JPH09316656A - Formation of insulated coating on grain-oriented silicon steel sheet excellent in coating adhesion - Google Patents
Formation of insulated coating on grain-oriented silicon steel sheet excellent in coating adhesionInfo
- Publication number
- JPH09316656A JPH09316656A JP14975196A JP14975196A JPH09316656A JP H09316656 A JPH09316656 A JP H09316656A JP 14975196 A JP14975196 A JP 14975196A JP 14975196 A JP14975196 A JP 14975196A JP H09316656 A JPH09316656 A JP H09316656A
- Authority
- JP
- Japan
- Prior art keywords
- annealing
- steel sheet
- grain
- adhesion
- insulating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemical Treatment Of Metals (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、フォルステライト
皮膜のない方向性電磁鋼板表面上、さらには鏡面ないし
はそれに近い状態に調整した仕上げ焼鈍後の方向性電磁
鋼板に、張力付加型の絶縁皮膜を形成したさいの密着性
の優れた絶縁皮膜形成方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention provides a tension-added insulating film on the surface of a grain-oriented electrical steel sheet having no forsterite coating, and further on the grain-oriented electrical steel sheet after finish annealing adjusted to a mirror surface or a state close thereto. The present invention relates to a method for forming an insulating film having excellent adhesiveness when formed.
【０００２】[0002]
【従来の技術】一方向性電磁鋼板は磁気鉄芯材料として
多用されており、特にエネルギーロスを少なくするため
に鉄損の少ない材料が求められている。一般に、鉄損の
低減は鋼板に張力を付与することが有効であることが知
られている。鋼板に張力を付与するためには、鋼板より
熱膨張係数の小さい材質からなる皮膜を高温で形成する
ことが有効である。仕上げ焼鈍工程では鋼板表面の酸化
物と焼鈍分離剤とが反応して生成するフォルステライト
皮膜は、鋼板に張力を与えることができ、皮膜密着性も
優れている。2. Description of the Related Art Unidirectional electrical steel sheets are widely used as a magnetic iron core material, and in particular, a material having a low iron loss is required to reduce energy loss. It is generally known that applying a tension to a steel sheet is effective for reducing iron loss. In order to apply tension to the steel sheet, it is effective to form a film made of a material having a smaller coefficient of thermal expansion than the steel sheet at a high temperature. In the finish annealing step, the forsterite film formed by the reaction between the oxide on the surface of the steel plate and the annealing separator can give tension to the steel plate and has excellent film adhesion.
【０００３】さらに、特開昭４８−３９３３８号公報で
開示されたコロイド状シリカ、燐酸塩、クロム酸塩から
なるコーティング液を焼き付けることによって絶縁皮膜
を形成する方法は、鋼板に対する張力付与の効果が大き
く、鉄損低減に有効である。したがって、仕上げ焼鈍工
程で生じた皮膜を残した上で、上記のような張力性の絶
縁コーティングを施すことが一般的な方向性電磁鋼板の
製造方法となっている。Further, the method of forming an insulating film by baking a coating liquid composed of colloidal silica, phosphate and chromate disclosed in Japanese Patent Laid-Open No. 48-39338 has the effect of applying tension to a steel sheet. Large and effective in reducing iron loss. Therefore, a general method for producing a grain-oriented electrical steel sheet is to leave the film produced in the finish annealing step and then apply the above-described tensile insulating coating.
【０００４】一方、フォルステライト系皮膜と地鉄の乱
れた界面構造が、鉄損に対する皮膜張力効果をある程度
相殺していることが判明してきた。そこで、例えば特開
昭４９−９６９２０号公報に開示されているごとく、仕
上げ焼鈍工程で生ずるフォルステライト質皮膜を除いた
り、さらに鏡面化仕上げを行った後、張力皮膜を改めて
形成することにより、さらなる鉄損低減を試みる技術が
開発された。On the other hand, it has been found that the disordered interfacial structure between the forsterite coating and the base steel cancels out the coating tension effect on iron loss to some extent. Therefore, for example, as disclosed in Japanese Patent Laid-Open No. 49-96920, by removing the forsterite film produced in the finish annealing step, further performing mirror finishing, and then forming a tension film again, A technology was developed to try to reduce iron loss.
【０００５】しかしながら、このような鏡面状の鋼板の
上に絶縁皮膜を施したさいの皮膜密着性は、一般にフォ
ルステライト系皮膜の上に絶縁皮膜を施した場合よりも
悪く、剥離が生じる。鏡面への絶縁皮膜密着性確保に関
する従来技術としては、特開平５−２７９７４７号公報
に示されるごとく鋼板表面と絶縁皮膜の間に、焼鈍によ
り中間層としてＳｉＯ2 を形成する方法等が存在する。
しかし、工業的には工程増によるコストが上昇し、かつ
生産性も劣化するという問題点があった。However, the film adhesion when an insulating film is formed on such a mirror-finished steel plate is generally worse than when an insulating film is formed on a forsterite film, and peeling occurs. As a conventional technique for securing the adhesion of the insulating coating to the mirror surface, there is a method of forming SiO 2 as an intermediate layer by annealing between the steel sheet surface and the insulating coating, as disclosed in JP-A-5-279747.
However, industrially, there are problems that the cost increases due to the increase in the number of processes and the productivity also deteriorates.
【０００６】[0006]
【発明が解決しようとする課題】上記に鑑み本発明は、
フォルステライト皮膜のない方向性電磁鋼板表面上に、
密着性の優れた方向性電磁鋼板の絶縁皮膜を、安価に形
成する手段を提供するものである。In view of the above, the present invention is
On the surface of grain-oriented electrical steel sheet without forsterite film,
The present invention provides a means for inexpensively forming an insulating coating of a grain-oriented electrical steel sheet having excellent adhesion.
【０００７】[0007]
【課題を解決するための手段】本発明は前記課題を解決
するものであって、密着性の優れた方向性電磁鋼板の絶
縁皮膜形成方法において、最終仕上げ焼鈍工程でのフォ
ルステライト皮膜を除去するかもしくはその生成を防止
した鋼板に、絶縁皮膜形成剤成分を塗布し、焼鈍温度を
Ｔ（℃）、焼鈍時間をｔ（ｍｉｎ）とすると、４００≦
Ｔ≦１３００、ｔ≧ｅｘｐ（（９２５−Ｔ）／１０８）
の範囲で焼鈍を実施することを特徴とする皮膜密着性の
優れた方向性電磁鋼板の絶縁皮膜形成方法である。ここ
において絶縁皮膜形成剤成分として燐酸塩とコロイド状
シリカを主成分とすること、上記焼鈍に先立ち、仮焼き
付けのさいの焼鈍の温度を６００℃以下とすることも特
徴とする。Means for Solving the Problems The present invention is to solve the above problems and removes the forsterite film in the final finishing annealing step in the method for forming an insulating film of a grain-oriented electrical steel sheet having excellent adhesion. Alternatively, when an insulating film forming agent component is applied to a steel sheet whose formation is prevented and the annealing temperature is T (° C.) and the annealing time is t (min), 400 ≦
T ≦ 1300, t ≧ exp ((925-T) / 108)
Is a method of forming an insulating coating on a grain-oriented electrical steel sheet having excellent coating adhesion, which is characterized in that annealing is performed in the range. Here, it is also characterized in that phosphate and colloidal silica are contained as main components as the insulating film forming agent, and that the annealing temperature during pre-baking is set to 600 ° C. or lower prior to the annealing.
【０００８】[0008]
【発明の実施の形態】以下、本発明を詳細に説明する。
本発明者らは、フォルステライト皮膜のない鋼板上に密
着性の優れた絶縁皮膜を形成するため、以下のような試
験を行った。試料材は、約３％Ｓｉを含有する０．２３
ｍｍ板厚の冷延板を、特開平７−１１８７５０号公報で
示されているごとく、Ｆｅ系酸化物の生成しない酸化度
の雰囲気ガス中で脱炭焼鈍を行い、焼鈍分離剤としてア
ルミナを用いることにより、最終仕上げ焼鈍においてフ
ォルステライト皮膜がなくかつ鏡面に近い状態に達成し
た素材を用いた。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below.
The present inventors conducted the following tests in order to form an insulating film having excellent adhesion on a steel plate having no forsterite film. The sample material is 0.23 containing about 3% Si.
As shown in JP-A-7-118750, a cold-rolled sheet having a thickness of mm is subjected to decarburization annealing in an atmosphere gas having an oxidation degree that does not produce Fe-based oxide, and alumina is used as an annealing separator. As a result, a material was used that had no forsterite film in the final finish annealing and was in a state close to a mirror surface.
【０００９】焼鈍分離剤を除去するための水洗を行った
後、燐酸塩とコロイド状シリカを主成分とする絶縁皮膜
液を、溝付きゴムロール液で片面当たり４．５ｇ／ｍ2
塗布し、８００℃で種々の時間焼鈍を行った。焼鈍後の
絶縁皮膜密着性を、曲げ試験により評価した結果につい
て表１に示す。評価基準は表２に示す通りである。焼鈍
時間５分以上で、絶縁皮膜密着性が向上する。After washing with water to remove the annealing separator, an insulating coating solution containing phosphate and colloidal silica as main components was applied to a grooved rubber roll solution at 4.5 g / m 2 per side.
It was applied and annealed at 800 ° C. for various times. Table 1 shows the results of evaluating the adhesion of the insulating film after annealing by a bending test. The evaluation criteria are as shown in Table 2. When the annealing time is 5 minutes or more, the insulating film adhesion is improved.
【００１０】[0010]
【表１】 [Table 1]
【００１１】[0011]
【表２】 [Table 2]
【００１２】焼鈍時間増加により皮膜密着性が良好とな
る理由は、絶縁皮膜−地鉄間の密着性にあずかる原子間
の結合数が増加し、張力付与型の絶縁皮膜形成に耐えう
るためと推察される。したがって、本発明で示した効果
は絶縁皮膜形成剤成分が燐酸塩とコロイド状シリカを主
成分するものに限ったものではなく、実施例１に示すご
とく他の成分系においても適用可能である。It is speculated that the reason why the film adhesion is improved by increasing the annealing time is that the number of interatomic bonds involved in the adhesion between the insulating film and the base iron increases, so that the film can withstand the formation of a tension-type insulating film. To be done. Therefore, the effects shown in the present invention are not limited to those in which the insulating film forming agent component is mainly composed of phosphate and colloidal silica, but can be applied to other component systems as shown in Example 1.
【００１３】次に焼鈍温度、焼鈍時間を変化させ、絶縁
皮膜密着性を調査した。素材は上記と同じフォルステラ
イト皮膜のない材料を用い、焼鈍分離剤を除去するため
の水洗を行った後、燐酸塩とコロイド状シリカを主成分
とする絶縁皮膜液を、溝付きゴムロール液で片面当たり
４．５ｇ／ｍ2 塗布した。結果を図１に示す。皮膜密着
性評価は表２に示す通りである。Next, the insulating film adhesion was investigated by changing the annealing temperature and the annealing time. The same material as above without a forsterite film was used, and after washing with water to remove the annealing separator, the insulating film liquid containing phosphate and colloidal silica as the main components was coated with a grooved rubber roll liquid on one side. 4.5 g / m 2 was applied. The results are shown in FIG. The film adhesion evaluation is as shown in Table 2.
【００１４】焼鈍温度の上昇に伴い皮膜密着性良好域は
短時間側に拡大する。その理由は、絶縁皮膜−地鉄間の
密着性にあずかる原子間の結合の数は、焼鈍温度上昇に
伴い指数関数的に増加するからである。なお、焼鈍温度
の下限を４００℃とした理由は、４００℃未満では皮膜
と鋼板の熱膨張係数差による鋼板への張力付与効果が小
さくなるためであり、上限を１３００℃としたのは、１
３００℃を超えると鋼板の軟化が著しくなるからであ
る。図中に示す密着性良好域は、焼鈍温度をＴ（℃）、
焼鈍時間をｔ（ｍｉｎ）とすると、４００≦Ｔ≦１３０
０、ｔ≧ｅｘｐ（（９２５−Ｔ）／１０８）で表される
ため、本発明範囲を以上の領域とした。As the annealing temperature rises, the good film adhesion region expands to the short time side. The reason for this is that the number of bonds between atoms, which participate in the adhesion between the insulating film and the base metal, increases exponentially as the annealing temperature rises. The reason why the lower limit of the annealing temperature is set to 400 ° C is that the effect of applying tension to the steel sheet due to the difference in thermal expansion coefficient between the coating and the steel sheet becomes smaller at less than 400 ° C, and the upper limit is set to 1300 ° C.
This is because if the temperature exceeds 300 ° C, the steel sheet will be significantly softened. In the good adhesion region shown in the figure, the annealing temperature is T (° C),
Assuming that the annealing time is t (min), 400 ≦ T ≦ 130
0, t ≧ exp ((925-T) / 108), so the scope of the present invention is set to the above range.
【００１５】以上の焼鈍領域は、焼鈍温度低下に伴い焼
鈍時間を長くする必要があるため（例えば８００℃では
約３分以上）、比較的低温で絶縁皮膜形成液を連続焼鈍
炉において焼き付けるのは生産性の点で好ましくない。
したがって、比較的低温で絶縁皮膜を形成するための焼
き付け焼鈍は、バッチ焼鈍炉内で実施されることが好ま
しい。このとき、バッチ焼鈍に先んじて連続焼鈍炉によ
る皮膜形成剤の乾燥あるいは仮焼き付けが実施される。
絶縁皮膜形成剤成分が燐酸塩とコロイド状シリカを主成
分とする系について、連続焼鈍での仮焼き付け温度につ
いて調査を行った。In the above-mentioned annealing region, it is necessary to lengthen the annealing time as the annealing temperature is lowered (for example, at 800 ° C. for about 3 minutes or more), so that the insulating film forming liquid is baked in a continuous annealing furnace at a relatively low temperature. It is not preferable in terms of productivity.
Therefore, the baking annealing for forming the insulating film at a relatively low temperature is preferably carried out in a batch annealing furnace. At this time, prior to the batch annealing, the film forming agent is dried or calcined in a continuous annealing furnace.
The calcination temperature in continuous annealing was investigated for the system in which the insulating film forming agent component is mainly composed of phosphate and colloidal silica.
【００１６】素材は、最終仕上げ焼鈍においてフォルス
テライト皮膜がなくかつ鏡面に近い状態を達成した鋼板
を用いた。水洗後、燐酸塩とコロイド状シリカを主成分
とする絶縁皮膜液を溝付きゴムロール液で片面当たり
４．５ｇ／ｍ2 塗布し、種々の温度にて１２０ｓの焼鈍
を行った。絶縁皮膜を燐酸塩とコロイド状シリカを主成
分とする組成に限定した理由は、方向性電磁鋼板の張力
型絶縁皮膜として広く一般的に使用されているからであ
る。The material used was a steel plate that had no forsterite film in the final finish annealing and achieved a state close to a mirror surface. After washing with water, an insulating film liquid containing phosphate and colloidal silica as main components was applied with a grooved rubber roll liquid at 4.5 g / m 2 per side and annealed at various temperatures for 120 s. The reason why the insulating coating is limited to a composition containing phosphate and colloidal silica as main components is that it is widely and generally used as a tension type insulating coating for grain-oriented electrical steel sheets.
【００１７】連続焼鈍直後の絶縁皮膜密着性試験結果を
図２に示す。皮膜密着性評価基準は表２に示す通りであ
る。焼き付け温度６００℃以下で皮膜密着性が良好であ
る。焼き付け温度６００℃以下で皮膜密着性が向上する
理由は、絶縁皮膜−地鉄間の熱膨張係数の差によって鋼
板に付与される張力が小さいためと推定される。しかし
ながら、次に行うバッチ焼鈍により鋼板への張力付与効
果は十分に確保できるので、本発明による皮膜形成法
は、張力による鉄損低減効果が十分に獲得できるもので
ある。The results of the insulating film adhesion test immediately after continuous annealing are shown in FIG. The film adhesion evaluation criteria are as shown in Table 2. Good film adhesion at a baking temperature of 600 ° C or lower. It is presumed that the reason why the film adhesion is improved at a baking temperature of 600 ° C. or lower is that the tension applied to the steel sheet is small due to the difference in the thermal expansion coefficient between the insulating film and the base iron. However, since the effect of applying tension to the steel sheet can be sufficiently ensured by the subsequent batch annealing, the film forming method according to the present invention can sufficiently obtain the effect of reducing iron loss due to tension.
【００１８】[0018]
実施例１ 試料材は、約３％Ｓｉを含有する０．２３ｍｍ板厚の冷
延板を、Ｆｅ系酸化物の生成しない酸化度の雰囲気ガス
中で脱炭焼鈍を行い、焼鈍分離剤としてアルミナを用い
ることにより、最終仕上げ焼鈍において鏡面に近い状態
に達成した材料を用いた。Example 1 As a sample material, a 0.23 mm-thick cold-rolled sheet containing about 3% Si was decarburized and annealed in an atmosphere gas having an oxidation degree that does not generate Fe-based oxides, and alumina was used as an annealing separator. By using, the material that achieved a state close to a mirror surface in the final finish annealing was used.
【００１９】水洗により焼鈍分離剤除去後、Ａｌ2 Ｏ3
ゾル４００ｇ、ＨＢＯ3 １００ｇから成る塗布液を鋼板
に溝付きゴムロール液で片面当たり４．０ｇ／ｍ2 塗布
した後、皮膜形成のため所定の温度・時間でバッチ焼鈍
を行った。結果を表３に示す。皮膜密着性評価基準は表
２に示す通りである。表３に示すごとく、焼鈍時間ｔ
（ｍｉｎ）≧ｅｘｐ（（９２５−Ｔ）／１０８）、Ｔ＝
６００、８００、１０００にて示される時間以上で皮膜
密着性が良好となる。After removing the annealing separator by washing with water, Al 2 O 3
A coating liquid consisting of 400 g of sol and 100 g of HBO 3 was applied to a steel plate with a grooved rubber roll liquid at 4.0 g / m 2 per side, and then batch annealing was performed at a predetermined temperature and time for forming a film. The results are shown in Table 3. The film adhesion evaluation criteria are as shown in Table 2. As shown in Table 3, the annealing time t
(Min) ≧ exp ((925−T) / 108), T =
When the time is 600, 800 or 1000 or more, the film adhesion becomes good.
【００２０】[0020]
【表３】 [Table 3]
【００２１】実施例２ 実施例１と同様の素材を用い、水洗により焼鈍分離剤除
去後、絶縁皮膜形成液として、２０％コロイド状シリカ
１００ｍｌ、５０％燐酸アルミニウム溶液１００ｍｌ、
無水クロム酸５ｇからなる処理液を、溝付きゴムロール
液で片面当たり４．５ｇ／ｍ2 塗布し、種々の温度で１
２０秒間、皮膜の仮焼き付けのため連続焼鈍を行った。
連続焼鈍直後の皮膜密着性試験結果を表４に示す。評価
基準は表２に示す通りである。表４に示すごとく、６０
０℃以下の温度での連続焼鈍により皮膜密着性が良好と
なる。Example 2 Using the same material as in Example 1, after removing the annealing separator by washing with water, 100 ml of 20% colloidal silica and 100 ml of 50% aluminum phosphate solution were prepared as an insulating film forming liquid.
A treatment liquid consisting of 5 g of chromic anhydride was coated with a grooved rubber roll liquid at 4.5 g / m 2 on each side,
Continuous annealing was performed for 20 seconds to pre-bak the coating.
Table 4 shows the results of the film adhesion test immediately after continuous annealing. The evaluation criteria are as shown in Table 2. As shown in Table 4, 60
Successive annealing at a temperature of 0 ° C. or lower improves the film adhesion.
【００２２】[0022]
【表４】 [Table 4]
【００２３】また、６００℃で仮焼き付けした材料につ
いて、さらに所定の温度・時間でバッチ焼鈍を行い、絶
縁皮膜を完全に形成させた。その結果を表５に示す。皮
膜密着性評価基準は表２に示す通りである。表５に示す
ごとく、焼鈍時間ｔ（ｍｉｎ）≧ｅｘｐ（（９２５−
Ｔ）／１０８）、Ｔ＝７００、８００、９００にて示さ
れる時間以上で皮膜密着性が良好となる。Further, the material pre-baked at 600 ° C. was further batch-annealed at a predetermined temperature and time to completely form an insulating film. The results are shown in Table 5. The film adhesion evaluation criteria are as shown in Table 2. As shown in Table 5, the annealing time t (min) ≧ exp ((925-
T) / 108), T = 700, 800, 900 or more, the film adhesion becomes good.
【００２４】[0024]
【表５】 [Table 5]
【００２５】実施例３ 実施例１と同様の素材を用い、水洗により焼鈍分離剤除
去後、絶縁皮膜形成液として、２０％コロイド状シリカ
１００ｍｌ、５０％燐酸アルミニウム溶液１００ｍｌ、
無水クロム酸５ｇからなる処理液を、溝付きゴムロール
液で片面当たり４．５ｇ／ｍ2 塗布した後、皮膜形成の
ため焼鈍温度、焼鈍時間、昇温速度を変化させて絶縁皮
膜焼き付けのためバッチ焼鈍を行った。連続焼鈍直後の
皮膜密着性試験結果を表６に示す。評価基準は表２に示
す通りである。表６に示すごとく、６００℃以下の温度
での連続焼鈍により皮膜密着性が良好となる。Example 3 Using the same material as in Example 1, after removing the annealing separator by washing with water, 100 ml of 20% colloidal silica and 100 ml of 50% aluminum phosphate solution were used as an insulating film forming liquid.
After applying a treatment liquid consisting of 5 g of chromic acid anhydride with a grooved rubber roll liquid at 4.5 g / m 2 per side, change the annealing temperature, annealing time and temperature rising rate to form a film, and then batch for insulating film baking. It was annealed. Table 6 shows the results of the film adhesion test immediately after continuous annealing. The evaluation criteria are as shown in Table 2. As shown in Table 6, the film adhesion is improved by continuous annealing at a temperature of 600 ° C. or lower.
【００２６】[0026]
【表６】 [Table 6]
【００２７】また、６００℃で仮焼き付けした材料につ
いて、さらに所定の温度・昇温速度で２時間バッチ焼鈍
を行い、絶縁皮膜を完全に形成させた。その結果を表７
に示す。表７に示すごとく、焼鈍温度５００℃以上、昇
温速度１℃／ｓ以下の焼鈍を施すことにより皮膜密着性
が良好となる。Further, the material pre-baked at 600 ° C. was further batch-annealed at a predetermined temperature and a heating rate for 2 hours to completely form an insulating film. Table 7 shows the results.
Shown in As shown in Table 7, film adhesion is improved by annealing at an annealing temperature of 500 ° C. or higher and a temperature rising rate of 1 ° C./s or lower.
【００２８】[0028]
【表７】 [Table 7]
【００２９】[0029]
【発明の効果】本発明は、フォルステライト皮膜のない
方向性電磁鋼板表面上に、密着性の優れた方向性電磁鋼
板の絶縁皮膜を形成する手段を提供するものである。し
たがって、張力性絶縁皮膜による鉄損減少効果を最大限
に発揮させるものであり、その工業的効果は甚大であ
る。The present invention provides means for forming an insulating coating of a grain-oriented electrical steel sheet having excellent adhesion on a grain-oriented electrical steel sheet surface without a forsterite coating. Therefore, the effect of reducing the iron loss by the tensile insulating film is maximized, and the industrial effect thereof is great.
【図１】絶縁皮膜を完全に形成するための焼鈍温度、焼
鈍時間と、焼き付け後の皮膜密着性の関係を示すグラフFIG. 1 is a graph showing a relationship between an annealing temperature and an annealing time for completely forming an insulating film and film adhesion after baking.
【図２】絶縁皮膜を形成するための焼鈍に先んじて実施
される、仮焼き付けのための連続焼鈍の温度と、連続焼
鈍直後の絶縁皮膜密着性を示すグラフFIG. 2 is a graph showing the temperature of continuous annealing for pre-baking, which is performed prior to the annealing for forming the insulating film, and the adhesion of the insulating film immediately after the continuous annealing.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 藤井 浩康 北九州市戸畑区飛幡町１−１ 新日本製鐵 株式会社八幡製鉄所内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Hiroyasu Fujii 1-1 Tobata-cho, Tobata-ku, Kitakyushu City Inside Nippon Steel Co., Ltd. Yawata Works
Claims (3)
膜形成方法において、最終仕上げ焼鈍工程でのフォルス
テライト皮膜を除去するかもしくはその生成を防止した
鋼板に、絶縁皮膜形成剤成分を塗布し、焼鈍温度をＴ
（℃）、焼鈍時間をｔ（ｍｉｎ）とすると、４００≦Ｔ
≦１３００、ｔ≧ｅｘｐ（（９２５−Ｔ）／１０８）の
範囲で焼鈍を実施することを特徴とする皮膜密着性の優
れた方向性電磁鋼板の絶縁皮膜形成方法。1. A method for forming an insulating film on a grain-oriented electrical steel sheet having excellent adhesion, wherein the insulating film forming agent component is applied to the steel plate from which the forsterite film is removed or prevented from being produced in the final finish annealing step. The annealing temperature to T
(C) and annealing time t (min), 400 ≦ T
An insulating coating forming method for a grain-oriented electrical steel sheet having excellent coating adhesion, which comprises performing annealing in a range of ≤1300 and t≥exp ((925-T) / 108).
イド状シリカを主成分とすることを特徴とする請求項１
記載の皮膜密着性の優れた方向性電磁鋼板の絶縁皮膜形
成方法。2. A phosphoric acid salt and colloidal silica as a main component as an insulating film forming agent component.
A method for forming an insulating film of a grain-oriented electrical steel sheet having excellent film adhesion as described.
付けのさいの焼鈍の温度を６００℃以下とすることを特
徴とする請求項１または２記載の皮膜密着性の優れた方
向性電磁鋼板の絶縁皮膜形成方法。3. A directional electromagnetic having excellent film adhesion according to claim 1 or 2, characterized in that the annealing temperature during pre-baking is set to 600 ° C. or lower prior to the annealing shown in claim 1. Method for forming insulating film on steel sheet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14975196A JPH09316656A (en) | 1996-05-22 | 1996-05-22 | Formation of insulated coating on grain-oriented silicon steel sheet excellent in coating adhesion |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14975196A JPH09316656A (en) | 1996-05-22 | 1996-05-22 | Formation of insulated coating on grain-oriented silicon steel sheet excellent in coating adhesion |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09316656A true JPH09316656A (en) | 1997-12-09 |
Family
ID=15481964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14975196A Pending JPH09316656A (en) | 1996-05-22 | 1996-05-22 | Formation of insulated coating on grain-oriented silicon steel sheet excellent in coating adhesion |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09316656A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8043698B2 (en) | 2004-08-03 | 2011-10-25 | The Furukawa Electric Co., Ltd. | Method of producing a semiconductor device, and wafer-processing tape |
| WO2020149321A1 (en) * | 2019-01-16 | 2020-07-23 | 日本製鉄株式会社 | Method for manufacturing grain-oriented electrical steel sheet |
| WO2020149323A1 (en) * | 2019-01-16 | 2020-07-23 | 日本製鉄株式会社 | Method for manufacturing grain-oriented electrical steel sheet |
| WO2020149326A1 (en) * | 2019-01-16 | 2020-07-23 | 日本製鉄株式会社 | Method for manufacturing grain-oriented electrical steel sheet |
| JPWO2020149327A1 (en) * | 2019-01-16 | 2021-11-25 | 日本製鉄株式会社 | Manufacturing method of grain-oriented electrical steel sheet |
-
1996
- 1996-05-22 JP JP14975196A patent/JPH09316656A/en active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8043698B2 (en) | 2004-08-03 | 2011-10-25 | The Furukawa Electric Co., Ltd. | Method of producing a semiconductor device, and wafer-processing tape |
| WO2020149321A1 (en) * | 2019-01-16 | 2020-07-23 | 日本製鉄株式会社 | Method for manufacturing grain-oriented electrical steel sheet |
| WO2020149323A1 (en) * | 2019-01-16 | 2020-07-23 | 日本製鉄株式会社 | Method for manufacturing grain-oriented electrical steel sheet |
| WO2020149326A1 (en) * | 2019-01-16 | 2020-07-23 | 日本製鉄株式会社 | Method for manufacturing grain-oriented electrical steel sheet |
| CN113272453A (en) * | 2019-01-16 | 2021-08-17 | 日本制铁株式会社 | Method for producing grain-oriented electromagnetic steel sheet |
| CN113286901A (en) * | 2019-01-16 | 2021-08-20 | 日本制铁株式会社 | Method for producing grain-oriented electromagnetic steel sheet |
| KR20210110865A (en) * | 2019-01-16 | 2021-09-09 | 닛폰세이테츠 가부시키가이샤 | Method for manufacturing grain-oriented electrical steel sheet |
| KR20210111803A (en) * | 2019-01-16 | 2021-09-13 | 닛폰세이테츠 가부시키가이샤 | Method for manufacturing grain-oriented electrical steel sheet |
| JPWO2020149321A1 (en) * | 2019-01-16 | 2021-11-25 | 日本製鉄株式会社 | Manufacturing method of grain-oriented electrical steel sheet |
| JPWO2020149327A1 (en) * | 2019-01-16 | 2021-11-25 | 日本製鉄株式会社 | Manufacturing method of grain-oriented electrical steel sheet |
| JPWO2020149323A1 (en) * | 2019-01-16 | 2021-11-25 | 日本製鉄株式会社 | Manufacturing method of grain-oriented electrical steel sheet |
| JPWO2020149326A1 (en) * | 2019-01-16 | 2021-12-02 | 日本製鉄株式会社 | Manufacturing method of grain-oriented electrical steel sheet |
| RU2768094C1 (en) * | 2019-01-16 | 2022-03-23 | Ниппон Стил Корпорейшн | Method for producing electrotechnical steel sheet with oriented grain structure |
| RU2771318C1 (en) * | 2019-01-16 | 2022-04-29 | Ниппон Стил Корпорейшн | Method for producing electrical steel sheet with oriented grain structure |
| EP3913073A4 (en) * | 2019-01-16 | 2022-09-21 | Nippon Steel Corporation | Method for manufacturing grain-oriented electrical steel sheet |
| EP3913095A4 (en) * | 2019-01-16 | 2022-09-28 | Nippon Steel Corporation | Method for manufacturing grain-oriented electrical steel sheet |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2698003B2 (en) | Method for forming insulating film on unidirectional silicon steel sheet | |
| JP2664337B2 (en) | Method for forming insulating film on unidirectional silicon steel sheet | |
| JPH05279747A (en) | Formation of insulating film on grain oriented electrical steel sheet | |
| JP3930696B2 (en) | Unidirectional silicon steel sheet excellent in film adhesion of tension imparting insulating film and method for producing the same | |
| JPH05311453A (en) | Production of ultralow iron loss grain-oriented electrical steel sheet | |
| JPH05279864A (en) | Formation of insulated film for grain oriented silicon steel sheet | |
| JP3172025B2 (en) | Method for forming insulating film on unidirectional silicon steel sheet with good adhesion | |
| JPH09316656A (en) | Formation of insulated coating on grain-oriented silicon steel sheet excellent in coating adhesion | |
| JP2698501B2 (en) | Method for forming insulating film on unidirectional silicon steel sheet | |
| WO2020149337A1 (en) | Method for manufacturing grain-oriented electrical steel sheet | |
| JP4018878B2 (en) | Method for forming insulating coating on grain-oriented electrical steel sheet | |
| JP3178988B2 (en) | Method for forming insulating film on grain-oriented electrical steel sheet with excellent adhesion | |
| JPH1171683A (en) | Grain oriented silicon steel sheet having high-tension insulating coating film and its treatment | |
| JP4041289B2 (en) | Method for forming insulating coating on electrical steel sheet | |
| JP3272210B2 (en) | Method for forming insulating film on unidirectional silicon steel sheet | |
| JPH09209165A (en) | Formation of insulated film excellent in adhesion on grain-oriented silicon steel sheet | |
| JPS6332849B2 (en) | ||
| JP3461712B2 (en) | Unidirectional electrical steel sheet and method for forming insulating film on unidirectional electrical steel sheet | |
| JP3426959B2 (en) | Method for increasing tension of unidirectional electrical steel sheet coating | |
| JP3426958B2 (en) | Unidirectional electrical steel sheet and method for increasing tension of coating of unidirectional electrical steel sheet | |
| JP3148092B2 (en) | Method for manufacturing mirror-oriented electrical steel sheet with low iron loss | |
| JP3148094B2 (en) | Method for manufacturing mirror-oriented electrical steel sheet with low iron loss | |
| JP3280844B2 (en) | Method for forming insulating film on unidirectional silicon steel sheet | |
| JP3148093B2 (en) | Method for manufacturing mirror-oriented electrical steel sheet with low iron loss | |
| JP2579714B2 (en) | Method for forming insulating film on mirror-oriented silicon steel sheet |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20020924 |