揺動して薄板ガラスの一面を研磨するようになって
いる。Conventionally, a so-called Oscar type polishing apparatus has been generally used for polishing thin glass. This polishing apparatus is provided with a polishing head having a holding portion for fitting and holding the thin glass to be polished on the lower surface, and the thin glass held by the polishing head is swung in a state of being pressed against a rotary polishing machine to be rotated. One side is polished.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、近年に
おける平面ディスプレイの大型化に伴い、それに用いら
れる薄板ガラスも大板化してきており、研磨に対して高
い効率が要求される。上記のオスカー式研磨装置では、
薄板ガラスを１枚毎に研磨ヘッドに嵌入保持して、その
一面を研磨するので、高い効率が得られない問題があ
る。However, with the recent increase in the size of the flat display, the thin glass used for the flat display is also increasing in size, and high efficiency is required for polishing. In the above Oscar-type polishing machine,
Since the thin glass is inserted into and held in the polishing head one by one and one surface thereof is polished, there is a problem that high efficiency cannot be obtained.
【０００６】本発明は、上記のような従来の問題点を解
決し、大板化した薄板ガラスの表面を高精度な平坦面に
高い効率で研磨できる研磨用キャリヤ及びそれを用いた
研磨方法を提供することを目的とする。The present invention solves the above-mentioned conventional problems and provides a polishing carrier and a polishing method using the same, which can polish a large-sized thin glass surface to a highly accurate flat surface with high efficiency. The purpose is to provide.
【０００７】[0007]
【課題を解決するための手段】本発明の研磨用キャリヤ
は、両面の夫々に研磨される薄板ガラスを嵌入保持する
保持部を設けたことを特徴とする。The polishing carrier according to the present invention is characterized in that a holding portion for fitting and holding a thin glass to be polished is provided on both sides.
【０００８】また、本発明に係る研磨方法は、研磨され
る薄板ガラスを研磨用キャリヤの両面の夫々に設けた保
持部に嵌入保持し、次いで前記研磨用キャリヤを相対向
する回転研磨盤の間に配設して各薄板ガラスの表面を研
磨することを特徴とする。Further, the polishing method according to the present invention is characterized in that the thin glass to be polished is fitted and held in holding portions provided on both sides of the polishing carrier, and then the polishing carrier is held between opposed rotary polishing disks. And the surface of each thin glass is polished.
【０００９】[0009]
【作用】本発明に係る研磨用キャリヤ及び研磨方法によ
れば、研磨用キャリヤの両面の夫々に研磨される薄板ガ
ラスを嵌入保持する保持部が設けてあり、夫々の保持部
に薄板ガラスを嵌入保持し、この研磨用キャリヤを相対
向する回転研磨盤の間に配設し、その保持部に嵌入保持
した各薄板ガラスを夫々の回転研磨盤に当接させて、そ
の表面を研磨することにより、一度に各薄板ガラスの表
面を均一で高精度に研磨できる。According to the polishing carrier and the polishing method of the present invention, holding portions are provided for fitting and holding thin glass to be polished on both sides of the polishing carrier, and the thin glass is fitted into each holding portion. Holding, the polishing carrier is disposed between the opposing rotary polishing disks, and each thin glass plate fitted and held in the holding portion is brought into contact with the respective rotary polishing disks to polish the surface thereof. At the same time, the surface of each thin glass can be polished uniformly and with high precision.
【００１０】[0010]
【発明の実施の形態】図１は、本発明の研磨用キャリヤ
の説明図であって、（Ａ）は平面図を、（Ｂ）は（Ａ）
のＹ−Ｙ断面図である。また、図２、図３は、本発明に
係る研磨方法を実施する研磨装置の説明図である。図１
〜図３で、１は研磨用キャリヤ全体を、２は内キャリヤ
を、２ａ及び２ｂは薄板ガラスを嵌入保持する保持部
を、３は外キャリヤを、４は矩形の薄板ガラスを、５は
太陽歯車を、６は内歯車を、７及び８は上下に相対向し
て位置する回転研磨盤をそれぞれ示している。1 is an explanatory view of a polishing carrier according to the present invention, wherein (A) is a plan view and (B) is (A).
5 is a sectional view taken along the line YY in FIG. FIGS. 2 and 3 are explanatory views of a polishing apparatus for performing the polishing method according to the present invention. FIG.
3, reference numeral 1 denotes the entire polishing carrier, 2 denotes the inner carrier, 2a and 2b denote holders for fitting and holding the thin glass, 3 denotes the outer carrier, 4 denotes the rectangular thin glass, and 5 denotes the sun. Reference numeral 6 denotes an internal gear, and reference numerals 7 and 8 denote rotary polishing machines which are positioned vertically opposite to each other.
【００１１】図１に示す本発明の研磨用キャリヤ１は、
ガラスエポキシ樹脂等の材料からなる内キャリヤ２と、
ステンレス鋼等の耐摩耗性に優れた金属材料からなる外
キャリヤ３とからなる。内キャリヤ２は、円盤状を呈
し、その一面にテンプレート２ｃで区画された保持部２
ａが、他面にテンプレート２ｄで区画された保持部２ｂ
が設けてある。この保持部２ａに研磨される一方の薄板
ガラス４を、保持部２ｂに研磨される他方の薄板ガラス
４’をそれぞれ嵌入保持することにより、両面の表面を
高い平行度及び平坦度に仕上げられた板状体２ｅを挟ん
で薄板ガラス４、４’が相対向して位置するようにな
り、両方の薄板ガラス４、４’に作用する研磨圧を均等
にして研磨面に偏摩耗等の研磨欠陥を防止し、かつ、薄
板ガラス４、４’の間で研磨量に差を生じず均一に研磨
できるようにしている。The polishing carrier 1 of the present invention shown in FIG.
An inner carrier 2 made of a material such as a glass epoxy resin;
The outer carrier 3 is made of a metal material having excellent wear resistance such as stainless steel. The inner carrier 2 has a disk-like shape, and has a holding portion 2 partitioned on one surface by a template 2c.
a is a holding section 2b partitioned on the other side by a template 2d
Is provided. By inserting and holding one thin glass 4 polished on the holding portion 2a and the other thin glass 4 ′ polished on the holding portion 2b, the surfaces of both surfaces were finished to high parallelism and flatness. The thin glass plates 4 and 4 ′ are located opposite to each other with the plate-shaped body 2 e interposed therebetween, and the polishing pressure acting on both the thin glass plates 4 and 4 ′ is made uniform so that polishing defects such as uneven wear on the polished surface. And the polishing can be performed uniformly without causing a difference in the polishing amount between the thin glass plates 4 and 4 ′.
【００１２】外キャリヤ３は、リング状を呈し、その外
周に歯３ａを有しており、その内部に内キャリヤ２を回
転自在に嵌め込むようになっている。この外キャリヤ３
は、図２に示す研磨装置が備える遊星回転機構の太陽歯
車５と歯車６との間に歯３ａが噛合されて配設され、研
磨時に太陽歯車５の周りを自転しつつ公転するようにな
っている。The outer carrier 3 has a ring shape and has teeth 3a on its outer periphery, and the inner carrier 2 is rotatably fitted therein. Outer carrier 3
Are arranged between the sun gear 5 and the gear 6 of the planetary rotation mechanism provided in the polishing apparatus shown in FIG. 2 so as to mesh with each other, and revolve around the sun gear 5 while being rotated during polishing. ing.
【００１３】上記の研磨用キャリヤ１を使用する研磨装
置は、図３に示すように、上回転研磨盤７及び下回転研
磨盤８が、薄板ガラス４、４’を嵌入保持した研磨用キ
ャリヤ１を挟んで上下に相対向して設けられる。As shown in FIG. 3, a polishing apparatus using the above-described polishing carrier 1 has an upper rotating polishing machine 7 and a lower rotating polishing machine 8 in which thin glass sheets 4 and 4 'are fitted and held. Are provided facing each other up and down.
【００１４】次に、上記の研磨用キャリヤ１を用いた本
発明の研磨方法を説明する。Next, a polishing method of the present invention using the above-mentioned polishing carrier 1 will be described.
【００１５】先ず、研磨装置から研磨用キャリヤ１の内
キャリヤ２を取り外し、内キャリヤ２の保持部２ａ、２
ｂの夫々に、表面に水やスラリ状の研磨剤など接着剤と
して働く液体を少量塗布した薄板ガラス４、４’を嵌入
して保持する。First, the inner carrier 2 of the polishing carrier 1 is removed from the polishing apparatus, and the holding portions 2a, 2a of the inner carrier 2 are removed.
The thin glass plates 4 and 4 'each having a small amount of liquid acting as an adhesive, such as water or a slurry-like abrasive applied to the surface thereof, are fitted and held in each of b.
【００１６】次いで、上記内キャリヤ２を、歯３ａが太
陽歯車５と内歯車６にを歯合した状態で下回転研磨盤８
上にある外キャリヤ３の内部に嵌め込み、下回転研磨盤
８に薄板ガラス４’が当接するようにする。Next, the inner carrier 2 is placed on the lower rotary polishing machine 8 with the teeth 3a meshed with the sun gear 5 and the internal gear 6.
It is fitted into the upper outer carrier 3 so that the thin glass 4 ′ comes into contact with the lower rotary polishing machine 8.
【００１７】次に、前記研磨用キャリヤ１の上に上回転
研磨盤７を降ろして前記薄板ガラス４、４’を保持した
研磨用キャリヤ１を下回転研磨盤８との間に挟み、この
状態で上回転研磨盤７と下回転研磨盤８をそれぞれ回転
駆動すると共に、内歯車６に対して太陽歯車５を回転駆
動して該研磨用キャリヤ１を自転させつつ公転させるこ
とにより、保持部２ａに保持した薄板ガラス４の上面を
上回転研磨盤７で研磨し、保持部２ｂに保持した薄板ガ
ラス４’の下面を下回転研磨盤８により研磨する。Next, the upper rotating polishing machine 7 is lowered onto the polishing carrier 1, and the polishing carrier 1 holding the thin glass plates 4 and 4 'is sandwiched between the polishing machine 1 and the lower rotating polishing machine 8. The upper rotating polishing machine 7 and the lower rotating polishing machine 8 are respectively driven to rotate, and the sun gear 5 is driven to rotate with respect to the internal gear 6 to revolve the polishing carrier 1 while revolving. The upper surface of the thin glass 4 held in the holder 2 is polished by the upper rotary polishing machine 7, and the lower surface of the thin glass 4 ′ held in the holder 2 b is polished by the lower rotary polishing machine 8.
【００１８】上記の研磨の際、薄板ガラス４、４’は、
一面の保持部２ａと他面の保持部２ｂに嵌入保持されて
高い平坦度に仕上げられた板状体２ｅを挟んで相対向し
て配設されているため、各薄板ガラス４、４’の表面に
偏摩耗を生じず均一な厚さの平坦面に研磨でき、且つ多
数の薄板ガラス４、４’を一斉に研磨ができる。In the above polishing, the thin glass plates 4 and 4 ′ are
Since the plate-like body 2e, which is fitted and held in the holding part 2a on one side and the holding part 2b on the other side and finished to a high flatness, is disposed opposite to each other, the respective sheet glass 4, 4 ' The surface can be polished to a flat surface having a uniform thickness without uneven wear, and a large number of thin glass plates 4 and 4 ′ can be polished all at once.
【００１９】また、研磨用キャリヤ１にあって、内キャ
リヤ２が、外キャリヤ３の内部に回転自在に嵌め込まれ
ているので、薄板ガラス４、４’の角部に懸かる過大な
負荷を逃がしてそれらにキズや角部のチッピングを防止
でき、薄板ガラス４、４’の研磨面にキズ等研磨欠陥の
生じず高品位な表面に仕上げることができる。Further, in the polishing carrier 1, the inner carrier 2 is rotatably fitted into the outer carrier 3, so that an excessive load hanging on the corners of the thin glass plates 4 and 4 'is released. They can prevent scratches and chipping at corners, and can be finished to a high-quality surface without generating scratches or other polishing defects on the polished surfaces of the thin glass plates 4 and 4 '.
【００２０】[0020]
【発明の効果】本発明の研磨用キャリヤ及び研磨方法に
よれば、薄板ガラスの表面を高精度の平坦面に高い効率
で研磨できる実用上優れた効果を奏するものである。According to the polishing carrier and the polishing method of the present invention, the surface of a thin glass can be polished on a highly accurate flat surface with high efficiency, which is a practically excellent effect.
【図１】本発明の研磨用キャリヤの説明図FIG. 1 is an explanatory view of a polishing carrier of the present invention.
【図２】本発明の研磨方法の一実施の形態の説明図FIG. 2 is an explanatory view of one embodiment of the polishing method of the present invention.
【図３】本発明の研磨装置の要部断面図FIG. 3 is a sectional view of a main part of the polishing apparatus of the present invention.
１ 研磨用キャリヤ ２ 内キャリヤ ２ａ 一面の保持部 ２ｂ 他面の保持部 ３ 外キャリヤ ４、４’ 薄板ガラス ５ 太陽歯車 ６ 内歯車 ７ 上回転研磨盤 ８ 下回転研磨盤 DESCRIPTION OF SYMBOLS 1 Polishing carrier 2 Inner carrier 2a Holder on one surface 2b Holder on other surface 3 Outer carrier 4, 4 'Thin glass 5 Sun gear 6 Internal gear 7 Upper rotary polishing machine 8 Lower rotary polishing machine
Claims (2)
入保持する保持部を設けたことを特徴とする研磨用キャ
リヤ。1. A polishing carrier comprising a holding portion for fitting and holding thin glass to be polished on both sides thereof.
の両面の夫々に設けた保持部に嵌入保持し、次いで前記
研磨用キャリヤを相対向する回転研磨盤の間に配設して
各薄板ガラスの表面を研磨することを特徴とする研磨方
法。2. The thin glass to be polished is fitted and held in holding portions provided on both sides of the polishing carrier, and then the polishing carrier is disposed between the opposed rotary polishing machines, and each of the thin glass is polished. A polishing method, characterized by polishing the surface of a substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9287986A JPH11104954A (en) | 1997-10-03 | 1997-10-03 | Polishing carrier and polishing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9287986A JPH11104954A (en) | 1997-10-03 | 1997-10-03 | Polishing carrier and polishing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11104954A true JPH11104954A (en) | 1999-04-20 |
Family
ID=17724325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9287986A Pending JPH11104954A (en) | 1997-10-03 | 1997-10-03 | Polishing carrier and polishing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11104954A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008149417A (en) * | 2006-12-19 | 2008-07-03 | Agc Techno Glass Co Ltd | Method of grinding platelike glass optical element |
| JP2012051039A (en) * | 2010-08-31 | 2012-03-15 | Nippon Electric Glass Co Ltd | Method of manufacturing glass thin sheet |
| US8274633B2 (en) | 2006-03-14 | 2012-09-25 | Sony Corporation | Display device comprising a protective fixing member disposed only about a periphery of a semiconductor chip wherein a top side and a bottom side are co-planar with a respective top side and a bottom side of the semiconductor chip |
| JP2014104522A (en) * | 2012-11-26 | 2014-06-09 | Sumitomo Metal Mining Co Ltd | Single-side processing method of wafer and production method of wafer |
-
1997
- 1997-10-03 JP JP9287986A patent/JPH11104954A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8274633B2 (en) | 2006-03-14 | 2012-09-25 | Sony Corporation | Display device comprising a protective fixing member disposed only about a periphery of a semiconductor chip wherein a top side and a bottom side are co-planar with a respective top side and a bottom side of the semiconductor chip |
| US8804089B2 (en) | 2006-03-14 | 2014-08-12 | Japan Display West Inc. | Method of manufacturing a display device comprising a step of simultaneously polishing a second substrate and a semiconductor chip to have the same thickness as each other |
| US8917372B2 (en) | 2006-03-14 | 2014-12-23 | Japan Display West Inc. | Method of manufacturing a display device comprising first and second polarizing plate and phase difference plate combinations and a step of simultaneously polishing a second substrate and a semiconductor chip to have the same thickness as each other |
| US9091893B2 (en) | 2006-03-14 | 2015-07-28 | Japan Display Inc. | Method of manufacturing a display device comprising a step of simultaneously polishing a second substrate and a semiconductor chip to have the same thickness as each other |
| JP2008149417A (en) * | 2006-12-19 | 2008-07-03 | Agc Techno Glass Co Ltd | Method of grinding platelike glass optical element |
| JP2012051039A (en) * | 2010-08-31 | 2012-03-15 | Nippon Electric Glass Co Ltd | Method of manufacturing glass thin sheet |
| JP2014104522A (en) * | 2012-11-26 | 2014-06-09 | Sumitomo Metal Mining Co Ltd | Single-side processing method of wafer and production method of wafer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |