JPH10293945A - Optical disk and its production - Google Patents

Optical disk and its production

Info

Publication number
JPH10293945A
JPH10293945A JP9103564A JP10356497A JPH10293945A JP H10293945 A JPH10293945 A JP H10293945A JP 9103564 A JP9103564 A JP 9103564A JP 10356497 A JP10356497 A JP 10356497A JP H10293945 A JPH10293945 A JP H10293945A
Authority
JP
Japan
Prior art keywords
film
alloy film
alloy
surface tension
reflectance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9103564A
Other languages
Japanese (ja)
Other versions
JP3017125B2 (en
Inventor
Shingetsu Yamada
紳月 山田
Toshiyuki Aritake
利行 有竹
Yukihiro Yoshida
幸弘 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Plastics Inc
Original Assignee
Mitsubishi Plastics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Plastics Inc filed Critical Mitsubishi Plastics Inc
Priority to JP9103564A priority Critical patent/JP3017125B2/en
Publication of JPH10293945A publication Critical patent/JPH10293945A/en
Application granted granted Critical
Publication of JP3017125B2 publication Critical patent/JP3017125B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an optical disk which is inexpensive, has high durability and allows the two-layered reading out of one side at a good conditions by setting the thickness of the translucent film consisting of Ag or an alloy consisting essentially of the Ag of the optical disk formed by sticking a first substrate having a metallic reflection plate and a second substrate having the translucent film by a photosetting transparent adhesive in a specific range. SOLUTION: The thickness of the translucent film of the alloy consisting essentially of the Ag is 125 to 225 Å. The amts. of the Cu, W and Mg to be added to the alloy is preferably 0.5 to 10 at.%. The two disks are stuck to each other by using the photosetting transparent adhesive having the surface tension optimum for the crystal grain size of the translucent film. The photosetting transparent adhesive is preferably a UV visible light curing type adhesive which is prepd. by compounding a photopolymn. initiator and sensitizer with an acrylate based oligomer and monomer and has a viscosity of 500 cPs (25 deg.C).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【０００１】[0001]

【発明の属する技術分野】本発明は光ディスクに関し、
特に、金属反射膜を有する第１の基板と半透明膜を有す
る第２の基板とを光硬化性透明接着剤で貼り合わせた構
造を持ち、半透明膜の特性を活かしてディスクの片面か
ら第１、第２の基板の両方に記録された情報にアクセス
可能な高密度記録光ディスクおよびその製造方法に関す
る。The present invention relates to an optical disc,
In particular, it has a structure in which a first substrate having a metal reflective film and a second substrate having a translucent film are bonded with a photo-curable transparent adhesive, and the first substrate having a semi-transparent film is used for the first substrate from the one side thereof. The present invention relates to a high-density recording optical disc capable of accessing information recorded on both the first and second substrates, and a method for manufacturing the same.

【０００２】[0002]

【従来の技術】単一波長の読み出しビームで２層に記録
された情報を片面から読み出し可能な光ディスクの構成
を図１に示す。このディスクは、信号面に反射膜（例え
ばＡｌ合金膜）が形成されたポリカーボネート樹脂など
からなる透明基板１と、信号面に 使用レーザ波長領域
の光を、例えば３０％程度反射するように設計された半
透明膜４が形成された透明基板３を、それぞれの信号面
を内側にして透明接着剤５で貼り合わせた構造を持って
いる。信号の再生原理は、１層目の記録面に記録された
情報はレーザ光６の焦点を半透明膜４側の信号面に合わ
せ、半透明膜４からの反射光７の強度を検出器で検出
し、２層目の信号面に記録された情報はレーザ光８の焦
点を反射膜２側の信号面に合わせ、半透膜膜４を通過し
た戻り光９の強弱を検出器で検出する。この１層目およ
び２層目からのそれぞれの反射率は３０±１０％程度が
必要で、しかもこの範囲内で１層目、２層目それぞれの
反射率が近い値をとることが好ましい。2. Description of the Related Art FIG. 1 shows a configuration of an optical disk capable of reading information recorded on two layers with a single-wavelength read beam from one side. This disc is designed to reflect, for example, about 30% of light in a used laser wavelength region on a signal surface by a transparent substrate 1 made of a polycarbonate resin or the like having a reflection film (for example, an Al alloy film) formed on a signal surface. The transparent substrate 3 on which the translucent film 4 is formed is bonded with a transparent adhesive 5 with the respective signal surfaces inside. The principle of signal reproduction is as follows. The information recorded on the recording layer of the first layer focuses the laser beam 6 on the signal surface on the side of the translucent film 4 and the intensity of the reflected light 7 from the translucent film 4 is detected by a detector The information recorded on the signal surface of the second layer is focused on the laser light 8 on the signal surface on the reflection film 2 side, and the intensity of the return light 9 passing through the semi-permeable film 4 is detected by a detector. . The reflectance of each of the first and second layers is required to be about 30 ± 10%, and it is preferable that the reflectances of the first and second layers have close values within this range.

【０００３】このディスクを作製する上では、２枚のデ
ィスクを光硬化性透明接着剤で均一に貼り合わせる技術
と、半透明膜の材料選択と光学設計が重要なポイントと
なる。光硬化性透明接着剤で均一に貼り合わせる技術と
しては、２Ｐスピンコート法、２Ｐプレス法があるが、
膜厚の均一性、生産性、脱泡の面から２Ｐスピンコート
法が有利である。２Ｐスピンコート装置について詳細に
述べると、１枚目のディスクを接着面を上向きにしてス
ピンナーテーブルの上に載せ、例えば２０ｒｐｍの低速
で回転させながらディスクの半径方向中央部（例えば半
径４０ｍｍの位置付近）に光硬化性透明接着剤を円環状
に滴下し、滴下完了後２枚目のディスクを接着面を下向
きにして落下させると、光硬化性透明接着剤は上側ディ
スクの自重で内周側、外周側へ円環の幅を広げながら展
開し始める。内周側へ十分に展開したところでスピンナ
ーテーブルを例えば２０００ｒｐｍ以上で回転させ２枚
の光ディスクの界面の全面に光硬化性透明接着層を形成
することができる。この方法に用いられる光硬化性接着
剤としては作業性の面から室温で粘度３００〜６００ｃ
ｐｓのものが一般的である。また、硬化前の光硬化性接
着剤の表面張力は、反射膜および半透明膜との密着性に
主眼をおき、２０℃における値が、２８〜３６ｄｙｎ・
ｃｍ-1が一般的である。この表面張力の調整には界面活
性剤が用いられる。[0003] In manufacturing this disk, the important points are a technique of uniformly bonding two disks with a photocurable transparent adhesive, a material selection of a translucent film, and an optical design. As a technique for uniformly bonding with a photocurable transparent adhesive, there are a 2P spin coating method and a 2P press method.
The 2P spin coating method is advantageous in terms of uniformity of film thickness, productivity and defoaming. The 2P spin coater will be described in detail. The first disk is placed on a spinner table with the bonding surface facing upward, and while rotating at a low speed of, for example, 20 rpm, the center of the disk in the radial direction (for example, near the position with a radius of 40 mm) ), The light-curable transparent adhesive is dropped in an annular shape, and after the dropping is completed, the second disk is dropped with the bonding surface facing down. Start to expand while expanding the width of the ring toward the outer circumference. When the spinner table is sufficiently developed to the inner peripheral side, the spinner table is rotated at, for example, 2000 rpm or more, and a photocurable transparent adhesive layer can be formed on the entire surface of the interface between the two optical disks. The photocurable adhesive used in this method has a viscosity of 300 to 600 c at room temperature from the viewpoint of workability.
The one of ps is common. Further, the surface tension of the photocurable adhesive before curing focuses on the adhesion to the reflective film and the translucent film, and the value at 20 ° C. is 28 to 36 dyn ·
cm -1 is common. A surfactant is used for adjusting the surface tension.

【０００４】次に半透明膜であるが、材料としては、Ａ
ｕ、Ａｇ、Ｃｕがその反射率の高さから有望であるが、
Ａｕは価格の問題、Ｃｕは耐久性の問題があり、Ａｇが
有利である。ただし、金属薄膜の場合、その結晶粒の大
きさ如何によっては、使用した光硬化性接着剤の表面張
力との関係で、光硬化性接着剤が金属薄膜中に浸透して
ディスクの反射率にばらつきを生じ、再生信号波形が不
明瞭になることがある。誘電体薄膜材料では、ＳｉＮ
x ，ＳｉＯx などが有望であるが、反応性スパッタに所
以する基板からの脱ガスの影響などを十分に制御する必
要があるなど、各材料とも一長一短がある。[0004] Next, a semi-transparent film is used.
u, Ag, and Cu are promising due to their high reflectivity,
Au has a problem of price, Cu has a problem of durability, and Ag is advantageous. However, in the case of a metal thin film, depending on the size of the crystal grains, the photocurable adhesive penetrates into the metal thin film and affects the reflectivity of the disk due to the surface tension of the photocurable adhesive used. Variations may occur and the reproduced signal waveform may become unclear. For the dielectric thin film material, SiN
Although x and SiO x are promising, each material has advantages and disadvantages, such as the need to sufficiently control the effect of outgassing from the substrate due to reactive sputtering.

【０００５】[0005]

【発明が解決しようとする課題】本発明は従来のこの様
な問題を解決し、安価で、耐久性に富み、片面からの２
層読み出しを良好に行うことのできる光ディスクを提供
することを目的とする。SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems and is inexpensive, durable, and has a single-sided structure.
It is an object of the present invention to provide an optical disk capable of performing layer reading satisfactorily.

【０００６】[0006]

【課題を解決するための手段】本発明による光ディスク
は、金属反射膜を有する第１の基板と半透明膜を有する
第２の基板とを光硬化性透明接着剤によって貼り合わせ
た光ディスクにおいて、半透明膜がＡｇまたはＡｇを主
成分とする合金からなり、その厚さが１２５Å以上かつ
２２５Å以下であることを特徴とする。According to the present invention, there is provided an optical disk in which a first substrate having a metal reflection film and a second substrate having a semi-transparent film are bonded with a photo-curable transparent adhesive. The transparent film is made of Ag or an alloy containing Ag as a main component, and has a thickness of 125 ° or more and 225 ° or less.

【０００７】ここで、ＡｇまたはＡｇ合金の平均結晶粒
径をＹ（Å）、光硬化性透明接着剤の硬化前の２０℃に
おける表面張力をＸ（ｄｙｎ・ｃｍ-1）としたとき、平
均結晶粒径Ｙと表面張力Ｘが以下の式を満足することが
好ましい。Here, assuming that the average crystal grain size of Ag or Ag alloy is Y (Å) and the surface tension at 20 ° C. before curing of the photocurable transparent adhesive is X (dyn · cm −1 ), It is preferable that the crystal grain size Y and the surface tension X satisfy the following expression.

【０００８】[0008]

【数２】Ｙ≦４０Ｘ−３５０ ただし、 ２０≦Ｘ≦３８ ここで、Ａｇ合金がＡｇにＣｕ、Ｗ、およびＭｇのうち
の１種以上を０．５ａｔ％〜１０ａｔ％添加した合金で
あることが特に好ましい。Where Y ≦ 40X−350, where 20 ≦ X ≦ 38, where the Ag alloy is an alloy obtained by adding at least one of Cu, W, and Mg to Ag at 0.5 at% to 10 at%. Is particularly preferred.

【０００９】本発明による光ディスクの製造方法は、金
属反射膜を有する第１の基板と、半透明膜を有する第２
の基板とを光硬化性透明接着剤によって貼り合わせて光
ディスクを製造する方法において、第２の基板に半透明
膜としてＡｇまたはＡｇを主成分とする合金からなり、
厚さが１２５Å以上かつ２２５Å以下である半透明膜を
形成する工程、および半透明膜の平均結晶粒径をＹ
（Å）としたとき、硬化前の２０℃における表面張力Ｘ
が、Ｙ≦４０Ｘ−３５０、ただし２０≦Ｘ≦３８、を満
足する光硬化性透明接着剤によって第１の基板と第２の
基板を貼り合わせる工程を有することを特徴とする。According to the method of manufacturing an optical disk of the present invention, a first substrate having a metal reflection film and a second substrate having a translucent film are provided.
In a method of manufacturing an optical disc by bonding a substrate with a photo-curable transparent adhesive, the second substrate is made of Ag or an alloy containing Ag as a main component as a translucent film,
Forming a translucent film having a thickness of not less than 125 ° and not more than 225 °, and setting the average crystal grain size of the translucent film to Y
(Å), surface tension X at 20 ° C. before curing
However, the method includes a step of bonding the first substrate and the second substrate with a photocurable transparent adhesive satisfying Y ≦ 40X−350, where 20 ≦ X ≦ 38.

【００１０】[0010]

【発明の実施の形態】本発明においては、片面２層読み
出しのための半透明膜として、ＡｇまたはＡｇを主成分
とする合金を用いる。半透明膜の厚さは１２５Å〜２２
５Åであり、半透明膜の膜厚が１２５Åより薄いと読み
出し光の大部分が透過して反射光の強度が弱くなり過
ぎ、逆に半透明膜の膜厚が２２５Åより厚いと読み出し
光の大部分が反射して第２層の読み出しが不可能とな
る。Ａｇを主成分とする合金半透明膜に添加されるＣ
ｕ、Ｗ、およびＭｇの量は０．５ａｔ％〜１０ａｔ％で
あり、０．５ａｔ％より少ないと平均結晶粒径が大きく
なって、使用可能な光硬化性接着剤の選択の幅が狭くな
り、１０ａｔ％より多いと反射率の低下を招く。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, Ag or an alloy containing Ag as a main component is used as a translucent film for single-sided, two-layer reading. The thickness of the translucent film is 125 to 22
When the thickness of the translucent film is smaller than 125 °, most of the reading light is transmitted and the intensity of the reflected light is too weak. On the contrary, when the thickness of the semitransparent film is larger than 225 °, the reading light is large. The portion is reflected and reading of the second layer becomes impossible. C added to a semi-transparent alloy film containing Ag as a main component
The amounts of u, W, and Mg are 0.5 at% to 10 at%, and if less than 0.5 at%, the average crystal grain size increases, and the range of usable photocurable adhesives becomes narrow. If the content is more than 10 at%, the reflectance will be reduced.

【００１１】そして、その半透明膜の結晶粒径に最適な
表面張力を有する光硬化性透明接着剤を用いて２枚のデ
ィスクを貼り合わせる。光硬化性透明接着剤として、以
下の実施例では、アクリレート系のオリゴマーおよびモ
ノマーに光重合開始剤、増感剤を配合した紫外可視光硬
化タイプの粘度５００ｃｐｓ（２５℃）のものを用い
た。比較例および実施例中に記述の表面張力の調整は界
面活性剤を添加して行った。界面活性剤の添加限界は１
％程度で、表面張力の下限は１８ｄｙｎ・ｃｍ-1（２０
℃）程度が限界であった。ウレタン系の接着剤も使用可
能である。Then, the two disks are bonded together using a photocurable transparent adhesive having a surface tension optimal for the crystal grain size of the translucent film. In the following examples, an ultraviolet-visible light-curable type having a viscosity of 500 cps (25 ° C.) in which a photopolymerization initiator and a sensitizer were mixed with an acrylate oligomer and monomer was used as the photocurable transparent adhesive. Adjustment of the surface tension described in Comparative Examples and Examples was performed by adding a surfactant. Surfactant addition limit is 1
%, The lower limit of the surface tension is 18 dyn · cm −1 (20
° C) was the limit. Urethane-based adhesives can also be used.

【００１２】以下に実施例および比較例を挙げて本発明
をより具体的に説明するが、本発明はその要旨を越えな
い限り以下の実施例に限定されるものではない。Hereinafter, the present invention will be described more specifically with reference to examples and comparative examples. However, the present invention is not limited to the following examples unless it exceeds the gist thereof.

【００１３】[0013]

【実施例】比較例１ ターゲットが自転および公転可能なスパッタリング装置
を用い、Ａｇターゲットを装着して直径１２０ｍｍ、厚
さ０．５７５ｍｍのポリカーボネート基板の信号面側
に、Ａｒガス流量５０ｓｃｃｍ、スパッタ圧力１ｍＴｏ
ｒｒ、スパッタ電力０．２５ｋＷ、スパッタ時間４２ｓ
ｅｃの条件で、厚さ１７５ÅのＡｇ膜を製膜した。この
膜の結晶粒の大きさはＸ線回折による粒径評価により平
均９３０Åであった。この値は製膜条件によっても多少
変化する。次に、公知の方法によって、Ａｇ膜上に記録
層を形成し、情報を記録した。別の直径１２０ｍｍ、厚
さ０．６ｍｍのポリカーボネート基板を用い、Ａｌ合金
ターゲットを装着してＤＣマグネトロンスパッタリング
法により平均厚さ６００ÅのＡｌ合金膜を製膜した。さ
らに、公知の方法によってＡｌ合金膜上に記録層を形成
し、情報を記録した。この様にしてＡｇ膜が製膜された
ディスクとＡｌ合金膜が製膜されたディスクを、それぞ
れの製膜面を内側にして２０℃における表面張力３０ｄ
ｙｎ・ｃｍ-1の光硬化性接着剤で２Ｐスピンコート法で
貼り合わせようとしたところ、光硬化性接着剤が塗布直
後に大部分の領域でＡｇ膜内部に浸透し、その部分に大
きな変色が認められた。そのため、これ以上のディスク
作製を中断した。COMPARATIVE EXAMPLE 1 A sputtering apparatus capable of rotating and revolving as a target was used. An Ag target was mounted on a polycarbonate substrate having a diameter of 120 mm and a thickness of 0.575 mm, on the signal side of an Ar gas flow rate of 50 sccm and a sputtering pressure of 1 mTo.
rr, sputtering power 0.25kW, sputtering time 42s
Under the condition of ec, an Ag film having a thickness of 175 ° was formed. The average size of the crystal grains of this film was 930 ° as determined by particle size evaluation by X-ray diffraction. This value slightly changes depending on the film forming conditions. Next, a recording layer was formed on the Ag film by a known method, and information was recorded. Using another polycarbonate substrate having a diameter of 120 mm and a thickness of 0.6 mm, an Al alloy target was mounted, and an Al alloy film having an average thickness of 600 ° was formed by DC magnetron sputtering. Further, a recording layer was formed on the Al alloy film by a known method, and information was recorded. The disk on which the Ag film was formed and the disk on which the Al alloy film was formed in this manner were subjected to a surface tension of 30 d at 20 ° C. with the respective film forming surfaces inside.
When trying to bond with the photocurable adhesive of yn · cm -1 by the 2P spin coating method, the photocurable adhesive permeated the Ag film in most areas immediately after the application, and large discoloration was caused in the area. Was observed. Therefore, further disc production was interrupted.

【００１４】比較例２ ２０℃における表面張力が３１ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ディスク外観を調査したところ、比較例１に示
したような光硬化性接着剤のＡｇ膜内部への浸透に基づ
く変色は肉眼では観察されなかった。このディスクにつ
いて、Ａｇ膜側からＡｇ膜およびＡｌ合金膜に波長６５
０ｎｍのレーザダイオードの焦点を合わせ、それぞれの
反射率を測定したところ、Ａｇ膜側からの反射率、Ａｌ
膜側からの反射率は、それぞれ３１％および３３％で所
望の反射率を満足していた。しかし、オシロスコープで
観察したＡｌ合金膜からの再生信号波形は非常に不明瞭
で、光硬化性接着剤が僅かではあるがＡｇ膜中に浸透し
ていると想定された。COMPARATIVE EXAMPLE 2 The same conditions as in Comparative Example 1 were used except that they were bonded together with a photocurable adhesive having a surface tension at 20 ° C. of 31 dyn · cm −1.
Two disks were stuck together. When the external appearance of the bonded disks was examined, no discoloration due to the penetration of the photocurable adhesive into the Ag film as shown in Comparative Example 1 was not observed with the naked eye. With respect to this disk, a wavelength of 65
When the laser diode of 0 nm was focused and the reflectance of each was measured, the reflectance from the Ag film side, Al
The reflectance from the film side was 31% and 33%, respectively, which satisfied the desired reflectance. However, the waveform of the reproduced signal from the Al alloy film observed with an oscilloscope was very unclear, and it was assumed that the photocurable adhesive had slightly penetrated into the Ag film.

【００１５】実施例１ ２０℃における表面張力が３２ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、Ａｇ膜側からＡｇ膜およびＡｌ合金膜に波長６
５０ｎｍのレーザダイオードの焦点を合わせ、それぞれ
の反射率を測定したところ、Ａｇ膜側からの反射率、Ａ
ｌ膜側からの反射率は、それぞれ３１％および３３％で
所望の反射率を満足していた。また、Ａｌ合金膜側から
の再生信号波形も明瞭であった。これは、光硬化性接着
剤の表面張力が増加し、光硬化性接着剤のＡｇ膜への浸
透が抑えられたことによる。[0015] except that the surface tension of Example 1 20 ° C. was laminated photocurable adhesive 32dyn · cm -1 under the same conditions as Comparative Example 1 2
Two disks were stuck together. With respect to the discs bonded together, a wavelength of 6
When the laser diode of 50 nm was focused and the reflectance of each was measured, the reflectance from the Ag film side, A
The reflectance from the 1-film side was 31% and 33%, respectively, which satisfied the desired reflectance. The reproduced signal waveform from the Al alloy film side was also clear. This is because the surface tension of the photocurable adhesive was increased and the penetration of the photocurable adhesive into the Ag film was suppressed.

【００１６】実施例２ ２０℃における表面張力が３８ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、Ａｇ膜側からＡｇ膜およびＡｌ合金膜に波長６
５０ｎｍのレーザダイオードの焦点を合わせ、それぞれ
の反射率を測定したところ、Ａｇ膜側からの反射率、Ａ
ｌ膜側からの反射率は、それぞれ３１％および３３％で
所望の反射率を満足していた。また、Ａｌ合金膜側から
の再生信号波形も明瞭であった。これは、実施例１と同
様に、光硬化性接着剤の表面張力が増加し、光硬化性接
着剤のＡｇ膜への浸透が抑えられたことによる。 Example 2 The same conditions as in Comparative Example 1 were used except that the film was laminated with a photocurable adhesive having a surface tension at 20 ° C. of 38 dyn · cm −1.
Two disks were stuck together. With respect to the discs bonded together, a wavelength of 6
When the laser diode of 50 nm was focused and the reflectance of each was measured, the reflectance from the Ag film side, A
The reflectance from the 1-film side was 31% and 33%, respectively, which satisfied the desired reflectance. The reproduced signal waveform from the Al alloy film side was also clear. This is because, similarly to Example 1, the surface tension of the photocurable adhesive was increased, and the penetration of the photocurable adhesive into the Ag film was suppressed.

【００１７】比較例３ ２０℃における表面張力が３９ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、Ａｇ膜側からＡｇ膜およびＡｌ合金膜に波長６
５０ｎｍのレーザダイオードの焦点を合わせ、それぞれ
の反射率を測定したところ、Ａｇ膜側からの反射率、Ａ
ｌ膜側からの反射率は、それぞれ３１％および３３％で
所望の反射率を満足していた。また、Ａｌ合金膜側から
の再生信号波形も実施例１、実施例２と同じ結果が得ら
れた。しかし、このディスクの透明接着層には泡の形成
が認められた。これは、接着剤の表面張力が高過ぎ、反
射膜および半透明膜との濡れ性が悪く、そのために貼り
合わせ時に泡の混入頻度が高くなったためと想定され
た。COMPARATIVE EXAMPLE 3 The same conditions as in Comparative Example 1 were used except that the photocurable adhesive having a surface tension at 20 ° C. of 39 dyn · cm −1 was used.
Two disks were stuck together. With respect to the discs bonded together, a wavelength of 6
When the laser diode of 50 nm was focused and the reflectance of each was measured, the reflectance from the Ag film side, A
The reflectance from the 1-film side was 31% and 33%, respectively, which satisfied the desired reflectance. Also, the same result as in Examples 1 and 2 was obtained with respect to the reproduction signal waveform from the Al alloy film side. However, the formation of bubbles was observed in the transparent adhesive layer of this disk. This was presumed to be because the surface tension of the adhesive was too high, and the wettability with the reflective film and the translucent film was poor, so that the frequency of mixing of bubbles at the time of bonding was increased.

【００１８】比較例４ ＡｇＣｕ１．５ａｔ％合金ターゲットを装着し、比較例
１と同じように直径１２０ｍｍ、厚さ０．５７５ｍｍの
ポリカーボネート基板の信号面に、Ａｒガス流量５０ｓ
ｃｃｍ、スパッタ圧力１ｍＴｏｒｒ、スパッタ電力０．
２５ｋＷ、スパッタ時間４２ｓｅｃの条件で、厚さ１７
５ÅのＡｇＣｕ合金膜を製膜した。製膜速度はＡｇ膜の
場合とほぼ同じであった。この膜の結晶粒の大きさはＸ
線回折による粒径評価の結果より平均８００Åであっ
た。次に、公知の方法によって、ＡｇＣｕ膜上に記録層
を形成し、情報を記録した。COMPARATIVE EXAMPLE 4 An AgCu 1.5 at% alloy target was mounted, and an Ar gas flow rate of 50 s was applied to the signal surface of a polycarbonate substrate having a diameter of 120 mm and a thickness of 0.575 mm as in Comparative Example 1.
ccm, sputter pressure 1 mTorr, sputter power 0.
Under the conditions of 25 kW and a sputtering time of 42 sec, a thickness of 17
A 5 ° AgCu alloy film was formed. The film forming speed was almost the same as that of the Ag film. The crystal grain size of this film is X
The average value was 800 ° based on the result of evaluation of the particle size by line diffraction. Next, a recording layer was formed on the AgCu film by a known method, and information was recorded.

【００１９】このＡｇＣｕ合金膜が製膜されたディスク
と、比較例１と同じ方法でＡｌ膜が製膜されたディスク
を、それぞれの製膜面を内側にして２０℃における表面
張力２７ｄｙｎ・ｃｍ-1の光硬化性接着剤で２Ｐスピン
コート法で貼り合わせようとしたところ、光硬化性接着
剤が塗布直後に大部分の領域でＡｇＣｕ合金膜内部に浸
透し、その部分に大きな変色が認められた。そのため、
これ以上のディスク作製を中断した。The disc on which the AgCu alloy film was formed and the disc on which the Al film was formed in the same manner as in Comparative Example 1 were subjected to a surface tension of 27 dyn · cm − at 20 ° C. with the respective film forming surfaces inside. When the two photo-curable adhesives were bonded together by the 2P spin coating method, the photo-curable adhesive permeated the AgCu alloy film in most areas immediately after application, and significant discoloration was observed in those areas. Was. for that reason,
Further disc production was interrupted.

【００２０】比較例５ ２０℃における表面張力が２８ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例４と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ディスク外観を調査したところ、比較例４に示
したような光硬化性接着剤のＡｇＣｕ合金膜内部への浸
透に基づく変色は肉眼では観察されなかった。このディ
スクについて、ＡｇＣｕ合金膜側からＡｇＣｕ合金膜お
よびＡｌ合金膜に波長６５０ｎｍのレーザダイオードの
焦点を合わせ、それぞれの反射率を測定したところ、Ａ
ｇＣｕ合金膜側からの反射率、Ａｌ膜側からの反射率
は、それぞれ３１％および３３％で所望の反射率を満足
していた。しかし、オシロスコープで観察したＡｌ合金
膜からの再生信号波形は非常に不明瞭で、光硬化性接着
剤が僅かではあるがＡｇＣｕ合金膜中に浸透していると
想定された。COMPARATIVE EXAMPLE 5 The same conditions as in Comparative Example 4 were used except that they were bonded together with a photocurable adhesive having a surface tension at 28 ° C. of 28 dyn · cm −1.
Two disks were stuck together. When the disk appearance of the bonded disks was examined, discoloration due to the penetration of the photocurable adhesive into the AgCu alloy film as shown in Comparative Example 4 was not observed with the naked eye. With respect to this disk, a laser diode having a wavelength of 650 nm was focused on the AgCu alloy film and the Al alloy film from the AgCu alloy film side, and the respective reflectances were measured.
The reflectance from the gCu alloy film side and the reflectance from the Al film side were 31% and 33%, respectively, satisfying the desired reflectance. However, the waveform of the reproduced signal from the Al alloy film observed with an oscilloscope was very unclear, and it was assumed that the photocurable adhesive had permeated the AgCu alloy film, albeit slightly.

【００２１】実施例３ ２０℃における表面張力が２９ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例４と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ＡｇＣｕ合金膜側からＡｇＣｕ合金膜およびＡ
ｌ合金膜に波長６５０ｎｍのレーザダイオードの焦点を
合わせ、それぞれの反射率を測定したところ、ＡｇＣｕ
合金膜側からの反射率、Ａｌ膜側からの反射率は、それ
ぞれ３１％および３３％で所望の反射率を満足してい
た。また、Ａｌ合金膜側からの再生信号波形も明瞭であ
った。これは、光硬化性接着剤の表面張力が増加し、光
硬化性接着剤のＡｇＣｕ合金膜への浸透が抑えられたこ
とによる。 Example 3 The same conditions as in Comparative Example 4 were used except that the photocurable adhesive having a surface tension at 20 ° C. of 29 dyn · cm −1 was used.
Two disks were stuck together. Regarding the bonded disks, the AgCu alloy film and A
A laser diode having a wavelength of 650 nm was focused on the alloy film, and the reflectance of each was measured.
The reflectance from the alloy film side and the reflectance from the Al film side were 31% and 33%, respectively, satisfying the desired reflectance. The reproduced signal waveform from the Al alloy film side was also clear. This is because the surface tension of the photocurable adhesive increased and the penetration of the photocurable adhesive into the AgCu alloy film was suppressed.

【００２２】実施例４ ２０℃における表面張力が３８ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例４と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ＡｇＣｕ合金膜側からＡｇＣｕ合金膜およびＡ
ｌ合金膜に波長６５０ｎｍのレーザダイオードの焦点を
合わせ、それぞれの反射率を測定したところ、ＡｇＣｕ
合金膜側からの反射率、Ａｌ膜側からの反射率は、それ
ぞれ３１％および３３％で所望の反射率を満足してい
た。また、Ａｌ合金膜側からの再生信号波形も明瞭であ
った。これは、実施例３と同様に光硬化性接着剤の表面
張力が増加し、光硬化性接着剤のＡｇＣｕ合金膜への浸
透が抑えられたことによる。 Example 4 The same procedure as in Comparative Example 4 was repeated except that the film was bonded with a photocurable adhesive having a surface tension at 20 ° C. of 38 dyn · cm −1.
Two disks were stuck together. Regarding the bonded disks, the AgCu alloy film and A
A laser diode having a wavelength of 650 nm was focused on the alloy film, and the reflectance of each was measured.
The reflectance from the alloy film side and the reflectance from the Al film side were 31% and 33%, respectively, satisfying the desired reflectance. The reproduced signal waveform from the Al alloy film side was also clear. This is because, similarly to Example 3, the surface tension of the photocurable adhesive was increased, and the penetration of the photocurable adhesive into the AgCu alloy film was suppressed.

【００２３】比較例６ ２０℃における表面張力が３９ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例４と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ＡｇＣｕ合金膜側からＡｇＣｕ合金膜およびＡ
ｌ合金膜に波長６５０ｎｍのレーザダイオードの焦点を
合わせ、それぞれの反射率を測定したところ、ＡｇＣｕ
合金膜側からの反射率、Ａｌ膜側からの反射率は、それ
ぞれ３１％および３３％で所望の反射率を満足してい
た。また、Ａｌ合金膜側からの再生信号波形も実施例
３、実施例４と同じ結果が得られた。しかし、このディ
スクの透明接着層には泡の形成が認められた。これは、
接着剤の表面張力が高過ぎ、反射膜および半透明膜との
濡れ性が悪く、そのために貼り合わせ時に泡の混入頻度
が高くなったためである。COMPARATIVE EXAMPLE 6 The same conditions as in Comparative Example 4 were used except that the photocurable adhesive having a surface tension at 20 ° C. of 39 dyn · cm −1 was used.
Two disks were stuck together. Regarding the bonded disks, the AgCu alloy film and A
A laser diode having a wavelength of 650 nm was focused on the alloy film, and the reflectance of each was measured.
The reflectance from the alloy film side and the reflectance from the Al film side were 31% and 33%, respectively, satisfying the desired reflectance. Also, the same result as in Examples 3 and 4 was obtained for the reproduction signal waveform from the Al alloy film side. However, the formation of bubbles was observed in the transparent adhesive layer of this disk. this is,
This is because the surface tension of the adhesive is too high, and the wettability with the reflective film and the translucent film is poor, so that the frequency of mixing of bubbles during bonding is increased.

【００２４】比較例７ Ａｇ（ＣｕＷ）１．５ａｔ％合金ターゲットを装着し、
比較例１と同じように直径１２０ｍｍ、厚さ０．５７５
ｍｍのポリカーボネート基板の信号面に、Ａｒガス流量
５０ｓｃｃｍ、スパッタ圧力１ｍＴｏｒｒ、スパッタ電
力０．２５ｋＷ、スパッタ時間４２ｓｅｃの条件で、厚
さ１７５ÅのＡｇＣｕＷ合金膜を製膜した。製膜速度は
Ａｇ膜の場合とほぼ同じであった。この膜の結晶粒の大
きさはＸ線回折による粒径評価の結果より平均６００Å
であった。次に、公知の方法によって、ＡｇＣｕＷ膜上
に記録層を形成し、情報を記録した。 Comparative Example 7 A 1.5 at% Ag (CuW) alloy target was mounted,
120 mm in diameter and 0.575 in thickness as in Comparative Example 1.
An AgCuW alloy film having a thickness of 175 mm was formed on a signal surface of a polycarbonate substrate having a thickness of 175 mm under the conditions of an Ar gas flow rate of 50 sccm, a sputtering pressure of 1 mTorr, a sputtering power of 0.25 kW, and a sputtering time of 42 sec. The film forming speed was almost the same as that of the Ag film. The average crystal grain size of this film was 600 ° from the result of the particle size evaluation by X-ray diffraction.
Met. Next, a recording layer was formed on the AgCuW film by a known method, and information was recorded.

【００２５】このＡｇＣｕＷ合金膜が製膜されたディス
クと、比較例１と同じ方法でＡｌ膜が製膜されたディス
クを、それぞれの製膜面を内側にして２０℃における表
面張力２２ｄｙｎ・ｃｍ-1の光硬化性接着剤で２Ｐスピ
ンコート法で貼り合わせようとしたところ、光硬化性接
着剤が塗布直後に大部分の領域でＡｇＣｕＷ合金膜内部
に浸透し、その部分に大きな変色が認められた。そのた
め、これ以上のディスク作製を中断した。The disc on which the AgCuW alloy film was formed and the disc on which the Al film was formed in the same manner as in Comparative Example 1 were subjected to a surface tension of 22 dyn · cm − at 20 ° C. with the respective film forming surfaces inside. When the two photo-curable adhesives were bonded together by the 2P spin coating method, the photo-curable adhesive penetrated into the AgCuW alloy film in most areas immediately after the application, and significant discoloration was observed in those areas. Was. Therefore, further disc production was interrupted.

【００２６】比較例８ ２０℃における表面張力が２３ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例７と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ディスク外観を調査したところ、比較例７に示
したような光硬化性接着剤のＡｇＣｕＷ膜内部への浸透
に基づく変色は肉眼では観察されなかった。このディス
クについて、ＡｇＣｕＷ合金膜側からＡｇＣｕＷ合金膜
およびＡｌ合金膜に波長６５０ｎｍのレーザダイオード
の焦点を合わせ、それぞれの反射率を測定したところ、
ＡｇＣｕＷ合金膜側からの反射率、Ａｌ膜側からの反射
率は、それぞれ３１％および３３％で所望の反射率を満
足していた。しかし、オシロスコープで観察したＡｌ合
金膜からの再生信号波形は非常に不明瞭で、あった。こ
れは光硬化性接着剤が僅かではあるがＡｇＣｕＷ合金膜
中に浸透していることによる。 Comparative Example 8 The same conditions as in Comparative Example 7 were used except that the photocurable adhesive having a surface tension at 20 ° C. of 23 dyn · cm −1 was used.
Two disks were stuck together. When the disk appearance of the bonded disks was examined, no discoloration due to the permeation of the photocurable adhesive into the AgCuW film as shown in Comparative Example 7 was observed with the naked eye. With respect to this disk, a laser diode having a wavelength of 650 nm was focused on the AgCuW alloy film and the Al alloy film from the AgCuW alloy film side, and the respective reflectances were measured.
The reflectance from the AgCuW alloy film side and the reflectance from the Al film side were 31% and 33%, respectively, satisfying the desired reflectance. However, the waveform of the reproduced signal from the Al alloy film observed with an oscilloscope was very unclear. This is because the photocurable adhesive has slightly penetrated into the AgCuW alloy film.

【００２７】実施例５ ２０℃における表面張力が２４ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例７と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ＡｇＣｕＷ合金膜側からＡｇＣｕＷ合金膜およ
びＡｌ合金膜に波長６５０ｎｍのレーザダイオードの焦
点を合わせ、それぞれの反射率を測定したところ、Ａｇ
ＣｕＷ合金膜側からの反射率、Ａｌ膜側からの反射率
は、それぞれ３１％および３３％で所望の反射率を満足
していた。また、Ａｌ合金膜側からの再生信号波形も明
瞭であった。これは、光硬化性接着剤の表面張力が増加
し、光硬化性接着剤のＡｇＣｕＷ合金膜への浸透が抑え
られたことによる。 Example 5 The same procedure as in Comparative Example 7 was repeated except that the film was bonded with a photocurable adhesive having a surface tension at 20 ° C. of 24 dyn · cm −1.
Two disks were stuck together. With respect to the bonded disks, a laser diode having a wavelength of 650 nm was focused on the AgCuW alloy film and the Al alloy film from the AgCuW alloy film side, and the respective reflectances were measured.
The reflectance from the CuW alloy film side and the reflectance from the Al film side were 31% and 33%, respectively, satisfying the desired reflectance. The reproduced signal waveform from the Al alloy film side was also clear. This is because the surface tension of the photocurable adhesive was increased and the penetration of the photocurable adhesive into the AgCuW alloy film was suppressed.

【００２８】実施例６ ２０℃における表面張力が３２ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例７と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ＡｇＣｕＷ合金膜側からＡｇＣｕＷ合金膜およ
びＡｌ合金膜に波長６５０ｎｍのレーザダイオードの焦
点を合わせ、それぞれの反射率を測定したところ、Ａｇ
ＣｕＷ合金膜側からの反射率、Ａｌ膜側からの反射率
は、それぞれ３１％および３３％で所望の反射率を満足
していた。また、Ａｌ合金膜側からの再生信号波形も明
瞭であった。これは、光硬化性接着剤の表面張力が増加
し、光硬化性接着剤のＡｇＣｕＷ合金膜への浸透が抑え
られたことによる。 Example 6 The procedure of Comparative Example 7 was repeated except that the surface tension at 20 ° C. was 32 dyn · cm −1.
Two disks were stuck together. With respect to the bonded disks, a laser diode having a wavelength of 650 nm was focused on the AgCuW alloy film and the Al alloy film from the AgCuW alloy film side, and the respective reflectances were measured.
The reflectance from the CuW alloy film side and the reflectance from the Al film side were 31% and 33%, respectively, satisfying the desired reflectance. The reproduced signal waveform from the Al alloy film side was also clear. This is because the surface tension of the photocurable adhesive was increased and the penetration of the photocurable adhesive into the AgCuW alloy film was suppressed.

【００２９】実施例７ ２０℃における表面張力が３８ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例７と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ＡｇＣｕＷ合金膜側からＡｇＣｕＷ合金膜およ
びＡｌ合金膜に波長６５０ｎｍのレーザダイオードの焦
点を合わせ、それぞれの反射率を測定したところ、Ａｇ
ＣｕＷ合金膜側からの反射率、Ａｌ膜側からの反射率
は、それぞれ３１％および３３％で所望の反射率を満足
していた。また、Ａｌ合金膜側からの再生信号波形も明
瞭であった。これは、実施例３と同様に光硬化性接着剤
の表面張力が増加し、光硬化性接着剤のＡｇＣｕＷ合金
膜への浸透が抑えられたことによる。[0029] except that the surface tension in Example 7 20 ° C. was laminated photocurable adhesive 38 dyn · cm -1 in the same conditions as Comparative Example 7 2
Two disks were stuck together. With respect to the bonded disks, a laser diode having a wavelength of 650 nm was focused on the AgCuW alloy film and the Al alloy film from the AgCuW alloy film side, and the respective reflectances were measured.
The reflectance from the CuW alloy film side and the reflectance from the Al film side were 31% and 33%, respectively, satisfying the desired reflectance. The reproduced signal waveform from the Al alloy film side was also clear. This is because the surface tension of the photocurable adhesive was increased as in Example 3, and the penetration of the photocurable adhesive into the AgCuW alloy film was suppressed.

【００３０】比較例９ ２０℃における表面張力が３９ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例７と同じ条件で２
枚のディスクを貼り合わせた。貼り合わせたディスクに
ついて、ＡｇＣｕＷ合金膜側からＡｇＣｕＷ合金膜およ
びＡｌ合金膜に波長６５０ｎｍのレーザダイオードの焦
点を合わせ、それぞれの反射率を測定したところ、Ａｇ
ＣｕＷ合金膜側からの反射率、Ａｌ膜側からの反射率
は、それぞれ３１％および３３％で所望の反射率を満足
していた。また、Ａｌ合金膜側からの再生信号波形も実
施例１、実施例２と同じ結果が得られた。しかし、この
ディスクの透明接着層には泡の形成が認められた。これ
は、接着剤の表面張力が高過ぎ、反射膜および半透明膜
との濡れ性が悪く、そのために貼り合わせ時に泡の混入
頻度が高くなったためである。COMPARATIVE EXAMPLE 9 The same conditions as in Comparative Example 7 were used except that they were bonded together with a photocurable adhesive having a surface tension of 39 dyn · cm −1 at 20 ° C.
Two disks were stuck together. With respect to the bonded disks, a laser diode having a wavelength of 650 nm was focused on the AgCuW alloy film and the Al alloy film from the AgCuW alloy film side, and the respective reflectances were measured.
The reflectance from the CuW alloy film side and the reflectance from the Al film side were 31% and 33%, respectively, satisfying the desired reflectance. Also, the same result as in Examples 1 and 2 was obtained with respect to the reproduction signal waveform from the Al alloy film side. However, the formation of bubbles was observed in the transparent adhesive layer of this disk. This is because the surface tension of the adhesive is too high, and the wettability with the reflective film and the translucent film is poor, so that the frequency of mixing of bubbles during bonding is increased.

【００３１】比較例１０ Ａｇ（ＣｕＭｇ）１．５ａｔ％合金ターゲットを装着
し、比較例１と同じように直径１２０ｍｍ、厚さ０．５
７５ｍｍのポリカーボネート基板の信号面に、Ａｒガス
流量５０ｓｃｃｍ、スパッタ圧力１ｍＴｏｒｒ、スパッ
タ電力０．２５ｋＷ、スパッタ時間４２ｓｅｃの条件
で、厚さ１７５ÅのＡｇＣｕＷ合金膜を製膜した。製膜
速度はＡｇ膜の場合とほぼ同じであった。この膜の結晶
粒の大きさはＸ線回折による粒径評価の結果より平均４
５０Åであった。次に、公知の方法によって、ＡｇＣｕ
Ｍｇ膜上に記録層を形成し、情報を記録した。 Comparative Example 10 A 1.5 at% Ag (CuMg) alloy target was mounted, and the diameter was 120 mm and the thickness was 0.5 as in Comparative Example 1.
An AgCuW alloy film having a thickness of 175 ° was formed on a signal surface of a 75 mm polycarbonate substrate under the conditions of an Ar gas flow rate of 50 sccm, a sputtering pressure of 1 mTorr, a sputtering power of 0.25 kW, and a sputtering time of 42 sec. The film forming speed was almost the same as that of the Ag film. The average size of the crystal grains of this film was 4 based on the result of the particle size evaluation by X-ray diffraction.
It was 50 degrees. Next, by a known method, AgCu
A recording layer was formed on the Mg film to record information.

【００３２】このＡｇＣｕＭｇ合金膜が製膜されたディ
スクと、比較例１と同じ方法でＡｌ膜が製膜されたディ
スクを、それぞれの製膜面を内側にして２０℃における
表面張力１８ｄｙｎ・ｃｍ-1の光硬化性接着剤で２Ｐス
ピンコート法で貼り合わせようとしたところ、光硬化性
接着剤が塗布直後に大部分の領域でＡｇＣｕＷ合金膜内
部に浸透し、その部分に大きな変色が認められた。その
ため、これ以上のディスク作製を中断した。The disc on which the AgCuMg alloy film was formed and the disc on which the Al film was formed in the same manner as in Comparative Example 1 were subjected to a surface tension of 18 dyn · cm − at 20 ° C. with the respective film forming surfaces inside. When the two photo-curable adhesives were bonded together by the 2P spin coating method, the photo-curable adhesive penetrated into the AgCuW alloy film in most areas immediately after the application, and significant discoloration was observed in those areas. Was. Therefore, further disc production was interrupted.

【００３３】比較例１１ ２０℃における表面張力が１９ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１０と同じ条件で
２枚のディスクを貼り合わせた。貼り合わせたディスク
について、ディスク外観を調査したところ、比較例１０
に示したような光硬化性接着剤のＡｇＣｕＭｇ膜内部へ
の浸透に基づく変色は肉眼では観察されなかった。この
ディスクについて、ＡｇＣｕＭｇ合金膜側からＡｇＣｕ
Ｍｇ合金膜およびＡｌ合金膜に波長６５０ｎｍのレーザ
ダイオードの焦点を合わせ、それぞれの反射率を測定し
たところ、ＡｇＣｕＭｇ合金膜側からの反射率、Ａｌ膜
側からの反射率は、それぞれ３１％および３３％で所望
の反射率を満足していた。しかし、オシロスコープで観
察したＡｌ合金膜からの再生信号波形は非常に不明瞭
で、光硬化性接着剤が僅かではあるがＡｇＣｕＭｇ合金
膜中に浸透していることによる。 Comparative Example 11 Two disks were laminated under the same conditions as in Comparative Example 10 except that they were laminated with a photocurable adhesive having a surface tension at 20 ° C. of 19 dyn · cm −1 . The appearance of the bonded disc was examined, and the results were compared with those of Comparative Example 10.
The discoloration due to the penetration of the photocurable adhesive into the AgCuMg film as shown in (1) was not observed with the naked eye. For this disc, AgCuMg alloy film
A laser diode having a wavelength of 650 nm was focused on the Mg alloy film and the Al alloy film, and the respective reflectances were measured. The reflectance from the AgCuMg alloy film side and the reflectance from the Al film side were 31% and 33%, respectively. %, The desired reflectance was satisfied. However, the waveform of the reproduced signal from the Al alloy film observed with an oscilloscope is very unclear, and the photocurable adhesive is slightly penetrated into the AgCuMg alloy film.

【００３４】実施例８ ２０℃における表面張力が２０ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１０と同じ条件で
２枚のディスクを貼り合わせた。貼り合わせたディスク
について、ＡｇＣｕＭｇ合金膜側からＡｇＣｕＭｇ合金
膜およびＡｌ合金膜に波長６５０ｎｍのレーザダイオー
ドの焦点を合わせ、それぞれの反射率を測定したとこ
ろ、ＡｇＣｕＭｇ合金膜側からの反射率、Ａｌ膜側から
の反射率は、それぞれ３１％および３３％で所望の反射
率を満足していた。また、Ａｌ合金膜側からの再生信号
波形も明瞭であった。これは、光硬化性接着剤の表面張
力が増加し、光硬化性接着剤のＡｇＣｕＭｇ合金膜への
浸透が抑えられたことによる。 Example 8 Two disks were bonded together under the same conditions as in Comparative Example 10 except that they were bonded using a photocurable adhesive having a surface tension at 20 ° C. of 20 dyn · cm −1 . With respect to the bonded disks, a laser diode having a wavelength of 650 nm was focused on the AgCuMg alloy film and the Al alloy film from the AgCuMg alloy film side, and the respective reflectances were measured. The reflectance from the AgCuMg alloy film side, the Al film side , Satisfying the desired reflectance at 31% and 33%, respectively. The reproduced signal waveform from the Al alloy film side was also clear. This is because the surface tension of the photocurable adhesive increased and the penetration of the photocurable adhesive into the AgCuMg alloy film was suppressed.

【００３５】実施例９ ２０℃における表面張力が２８ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１０と同じ条件で
２枚のディスクを貼り合わせた。貼り合わせたディスク
について、ＡｇＣｕＭｇ合金膜側からＡｇＣｕＭｇ合金
膜およびＡｌ合金膜に波長６５０ｎｍのレーザダイオー
ドの焦点を合わせ、それぞれの反射率を測定したとこ
ろ、ＡｇＣｕＭｇ合金膜側からの反射率、Ａｌ膜側から
の反射率は、それぞれ３１％および３３％で所望の反射
率を満足していた。また、Ａｌ合金膜側からの再生信号
波形も明瞭であった。これは、光硬化性接着剤の表面張
力が増加し、光硬化性接着剤のＡｇＣｕＭｇ合金膜への
浸透が抑えられたことによる。 Example 9 Two disks were bonded under the same conditions as in Comparative Example 10 except that they were bonded with a photocurable adhesive having a surface tension at 20 ° C. of 28 dyn · cm −1 . With respect to the bonded disks, a laser diode having a wavelength of 650 nm was focused on the AgCuMg alloy film and the Al alloy film from the AgCuMg alloy film side, and the respective reflectances were measured. The reflectance from the AgCuMg alloy film side, the Al film side , Satisfying the desired reflectance at 31% and 33%, respectively. The reproduced signal waveform from the Al alloy film side was also clear. This is because the surface tension of the photocurable adhesive increased and the penetration of the photocurable adhesive into the AgCuMg alloy film was suppressed.

【００３６】実施例１０ ２０℃における表面張力が３２ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１０と同じ条件で
２枚のディスクを貼り合わせた。貼り合わせたディスク
について、ＡｇＣｕＭｇ合金膜側からＡｇＣｕＭｇ合金
膜およびＡｌ合金膜に波長６５０ｎｍのレーザダイオー
ドの焦点を合わせ、それぞれの反射率を測定したとこ
ろ、ＡｇＣｕＭｇ合金膜側からの反射率、Ａｌ膜側から
の反射率は、それぞれ３１％および３３％で所望の反射
率を満足していた。また、Ａｌ合金膜側からの再生信号
波形も明瞭であった。これは、光硬化性接着剤の表面張
力が増加し、光硬化性接着剤のＡｇＣｕＭｇ合金膜への
浸透が抑えられたことによる。 Example 10 Two disks were bonded together under the same conditions as in Comparative Example 10 except that they were bonded using a photocurable adhesive having a surface tension at 20 ° C. of 32 dyn · cm −1 . With respect to the bonded disks, a laser diode having a wavelength of 650 nm was focused on the AgCuMg alloy film and the Al alloy film from the AgCuMg alloy film side, and the respective reflectances were measured. The reflectance from the AgCuMg alloy film side, the Al film side , Satisfying the desired reflectance at 31% and 33%, respectively. The reproduced signal waveform from the Al alloy film side was also clear. This is because the surface tension of the photocurable adhesive increased and the penetration of the photocurable adhesive into the AgCuMg alloy film was suppressed.

【００３７】実施例１１ ２０℃における表面張力が３８ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１０と同じ条件で
２枚のディスクを貼り合わせた。貼り合わせたディスク
について、ＡｇＣｕＭｇ合金膜側からＡｇＣｕＭｇ合金
膜およびＡｌ合金膜に波長６５０ｎｍのレーザダイオー
ドの焦点を合わせ、それぞれの反射率を測定したとこ
ろ、ＡｇＣｕＷ合金膜側からの反射率、Ａｌ膜側からの
反射率は、それぞれ３１％および３３％で所望の反射率
を満足していた。また、Ａｌ合金膜側からの再生信号波
形も明瞭であった。これは、実施例３と同様に光硬化性
接着剤の表面張力が増加し、光硬化性接着剤のＡｇＣｕ
Ｍｇ合金膜への浸透が抑えられたことによる。 Example 11 Two disks were bonded under the same conditions as in Comparative Example 10 except that they were bonded using a photocurable adhesive having a surface tension at 20 ° C. of 38 dyn · cm −1 . With respect to the bonded disks, a laser diode having a wavelength of 650 nm was focused on the AgCuMg alloy film and the Al alloy film from the AgCuMg alloy film side, and the respective reflectances were measured. The reflectance from the AgCuW alloy film side, the Al film side , Satisfying the desired reflectance at 31% and 33%, respectively. The reproduced signal waveform from the Al alloy film side was also clear. This is because, as in Example 3, the surface tension of the photocurable adhesive increases, and the AgCu of the photocurable adhesive increases.
This is because the permeation into the Mg alloy film was suppressed.

【００３８】比較例１２ ２０℃における表面張力が３９ｄｙｎ・ｃｍ-1の光硬化
性接着剤で貼り合わせた以外は比較例１０と同じ条件で
２枚のディスクを貼り合わせた。貼り合わせたディスク
について、ＡｇＣｕＭｇ合金膜側からＡｇＣｕＭｇ合金
膜およびＡｌ合金膜に波長６５０ｎｍのレーザダイオー
ドの焦点を合わせ、それぞれの反射率を測定したとこ
ろ、ＡｇＣｕＭｇ合金膜側からの反射率、Ａｌ膜側から
の反射率は、それぞれ３１％および３３％で所望の反射
率を満足していた。また、Ａｌ合金膜側からの再生信号
波形も実施例１、実施例２と同じ結果が得られた。しか
し、このディスクの透明接着層には泡の形成が認められ
た。これは、接着剤の表面張力が高過ぎ、反射膜および
半透明膜との濡れ性が悪く、そのために貼り合わせ時に
泡の混入頻度が高くなったためである。 Comparative Example 12 Two disks were laminated under the same conditions as in Comparative Example 10 except that they were laminated with a photocurable adhesive having a surface tension at 20 ° C. of 39 dyn · cm −1 . With respect to the bonded disks, a laser diode having a wavelength of 650 nm was focused on the AgCuMg alloy film and the Al alloy film from the AgCuMg alloy film side, and the respective reflectances were measured. The reflectance from the AgCuMg alloy film side, the Al film side , Satisfying the desired reflectance at 31% and 33%, respectively. Also, the same result as in Examples 1 and 2 was obtained with respect to the reproduction signal waveform from the Al alloy film side. However, the formation of bubbles was observed in the transparent adhesive layer of this disk. This is because the surface tension of the adhesive is too high, and the wettability with the reflective film and the translucent film is poor, so that the frequency of mixing of bubbles during bonding is increased.

【００３９】以上の結果を図２にまとめて示す。折れ線
ＡＢＣより左では接着剤が半透明膜中に浸透し、線ＤＥ
より右では接着在中に泡が存在する。良好な結果が得ら
れるのは、折れ線ＡＢＣと線ＤＥの間の領域、すなわ
ち、半透明膜の平均結晶粒径をＹ（Å）、光硬化性透明
接着剤の硬化前の２０℃における表面張力をＸ（ｄｙｎ
・ｃｍ-1）としたとき、平均結晶粒径Ｙと表面張力Ｘの
関係が、Ｙ≦４０Ｘ−３５０、ただし２０≦Ｘ≦３８、
を満足する範囲である。なお、半透明膜として、Ｗおよ
びＭｇが単独でＡｇに添加されてもよく、Ｃｕ、Ｗ、Ｍ
ｇの３種が同時にＡｇに添加されてもよい。The above results are summarized in FIG. On the left side of the line ABC, the adhesive penetrates into the translucent film, and the line DE
On the right, bubbles are present during adhesion. Good results are obtained in the area between the broken line ABC and the line DE, that is, when the average crystal grain size of the translucent film is Y (Å), and the surface tension at 20 ° C. before the curing of the photocurable transparent adhesive. To X (dyn
· Cm -1 ), the relationship between the average crystal grain size Y and the surface tension X is Y ≦ 40X−350, where 20 ≦ X ≦ 38,
Is a range that satisfies. In addition, as a translucent film, W and Mg may be independently added to Ag, and Cu, W, M
g may be added to Ag at the same time.

【００４０】[0040]

【発明の効果】以上説明したように、本発明によれば、
半透明膜の材料としたＡｇまたはＡｇを主成分とする合
金を用い、その結晶粒の大きさに最適な表面張力を有す
る光硬化性透明接着剤を使用して２枚のディスクを貼り
合わせるので、単一波長の光で片面２層読み出し可能な
光ディスクを効率よく作製できる。As described above, according to the present invention,
Since the translucent film is made of Ag or an alloy containing Ag as a main component, and two discs are bonded to each other using a photocurable transparent adhesive having a surface tension optimal for the size of the crystal grains. In addition, it is possible to efficiently manufacture an optical disk capable of reading one layer and two layers with light of a single wavelength.

【図面の簡単な説明】[Brief description of the drawings]

【図１】片面２層読み出しディスクの構成を説明する図
である。FIG. 1 is a diagram illustrating a configuration of a single-sided, dual-layer readout disk.

【図２】本発明実施例および比較例における貼り合わせ
結果に対する結晶粒の大きさと接着剤の表面張力の影響
を示す線図である。FIG. 2 is a diagram showing the influence of the size of crystal grains and the surface tension of an adhesive on the bonding results in Examples of the present invention and Comparative Examples.

【符号の説明】[Explanation of symbols]

１、３ 透明基板 ２ 反射膜 ４ 半透明膜 ５ 光硬化性透明接着剤層 1, 3 transparent substrate 2 reflective film 4 translucent film 5 photo-curable transparent adhesive layer

Claims (4)

【特許請求の範囲】[Claims] 【請求項１】 金属反射膜を有する第１の基板と半透明
膜を有する第２の基板とを光硬化性透明接着剤によって
貼り合わせた光ディスクにおいて、前記半透明膜がＡｇ
またはＡｇを主成分とする合金からなり、その厚さが１
２５Å以上かつ２２５Å以下であることを特徴とする光
ディスク。1. An optical disk in which a first substrate having a metal reflective film and a second substrate having a translucent film are bonded with a photocurable transparent adhesive, wherein the translucent film is made of Ag.
Alternatively, it is made of an alloy containing Ag as a main component and has a thickness of 1
An optical disc characterized by being at least 25 ° and at most 225 °. 【請求項２】 前記ＡｇまたはＡｇ合金の平均結晶粒径
をＹ（Å）、前記光硬化性透明接着剤の硬化前の２０℃
における表面張力をＸ（ｄｙｎ・ｃｍ-1）としたとき、
前記平均結晶粒径Ｙと前記表面張力Ｘが以下の式を満足
することを特徴とする請求項１に記載の光ディスク。 【数１】Ｙ≦４０Ｘ−３５０ ただし、 ２０≦Ｘ≦３８2. The method according to claim 1, wherein the Ag or Ag alloy has an average crystal grain size of Y (Å), and the photocurable transparent adhesive has a temperature of 20 ° C.
Where X (dyn · cm −1 ) is the surface tension at
The optical disk according to claim 1, wherein the average crystal grain size Y and the surface tension X satisfy the following expression. [Expression 1] Y ≦ 40X−350, where 20 ≦ X ≦ 38 【請求項３】 前記Ａｇ合金がＡｇにＣｕ、Ｗ、および
Ｍｇのうちの１種以上を０．５ａｔ％〜１０ａｔ％添加
した合金であることを特徴とする請求項１または２に記
載の光ディスク。3. The optical disk according to claim 1, wherein the Ag alloy is an alloy obtained by adding at least one of Cu, W, and Mg to Ag at 0.5 at% to 10 at%. . 【請求項４】 金属反射膜を有する第１の基板と、半透
明膜を有する第２の基板とを光硬化性透明接着剤によっ
て貼り合わせて光ディスクを製造する方法において、 前記第２の基板に前記半透明膜としてＡｇまたはＡｇを
主成分とする合金からなり、厚さが１２５Å以上かつ２
２５Å以下である半透明膜を形成する工程、および前記
半透明膜の平均結晶粒径をＹ（Å）としたとき、硬化前
の２０℃における表面張力Ｘが、Ｙ≦４０Ｘ−３５０、
ただし２０≦Ｘ≦３８、を満足する光硬化性透明接着剤
によって前記第１の基板と前記第２の基板を貼り合わせ
る工程を有することを特徴とする光ディスクの製造方
法。4. A method for manufacturing an optical disk by bonding a first substrate having a metal reflective film and a second substrate having a translucent film with a photocurable transparent adhesive, wherein the second substrate is The translucent film is made of Ag or an alloy containing Ag as a main component and has a thickness of 125
A step of forming a translucent film of 25 ° or less, and assuming that the average crystal grain size of the translucent film is Y (Å), the surface tension X at 20 ° C. before curing is Y ≦ 40X−350;
However, a method of manufacturing an optical disk, comprising a step of bonding the first substrate and the second substrate with a photocurable transparent adhesive satisfying 20 ≦ X ≦ 38.
JP9103564A 1997-04-21 1997-04-21 Optical disc manufacturing method Expired - Fee Related JP3017125B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9103564A JP3017125B2 (en) 1997-04-21 1997-04-21 Optical disc manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9103564A JP3017125B2 (en) 1997-04-21 1997-04-21 Optical disc manufacturing method

Publications (2)

Publication Number Publication Date
JPH10293945A true JPH10293945A (en) 1998-11-04
JP3017125B2 JP3017125B2 (en) 2000-03-06

Family

ID=14357310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9103564A Expired - Fee Related JP3017125B2 (en) 1997-04-21 1997-04-21 Optical disc manufacturing method

Country Status (1)

Country Link
JP (1) JP3017125B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003098619A1 (en) * 2002-04-22 2003-11-27 Tdk Corporation Optical recording medium

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI368819B (en) 2003-04-18 2012-07-21 Target Technology Co Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003098619A1 (en) * 2002-04-22 2003-11-27 Tdk Corporation Optical recording medium

Also Published As

Publication number Publication date
JP3017125B2 (en) 2000-03-06

Similar Documents

Publication Publication Date Title
US5862121A (en) Double-layered information recording medium having information recording layers
US5200120A (en) Method of forming optical discs
JP2002237096A (en) Optical recording medium
US6136133A (en) Method of producing optical disc of bonded type
JPH1116214A (en) Multilayer optical disk
JP3017125B2 (en) Optical disc manufacturing method
JPH10283682A (en) Optical disk and its manufacture
JP3537701B2 (en) Optical recording medium, method for manufacturing optical recording medium, and apparatus for manufacturing optical recording medium
JPH08255376A (en) Mod and sd using integrated substrate and their manufacture
JP2982701B2 (en) Information recording medium and method of manufacturing the same
JPH09293271A (en) Double-sided optical disk and its initialization method
JPH0954985A (en) Optical disk and production of optical disk
JP4238442B2 (en) Manufacturing method of phase change type optical disk
JP2001312841A (en) Method for manufacturing optical disk and optical disk
JP3301134B2 (en) optical disk
JPH09128808A (en) Optical disk and its production
JPH11328753A (en) Production of disk recording medium
JPH10162436A (en) Optical disk
JPH05210870A (en) Optical disk substrate and its production
JPH0196839A (en) Medium for optical disk
JPS62154246A (en) Production of optical recording medium
JPH09115181A (en) Multilayered information recording medium
JP2002312980A (en) Optical recording medium, method of manufacturing the same, and target for sputtering
JP2003157587A (en) Disk for testing reproduction
JP2005078727A (en) Optical disk

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees