JPH10186342A - Cleaning device for substrate - Google Patents
Cleaning device for substrateInfo
- Publication number
- JPH10186342A JPH10186342A JP34604396A JP34604396A JPH10186342A JP H10186342 A JPH10186342 A JP H10186342A JP 34604396 A JP34604396 A JP 34604396A JP 34604396 A JP34604396 A JP 34604396A JP H10186342 A JPH10186342 A JP H10186342A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning liquid
- cleaning
- pipe
- substrate
- liq
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Liquid Crystal (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、基板の洗浄装置に
係り、特に液晶表示素子を製造するためのガラス基板を
薬液等で処理した後、薬液やその他の汚れを洗浄する装
置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for cleaning a substrate, and more particularly to an apparatus for cleaning a glass substrate for manufacturing a liquid crystal display element with a chemical solution or the like, and then removing the chemical solution or other stains.
【０００２】[0002]
【従来の技術】一般に液晶表示素子は、透明電極と液晶
分子配向層とを備えた２枚のガラス等の基板の間に液晶
層を挟持した構造を有しており、軽量、低消費電力の特
徴を生かして、テレビジョン用あるいはＯＡ用ディスプ
レイとして各種分野で利用されている。そして、このよ
うな液晶表示素子の製造においては、ガラス基板を有機
溶剤等の薬液で処理した後、界面活性剤のような洗浄剤
を含む洗浄液を吹付けて洗浄し、ガラス基板の表面に付
着した油脂やその他の有機物、ゴミ等の汚れを除去する
ことが行われている。2. Description of the Related Art In general, a liquid crystal display device has a structure in which a liquid crystal layer is sandwiched between two substrates, such as glass, provided with a transparent electrode and a liquid crystal molecular alignment layer, and is light in weight and low in power consumption. Utilizing the features, it is used in various fields as a display for television or OA. In the production of such a liquid crystal display device, a glass substrate is treated with a chemical solution such as an organic solvent, and then washed by spraying a cleaning solution containing a detergent such as a surfactant, and adhered to the surface of the glass substrate. 2. Description of the Related Art Removal of stains such as oils and fats, other organic substances, and trash is performed.
【０００３】従来からの基板の洗浄装置を、図３に示
す。この洗浄装置は、薬液処理等がなされたガラス基板
１に洗浄液を吹付ける吹付け機構２を備えた洗浄槽３
と、この洗浄槽３内の下部に配置された洗浄液受け部４
と、一端が洗浄液受け部４に接続され、使用済みの洗浄
液を洗浄槽３から排出する洗浄液排出配管５とから成
り、洗浄液排出配管５は中間部で分岐され、分岐配管６
は分岐部５ａがＹ字状をなすように上方から連結されて
いる。また、洗浄液排出配管５の分岐部５ａより下流に
は、タイマー７により開閉が制御される洗浄液排出バル
ブ８が配設されており、洗浄液排出配管５を流れる使用
済み洗浄液の流路が、タイマー７からの信号により分岐
配管６と排出配管５の本管５ｂのいずれかの方向に切替
えられるようになっている。すなわち、洗浄開始から一
定時間は洗浄液排出バルブ８が閉じられており、洗浄液
排出配管５を流れる使用済みの洗浄液は、分岐部５ａを
通って分岐配管６に流れ込み、洗浄液として再使用され
るようになっている。また一定時間経過後は、タイマー
７からの信号により洗浄液排出バルブ８が開かれ、使用
済み洗浄液は排出配管５の本管５ｂを通り廃液等として
処理されるようになっている。なお、図中符号９は、洗
浄槽３の吹付け機構２への洗浄液の供給配管を示し、こ
の洗浄液供給配管９の中間部にもタイマー７付きの洗浄
液供給バルブ１０が配設され、タイマー７からの信号に
より洗浄槽３への洗浄液の供給が制御されるようになっ
ている。また、破線で示した部分は、使用済み洗浄液を
洗浄液として再び使用するための循環機構を示し、符号
１１は使用済み洗浄液槽、１２はポンプ、１３は使用済
み洗浄液の供給配管をそれぞれ示す。また、符号１４は
使用済み洗浄液の供給配管１３に介挿された供給バルブ
を示す。FIG. 3 shows a conventional substrate cleaning apparatus. This cleaning apparatus includes a cleaning tank 3 having a spraying mechanism 2 for spraying a cleaning liquid onto a glass substrate 1 on which a chemical solution treatment or the like has been performed.
And a cleaning liquid receiving portion 4 disposed at a lower portion in the cleaning tank 3.
And a cleaning liquid discharge pipe 5 having one end connected to the cleaning liquid receiving section 4 and discharging used cleaning liquid from the cleaning tank 3. The cleaning liquid discharge pipe 5 is branched at an intermediate portion, and a branch pipe 6 is provided.
Are connected from above so that the branch portion 5a forms a Y-shape. A cleaning liquid discharge valve 8 whose opening and closing is controlled by a timer 7 is provided downstream of the branching portion 5 a of the cleaning liquid discharge pipe 5, and the flow path of the used cleaning liquid flowing through the cleaning liquid discharge pipe 5 is controlled by the timer 7. Is switched to any one of the branch pipe 6 and the main pipe 5b of the discharge pipe 5. That is, the cleaning liquid discharge valve 8 is closed for a certain time from the start of cleaning, and the used cleaning liquid flowing through the cleaning liquid discharge pipe 5 flows into the branch pipe 6 through the branch portion 5a, and is reused as the cleaning liquid. Has become. After a certain period of time, the cleaning liquid discharge valve 8 is opened by a signal from the timer 7, and the used cleaning liquid passes through the main pipe 5b of the discharge pipe 5 and is treated as waste liquid or the like. Reference numeral 9 in the figure denotes a supply pipe for supplying the cleaning liquid to the spraying mechanism 2 of the cleaning tank 3. A cleaning liquid supply valve 10 with a timer 7 is also provided at an intermediate portion of the cleaning liquid supply pipe 9. The supply of the cleaning liquid to the cleaning tank 3 is controlled by a signal from the controller. Further, the portions shown by broken lines indicate a circulation mechanism for reusing the used cleaning liquid as the cleaning liquid, reference numeral 11 indicates a used cleaning liquid tank, reference numeral 12 indicates a pump, and reference numeral 13 indicates a supply pipe for the used cleaning liquid. Reference numeral 14 denotes a supply valve inserted into the supply pipe 13 for the used cleaning liquid.
【０００４】[0004]
【発明が解決しようとする課題】しかし、このような従
来の洗浄装置においては、洗浄液受け部４が、内底面が
平らで液が滞留しやすい平皿状を呈しているため、使用
済み洗浄液が洗浄液受け部４内で滞留し、連続的に生じ
た含有成分の濃度の異なる使用済み洗浄液が互いに混合
しやすかった。そして、このような使用済み洗浄液が、
タイマー７により開閉が制御された洗浄液排出バルブ８
により、洗浄液として再使用されるかあるいは廃液等と
して処理されるかの流路の切替えがなされるようになっ
ているので、洗浄剤等の濃度が高く実際に洗浄液として
再使用可能な洗浄液と、そうでない洗浄液とを、確実に
分別して切替えることができなかった。また、洗浄液排
出配管５が洗浄液排出バルブ８より上流の位置でＹ字状
に分岐されているので、洗浄液排出バルブ８の開閉切替
え時に、使用済み洗浄液の一部が、洗浄液排出バルブ８
と分岐部５ａとの間の洗浄液排出配管５内や分岐配管６
の分岐部５ａ近傍に滞留しやすかった。However, in such a conventional cleaning apparatus, since the cleaning liquid receiving portion 4 has the shape of a flat plate with a flat inner bottom surface and the liquid easily stays therein, the used cleaning liquid is used as the cleaning liquid. The used cleaning liquids which stayed in the receiving portion 4 and were continuously formed and having different concentrations of the contained components were easily mixed with each other. And such used cleaning liquid is
Cleaning liquid discharge valve 8 whose opening and closing are controlled by timer 7
Thus, since the flow path is switched between being reused as a cleaning liquid or being treated as a waste liquid, etc., a cleaning liquid having a high concentration of a cleaning agent or the like, which can be actually reused as a cleaning liquid, It was not possible to reliably separate and switch from the other washing liquid. Further, since the cleaning liquid discharge pipe 5 is branched in a Y-shape at a position upstream of the cleaning liquid discharge valve 8, when the cleaning liquid discharge valve 8 is switched between open and closed, a part of the used cleaning liquid is removed from the cleaning liquid discharge valve 8.
Of the cleaning liquid discharge pipe 5 and the branch pipe 6 between the
In the vicinity of the branch portion 5a.
【０００５】したがって、洗浄に要する時間が長くなる
ばかりでなく、使用される洗浄液の量や廃液等として処
理される排出液の量が多くなるという問題があった。Therefore, there is a problem that not only the time required for cleaning becomes long, but also the amount of used cleaning liquid and the amount of discharged liquid treated as waste liquid increase.
【０００６】本発明はこのような問題を解決するために
なされたもので、使用済み洗浄液についての正確な分別
と切替えがなされ、洗浄液量および排出液量を低減し洗
浄時間の短縮を図ることができる基板の洗浄装置を提供
することを目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve such a problem, and it is possible to accurately sort and switch used cleaning liquids, to reduce the amount of cleaning liquid and the amount of discharged liquid, and to shorten the cleaning time. An object of the present invention is to provide an apparatus for cleaning a substrate that can be used.
【０００７】[0007]
【課題を解決するための手段】本発明の基板の洗浄装置
は、基板に洗浄液を吹付けて洗浄する洗浄槽と、中間部
において２つに分岐された、前記洗浄槽から使用済みの
洗浄液を排出する配管と、該配管に介挿されたバルブ機
構とを備え、前記バルブ機構により、前記使用済み洗浄
液の流路を２つの分岐された流路のいずれかに切替える
ように構成された基板の洗浄装置において、前記洗浄槽
内の下部に、下向きに傾斜した傾斜面から成る洗浄液受
け部を配設し、該受け部の底部に前記使用済み洗浄液の
排出配管を接続するとともに、この排出配管の分岐部
に、該配管内を流れる洗浄液中の所定成分の濃度により
開閉が制御されるように構成された制御バルブを配設し
てなることを特徴とする。According to the present invention, there is provided an apparatus for cleaning a substrate, comprising: a cleaning tank for spraying a cleaning liquid onto a substrate to clean the substrate; A pipe for discharging, and a valve mechanism interposed in the pipe, wherein the valve mechanism switches the flow path of the used cleaning liquid to one of two branched flow paths. In the cleaning device, a cleaning liquid receiving portion having a downwardly inclined surface is provided at a lower portion in the cleaning tank, and a drain pipe of the used cleaning liquid is connected to a bottom portion of the receiving portion. A control valve configured to control opening and closing by a concentration of a predetermined component in a cleaning liquid flowing in the pipe is provided in the branch portion.
【０００８】本発明の洗浄装置においては、中央部に向
かう複数の下向き傾斜面から成る洗浄液受け部が洗浄槽
内に配設されているので、この受け部により洗浄使用済
みの洗浄液を効率的に集め、かつ滞留させることなく排
出することができる。そのため、連続的に生じる使用済
み洗浄液を、できるだけ混合することなく速やかに排出
配管へ送り込むことができる。In the cleaning apparatus of the present invention, since the cleaning liquid receiving portion composed of a plurality of downwardly inclined surfaces toward the center is disposed in the cleaning tank, the cleaning liquid used for cleaning can be efficiently used by the receiving portion. It can be collected and discharged without stagnation. Therefore, the continuously used used cleaning liquid can be quickly sent to the discharge pipe without mixing as much as possible.
【０００９】また、排出配管の中間分岐部にバルブが配
設され、配管内を流れる使用済み洗浄液中の洗浄剤等の
濃度に基づいて、バルブの開閉が自動的に制御され、使
用済み洗浄液が洗浄液として再使用されるかあるいは廃
液等として処理されるかの流路の切替えがなされるの
で、洗浄剤等の濃度が高く洗浄液として再使用可能な洗
浄液を適確に分別して再使用することができる。したが
って、使用される洗浄液の量および廃液処理される排出
液量を低減することができるうえに、洗浄に要する時間
を短縮することができる。A valve is provided at an intermediate branch of the discharge pipe, and the opening and closing of the valve is automatically controlled based on the concentration of a cleaning agent or the like in the used cleaning liquid flowing in the pipe, so that the used cleaning liquid is removed. Since the flow path is switched between being reused as a cleaning liquid and being treated as a waste liquid, it is possible to accurately separate and reuse a cleaning liquid having a high concentration of a cleaning agent or the like and a reusable cleaning liquid. it can. Therefore, it is possible to reduce the amount of the cleaning liquid used and the amount of the discharged liquid subjected to the waste liquid treatment, and to shorten the time required for the cleaning.
【００１０】[0010]
【発明の実施の形態】以下、本発明の実施例を図面に基
づいて説明する。Embodiments of the present invention will be described below with reference to the drawings.
【００１１】図１は、本発明の基板の洗浄装置の一実施
例を概略的に示す図である。FIG. 1 is a diagram schematically showing an embodiment of a substrate cleaning apparatus according to the present invention.
【００１２】図において、符号１５は、洗浄剤を含む洗
浄液を噴出する吹付け機構１６を備えた洗浄槽を示し、
薬液処理槽１７において薬液による洗浄処理等がなされ
たガラス基板１８は、この洗浄槽１５内を水平方向に連
続的に進行し、吹付け機構１６により洗浄液を吹付けら
れて、付着した薬液等を洗浄除去されるようになってい
る。そして、この洗浄槽１５内の下部には、以下に示す
形状を有する洗浄液受け部１９が配置されており、洗浄
液受け部１９の底部に使用済みの洗浄液を洗浄槽１５か
ら排出する洗浄液排出配管２０が接続されている。すな
わち、洗浄液受け部１９は、中央部に向って下向きに傾
斜がつけられた２つの傾斜面から成る凹形の受け部材１
９ａとその上方に両側の傾斜面に跨って配置された上向
き傘形のガイド部材１９ｂとから構成され、洗浄液排出
配管２０の端部が凹形受け部材１９ａの中央部を貫通し
て接続されている。In the drawing, reference numeral 15 denotes a cleaning tank provided with a spraying mechanism 16 for jetting a cleaning liquid containing a cleaning agent.
The glass substrate 18 which has been subjected to the cleaning treatment with the chemical in the chemical treatment tank 17 continuously advances in the cleaning tank 15 in the horizontal direction, and the cleaning liquid is sprayed by the spray mechanism 16 to remove the adhered chemical and the like. It is designed to be cleaned and removed. A cleaning liquid receiving portion 19 having the following shape is disposed in the lower portion of the cleaning tank 15. A cleaning liquid discharge pipe 20 for discharging used cleaning liquid from the cleaning tank 15 is provided at the bottom of the cleaning liquid receiving portion 19. Is connected. In other words, the cleaning liquid receiving portion 19 is a concave receiving member 1 composed of two inclined surfaces inclined downward toward the center.
9a and an upwardly-facing umbrella-shaped guide member 19b disposed above the inclined surfaces on both sides thereof, and the end of the cleaning liquid discharge pipe 20 is connected through the center of the concave receiving member 19a. I have.
【００１３】また、洗浄液排出配管２０は、中間部にお
いて廃液処理用配管２１と再使用配管２２とに逆Ｙ字状
に分岐され、かつこの分岐部の直ぐ上流において、洗浄
液中の洗浄剤の濃度が濃度測定器２３により測定される
ようになっている。そして、洗浄液排出配管２０の分岐
部に、濃度測定器２３からの信号により開閉動作が制御
される制御バルブ２４が介挿されており、洗浄液排出配
管２０内を流れる使用済み洗浄液の流路が、液中の洗浄
剤の濃度により、廃液処理用配管２１の方向あるいは再
使用配管２２の方向のいずれかに切替えられるように構
成されている。A cleaning liquid discharge pipe 20 is branched in an intermediate portion into a waste liquid treatment pipe 21 and a reuse pipe 22 in an inverted Y-shape, and immediately upstream of the branch, the concentration of the cleaning agent in the cleaning liquid is determined. Is measured by the concentration measuring device 23. A control valve 24 whose opening and closing operation is controlled by a signal from the concentration measuring device 23 is interposed at a branch portion of the cleaning liquid discharge pipe 20, and a flow path of the used cleaning liquid flowing through the cleaning liquid discharge pipe 20 is provided. Depending on the concentration of the cleaning agent in the liquid, the direction of the waste liquid treatment pipe 21 or the direction of the reuse pipe 22 can be switched.
【００１４】さらに、吹付け機構１６に洗浄液を供給す
る洗浄液供給配管２５に、洗浄液供給バルブ２６が介挿
されており、このバルブの開閉も濃度測定器２３により
制御されるようになっている。なお、図中破線で示した
部分は、使用済み洗浄液の再使用のための循環機構を示
し、符号２７は使用済み洗浄液槽、２８はポンプ、２９
は使用済み洗浄液供給配管、３０は使用済み洗浄液供給
バルブをそれぞれ示す。Further, a cleaning liquid supply valve 26 is interposed in the cleaning liquid supply pipe 25 for supplying the cleaning liquid to the spray mechanism 16, and the opening and closing of this valve is controlled by the concentration measuring device 23. In the drawing, the part shown by the broken line indicates a circulation mechanism for reusing the used cleaning liquid, reference numeral 27 denotes a used cleaning liquid tank, 28 denotes a pump, 29
Denotes a used cleaning liquid supply pipe, and 30 denotes a used cleaning liquid supply valve.
【００１５】このような構造の実施例の洗浄装置におい
て、ガラス基板１８を洗浄した後の洗浄液は、ガイド部
材１９ｂの傾斜面に沿って落下して凹形受け部材１９ａ
の下向き傾斜面上に達し、中央の谷部に効率的に集めら
れた後、この中央谷部に接続された洗浄液排出配管２０
に送り込まれ、この配管内で濃度測定器２３により液中
の洗浄剤の濃度が測定される。そして、洗浄剤の濃度が
予め設定された濃度を越える十分大きな値を保っている
場合は、濃度測定器２３から制御バルブ２４へ、再使用
配管２２への流路を開く信号が出される。またこのと
き、濃度測定器２３から洗浄液供給バルブ２６へ、流路
を閉じる信号が出される。そして、Ａ部を拡大した図２
に示すように、濃度測定器２３からの信号により、制御
バルブ２４の開閉弁２４ａが、廃液処理用配管２１の流
入口を閉じ再使用配管２２の流入口を開く動作を行な
い、その結果使用済み洗浄液は、再使用配管２２を通り
使用済み洗浄液槽２７を経て洗浄液供給配管２５内に供
給され、洗浄液として再び使用される。またこのとき、
洗浄液供給配管２５の洗浄液供給バルブ２６は閉じられ
ているので、新しい洗浄液の供給はなく、使用済み洗浄
液のみが吹付け機構１６に供給される。In the cleaning apparatus of the embodiment having such a structure, the cleaning liquid after cleaning the glass substrate 18 falls along the inclined surface of the guide member 19b and falls into the concave receiving member 19a.
Reaches the downward slope and is efficiently collected in the central valley, and then connected to the central valley.
The concentration of the cleaning agent in the liquid is measured by the concentration measuring device 23 in this pipe. Then, when the concentration of the cleaning agent is maintained at a sufficiently large value exceeding the preset concentration, a signal for opening the flow path to the reuse pipe 22 is output from the concentration measuring device 23 to the control valve 24. At this time, a signal for closing the flow path is output from the concentration measuring device 23 to the cleaning liquid supply valve 26. FIG. 2 is an enlarged view of part A.
As shown in (2), the signal from the concentration measuring device 23 causes the on-off valve 24a of the control valve 24 to perform the operation of closing the inflow port of the waste liquid treatment pipe 21 and opening the inflow port of the reuse pipe 22, and as a result, The cleaning liquid is supplied to the cleaning liquid supply pipe 25 through the used cleaning liquid tank 27 through the reuse pipe 22, and is used again as the cleaning liquid. At this time,
Since the cleaning liquid supply valve 26 of the cleaning liquid supply pipe 25 is closed, no new cleaning liquid is supplied, and only the used cleaning liquid is supplied to the spray mechanism 16.
【００１６】そして、このような使用済み洗浄液の再使
用により、その中の洗浄剤の濃度が設定された濃度以下
になると、それを測定検出した濃度測定器２３により制
御バルブ２４に信号が出される。そしてこの信号によ
り、制御バルブ２４の開閉弁２４ａが、廃液処理用配管
２１への流路を開き再使用配管２２への流路を閉じる動
作を行ない、その結果洗浄液排出配管２０内を流れる使
用済み洗浄液は、廃液処理用配管２１を通り廃液等とし
て処理される。またこのとき、濃度測定器２３から洗浄
液供給バルブ２６にも信号が出され、この信号により洗
浄液供給バルブ２６が開放されて、新しい洗浄液が洗浄
液供給配管２５を通って吹付け機構１６に供給される。When the concentration of the cleaning agent in the used cleaning solution becomes lower than the set concentration due to the reuse of the used cleaning solution, a signal is output to the control valve 24 by the concentration measuring device 23 which has measured and detected the concentration. . In response to this signal, the on-off valve 24a of the control valve 24 performs an operation of opening the flow path to the waste liquid treatment pipe 21 and closing the flow path to the reuse pipe 22. As a result, the used liquid flowing in the cleaning liquid discharge pipe 20 is used. The cleaning liquid passes through the waste liquid treatment pipe 21 and is treated as waste liquid or the like. At this time, a signal is also output from the concentration measuring device 23 to the cleaning liquid supply valve 26, and the cleaning liquid supply valve 26 is opened by this signal, and a new cleaning liquid is supplied to the spray mechanism 16 through the cleaning liquid supply pipe 25. .
【００１７】このように構成される実施例の洗浄装置に
よれば、ガラス基板１８を洗浄した後の使用済み洗浄液
を、上向き傘形のガイド部材１９ｂと凹形の受け部材１
９ａとにより効率的に集め、かつ受け部材１９ａ内で滞
留させることなく速やかに洗浄液排出配管２０に送り込
むことができる。According to the cleaning apparatus of the embodiment configured as described above, the used cleaning liquid after cleaning the glass substrate 18 is supplied to the upwardly umbrella-shaped guide member 19b and the concave receiving member 1.
9a and can be efficiently sent to the cleaning liquid discharge pipe 20 without stagnation in the receiving member 19a.
【００１８】また、洗浄液排出配管２０の分岐部に、濃
度測定器２３からの信号により開閉動作が制御される制
御バルブ２４が介挿され、洗浄液排出配管２０内を流れ
る使用済み洗浄液が、液中の洗浄剤の濃度に基づいて廃
液処理あるいは再使用のいずれかの方向に流されるよう
になっているので、再使用可能な洗浄液を適確に分別
し、廃棄することなく有効に再使用することができる。
さらに、洗浄液排出配管２０の分岐部が逆Ｙ字状を呈し
ているので、流路の切替えの際に、配管内に使用済み洗
浄液が滞留することがない。A control valve 24 whose opening and closing operation is controlled by a signal from a concentration measuring device 23 is interposed at a branch portion of the cleaning liquid discharge pipe 20 so that the used cleaning liquid flowing through the cleaning liquid discharge pipe 20 is supplied to the inside of the liquid. It is designed to flow in either direction of waste liquid treatment or reuse based on the concentration of the cleaning agent, so that the reusable cleaning solution should be properly separated and reused effectively without disposal. Can be.
Further, since the branch portion of the cleaning liquid discharge pipe 20 has an inverted Y-shape, the used cleaning liquid does not stay in the pipe when the flow path is switched.
【００１９】したがって、洗浄液量および処理される排
出液量を低減することができるうえに、洗浄に要する時
間を大幅に短縮することができる。Therefore, the amount of cleaning liquid and the amount of discharged liquid to be processed can be reduced, and the time required for cleaning can be greatly reduced.
【００２０】[0020]
【発明の効果】以上説明したように本発明の基板の洗浄
装置によれば、基板を洗浄した後の使用済み洗浄液を、
洗浄剤のような所定の成分の液中の濃度によって、再使
用あるいは廃液処理の方向に流路を切替えて排出するこ
とができ、洗浄液量および排出液量を低減し洗浄に要す
る時間を短縮することができる。As described above, according to the substrate cleaning apparatus of the present invention, the used cleaning liquid after cleaning the substrate is
Depending on the concentration of a predetermined component such as a cleaning agent in the liquid, the flow path can be switched and discharged in the direction of reuse or waste liquid treatment, thereby reducing the amount of cleaning liquid and the amount of discharged liquid and shortening the time required for cleaning. be able to.
【図１】本発明の基板の洗浄装置の一実施例を概略的に
示す図。FIG. 1 is a view schematically showing an embodiment of a substrate cleaning apparatus of the present invention.
【図２】同実施例の洗浄装置の一部を拡大して示す図。FIG. 2 is an enlarged view showing a part of the cleaning apparatus of the embodiment.
【図３】従来からの基板の洗浄装置を概略的に示す図。FIG. 3 is a diagram schematically showing a conventional substrate cleaning apparatus.
１５………洗浄槽 １６………吹付け機構 １８………ガラス基板 １９………洗浄液受け部 ２０………洗浄液排出配管 ２３………濃度測定器 ２４………制御バルブ ２５………洗浄液供給配管 ２６………洗浄液供給バルブ 15 cleaning tank 16 spraying mechanism 18 glass substrate 19 cleaning liquid receiving section 20 cleaning liquid discharge pipe 23 concentration measuring instrument 24 control valve 25 Cleaning liquid supply pipe 26 ... Cleaning liquid supply valve
Claims (2)
と、中間部において２つに分岐された、前記洗浄槽から
使用済みの洗浄液を排出する配管と、該配管に介挿され
たバルブ機構とを備え、前記バルブ機構により、前記使
用済み洗浄液の流路を２つの分岐された流路のいずれか
に切替えるように構成された基板の洗浄装置において、 前記洗浄槽内の下部に、下向きに傾斜した傾斜面から成
る洗浄液受け部を配設し、該受け部の底部に前記使用済
み洗浄液の排出配管を接続するとともに、この排出配管
の分岐部に、該配管内を流れる洗浄液中の所定成分の濃
度により開閉が制御されるように構成された制御バルブ
を配設してなることを特徴とする基板の洗浄装置。1. A cleaning tank for spraying a cleaning liquid onto a substrate to wash the substrate, a pipe for discharging used cleaning liquid from the cleaning tank, which is branched into two in an intermediate portion, and a valve interposed in the pipe. A cleaning mechanism for the substrate, wherein the valve mechanism switches the flow path of the used cleaning liquid to one of two branched flow paths. A cleaning liquid receiving portion having an inclined surface is disposed, and a drain pipe for the used cleaning liquid is connected to the bottom of the receiving portion. A predetermined portion of the cleaning liquid flowing through the pipe is connected to a branch portion of the discharging pipe. An apparatus for cleaning a substrate, comprising: a control valve configured to control opening and closing according to a concentration of a component.
部が逆Ｙ字状をなすように、分岐配管が下方から連結さ
れていることを特徴とする請求項１記載の基板の洗浄装
置。2. The apparatus for cleaning a substrate according to claim 1, wherein the branch pipe is connected from below at a branch part of the discharge pipe such that the branch part forms an inverted Y-shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34604396A JPH10186342A (en) | 1996-12-25 | 1996-12-25 | Cleaning device for substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34604396A JPH10186342A (en) | 1996-12-25 | 1996-12-25 | Cleaning device for substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10186342A true JPH10186342A (en) | 1998-07-14 |
Family
ID=18380756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34604396A Withdrawn JPH10186342A (en) | 1996-12-25 | 1996-12-25 | Cleaning device for substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10186342A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1299334C (en) * | 2003-03-12 | 2007-02-07 | 大日本屏影象制造株式会社 | Placode treating method and treater |
| KR20160094275A (en) * | 2015-01-30 | 2016-08-09 | 도쿄엘렉트론가부시키가이샤 | Substrate liquid processing apparatus, substrate liquid processing method, and computer-readable storage medium having substrate liquid processing program stored therein |
| CN108862738A (en) * | 2018-08-17 | 2018-11-23 | 重庆工业职业技术学院 | Sewage disposal system |
| JP2019160953A (en) * | 2018-03-12 | 2019-09-19 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing apparatus and substrate processing method |
-
1996
- 1996-12-25 JP JP34604396A patent/JPH10186342A/en not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1299334C (en) * | 2003-03-12 | 2007-02-07 | 大日本屏影象制造株式会社 | Placode treating method and treater |
| KR20160094275A (en) * | 2015-01-30 | 2016-08-09 | 도쿄엘렉트론가부시키가이샤 | Substrate liquid processing apparatus, substrate liquid processing method, and computer-readable storage medium having substrate liquid processing program stored therein |
| KR20180084020A (en) * | 2015-01-30 | 2018-07-24 | 도쿄엘렉트론가부시키가이샤 | Substrate liquid processing apparatus, substrate liquid processing method, and computer-readable storage medium having substrate liquid processing program stored therein |
| KR20190059881A (en) * | 2015-01-30 | 2019-05-31 | 도쿄엘렉트론가부시키가이샤 | Substrate liquid processing apparatus, substrate liquid processing method, and computer-readable storage medium having substrate liquid processing program stored therein |
| JP2019160953A (en) * | 2018-03-12 | 2019-09-19 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing apparatus and substrate processing method |
| CN108862738A (en) * | 2018-08-17 | 2018-11-23 | 重庆工业职业技术学院 | Sewage disposal system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20040302 |