JPH0980207A - Optical lens for ultraviolet irradiation device - Google Patents
Optical lens for ultraviolet irradiation deviceInfo
- Publication number
- JPH0980207A JPH0980207A JP7255774A JP25577495A JPH0980207A JP H0980207 A JPH0980207 A JP H0980207A JP 7255774 A JP7255774 A JP 7255774A JP 25577495 A JP25577495 A JP 25577495A JP H0980207 A JPH0980207 A JP H0980207A
- Authority
- JP
- Japan
- Prior art keywords
- plano
- lens
- optical
- ultraviolet
- ultraviolet irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Joining Of Glass To Other Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】マイクロマシン、パワートラ
ンジスタなどの製造工程において採用される露光工程
に、露光装置が使用される。本発明は、露光装置等の紫
外線照射装置の光学系を構成する紫外線照射装置用光学
レンズに関するものである。BACKGROUND OF THE INVENTION An exposure apparatus is used in an exposure process adopted in a manufacturing process of micromachines, power transistors and the like. The present invention relates to an optical lens for an ultraviolet irradiation device that constitutes an optical system of an ultraviolet irradiation device such as an exposure device.
【０００２】[0002]
【従来の技術】半導体素子や液晶画面、インクジェット
方式のプリンタヘッド、一枚の基板の上に多種多数の電
気素子を製作して１つのモジュールにするマルチチップ
モジュール等、ミクロンサイズの加工が必要である様々
な電気部品の製作工程において露光工程が用いられる。
この露光工程において使用する露光装置の一つとして、
投影露光装置が採用される。上記投影露光装置は、所定
のマスクパターンが記されているマスクの上方から露光
波長光を照射し、投影レンズを介して所定の縮小率でマ
スクパターンをワーク上に塗布されているフォトレジス
トに転写するものである。2. Description of the Related Art Micron-sized processing is required for semiconductor devices, liquid crystal screens, ink jet printer heads, multichip modules in which a large number of various electric devices are manufactured on a single substrate to form a single module. An exposure process is used in a process of manufacturing a variety of electric components.
As one of the exposure devices used in this exposure process,
A projection exposure apparatus is adopted. The projection exposure apparatus irradiates light having an exposure wavelength from above a mask on which a predetermined mask pattern is written, and transfers the mask pattern to a photoresist coated on a work at a predetermined reduction rate through a projection lens. To do.
【０００３】マスクパターンのワーク上のフォトレジス
トへの転写は、波長がフォトレジストの感光波長である
光（以下、露光波長光という）によって、マスクパター
ンをワーク上に結像させることにより実現される。その
ため、上記投影レンズには、露光波長光に対して上記結
像関係を成立させる機能が要求される。この要求を満た
すよう露光波長光に対する色収差補正を施した投影レン
ズは、通常、複数の光学ガラス（レンズ等）を光学用接
着剤によって接合した構成であるものが多い。これは、
以下の（１），（２）の理由により、光学設計の自由度
が高くなり、より高性能なレンズが得られるためであ
る。 （１）複数の異なる種類の光学ガラス（レンズ等）を適
宜選択して重ね合わせることにより、所望の波長に対す
る色収差補正が可能であること。 （２）接合に光学用接着剤を使用することにより、接合
面を極めて高い精度で加工することなく接合面における
屈折率の高い空気層の形成を防止し、その結果、接合面
で光がある入射角以上で全反射するという不具合が発生
しないこと。すなわち、光学ガラスがレンズの場合、空
気層の存在による上記全反射を防止するために、レンズ
の曲率がある範囲に制限されるということがなくなるこ
と。The transfer of the mask pattern to the photoresist on the work is realized by forming an image of the mask pattern on the work with light whose wavelength is the photosensitive wavelength of the photoresist (hereinafter referred to as exposure wavelength light). . Therefore, the projection lens is required to have a function of establishing the image formation relationship with the exposure wavelength light. A projection lens that has been subjected to chromatic aberration correction for exposure wavelength light so as to satisfy this requirement usually has a structure in which a plurality of optical glasses (lenses or the like) are bonded by an optical adhesive. this is,
Because of the following reasons (1) and (2), the degree of freedom in optical design is increased and a higher performance lens can be obtained. (1) It is possible to correct chromatic aberration for a desired wavelength by appropriately selecting and stacking a plurality of different types of optical glass (lenses, etc.). (2) By using an optical adhesive for joining, formation of an air layer having a high refractive index on the joining surface is prevented without processing the joining surface with extremely high precision, and as a result, light is present on the joining surface. The problem of total reflection above the angle of incidence must not occur. That is, when the optical glass is a lens, the curvature of the lens is not limited to a certain range in order to prevent the total reflection due to the presence of the air layer.
【０００４】従来の投影レンズとして使用される光学レ
ンズの製作方法の例を図５に示す。ここに示す光学レン
ズは、平凸レンズ１枚と平凹レンズ１枚とを接合させた
構成である。平凸レンズは、例えば、硝材がＢＫ７ＷＤ
であり、直径３５．８ｍｍ、最頂部における厚みが８．
５ｍｍ、凸部の曲率半径が３０．２０ｍｍである。一
方、平凹レンズは、硝材がＦＬ６であり、直径３６ｍ
ｍ、最底部における厚みが２．５ｍｍ、凹部の曲率半径
が１８．５４ｍｍである。An example of a method of manufacturing an optical lens used as a conventional projection lens is shown in FIG. The optical lens shown here has a configuration in which one plano-convex lens and one plano-concave lens are cemented together. For the plano-convex lens, for example, the glass material is BK7WD
And the diameter is 35.8 mm and the thickness at the top is 8.
5 mm, the radius of curvature of the convex portion is 30.20 mm. On the other hand, the plano-concave lens has a glass material of FL6 and a diameter of 36 m.
m, the thickness at the bottom is 2.5 mm, and the radius of curvature of the recess is 18.54 mm.
【０００５】以下、製作手順を説明する。 （１）同図（ａ）に示すように、平凹レンズ３０の接合
面（平面側）が上方となるよう平凹レンズ３０を設置
し、接合面に光学用接着剤として紫外線硬化性接着剤２
０を塗布する。 （２）同図（ｂ）に示すように、平凹レンズ３０の上方
から平凸レンズ１０を重ね合わせ、平凸レンズ１０自体
の荷重により紫外線硬化性接着剤２０が接合面全体に行
き渡るまで待機する。紫外線硬化性接着剤２０に気泡や
異物の混入が観察される場合は、平凸レンズ１０および
平凹レンズ３０をすり合わせることにより、気泡や異物
を排除する。 （３）同図（ｃ）に示すように、紫外線硬化性接着剤２
０が接合面全体に行き渡った後、重り等を用いて平凸レ
ンズ１０の上方より荷重を加えて、紫外線硬化性接着剤
２０の形成層の厚さｄを所定の値に調整する。例えば、
２Ｋｇの荷重を１０分間加え、厚さｄを５μｍ以下にす
る。The manufacturing procedure will be described below. (1) As shown in FIG. 1A, the plano-concave lens 30 is installed so that the cemented surface (planar side) of the plano-concave lens 30 faces upward, and the ultraviolet curable adhesive 2 is used as an optical adhesive on the cemented surface.
Apply 0. (2) As shown in FIG. 2B, the plano-convex lens 10 is superposed from above the plano-concave lens 30, and the load of the plano-convex lens 10 itself waits until the ultraviolet curable adhesive 20 reaches the entire bonding surface. When bubbles or foreign matter is observed mixed in the ultraviolet curable adhesive 20, the plano-convex lens 10 and the plano-concave lens 30 are rubbed together to eliminate the bubbles or foreign matter. (3) As shown in FIG. 3C, the ultraviolet curable adhesive 2
After 0 has spread over the entire bonding surface, a load is applied from above the plano-convex lens 10 using a weight or the like to adjust the thickness d of the formation layer of the ultraviolet curable adhesive 20 to a predetermined value. For example,
A load of 2 kg is applied for 10 minutes to make the thickness d 5 μm or less.
【０００６】形成層を５μｍ以下としたのは、以下の理
由による。接着にて形成される光学レンズの要求される
厚みの公差が±５０μｍ以下であるのに対し、接着前の
光学ガラス（レンズ）それぞれ厚みの公差は、通常±２
０μｍである。よって、（±５０μｍ）−（±２０μ
ｍ）×２＝（±１０μｍ）の範囲内に形成層の厚さｄを
調整すればよいことになる。しかしながら、例えば、形
成層のある位置での厚さｄ1 ＝９μｍ，別の位置での厚
さｄ2 ＝３μｍといったように、形成層の厚さｄのバラ
ツキが５μｍを越えると、所定の光に対し収差が発生し
てしまう。組上がった光学レンズの平行度を５μｍ以内
に制御するのは困難であるので、形成層の厚さｄを５μ
ｍ以内として上記収差の発生を防止している。その後、
平凸レンズ１０および平凹レンズ３０の光軸が一致する
ように両者の位置合わせを行う。The reason why the forming layer is set to 5 μm or less is as follows. The required thickness tolerance of the optical lens formed by bonding is ± 50 μm or less, while the thickness tolerance of each optical glass (lens) before bonding is usually ± 2.
0 μm. Therefore, (± 50 μm)-(± 20 μm
The thickness d of the forming layer should be adjusted within the range of (m) × 2 = (± 10 μm). However, when the variation in the thickness d of the forming layer exceeds 5 μm, for example, the thickness d 1 = 9 μm at a certain position of the forming layer and the thickness d 2 = 3 μm at another position, a predetermined light is emitted. However, aberration will occur. Since it is difficult to control the parallelism of the assembled optical lens within 5 μm, the thickness d of the forming layer is set to 5 μm.
Within m, the above-mentioned aberration is prevented from occurring. afterwards,
The plano-convex lens 10 and the plano-concave lens 30 are aligned so that their optical axes coincide with each other.
【０００７】（４）同図（ｄ）に示すように、形成層の
厚さｄを調整後、平凸レンズ１０の上方より紫外線を照
射する。例えば、波長が３６０ｎｍ〜３７０ｎｍであっ
て、平凸レンズ１０の表面における照度が０．１ｍＷ／
ｃｍ2 である紫外線を、まず仮硬化として３０秒間照射
する。そして、平凸レンズ１０および平凹レンズ３０の
光軸が一致しているかどうか確認する。光軸がずれてい
る場合は、両者を剥離させ、紫外線硬化性接着剤を除去
し、再び上記（１）〜（４）の手順を繰り返す。光軸調
整が終了後、本硬化として、上記条件で紫外線を１８０
秒間照射する。以上により、光学レンズが得られる。(4) As shown in FIG. 3D, after adjusting the thickness d of the forming layer, ultraviolet rays are irradiated from above the plano-convex lens 10. For example, the wavelength is 360 nm to 370 nm, and the illuminance on the surface of the plano-convex lens 10 is 0.1 mW /
First, ultraviolet rays of cm 2 are irradiated for 30 seconds as temporary curing. Then, it is confirmed whether the optical axes of the plano-convex lens 10 and the plano-concave lens 30 match. When the optical axes are deviated from each other, the both are peeled off, the ultraviolet curable adhesive is removed, and the steps (1) to (4) are repeated again. After the optical axis adjustment is completed, as the main curing, the ultraviolet rays are 180
Irradiate for 2 seconds. An optical lens is obtained by the above.
【０００８】[0008]
【発明が解決しようとする課題】上記のように製作され
た光学レンズを紫外線照射装置の光学系に組み込み、紫
外線を照射すると、照射時間の経過につれて被照射物表
面での紫外線照度が低下してゆくという問題点が生じ
た。照度劣化後の光学レンズを調査したところ、光学レ
ンズを構成する複数の光学ガラス（レンズ等）を接合す
る光学用接着剤と光学ガラス（レンズ等）との界面が着
色されており、この界面にて紫外線が吸収され、紫外線
照度が低下することが判明した。When the optical lens manufactured as described above is incorporated into the optical system of an ultraviolet irradiator and irradiated with ultraviolet rays, the illuminance of ultraviolet rays on the surface of the object to be irradiated decreases as the irradiation time elapses. The problem of going forward arose. When the optical lens after illuminance deterioration was investigated, the interface between the optical glass (lens etc.) and the optical adhesive that joins the multiple optical glasses (lens etc.) that make up the optical lens was colored. It was found that UV rays were absorbed by the UV rays and the illuminance of the UV rays decreased.
【０００９】本発明は上記した従来技術の問題点を解決
するためになされたものであって、本発明の目的は、紫
外線を長時間照射する場合においても被照射物表面での
紫外線照度が低下しない紫外線照射装置用光学レンズを
提供することである。The present invention has been made in order to solve the above-mentioned problems of the prior art, and the object of the present invention is to reduce the ultraviolet illuminance on the surface of an object to be irradiated even when it is irradiated with ultraviolet light for a long time. Another object is to provide an optical lens for a UV irradiation device.
【００１０】[0010]
【課題を解決するための手段】上記課題は本発明を次の
ように解決したものである。紫外線照射装置用光学レン
ズを構成する複数の光学ガラス（レンズ等）の硝材は、
所定の波長の紫外線透過性は高く耐紫外線性も良好であ
る。また、複数の光学ガラス（レンズ等）を接合する光
学用接着剤である紫外線硬化性接着剤も、同様の特性を
有する。よって、光学ガラス（レンズ等）と光学用接着
剤との界面の着色という特性変化は、紫外線が紫外線照
射装置用光学レンズを通過することにより発生する、光
学ガラス（レンズ等）と紫外線硬化性接着剤との化学反
応に起因するものと考えられる。The above-mentioned object is to solve the present invention as follows. The glass materials of the optical glasses (lenses etc.) that make up the optical lens for the ultraviolet irradiation device are
It has a high UV transparency at a predetermined wavelength and a good UV resistance. An ultraviolet curable adhesive, which is an optical adhesive that bonds a plurality of optical glasses (lenses and the like), also has similar characteristics. Therefore, the characteristic change of coloring of the interface between the optical glass (lens etc.) and the optical adhesive occurs when ultraviolet rays pass through the optical lens for the ultraviolet irradiation device. It is considered to be caused by the chemical reaction with the agent.
【００１１】本発明の請求項１の発明は、光学ガラス
（レンズ等）と紫外線硬化性接着剤との間に誘電体膜を
形成したので、光学ガラス（レンズ等）と光学用接着剤
である紫外線硬化性接着剤とが直接接触することなく、
複数の光学ガラス（レンズ等）を接合することが可能と
なり、紫外線を長時間照射する場合においても被照射物
表面での紫外線照度が低下しない紫外線照射装置用光学
レンズを得ることができる。Since the dielectric film is formed between the optical glass (lens or the like) and the ultraviolet curable adhesive, the invention of claim 1 of the present invention is the optical glass (lens or the like) and the optical adhesive. Without direct contact with UV curable adhesive,
It becomes possible to bond a plurality of optical glasses (lenses or the like), and it is possible to obtain an optical lens for an ultraviolet irradiation device in which the ultraviolet illuminance on the surface of the object to be irradiated does not decrease even when the ultraviolet irradiation is performed for a long time.
【００１２】本発明の請求項２、請求項３の発明は、誘
電体膜を紫外線透過率の高い酸化シリコン膜、フッ化マ
グネシウム膜としたので、誘電体膜による紫外線光量の
減少を抑制することができる。In the second and third aspects of the present invention, since the dielectric film is a silicon oxide film or a magnesium fluoride film having a high ultraviolet transmittance, it is possible to suppress a decrease in the amount of ultraviolet light due to the dielectric film. You can
【００１３】[0013]
【発明の実施の形態】図１は、本発明の実施例である光
学レンズの構成の一例を示す断面図である。ここに示す
光学レンズは、平凸レンズ１枚と平凹レンズ１枚とを接
合させた構成である。平凸レンズ１０は、例えば、硝材
がＢＫ７ＷＤであり、直径３５．８ｍｍ、最頂部におけ
る厚みが８．５ｍｍ、凸部の曲率が３０．２０ｍｍであ
る。一方、平凹レンズ３０は、硝材がＦＬ６であり、直
径３６ｍｍ、最底部における厚みが２．５ｍｍ、凹部の
曲率が１８．５４ｍｍである。すなわち、この例におい
ては、平凸レンズ１０および平凹レンズ３０の接合面上
に、酸化シリコン（ＳｉＯ2 ）が蒸着されてなる第１の
薄層４１および第２の薄層４２を形成し、該薄層４１お
よび４２を介して、平凸レンズ１０および平凹レンズ３
０が紫外線硬化性接着剤２０によって接合することによ
り、光学レンズを構成する。1 is a sectional view showing an example of the structure of an optical lens that is an embodiment of the present invention. The optical lens shown here has a configuration in which one plano-convex lens and one plano-concave lens are cemented together. For the plano-convex lens 10, for example, the glass material is BK7WD, the diameter is 35.8 mm, the thickness at the top is 8.5 mm, and the curvature of the convex is 30.20 mm. On the other hand, in the plano-concave lens 30, the glass material is FL6, the diameter is 36 mm, the thickness at the bottom is 2.5 mm, and the curvature of the recess is 18.54 mm. That is, in this example, the first thin layer 41 and the second thin layer 42 formed by vapor deposition of silicon oxide (SiO 2 ) are formed on the cemented surface of the plano-convex lens 10 and the plano-concave lens 30, and the thin layers are formed. Plano-convex lens 10 and plano-concave lens 3 via layers 41 and 42
An optical lens is formed by bonding 0 with the ultraviolet curable adhesive 20.
【００１４】以下、製作手順を説明する。 （１）平凸レンズ１０および平凹レンズ３０の接合面に
酸化シリコン（ＳｉＯ2）を膜厚７０ｎｍで蒸着するこ
とにより、第１の薄層４１および第２の薄層４２を形成
する。上記第１の薄層４１および第２の薄層４２は、例
えば、平凸レンズ１０ならびに平凹レンズ３０の温度３
００℃、真空槽内圧力２．７×１０-3Ｐａ、蒸着速度
７．０Å／ｓの条件で蒸着形成される。その際、蒸着中
にＡｒイオンを加速して蒸着されている基板（平凸レン
ズ１０または平凹レンズ３０）に照射し、密度の高い蒸
着膜を得る。The manufacturing procedure will be described below. (1) The first thin layer 41 and the second thin layer 42 are formed by vapor-depositing silicon oxide (SiO 2 ) with a film thickness of 70 nm on the cemented surface of the plano-convex lens 10 and the plano-concave lens 30. The first thin layer 41 and the second thin layer 42 are formed, for example, at the temperature 3 of the plano-convex lens 10 and the plano-concave lens 30.
Vapor deposition is performed under the conditions of 00 ° C., vacuum chamber pressure of 2.7 × 10 −3 Pa, and vapor deposition rate of 7.0 Å / s. At this time, Ar ions are accelerated during the vapor deposition to irradiate the vapor-deposited substrate (plano-convex lens 10 or plano-concave lens 30) to obtain a vapor-deposited film with high density.
【００１５】（２） 上記第１の薄層４１および第２の
薄層４２の形成終了後は、従来の技術で示した製作手順
（１）〜（４）を継承する。すなわち、本実施例におい
ても、紫外線硬化性接着剤２０の形成層の厚さｄを５μ
ｍとし、紫外線の照射条件は、波長が３６０ｎｍ〜３７
０ｎｍ、平凸レンズ１の表面における照度が０．１ｍＷ
／ｃｍ2 、仮硬化時照射時間３０秒、本硬化時照射時間
１８０秒とした。以上により、光学レンズが得られる。(2) After the formation of the first thin layer 41 and the second thin layer 42, the manufacturing procedures (1) to (4) shown in the prior art are succeeded. That is, also in this embodiment, the thickness d of the formation layer of the ultraviolet curable adhesive 20 is 5 μm.
m, and the ultraviolet irradiation condition is that the wavelength is 360 nm to 37 nm.
0 nm, the illuminance on the surface of plano-convex lens 1 is 0.1 mW
/ Cm 2 , irradiation time during temporary curing was 30 seconds, and irradiation time during main curing was 180 seconds. An optical lens is obtained by the above.
【００１６】上記実施例において、第１の薄層４１およ
び第２の薄層４２をフッ化マグネシウム（ＭｇＦ2 ）と
した場合の形成条件は、例えば以下の通りである。すな
わち、平凸レンズ１０ならびに平凹レンズ３０の温度３
００℃、真空槽内圧力１．２×１０-3Ｐａ、蒸着速度
５．０Å／ｓの条件で蒸着し、膜厚７２ｎｍのフッ化マ
グネシウム層を得る。In the above embodiment, the formation conditions when the first thin layer 41 and the second thin layer 42 are magnesium fluoride (MgF 2 ) are as follows, for example. That is, the temperature of the plano-convex lens 10 and the plano-concave lens 30 is 3
Vapor deposition is performed under the conditions of 00 ° C., vacuum chamber pressure 1.2 × 10 −3 Pa, and vapor deposition rate 5.0 Å / s to obtain a magnesium fluoride layer having a film thickness of 72 nm.
【００１７】本発明の効果を確認するために、上記実施
例に基づき誘電体膜を酸化シリコン膜とした第１の光学
サンプルと、上記実施例に基づき誘電体膜をフッ化マグ
ネシウム膜とした第２の光学サンプルと、従来技術に基
づく、即ち、光学ガラス（レンズ）と紫外線硬化性接着
剤との間に誘電体膜を介在させない第３の光学サンプル
の紫外線透過率の経時的変化を測定した。図２に各サン
プルの構成を示す。同図（ａ）が第１、第２のサンプ
ル、同図（ｂ）が第３のサンプルであり、図１と同等の
構成要素には同じ符号が付されている。各サンプルは、
各々、５０ｍｍ×５０ｍｍ×厚さ２ｍｍのＢＫ７ＷＤガ
ラスおよびＦＬ６ガラスを上記実施例および従来の技術
にもとづいて張り合わせたものである。図３に、該各サ
ンプルの紫外線透過率の経時的変化を示す。ここで対象
とした紫外線の波長は、露光波長の一つである３６５ｎ
ｍ（ｉ線）とした。同図において縦軸は波長３６５ｎｍ
光の透過率であり、横軸は紫外線照射時間を示す。In order to confirm the effect of the present invention, a first optical sample in which the dielectric film is a silicon oxide film based on the above-mentioned embodiment and a first optical sample in which the dielectric film is a magnesium fluoride film based on the above-mentioned embodiment are used. The change with time of the ultraviolet transmittance of the optical sample of No. 2 and the third optical sample based on the prior art, that is, without interposing the dielectric film between the optical glass (lens) and the ultraviolet curable adhesive, was measured. . FIG. 2 shows the structure of each sample. The figure (a) is the 1st and 2nd sample, the figure (b) is the 3rd sample, and the same code | symbol is attached | subjected to the component equivalent to FIG. Each sample is
BK7WD glass and FL6 glass each having a size of 50 mm × 50 mm × thickness of 2 mm are laminated based on the above-mentioned examples and the conventional technique. FIG. 3 shows the change with time of the ultraviolet transmittance of each sample. The wavelength of the ultraviolet rays targeted here is 365n, which is one of the exposure wavelengths.
m (i line). In the figure, the vertical axis shows the wavelength of 365 nm.
It is the light transmittance, and the horizontal axis represents the ultraviolet irradiation time.
【００１８】両者に紫外線を投射する紫外線光源はウシ
オ電機株式会社製の紫外線照射装置ＵＩＳ−５０１１Ｈ
Ｇ９７である。両者に投射される紫外線の分光分布を図
４に示す。同図において、縦軸は相対分光強度、横軸は
波長である。ここで、投射される紫外線のうち、波長３
４０ｎｍ以下の成分はフィルタ等によりカットされてい
る。これは、波長３４０ｎｍ以下の紫外線によって、貼
り合わせる光学ガラス（レンズ）が着色してしまい、ま
た紫外線硬化性接着剤自体も特性が劣化してしまうから
である。An ultraviolet light source for projecting ultraviolet light to both is an ultraviolet irradiation device UIS-5011H manufactured by Ushio Inc.
It is G97. FIG. 4 shows the spectral distribution of ultraviolet rays projected on both. In the figure, the vertical axis represents relative spectral intensity and the horizontal axis represents wavelength. Here, among the projected ultraviolet rays, the wavelength 3
The component of 40 nm or less is cut by a filter or the like. This is because the optical glass (lens) to be bonded is colored by ultraviolet rays having a wavelength of 340 nm or less, and the characteristics of the ultraviolet curable adhesive itself are deteriorated.
【００１９】図３から明らかなように、従来技術に基づ
く第３の光学サンプルにおいては、照射時間が５００時
間経過した後着色が観測され、透過率は指数関数的に低
下している。一方、本発明に係る第１の光学サンプル
（酸化シリコン膜使用）においては、照射時間が１００
０時間経過後も着色が観測されず、透過率の低下も２％
以内となっている。さらに２０００時間経過後も透過率
の低下は５％以内であり、例えば、露光装置の投影レン
ズとしても十分実用可能であるという評価が得られた。
また、本発明に係る第２の光学サンプル（フッ化マグネ
シウム膜使用）においては、照射時間が１４００時間経
過後も着色が観測されず、透過率の低下も４％以内とな
っており、第３の光学サンプルと比較して良好な結果が
得られた。As is apparent from FIG. 3, in the third optical sample based on the prior art, coloring was observed after the irradiation time of 500 hours, and the transmittance decreased exponentially. On the other hand, in the first optical sample (using a silicon oxide film) according to the present invention, the irradiation time is 100
No coloring was observed even after 0 hour, and the decrease in transmittance was 2%.
It is within. Furthermore, the decrease in transmittance was within 5% even after 2000 hours, and it was evaluated that it can be sufficiently used as a projection lens for an exposure apparatus, for example.
In the second optical sample (using a magnesium fluoride film) according to the present invention, no coloring was observed even after the irradiation time of 1400 hours, and the decrease in transmittance was within 4%. Good results were obtained in comparison with the optical sample of.
【００２０】[0020]
【発明の効果】以上説明したとおり、本発明は、光学ガ
ラス（レンズ等）と紫外線硬化性接着剤との間に酸化シ
リコン膜を形成したので、光学ガラス（レンズ等）と光
学用接着剤である紫外線硬化性接着剤とが直接接触する
ことなく、複数の光学ガラス（レンズ等）を接合するこ
とが可能となり、紫外線を長時間照射する場合において
も被照射物表面での紫外線照度が低下しない紫外線照射
装置用光学レンズを得ることができる。As described above, according to the present invention, since the silicon oxide film is formed between the optical glass (lens or the like) and the ultraviolet curable adhesive, the optical glass (lens or the like) and the optical adhesive are used. It is possible to bond multiple optical glasses (lenses, etc.) without direct contact with a certain UV curable adhesive, and the UV illuminance on the surface of the irradiated object does not decrease even when UV irradiation is performed for a long time. An optical lens for an ultraviolet irradiation device can be obtained.
【図１】本発明の実施例である光学レンズの構成の一例
を示す図である。FIG. 1 is a diagram showing an example of a configuration of an optical lens that is an embodiment of the present invention.
【図２】本発明ならびに従来技術に基づき製作されたサ
ンプルを示す図である。FIG. 2 is a diagram showing a sample manufactured according to the present invention and the prior art.
【図３】本発明ならびに従来技術に基づき製作されたサ
ンプルの紫外線透過率の経時的変化を示す図である。FIG. 3 is a graph showing changes with time in ultraviolet transmittance of samples manufactured according to the present invention and the prior art.
【図４】紫外線光源から放射される紫外線の分光分布を
示す図である。FIG. 4 is a diagram showing a spectral distribution of ultraviolet rays emitted from an ultraviolet light source.
【図５】従来の投影レンズとして使用される光学レンズ
の製作方法の例を示す図である。FIG. 5 is a diagram showing an example of a method of manufacturing an optical lens used as a conventional projection lens.
１０ 平凸レンズ ｄ 形成層の厚さ ２０ 紫外線硬化性接着剤 ３０ 平凹レンズ ４１ 第１の薄層 ４２ 第２の薄層 10 Plano-Convex Lens d Thickness of Formation Layer 20 UV-Curable Adhesive 30 Plano-Concave Lens 41 First Thin Layer 42 Second Thin Layer
Claims (3)
よって接合することにより構成される紫外線照射装置用
光学レンズであって、 各光学ガラスと紫外線硬化性接着剤の間に誘電体膜を形
成したことを特徴とする紫外線照射装置用光学レンズ。1. An optical lens for an ultraviolet irradiation device, comprising a plurality of optical glasses bonded together by an ultraviolet curable adhesive, wherein a dielectric film is formed between each optical glass and the ultraviolet curable adhesive. An optical lens for an ultraviolet irradiation device, which is characterized in that
を特徴とする紫外線照射装置用光学レンズ。2. An optical lens for an ultraviolet irradiation device, wherein the dielectric film is a silicon oxide film.
ることを特徴とする紫外線照射装置用光学レンズ。3. An optical lens for an ultraviolet irradiation device, wherein the dielectric film is a magnesium fluoride film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25577495A JP3238617B2 (en) | 1995-09-08 | 1995-09-08 | Optical lens for ultraviolet irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25577495A JP3238617B2 (en) | 1995-09-08 | 1995-09-08 | Optical lens for ultraviolet irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0980207A true JPH0980207A (en) | 1997-03-28 |
| JP3238617B2 JP3238617B2 (en) | 2001-12-17 |
Family
ID=17283446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25577495A Expired - Fee Related JP3238617B2 (en) | 1995-09-08 | 1995-09-08 | Optical lens for ultraviolet irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3238617B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0895113A2 (en) * | 1997-08-01 | 1999-02-03 | Carl Zeiss | Optical mount with UV curable adhesive and protective coating |
-
1995
- 1995-09-08 JP JP25577495A patent/JP3238617B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0895113A2 (en) * | 1997-08-01 | 1999-02-03 | Carl Zeiss | Optical mount with UV curable adhesive and protective coating |
| EP0895113A3 (en) * | 1997-08-01 | 1999-12-15 | Carl Zeiss | Optical mount with UV curable adhesive and protective coating |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3238617B2 (en) | 2001-12-17 |
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