JPH09136017A - Exhaust gas treatment method - Google Patents
Exhaust gas treatment methodInfo
- Publication number
- JPH09136017A JPH09136017A JP7317245A JP31724595A JPH09136017A JP H09136017 A JPH09136017 A JP H09136017A JP 7317245 A JP7317245 A JP 7317245A JP 31724595 A JP31724595 A JP 31724595A JP H09136017 A JPH09136017 A JP H09136017A
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- ultraviolet rays
- volatile organic
- organic halogen
- decomposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明はトリクロロエチレ
ン、テトラクロロエチレン等の揮発性有機ハロゲン化合
物を含む地下水や土壌の処理で発生する排気ガスの処理
方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating exhaust gas generated in the treatment of groundwater or soil containing volatile organic halogen compounds such as trichlorethylene and tetrachloroethylene.
【０００２】[0002]
【従来の技術】近年、トリクロロエチレン、テトラクロ
ロエチレン等の人体に有害な揮発性有機ハロゲン化合物
による地下水や土壌の汚染が問題となっている。地下水
中に含まれるこれら揮発性有機ハロゲン化合物は、水へ
の溶解度が小さく、ストリッピングを行うことで容易に
排ガス中に移行する。一方、土壌中に含まれる揮発性有
機ハロゲン化合物は抽出井戸を減圧してガス状で取り出
して地上で処理している。これらは長時間連続して排出
されるため、排ガス処理も長時間連続して使用できるも
のが望まれている。2. Description of the Related Art In recent years, contamination of groundwater and soil by volatile organic halogen compounds harmful to the human body such as trichloroethylene and tetrachloroethylene has become a problem. These volatile organohalogen compounds contained in groundwater have low solubility in water and are easily transferred to exhaust gas by stripping. On the other hand, the volatile organic halogen compounds contained in the soil are decompressed in the extraction well, taken out in the form of gas, and processed on the ground. Since these are continuously discharged for a long time, it is desired that the exhaust gas treatment can be continuously used for a long time.
【０００３】これらの排ガス中から揮発性有機ハロゲン
化合物を除去する方法としては従来、活性炭等の吸着剤
に吸着させて除去する事が行われているが、近年、排ガ
スに紫外線を照射し、ガス中の揮発性有機ハロゲン化合
物を光のエネルギ−を用いて直接酸化分解し、無機化す
る方法が開発されつつある。しかし、揮発性有機ハロゲ
ン化合物を炭酸ガスや塩酸などの無機質まで分解するの
に必要な光エネルギーを既存の紫外線ランプで供給する
には照射可能な光エネルギーに限界がある。そのため，
照射時間を増大しなくてはならず、装置が大型化する問
題がある。As a method for removing the volatile organic halogen compound from the exhaust gas, it has been conventionally adsorbed to an adsorbent such as activated carbon to remove it, but in recent years, the exhaust gas is irradiated with ultraviolet rays to remove gas. A method for directly oxidizing and decomposing the volatile organic halogen compound therein by using light energy is being developed. However, there is a limit to the light energy that can be irradiated in order to supply the light energy necessary for decomposing volatile organic halogen compounds to inorganic substances such as carbon dioxide and hydrochloric acid with the existing ultraviolet lamp. for that reason,
The irradiation time has to be increased, and there is a problem that the device becomes large.
【０００４】[0004]
【発明が解決しようとする課題】本発明は上記の問題点
に着目し、短時間に処理可能な排ガス処理方法を提供す
る。The present invention focuses on the above problems and provides an exhaust gas treatment method capable of treating in a short time.
【０００５】[0005]
【課題を解決するための手段】上記課題を達成するため
に、排ガス中の揮発性有機ハロゲン化合物を含有する排
ガスに紫外線を照射し，同時に該紫外線の照射下にある
光触媒に接触させるように構成する。In order to achieve the above object, the exhaust gas containing a volatile organic halogen compound in the exhaust gas is irradiated with ultraviolet rays, and at the same time, contacted with the photocatalyst under the irradiation of the ultraviolet rays. To do.
【０００６】[0006]
【発明の実施の形態】本発明の一実施例を図面を用いて
説明する。本発明に基づく排ガス処理装置の構成を図１
に示す。排ガス中の揮発性有機ハロゲン化合物を分解す
るための分解槽１内に紫外線の光源である低圧水銀ラン
プ２と整流板３を設置した。分解槽１の内壁面と整流板
３の表面には光触媒４であるＴiＯ2を平均膜厚１.５μ
ｍで設置した。低圧水銀ランプ２は出力３０ｗで，主に
波長１８５ｎｍと２５４ｎｍの紫外線を発生する。トリ
クロロエチレン(ＴＣＥ)濃度１０００ｐｐｍに調製した
模擬排ガスを分解槽１に所定の滞留時間となる流量で連
続供給し、処理ガス中のＴＣＥ濃度を測定した。結果を
図２に示す。比較のために光触媒を付けずに紫外線のみ
で処理した従来方式の結果を併記した。従来方式は、滞
留時間１０秒では除去率９９％に達しなかったが、本発
明による方式では滞留時間１０秒で除去率９９.７％に
達した。滞留時間が長いほど処理ガス中のトリクロロエ
チレン濃度は低下するが、いずれの滞留時間でも従来方
式よりもトリクロロエチレン濃度を低減できた。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described with reference to the drawings. FIG. 1 shows the configuration of an exhaust gas treatment device based on the present invention.
Shown in A low-pressure mercury lamp 2 as a light source of ultraviolet rays and a rectifying plate 3 were installed in a decomposition tank 1 for decomposing volatile organic halogen compounds in exhaust gas. On the inner wall surface of the decomposition tank 1 and the surface of the rectifying plate 3, TiO 2 which is the photocatalyst 4 has an average film thickness of 1.5 μm.
It was installed at m. The low-pressure mercury lamp 2 has an output of 30 w and mainly emits ultraviolet rays having wavelengths of 185 nm and 254 nm. Simulated exhaust gas adjusted to have a trichlorethylene (TCE) concentration of 1000 ppm was continuously supplied to the decomposition tank 1 at a flow rate that would give a predetermined residence time, and the TCE concentration in the treated gas was measured. The results are shown in FIG. For comparison, the results of the conventional method in which the photocatalyst is not attached and only the ultraviolet rays are treated are also shown. In the conventional method, the removal rate did not reach 99% when the residence time was 10 seconds, but in the method according to the present invention, the removal rate reached 99.7% when the residence time was 10 seconds. The longer the residence time, the lower the concentration of trichlorethylene in the treated gas, but at any residence time, the concentration of trichlorethylene could be reduced compared to the conventional method.
【０００７】前記実施例では紫外線照射に低圧水銀ラン
プを用いたが波長２５０ｎｍ以下の紫外線を発生できる
ランプであれば何れでもよい。また，複数の低圧水銀ラ
ンプを設置してもよい。In the above-mentioned embodiment, the low-pressure mercury lamp was used for irradiation of ultraviolet rays, but any lamp can be used as long as it can generate ultraviolet rays having a wavelength of 250 nm or less. Also, a plurality of low pressure mercury lamps may be installed.
【０００８】[0008]
【発明の効果】本発明によりトリクロロエチレンの分解
を促進でき、短時間にトリクロロエチレンの残留濃度を
低減できる。According to the present invention, the decomposition of trichlorethylene can be promoted and the residual concentration of trichlorethylene can be reduced in a short time.
【図１】本発明の実施例を示す装置の概要。FIG. 1 is an outline of an apparatus showing an embodiment of the present invention.
【図２】本発明によるトリクロロエチレンの分解効果を
示すグラフ。FIG. 2 is a graph showing the decomposition effect of trichlorethylene according to the present invention.
１ 分解槽 ２ 低圧水銀灯 ３ 整流板 ４ 光触媒 ５ 電源 1 Decomposition tank 2 Low-pressure mercury lamp 3 Rectifier plate 4 Photocatalyst 5 Power supply
Claims (1)
分を含む排ガスに酸素からオゾンを生成する波長を含む
紫外線を照射するとともに、該紫外線の照射下にある光
触媒と接触させて処理することを特徴とする排ガス処理
方法。1. An exhaust gas containing a harmful component such as a volatile organic halogen compound is irradiated with ultraviolet rays having a wavelength for generating ozone from oxygen, and is treated by contacting with a photocatalyst under the irradiation of the ultraviolet rays. Exhaust gas treatment method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7317245A JPH09136017A (en) | 1995-11-10 | 1995-11-10 | Exhaust gas treatment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7317245A JPH09136017A (en) | 1995-11-10 | 1995-11-10 | Exhaust gas treatment method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09136017A true JPH09136017A (en) | 1997-05-27 |
Family
ID=18086106
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7317245A Pending JPH09136017A (en) | 1995-11-10 | 1995-11-10 | Exhaust gas treatment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09136017A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6358374B1 (en) * | 1999-12-17 | 2002-03-19 | Carrier Corporation | Integrated photocatalytic and adsorbent technologies for the removal of gaseous contaminants |
| KR20030032612A (en) * | 2001-10-19 | 2003-04-26 | 엘지건설 주식회사 | A method for photocatalysis of a volatile organic compound and a method for regenerating a deactivated photocatalyst |
| KR20030034590A (en) * | 2001-10-26 | 2003-05-09 | (주)서울필텍엔지니어링 | Method and apparatus for eliminating the stench and volatile organic compounds in the polluted air |
| JP2009297341A (en) * | 2008-06-16 | 2009-12-24 | Mitsubishi Electric Corp | Coolant treatment apparatus and treatment method, and freezing cycle apparatus |
| CN103127811A (en) * | 2013-03-01 | 2013-06-05 | 山东山大华特科技股份有限公司 | Stinking gas treatment method |
-
1995
- 1995-11-10 JP JP7317245A patent/JPH09136017A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6358374B1 (en) * | 1999-12-17 | 2002-03-19 | Carrier Corporation | Integrated photocatalytic and adsorbent technologies for the removal of gaseous contaminants |
| KR20030032612A (en) * | 2001-10-19 | 2003-04-26 | 엘지건설 주식회사 | A method for photocatalysis of a volatile organic compound and a method for regenerating a deactivated photocatalyst |
| KR20030034590A (en) * | 2001-10-26 | 2003-05-09 | (주)서울필텍엔지니어링 | Method and apparatus for eliminating the stench and volatile organic compounds in the polluted air |
| JP2009297341A (en) * | 2008-06-16 | 2009-12-24 | Mitsubishi Electric Corp | Coolant treatment apparatus and treatment method, and freezing cycle apparatus |
| CN103127811A (en) * | 2013-03-01 | 2013-06-05 | 山东山大华特科技股份有限公司 | Stinking gas treatment method |
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