JPH1074722A - Ultrasonic vibrator and ultrasonic washer with it - Google Patents

Ultrasonic vibrator and ultrasonic washer with it

Info

Publication number
JPH1074722A
JPH1074722A JP22821096A JP22821096A JPH1074722A JP H1074722 A JPH1074722 A JP H1074722A JP 22821096 A JP22821096 A JP 22821096A JP 22821096 A JP22821096 A JP 22821096A JP H1074722 A JPH1074722 A JP H1074722A
Authority
JP
Japan
Prior art keywords
vibration
diaphragm
ultrasonic
thickness
vibrator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22821096A
Other languages
Japanese (ja)
Inventor
Nobuki Matsuzaki
伸樹 松崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Engineering Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Engineering Works Co Ltd filed Critical Shibaura Engineering Works Co Ltd
Priority to JP22821096A priority Critical patent/JPH1074722A/en
Publication of JPH1074722A publication Critical patent/JPH1074722A/en
Pending legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To remove particulates of various diameters adhering to a substance to be washed efficiently by setting the thickness of a diaphragm to a thickness other than specific integral multiples of the wavelength of vibration generated by a vibrator element. SOLUTION: Concerning to a diaphragm 21, the peripheral part of its underside is joined to the internal bottom surface of the recession 12 of an upper member 13 through a framelike sealing material 22 having a specified thickness. Besides, to the upper surface of the diaphragm 21 a framelike pressing board 23 is joined similarly, is fixed to the upper member 13, and the upper end opening of a space 18 is closed hermetically. And a plurality of vibrator elements 24 are stuch and fixed with their adjoining sides separated at specified intervals, at the corresponding region to the space 18 being the cross direction central part of the upper surface of the vibrating board 21, and the thickness of the vibrating board 21 is set to a thickness other than integral multiples of λ/2, when the wavelength of the vibration of the vibrator elements 24 is represented by λ. Consequently, it becomes possible to remove particulates of various diameters adhering to a substance to be washed efficiently.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は被洗浄物を洗浄す
る洗浄液に超音波振動を付与するための超音波振動装置
およびそれが用いられた超音波洗浄装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrasonic vibration device for applying ultrasonic vibration to a cleaning liquid for cleaning an object to be cleaned and an ultrasonic cleaning device using the same.

【0002】[0002]

【従来の技術】たとえば、液晶表示装置や半導体装置の
製造工程においては、被洗浄物としての液晶用ガラス基
板や半導体ウエハを高い清浄度で洗浄することが要求さ
れる工程がある。このような被洗浄物を洗浄する方式と
しては、洗浄液中に複数枚の被洗浄基板を浸漬するデイ
ップ方式や被洗浄物に向けて洗浄液を噴射して一枚づつ
洗浄する枚葉方式があり、最近では高い清浄度が得られ
るとともに、コスト的に有利な枚葉方式が採用されるこ
とが多くなってきている。
2. Description of the Related Art For example, in a manufacturing process of a liquid crystal display device or a semiconductor device, there is a process that requires cleaning a glass substrate for liquid crystal or a semiconductor wafer as an object to be cleaned with high cleanliness. As a method of cleaning such an object to be cleaned, there are a dip method in which a plurality of substrates to be cleaned are immersed in a cleaning liquid, and a single-wafer method in which a cleaning liquid is sprayed toward an object to be cleaned to wash one by one. In recent years, a single-wafer method which is advantageous in terms of cost while being able to obtain high cleanliness has been increasingly used.

【0003】枚葉方式の1つとして被洗浄物に噴射され
る洗浄液に振動を付与し、その振動作用によって上記被
洗浄物から微粒子を効率よく除去するようにした洗浄方
式が実用化されている。
[0003] As one of the single-wafer systems, a cleaning system has been put to practical use in which vibration is imparted to a cleaning liquid sprayed on a cleaning object, and the fine particles are efficiently removed from the cleaning object by vibrating action. .

【0004】洗浄液に振動を付与する洗浄方式におい
て、従来は20〜50kHz程度の超音波が用いられていた
が、最近では600 〜2000kHz程度の極超音波帯域の音
波を用いる超音波洗浄装置が開発されている。
In the cleaning method of applying vibration to the cleaning liquid, ultrasonic waves of about 20 to 50 kHz have been used in the past, but recently an ultrasonic cleaning apparatus using ultrasonic waves in the ultra-ultrasonic band of about 600 to 2000 kHz has been developed. Have been.

【0005】振動が付与された洗浄液を被洗浄物に噴射
すると、その振動の作用によって被洗浄物に付着した微
粒子の結合力が低下するため、振動を付与しない場合に
比べて洗浄効果を向上させることができる。
[0005] When the vibration-applied cleaning liquid is sprayed onto the object to be cleaned, the effect of the vibration reduces the bonding force of the fine particles adhering to the object to be cleaned, so that the cleaning effect is improved as compared with the case where no vibration is applied. be able to.

【0006】従来の超音波洗浄装置は、図4に示すよう
に細長い装置本体1を有する。この装置本体1には空間
部2が本体1の厚さ方向に貫通し、かつ長手方向に沿っ
て形成されている。上記空間部2は上端側から下端側に
ゆくにつれて狭幅となるテ−パ状に形成されていて、下
端は装置本体1の下面に開口したノズル口3となってい
る。
A conventional ultrasonic cleaning apparatus has an elongated apparatus main body 1 as shown in FIG. A space 2 is formed in the apparatus main body 1 so as to penetrate in the thickness direction of the main body 1 and to extend along the longitudinal direction. The space portion 2 is formed in a tapered shape that becomes narrower in width from the upper end to the lower end, and the lower end is a nozzle port 3 opened on the lower surface of the apparatus main body 1.

【0007】上記空間部2の上端開口はシ−ル材4を介
して金属板などの振動板5で閉塞されている。この振動
板5の上面には上記空間部2の上端開口と対応する部位
に沿って細長い矩形状の複数の振動子6(1つのみ図
示)が所定間隔で取着されている。この振動子6には直
流電圧が印加されるようになっている。それによって、
振動子6は超音波振動するから、その超音波振動によっ
て上記振動板5も振動する。つまり、上記振動板5と振
動子6とで超音波振動装置を構成している。
The upper end opening of the space 2 is closed by a diaphragm 5 such as a metal plate via a seal material 4. A plurality of elongated rectangular vibrators 6 (only one is shown) are attached to the upper surface of the diaphragm 5 at predetermined intervals along a portion corresponding to the upper end opening of the space 2. A DC voltage is applied to the vibrator 6. Thereby,
Since the vibrator 6 is ultrasonically vibrated, the vibration plate 5 also vibrates due to the ultrasonic vibration. That is, the vibration plate 5 and the vibrator 6 constitute an ultrasonic vibration device.

【0008】上記装置本体1の上記空間部2の両側には
それぞれ長手方向に沿って供給路8が貫通して形成され
ている。一対の供給路8にはその両端にそれぞれ図示し
ない洗浄液の供給管が接続され、それら供給管によって
洗浄液が供給されるようになっている。
On both sides of the space portion 2 of the apparatus main body 1, supply paths 8 are formed penetrating along the longitudinal direction. A pair of supply passages 8 for cleaning liquid (not shown) are connected to both ends of the pair of supply paths 8, and the cleaning liquid is supplied by the supply pipes.

【0009】さらに、上記装置本体1には一端を上記供
給路8に連通させ、他端を空間部2に連通させた複数の
噴出路9が上記装置本体1の長手方向に沿って所定間隔
で形成されている。つまり、上記噴出路9の他端は上記
振動板5に対向して開口している。上記噴出路9は上記
供給路8に比べ内径寸法が十分に小さく設定されてい
る。
Further, a plurality of ejection paths 9 having one end communicating with the supply path 8 and the other end communicating with the space 2 are formed at predetermined intervals along the longitudinal direction of the apparatus main body 1. Is formed. That is, the other end of the ejection path 9 is open to face the diaphragm 5. The ejection path 9 has a sufficiently smaller inner diameter than the supply path 8.

【0010】上記供給路8に供給された洗浄液は複数の
噴出路9へほぼ均等に分流し、他端開口から上記振動板
5の下面に向かって噴出し、この振動板5で超音波振動
が付与される。超音波振動が付与された洗浄液は上記空
間部2のノズル口3から図示しない被洗浄物に向かって
噴出する。それによって、上記被洗浄物を超音波振動が
付与された洗浄液で洗浄することができる。
The cleaning liquid supplied to the supply path 8 is almost equally diverted to the plurality of ejection paths 9 and is ejected from the opening at the other end toward the lower surface of the vibration plate 5. Granted. The cleaning liquid to which the ultrasonic vibration has been applied is jetted from the nozzle port 3 of the space 2 toward the object to be cleaned (not shown). Thereby, the object to be cleaned can be cleaned with the cleaning liquid to which the ultrasonic vibration is applied.

【0011】ところで、このような構成の超音波洗浄装
置においては、振動子6から発振されて振動板5に入射
した振動波は、振動板5と、この振動板5に接する洗浄
液との境界面で一部が反射したり、残りが透過するとい
うことを繰返す。
By the way, in the ultrasonic cleaning apparatus having such a configuration, the vibration wave oscillated from the vibrator 6 and incident on the diaphragm 5 is applied to the boundary surface between the diaphragm 5 and the cleaning liquid in contact with the diaphragm 5. , And a part of the light is reflected and the rest is transmitted.

【0012】従来、上記振動板5の厚さtは図5(a)
に示すように振動波の波長λの2分の1の整数倍に設定
されていた。それによって、振動波の節の部分が振動板
5と洗浄液との境界面(振動板5の一側面)に位置する
から、上記境界面で反射と透過を繰返すことで、振動板
5を駆動する複数の振動波W1 は、図5(b)に示すよ
うに、見掛上は全体として位相にずれがない1つの振動
波になる。
Conventionally, the thickness t of the diaphragm 5 is shown in FIG.
As shown in the figure, the wavelength was set to an integral multiple of half the wavelength λ of the vibration wave. As a result, the node of the vibration wave is located at the boundary surface (one side surface of the vibration plate 5) between the vibration plate 5 and the cleaning liquid. Therefore, the vibration plate 5 is driven by repeating reflection and transmission at the boundary surface. As shown in FIG. 5B, the plurality of vibration waves W1 are apparently one vibration wave having no phase shift as a whole.

【0013】このように、振動板5を駆動する振動波が
見掛上、位相にずれがない1つの振動波であると、その
駆動力のピ−ク値は高くなるから、振動板5を大きな振
幅で振動させることができる。つまり、振動板5は一定
の周期で振動することになる。
As described above, if the vibration wave for driving the diaphragm 5 is apparently a single vibration wave having no phase shift, the peak value of the driving force is increased. Vibration can be performed with a large amplitude. That is, the diaphragm 5 vibrates at a constant cycle.

【0014】ところで、被洗浄物には種々の粒径の微粒
子が付着していて、それらの粒径の微粒子は振動の波形
によって除去され易い粒径と除去されにくい粒径とがあ
る。そのため、振動板を位相にずれのない波形の振動波
で駆動すると、この振動板から振動が付与された洗浄液
では除去され易い粒径の微粒子と、除去されにくい粒径
の微粒子があるため、被洗浄物の洗浄効果を十分に高め
ることができないということがあった。
By the way, fine particles having various particle diameters adhere to the object to be cleaned, and the fine particles having such particle diameters have a particle size that is easily removed by a vibration waveform and a particle size that is difficult to be removed. Therefore, when the diaphragm is driven by a vibration wave having a waveform having no phase shift, there are fine particles having a particle size that is easy to be removed by the cleaning liquid vibrated from the diaphragm and fine particles having a particle size that is difficult to be removed. In some cases, the cleaning effect of the cleaning object cannot be sufficiently enhanced.

【0015】[0015]

【発明が解決しようとする課題】このように、従来は振
動板の厚さを振動波の波長の2分の1の整数倍に設定す
ることで振動板を位相にずれのない波形の振動波で駆動
していた。そのため、被洗浄物に付着した微粒子は振動
板から振動が付与された洗浄液によって除去され易い粒
径と除去されにくい粒径の微粒子とがあるため、被洗浄
物の洗浄効果を十分に高めることができないということ
があった。
As described above, conventionally, by setting the thickness of the vibration plate to an integral multiple of one half of the wavelength of the vibration wave, the vibration wave having a waveform having no phase shift can be obtained. Had been driven. Therefore, the fine particles adhering to the object to be cleaned have a particle size that is easily removed by the cleaning liquid to which vibration is applied from the diaphragm and a particle size that is difficult to be removed. There were things that I couldn't do.

【0016】この発明の目的は、振動板を位相がずれた
複数の振動波で駆動できるようにすることで、被洗浄物
に付着した種々の粒径の微粒子を効率よく除去できるよ
うにした超音波振動装置およびそれを用いた超音波洗浄
装置を提供することにある。
An object of the present invention is to make it possible to drive a diaphragm with a plurality of vibration waves having phases shifted from each other so that fine particles having various particle diameters attached to an object to be cleaned can be efficiently removed. An object of the present invention is to provide an ultrasonic vibration device and an ultrasonic cleaning device using the same.

【0017】[0017]

【課題を解決するための手段】請求項1の発明は、振動
板に振動子が取着されてなる超音波振動装置において、
上記振動板は、上記振動子から発振される振動の波長の
2分の1の整数倍以外の厚さに設定されていることを特
徴とする。
According to a first aspect of the present invention, there is provided an ultrasonic vibrating apparatus having a vibrator attached to a vibrating plate.
The thickness of the vibration plate is set to a thickness other than an integral multiple of half the wavelength of vibration oscillated from the vibrator.

【0018】請求項2の発明は、被洗浄物を洗浄する洗
浄液に超音波振動を付与するための超音波振動装置が設
けられた超音波洗浄装置において、上記超音波振動装置
は請求項1に記載された構成であることを特徴とする。
According to a second aspect of the present invention, there is provided an ultrasonic cleaning apparatus provided with an ultrasonic vibration apparatus for applying ultrasonic vibration to a cleaning liquid for cleaning an object to be cleaned. It is the feature described.

【0019】請求項1と請求項2の発明によれば、振動
子から発振された振動波の節の部分が振動板と洗浄液と
の境界面からずれるから、上記境界面で反射する振動波
は位相がずれる。
According to the first and second aspects of the present invention, the node of the vibration wave oscillated from the vibrator is displaced from the boundary between the diaphragm and the cleaning liquid. Out of phase.

【0020】それによって、振動板は位相がずれた複数
の振動波によって不規則に駆動されるため、不規則な振
動が付与された洗浄液は種々の粒径の粒子に対して洗浄
効果を呈する。
Accordingly, the diaphragm is driven irregularly by a plurality of vibration waves having different phases, so that the cleaning liquid to which the irregular vibration is applied has a cleaning effect on particles having various particle diameters.

【0021】[0021]

【発明の実施形態】以下、この発明の一実施形態を図1
乃至図3を参照して説明する。図2に示すこの発明の超
音波洗浄装置は装置本体11を有する。この装置本体1
1は上面が開放した凹部12が長手方向に沿って形成さ
れた上部材13と、この上部材13の下面に第1のシ−
ル材14を介して液密に接合固定された下部材15とに
よって細長い角柱状に形成されている。
BRIEF DESCRIPTION OF THE DRAWINGS FIG.
This will be described with reference to FIGS. The ultrasonic cleaning apparatus of the present invention shown in FIG. This device body 1
Reference numeral 1 denotes an upper member 13 in which a concave portion 12 having an open upper surface is formed along the longitudinal direction, and a first seal on the lower surface of the upper member 13.
And a lower member 15 which is joined and fixed in a liquid-tight manner via a metal member 14 to form an elongated prism.

【0022】上記上部材13の下部壁には長手方向に沿
って嵌合孔16が穿設され、上記下部材15の上面の幅
方向中央部分には上記嵌合孔16に嵌合する凸部17が
形成されている。
A fitting hole 16 is formed in the lower wall of the upper member 13 along the longitudinal direction, and a convex portion that fits into the fitting hole 16 is formed in the center of the upper surface of the lower member 15 in the width direction. 17 are formed.

【0023】上記下部材15の凸部17が形成された幅
方向中央部分には、一端を上面に開口させ、他端を下面
に開口させた空間部18が長手方向に沿って形成されて
いる。この空間部18の断面形状は、一端(上端)から
他端(下端)にゆくにつれて幅寸法が小さくなるテ−パ
状をなしていて、その下端開口は狭幅なノズル口19と
なっている。
A space 18 having one end opened on the upper surface and the other end opened on the lower surface is formed along the longitudinal direction at the center of the lower member 15 in the width direction where the projection 17 is formed. . The cross-sectional shape of the space 18 is tapered such that the width decreases from one end (upper end) to the other end (lower end), and the lower end opening is a narrow nozzle opening 19. .

【0024】上記空間部18の開口した上端は矩形状の
タンタルなどの薄い導電性の金属板や石英などの材料か
らなる、超音波振動装置を構成する振動板21によって
液密に閉塞されている。つまり、この振動板21は、そ
の下面周辺部が所定の厚さを有する枠状の第2のシ−ル
材22を介して上記上部材13の凹部12の内底面に接
合されている。
The open upper end of the space 18 is liquid-tightly closed by a vibrating plate 21 comprising a thin conductive metal plate such as tantalum or a material such as quartz, which constitutes an ultrasonic vibrator. . That is, the diaphragm 21 is joined to the inner bottom surface of the concave portion 12 of the upper member 13 through the frame-shaped second seal member 22 having a predetermined thickness at the lower peripheral portion.

【0025】上記振動板21の上面には同じく枠状の押
え板23が接合され、上記上部材13に固定されてい
る。それによって、上記空間部18の上端開口は気密に
閉塞されている。
A frame-like holding plate 23 is joined to the upper surface of the vibration plate 21 and is fixed to the upper member 13. Thereby, the upper end opening of the space 18 is airtightly closed.

【0026】上記振動板21の上面の幅方向中央部分、
つまり上記空間部18と対応する部位には複数の振動子
24(1つのみ図示)が隣り合う側面を所定の間隔で離
間させ接着固定されている。上記振動板24の厚さ寸法
Tは、振動子24の振動の波長をλとすると、λ/2の
整数倍以外の厚さ、たとえばT=0.1 λ〜0.9 λに設定
されている。
A central portion in the width direction of the upper surface of the diaphragm 21;
In other words, a plurality of vibrators 24 (only one is shown) are bonded and fixed to the portion corresponding to the space portion 18 with the adjacent side surfaces separated at a predetermined interval. The thickness T of the diaphragm 24 is set to a thickness other than an integral multiple of λ / 2, for example, T = 0.1 λ to 0.9 λ, where λ is the wavelength of vibration of the vibrator 24.

【0027】それによって、図1(a)に示すように振
動板21と、この振動板21の空間部18に充満する洗
浄液との境界面Bにおいて、上記振動子24からの振動
波Wは、その振動の節Lの部分が上記境界面Bから外れ
ることになる。なお、図中Hは振動の腹の部分を示して
いる。
Thus, as shown in FIG. 1A, at the boundary B between the vibration plate 21 and the cleaning liquid filling the space 18 of the vibration plate 21, the vibration wave W from the vibrator 24 is The portion of the node L of the vibration comes off the boundary surface B. In the figure, H indicates the antinode of the vibration.

【0028】そのため、振動波Wは、上記境界面Bで一
部は透過するが、残りは反射するということを繰返す。
境界面Bで反射する振動波W1 は節Lの部分が上記境界
面Bからずれていることで、反射を繰返す複数の振動波
はそれぞれ位相がずれることになる。つまり、振動板2
1は図1(b)に示すように位相がずれた複数の振動波
Wによって駆動されることになる。
For this reason, the vibration wave W repeats such that a part of the vibration wave W is transmitted through the boundary surface B but the rest is reflected.
Since the vibration wave W1 reflected at the boundary surface B is shifted from the boundary surface B at the node L, a plurality of vibration waves that repeat reflection have respective phases shifted. That is, the diaphragm 2
1 is driven by a plurality of vibration waves W out of phase as shown in FIG.

【0029】上記振動板21の上方には給電板25が上
記押え板23に保持部材26を介して取り付けられてい
る。この給電板25には上記振動子24の上面側の電極
24bと弾性的に接触した接触子27が設けられてい
る。
A power supply plate 25 is mounted above the vibration plate 21 on the holding plate 23 via a holding member 26. The power supply plate 25 is provided with a contact 27 that is in elastic contact with the electrode 24b on the upper surface side of the vibrator 24.

【0030】図2に示すように上記給電板25にはコイ
ル28が設けられ、このコイル28から上記給電板2
5、接触子27を介して上記振動子24に給電されるよ
うになっている。それによって、上記振動子24が超音
波振動し、その超音波振動に上記振動板21が連動する
ようになっている。
As shown in FIG. 2, a coil 28 is provided on the power supply plate 25, and the coil 28
5. Power is supplied to the vibrator 24 via the contact 27. Thereby, the vibrator 24 is ultrasonically vibrated, and the vibration plate 21 is interlocked with the ultrasonic vibration.

【0031】上記装置本体11の下部材15には、上記
空間部18の幅方向両側に位置する一対の供給路31が
長手方向に貫通して形成されている。この供給路31の
両端には図示しない供給源が同じく図示しないチュ−ブ
を介して接続され、純水や薬液などの洗浄液を供給する
ようになっている。
In the lower member 15 of the apparatus main body 11, a pair of supply paths 31 located on both sides in the width direction of the space 18 are formed so as to penetrate in the longitudinal direction. A supply source (not shown) is connected to both ends of the supply path 31 via a tube (not shown) to supply a cleaning liquid such as pure water or a chemical solution.

【0032】一対の供給路31にはそれぞれ複数の噴出
路32が一端を連通させて設けられている。つまり、噴
出路32は上記装置本体11の上部材13と下部材15
との接合する部分に形成されていて、他端を上記上部材
13の凹部12の内底面の上記振動板21によって覆わ
れた部分、つまり上記空間部18の上端側に連通するよ
う開口させている。
Each of the pair of supply paths 31 is provided with a plurality of ejection paths 32 each having one end communicating with one another. That is, the ejection path 32 is provided between the upper member 13 and the lower member 15 of the apparatus main body 11.
And the other end is opened so as to communicate with a portion covered by the diaphragm 21 on the inner bottom surface of the concave portion 12 of the upper member 13, that is, the upper end side of the space portion 18. I have.

【0033】上記噴出路32は上記空間部18の幅方向
一側と他側において、装置本体11の長手方向に沿って
所定間隔で複数形成されている。上記空間部18の幅方
向一側と他側における噴出路32の上記凹部12の内底
面に開口させた他端は、図3に示すように装置本体11
の長手方向において位置をずらしている。
A plurality of the ejection paths 32 are formed at predetermined intervals along the longitudinal direction of the apparatus main body 11 on one side and the other side in the width direction of the space 18. As shown in FIG. 3, the other ends of the ejection passages 32 opened on the inner bottom surface of the recess 12 on one side and the other side in the width direction of the space portion 18 are connected to the apparatus main body 11.
Are shifted in the longitudinal direction.

【0034】つぎに、上記構成の超音波洗浄装置の作用
について説明する。一対の供給路31に洗浄液を供給す
るとともに、振動子24に所定の電圧を印加して振動板
21を超音波振動させる。上記供給路31に供給された
洗浄液は複数の噴出路32へ分流し、その噴出路32の
他端開口から振動板21に向かって噴出する。
Next, the operation of the ultrasonic cleaning apparatus having the above configuration will be described. The cleaning liquid is supplied to the pair of supply paths 31 and a predetermined voltage is applied to the vibrator 24 to ultrasonically vibrate the vibration plate 21. The cleaning liquid supplied to the supply path 31 is divided into a plurality of ejection paths 32 and is ejected toward the diaphragm 21 from the other end opening of the ejection path 32.

【0035】各噴出路32から噴出された洗浄液が超音
波振動する振動板21の下面に衝突すると、その洗浄液
に超音波振動が伝播される。超音波振動が伝播された洗
浄液、つまり超音波振動する洗浄液は図2に矢印で示す
ように空間部18を流れてその下端のノズル口19から
噴出する。したがって、上記ノズル口19の下方に被洗
浄物を対向配置すれば、その被洗浄物を超音波振動が付
与された洗浄液によって洗浄することができる。
When the cleaning liquid jetted from each jetting path 32 collides with the lower surface of the vibration plate 21 that vibrates ultrasonically, the ultrasonic vibration is propagated to the cleaning liquid. The cleaning liquid to which the ultrasonic vibration has propagated, that is, the cleaning liquid which is ultrasonically vibrated, flows through the space 18 as shown by the arrow in FIG. Therefore, when the object to be cleaned is disposed below the nozzle port 19, the object to be cleaned can be cleaned with the cleaning liquid to which the ultrasonic vibration is applied.

【0036】ところで、上記振動板21からは、その厚
さ寸法Tを振動子24の振動の波長λの1/2の整数倍
以外の値に設定している。そのため、振動板21と洗浄
液との境界面Bから振動波Wの節Lの部分がずれるか
ら、上記振動波Wが上記境界面Bで反射と透過を繰返す
ことで、上記境界面Bで反射したそれぞれの振動波Wは
位相がずれることになる。つまり、振動板21は位相が
ずれた複数の振動波Wによって不規則に駆動されること
になる。
The thickness T of the vibrating plate 21 is set to a value other than an integral multiple of 1/2 of the wavelength λ of vibration of the vibrator 24. Therefore, the node L of the vibration wave W is shifted from the boundary surface B between the vibration plate 21 and the cleaning liquid, and the vibration wave W is reflected on the boundary surface B by repeating reflection and transmission at the boundary surface B. Each vibration wave W will be out of phase. In other words, the diaphragm 21 is driven irregularly by the plurality of vibration waves W having different phases.

【0037】それによって、被洗浄物に粒径の異なる微
粒子が付着していても、不規則に振動する振動板21か
ら振動が付与された洗浄液は、所定の大きさの粒径だけ
を除去するということがなく、種々の大きさの粒径の微
粒子を除去できるから、被洗浄物の洗浄効果を高めるこ
とができる。
Thus, even if fine particles having different particle diameters adhere to the object to be cleaned, the cleaning liquid vibrated from the vibrating plate 21 that vibrates irregularly removes only a predetermined particle size. In addition, since fine particles having various sizes can be removed, the effect of cleaning the object to be cleaned can be enhanced.

【0038】図3(a)はこの発明の振動板21に発生
したインピ−ダンスの変化を測定したグラフで、同図
(b)は従来の振動板5に発生したインピ−ダンスを測
定したグラフである。
FIG. 3A is a graph showing a change in the impedance generated on the diaphragm 21 of the present invention, and FIG. 3B is a graph showing a measurement of the impedance generated on the conventional diaphragm 5. It is.

【0039】これらのグラフから明らかなように、従来
はインピ−ダンスの変化が規則的でったが、この発明に
よれば複数のピ−ク値が不規則に生じていることが分か
る。したがって、振動子24による振動板21の駆動も
不規則となる。
As is apparent from these graphs, the impedance changes in the prior art in a regular manner, but according to the present invention, a plurality of peak values occur irregularly. Therefore, the driving of the diaphragm 21 by the vibrator 24 is also irregular.

【0040】[0040]

【発明の効果】請求項1の発明によれば、振動子が取着
される振動板の厚さを、上記振動子からの振動の波長の
1/2の整数倍以外の厚さに設定した。そのため、上記
振動板は位相がずれた複数の振動波によって不規則に駆
動されることになる。
According to the first aspect of the present invention, the thickness of the vibration plate to which the vibrator is attached is set to a thickness other than an integral multiple of 1/2 of the wavelength of the vibration from the vibrator. . Therefore, the diaphragm is driven irregularly by a plurality of vibration waves having different phases.

【0041】請求項2の発明によれば、位相がずれた複
数の振動波によって振動板が駆動される超音波振動装置
を超音波洗浄装置に用いることで、洗浄液には上記振動
板の不規則な振動が付与されるから、その不規則な振動
により、被洗浄物に粒径の異なる微粒子が付着していて
も、それぞれの粒径の微粒子を効率よく洗浄除去するこ
とができる。
According to the second aspect of the present invention, an ultrasonic vibration device in which a vibration plate is driven by a plurality of vibration waves having different phases is used for an ultrasonic cleaning device. Since the irregular vibrations are applied, even if the irregular vibrations cause fine particles having different particle diameters to adhere to the object to be cleaned, the fine particles having the respective particle diameters can be efficiently cleaned and removed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)はこの発明の一実施形態を示す振動子の
取付け構造の拡大断面図、(b)は同じく振動板を駆動
する振動波の波形を拡大して示した説明図。
FIG. 1A is an enlarged cross-sectional view of a vibrator mounting structure according to an embodiment of the present invention, and FIG. 1B is an explanatory diagram showing an enlarged waveform of a vibration wave for driving the diaphragm.

【図2】同じく超音波洗浄装置の縦断面図。FIG. 2 is a longitudinal sectional view of the ultrasonic cleaning apparatus.

【図3】この発明と従来の振動板のインピ−ダンスの変
化を示す説明図。
FIG. 3 is an explanatory diagram showing a change in impedance of the diaphragm according to the present invention and a conventional diaphragm.

【図4】従来の超音波洗浄装置の縦断面図。FIG. 4 is a longitudinal sectional view of a conventional ultrasonic cleaning device.

【図5】(a)は同じく振動子の取付け構造の拡大断面
図、(b)は同じく振動板を駆動する振動波の波形を拡
大して示した説明図。
5A is an enlarged cross-sectional view of a vibrator mounting structure, and FIG. 5B is an explanatory diagram showing an enlarged waveform of a vibration wave for driving the vibration plate.

【符号の説明】[Explanation of symbols]

21…振動板 24…振動子 21: diaphragm 24: vibrator

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 振動板に振動子が取着されてなる超音波
振動装置において、 上記振動板は、上記振動子から発振される振動の波長の
2分の1の整数倍以外の厚さに設定されていることを特
徴とする超音波振動装置。
An ultrasonic vibration device comprising a vibrator attached to a vibrating plate, wherein the vibrating plate has a thickness other than an integral multiple of half the wavelength of vibration oscillated from the vibrator. An ultrasonic vibration device characterized by being set.
【請求項2】 被洗浄物を洗浄する洗浄液に超音波振動
を付与するための超音波振動装置が設けられた超音波洗
浄装置において、 上記超音波振動装置は請求項1に記載された構成である
ことを特徴とする超音波洗浄装置。
2. An ultrasonic cleaning device provided with an ultrasonic vibration device for applying ultrasonic vibration to a cleaning liquid for cleaning an object to be cleaned, wherein the ultrasonic vibration device has a configuration according to claim 1. An ultrasonic cleaning device, comprising:
JP22821096A 1996-08-29 1996-08-29 Ultrasonic vibrator and ultrasonic washer with it Pending JPH1074722A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22821096A JPH1074722A (en) 1996-08-29 1996-08-29 Ultrasonic vibrator and ultrasonic washer with it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22821096A JPH1074722A (en) 1996-08-29 1996-08-29 Ultrasonic vibrator and ultrasonic washer with it

Publications (1)

Publication Number Publication Date
JPH1074722A true JPH1074722A (en) 1998-03-17

Family

ID=16872921

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22821096A Pending JPH1074722A (en) 1996-08-29 1996-08-29 Ultrasonic vibrator and ultrasonic washer with it

Country Status (1)

Country Link
JP (1) JPH1074722A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003031540A (en) * 2001-07-18 2003-01-31 Toshiba Corp Ultrasonic cleaning unit, ultrasonic cleaning apparatus and method, and manufacturing methods of semiconductor device and liquid crystal display

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003031540A (en) * 2001-07-18 2003-01-31 Toshiba Corp Ultrasonic cleaning unit, ultrasonic cleaning apparatus and method, and manufacturing methods of semiconductor device and liquid crystal display

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