JPH09285950A - Polishing device and polishing method - Google Patents
Polishing device and polishing methodInfo
- Publication number
- JPH09285950A JPH09285950A JP9664896A JP9664896A JPH09285950A JP H09285950 A JPH09285950 A JP H09285950A JP 9664896 A JP9664896 A JP 9664896A JP 9664896 A JP9664896 A JP 9664896A JP H09285950 A JPH09285950 A JP H09285950A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- pitch
- dresser
- polished
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
Description
【発明の詳細な説明】Detailed Description of the Invention
【０００１】[0001]
【発明の属する技術分野】本発明は、各種光学機械や精
密測定器械などに用いられる光学結晶や光学ガラスなど
を、精密に研磨加工するための研磨装置、及び研磨方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing apparatus and a polishing method for precisely polishing an optical crystal or optical glass used in various optical machines and precision measuring instruments.
【０００２】[0002]
【従来の技術】このような各種光学機械や精密測定器械
などに用いられる、例えばＫＮｂＯ3などの光学結晶や
光学ガラスなどは、非常に精密な精度が必要とされてお
り、光学結晶や光学ガラスを研磨加工する際には、その
研磨面の平坦度を、光の波長の四分の１以下にすること
が求められている。従来より、このような高い精度で光
学結晶や光学ガラスなどの被研磨材料を、アスファルト
や松脂などの樹脂を溶融して円盤状に成形したピッチ盤
を用いた研磨装置を用いて研磨することが行われてい
る。2. Description of the Related Art Optical crystals such as KNbO 3 and optical glass used in such various optical machines and precision measuring instruments are required to have extremely high precision. When polishing is carried out, it is required that the flatness of the polished surface be one-fourth or less of the wavelength of light. Conventionally, it is possible to polish a material to be polished such as an optical crystal or optical glass with such a high accuracy using a polishing apparatus using a pitch disk formed by melting a resin such as asphalt or pine resin into a disk shape. Has been done.
【０００３】図６及び図７に示したように、このような
研磨装置１００は、駆動モータ１０２の回転軸１０３に
ギアなど（図示せず）を介して接続されて回転駆動する
円盤状の回転テーブル１０４と、回転テーブル１０４の
上面に固着された円盤状のピッチ盤１０６を備えてい
る。また、研磨装置本体１０１には、被研磨材料Ａを保
持してピッチ盤１０６上に当接（押しつけ）して研磨す
る被研磨材料保持装置１０８と、研磨作業で摩耗したピ
ッチ盤１０６の上面を磨削してその平坦度を保つための
ドレッサー装置１１０が設けられている。なお、ピッチ
盤１０６の表面には、研磨の際の研磨材のトラップや研
磨屑を逃すために、同心円状に溝１０６Ａが形成されて
いる。As shown in FIGS. 6 and 7, such a polishing apparatus 100 is connected to a rotary shaft 103 of a drive motor 102 via a gear or the like (not shown) and is rotationally driven in a disk shape. A table 104 and a disk-shaped pitch disk 106 fixed to the upper surface of the rotary table 104 are provided. Further, the polishing apparatus main body 101 is provided with a polishing material holding apparatus 108 for holding the material A to be polished and abutting (pressing) it on the pitch plate 106 for polishing, and an upper surface of the pitch plate 106 worn by the polishing operation. A dresser device 110 for grinding and maintaining the flatness is provided. It should be noted that grooves 106A are concentrically formed on the surface of the pitch plate 106 in order to escape traps of polishing material and polishing debris during polishing.
【０００４】また、被研磨材料保持装置１０８には、被
研磨材料保持装置本体１０８Ａに固定された２本の保持
棒部材１０８Ｂの先端部に、回転ローラ１０８Ｃが設け
られており、この回転ローラ１０８Ｃが、リング状の被
研磨材料固定部材１０８Ｄの外周に設けられたガイド溝
１０８Ｅ内を回転可能に嵌着されている。そして、被研
磨材料Ａを被研磨材料固定部材１０８Ｄのリング内に固
定保持して、ピッチ盤１０６上に当接して研磨するよう
になっている。Further, in the material-to-be-polished holding device 108, a rotary roller 108C is provided at the tips of two holding rod members 108B fixed to the body 108A of the material-to-be-polished material holding device. Is rotatably fitted in a guide groove 108E provided on the outer circumference of the ring-shaped material-to-be-polished fixing member 108D. Then, the material A to be polished is fixedly held in the ring of the material-to-be-polished fixing member 108D, and abutted on the pitch plate 106 for polishing.
【０００５】一方、ドレッサー装置１１０には、円盤状
の金属製のブロック１１０Ｂの下面に円柱状の複数個の
ガラスからなるドレッサー部材１１０Ｃが接着されてお
り、ブロック１１０Ｂの上面中心にはブロック保持ネジ
部材１１０Ｄが回転可能にベアリング１１０Ｄ’を介し
て接続されている。そして、ブロック保持ネジ部材１１
０Ｄが、ドレッサー装置本体に１１０Ａに設けられた支
持部材１１０Ｅに螺合されて、ブロック保持ネジ部材１
１０Ｄの上部に設けられたハンドル部１１０Ｆを回転さ
せることによって、ブロック１１０Ｂを上下動させて、
その下面のドレッサー部材１１０Ｃをピッチ盤１０６に
当接させることによって、ピッチ盤１０６の平坦度を保
つためにピッチ盤１０６を磨削して、平坦性を修正する
ようになっている。なお、このブロック１１０Ｂは、モ
ータ１１０Ｆを介してローラ１１０Ｇによって回転する
ようになっている。On the other hand, in the dresser device 110, a dresser member 110C made of a plurality of columnar glasses is adhered to the lower surface of a disk-shaped metal block 110B, and a block holding screw is provided at the center of the upper surface of the block 110B. The member 110D is rotatably connected via a bearing 110D '. Then, the block holding screw member 11
0D is screwed into a support member 110E provided in 110A of the dresser device main body, and the block holding screw member 1
By rotating the handle portion 110F provided on the upper portion of 10D, the block 110B is moved up and down,
By bringing the dresser member 110C on the lower surface into contact with the pitch plate 106, the pitch plate 106 is ground to maintain the flatness of the pitch plate 106, and the flatness is corrected. The block 110B is adapted to be rotated by a roller 110G via a motor 110F.
【０００６】[0006]
【発明が解決しようとする課題】このような研磨装置１
００を用いて、被研磨材料Ａを研磨する場合には、図８
に示したように、ピッチ盤１０６を回転させることによ
って、その上に当接している被研磨材料Ａは、被研磨材
料固定部材１０８Ｄとともに引きづられて、回転ローラ
１０８Ｃで受けられて、被研磨材料固定部材１０８Ｄと
ともに自転するか、又は別途設けられたモータの回転駆
動力によって、回転ローラ１０８Ｃを回転させることに
よって、被研磨材料固定部材１０８Ｄ、すなわち被研磨
材料Ａを回転させるようになっている。そして、この状
態で、ピッチ盤１０６の上面に砥粒液を滴下することに
よって、研磨材である砥粒が、ピッチ盤１０６の表面に
くい込み、又はピッチ盤１０６の表面に漂って、被研磨
材料Ａの研磨面が研磨されるようになっている。SUMMARY OF THE INVENTION Such a polishing apparatus 1
00 to be used for polishing the material A to be polished,
As shown in FIG. 4, by rotating the pitch plate 106, the material A to be polished, which is in contact with the material, is dragged together with the material-to-be-polished fixing member 108D, received by the rotary roller 108C, and polished. The material-to-be-grounded fixing member 108D, that is, the material-to-be-polished A is rotated by rotating with the material fixing member 108D or by rotating the rotating roller 108C by the rotational driving force of a separately provided motor. . Then, in this state, by dropping an abrasive grain liquid onto the upper surface of the pitch plate 106, the abrasive grains, which are abrasives, are embedded in the surface of the pitch plate 106 or drift on the surface of the pitch plate 106, and the material to be polished is The polishing surface of A is polished.
【０００７】ところで、研磨が進行するにつれて、ピッ
チ盤１０６の表面も摩耗していくが、被研磨材料保持装
置１０８の加重が偏っている場合には、図９に示したよ
うに、ピッチ盤１０６の表面に、半径方向に窪み１０６
Ｂが生じるようになる。この場合、被研磨材料Ａの研磨
面は、接触するピッチ盤１０６の表面の形状が転写され
ていくことになるので、このような窪み１０６Ｂの発生
は被研磨材料Ａの研磨面の平坦度を低下させることにな
る。By the way, as the polishing progresses, the surface of the pitch plate 106 also wears, but when the weight of the material-holding device 108 for polishing is uneven, as shown in FIG. In the radial direction on the surface of the
B comes to occur. In this case, since the shape of the surface of the pitch plate 106 that is in contact is transferred to the polishing surface of the material A to be polished, the occurrence of such a dent 106B affects the flatness of the polishing surface of the material A to be polished. Will be lowered.
【０００８】従って、ドレッサー装置１１０のブロック
１１０Ｂを下降させて、その下面のドレッサー部材１１
０Ｃをピッチ盤１０６に当接させることによって、被研
磨材料Ａの研磨と同時に、ピッチ盤１０６を磨削して、
ピッチ盤１０６の表面の平坦性を修正するようになって
いる。Therefore, the block 110B of the dresser device 110 is lowered so that the dresser member 11 on the lower surface of the block 110B is lowered.
By bringing 0C into contact with the pitch plate 106, the pitch plate 106 is ground at the same time as the polishing of the material A to be polished,
The flatness of the surface of the pitch board 106 is modified.
【０００９】しかしながら、このような複数個のガラス
円柱からなるドレッサー部材１１０Ｃでは、ドレッサー
部材と接するピッチ盤１０６の表面の窪み１０６Ｂを全
て修正することは困難であり、図１０に示したように、
ドレッサー部材１１０Ｃがピッチ盤１０６の半径までの
領域のみ磨削することになるので、ドレッサー部材１１
０Ｃによる窪み１０６Ｃが生じて、直径方向に２つの窪
み、すなわち、ピッチ盤全体で見るとドーナッツ状の窪
みが生じることになって好ましくなかった。特に、ドレ
ッサーに偏加重が加わっている場合には、この窪み１０
６Ｃは大きくなってしまい、被研磨材料Ａの平坦性が損
なわれる原因となっている。However, in such a dresser member 110C composed of a plurality of glass cylinders, it is difficult to correct all the dents 106B on the surface of the pitch plate 106 which is in contact with the dresser member, and as shown in FIG.
Since the dresser member 110C only grinds the region up to the radius of the pitch plate 106, the dresser member 11
The cavities 106C due to 0C were generated, and two cavities in the diametrical direction, that is, donut-shaped cavities when viewed in the entire pitch board were generated, which was not preferable. Especially when the dresser is biased, the depression 10
6C becomes large, which is a cause of impairing the flatness of the material A to be polished.
【００１０】この問題を解消するために、ドレッサーを
ピッチ盤１０６の半径方向に揺動させることが考えられ
るが、揺動させるために複雑な揺動装置が必要となり好
ましくなかった。また、ドレッサーの直径をピッチ盤１
０６の半径以上の大きさとして、ピッチ盤１０６の表面
の窪み１０６Ｂを全て修正することが考えられるが、ド
レッサーのピッチ盤１０６上で占める領域が大きくな
り、被研磨材料Ａを研磨するために使用できる領域が小
さくなってしまい、被研磨材料固定部材１０８Ｄすなわ
ち、被研磨材料Ａの大きさが制約を受けることになり、
ドレッサ自体が大きく且つ重くなるので、取り扱いに不
便であった。In order to solve this problem, it is conceivable to swing the dresser in the radial direction of the pitch plate 106, but this is not preferable because a complicated swing device is required for swinging. Moreover, the diameter of the dresser is changed to the pitch machine 1
Although it is conceivable to correct all the dents 106B on the surface of the pitch plate 106 with a radius of 06 or more, the area occupied by the dresser on the pitch plate 106 becomes large and it is used for polishing the material A to be polished. The area that can be formed becomes small, and the size of the material to be polished fixing member 108D, that is, the material to be polished A is restricted,
Since the dresser itself is large and heavy, it is inconvenient to handle.
【００１１】また、このような従来の複数の円柱状のガ
ラスからなるドレッサー部材１１０Ｃでは、図１１及び
図１２に示したように、ピッチ盤１０６の表面とドレッ
サー部材１１０Ｃのエッジ部分でチッピングが生じて粗
い異物（バリ）Ｂが発生して、このために被研磨材料Ａ
の研磨面に微少な傷が発生してしまい好ましくなかっ
た。Further, in such a conventional dresser member 110C made of a plurality of columnar glasses, as shown in FIGS. 11 and 12, chipping occurs on the surface of the pitch plate 106 and the edge portion of the dresser member 110C. And coarse foreign matter (burr) B is generated, and for this reason, the material A to be polished is
This was not preferable because minute scratches were generated on the polished surface.
【００１２】本発明は、このような現状を考慮して、光
学結晶や光学ガラスなどの被研磨材料の研磨中に生じる
ピッチ盤の摩耗による表面の窪みを磨削、修正して、被
研磨材料の研磨面の平坦性を向上し、しかも研磨面に微
少な傷が発生することなく精密に研磨することが可能な
研磨装置ならびに研磨方法を提供することを目的とす
る。In consideration of the above situation, the present invention grinds and corrects the surface depression caused by the abrasion of the pitching machine which occurs during the polishing of the material to be polished such as an optical crystal or optical glass to obtain the material to be polished. It is an object of the present invention to provide a polishing apparatus and a polishing method capable of improving the flatness of the polishing surface and accurately polishing without causing a minute scratch on the polishing surface.
【００１３】[0013]
【課題を解決するための手段】本発明は、前述したよう
な従来技術における課題及び目的を達成するために発明
なされたものであって、本発明の研磨装置は、ピッチ盤
上面の研磨によって摩耗した研磨面を平坦に磨削するド
レッサー装置を、ピッチ盤の回転中心近傍をピッチ盤を
横切るように、ピッチ盤上面に遊動可能に載置された略
円柱形状のドレッサー部材と、ドレッサー部材に当接し
て、ドレッサー部材がピッチ盤上面において転動するの
を抑止する、研磨装置本体部に固設されたストッパー部
材と、ドレッサー部材の両端部に脱着自在に装着して、
ドレッサー部材に偏加重を負荷する重錘部材とから構成
したことを特徴とする。The present invention has been made in order to achieve the above-mentioned problems and objects in the prior art, and the polishing apparatus of the present invention is worn by polishing the upper surface of the pitch plate. The dresser device that grinds the polished surface evenly is attached to the dresser member that is mounted on the upper surface of the pitch machine so that it can move freely so that it crosses the vicinity of the center of rotation of the pitch machine across the pitch machine, and the dresser member. In contact with each other, the dresser member is mounted on the upper surface of the polishing device to prevent the dresser member from rolling on the upper surface of the pitch device, and the dresser member is detachably attached to both ends of the dresser member.
The dresser member is configured by a weight member that applies a biased load to the dresser member.
【００１４】また、本発明の研磨方法は、略円柱形状の
ドレッサー部材の両端部に不均衡な重錘部材を装着する
とともに、ドレッサー部材を、研磨装置本体部に固設さ
れたストッパー部材に当接させて、ピッチ盤の回転中心
近傍をピッチ盤を横切るように、ピッチ盤上面に遊動可
能に載置して、ピッチ盤を回転させ、被研磨材料保持装
置によって、被研磨材料をピッチ盤上面に当接させて研
磨することを特徴とする。Further, in the polishing method of the present invention, an unbalanced weight member is attached to both ends of a substantially columnar dresser member, and the dresser member is applied to a stopper member fixed to the main body of the polishing apparatus. The pitch plate is rotatably mounted on the upper surface of the pitch plate so as to cross the pitch plate around the center of rotation of the pitch plate, and the pitch plate is rotated. It is characterized by being brought into contact with and polishing.
【００１５】このように、略円柱形状のドレッサー部材
の両端部に不均衡な重錘部材を装着して、ピッチ盤の回
転中心近傍をピッチ盤を横切るように、ピッチ盤上面に
ドレッサー部材を遊動可能に載置して、ピッチ盤の回転
方向に対してストッパー部材に当接させて、ピッチ盤を
回転させることによって、加重の重い方では、ピッチ盤
の表面の移動方向（回転方向）と同じ方向にドレッサー
部材が回転するダウンローリングで、加重の軽い方で
は、ピッチ盤の表面の移動方向と逆向きに回転するアッ
パーローリングすることになり、その結果、ドレッサー
部材はピッチ盤上で同一方向に回転することになる。As described above, the unbalanced weight members are attached to both ends of the substantially cylindrical dresser member, and the dresser member is allowed to float on the upper surface of the pitch plate so as to cross the pitch plate near the center of rotation of the pitch plate. It is mounted as much as possible, abuts against the stopper member in the direction of rotation of the pitch plate, and the pitch plate is rotated. The down-rolling that rotates the dresser member in the direction, and the one with a lighter weight causes the upper rolling that rotates in the direction opposite to the moving direction of the surface of the pitch board, and as a result, the dresser member moves in the same direction on the pitch board. It will rotate.
【００１６】この際、ドレッサー部材は、ピッチ盤の直
径全体で支持されているので、ピッチ盤表面にドレッサ
ー部材による窪みが生じても、ピッチ盤の直径方向の端
から端にわたる単一の窪みが生じるだけである。被研磨
材料は、ピッチ盤の１半径の領域で研磨されることにな
るので、ピッチ盤の形状が転写されても、図９に示した
従来よりも緩やかになるので、被研磨材料の研磨面の平
坦度が改善されることになる。At this time, since the dresser member is supported by the entire diameter of the pitch plate, even if a recess is formed on the surface of the pitch plate by the dresser member, a single recess extending across the diametrical end of the pitch plate is formed. It just happens. Since the material to be polished is polished in a region of one radius of the pitch plate, even if the shape of the pitch plate is transferred, it becomes gentler than the conventional one shown in FIG. The flatness will be improved.
【００１７】また、本発明のドレッサー部材では、ピッ
チ盤と接する表面にエッジが存在しないので、従来のよ
うに、エッジ部分でチッピングが生じて粗い異物（バ
リ）が発生して、被研磨材料の研磨面に微少な傷が発生
することがない。Further, in the dresser member of the present invention, since there is no edge on the surface in contact with the pitch plate, chipping occurs at the edge portion and coarse foreign matters (burrs) are generated as in the prior art, so that the material to be polished is No slight scratches are generated on the polished surface.
【００１８】[0018]
【発明の実施の形態】本発明では、ドレッサー部材が、
軸方向中央部に向かって直径が減少するテーパー形状に
形成されているのが、ピッチ盤の摩耗による窪みを磨削
して、窪みがより浅く修正できるので好ましく、この減
少割合としては、ピッチ盤の両端に接するドレッサー部
材の直径に対して、ドレッサー部材の軸方向中央部の直
径がドレッサの長さの０〜１／３００だけ細くしたの
が、窪み減少効果のためには好ましい。また、ドレッサ
ー部材としては、耐食性、耐磨耗性に優れているステン
レス鋼などの金属材料、またはガラス、アルミナなどの
非金属など、ピッチ盤の材質に応じて選択することが可
能である。BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, the dresser member is
It is preferable that the taper shape is formed so that the diameter decreases toward the central portion in the axial direction, because the recess due to wear of the pitch machine can be abraded and the recess can be corrected to a shallower depth. It is preferable for the effect of reducing the depression that the diameter of the central portion in the axial direction of the dresser member is made smaller by 0 to 1/300 of the length of the dresser with respect to the diameter of the dresser member in contact with both ends of the. Further, the dresser member can be selected according to the material of the pitch board, such as a metal material such as stainless steel having excellent corrosion resistance and abrasion resistance, or a nonmetal such as glass or alumina.
【００１９】また、重錘部材は、リング状の金属製の重
りで、ドレッサー部材の両端に設けたネジ孔に、ネジに
よって脱着自在に取り付ける構造にするのが好ましい。Further, it is preferable that the weight member is a ring-shaped metal weight, and is structured to be detachably attached to the screw holes provided at both ends of the dresser member by screws.
【００２０】[0020]
【実施例】以下、本発明の実施例を図面に基づいてより
詳細に説明する。図１は、本発明の研磨装置の斜視図で
あり、図２は、図１の部分的な平面図である。Embodiments of the present invention will be described below in detail with reference to the drawings. 1 is a perspective view of a polishing apparatus of the present invention, and FIG. 2 is a partial plan view of FIG.
【００２１】図において、１は全体で本発明の研磨装置
を示しており、研磨装置１は、駆動モータ２の回転軸
３’にギアなど（図示せず）を介して接続されて回転駆
動する円盤状の回転テーブル４と、回転テーブル４の上
面に固着された円盤状のピッチ盤６を備えている。な
お、ピッチ盤６は、アスファルトや松脂などの樹脂を溶
融して円盤状に成形したもので、ピッチ盤６の表面に
は、研磨の際の研磨材のトラップや研磨屑を逃すため
に、同心円状に溝６Ａが形成されている。In the figure, reference numeral 1 denotes the polishing apparatus of the present invention as a whole, and the polishing apparatus 1 is connected to a rotary shaft 3'of a drive motor 2 via a gear or the like (not shown) to be rotationally driven. The rotary table 4 has a disk shape, and the pitch table 6 has a disk shape fixed to the upper surface of the rotary table 4. The pitch plate 6 is formed by melting a resin such as asphalt or pine resin into a disk shape, and the surface of the pitch plate 6 has concentric circles in order to escape traps of polishing material and polishing debris during polishing. A groove 6A is formed in a shape.
【００２２】また、研磨装置本体３には、被研磨材料Ａ
を保持してピッチ盤６上に当接させて研磨する被研磨材
料保持装置８と、研磨作業で摩耗したピッチ盤６の上面
を磨削してその平坦度を保つためのドレッサー装置１０
が設けられている。Further, the polishing apparatus main body 3 is provided with a material A to be polished.
Holding device 8 for holding and holding the workpiece on the pitch plate 6 for polishing, and a dresser device 10 for polishing the upper surface of the pitch plate 6 worn by the polishing work to maintain its flatness.
Is provided.
【００２３】また、被研磨材料保持装置８には、被研磨
材料保持装置本体８Ａに固定された２本の保持棒部材８
Ｂの先端部に、回転ローラ８Ｃが設けられており、この
回転ローラ８Ｃが、リング状の被研磨材料固定部材８Ｄ
の外周に設けられたガイド溝（図示せず）内を回転可能
に嵌着されている。そして、被研磨材料Ａを被研磨材料
固定部材８Ｄのリング内にネジ止めなどの周知の固定手
段によって固定保持して、ピッチ盤６を回転させて、ピ
ッチ盤６上に当接することによって、被研磨材料Ａを保
持した被研磨材料固定部材８Ｄが回転ローラ８Ｃを介し
て自転して、研磨するようになっている。Further, the polishing material holding device 8 has two holding rod members 8 fixed to the polishing material holding device main body 8A.
A rotary roller 8C is provided at the tip of B, and the rotary roller 8C is a ring-shaped material-to-be-polished material fixing member 8D.
Is rotatably fitted in a guide groove (not shown) provided on the outer periphery of the. Then, the material A to be polished is fixed and held in the ring of the material to be polished fixing member 8D by a known fixing means such as a screw, and the pitch plate 6 is rotated to abut on the pitch plate 6, whereby the material to be polished is fixed. The material-to-be-polished fixing member 8D holding the polishing material A rotates on its own via a rotating roller 8C to polish.
【００２４】一方、ドレッサー装置１０は、研磨装置本
体３上において、ピッチ盤６の直径を挟んで両側の端部
に固定的に立設された２個のストッパー部材１２と、ピ
ッチ盤の回転中心近傍をピッチ盤を横切るように、ピッ
チ盤６の上面に遊動可能に載置された略円柱形状のドレ
ッサー部材１４と、ドレッサー部材の両端部に脱着自在
に装着して、ドレッサー部材１４に偏加重を負荷する重
錘部材１６とを備えている。On the other hand, the dresser device 10 includes two stopper members 12 fixedly erected on both ends of the polishing device body 3 with the diameter of the pitch device 6 interposed therebetween, and the center of rotation of the pitch device. A substantially cylindrical dresser member 14 movably mounted on the upper surface of the pitch plate 6 so as to traverse the vicinity of the pitch plate, and detachably attached to both ends of the dresser member, and biasedly applied to the dresser member 14. And a weight member 16 for loading the load.
【００２５】すなわち、ドレッサー部材１４は、ピッチ
盤６の直径より僅かに大きい長さを有する略円柱形状の
ドレッサー本体１４Ａと、その両端のドレッサー本体１
４Ａよりも小径のドレッサー支持部１４Ｂ、１４Ｃから
構成されている。そして、このドレッサー支持部１４
Ｂ、１４Ｃが、ピッチ盤６が回転する際に、図２に示し
たように、ストッパー部材１２に当接することによっ
て、ドレッサー部材１４がピッチ盤６上を転動するのが
抑止されるようになっている。なお、このように、ドレ
ッサー部材１４は、ピッチ盤６の回転方向には移動でき
ないようになっているが、ピッチ盤６の表面に垂直な方
向の上下動、及びドレッサー部材１４の軸周りの回転
（すなわち自転）は可能となっている。That is, the dresser member 14 is a substantially columnar dresser body 14A having a length slightly larger than the diameter of the pitch plate 6, and the dresser body 1 at both ends thereof.
It is composed of dresser support portions 14B and 14C having a diameter smaller than 4A. And this dresser support portion 14
As shown in FIG. 2, B and 14C contact the stopper member 12 when the pitch plate 6 rotates, so that the dresser member 14 is prevented from rolling on the pitch plate 6. Has become. Although the dresser member 14 cannot move in the rotation direction of the pitch plate 6 as described above, the dresser member 14 moves up and down in the direction perpendicular to the surface of the pitch plate 6 and rotates about the axis of the dresser member 14. (That is, rotation) is possible.
【００２６】また、図３に示したように、ドレッサー部
材１４の両端部のドレッサー支持部１４Ｂ、１４Ｃの先
端部近傍には、複数個のネジ孔１５が形成されており、
リング状の重錘部材１６をドレッサー支持部１４Ｂ、１
４Ｃに挿通した後、このネジ孔１５に、重錘部材１６に
設けられた取付ネジ１７を螺着することによって、重錘
部材１６をドレッサー部材１４の両端部のドレッサー支
持部１４Ｂ、１４Ｃに脱着自在に装着できるように構成
されている。Further, as shown in FIG. 3, a plurality of screw holes 15 are formed near the tips of the dresser supporting portions 14B and 14C at both ends of the dresser member 14.
The ring-shaped weight member 16 is attached to the dresser support portions 14B, 1
After being inserted into the 4C, the mounting screw 17 provided on the weight member 16 is screwed into the screw hole 15, so that the weight member 16 is attached to and detached from the dresser support portions 14B and 14C at both ends of the dresser member 14. It is configured so that it can be installed freely.
【００２７】なお、ドレッサー部材１４のドレッサー本
体１４Ａは、軸方向中央部に向かって直径が減少するテ
ーパー形状に形成されているのが、ピッチ盤６の摩耗に
よる窪みを磨削して、窪みがより浅く修正できるので好
ましく、この減少割合としては、ピッチ盤の両端に接す
るドレッサー部材１４のドレッサー本体１４Ａの直径に
対して、ドレッサー部材１４のドレッサー本体１４Ａの
軸方向中央部の直径がドレッサの長さの０〜１／３００
だけ細くしたのが、ピッチ盤６の窪みを磨削する効果、
作業領域などを考慮すれば好ましい。The dresser body 14A of the dresser member 14 is formed in a taper shape whose diameter decreases toward the central portion in the axial direction. Since it can be corrected more shallowly, it is preferable that the reduction rate be such that the diameter of the dresser body 14A of the dresser member 14 in the axial direction is longer than the diameter of the dresser body 14A of the dresser member 14 which is in contact with both ends of the pitch machine. 0 to 1/300 of Sa
The only thing that made it thinner is the effect of polishing the depressions on the pitch board 6,
It is preferable to consider the work area and the like.
【００２８】また、ドレッサー部材の材質は、特に限定
されるものではないが、耐食性、耐磨耗性に優れている
ステンレス鋼などの金属材料、またはガラス、アルミナ
などの非金属など、ピッチ盤６の材質に応じて選択すれ
ばよい。The material of the dresser member is not particularly limited, but a metal material such as stainless steel having excellent corrosion resistance and abrasion resistance, or a non-metal material such as glass or alumina can be used for the pitch plate 6 It may be selected according to the material of.
【００２９】本発明の研磨方法では、このように構成さ
れる研磨装置１を用いて、ドレッサー部材１４の両端部
に不均衡な重錘部材１６を装着して、ピッチ盤６の回転
中心近傍をピッチ盤を横切るように、ピッチ盤上面にド
レッサー部材１４を遊動可能に載置し、ピッチ盤６の回
転方向に対してストッパー部材１２に当接させて、その
ピッチ盤を回転させる。それとともに、被研磨材料保持
装置８を用いて、被研磨材料Ａを被研磨材料固定部材８
Ｄのリング内に固定保持して、ピッチ盤６上に当接して
研磨する。In the polishing method of the present invention, by using the polishing apparatus 1 configured as described above, the unbalanced weight members 16 are attached to both ends of the dresser member 14, and the vicinity of the center of rotation of the pitch table 6 is mounted. The dresser member 14 is movably mounted on the upper surface of the pitch board so as to traverse the pitch board, and is brought into contact with the stopper member 12 in the rotation direction of the pitch board 6 to rotate the pitch board. At the same time, the polishing material holding device 8 is used to transfer the polishing material A to the polishing material fixing member 8
It is fixedly held in the ring D, and abutted on the pitch plate 6 for polishing.
【００３０】これによって、図４に示したように、ドレ
ッサー部材１４の加重の重い方（図において右側、すな
わち１４Ｃ側）では、ピッチ盤の表面の移動方向（回転
方向）Ｂと同じ方向Ｃにドレッサー部材１４が回転する
ダウンローリングで、加重の軽い方（図において左側、
すなわち１４Ｂ側）では、ピッチ盤の表面の移動方向Ｄ
と逆向きＥに回転するアッパーローリングすることにな
る。その結果、ドレッサー部材はピッチ盤６上で同一方
向にその長手方向の軸Ｆの周りに回転することになっ
て、ドレッサー部材１４のドレッサー本体１４Ａの特に
加重の重い側にて、ピッチ盤６の表面の被研磨材料Ａの
研磨によって生じた窪み６Ｂが磨削され修正されるよう
になっている。As a result, as shown in FIG. 4, the dresser member 14 on the heavier weight side (on the right side in the figure, ie, on the 14C side) is moved in the same direction C as the moving direction (rotational direction) B of the surface of the pitch board. The down-rolling that rotates the dresser member 14, which has a lighter weight (left side in the figure,
That is, on the 14B side), the moving direction D of the surface of the pitch board is
And the upper rolling will rotate in the opposite direction E. As a result, the dresser member will rotate on the pitch plate 6 in the same direction about the longitudinal axis F, and the dresser body 14A of the dresser member 14 will have a heavier side, particularly on the heavier side. The depression 6B formed by polishing the surface-polished material A is abraded and corrected.
【００３１】この際、ドレッサー部材１４は、ピッチ盤
６の直径全体で支持されているので、ピッチ盤６表面に
ドレッサー部材１４による窪みが生じても、図５に示し
たように、単一の窪み６Ｃが生じるだけであり、しか
も、被研磨材料Ａは、ピッチ盤６の１半径の領域で研磨
されることになるので、ピッチ盤の形状が転写されて
も、従来よりも緩やかになるので、被研磨材料Ａの研磨
面の平坦度が改善されることになる。At this time, since the dresser member 14 is supported by the entire diameter of the pitch plate 6, even if the dresser member 14 has a depression on the surface of the pitch plate 6, as shown in FIG. Since only the depression 6C is generated, and the material A to be polished is polished in the region of one radius of the pitch plate 6, even if the shape of the pitch plate is transferred, it becomes gentler than before. Therefore, the flatness of the polishing surface of the material A to be polished is improved.
【００３２】また、本発明のドレッサー部材１４では、
図４に示したように、ピッチ盤６と接する表面にエッジ
が存在しないので、従来のように、エッジ部分でチッピ
ングが生じて粗い異物（バリ）が発生して、被研磨材料
の研磨面に微少な傷が発生することがない。Further, in the dresser member 14 of the present invention,
As shown in FIG. 4, since there is no edge on the surface in contact with the pitch plate 6, chipping occurs at the edge portion and coarse foreign matters (burrs) are generated as in the conventional case, so that the polished surface of the material to be polished is No slight scratches will occur.
【００３３】[0033]
【実施例１】直径３０ｍｍＭ、長さ３５ｃｍのステンレ
ス製の丸棒を旋盤を用いて、長手軸方向の中央部の直径
が両端部の直径よりも０．２ｍｍ小さくなるように長さ
方向にテーパー形状に切削した。また、両端部には、リ
ング状の重りに取り付けた取り付けネジによって、重り
を取り付けられるようにネジ加工を施してドレッサーバ
ーとした。Example 1 A stainless steel round bar having a diameter of 30 mmM and a length of 35 cm was tapered in the lengthwise direction by using a lathe so that the diameter of the central part in the longitudinal axis direction was smaller than the diameter of both ends by 0.2 mm. It was cut into a shape. In addition, both ends were threaded so that weights could be attached with attachment screws attached to ring-shaped weights to form dressers.
【００３４】一方、アスファルト材を溶融して、金型に
流し込んで直径３０ｃｍの円盤状に成形した。これを研
磨装置の回転テーブルに取り付け、半径方向に移動可能
な治具に取り付けたバイトでピッチ盤の表面を平坦に研
削するとともに、同心円状の溝を半径方向にほぼ１ｃｍ
の間隔で設けて、研磨の際の研磨材のトラップや研磨屑
を逃すセグメントとした。On the other hand, the asphalt material was melted and poured into a mold to form a disk having a diameter of 30 cm. This was attached to the rotary table of the polishing device, the surface of the pitch plate was ground flat with a tool attached to a jig movable in the radial direction, and concentric circular grooves were approximately 1 cm in the radial direction.
Are provided at intervals to provide a trap for the abrasive during polishing and a segment for releasing polishing debris.
【００３５】ドレッサーバーの両端を、予め回転テーブ
ルの外側で直径方向に対向する２箇所に設けたストッパ
ーの間に収めるように、ピッチ盤上に載置し、ドレッサ
ーバーの両端にリング状の重しを取り付けネジにて固定
した。この際、両端に不均等な重りを装着した。The dresser is placed on a pitch board so that both ends of the dresser can be accommodated in advance between stoppers provided at two diametrically opposed positions on the outside of the rotary table, and ring-shaped weights are placed on both ends of the dresser. The sushi was fixed with mounting screws. At this time, uneven weights were attached to both ends.
【００３６】ピッチ盤を回転っせるとドレッサーバー
は、ピッチ盤上を転がり加重の大きい側でダウンローリ
ングをし、その際にピッチ盤表面に引きづられるが、両
端のストッパーに当接して止まり、長手方向の軸を中心
として回転する。また、ドレッサーバーの重量は、ピッ
チ盤に支持されているだけであり、ストッパー部では鉛
直方向には接触しないで浮いており遊動できるようにな
っている。この状態で、ピッチ盤面上に砥粒液を滴下し
ながらならし運転をした。When the pitch machine is rotated, the dresser rolls down on the pitch machine and down-rolls on the side with a large weight. At that time, the dresser is pulled by the surface of the pitch machine, but stops by contacting the stoppers at both ends. It rotates about its longitudinal axis. In addition, the weight of the dresser is only supported by the pitch board, and the stopper portion floats without contact in the vertical direction and can move freely. In this state, the leveling operation was performed while dropping the abrasive liquid on the pitch plate surface.
【００３７】光学結晶であるＫＮｂＯ3の単結晶を円柱
形状のステンレス製のブロックの下面にホットメルト接
着剤で固定して研磨試料を作成した。これを、図１に示
したような本発明の被研磨材料保持装置８を用いて、こ
のブロックを被研磨材料固定部材８Ｄのリング内に固定
保持して、ピッチ盤６上にＫＮｂＯ3の被研磨面を当接
して研磨した。なお、同じように作成した試料につい
て、従来のドレッサーを用いて研磨した。Polished samples were prepared by fixing a single crystal of KNbO 3 as an optical crystal to the lower surface of a cylindrical stainless block with a hot melt adhesive. This block is fixedly held in the ring of the material-to-be-polished material fixing member 8D by using the material-to-be-polished material holding device 8 of the present invention as shown in FIG. 1, and KNbO 3 is held on the pitch plate 6. The polishing surface was abutted and polished. The sample prepared in the same manner was polished using a conventional dresser.
【００３８】その結果、ＫＮｂＯ3の単結晶は、非線形
光学結晶として重要であり精密な研磨を必要とするが、
従来のドレッサーを用いると研磨面に微少な傷が発生し
やすく、平坦度も良好ではなかったの対して、本発明で
は、研磨面の平坦度も良好であり、傷がほとんど発生し
なかった。As a result, the KNbO 3 single crystal is important as a non-linear optical crystal and requires precise polishing.
When the conventional dresser was used, minute scratches were likely to occur on the polished surface and the flatness was not good. On the contrary, in the present invention, the flatness of the polished surface was good and scars were hardly generated.
【００３９】[0039]
【発明の効果】本発明に係る研磨装置及び研磨方法によ
れば、略円柱形状のドレッサー部材の両端部に不均衡な
重錘部材を装着して、ピッチ盤の回転中心近傍をピッチ
盤を横切るように、ピッチ盤上面にドレッサー部材を遊
動可能に載置して、ピッチ盤の回転方向に対してストッ
パー部材に当接させて、ピッチ盤を回転させるようにし
たので、以下のような顕著で特有な作用効果を奏する極
めて優れた発明である。 （１）光学結晶や光学ガラスなどの被研磨材料の研磨中
に生じるピッチ盤の摩耗による表面の窪みを磨削、修正
して、ドレッサー部材による窪みが生じても単一の窪み
が生じるだけであり、窪みが緩やかな形状となるので、
被研磨材料の研磨面の平坦性が極めて向上する。 （２）本発明のドレッサー部材では、ピッチ盤と接する
表面にエッジが存在しないので、従来のように、エッジ
部分でチッピングが生じて粗い異物（バリ）が発生し
て、被研磨材料の研磨面に微少な傷が発生することがな
く、精密、高精度なな研磨加工が可能である。 （３）装置の構造が簡単であり、しかもドレッサーの占
有面積が従来と比較して格段と減少できるので、ピッチ
盤上の研削有効面積を広くとれ、処理できる非研磨材料
の数が増加する。 （４）ピッチ盤の材質（硬度）に応じて、ピッチ盤の加
重条件が設定できるので、より精密な研磨加工が可能で
ある。 （５）また、本発明は、平坦な面で研磨加工する装置及
び方法に適用したが、ドレッサーの外形を長手方向に凸
曲線や凹曲線にすることにより、凸面や凹面の研磨加工
が可能となる。According to the polishing apparatus and the polishing method of the present invention, the unbalanced weight members are attached to both ends of the substantially cylindrical dresser member and the pitch plate is traversed near the center of rotation. As described above, the dresser member is movably mounted on the upper surface of the pitch board, and is brought into contact with the stopper member in the rotation direction of the pitch board to rotate the pitch board. It is an extremely excellent invention that exhibits unique operational effects. (1) Only a single dent is produced even if the dent caused by the dresser member is abraded by correcting the dent on the surface caused by the wear of the pitching machine that occurs during the polishing of the material to be polished such as an optical crystal or optical glass. Yes, because the dent has a gentle shape,
The flatness of the polishing surface of the material to be polished is significantly improved. (2) In the dresser member of the present invention, since there is no edge on the surface in contact with the pitch plate, chipping occurs at the edge portion and coarse foreign matters (burrs) are generated as in the conventional case, and the polished surface of the material to be polished. Precise and highly accurate polishing processing is possible without causing microscopic scratches. (3) Since the structure of the device is simple and the area occupied by the dresser can be remarkably reduced as compared with the prior art, the effective grinding area on the pitch machine can be increased and the number of non-abrasive materials that can be processed increases. (4) Since the weighting condition of the pitch plate can be set according to the material (hardness) of the pitch plate, more precise polishing can be performed. (5) Further, although the present invention is applied to an apparatus and a method for polishing a flat surface, it is possible to polish a convex surface or a concave surface by forming the contour of the dresser into a convex curve or a concave curve in the longitudinal direction. Become.
【図１】本発明の研磨装置の斜視図である。図１の部分
的な平面図である。FIG. 1 is a perspective view of a polishing apparatus of the present invention. It is a partial top view of FIG.
【図２】図１の部分的な平面図である。FIG. 2 is a partial plan view of FIG.
【図３】本発明の研磨装置のドレッサー部材端部と重錘
部材との結合状態を説明する断面図である。FIG. 3 is a cross-sectional view illustrating a combined state of a dresser member end and a weight member of the polishing apparatus of the present invention.
【図４】本発明の研磨装置のドレッサー部材のピッチ盤
上での動作状態を説明する概略図である。FIG. 4 is a schematic view illustrating an operating state of the dresser member of the polishing apparatus of the present invention on the pitch plate.
【図５】本発明の研磨装置のドレッサー部材によるピッ
チ盤の磨削状態を説明する部分縦断面図である。FIG. 5 is a partial vertical cross-sectional view for explaining a state in which a pitcher is abraded by a dresser member of the polishing apparatus of the present invention.
【図６】従来の研磨装置の斜視図である。FIG. 6 is a perspective view of a conventional polishing apparatus.
【図７】従来の研磨装置の部分縦断面図である。FIG. 7 is a partial vertical sectional view of a conventional polishing apparatus.
【図８】図７のＩ−Ｉ線についての平面図である。8 is a plan view taken along line I-I in FIG. 7. FIG.
【図９】従来の研磨装置の被研磨材料を研磨した際のピ
ッチ盤の窪みの状態を説明する部分縦断面図である。FIG. 9 is a partial vertical cross-sectional view illustrating a state of depressions of a pitch plate when a material to be polished of a conventional polishing apparatus is polished.
【図１０】従来の研磨装置の被研磨材料を研磨した際の
ピッチ盤の窪みをドレッサー装置で磨削修正した状態を
説明する部分縦断面図である。FIG. 10 is a partial vertical cross-sectional view for explaining a state in which the recesses of the pitch plate when the material to be polished of the conventional polishing device is polished are corrected by the dresser device.
【図１１】従来の研磨装置のドレッサー装置でピッチ盤
を磨削修正する状態を説明する部分拡大斜視図である。FIG. 11 is a partially enlarged perspective view illustrating a state in which a pitch machine is ground and corrected by a dresser device of a conventional polishing device.
【図１２】従来の研磨装置のドレッサー装置でピッチ盤
を磨削修正する状態を説明する部分拡大断面図である。FIG. 12 is a partially enlarged cross-sectional view illustrating a state in which a pitch plate is abraded and corrected by a dresser device of a conventional polishing device.
１・・・…研磨装置 ２・・・モータ ４・・・回転テーブル ６・・・ピッチ盤 ８・・・被研磨材料保持装置 ８Ｂ・・・保持棒部材 ８Ｃ・・・機転ローラ ８Ｄ・・・被研磨材料固定部材 １０・・・ドレッサー装置 １２・・・ストッパー部材 １４・・・ドレッサー部材 １４Ａ・・・ドレッサー本体 １４Ｂ，１４Ｃ・・・ドレッサー支持部 １６・・・重錘部材 Ａ・・・被研磨材料 DESCRIPTION OF SYMBOLS 1 ... Polishing device 2 ... Motor 4 ... Rotary table 6 ... Pitch machine 8 ... Polishing material holding device 8B ... Holding rod member 8C ... Machine roller 8D ... Material to be polished fixing member 10 ... Dresser device 12 ... Stopper member 14 ... Dresser member 14A ... Dresser body 14B, 14C ... Dresser support part 16 ... Weight member A ... Abrasive material
Claims (6)
を研磨加工するための研磨装置であって、 モータに接続されて回転駆動する円盤状の回転テーブル
と、 前記回転テーブル上面に装着され、回転テーブルととも
に回転する円盤状のピッチ盤と、 被研磨材料を保持して、被研磨材料をピッチ盤上面に当
接させて研磨する被研磨材料保持装置と、 前記ピッチ盤上面の研磨によって摩耗した研磨面を平坦
に磨削するドレッサー装置とから構成され、 前記ドレッサー装置が、 ピッチ盤の回転中心近傍をピッチ盤を横切るように、ピ
ッチ盤上面に遊動可能に載置された略円柱形状のドレッ
サー部材と、 前記ドレッサー部材に当接して、ドレッサー部材がピッ
チ盤上面において転動するのを抑止する、研磨装置本体
部に固設されたストッパー部材とから構成したことを特
徴とする研磨装置。1. A polishing apparatus for polishing a material to be polished such as an optical crystal and an optical glass, comprising a disk-shaped rotary table which is connected to a motor and rotationally driven, and which is mounted on the upper surface of the rotary table. A disk-shaped pitch disk that rotates together with a rotary table, a polishing material holding device that holds the material to be polished, and brings the material to be polished into contact with the upper surface of the pitch disk to polish, and wear due to polishing of the upper surface of the pitch disk. And a dresser device for polishing the polishing surface to a flat surface.The dresser device is a substantially cylindrical dresser movably mounted on the upper surface of the pitch plate so as to cross the pitch plate near the center of rotation of the pitch plate. Member and a stopper member fixed to the main body of the polishing apparatus that abuts on the dresser member and prevents the dresser member from rolling on the upper surface of the pitch plate. Polishing apparatus characterized by being composed.
に装着して、ドレッサー部材に偏加重を負荷する重錘部
材を備えることを特徴とする請求項１に記載の研磨装
置。2. The polishing apparatus according to claim 1, further comprising a weight member that is detachably attached to both ends of the dresser member and applies a biased load to the dresser member.
向かって直径が減少するテーパー形状に形成されている
ことを特徴とする請求項１又は２に記載の研磨装置。3. The polishing apparatus according to claim 1, wherein the dresser member is formed in a tapered shape whose diameter decreases toward a central portion in the axial direction.
の回転テーブルと、 前記回転テーブル上面に装着され、回転テーブルととも
に回転する円盤状のピッチ盤と、 被研磨材料を保持して、被研磨材料をピッチ盤上面に当
接させて研磨する被研磨材料保持装置とから構成される
研磨装置を用いて、光学結晶や光学ガラスなどの被研磨
材料を研磨加工するための研磨方法であって、 前記ピッチ盤上面の研磨によって摩耗した研磨面を平坦
に磨削するために、 略円柱形状のドレッサー部材を、研磨装置本体部に固設
されたストッパー部材に当接させて、ピッチ盤の回転中
心近傍をピッチ盤を横切るように、ピッチ盤上面に遊動
可能に載置して、ピッチ盤を回転させ、 被研磨材料保持装置によって、被研磨材料をピッチ盤上
面に当接させて研磨することを特徴とする研磨方法。4. A disk-shaped rotary table which is connected to a motor and rotationally driven, a disk-shaped pitch table which is mounted on the upper surface of the rotary table and rotates together with the rotary table, and a material to be polished is held to be polished. A polishing method for polishing a material to be polished such as an optical crystal or an optical glass by using a polishing device configured to bring a material into contact with the upper surface of a pitch plate and to polish the material to be polished. The center of rotation of the pitch machine is made by contacting a substantially cylindrical dresser member with a stopper member fixed to the main body of the polishing machine in order to flatten the polished surface worn by the polishing of the upper surface of the pitch machine. Place it on the upper surface of the pitch board so that it can move freely so that it crosses the vicinity of the pitch board, rotate the pitch board, and bring the material to be polished into contact with the upper surface of the pitch board by the polishing material holding device to polish the material. Polishing wherein the.
重錘部材を装着して研磨することを特徴とする請求項４
に記載の研磨方法。5. An unbalanced weight member is attached to both ends of the dresser member for polishing.
3. The polishing method according to 1.
向かって直径が減少するテーパー形状に形成されている
ドレッサー部材であることを特徴とする請求項４又は５
に記載の研磨方法。6. The dresser member according to claim 4, wherein the dresser member is formed in a tapered shape whose diameter decreases toward a central portion in the axial direction.
3. The polishing method according to 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9664896A JPH09285950A (en) | 1996-04-18 | 1996-04-18 | Polishing device and polishing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9664896A JPH09285950A (en) | 1996-04-18 | 1996-04-18 | Polishing device and polishing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09285950A true JPH09285950A (en) | 1997-11-04 |
Family
ID=14170655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9664896A Pending JPH09285950A (en) | 1996-04-18 | 1996-04-18 | Polishing device and polishing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09285950A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103659515A (en) * | 2012-09-07 | 2014-03-26 | 中国航空工业第六一八研究所 | Polishing device of excircle chamfer of laser gyro lens and polishing method of polishing device |
| CN104708514A (en) * | 2013-12-11 | 2015-06-17 | 中国航空工业第六一八研究所 | Edge and chamfer accurate grinding device of cylindrical glass optical lenses and method thereof |
| CN108296931A (en) * | 2018-02-02 | 2018-07-20 | 成都精密光学工程研究中心 | A kind of nutation type plane polishing device of belt wear compensation |
| WO2023116555A1 (en) * | 2021-12-20 | 2023-06-29 | 唐山国芯晶源电子有限公司 | Large-area quartz wafer grinding apparatus and method |
-
1996
- 1996-04-18 JP JP9664896A patent/JPH09285950A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103659515A (en) * | 2012-09-07 | 2014-03-26 | 中国航空工业第六一八研究所 | Polishing device of excircle chamfer of laser gyro lens and polishing method of polishing device |
| CN104708514A (en) * | 2013-12-11 | 2015-06-17 | 中国航空工业第六一八研究所 | Edge and chamfer accurate grinding device of cylindrical glass optical lenses and method thereof |
| CN108296931A (en) * | 2018-02-02 | 2018-07-20 | 成都精密光学工程研究中心 | A kind of nutation type plane polishing device of belt wear compensation |
| WO2023116555A1 (en) * | 2021-12-20 | 2023-06-29 | 唐山国芯晶源电子有限公司 | Large-area quartz wafer grinding apparatus and method |
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