JPH10111240A - Apparatus for measuring spectral reflectance - Google Patents
Apparatus for measuring spectral reflectanceInfo
- Publication number
- JPH10111240A JPH10111240A JP26282896A JP26282896A JPH10111240A JP H10111240 A JPH10111240 A JP H10111240A JP 26282896 A JP26282896 A JP 26282896A JP 26282896 A JP26282896 A JP 26282896A JP H10111240 A JPH10111240 A JP H10111240A
- Authority
- JP
- Japan
- Prior art keywords
- spectral reflectance
- sample surface
- spectral
- light
- measurement sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、物質の特定や膜厚
測定などのために、ミラーなどの光学部品、半導体基板
や液晶基板、コーティング処理物などの被測定物の測定
試料面の分光反射率を測定する分光反射率測定装置に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spectroscopic reflection of an object to be measured such as an optical component such as a mirror, a semiconductor substrate or a liquid crystal substrate, or a coating material, for specifying a substance or measuring a film thickness. The present invention relates to a spectral reflectance measuring device for measuring a reflectance.
【０００２】[0002]
【従来の技術】上述のような、表面処理が施された被測
定物の分光反射率のデータを得る装置として、従来、特
公平７−３３６５号公報に示されるような顕微分光装置
があった。2. Description of the Related Art As a device for obtaining the spectral reflectance data of an object to be measured which has been subjected to a surface treatment as described above, there has heretofore been a microspectroscope as disclosed in Japanese Patent Publication No. 7-3365. .
【０００３】このような従来の顕微分光装置によれば、
被測定物の上方において、被測定物の測定試料面の所望
箇所を測定するように顕微鏡光学系を移動し、その顕微
鏡光学系を構成する顕微鏡対物レンズを被測定物に対向
させて分光反射率を測定するように構成されている。According to such a conventional microspectroscope,
The microscope optical system is moved above the DUT so as to measure a desired portion of the measurement sample surface of the DUT, and a microscope objective lens constituting the microscope optical system is opposed to the DUT to obtain a spectral reflectance. Is configured to measure
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、上述の
ような装置では、被測定物の測定試料面の所望の１点に
対物レンズのピントを合わせて測定するものであるため
に、被測定領域に比べて光学系が大きなものになる。ま
た、被測定物の測定試料面に対して二次元方向でのデー
タを得ようとすると、光学系または被測定物を二次元方
向に移動させ、多数の点で測定しなければならず、測定
を迅速に行えないという欠点があった。However, in the apparatus described above, the objective lens is focused on a desired point on the measurement sample surface of the object to be measured. The optical system becomes larger in comparison. In addition, when trying to obtain data in two dimensions with respect to the measurement sample surface of the object to be measured, the optical system or the object to be measured must be moved in two dimensions and measured at many points. Has not been able to be performed quickly.
【０００５】このため、例えば、半導体業界で膜厚測定
のために上述の装置を用いるような場合、通常は１枚の
半導体ウエハに対して数点から高々数十点程度の測定で
済まさざるを得ず、二次元方向に分散した不連続の代表
点のデータしか得られず、分光反射率データの局所的な
変化を見逃しやすいという欠点があった。For this reason, for example, when the above-described apparatus is used for measuring the film thickness in the semiconductor industry, it is usually necessary to measure several to at most several tens of points for one semiconductor wafer. However, there is a disadvantage that only data of discontinuous representative points dispersed in the two-dimensional direction can be obtained, and a local change in the spectral reflectance data is easily overlooked.
【０００６】本発明は、このような事情に鑑みてなされ
たものであって、分光反射率を迅速にかつ精度良く測定
できるようにすることを目的とする。The present invention has been made in view of such circumstances, and has as its object to enable the spectral reflectance to be measured quickly and accurately.
【０００７】[0007]
【課題を解決するための手段】請求項１に記載した発明
の分光反射率測定装置は、上述のような目的を達成する
ために、計測光を発する光源と、前記光源からの計測光
を測定試料面に到達させる照明光学系と、前記測定試料
面からの反射光を結像させる結像光学系と、前記測定試
料面からの反射光を分光する分光手段と、結像された分
光画像を撮影する撮像手段と、前記分光画像に基づいて
分光反射率を測定する分光反射率測定手段と、を備えた
分光反射率測定装置において、前記分光手段を、前記結
像光学系と前記分光反射率測定手段との間に設けて前記
測定試料面の二次元領域から前記分光反射率測定手段に
到達する透過反射光の波長を変更する透過波長可変フィ
ルターで構成する。According to a first aspect of the present invention, there is provided a spectral reflectance measuring apparatus for measuring a measuring light from a light source which emits a measuring light to achieve the above object. An illumination optical system that reaches the sample surface, an imaging optical system that forms an image of the reflected light from the measurement sample surface, a spectral unit that splits the reflected light from the measurement sample surface, and a spectral image that is formed. In a spectral reflectance measuring apparatus comprising: an imaging unit for photographing; and a spectral reflectance measuring unit for measuring a spectral reflectance based on the spectral image, the spectral unit includes the imaging optical system and the spectral reflectance. A transmission wavelength variable filter is provided between the two-dimensional area of the surface of the measurement sample and the wavelength of the transmitted reflected light that reaches the spectral reflectance measurement means.
【０００８】また、請求項２に記載した発明の分光反射
率測定装置は、上述のような目的を達成するために、計
測光を発する光源と、前記光源からの計測光を測定試料
面に到達させる照明光学系と、前記測定試料面からの反
射光を結像させる結像光学系と、前記測定試料面からの
反射光を分光する分光手段と、結像された分光画像を撮
影する撮像手段と、前記分光画像に基づいて分光反射率
を測定する分光反射率測定手段と、を備えた分光反射率
測定装置において、前記分光手段を、前記結像光学系と
前記分光反射率測定手段との間に設けて前記測定試料面
の一直線状の領域からの反射光を分光して取り込む一次
元スリットで構成し、前記測定試料面と前記一次元スリ
ットとを、前記測定試料面の面に平行でかつ前記一次元
スリットの長手方向に直交する方向に相対移動する移動
手段を設けて構成する。According to another aspect of the present invention, there is provided a spectral reflectance measuring apparatus, comprising: a light source for emitting measuring light; and a measuring light from the light source reaching a measuring sample surface. An illumination optical system, an imaging optical system that forms an image of the reflected light from the measurement sample surface, a spectral unit that splits the reflected light from the measurement sample surface, and an imaging unit that captures the formed spectral image And a spectral reflectance measurement device that measures spectral reflectance based on the spectral image, wherein the spectral reflectance measuring device includes: an imaging optical system; and a spectral reflectance measuring device. A one-dimensional slit is provided between the two to form a one-dimensional slit for spectrally capturing reflected light from a linear region of the measurement sample surface, and the measurement sample surface and the one-dimensional slit are parallel to the surface of the measurement sample surface. And the longitudinal direction of the one-dimensional slit Constituting provided moving means for relatively moving in a direction perpendicular to.
【０００９】そして、請求項３に記載した発明の分光反
射率測定装置は、請求項２に記載した発明の分光反射率
測定装置における結像光学系と一次元スリットと撮像手
段とを、測定試料面の面に平行な方向で、かつ、前記一
次元スリットの長手方向に複数個並設するとともに、前
記一次元スリットの長手方向に直交する方向視におい
て、隣り合う前記一次元スリットの長手方向の端部を重
複させるように構成する。According to a third aspect of the present invention, there is provided a spectral reflectance measuring apparatus, wherein the imaging optical system, the one-dimensional slit, and the image pickup means in the spectral reflectance measuring apparatus according to the second aspect of the present invention are used as a measurement sample. In a direction parallel to the plane of the surface, and a plurality of juxtaposed in the longitudinal direction of the one-dimensional slit, when viewed in a direction perpendicular to the longitudinal direction of the one-dimensional slit, the longitudinal direction of the adjacent one-dimensional slit The ends are configured to overlap.
【００１０】[0010]
【作用】請求項１に記載した発明の分光反射率測定装置
の構成によれば、測定試料面の二次元領域からの反射光
に対し、透過波長可変フィルターにより複数種の波長の
反射光を選択して分光反射率測定手段に到達させ、各波
長ごとの分光画像を撮像手段で撮影し、その測定試料面
の二次元領域の分光画像に基づいて分光反射率を測定す
ることができる。According to the configuration of the spectral reflectance measuring apparatus of the present invention, the reflected light from the two-dimensional area on the surface of the measurement sample is selected from the reflected light of plural wavelengths by the transmission wavelength variable filter. Then, the light reaches the spectral reflectance measuring means, a spectral image for each wavelength is captured by the imaging means, and the spectral reflectance can be measured based on the spectral image of the two-dimensional area of the measurement sample surface.
【００１１】また、請求項２に記載した発明の分光反射
率測定装置の構成によれば、測定試料面の一直線状の領
域からの反射光を一次元スリットにより分光し、その分
光された一直線状の領域からの反射光の分光画像を撮像
手段で撮影し、更に、移動手段により、上述一直線状の
領域に直交する方向に移動させ、間欠的に同様に分光さ
れた一直線状の領域からの反射光の分光画像を撮像手段
で撮影し、全体として二次元領域からの分光された反射
光の分光画像を得る。これらの分光画像に基づいて測定
試料面の二次元領域の分光反射率を測定することができ
る。Further, according to the configuration of the spectral reflectance measuring apparatus of the present invention, the reflected light from the linear region of the measurement sample surface is separated by the one-dimensional slit, and the split linear light is measured. The spectral image of the reflected light from the area is photographed by the imaging means, and further moved by the moving means in a direction orthogonal to the linear area, and the reflected light from the linear area intermittently similarly dispersed is obtained. A spectral image of light is photographed by the imaging means, and a spectral image of reflected light that is spectrally reflected from the two-dimensional region as a whole is obtained. Based on these spectral images, it is possible to measure the spectral reflectance of a two-dimensional area on the measurement sample surface.
【００１２】また、請求項３に記載した発明の分光反射
率測定装置の構成によれば、測定試料面が大きい場合に
は、結像光学系と一次元スリットと撮像手段の個数を多
くし、一方、測定試料面が小さい場合には個数を少なく
し、測定試料面の大きさに容易に対応することができ
る。Further, according to the configuration of the spectral reflectance measuring apparatus of the present invention, when the surface of the sample to be measured is large, the number of the imaging optical system, the one-dimensional slit, and the number of the imaging means is increased. On the other hand, when the measurement sample surface is small, the number can be reduced, and the size of the measurement sample surface can be easily accommodated.
【００１３】[0013]
【発明の実施の形態】次に、本発明の実施例を図面を用
いて詳細に説明する。図１は、本発明に係る第１実施例
の分光反射率測定装置の全体側面図、図２は要部の構成
図である。図１に示すように、基台１に立設された支柱
２に、第１のステージ３ａと第２のステージ３ｂとから
成るＸ−Ｙステージ３を介してケーシング４が水平方向
に移動可能に支持されている。Next, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is an overall side view of a spectral reflectance measuring apparatus according to a first embodiment of the present invention, and FIG. 2 is a configuration diagram of a main part. As shown in FIG. 1, a casing 4 is horizontally movable on a support 2 erected on a base 1 via an XY stage 3 including a first stage 3a and a second stage 3b. Supported.
【００１４】ケーシング４内には、図２に示すように、
計測光を発する光源５と、第１の凸レンズ６と、開口絞
り７と、視野絞り８と、第２の凸レンズ９と、ハーフミ
ラー（ビームスプリッタも含む）１０と、第３の絞り１
１と対物レンズ１２とが備えられ、光源５からの計測光
を基板などの被測定物１３の測定試料面Ｓの所定の二次
元領域に照射するように構成されている。In the casing 4, as shown in FIG.
A light source 5 that emits measurement light, a first convex lens 6, an aperture stop 7, a field stop 8, a second convex lens 9, a half mirror (including a beam splitter) 10, and a third stop 1
1 and an objective lens 12 are provided, and are configured to irradiate measurement light from the light source 5 to a predetermined two-dimensional area of the measurement sample surface S of the measurement target 13 such as a substrate.
【００１５】また、ケーシング４内には、分光画像を撮
影するＣＣＤカメラ１４と、対物レンズ１２およびハー
フミラー１０を通った測定試料面Ｓからの反射光を絞り
１７上に結像する第３の凸レンズ１５と、分光画像に基
づいて分光反射率を測定する分光反射率測定手段１６と
が備えられている。絞り１７は、被測定物１３の測定試
料面Ｓからの測定しようとする反射光のみを通過させ、
不要な部分から入射される光をカットできるようになっ
ている。In the casing 4, a CCD camera 14 for photographing a spectral image and a third light for forming an image of the reflected light from the measurement sample surface S passing through the objective lens 12 and the half mirror 10 on a diaphragm 17 are formed. A convex lens 15 and spectral reflectance measuring means 16 for measuring spectral reflectance based on a spectral image are provided. The diaphragm 17 allows only the reflected light to be measured from the measurement sample surface S of the DUT 13 to pass,
Light incident from unnecessary portions can be cut.
【００１６】前記絞り１７とＣＣＤカメラ１４の撮像面
との間に、分光手段としての透過波長可変フィルター１
８および絞り１７上の像をＣＣＤカメラ１４の撮像面に
結像させる光学系（図示せず）が設けられ、測定試料面
Ｓの二次元領域から分光反射率測定手段１６に到達する
透過反射光の波長を変更するように構成されている。な
お、第１の凸レンズ６、第２の凸レンズ９、対物レンズ
１２、第３の凸レンズ１５は、それぞれ１枚のレンズで
示されているが、複数枚のレンズで構成されることもあ
る。Between the stop 17 and the image pickup surface of the CCD camera 14, the transmission wavelength variable filter 1
An optical system (not shown) for forming an image on the aperture 8 and the aperture 17 on the imaging surface of the CCD camera 14 is provided, and transmitted and reflected light reaching the spectral reflectance measuring means 16 from a two-dimensional area of the measurement sample surface S. Is changed. Although the first convex lens 6, the second convex lens 9, the objective lens 12, and the third convex lens 15 are each shown as one lens, they may be composed of a plurality of lenses.
【００１７】以上の構成により、透過波長可変フィルタ
ー１８に対する操作を行うだけで、透過波長可変フィル
ター１８で選択された複数種の波長の分光画像を得、そ
れらの分光画像をＣＣＤカメラ１４で撮影するととも
に、分光画像に基づいて、被測定物１３の測定試料面Ｓ
の二次元領域の分光反射率を一挙に測定することができ
る。With the above configuration, spectral images of a plurality of wavelengths selected by the variable transmission wavelength filter 18 are obtained only by performing an operation on the variable transmission wavelength filter 18, and those spectral images are photographed by the CCD camera 14. At the same time, based on the spectral image, the measurement sample surface S
Can be measured at once.
【００１８】前記第１の凸レンズ６、開口絞り７、視野
絞り８、第２の凸レンズ９、ハーフミラー１０、第３の
絞り１１および対物レンズ１２によって、光源５からの
計測光を測定試料面Ｓに到達させる照明光学系が構成さ
れている。第１の凸レンズ６、開口絞り７、視野絞り８
および第３の絞り１１を設けずに構成することもでき
る。The first convex lens 6, the aperture stop 7, the field stop 8, the second convex lens 9, the half mirror 10, the third stop 11, and the objective lens 12 allow measurement light from the light source 5 to be measured on the sample surface S. Is formed. First convex lens 6, aperture stop 7, field stop 8
Alternatively, the configuration may be such that the third aperture 11 is not provided.
【００１９】前記透過波長可変フィルター１８として
は、音響光学結晶と音響波ドライバーとから構成されて
ブロードバンドな光から単色光を分離する音響光学フィ
ルター（Brimrose Coporation of America製）とか、液
晶チューニングエレメントと複屈折フィルターとを組み
合わせて50ms以下の波長チューニング速度で任意の波長
のみ選択し、他の波長をカットする液晶チューナブルフ
ィルター（Cambridge Research & Instrumentation Inc
製）とか、更には、複数枚の透過波長の異なるフィルタ
ーを用いて、回転やスライドにより所定波長のフィルタ
ーに変更するように構成したものなど各種のものが適用
できる。The transmission wavelength tunable filter 18 includes an acousto-optic filter (manufactured by Brimrose Corporation of America) that is composed of an acousto-optic crystal and an acoustic wave driver and separates monochromatic light from broadband light, or a liquid crystal tuning element. A liquid crystal tunable filter that selects only an arbitrary wavelength at a wavelength tuning speed of 50 ms or less in combination with a refraction filter and cuts other wavelengths (Cambridge Research & Instrumentation Inc.
Various types of filters, such as a filter configured to change to a filter of a predetermined wavelength by rotating or sliding using a plurality of filters having different transmission wavelengths, can be applied.
【００２０】上記第１実施例において、測定試料面Ｓが
大きく、一度で測定できない場合には、Ｘ−Ｙステージ
３によりケーシング４を移動するか、あるいは、被測定
物１３を移動するかによって対処すれば良い。In the first embodiment, when the measurement sample surface S is large and cannot be measured at one time, the measure is taken depending on whether the casing 4 is moved by the XY stage 3 or the object 13 is moved. Just do it.
【００２１】図３は、本発明に係る第２実施例の分光反
射率測定装置の要部の構成図、図４の（ａ）は要部の拡
大図、図４の（ｂ）は図４の（ａ）の側面図であり、第
１実施例と異なるところは次の通りである。FIG. 3 is a structural view of a main part of a spectral reflectance measuring apparatus according to a second embodiment of the present invention, FIG. 4 (a) is an enlarged view of the main part, and FIG. 4 (b) is FIG. (A) is a side view, and the difference from the first embodiment is as follows.
【００２２】すなわち、結像光学系の第３の凸レンズ１
５に対向させて、測定試料面Ｓの一直線状の領域からの
反射光を分光して取り込む一次元スリット１９が設けら
れている。一次元スリット１９を通過した光を、第４の
凸レンズ２０、プリズム２１および第５の凸レンズ２２
を介して二次元イメージセンサ２３の撮像面上に結像さ
せる。この時、図４の（ｂ）に示したように、プリズム
２１によってスリット長手方向に直交する方向に光が分
散されるので、二次元イメージセンサ２３の撮像面上に
はスリットの分光された像が結像する。その分光画像に
基づき、分光反射率測定手段２４により被測定物１３の
測定試料面Ｓの一直線状の領域の分光反射率を一挙に測
定できるように構成されている。That is, the third convex lens 1 of the imaging optical system
A one-dimensional slit 19 is provided so as to be opposed to 5, and spectrally take in reflected light from a linear region of the measurement sample surface S. The light passing through the one-dimensional slit 19 is converted into a fourth convex lens 20, a prism 21 and a fifth convex lens 22.
The image is formed on the imaging surface of the two-dimensional image sensor 23 via the. At this time, as shown in FIG. 4B, since the light is dispersed in the direction orthogonal to the slit longitudinal direction by the prism 21, the split image of the slit is displayed on the imaging surface of the two-dimensional image sensor 23. Is imaged. Based on the spectral image, the spectral reflectance measuring means 24 can measure the spectral reflectance of a linear region of the measurement sample surface S of the device under test 13 at once.
【００２３】そして、Ｘ−Ｙステージ３を移動手段とし
て、ケーシング４を測定試料面Ｓの面に平行でかつ一次
元スリット１９の長手方向に直交する方向に所定量づつ
間欠的に移動させてそれぞれの一直線状の領域の分光反
射率を一挙に測定していき、全体として、被測定物１３
の測定試料面Ｓの二次元領域の分光反射率を迅速に測定
できるように構成されている。他の構成は第１実施例と
同じであり、同一図番を付すことによりその説明は省略
する。The casing 4 is intermittently moved by a predetermined amount in a direction parallel to the surface of the measurement sample surface S and perpendicular to the longitudinal direction of the one-dimensional slit 19 by using the XY stage 3 as a moving means. The spectral reflectance of the linear region is measured all at once, and as a whole, the measured object 13
Is configured to be able to quickly measure the spectral reflectance of the two-dimensional region of the measurement sample surface S. The other configuration is the same as that of the first embodiment, and the description thereof will be omitted by retaining the same reference numerals.
【００２４】上記第２実施例の第４の凸レンズ２０およ
び第５の凸レンズ２２は、それぞれ１枚のレンズで示さ
れているが、複数枚のレンズで構成されることもある。
移動手段としては、被測定物１３を移動するように構成
しても良い。The fourth convex lens 20 and the fifth convex lens 22 of the second embodiment are each shown as one lens, but may be composed of a plurality of lenses.
The moving means may be configured to move the device under test 13.
【００２５】また、上記第２実施例においては、照明光
学系の視野絞り８も矩形状あるいはスリット形状にし、
測定試料面Ｓの測定対象箇所のみに計測光を照射するの
が望ましい。不要な迷光の影響を低減できるからであ
る。In the second embodiment, the field stop 8 of the illumination optical system has a rectangular or slit shape.
It is desirable to irradiate only the measurement target portion on the measurement sample surface S with the measurement light. This is because the influence of unnecessary stray light can be reduced.
【００２６】上記第２実施例のプリズム２１に代えて、
図５の変形例の要部の構成図に示すように、グレーティ
ング２５を用いても良い。Instead of the prism 21 of the second embodiment,
A grating 25 may be used as shown in the configuration diagram of the main part of the modification of FIG.
【００２７】また、図６の（ａ）の変形例の要部の構成
図、および、図６の（ｂ）の図６の（ａ）の側面図に示
すように、上記第２実施例の第４の凸レンズ２０に代え
て、一次元のマイクロレンズアレイ２６を、そして、第
５の凸レンズ２２に代えて、アナモルフィックレンズア
レイ２７をそれぞれ用いても良い。Further, as shown in the structural view of the main part of the modification of FIG. 6A and the side view of FIG. 6A in FIG. Instead of the fourth convex lens 20, a one-dimensional microlens array 26 may be used, and instead of the fifth convex lens 22, an anamorphic lens array 27 may be used.
【００２８】上記第２実施例では、ケーシング４を一次
元スリット１９の長手方向に直交する一直線方向に移動
させているが、図７の要部の斜視図に示すように、ケー
シング４を所定の軸芯周りで 180°あるいは 360°回転
するように構成しても良い。この回転構成としては、例
えば、Ｘ−Ｙステージ３にベース部材を設け、このベー
ス部材にケーシング４を回転可能に設け、ケーシング４
の外周面に全周にわたる帯状のギアを設け、一方、ベー
ス部材に電動モータを設けるとともに電動モータのモー
タ軸に前記帯状のギアに咬合する小径ギアを設け、電動
モータを所定角度づつ回転させるように構成すれば良
い。なお、このとき、ケーシング４の回転軸芯と結像光
学系の光軸とを一致させておくのが望ましい。測定試料
面Ｓの位置と測定データとを関連付けやすいからであ
る。In the second embodiment, the casing 4 is moved in a linear direction orthogonal to the longitudinal direction of the one-dimensional slit 19, but as shown in a perspective view of a main part in FIG. It may be configured to rotate 180 ° or 360 ° around the axis. As this rotation configuration, for example, a base member is provided on the XY stage 3, and the casing 4 is rotatably provided on the base member.
A belt-shaped gear is provided over the entire outer peripheral surface of the base member, while an electric motor is provided on the base member, and a small-diameter gear that meshes with the band-shaped gear is provided on the motor shaft of the electric motor, and the electric motor is rotated by a predetermined angle. It may be configured as follows. At this time, it is desirable that the rotation axis of the casing 4 coincides with the optical axis of the imaging optical system. This is because it is easy to associate the position of the measurement sample surface S with the measurement data.
【００２９】また、測定試料面Ｓが大きい場合には、図
８の変形例の要部の斜視図に示すように、Ｘ−Ｙステー
ジ３によりジグザグ状にケーシング４を移動し、測定試
料面Ｓ全体の分光反射率を測定するようにすれば良い。When the measurement sample surface S is large, the casing 4 is moved in a zigzag manner by the XY stage 3 as shown in the perspective view of the main part of the modification of FIG. What is necessary is just to measure the whole spectral reflectance.
【００３０】図９は、本発明に係る第３実施例の分光反
射率測定装置の要部の斜視図、図１０は要部の平面図で
あり、前述第２実施例と同一構成のケーシング４ａの４
個が、図示しない取付構成によってＸ−Ｙステージ３
（図１参照）に着脱可能に取り付けられている。各ケー
シング４ａは、一次元スリット１９ａの長手方向に並設
され、かつ、隣り合う一次元スリット１９ａの長手方向
に直交する方向視において重複するように構成されてい
る。Ｘ−Ｙステージ３、および、その取付け構成は第１
実施例と同じである。FIG. 9 is a perspective view of a main part of a spectral reflectance measuring apparatus according to a third embodiment of the present invention, and FIG. 10 is a plan view of the main part. The casing 4a has the same configuration as that of the second embodiment. Of 4
The XY stage 3 is mounted on an XY stage 3
(See FIG. 1). The casings 4a are arranged side by side in the longitudinal direction of the one-dimensional slit 19a, and are configured to overlap when viewed in a direction orthogonal to the longitudinal direction of the adjacent one-dimensional slit 19a. The XY stage 3 and its mounting configuration are the first
This is the same as the embodiment.
【００３１】この第３実施例によれば、測定試料面Ｓが
大きい場合でも、ケーシング４ａの取付個数を増加する
だけで、Ｘ−Ｙステージ３の所定の一方向への間欠移動
によって測定試料面Ｓ全体の分光反射率を容易に測定で
きる利点を有している。According to the third embodiment, even when the measurement sample surface S is large, only by increasing the number of the casings 4a mounted, the measurement sample surface is intermittently moved in one predetermined direction of the XY stage 3. This has the advantage that the spectral reflectance of the entire S can be easily measured.
【００３２】撮像手段としては、上述実施例のようなＣ
ＣＤカメラ２８に限らず、例えば、イメージセンサやフ
ォトダイオードアレイなど各種の手段が適用できる。As the image pickup means, C as in the above embodiment is used.
Not limited to the CD camera 28, for example, various means such as an image sensor and a photodiode array can be applied.
【００３３】[0033]
【発明の効果】以上の説明から明らかなように、請求項
１に記載した発明の分光反射率測定装置によれば、測定
試料面の二次元領域からの反射光に対し、選択した波長
ごとの測定試料面の二次元領域全体の分光画像を撮像手
段で撮影し、その測定試料面の二次元領域全体の分光反
射率を一挙に測定できるから、多点の測定を行う従来に
比べ、分光反射率の測定を迅速に行うことができる。し
かも、多点の測定の場合のような不連続な測定にはなら
ないから、局所的な変化をも把握でき、分光反射率を精
度良く測定できる。As is apparent from the above description, according to the spectral reflectance measuring apparatus of the first aspect of the present invention, the reflected light from the two-dimensional area on the surface of the sample to be measured is selected for each selected wavelength. Spectral images of the entire two-dimensional area of the measurement sample surface are taken by the imaging means, and the spectral reflectance of the entire two-dimensional area of the measurement sample surface can be measured at once. The rate measurement can be performed quickly. Moreover, since the measurement is not discontinuous as in the case of multi-point measurement, a local change can be grasped and the spectral reflectance can be measured with high accuracy.
【００３４】また、請求項２に記載した発明の分光反射
率測定装置によれば、測定試料面の一直線状の領域から
の反射光を一次元スリットにより分光し、一直線に連な
った領域の分光反射率を測定し、その測定位置を移動手
段で変え、全体として二次元領域の分光反射率を測定で
きるから、多点の測定を行う従来に比べ、分光反射率の
測定を迅速に行うことができる。しかも、多点の測定の
場合のような不連続な測定にはならないから、局所的な
変化をも把握でき、分光反射率を精度良く測定できる。According to the spectral reflectance measuring apparatus of the present invention, the reflected light from the linear region of the measurement sample surface is separated by the one-dimensional slit, and the spectral reflection of the linearly connected region is measured. Since the reflectance can be measured, the measurement position can be changed by the moving means, and the spectral reflectance of the two-dimensional area can be measured as a whole, so that the spectral reflectance can be measured more quickly than in the conventional case where multiple points are measured. . Moreover, since the measurement is not discontinuous as in the case of multi-point measurement, a local change can be grasped and the spectral reflectance can be measured with high accuracy.
【００３５】また、請求項３に記載した発明の分光反射
率測定装置によれば、測定試料面の大小にかかわらず、
撮像光学系と一次元スリットと撮像手段の個数を変更す
ることによって対応できるから、大径のレンズを設けた
りせずに済み、製作が簡単で安価にできる。According to the spectral reflectance measuring apparatus of the third aspect of the present invention, regardless of the size of the measurement sample surface,
Since it can be handled by changing the number of the imaging optical system, the one-dimensional slit, and the number of the imaging means, it is not necessary to provide a large-diameter lens, and the manufacturing can be simplified and inexpensive.
【図１】本発明に係る第１実施例の分光反射率測定装置
の全体側面図である。FIG. 1 is an overall side view of a spectral reflectance measuring apparatus according to a first embodiment of the present invention.
【図２】要部の横断面図である。FIG. 2 is a cross-sectional view of a main part.
【図３】本発明に係る第２実施例の分光反射率測定装置
の要部の構成図である。FIG. 3 is a configuration diagram of a main part of a spectral reflectance measuring apparatus according to a second embodiment of the present invention.
【図４】（ａ）は要部の拡大図、（ｂ）は図４の（ａ）
の側面図である。4A is an enlarged view of a main part, and FIG. 4B is a view of FIG.
FIG.
【図５】変形例の要部の構成図である。FIG. 5 is a configuration diagram of a main part of a modified example.
【図６】（ａ）は変形例の要部の構成図、（ｂ）は図６
の（ａ）の側面図である。6A is a configuration diagram of a main part of a modified example, and FIG.
(A) is a side view.
【図７】変形例の要部の斜視図である。FIG. 7 is a perspective view of a main part of a modification.
【図８】変形例の要部の斜視図である。FIG. 8 is a perspective view of a main part of a modification.
【図９】本発明に係る第３実施例の分光反射率測定装置
の要部の斜視図である。FIG. 9 is a perspective view of a main part of a spectral reflectance measuring apparatus according to a third embodiment of the present invention.
【図１０】要部の平面図である。FIG. 10 is a plan view of a main part.
３…Ｘ−Ｙステージ（移動手段） ５…光源 １３…被測定物 １４…ＣＣＤカメラ（撮像手段） １６…分光反射率測定手段 １８…透過波長可変フィルター（分光手段） １９…一次元スリット（分光手段） ２３…二次元イメージセンサ（撮像手段） ２４…分光反射率測定手段 Ｓ…測定試料面 DESCRIPTION OF SYMBOLS 3 ... XY stage (moving means) 5 ... Light source 13 ... Measurement object 14 ... CCD camera (imaging means) 16 ... Spectral reflectance measuring means 18 ... Transmissible wavelength variable filter (spectral means) 19 ... One-dimensional slit (spectral means) Means 23 23-dimensional image sensor (imaging means) 24 Spectral reflectance measuring means S Sampling sample surface
Claims (3)
学系と、 前記測定試料面からの反射光を結像させる結像光学系
と、 前記測定試料面からの反射光を分光する分光手段と、 結像された分光画像を撮影する撮像手段と、 前記分光画像に基づいて分光反射率を測定する分光反射
率測定手段と、 を備えた分光反射率測定装置において、 前記分光手段を、 前記結像光学系と前記分光反射率測定手段との間に設け
て前記測定試料面の二次元領域から前記分光反射率測定
手段に到達する透過反射光の波長を変更する透過波長可
変フィルターで構成したことを特徴とする分光反射率測
定装置。A light source that emits measurement light; an illumination optical system that causes the measurement light from the light source to reach a measurement sample surface; an imaging optical system that images reflected light from the measurement sample surface; A spectral means for spectrally dispersing light reflected from the sample surface; an imaging means for photographing the formed spectral image; and a spectral reflectance measuring means for measuring spectral reflectance based on the spectral image. In the rate measuring apparatus, the spectroscopic means is provided between the imaging optical system and the spectral reflectance measuring means, and the transmitted and reflected light reaching the spectral reflectance measuring means from a two-dimensional area of the measurement sample surface is measured. A spectral reflectance measuring device comprising a transmission wavelength variable filter for changing a wavelength.
学系と、 前記測定試料面からの反射光を結像させる結像光学系
と、 前記測定試料面からの反射光を分光する分光手段と、 結像された分光画像を撮影する撮像手段と、 前記分光画像に基づいて分光反射率を測定する分光反射
率測定手段と、 を備えた分光反射率測定装置において、 前記分光手段を、 前記結像光学系と前記分光反射率測定手段との間に設け
て前記測定試料面の一直線状の領域からの反射光を分光
して取り込む一次元スリットで構成し、 前記測定試料面と前記一次元スリットとを、前記測定試
料面の面に平行でかつ前記一次元スリットの長手方向に
直交する方向に相対移動する移動手段を設けたことを特
徴とする分光反射率測定装置。A light source that emits measurement light; an illumination optical system that causes the measurement light from the light source to reach a measurement sample surface; an imaging optical system that images reflected light from the measurement sample surface; A spectral means for spectrally dispersing light reflected from the sample surface; an imaging means for photographing the formed spectral image; and a spectral reflectance measuring means for measuring spectral reflectance based on the spectral image. In the rate measuring device, the spectroscopic unit is provided between the imaging optical system and the spectral reflectance measuring unit, and is a one-dimensional slit that spectrally captures reflected light from a linear region of the measurement sample surface. A moving means that relatively moves the measurement sample surface and the one-dimensional slit in a direction parallel to a surface of the measurement sample surface and orthogonal to a longitudinal direction of the one-dimensional slit. Spectral reflectance measurement device .
リットと撮像手段とを、測定試料面の面に平行な方向
で、かつ、前記一次元スリットの長手方向に複数個並設
するとともに、前記一次元スリットの長手方向に直交す
る方向視において、隣り合う前記一次元スリットの長手
方向の端部を重複させてある分光反射率測定装置。3. A plurality of the imaging optical system according to claim 2, a one-dimensional slit, and an imaging unit are arranged in a direction parallel to a surface of a measurement sample surface and in a longitudinal direction of the one-dimensional slit. And a spectral reflectance measuring device in which, when viewed in a direction perpendicular to the longitudinal direction of the one-dimensional slit, ends of the adjacent one-dimensional slits in the longitudinal direction are overlapped.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26282896A JPH10111240A (en) | 1996-10-03 | 1996-10-03 | Apparatus for measuring spectral reflectance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26282896A JPH10111240A (en) | 1996-10-03 | 1996-10-03 | Apparatus for measuring spectral reflectance |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10111240A true JPH10111240A (en) | 1998-04-28 |
Family
ID=17381187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26282896A Pending JPH10111240A (en) | 1996-10-03 | 1996-10-03 | Apparatus for measuring spectral reflectance |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10111240A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003509667A (en) * | 1999-09-16 | 2003-03-11 | エムケーエス インストゥルメンツ インコーポレーテッド | Method and apparatus for optical measurement of layer and surface properties |
| CZ304617B6 (en) * | 2008-04-24 | 2014-08-06 | Univerzita Palackého | Optical system for measuring shape of convex reflectance surfaces, particularly segments of large-area spherical mirrors |
-
1996
- 1996-10-03 JP JP26282896A patent/JPH10111240A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003509667A (en) * | 1999-09-16 | 2003-03-11 | エムケーエス インストゥルメンツ インコーポレーテッド | Method and apparatus for optical measurement of layer and surface properties |
| JP4909480B2 (en) * | 1999-09-16 | 2012-04-04 | エムケーエス インストゥルメンツ インコーポレーテッド | Layer and surface property optical measurement method and apparatus |
| CZ304617B6 (en) * | 2008-04-24 | 2014-08-06 | Univerzita Palackého | Optical system for measuring shape of convex reflectance surfaces, particularly segments of large-area spherical mirrors |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI754086B (en) | Overlay metrology using multiple parameter configurations | |
| US9442013B2 (en) | Microscope spectrometer, optical axis shift correction device, spectroscope and microscope using same | |
| KR100917912B1 (en) | Single-Polarizer Focused-Beam Ellipsometer | |
| US7595873B1 (en) | Rapid spatial averaging over an extended sample in a Raman spectrometer | |
| EP2160591B1 (en) | Imaging optical inspection device with a pinhole camera | |
| KR20030041147A (en) | Differential numerical aperture methods and device | |
| JP2007522445A (en) | Method and apparatus for multi-mode spectral image analysis | |
| CN108496066B (en) | Micro spectrometer and method for switching micro spectrometer between imaging mode and spectrometer mode | |
| US8189191B2 (en) | Spectroscopic imaging microscopy | |
| WO2017150062A1 (en) | Spectrometry device | |
| WO2021197207A1 (en) | Apparatus for surface profile measurement | |
| JP4447970B2 (en) | Object information generation apparatus and imaging apparatus | |
| JPH11201819A (en) | Two-dimensional spectral characteristics measuring device | |
| JP2011220700A (en) | Spectroscopic analyzer for microscope | |
| JP2558864B2 (en) | Spectroscopic analyzer | |
| WO2011117565A2 (en) | Alignment methods and systems and devices using them | |
| JP2002005823A (en) | Thin-film measuring apparatus | |
| JP3316012B2 (en) | Temperature measuring device using a micro-Raman spectrophotometer | |
| KR101861919B1 (en) | Rapid optical inspection method of semiconductor | |
| JPH09105673A (en) | Spectral apparatus | |
| JPH10111240A (en) | Apparatus for measuring spectral reflectance | |
| JP7318868B2 (en) | Sample measuring device, measuring method and program | |
| JP3219462B2 (en) | Thin film measuring instrument | |
| KR102442981B1 (en) | Instant raman imaging apparatus | |
| JP3908726B2 (en) | Three-dimensional shape measuring device for transparent thin film using acousto-optic modulation filter |