JPH10189419A - Apparatus and method for development - Google Patents
Apparatus and method for developmentInfo
- Publication number
- JPH10189419A JPH10189419A JP34877196A JP34877196A JPH10189419A JP H10189419 A JPH10189419 A JP H10189419A JP 34877196 A JP34877196 A JP 34877196A JP 34877196 A JP34877196 A JP 34877196A JP H10189419 A JPH10189419 A JP H10189419A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- developer
- discharge nozzle
- developing solution
- discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、基板上の感光性膜
に現像液を供給して現像処理を行う現像装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing device for performing a developing process by supplying a developing solution to a photosensitive film on a substrate.
【０００２】[0002]
【従来の技術】半導体ウエハ、液晶表示装置用ガラス基
板、フォトマスク用ガラス基板、光ディスク用基板等の
基板上に形成された感光性膜に現像処理を行うために現
像装置が用いられる。2. Description of the Related Art A developing device is used for developing a photosensitive film formed on a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask, and a substrate for an optical disk.
【０００３】例えば、回転式現像装置は、基板を水平に
保持して鉛直軸の周りで回転させる回転保持部と、基板
の表面に現像液を供給する現像液吐出ノズルとを備え
る。現像液吐出ノズルは、水平面内で回動自在に設けら
れたノズルアームの先端に取り付けられており、基板の
上方位置と待機位置との間を移動することができる。[0003] For example, a rotary developing device includes a rotation holding unit that holds a substrate horizontally and rotates it around a vertical axis, and a developer discharge nozzle that supplies a developer to the surface of the substrate. The developer discharge nozzle is attached to the tip of a nozzle arm rotatably provided in a horizontal plane, and can move between a position above the substrate and a standby position.
【０００４】現像処理時には、現像液吐出ノズルが待機
位置から基板の上方に移動した後、基板上の感光性膜に
現像液を供給する。供給された現像液は、基板の回転に
よって基板の全面に塗り広げられ、感光性膜と接触す
る。表面張力により基板上に現像液を保持した状態（液
盛り）で一定時間基板を静止させることにより感光性膜
の現像が行われる。現像液の供給が終了すると、現像液
吐出ノズルはノズルアームの回動により基板の上方から
退いた待機位置に移動する。[0004] During the developing process, the developing solution is supplied to the photosensitive film on the substrate after the developing solution discharge nozzle moves from the standby position to above the substrate. The supplied developer is spread over the entire surface of the substrate by the rotation of the substrate, and comes into contact with the photosensitive film. The development of the photosensitive film is performed by stopping the substrate for a certain period of time in a state in which the developer is held on the substrate by the surface tension (a liquid level). When the supply of the developer is completed, the developer discharge nozzle moves to a standby position retreated from above the substrate by the rotation of the nozzle arm.
【０００５】現像液吐出ノズルの吐出口付近の現像液が
大気に晒されると、現像液中の水分が蒸発して現像液の
濃度の変化や空気と接触することで変質が起こる。その
ため、現像処理を行う前に、予め待機位置で現像液吐出
ノズルの吐出口付近の現像液を吐出することにより（プ
リディスペンス処理）、現像液吐出ノズル内に供給され
ている現像液を均一化させている。When the developer near the discharge port of the developer discharge nozzle is exposed to the atmosphere, moisture in the developer evaporates and changes in the concentration of the developer or contact with air cause deterioration. Therefore, before the developing process is performed, the developer supplied in the developer discharging nozzle is made uniform by previously discharging the developer near the discharge port of the developer discharging nozzle at the standby position (pre-dispensing process). Let me.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、上記の
従来の回転式現像装置では、回転する基板に吐出開始時
の現像液が当たることにより基板上の感光性膜が大きな
衝撃を受ける。その衝撃で現像液中に気泡が生じ、感光
性膜の表面に残留する微小な気泡が現像欠陥となる場合
がある。また、吐出開始時の現像液による衝撃で感光性
膜が損傷するおそれもある。However, in the above-described conventional rotary developing device, the photosensitive film on the substrate is subjected to a large impact when the rotating substrate is exposed to the developing solution at the start of discharge. Bubbles are generated in the developer by the impact, and minute bubbles remaining on the surface of the photosensitive film may cause development defects. Further, the photosensitive film may be damaged by the impact of the developer at the start of the discharge.
【０００７】また、プリディスペンス処理の後、現像液
吐出ノズルが待機位置から基板の上方へ移動する間に、
現像液吐出ノズルの吐出口付近の現像液が空気と接触す
ることになる。そのため、吐出開始直後に基板上に供給
される現像液は、その後連続的に供給される現像液に比
べて多少変質している可能性がある。それにより、吐出
開始直後の現像液が接触する基板上に現像欠陥が発生す
るおそれがある。また、現像液が空気との接触により乾
燥し、乾燥した現像液がパーティクルとなって基板上に
付着するおそれもある。After the pre-dispensing process, while the developing solution discharge nozzle moves from the standby position to above the substrate,
The developer near the discharge port of the developer discharge nozzle comes into contact with air. Therefore, there is a possibility that the developer supplied onto the substrate immediately after the start of the discharge is slightly deteriorated in comparison with the developer continuously supplied thereafter. As a result, a development defect may be generated on the substrate that comes into contact with the developer immediately after the start of the discharge. Further, the developer may be dried by contact with air, and the dried developer may become particles and adhere to the substrate.
【０００８】さらに、基板上に滴下された現像液が遠心
力により基板の全面に塗り広げられる過程で現像液にむ
らが生じるため、基板上の現像液が均一になるまで多量
の現像液を供給する必要がある。Further, since the developing solution dropped on the substrate is uneven in the process of being spread over the entire surface of the substrate by centrifugal force, a large amount of the developing solution is supplied until the developing solution on the substrate becomes uniform. There is a need to.
【０００９】本発明の目的は、基板上の感光性膜に少量
の現像液で均一な現像処理を行うことができる現像装置
を提供することである。It is an object of the present invention to provide a developing apparatus capable of performing a uniform developing process on a photosensitive film on a substrate with a small amount of a developing solution.
【００１０】[0010]
【課題を解決するための手段および発明の効果】第１の
発明に係る現像装置は、基板を水平姿勢で保持する基板
保持手段と、現像液を吐出する現像液吐出ノズルと、基
板保持手段に静止状態で保持された基板外の一方側の移
動開始位置から基板上を通過して基板外の他方側の停止
位置まで現像液吐出ノズルを移動させる移動手段と、現
像液吐出ノズルの移動開始後に移動開始位置と基板の上
記一方側の端縁との間で現像液吐出ノズルによる現像液
の吐出を開始させる制御手段とを備えたものである。Means for Solving the Problems and Effects of the Invention A developing device according to a first aspect of the present invention comprises a substrate holding means for holding a substrate in a horizontal posture, a developing solution discharge nozzle for discharging a developing solution, and a substrate holding means. A moving means for moving the developer discharge nozzle from the movement start position on one side outside the substrate held in a stationary state to a stop position on the other side outside the substrate by passing over the substrate, and after the movement of the developer discharge nozzle is started Control means for starting the discharge of the developer by the developer discharge nozzle between the movement start position and the one side edge of the substrate.
【００１１】第１の発明に係る現像装置においては、現
像液吐出ノズルの移動開始後、現像液吐出ノズルが静止
した基板上に達する前に現像液の吐出が開始される。そ
のため、吐出開始時の現像液が基板に衝撃を与えること
が回避される。それにより、現像液中の気泡の発生が抑
制されて現像欠陥の発生が防止されるとともに、衝撃に
よる基板上の感光性膜の損傷が防止される。In the developing device according to the first aspect of the invention, the discharge of the developing solution is started after the movement of the developing solution discharging nozzle is started and before the developing solution discharging nozzle reaches the stationary substrate. Therefore, it is possible to prevent the developer at the start of the discharge from giving an impact to the substrate. This suppresses the generation of bubbles in the developing solution and prevents the occurrence of development defects, and also prevents the photosensitive film on the substrate from being damaged by impact.
【００１２】また、現像液吐出ノズルの移動中に空気に
接触する吐出口付近の現像液が基板外に廃棄され、現像
液吐出ノズルが基板上に到達した時点で現像液吐出ノズ
ルから新しい現像液が静止した基板上に供給される。そ
れにより、変質した現像液により現像欠陥が発生するこ
とが防止されるとともに、乾燥した現像液によるパーテ
ィクルが基板表面に付着することが防止される。Further, the developing solution near the discharge port which comes into contact with air during the movement of the developing solution discharging nozzle is discarded outside the substrate, and when the developing solution discharging nozzle reaches the substrate, a new developing solution is discharged from the developing solution discharging nozzle. Is supplied on a stationary substrate. This prevents development defects caused by the deteriorated developer and prevents particles of the dried developer from adhering to the substrate surface.
【００１３】さらに、現像液吐出ノズルが基板上を通過
する間、新しい現像液が連続的に供給されるので、基板
上に現像液が均一に供給される。Further, while the developing solution discharge nozzle passes over the substrate, new developing solution is continuously supplied, so that the developing solution is uniformly supplied onto the substrate.
【００１４】しかも、現像液吐出ノズルの移動開始後で
かつ基板上への到達前に現像液の吐出が開始されるの
で、現像液の無駄な消費量が少なくなり、少量の現像液
で基板上の感光性膜に均一な現像処理が行われる。In addition, since the discharge of the developing solution is started after the movement of the developing solution discharging nozzle and before the developing solution reaches the substrate, wasteful consumption of the developing solution is reduced. The photosensitive film is uniformly developed.
【００１５】第２の発明に係る現像装置は、第１の発明
に係る現像装置の構成において、現像液吐出ノズルが基
板保持手段に保持された基板上を通過した後に基板の上
記他方側の端縁と停止位置との間で制御手段が、現像液
吐出ノズルによる現像液の吐出を停止させるものであ
る。The developing device according to a second aspect of the present invention is the developing device according to the first aspect, wherein the developer discharging nozzle passes over the substrate held by the substrate holding means, and then the other end of the substrate. The control means stops the discharge of the developer by the developer discharge nozzle between the edge and the stop position.
【００１６】この場合、現像液吐出ノズルが基板上を通
り過ぎた後に現像液の吐出が停止されるので、吐出停止
時の現像液の液だれにより基板表面に衝撃が加わること
が防止されるとともに、吐出停止時の衝撃により液盛り
中の現像液へ悪影響が与えられることが防止される。そ
れにより、現像欠陥の発生および現像後の感光性膜パタ
ーンの線幅均一性の劣化が防止される。In this case, since the discharge of the developer is stopped after the developer discharge nozzle passes over the substrate, it is possible to prevent an impact on the substrate surface due to the dripping of the developer at the time of stopping the discharge. It is possible to prevent the impact at the time of stopping the discharge from adversely affecting the developer in the liquid reservoir. As a result, occurrence of development defects and deterioration of line width uniformity of the photosensitive film pattern after development are prevented.
【００１７】第３の発明に係る現像装置は、第１または
第２の発明に係る現像装置の構成において、現像液吐出
ノズルによる現像液の吐出方向が鉛直下向きから現像液
吐出ノズルの移動方向と反対方向に傾けられたものであ
る。According to a third aspect of the present invention, in the configuration of the developing device according to the first or second aspect, the direction of discharge of the developer by the developer discharge nozzle is vertically downward from the moving direction of the developer discharge nozzle. It is tilted in the opposite direction.
【００１８】この場合、基板表面において現像液吐出ノ
ズルの移動方向への現像液の流動が抑制されるととも
に、移動方向とは逆方向への現像液の流動が誘起され
る。移動方向への現像液の流動が抑制されることによ
り、現像液が現像液吐出ノズルよりも移動方向側へ先行
して流れることが防止され、現像液の均一性が向上す
る。また、移動方向とは逆方向への現像液の流動が誘起
されることにより、マイクロバブルと呼ばれる現像液中
の微小な泡が基板表面に付着することが防止され、微小
な泡の付着による現像欠陥の発生が抑制される。In this case, the flow of the developer in the direction of movement of the developer discharge nozzle on the substrate surface is suppressed, and the flow of the developer in the direction opposite to the direction of movement is induced. By suppressing the flow of the developing solution in the moving direction, the developing solution is prevented from flowing ahead of the developing solution discharge nozzle in the moving direction, and the uniformity of the developing solution is improved. In addition, since the flow of the developer in the direction opposite to the moving direction is induced, minute bubbles in the developer, called microbubbles, are prevented from adhering to the substrate surface, and the development due to the adhesion of the minute bubbles is prevented. The occurrence of defects is suppressed.
【００１９】第４の発明に係る現像装置は、第１、第２
または第３の発明に係る現像装置の構成において、現像
液吐出ノズルが、水平方向に配置されたスリット状吐出
口を有し、移動手段が、現像液吐出ノズルをスリット状
吐出口とほぼ垂直な方向に直線状に移動させるものであ
る。The developing device according to a fourth aspect of the present invention includes first and second developing devices.
Alternatively, in the configuration of the developing device according to the third aspect, the developer discharge nozzle has a slit-shaped discharge port arranged in a horizontal direction, and the moving unit moves the developer discharge nozzle substantially perpendicular to the slit-shaped discharge port. It is moved linearly in the direction.
【００２０】この場合、現像液吐出ノズルのスリット状
吐出口が基板上を直線状に走査されるので、現像液が基
板上の広い面積に均一に供給される。In this case, since the slit-shaped discharge port of the developing solution discharge nozzle is linearly scanned on the substrate, the developing solution is uniformly supplied to a large area on the substrate.
【００２１】第５の発明に係る現像装置は、第４の発明
に係る現像装置の構成において、現像液吐出ノズルが、
基板保持手段に保持された基板の上面とスリット状吐出
口との間を５ｍｍ以下の一定の距離に保ちながら基板上
を通過するものである。A developing device according to a fifth aspect of the present invention is the developing device according to the fourth aspect, wherein the developing solution discharge nozzle comprises:
It passes over the substrate while maintaining a constant distance of 5 mm or less between the upper surface of the substrate held by the substrate holding means and the slit-shaped discharge port.
【００２２】この場合、現像液吐出ノズルが静止した基
板上をスリット状吐出口と基板の上面とが近接した状態
で水平方向に移動する。それにより、スリット状吐出口
に形成された帯状の現像液が基板表面に連続的に接触す
ることになり、基板表面に衝撃が加わることなく基板の
全面に現像液が均一に供給される。In this case, the developing solution discharge nozzle moves horizontally on the stationary substrate with the slit-shaped discharge port and the upper surface of the substrate close to each other. As a result, the strip-shaped developer formed in the slit-shaped discharge port comes into continuous contact with the substrate surface, and the developer is uniformly supplied to the entire surface of the substrate without applying an impact to the substrate surface.
【００２３】第６の発明に係る現像装置は、第４または
第５の発明に係る現像装置の構成において、現像液吐出
ノズルのスリット状吐出口の長さが、基板保持手段に保
持される基板の直径以上に設定されたものである。The developing device according to a sixth aspect of the present invention is the developing device according to the fourth or fifth aspect, wherein the length of the slit-shaped discharge port of the developing solution discharge nozzle is held by the substrate holding means. Is set to be equal to or larger than the diameter of
【００２４】この場合、現像液吐出ノズルが基板の一端
部から他端部へ移動することにより、スリット状吐出口
から帯状に垂下した現像液が基板の全面に連続的に接触
する。したがって、現像液吐出ノズルの１回の走査によ
り基板の全面に現像液が均一に供給され、基板上の感光
性膜に少量の現像液により均一な現像処理が行われる。In this case, when the developing solution discharge nozzle moves from one end to the other end of the substrate, the developing solution drooping like a band from the slit-shaped discharge port continuously contacts the entire surface of the substrate. Therefore, the developer is uniformly supplied to the entire surface of the substrate by one scanning of the developer discharge nozzle, and the photosensitive film on the substrate is uniformly developed with a small amount of the developer.
【００２５】第７の発明に係る現像装置は、第４、第５
または第６の発明に係る現像装置の構成において、現像
液吐出ノズルが基板保持手段に保持された基板の上記一
方側の端縁に到達するまでにスリット状吐出口から現像
液が帯状に垂下するように制御手段が現像液吐出ノズル
による現像液の吐出を開始させるものである。The developing device according to the seventh aspect of the present invention comprises a fourth and fifth developing devices.
Alternatively, in the configuration of the developing device according to the sixth aspect, the developing solution droops from the slit-shaped discharge port in a band shape until the developing solution discharge nozzle reaches the one side edge of the substrate held by the substrate holding means. Thus, the control means starts the discharge of the developer by the developer discharge nozzle.
【００２６】この場合、現像液吐出ノズルが基板上に到
達する前にスリット状吐出口に連続的な帯状の現像液が
形成されるので、現像液吐出ノズルが基板上に到達した
時点で基板上に現像液がむらなく供給される。In this case, since the continuous strip-shaped developer is formed in the slit-shaped discharge port before the developer discharge nozzle reaches the substrate, when the developer discharge nozzle reaches the substrate, The developer is supplied evenly.
【００２７】第８の発明に係る現像方法は、基板保持手
段に保持された基板上に現像液吐出ノズルから現像液を
吐出供給するようにした現像方法であって、静止状態の
基板の一方端外から現像液吐出ノズルの移動を開始する
工程と、移動開始後、基板の一方端に到達する前に現像
液吐出ノズルから現像液の吐出を開始する工程とを備え
たものである。According to an eighth aspect of the present invention, there is provided a developing method in which a developing solution is discharged and supplied from a developing solution discharge nozzle onto a substrate held by a substrate holding means. The method includes a step of starting the movement of the developing solution discharge nozzle from the outside, and a step of starting the discharge of the developing solution from the developing solution discharge nozzle before reaching the one end of the substrate after the movement is started.
【００２８】第８の発明に係る現像方法においては、現
像液吐出ノズルの移動開始後、現像液吐出ノズルが静止
状態の基板上に到達する前に現像液の吐出が開始され
る。そのため、吐出開始時の現像液が基板に衝撃を与え
ることが回避される。それにより、現像液中の気泡の発
生が抑制されるとともに、衝撃による基板上の感光性膜
の損傷が防止される。In the developing method according to the eighth aspect of the present invention, after the movement of the developing solution discharge nozzle is started, the discharging of the developing solution is started before the developing solution discharging nozzle reaches the stationary substrate. Therefore, it is possible to prevent the developer at the start of the discharge from giving an impact to the substrate. This suppresses the generation of bubbles in the developer and prevents the photosensitive film on the substrate from being damaged by impact.
【００２９】[0029]
【発明の実施の形態】図１は本発明の一実施例における
現像装置の平面図、図２は図１の現像装置の主要部のＸ
−Ｘ線断面図、図３は図１の現像装置の主要部のＹ−Ｙ
線断面図である。FIG. 1 is a plan view of a developing device according to an embodiment of the present invention. FIG.
FIG. 3 is a sectional view taken along line X-Y of FIG.
It is a line sectional view.
【００３０】図２および図３に示すように、現像装置
は、基板１００を水平姿勢で吸引保持する基板保持部１
を備える。基板保持部１は、モータ２の回転軸３の先端
部に固定され、鉛直方向の軸の周りで回転可能に構成さ
れている。基板保持部１の周囲には、基板１００を取り
囲むように円形の内側カップ４が上下動自在に設けられ
ている。また、内側カップ４の周囲には、正方形の外側
カップ５が設けられている。As shown in FIGS. 2 and 3, the developing device includes a substrate holding section 1 for holding the substrate 100 in a horizontal posture by suction.
Is provided. The substrate holding unit 1 is fixed to a tip of a rotating shaft 3 of a motor 2 and is configured to be rotatable around a vertical axis. Around the substrate holding portion 1, a circular inner cup 4 is provided so as to freely move up and down so as to surround the substrate 100. A square outer cup 5 is provided around the inner cup 4.
【００３１】図１に示すように、外側カップ５の両側に
はそれぞれ待機ポット６，７が配置され、外側カップ５
の一方の側部側にはガイドレール８が配設されている。
また、ノズルアーム９がアーム駆動部１０によりガイド
レール８に沿って走査方向Ａおよびその逆方向に移動可
能に設けられている。外側カップ５の他方の側部側に
は、純水を吐出する純水吐出ノズル１２が矢印Ｒの方向
に回動可能に設けられている。As shown in FIG. 1, standby pots 6 and 7 are arranged on both sides of the outer cup 5, respectively.
A guide rail 8 is disposed on one side of the guide rail.
The nozzle arm 9 is provided so as to be movable in the scanning direction A and the opposite direction along the guide rail 8 by the arm driving unit 10. On the other side of the outer cup 5, a pure water discharge nozzle 12 for discharging pure water is provided rotatably in the direction of arrow R.
【００３２】ノズルアーム９には、下端部にスリット状
吐出口１５を有する現像液吐出ノズル１１がガイドレー
ル８と垂直に取り付けられている。これにより、現像液
吐出ノズル１１は、待機ポット６の位置から基板１００
上を通過して待機ポット７の位置まで走査方向Ａに沿っ
て直線状に平行移動可能となっている。図３に示すよう
に、現像液吐出ノズル１１は矢印Ｑの方向に回動可能に
構成されている。A developing solution discharge nozzle 11 having a slit-like discharge port 15 at the lower end thereof is attached to the nozzle arm 9 vertically to the guide rail 8. As a result, the developer discharge nozzle 11 moves the substrate 100 from the position of the standby pot 6.
It is possible to move in a straight line parallel along the scanning direction A to the position of the standby pot 7 after passing through the upper side. As shown in FIG. 3, the developer discharge nozzle 11 is configured to be rotatable in the direction of arrow Q.
【００３３】図２に示すように、現像液吐出ノズル１１
には、現像液供給系１２により現像液が供給される。制
御部１３は、モータ２の回転動作、アーム駆動部１０に
よる現像液吐出ノズル１１の走査および現像液吐出ノズ
ル１１からの現像液の吐出を制御する。As shown in FIG. 2, the developing solution discharge nozzle 11
Is supplied with a developer by a developer supply system 12. The control unit 13 controls the rotation operation of the motor 2, the scanning of the developer discharge nozzle 11 by the arm drive unit 10, and the discharge of the developer from the developer discharge nozzle 11.
【００３４】本実施例では、基板保持部１が基板保持手
段に相当し、アーム駆動部１０が移動手段に相当し、制
御部１３が制御手段に相当する。In this embodiment, the substrate holding unit 1 corresponds to a substrate holding unit, the arm driving unit 10 corresponds to a moving unit, and the control unit 13 corresponds to a control unit.
【００３５】図４は現像液吐出ノズル１１のスリット状
吐出口１５を示す図である。スリット状吐出口１５のス
リット幅ｔは０．０２〜０．５ｍｍであり、本実施例で
は０．１ｍｍである。また、スリット状吐出口１５の吐
出幅Ｌは処理対象となる基板１００の直径と同じかまた
はそれよりも大きく設定されている。このスリット状吐
出口１５は現像液吐出ノズル１１の走査方向Ａと垂直に
配置される。FIG. 4 is a view showing the slit-shaped discharge port 15 of the developing solution discharge nozzle 11. The slit width t of the slit-shaped discharge port 15 is 0.02 to 0.5 mm, and is 0.1 mm in this embodiment. Further, the discharge width L of the slit-shaped discharge port 15 is set to be equal to or larger than the diameter of the substrate 100 to be processed. This slit-shaped discharge port 15 is arranged perpendicular to the scanning direction A of the developer discharge nozzle 11.
【００３６】図５は現像液吐出ノズル１１による現像液
の吐出方向を示す側面図である。図５に示すように、現
像処理時には、現像液吐出ノズル１１は、現像液の吐出
方向Ｂが基板の法線方向（鉛直下向き）から走査方向Ａ
と反対側に角度α傾斜するように傾けられる。傾斜角度
αは０〜３０°の範囲内であり、本実施例では２０°に
設定される。FIG. 5 is a side view showing the direction of discharge of the developer by the developer discharge nozzle 11. As shown in FIG. 5, during the developing process, the developing solution discharge nozzle 11 changes the discharging direction B of the developing solution from the normal direction of the substrate (vertically downward) to the scanning direction A.
To the opposite side to the angle α. The inclination angle α is in the range of 0 to 30 °, and is set to 20 ° in the present embodiment.
【００３７】また、現像液吐出ノズル１１は、スリット
状吐出口１５が基板１００の上面に対して０．２〜０．
５ｍｍ、より好ましくは０．２〜１．０ｍｍの間隔を保
つように走査される。本実施例では、現像液吐出ノズル
１１のスリット状吐出口１５と基板１００の上面との間
隔が０．３±０．１ｍｍに設定される。In the developing solution discharge nozzle 11, the slit-shaped discharge port 15 has a height of 0.2 to 0.1 mm with respect to the upper surface of the substrate 100.
Scanning is performed so as to keep an interval of 5 mm, more preferably 0.2 to 1.0 mm. In the present embodiment, the distance between the slit-shaped discharge port 15 of the developer discharge nozzle 11 and the upper surface of the substrate 100 is set to 0.3 ± 0.1 mm.
【００３８】次に図６を参照しながら図１の現像装置の
動作を説明する。現像処理時には、基板１００は基板保
持部１により静止状態で保持されている。Next, the operation of the developing device of FIG. 1 will be described with reference to FIG. During the development processing, the substrate 100 is held in a stationary state by the substrate holding unit 1.
【００３９】待機時には、現像液吐出ノズル１１は、待
機ポット６内の位置Ｐ０に待機している。現像処理時に
は、現像液吐出ノズル１１が上昇した後、走査方向Ａに
移動し、外側カップ５内の走査開始位置Ｐ１で下降す
る。During standby, the developing solution discharge nozzle 11 waits at a position P0 in the standby pot 6. During the development processing, the developer discharge nozzle 11 moves up in the scanning direction A after rising, and then descends at the scanning start position P1 in the outer cup 5.
【００４０】その後、現像液吐出ノズル１１は、走査開
始位置Ｐ１から所定の走査速度で走査を開始する。この
時点では、現像液吐出ノズル１１からまだ現像液の吐出
は行わない。本実施例では、走査速度は１０〜５００ｍ
ｍ／秒とする。Thereafter, the developing solution discharge nozzle 11 starts scanning at a predetermined scanning speed from the scanning start position P1. At this time, the developer is not yet discharged from the developer discharge nozzle 11. In this embodiment, the scanning speed is 10 to 500 m
m / sec.
【００４１】現像液吐出ノズル１１の走査開始後、現像
液吐出ノズル１１のスリット状吐出口１５が基板１００
上に到達する前に、吐出開始位置Ｐ２にて所定の流量で
現像液吐出ノズル１１による現像液の吐出を開始する。
本実施例では、現像液の流量は１．５Ｌ／分とする。After the scanning of the developing solution discharge nozzle 11 is started, the slit-shaped discharge port 15 of the developing solution discharging nozzle 11
Before reaching the upper side, the discharge of the developer by the developer discharge nozzle 11 is started at a predetermined flow rate at the discharge start position P2.
In this embodiment, the flow rate of the developer is 1.5 L / min.
【００４２】現像液吐出ノズル１１は、現像液を吐出し
ながら吐出開始位置Ｐ２から基板１００上を走査方向Ａ
に直線状に移動する。これにより、基板１００の全面に
現像液が連続的に供給される。供給された現像液は、表
面張力により基板１００上に保持される。The developing solution discharge nozzle 11 scans the substrate 100 in the scanning direction A from the discharging start position P2 while discharging the developing solution.
To move linearly. Thus, the developer is continuously supplied to the entire surface of the substrate 100. The supplied developer is held on the substrate 100 by surface tension.
【００４３】現像液吐出ノズル１１が基板１００上を通
過した後、基板１００上から外れた吐出停止位置Ｐ３で
現像液吐出ノズル１１による現像液の吐出を停止させ
る。そして、現像液吐出ノズル１１が外側カップ５内の
走査停止位置Ｐ４に到達した時点で現像液吐出ノズル１
１の走査を停止させる。After the developer discharge nozzle 11 has passed over the substrate 100, the discharge of the developer by the developer discharge nozzle 11 is stopped at the discharge stop position P3 off the substrate 100. When the developer discharge nozzle 11 reaches the scan stop position P4 in the outer cup 5, the developer discharge nozzle 1
1 is stopped.
【００４４】その後、現像液吐出ノズル１１は、走査停
止位置Ｐ４で上昇した後、他方の待機ポット７の位置Ｐ
５まで移動し、待機ポット７内に下降する。Thereafter, the developer discharge nozzle 11 moves up at the scanning stop position P4, and then moves to the position P of the other standby pot 7.
5 and descends into the standby pot 7.
【００４５】基板１００上に現像液が供給された状態を
一定時間維持し、現像を進行させる。このとき、モータ
２により基板保持部１を回転駆動し、基板１００を回転
させてもよい。その後、純水吐出ノズル１２により純水
を基板１００上に供給しながら基板１００を高速回転さ
せることにより基板１００上の現像液を振り切り、基板
１００を乾燥させて現像処理を終了する。The state in which the developing solution is supplied onto the substrate 100 is maintained for a certain period of time, and the development proceeds. At this time, the substrate 2 may be rotated by the motor 2 to rotate the substrate 100. Thereafter, the developing solution on the substrate 100 is shaken off by rotating the substrate 100 at a high speed while supplying pure water onto the substrate 100 by the pure water discharge nozzle 12, and the substrate 100 is dried to complete the developing process.
【００４６】図７は現像液吐出ノズル１１からの現像液
の吐出状態を示す正面図である。現像液の吐出直後に
は、図７（ａ）に示すように、現像液がスリット状吐出
口１５から滴状に滲み出る。現像液の吐出から一定時間
が経過すると、図７（ｂ）に示すように、滴状の現像液
がつながってスリット状吐出口１５に沿って現像液が帯
状に形成される。FIG. 7 is a front view showing a state in which the developing solution is discharged from the developing solution discharge nozzle 11. Immediately after the discharge of the developer, as shown in FIG. After a predetermined time has elapsed from the discharge of the developer, the developer in the form of a strip is connected to form a strip along the slit-shaped discharge port 15 as shown in FIG. 7B.
【００４７】上記の走査開始位置Ｐ１は、現像液吐出ノ
ズル１１が走査開始から基板１００の端縁に到達するま
でに走査速度が所定の速度に達し、かつ図７（ｂ）に示
すようにスリット状吐出口１５の現像液が帯状になるた
めの時間が確保されるように設定する。例えば、走査開
始位置Ｐ１は、基板１００の端縁から走査方向Ａと反対
方向に１０〜１００ｍｍ程度離れた位置に設定する。本
実施例では、走査開始位置Ｐ１は基板１００の端縁から
５０ｍｍ離れた位置に設定する。The scanning start position P1 is set such that the scanning speed reaches a predetermined speed from the start of the scanning of the developing solution discharge nozzle 11 to the edge of the substrate 100, and the slit as shown in FIG. It is set so that the time for the developer in the shape discharge port 15 to be strip-shaped is secured. For example, the scanning start position P1 is set at a position away from the edge of the substrate 100 by about 10 to 100 mm in a direction opposite to the scanning direction A. In this embodiment, the scanning start position P1 is set at a position 50 mm away from the edge of the substrate 100.
【００４８】また、吐出開始位置Ｐ２は、現像液吐出ノ
ズル１１の走査速度および現像液の吐出流量に応じて、
現像液吐出ノズル１１が基板１００の端縁に到達するま
でに現像液の吐出状態が帯状になるための時間が確保さ
れるように設定する。The discharge start position P2 is determined according to the scanning speed of the developing solution discharging nozzle 11 and the discharging flow rate of the developing solution.
The setting is made so that the time required for the discharge state of the developer to be in a band shape is secured before the developer discharge nozzle 11 reaches the edge of the substrate 100.
【００４９】走査速度が速くなれば、現像液吐出ノズル
１１が走査開始位置Ｐ１から基板１００の端縁に到達す
るまでの時間が短くなるため、吐出開始位置Ｐ２を走査
開始位置Ｐ１に近づける。例えば、走査速度が１００ｍ
ｍ／秒の場合には走査開始時点から０．３秒後に現像液
の吐出を開始し、走査速度が３０ｍｍ／秒の場合には走
査開始時点から１．３秒後に現像液の吐出を開始する。When the scanning speed is increased, the time required for the developing solution discharge nozzle 11 to reach the edge of the substrate 100 from the scanning start position P1 is shortened. Therefore, the discharge start position P2 is made closer to the scanning start position P1. For example, if the scanning speed is 100m
In the case of m / sec, the discharge of the developing solution is started 0.3 seconds after the start of scanning, and when the scanning speed is 30 mm / sec, the discharge of the developing solution is started 1.3 seconds after the start of scanning. .
【００５０】また、現像液の吐出流量が多い場合には、
現像液の吐出状態が短時間で帯状になるので、吐出開始
位置Ｐ２を基板１００の端縁に近づける。例えば、現像
液の吐出流量が１．５Ｌ／分であり、走査速度が７０ｍ
ｍ／秒のときには、現像液吐出ノズル１１が基板１００
の端縁に到達する０．１〜１．０秒（例えば０．２秒）
前に現像液の吐出を開始する。When the discharge flow rate of the developing solution is large,
Since the discharge state of the developer becomes a strip in a short time, the discharge start position P2 is made closer to the edge of the substrate 100. For example, the discharge flow rate of the developer is 1.5 L / min, and the scanning speed is 70 m.
m / sec, the developer discharge nozzle 11
0.1-1.0 seconds (eg 0.2 seconds) to reach the edge of
Before starting the discharge of the developing solution.
【００５１】なお、現像液の無駄な消費量を低減するた
めには、現像液吐出ノズル１１が基板１００の端縁に達
するまでに現像液の吐出状態が帯状になる範囲で、吐出
開始位置Ｐ２を基板１００の端縁に近づけることが望ま
しい。In order to reduce the wasteful consumption of the developer, the discharge start position P2 is set within a range in which the discharge state of the developer is in a band shape before the developer discharge nozzle 11 reaches the edge of the substrate 100. Is desirably close to the edge of the substrate 100.
【００５２】図８は基板１００上での現像液吐出ノズル
１１の走査を示す側面図である。上記のように現像液の
吐出方向が鉛直下向きから走査方向Ａと反対方向に傾け
られているので、基板１００の表面において走査方向Ａ
への現像液の流動が抑制されるとともに、走査方向Ａと
は逆方向への現像液の流動が誘起される。走査方向Ａへ
の現像液の流動が抑制されることにより、現像液が現像
液吐出ノズル１１よりも走査方向Ａの側へ先行して流れ
ることが防止され、現像の均一性が向上する。走査方向
Ａとは逆方向への現像液の流動が誘起されることによ
り、マイクロバブルと呼ばれる現像液中の微小な泡が基
板１００上の感光性膜の表面に付着することが防止さ
れ、現像欠陥の発生が抑制される。FIG. 8 is a side view showing scanning of the developing solution discharge nozzle 11 on the substrate 100. As described above, since the discharge direction of the developer is inclined downward from the vertical direction in the direction opposite to the scanning direction A, the scanning direction A
And the flow of the developer in the direction opposite to the scanning direction A is induced. By suppressing the flow of the developer in the scanning direction A, the developer is prevented from flowing ahead of the developer discharge nozzle 11 in the scanning direction A, and the uniformity of development is improved. By inducing the flow of the developing solution in the direction opposite to the scanning direction A, fine bubbles in the developing solution called microbubbles are prevented from adhering to the surface of the photosensitive film on the substrate 100, and The occurrence of defects is suppressed.
【００５３】本実施例の現像装置では、現像液吐出ノズ
ル１１が静止した基板１００上に到達する前に現像液の
吐出が開始されるので、吐出開始時の現像液が基板１０
０に衝撃を与えることが回避される。それにより、現像
液中の気泡の発生が抑制され、現像欠陥の発生が防止さ
れる。In the developing device of the present embodiment, the discharge of the developing solution is started before the developing solution discharging nozzle 11 reaches the stationary substrate 100.
The impact on zero is avoided. Thereby, generation of bubbles in the developer is suppressed, and generation of development defects is prevented.
【００５４】また、現像液吐出ノズル１１の移動中に空
気に接触するスリット状吐出口１５付近の現像液が基板
１００外に廃棄され、現像液吐出ノズル１１が基板１０
０上に到達した時点で現像液吐出ノズル１１から新しい
現像液が静止した基板１００上に供給される。それによ
り、変質した現像液により現像欠陥が発生することが防
止されるとともに、乾燥した現像液によるパーティクル
が基板１００上の感光性膜の表面に付着することが防止
される。Further, while the developing solution discharge nozzle 11 is moving, the developing solution near the slit-shaped discharge port 15 which comes into contact with air is discarded outside the substrate 100, and the developing solution discharging nozzle 11
At the time when the developer reaches 0, a new developer is supplied from the developer discharge nozzle 11 onto the stationary substrate 100. This prevents development defects caused by the deteriorated developer and prevents particles of the dried developer from adhering to the surface of the photosensitive film on the substrate 100.
【００５５】さらに、現像液吐出ノズル１１が静止した
基板１００上をスリット状吐出口１５と基板１００の上
面とが近接した状態で水平方向に直線状に平行移動し、
スリット状吐出口１５に形成された帯状の現像液が基板
１００の表面に連続的に接触するので、基板１００の表
面に衝撃が加わることなく基板１００の全面に現像液が
均一に供給される。Further, the developing solution discharge nozzle 11 is horizontally and linearly moved in parallel with the slit-shaped discharge port 15 and the upper surface of the substrate 100 on the substrate 100 on which the developer discharge nozzle 11 is stationary.
Since the strip-shaped developer formed in the slit-shaped discharge port 15 continuously contacts the surface of the substrate 100, the developer is uniformly supplied to the entire surface of the substrate 100 without applying an impact to the surface of the substrate 100.
【００５６】また、現像液吐出ノズル１１が基板１００
上を通過するまで現像液の供給が続けられるので、吐出
停止時の衝撃による液盛り中の現像液への悪影響が防止
される。その結果、現像欠陥の発生が抑制されるととも
に、現像後の感光性膜パターンの線幅均一性が向上す
る。Further, the developing solution discharge nozzle 11 is
Since the supply of the developer is continued until the developer passes above, an adverse effect on the developer in the liquid pool due to the impact at the time of stopping the discharge is prevented. As a result, the occurrence of development defects is suppressed, and the line width uniformity of the photosensitive film pattern after development is improved.
【００５７】また、現像液吐出ノズル１１が基板１００
上を通り過ぎた後に現像液の吐出が停止されるので、吐
出停止時の現像液の液だれにより基板１００上の感光性
膜に衝撃が加わることが防止される。したがって、現像
欠陥の発生や感光性膜パターンの線幅均一性の劣化が防
止される。Further, the developing solution discharge nozzle 11 is
Since the discharge of the developer is stopped after passing over, the impact of the dripping of the developer at the time of stopping the discharge on the photosensitive film on the substrate 100 is prevented. Therefore, occurrence of development defects and deterioration of line width uniformity of the photosensitive film pattern are prevented.
【００５８】さらに、現像液の吐出方向が走査方向Ａと
反対方向に傾けられているので、基板１００の表面での
走査方向Ａへの現像液の流動が抑制されるとともに、走
査方向Ａとは逆方向への現像液の流動が誘起される。そ
れにより、現像の均一性が向上し、かつ現像欠陥の発生
が防止される。Further, since the discharge direction of the developer is inclined in the direction opposite to the scanning direction A, the flow of the developer in the scanning direction A on the surface of the substrate 100 is suppressed, and The flow of the developer in the opposite direction is induced. Thereby, the uniformity of development is improved, and the occurrence of development defects is prevented.
【図１】本発明の一実施例における現像装置の平面図で
ある。FIG. 1 is a plan view of a developing device according to an embodiment of the present invention.
【図２】図１の現像装置の主要部のＸ−Ｘ線断面図であ
る。FIG. 2 is a sectional view taken along line XX of a main part of the developing device of FIG.
【図３】図１の現像装置の主要部のＹ−Ｙ線断面図であ
る。FIG. 3 is a sectional view taken along line YY of a main part of the developing device of FIG.
【図４】現像液吐出ノズルのスリット状吐出口を示す図
である。FIG. 4 is a diagram showing a slit-shaped discharge port of a developer discharge nozzle.
【図５】現像液吐出ノズルによる現像液の吐出方向を示
す側面図である。FIG. 5 is a side view illustrating a direction in which a developer is discharged by a developer discharge nozzle.
【図６】図１の現像装置の動作を説明するための図であ
る。FIG. 6 is a view for explaining the operation of the developing device of FIG. 1;
【図７】現像液吐出ノズルからの現像液の吐出状態を示
す正面図である。FIG. 7 is a front view showing a state of discharge of a developer from a developer discharge nozzle.
【図８】基板上での現像液吐出ノズルの走査を示す側面
図である。FIG. 8 is a side view showing scanning of a developing solution discharge nozzle on a substrate.
１ 基板保持部 ４ 内側カップ ５ 外側カップ ６，７ 待機スポット ８ ガイドレール ９ ノズルアーム １０ ノズル駆動部 １１ 現像液吐出ノズル １２ 現像液供給系 １３ 制御部 １５ スリット状吐出口 DESCRIPTION OF SYMBOLS 1 Substrate holding | maintenance part 4 Inner cup 5 Outer cup 6,7 Standby spot 8 Guide rail 9 Nozzle arm 10 Nozzle drive part 11 Developer discharge nozzle 12 Developer supply system 13 Control part 15 Slit discharge port
【手続補正書】[Procedure amendment]
【提出日】平成９年４月２８日[Submission date] April 28, 1997
【手続補正１】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００３７[Correction target item name] 0037
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【００３７】また、現像液吐出ノズル１１は、スリット
状吐出口１５が基板１００の上面に対して０．２〜５ｍ
ｍ、より好ましくは０．２〜１．０ｍｍの間隔を保つよ
うに走査される。本実施例では、現像液吐出ノズル１１
のスリット状吐出口１５と基板１００の上面との間隔が
０．３±０．１ｍｍに設定される。Further, in the developing solution discharge nozzle 11, the slit-shaped discharge port 15 has a height of 0.2 to 5 m with respect to the upper surface of the substrate 100.
m, more preferably 0.2 to 1.0 mm. In this embodiment, the developer discharge nozzle 11
The distance between the slit-shaped discharge port 15 and the upper surface of the substrate 100 is set to 0.3 ± 0.1 mm.
Claims (8)
と、 現像液を吐出する現像液吐出ノズルと、 前記基板保持手段に静止状態で保持された基板外の一方
側の移動開始位置から前記基板上を通過して前記基板外
の他方側の停止位置まで前記現像液吐出ノズルを移動さ
せる移動手段と、 前記現像液吐出ノズルの移動開始後に前記移動開始位置
と前記基板の前記一方側の端縁との間で前記現像液吐出
ノズルによる現像液の吐出を開始させる制御手段とを備
えたことを特徴とする現像装置。1. A substrate holding means for holding a substrate in a horizontal posture; a developing solution discharge nozzle for discharging a developing solution; and a moving start position on one side outside the substrate held stationary by the substrate holding means. Moving means for moving the developing solution discharge nozzle to a stop position on the other side outside the substrate by passing over the substrate; and a moving start position and the one end of the substrate after the developing solution discharge nozzle starts moving. Control means for starting the discharge of the developing solution by the developing solution discharge nozzle between the developing device and the edge.
が前記基板保持手段に保持された基板上を通過した後に
前記基板の前記他方側の端縁と前記停止位置との間で前
記現像液吐出ノズルによる現像液の吐出を停止させるこ
とを特徴とする請求項１記載の現像装置。2. The control device according to claim 1, wherein the developing solution discharge nozzle passes over the substrate held by the substrate holding device, and the developing solution discharge nozzle moves between the other edge of the substrate and the stop position. 2. The developing device according to claim 1, wherein the discharge of the developer by the discharge nozzle is stopped.
出方向が鉛直下向きから前記現像液吐出ノズルの移動方
向と反対方向に傾けられたことを特徴とする請求項１ま
たは２記載の現像装置。3. The developing device according to claim 1, wherein a direction of discharge of the developer by the developer discharge nozzle is inclined from a vertically downward direction to a direction opposite to a moving direction of the developer discharge nozzle.
置されたスリット状吐出口を有し、前記移動手段は、前
記現像液吐出ノズルを前記スリット状吐出口とほぼ垂直
な方向に直線状に移動させることを特徴とする請求項
１、２または３記載の現像装置。4. The developing solution discharge nozzle has a slit-like discharge port arranged in a horizontal direction, and the moving means linearly moves the developing solution discharge nozzle in a direction substantially perpendicular to the slit-like discharge port. 4. The developing device according to claim 1, wherein the developing device is moved.
手段に保持された基板の上面と前記スリット状吐出口と
の間を５ｍｍ以下の一定の距離に保ちながら前記基板上
を通過することを特徴とする請求項４記載の現像装置。5. The developing solution discharge nozzle passes over the substrate while maintaining a constant distance of 5 mm or less between the upper surface of the substrate held by the substrate holding means and the slit-shaped discharge port. The developing device according to claim 4, wherein:
吐出口の長さは、前記基板保持手段に保持される基板の
直径以上に設定されたことを特徴とする請求項４または
５記載の現像装置。6. The developing device according to claim 4, wherein a length of the slit-shaped discharge port of the developing solution discharge nozzle is set to be equal to or larger than a diameter of a substrate held by the substrate holding means. apparatus.
が前記基板保持手段に保持された基板の前記一方側の端
縁に到達するまでに前記スリット状吐出口から現像液が
帯状に垂下するように前記現像液吐出ノズルによる現像
液の吐出を開始させることを特徴とする請求項４、５ま
たは６記載の現像装置。7. The control means, wherein the developer is dripped from the slit-shaped discharge port in a strip shape until the developer discharge nozzle reaches the one side edge of the substrate held by the substrate holding means. 7. The developing device according to claim 4, wherein the discharge of the developer by the developer discharge nozzle is started.
液吐出ノズルから現像液を吐出供給するようにした現像
方法であって、 静止状態の基板の一方端外から前記現像液吐出ノズルの
移動を開始する工程と、 移動開始後、前記基板の一方端に到達する前に前記現像
液吐出ノズルから現像液の吐出を開始する工程とを備え
る現像方法。8. A developing method wherein a developing solution is discharged and supplied from a developing solution discharging nozzle onto a substrate held by a substrate holding means, wherein the developing solution discharging nozzle is supplied from outside one end of a stationary substrate. A developing method, comprising: starting the movement; and starting discharging the developer from the developer discharge nozzle before reaching the one end of the substrate after the start of the movement.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34877196A JP3471547B2 (en) | 1996-12-26 | 1996-12-26 | Developing device and developing method |
| KR1019970067468A KR100283442B1 (en) | 1996-12-26 | 1997-12-10 | Developing apparatus and developing method |
| US08/997,083 US5984540A (en) | 1996-12-26 | 1997-12-23 | Developing apparatus and developing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34877196A JP3471547B2 (en) | 1996-12-26 | 1996-12-26 | Developing device and developing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10189419A true JPH10189419A (en) | 1998-07-21 |
| JP3471547B2 JP3471547B2 (en) | 2003-12-02 |
Family
ID=18399259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34877196A Expired - Fee Related JP3471547B2 (en) | 1996-12-26 | 1996-12-26 | Developing device and developing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3471547B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6076979A (en) * | 1997-07-25 | 2000-06-20 | Dainippon Screen Mfg. Co., Ltd. | Method of and apparatus for supplying developing solution onto substrate |
| JP2002035666A (en) * | 2000-07-28 | 2002-02-05 | Dainippon Printing Co Ltd | Coater and coating method |
| US6742944B2 (en) | 2001-05-14 | 2004-06-01 | Kabushiki Kaisha Toshiba | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method |
-
1996
- 1996-12-26 JP JP34877196A patent/JP3471547B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6076979A (en) * | 1997-07-25 | 2000-06-20 | Dainippon Screen Mfg. Co., Ltd. | Method of and apparatus for supplying developing solution onto substrate |
| JP2002035666A (en) * | 2000-07-28 | 2002-02-05 | Dainippon Printing Co Ltd | Coater and coating method |
| US6742944B2 (en) | 2001-05-14 | 2004-06-01 | Kabushiki Kaisha Toshiba | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method |
| US7097960B2 (en) | 2001-05-14 | 2006-08-29 | Kabushiki Kaisha Toshiba | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method |
| US7399578B2 (en) | 2001-05-14 | 2008-07-15 | Kabushiki Kaisha Toshiba | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3471547B2 (en) | 2003-12-02 |
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