JPH09196630A - Optical constant measuring apparatus and microscope - Google Patents
Optical constant measuring apparatus and microscopeInfo
- Publication number
- JPH09196630A JPH09196630A JP2316396A JP2316396A JPH09196630A JP H09196630 A JPH09196630 A JP H09196630A JP 2316396 A JP2316396 A JP 2316396A JP 2316396 A JP2316396 A JP 2316396A JP H09196630 A JPH09196630 A JP H09196630A
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- light
- sample
- intensity distribution
- optical system
- microscope
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光学定数測定装
置、および少なくともその測定ヘッドを備えた顕微鏡に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical constant measuring device and a microscope equipped with at least a measuring head thereof.
【０００２】[0002]
【従来の技術】特開平３−１７５０５号公報に、光ビー
ムを用いて基板の表面上に設けられた薄膜の厚さを測定
する膜厚測定技術が開示されている（以下、ＢＰＲ法
（BeamProfile Reflectometry）と呼ぶこともある）。
このＢＰＲ法は、上記薄膜に様々な角度θから光を照射
し、該薄膜からの反射光（薄膜表面、裏面からの反射光
および薄膜中を散乱した後表面から出射した光）の光ビ
ーム内光強度分布（反射率分布）を上記入射角θに関す
る分布として検出し、検出された分布を、予め求められ
ている各膜厚における分布と照合し、どの膜厚における
分布と一致するかをみることによって、測定対象である
上記薄膜の膜厚を算出するようにしたものである。2. Description of the Related Art Japanese Unexamined Patent Publication (Kokai) No. 3-17505 discloses a film thickness measuring technique for measuring the thickness of a thin film provided on the surface of a substrate using a light beam (hereinafter, BPR method (BeamProfile). Reflectometry) may also be called).
In this BPR method, the thin film is irradiated with light from various angles θ, and a light beam of reflected light from the thin film (reflected light from the front and back surfaces of the thin film and light emitted from the front surface after scattering in the thin film) The light intensity distribution (reflectance distribution) is detected as the distribution related to the incident angle θ, and the detected distribution is compared with the distribution for each film thickness obtained in advance to see which film thickness matches the distribution. Thus, the film thickness of the thin film to be measured is calculated.
【０００３】[0003]
【発明が解決しようとする課題】本発明の課題は、上記
特開平３−１７５０５号公報で提案されている膜厚測定
技術を利用して、該公報ではシステム的な装置として提
案されていた膜厚測定装置に比べ、よりコンパクトな構
成でかつより多彩な光学定数を測定可能な光学定数測定
装置を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to utilize the film thickness measuring technique proposed in the above-mentioned Japanese Patent Laid-Open No. 3-17505, and to propose a film as a system-like device in the same. An object of the present invention is to provide an optical constant measuring device having a more compact structure and capable of measuring a wider variety of optical constants than a thickness measuring device.
【０００４】また、本発明の別の課題は、上記膜厚測定
技術を利用した小型測定ヘッドを組み込んだ顕微鏡を提
供することにある。Another object of the present invention is to provide a microscope incorporating a small measuring head utilizing the film thickness measuring technique.
【０００５】[0005]
【課題を解決するための手段】上記課題を解決するため
に、本発明の光学定数測定装置は、試料表面に収束光ま
たは発散光を照射する照射光学系、前記収束光または発
散光の前記試料からの反射光を導く受光光学系および該
受光光学系により導かれた反射光の光ビーム内光強度分
布を検出する光強度分布センサを備えた測定ヘッドと、
検出された該光ビーム内光強度分布に基づいて前記試料
の光学定数または前記試料表面に形成された薄膜の光学
定数を算出する光学定数算出装置とを備えたことを特徴
とするものからなる。In order to solve the above-mentioned problems, an optical constant measuring device of the present invention comprises an irradiation optical system for irradiating a sample surface with convergent light or divergent light, and the sample of the convergent light or divergent light. A light receiving optical system for guiding the reflected light from and a measuring head equipped with a light intensity distribution sensor for detecting the light intensity distribution in the light beam of the reflected light guided by the light receiving optical system,
An optical constant calculating device for calculating the optical constant of the sample or the optical constant of the thin film formed on the sample surface based on the detected light intensity distribution in the light beam.
【０００６】また、本発明に係る顕微鏡は、試料台と、
該試料台に装着された試料表面に収束光または発散光を
照射する照射光学系、前記収束光または発散光の前記試
料からの反射光を導く受光光学系および該受光光学系に
より導かれた反射光の光ビーム内光強度分布を検出する
光強度分布センサを備えた測定ヘッドと、該測定ヘッド
を装着する顕微鏡本体とを備えたことを特徴とするもの
からなる。The microscope according to the present invention comprises a sample table,
An irradiation optical system for irradiating a sample surface mounted on the sample table with convergent light or divergent light, a light receiving optical system for guiding the reflected light from the sample of the convergent light or divergent light, and reflection guided by the light receiving optical system. It is characterized by comprising a measuring head having a light intensity distribution sensor for detecting a light intensity distribution in a light beam of light, and a microscope main body to which the measuring head is attached.
【０００７】この顕微鏡において、上記測定ヘッドは、
顕微鏡本体に着脱可能なものであることが好ましい。ま
た上記顕微鏡は、光強度分布センサにより検出された光
ビーム内光強度分布に基づいて前記試料の光学定数また
は前記試料表面に形成された薄膜の光学定数を算出する
光学定数算出装置を備えていることが好ましい。In this microscope, the measuring head is
It is preferably detachable from the microscope body. Further, the microscope includes an optical constant calculation device that calculates the optical constant of the sample or the optical constant of the thin film formed on the sample surface based on the light intensity distribution in the light beam detected by the light intensity distribution sensor. It is preferable.
【０００８】さらに、上記照射光学系は、レーザ光発生
装置を備えたものであることが好ましい。また、上記顕
微鏡は、接眼鏡を備えたものとすることもできる。Further, it is preferable that the irradiation optical system includes a laser beam generator. Further, the microscope may be equipped with an eyepiece.
【０００９】[0009]
【発明の実施の形態】以下に、本発明の望ましい実施の
形態を、図面を参照しながら説明する。図１は、本発明
の一実施態様に係る光学定数測定装置の概略構成を示し
ている。図において、１は光学定数測定装置全体を示し
ており、該光学定数測定装置１は、測定ヘッド２と光学
定数算出装置３とを備えている。BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows a schematic configuration of an optical constant measuring device according to an embodiment of the present invention. In the figure, reference numeral 1 denotes the entire optical constant measuring device, and the optical constant measuring device 1 comprises a measuring head 2 and an optical constant calculating device 3.
【００１０】測定ヘッド２は、試料４の表面に光５を照
射する照射光学系６、光５の試料４からの反射光７を導
く受光光学系８および該受光光学系８により導かれた反
射光７の光ビーム内光強度分布を検出する光強度分布セ
ンサ９を備えている。The measuring head 2 includes an irradiation optical system 6 for irradiating the surface of the sample 4 with the light 5, a light receiving optical system 8 for guiding the reflected light 7 of the light 5 from the sample 4, and a reflection guided by the light receiving optical system 8. A light intensity distribution sensor 9 for detecting the light intensity distribution in the light beam of the light 7 is provided.
【００１１】図１においては、測定対象としての試料４
として、基板４ａ上に薄膜４ｂを形成したものを示して
いるが、基板４ａのみからなる試料であってもよい。本
発明における光学定数とは、測定対象が基板の場合は、
屈折率または消衰係数を指し、薄膜の場合は屈折率、消
衰係数または膜厚を指す。In FIG. 1, a sample 4 to be measured is shown.
As a sample, the thin film 4b is formed on the substrate 4a, but a sample including only the substrate 4a may be used. The optical constant in the present invention, when the measurement target is a substrate,
Refers to the refractive index or extinction coefficient, and in the case of a thin film, refers to the refractive index, extinction coefficient or film thickness.
【００１２】試料４の表面に向けて、照射光学系６の光
５が照射される。本実施態様では、レーザ光源１０（た
とえば半導体レーザ光源）からのレーザ光がハーフミラ
ー１１で反射された後、凸レンズ（集光レンズ）１２で
集光されて試料４に照射されている。The light 5 of the irradiation optical system 6 is irradiated toward the surface of the sample 4. In this embodiment, the laser light from the laser light source 10 (for example, a semiconductor laser light source) is reflected by the half mirror 11 and then condensed by a convex lens (condensing lens) 12 to be applied to the sample 4.
【００１３】図１においては、照射される光５は、丁度
試料４の表面に焦点が合わされた収束光として描かれて
いるが、図２に示すように、焦点に至る前に試料４の表
面に照射される収束光５ａの形態であってもよい。ま
た、図３に示すように、一旦焦点を経た後、実質的に発
散光５ｂの形態として試料４の表面に照射するようにし
てもよい。要は、平行光でなく、試料４の表面に対して
様々な角度θ（図１に図示）で入射する光であればよ
い。In FIG. 1, the radiated light 5 is depicted as a convergent light just focused on the surface of the sample 4, but as shown in FIG. It may be in the form of the convergent light 5a that is irradiated onto the. Alternatively, as shown in FIG. 3, after passing through the focus once, the surface of the sample 4 may be irradiated with substantially divergent light 5b. The point is that the light is not parallel light and may be light that is incident on the surface of the sample 4 at various angles θ (illustrated in FIG. 1).
【００１４】試料４に照射された光５は、試料４から反
射される。この試料４からの反射光とは、試料表面、試
料裏面における反射光および試料内部での散乱後の反射
光を含むものである。たとえば、基板４ａ上に形成され
た薄膜４ｂの光学定数が測定対象となる場合、照射され
た光５の反射は、図４に示すように、多重反射の形態で
行われる。The light 5 applied to the sample 4 is reflected from the sample 4. The reflected light from the sample 4 includes the reflected light on the front surface of the sample, the reflected light on the back surface of the sample, and the reflected light after being scattered inside the sample. For example, when the optical constant of the thin film 4b formed on the substrate 4a is to be measured, the reflected light 5 is reflected in the form of multiple reflection as shown in FIG.
【００１５】図４において、ｔは薄膜４ｂの膜厚、
ｎ0 、ｎ1 、ｎ2 はそれぞれ空気、薄膜４ｂ、基板４ａ
の屈折率であり、ｒ1 、ｒ2 は空気と薄膜、薄膜と基板
の境界での光の反射率である。この光の反射率はＰ偏光
とＳ偏光とでは異なりそれぞれ次の（１）〜（４）式で
表される。In FIG. 4, t is the film thickness of the thin film 4b,
n 0 , n 1 and n 2 are air, thin film 4b and substrate 4a, respectively.
And r 1 and r 2 are the reflectances of light at the boundary between air and the thin film, and between the thin film and the substrate. The reflectance of this light differs between P-polarized light and S-polarized light and is expressed by the following equations (1) to (4).
【００１６】 ｒ1S＝（ｎ1 cos θ1 −ｎ0 cos θ0)／（ｎ1 cos θ1 ＋ｎ0 cos θ0) （１） ｒ1P＝（ｎ1 cos θ0 −ｎ0 cos θ1)／（ｎ1 cos θ0 ＋ｎ0 cos θ1) （２） ｒ2S＝（ｎ2 cos θ2 −ｎ1 cos θ1)／（ｎ2 cos θ2 ＋ｎ1 cos θ1) （３） ｒ2P＝（ｎ2 cos θ1 −ｎ1 cos θ2)／（ｎ2 cos θ1 ＋ｎ1 cos θ2) （４） ここでＳおよびＰの添字はそれぞれＳ偏光およびＰ偏光
であることを意味する。またθ0 、θ1 、θ2 はそれぞ
れ光が各媒質を通過するときの試料面の法線に対する角
度である。R 1S = (n 1 cos θ 1 −n 0 cos θ 0 ) / (n 1 cos θ 1 + n 0 cos θ 0 ) (1) r 1P = (n 1 cos θ 0 −n 0 cos θ 1 ) / (N 1 cos θ 0 + n 0 cos θ 1 ) (2) r 2S = (n 2 cos θ 2 −n 1 cos θ 1 ) / (n 2 cos θ 2 + n 1 cos θ 1 ) (3) r 2P = (n 2 cos θ 1 −n 1 cos θ 2 ) / (n 2 cos θ 1 + n 1 cos θ 2 ) (4) where the suffixes S and P mean S-polarized light and P-polarized light, respectively. To do. Further, θ 0 , θ 1 , and θ 2 are angles with respect to the normal to the sample surface when light passes through each medium.
【００１７】さて、ｒ1 、ｒ2 は一般的に０でないの
で、図４に示したように光の多重反射が起きる。レーザ
光のようなコヒーレント光では、この多重反射した各光
線ａ、ｂ、ｃ・・・の間で干渉を考慮した総合的な反射
率Ｒは、次の（５）式のようになる。 Ｒ＝（ｒ1 ＋ｒ2 ｅid）／（１＋ｒ1 ｒ2 ｅid） （５） ここでｄは ｄ＝（２π／λ）ｎ1 ｔｃｏｓθ1 （６） であり、ｔは薄膜の膜厚、λは光の波長である。（５）
式の入射角θ0 に対する反射率の変化をプロットする
と、たとえば図５、図６に示すようなプロファイル（理
論反射率分布）が得られる。この入射角θ0 に対する反
射率の分布は、膜厚ｔが変われば変化する。Since r 1 and r 2 are generally not 0, multiple reflection of light occurs as shown in FIG. In coherent light such as laser light, the total reflectance R considering the interference among the multiple-reflected light beams a, b, c ... Is as shown in the following expression (5). R = (r 1 + r 2 e id ) / (1 + r 1 r 2 e id ) (5) where d is d = (2π / λ) n 1 tcos θ 1 (6), and t is the film thickness of the thin film, λ is the wavelength of light. (5)
When the change in reflectance with respect to the incident angle θ 0 in the equation is plotted, for example, profiles (theoretical reflectance distribution) shown in FIGS. 5 and 6 are obtained. The distribution of reflectance with respect to the incident angle θ 0 changes if the film thickness t changes.
【００１８】さて、再び図１を参照するに、試料４から
の反射光７は、受光光学系８により光強度分布センサ９
へと導かれる。本実施態様においては、受光光学系８
は、レンズ１２、ハーフミラー１１と、照射光学系６と
共通の要素、光道を有しているが、照射光学系６とは異
なる光道で構成してもよい。Referring again to FIG. 1, the reflected light 7 from the sample 4 is reflected by the light receiving optical system 8 and the light intensity distribution sensor 9
It is led to. In the present embodiment, the light receiving optical system 8
Has a lens 12, a half mirror 11, and an element and an optical path that are common to the irradiation optical system 6, but may have an optical path different from that of the irradiation optical system 6.
【００１９】光強度分布センサ９は、受光光学系８を導
かれてきた反射光７の光ビーム内強度分布を検出する。
つまり、光ビームの断面方向に、一次元または二次元の
ＣＣＤなどのアレイセンサまたはイメージインテンシフ
ァイアなど、少なくとも一次元的な光強度の分布を測定
できる光のセンサを指す。小さな単一の受光部位が少な
くとも一次元的に配列されたものの他、該小さな単一の
受光部位が時間的にビーム内を移動するものを含む。The light intensity distribution sensor 9 detects the intensity distribution in the light beam of the reflected light 7 guided through the light receiving optical system 8.
That is, it refers to a light sensor capable of measuring at least a one-dimensional distribution of light intensity, such as an array sensor such as a one-dimensional or two-dimensional CCD or an image intensifier in the cross-sectional direction of the light beam. In addition to the arrangement in which at least one dimensional array of small single light receiving portions is arranged, the small single light receiving portion includes one in which the small single light receiving portion moves in the beam with time.
【００２０】前述したように、試料４に照射される光５
は様々な角度θで入射されるから、光強度分布センサ９
では、この入射角θに対する光ビーム内光強度の分布、
ひいては反射率の分布として検出される。As described above, the light 5 irradiated on the sample 4
Is incident at various angles θ, the light intensity distribution sensor 9
Then, the distribution of the light intensity in the light beam with respect to this incident angle θ,
As a result, it is detected as a distribution of reflectance.
【００２１】上記検出された光ビーム内光強度分布（た
とえば反射率分布）に基づいて、より具体的には検出さ
れた光強度分布（反射率分布）と前述の理論反射率分布
とが照合され、対象となる試料の光学定数が算出され
る。この算出が、光学定数算出装置３によって行われ
る。光学定数算出装置３は、たとえばマイクロコンピュ
ータからなる。More specifically, the detected light intensity distribution (reflectance distribution) is collated with the above-mentioned theoretical reflectance distribution based on the detected light intensity distribution (eg reflectance distribution) in the light beam. , The optical constant of the target sample is calculated. This calculation is performed by the optical constant calculation device 3. The optical constant calculation device 3 is composed of, for example, a microcomputer.
【００２２】光学定数算出装置３においては、図７にそ
の処理を概念的に示すように、たとえば基板４ａ上に形
成された薄膜４ｂについて、前述の如く予め薄膜４ｂの
物理的なモデル２０から理論的に入射角θに対する反射
率Ｒを、各膜厚ｔについて算出しておく。この理論式に
より、たとえばモデル２１に示すように、膜厚ｔをパラ
メータとして各種反射率特性（特性カーブ）が求まる。
そして、センサ９による実測値として、モデル２２に示
すような入射角θに対する反射率Ｒの実測特性が検出さ
れるから、この実際に測定された反射率分布情報を上記
理論カーブに対して、たとえば非線形最小２乗法でフィ
ッティング（カーブフィッティング２３）を行うことに
より、膜厚等の各パラメータを算出（推定２４）するこ
とが可能となる。In the optical constant calculation device 3, as conceptually shown in FIG. 7, for the thin film 4b formed on the substrate 4a, for example, as described above, theoretically from the physical model 20 of the thin film 4b. Specifically, the reflectance R with respect to the incident angle θ is calculated for each film thickness t. With this theoretical formula, various reflectance characteristics (characteristic curves) can be obtained with the film thickness t as a parameter, as shown in the model 21, for example.
Then, as the actual measurement value by the sensor 9, the actual measurement characteristic of the reflectance R with respect to the incident angle θ as shown in the model 22 is detected, and thus the actually measured reflectance distribution information is compared with the theoretical curve, for example. By performing the fitting (curve fitting 23) by the non-linear least squares method, each parameter such as the film thickness can be calculated (estimated 24).
【００２３】本発明は、上述のような測定ヘッド２およ
び光学定数算出装置３を備えた光学定数測定装置１を、
一つのまとまった装置として実現したものである。上記
カーブフィッティングによる算出から、前述の（５）、
（６）式に基づいて、測定対象が基板の場合にはその屈
折率、消衰係数を求めることが可能となり、測定対象が
薄膜の場合には、その屈折率、消衰係数または膜厚を求
めることが可能となる。The present invention provides an optical constant measuring device 1 having the measuring head 2 and the optical constant calculating device 3 as described above,
It was realized as a single unit. From the above curve fitting calculation, the above (5),
When the measurement target is a substrate, the refractive index and the extinction coefficient can be calculated based on the equation (6). When the measurement target is a thin film, the refractive index, the extinction coefficient, or the film thickness can be calculated. It becomes possible to ask.
【００２４】上述のような測定原理に基づいて、上記の
ような測定ヘッドを顕微鏡に組み込むことができる。す
なわち、図８に本発明に係る顕微鏡の一実施態様の基本
構成を示すように、該顕微鏡３１は、試料台３２と、該
試料台３２に装着された試料３３の表面に前述のような
収束光または発散光を照射する照射光学系、上記収束光
または発散光の試料３３からの反射光を導く受光光学系
および該受光光学系により導かれた反射光の光ビーム内
光強度分布を検出する光強度分布センサを備えた測定ヘ
ッド３４と、該測定ヘッド３４を装着する顕微鏡本体３
５とを備えている。上記測定ヘッド３４は、顕微鏡本体
３５に着脱可能に構成されている。Based on the above-described measuring principle, the measuring head as described above can be incorporated in a microscope. That is, as shown in FIG. 8 which shows the basic configuration of one embodiment of the microscope according to the present invention, the microscope 31 has the above-described focusing on the surface of the sample stage 32 and the sample 33 mounted on the sample stage 32. An irradiation optical system for irradiating light or divergent light, a light receiving optical system for guiding the converged light or divergent light reflected from the sample 33, and a light intensity distribution in the light beam of the reflected light guided by the light receiving optical system are detected. Measuring head 34 equipped with a light intensity distribution sensor, and microscope body 3 to which the measuring head 34 is attached
5 is provided. The measuring head 34 is configured to be attachable to and detachable from the microscope body 35.
【００２５】また、測定ヘッド３４以外の部分は、基本
的には市販の顕微鏡と同等の構成を有しており、本実施
態様においては、対物レンズ３６、照明光源３７（たと
えば白色光源）、ＣＣＤカメラ等からなる撮像カメラ３
８、接眼鏡３９を備えている。The parts other than the measuring head 34 have basically the same structure as a commercially available microscope. In this embodiment, the objective lens 36, the illumination light source 37 (for example, a white light source), the CCD. Imaging camera 3 including a camera
8. The eyepiece 39 is provided.
【００２６】より具体的な構造は、たとえば図９に示す
ように実現できる。図９においては、図８に示したと同
等の機能を有する部位に、図８に付したのと同じ符号を
付してある。A more specific structure can be realized, for example, as shown in FIG. In FIG. 9, portions having the same functions as those shown in FIG. 8 are designated by the same reference numerals as those given in FIG.
【００２７】この顕微鏡３１の内部は、たとえば図１０
に示すような構成を有している。図１０において、測定
ヘッド３４は、試料３３に向けて照射される光としての
レーザ光を出射するレーザ光源４０を備えており、レー
ザ光源４０からのレーザ光４１がハーフミラー４２で反
射された後、対物レンズ３６で集光されて試料３３の表
面に照射される。The inside of the microscope 31 is, for example, as shown in FIG.
It has a configuration as shown in FIG. In FIG. 10, the measurement head 34 includes a laser light source 40 that emits laser light as light to be irradiated toward the sample 33, and after the laser light 41 from the laser light source 40 is reflected by the half mirror 42. The light is condensed by the objective lens 36 and is irradiated onto the surface of the sample 33.
【００２８】試料３３からの反射光が、本実施態様では
照射光学系と一部同じ光道を有する受光光学系を通り、
ハーフミラー４２を透過した後ハーフミラー４３で反射
され、コンデンサレンズ４４で集光され、ピンホール４
５を通した後ビームスプリッタ４６を介して、アレイセ
ンサ４７、４８にて、光ビーム内光強度分布がＰ偏光成
分、Ｓ偏光成分として検出される。In the present embodiment, the reflected light from the sample 33 passes through the light receiving optical system having the same optical path as that of the irradiation optical system,
After passing through the half mirror 42, it is reflected by the half mirror 43 and condensed by the condenser lens 44, and the pinhole 4
After passing 5 through the beam splitter 46, the array sensors 47 and 48 detect the light intensity distribution in the light beam as a P-polarized component and an S-polarized component.
【００２９】そして本実施態様では、検出された光ビー
ム内光強度分布の信号が光学定数算出装置４９に送ら
れ、該光学定数算出装置４９にて、検出された光ビーム
内光強度分布に基づいて、前述の測定原理により試料３
３の光学定数が算出される。In the present embodiment, the signal of the detected light intensity distribution in the light beam is sent to the optical constant calculation device 49, and the optical constant calculation device 49 uses the detected light intensity distribution in the light beam based on the detected light intensity distribution. Then, the sample 3
The optical constant of 3 is calculated.
【００３０】上記光学定数算出装置４９は、顕微鏡３１
と一体的な、あるいは１セットの装置として構成されて
いる。したがって、光学定数算出装置４９を含む顕微鏡
装置として、前述の測定原理に基づいて試料３３の光学
定数を測定することが可能となる。The optical constant calculating device 49 comprises a microscope 31.
It is configured as an integrated device or a set of devices. Therefore, it becomes possible to measure the optical constant of the sample 33 based on the above-mentioned measurement principle as a microscope device including the optical constant calculation device 49.
【００３１】また、予め光学定数が判っている標準試料
を各種準備し、その標準試料でキャリブレーションして
測定対象となる試料３３の光学定数を求めることもでき
る。It is also possible to prepare various standard samples whose optical constants are known in advance and calibrate with the standard samples to obtain the optical constants of the sample 33 to be measured.
【００３２】また、上記測定ヘッド３４は、顕微鏡本体
３５に着脱可能なコンパクトな構成を有するから、市販
の顕微鏡に簡単な改造を加えるだけで本測定ヘッド３４
を組み込むことが可能となっている。Further, since the measuring head 34 has a compact structure which can be attached to and detached from the microscope main body 35, the main measuring head 34 can be obtained by simply modifying a commercially available microscope.
Can be incorporated.
【００３３】なお、図１０に示した態様では、従来から
知られている顕微鏡と同様、照明光源として白色光源５
０、集光レンズ５１、ハーフミラー５２、撮像カメラと
してＣＣＤカメラ５３、リレーレンズ５４を組み込んで
ある。In the embodiment shown in FIG. 10, the white light source 5 is used as the illumination light source as in the conventionally known microscope.
0, a condenser lens 51, a half mirror 52, a CCD camera 53 as an imaging camera, and a relay lens 54 are incorporated.
【００３４】また、前述の接眼鏡３９で肉眼にて観る場
合には、レーザ光が接眼鏡内にまで到達してくることは
好ましくないので、該到達レーザ光を弱くするか、レー
ザ光のみ選択的にカットすることが好ましい。レーザ光
のみを選択的にカットする手段として、たとえばレーザ
光に含まれる波長域の光のみ反射または吸収するノッチ
フィルタ（図示略）があり、これをたとえばハーフミラ
ー４３とハーフミラー５２の間に挿入して、該ノッチフ
ィルタでレーザ光のみをカットした状態で接眼鏡を通し
て観るようにすればよい。When viewing with the naked eye through the eyepiece 39, it is not preferable that the laser light reaches the inside of the eyepiece. Therefore, the reaching laser light is weakened or only the laser light is selected. It is preferable to cut it. As a means for selectively cutting only the laser light, for example, there is a notch filter (not shown) that reflects or absorbs only the light in the wavelength range included in the laser light, which is inserted between the half mirror 43 and the half mirror 52, for example. Then, the notch filter may be used to view only the laser light through the eyepiece.
【００３５】このように、本発明に係る顕微鏡において
は、上述のような機能を備えた小型の測定ヘッド３４を
組み込むことにより、つまり、汎用顕微鏡における光学
系の途中に上記の小型測定ヘッド３４を挿入すること
で、極めて便利に試料３３の光学定数を測定することが
可能になる。As described above, in the microscope according to the present invention, the small measuring head 34 having the above-mentioned functions is incorporated, that is, the small measuring head 34 is provided in the middle of the optical system of the general-purpose microscope. By inserting, the optical constant of the sample 33 can be measured very conveniently.
【００３６】[0036]
【発明の効果】以上説明したように、本発明の光学定数
測定装置によれば、コンパクトな装置構成で、基板や基
板表面に形成された薄膜の各種光学定数を測定すること
が可能となる。As described above, according to the optical constant measuring device of the present invention, it is possible to measure various optical constants of the substrate or the thin film formed on the substrate surface with a compact device configuration.
【００３７】また、顕微鏡本体に本発明に係る測定ヘッ
ドを組み込むことで、汎用の顕微鏡とそれ程変わらない
サイズのコンパクトな顕微鏡構成にて、試料の光学定数
を簡単に測定することができるようになる。Further, by incorporating the measuring head according to the present invention in the main body of the microscope, it becomes possible to easily measure the optical constants of the sample with a compact microscope structure having a size not much different from that of a general-purpose microscope. .
【００３８】本発明は、たとえば、液晶ディスプレイ用
基板や、各種基板上に形成された薄膜の光学定数、たと
えば膜厚や、屈折率、消衰係数等の光学定数の測定に適
用でき、さらに、光学定数の測定を要するあらゆる分野
においての適用が可能である。The present invention can be applied to, for example, measurement of optical constants of liquid crystal display substrates and thin films formed on various substrates, for example, optical constants such as film thickness, refractive index and extinction coefficient. It can be applied to all fields that require measurement of optical constants.
【図１】本発明の一実施態様に係る光学定数測定装置の
概略構成図である。FIG. 1 is a schematic configuration diagram of an optical constant measuring device according to an embodiment of the present invention.
【図２】試料に照射される収束光の一例を示す概略構成
図である。FIG. 2 is a schematic configuration diagram showing an example of convergent light with which a sample is irradiated.
【図３】試料に照射される発散光の一例を示す概略構成
図である。FIG. 3 is a schematic configuration diagram showing an example of divergent light with which a sample is irradiated.
【図４】試料における多重反射の様子を示す説明図であ
る。FIG. 4 is an explanatory diagram showing a state of multiple reflection in a sample.
【図５】Ｓ偏光反射率の一例を示す、入射角に対する特
性図である。FIG. 5 is a characteristic diagram showing an example of S-polarized reflectance with respect to an incident angle.
【図６】Ｐ偏光反射率の一例を示す、入射角に対する特
性図である。FIG. 6 is a characteristic diagram showing an example of P-polarized reflectance with respect to an incident angle.
【図７】光学定数算出装置における処理例を示す説明図
である。FIG. 7 is an explanatory diagram showing a processing example in the optical constant calculation device.
【図８】本発明の一実施態様に係る顕微鏡の概略構成図
である。FIG. 8 is a schematic configuration diagram of a microscope according to an embodiment of the present invention.
【図９】本発明の一実施態様に係る顕微鏡のより具体的
な外観構成を示す構成図である。FIG. 9 is a configuration diagram showing a more specific external configuration of the microscope according to the embodiment of the present invention.
【図１０】本発明の顕微鏡の内部構成例を示す概略構成
図である。FIG. 10 is a schematic configuration diagram showing an internal configuration example of a microscope of the present invention.
１ 光学定数測定装置 ２ 測定ヘッド ３ 光学定数算出装置 ４ 試料 ４ａ 基板 ４ｂ 薄膜 ５ 照射される光 ５ａ 収束光 ５ｂ 発散光 ６ 照射光学系 ７ 反射光 ８ 受光光学系 ９ 光強度分布センサ １０ レーザ光源 １１ ハーフミラー １２ 対物レンズ ３１ 顕微鏡 ３２ 試料台 ３３ 試料 ３４ 測定ヘッド ３５ 顕微鏡本体 ３６ 対物レンズ ３７ 照明光源 ３８ 撮像カメラ ３９ 接眼鏡 ４０ レーザ光源 ４１ レーザ光 ４２、４３、５２ ハーフミラー ４４ コンデンサレンズ ４５ ピンホール ４６ ビームスプリッタ ４７、４８ アレイセンサ ４９ 光学定数算出装置 ５０ 白色光源 ５１ 集光レンズ ５３ ＣＣＤカメラ ５４ リレーレンズ DESCRIPTION OF SYMBOLS 1 Optical constant measuring device 2 Measuring head 3 Optical constant calculating device 4 Sample 4a Substrate 4b Thin film 5 Irradiated light 5a Convergent light 5b Convergent light 6 Irradiation optical system 7 Reflected light 8 Light receiving optical system 9 Light intensity distribution sensor 10 Laser light source 11 Half mirror 12 Objective lens 31 Microscope 32 Sample stage 33 Sample 34 Measuring head 35 Microscope main body 36 Objective lens 37 Illumination light source 38 Imaging camera 39 Eyepiece 40 Laser light source 41 Laser light 42, 43, 52 Half mirror 44 Condenser lens 45 Pinhole 46 Beam splitter 47, 48 Array sensor 49 Optical constant calculation device 50 White light source 51 Condenser lens 53 CCD camera 54 Relay lens
Claims (6)
る照射光学系、前記収束光または発散光の前記試料から
の反射光を導く受光光学系および該受光光学系により導
かれた反射光の光ビーム内光強度分布を検出する光強度
分布センサを備えた測定ヘッドと、検出された該光ビー
ム内光強度分布に基づいて前記試料の光学定数または前
記試料表面に形成された薄膜の光学定数を算出する光学
定数算出装置とを備えたことを特徴とする光学定数測定
装置。1. An irradiation optical system for irradiating a sample surface with convergent light or divergent light, a light receiving optical system for guiding the reflected light of the convergent light or divergent light from the sample, and a reflected light guided by the light receiving optical system. A measuring head including a light intensity distribution sensor for detecting a light intensity distribution in the light beam, and an optical constant of the sample or a thin film formed on the sample surface based on the detected light intensity distribution in the light beam. An optical constant measuring device for calculating the optical constant.
面に収束光または発散光を照射する照射光学系、前記収
束光または発散光の前記試料からの反射光を導く受光光
学系および該受光光学系により導かれた反射光の光ビー
ム内光強度分布を検出する光強度分布センサを備えた測
定ヘッドと、該測定ヘッドを装着する顕微鏡本体とを備
えたことを特徴とする顕微鏡。2. A sample table, an irradiation optical system for irradiating the surface of the sample mounted on the sample table with convergent light or divergent light, a light receiving optical system for guiding the reflected light of the convergent light or divergent light from the sample, and A microscope comprising: a measuring head having a light intensity distribution sensor for detecting a light intensity distribution in a light beam of reflected light guided by the light receiving optical system; and a microscope main body to which the measuring head is mounted.
脱可能なものである、請求項２に記載の顕微鏡。3. The microscope according to claim 2, wherein the measuring head is attachable to and detachable from the microscope body.
光ビーム内光強度分布に基づいて前記試料の光学定数ま
たは前記試料表面に形成された薄膜の光学定数を算出す
る光学定数算出装置を備えている、請求項２または３に
記載の顕微鏡。4. An optical constant calculating device for calculating an optical constant of the sample or an optical constant of a thin film formed on the sample surface based on the light intensity distribution in the light beam detected by the light intensity distribution sensor. The microscope according to claim 2 or 3, which is present.
えている、請求項２ないし４のいずれかに記載の顕微
鏡。5. The microscope according to claim 2, wherein the irradiation optical system includes a laser light generator.
のいずれかに記載の顕微鏡。6. The apparatus according to claim 2, further comprising an eyepiece.
The microscope according to any one of 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02316396A JP3794745B2 (en) | 1996-01-16 | 1996-01-16 | Optical constant measuring device and microscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02316396A JP3794745B2 (en) | 1996-01-16 | 1996-01-16 | Optical constant measuring device and microscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09196630A true JPH09196630A (en) | 1997-07-31 |
| JP3794745B2 JP3794745B2 (en) | 2006-07-12 |
Family
ID=12102955
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP02316396A Expired - Fee Related JP3794745B2 (en) | 1996-01-16 | 1996-01-16 | Optical constant measuring device and microscope |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3794745B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009300205A (en) * | 2008-06-12 | 2009-12-24 | Horiba Ltd | End point detecting apparatus |
| WO2019031667A1 (en) * | 2017-08-07 | 2019-02-14 | 한국표준과학연구원 | Device and method for measuring thickness and refractive index of multilayer thin film by using angle-resolved spectral reflectometry |
| KR102015216B1 (en) * | 2018-03-12 | 2019-08-28 | 한국표준과학연구원 | An apparatus and method for measuring the thickness and refractive index of multilayer thin films using angle-resolved spectral interference image according to polarization |
| WO2021020604A1 (en) * | 2019-07-29 | 2021-02-04 | 한국표준과학연구원 | Measurement apparatus and measurement method for thickness and refractive index of multi-layer thin film, using angle-resolved spectral interference image according to polarization |
| WO2021033860A1 (en) * | 2019-08-16 | 2021-02-25 | 한국표준과학연구원 | Device and method for measuring thickness of multilayer thin film using one-shot angle-resolved spectroscopic reflectometry |
-
1996
- 1996-01-16 JP JP02316396A patent/JP3794745B2/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009300205A (en) * | 2008-06-12 | 2009-12-24 | Horiba Ltd | End point detecting apparatus |
| WO2019031667A1 (en) * | 2017-08-07 | 2019-02-14 | 한국표준과학연구원 | Device and method for measuring thickness and refractive index of multilayer thin film by using angle-resolved spectral reflectometry |
| US20210341283A1 (en) * | 2017-08-07 | 2021-11-04 | Korea Research Institute Of Standards And Science | Device and method for measuring thickness and refractive index of multilayer thin film by using angle-resolved spectral reflectometry |
| US11906281B2 (en) * | 2017-08-07 | 2024-02-20 | Korea Research Institute Of Standards And Science | Device and method for measuring thickness and refractive index of multilayer thin film by using angle-resolved spectral reflectometry |
| KR102015216B1 (en) * | 2018-03-12 | 2019-08-28 | 한국표준과학연구원 | An apparatus and method for measuring the thickness and refractive index of multilayer thin films using angle-resolved spectral interference image according to polarization |
| WO2021020604A1 (en) * | 2019-07-29 | 2021-02-04 | 한국표준과학연구원 | Measurement apparatus and measurement method for thickness and refractive index of multi-layer thin film, using angle-resolved spectral interference image according to polarization |
| US11466978B2 (en) | 2019-07-29 | 2022-10-11 | Korea Research Institute Of Standard And Science | Apparatus and method for measuring the thickness and refractive index of multilayer thin films using angle-resolved spectral interference image according to polarization |
| WO2021033860A1 (en) * | 2019-08-16 | 2021-02-25 | 한국표준과학연구원 | Device and method for measuring thickness of multilayer thin film using one-shot angle-resolved spectroscopic reflectometry |
| US11243070B2 (en) | 2019-08-16 | 2022-02-08 | Korea Research Institute Of Standards And Science | Apparatus and method for multilayer thin film thickness measurement using single-shot angle-resolved spectral reflectometry |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3794745B2 (en) | 2006-07-12 |
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