JPH09126660A - Continuous vacuum heat treatment furnace - Google Patents
Continuous vacuum heat treatment furnaceInfo
- Publication number
- JPH09126660A JPH09126660A JP30694495A JP30694495A JPH09126660A JP H09126660 A JPH09126660 A JP H09126660A JP 30694495 A JP30694495 A JP 30694495A JP 30694495 A JP30694495 A JP 30694495A JP H09126660 A JPH09126660 A JP H09126660A
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- tray
- heat insulating
- chamber
- treatment furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は被処理物を真空中で又は
ガス雰囲気中で熱処理するための連続式真空熱処理炉に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous vacuum heat treatment furnace for heat treating an object to be treated in vacuum or in a gas atmosphere.
【０００２】[0002]
【従来の技術及びその問題点】タンタル電解コンデンサ
やアルニコ磁石などの焼結製品は脱ワックス室、焼結
室、冷却室が連設された連続式熱処理炉を用い、高温の
真空下、または高温の不活性ガス雰囲気下で焼結されて
製造されている。焼結は連続式真空熱処理炉の前段で温
度１２００〜１６００℃、圧力は１０-5ｔｏｒｒの雰囲
気で行われ、最終的には温度２０００℃、圧力１０-6ｔ
ｏｒｒ程度の雰囲気とされる。しかし、従来の連続式真
空熱処理炉では温度の均一性が得難いことのほか、エネ
ルギ・ロスや断熱材の消耗が大きいなどの問題を有して
いる。2. Description of the Related Art Sintered products such as tantalum electrolytic capacitors and alnico magnets use a continuous heat treatment furnace in which a dewaxing chamber, a sintering chamber, and a cooling chamber are connected in series under high temperature vacuum or high temperature. Manufactured by sintering in an inert gas atmosphere. Sintering is performed in an atmosphere of a temperature of 1200 to 1600 ° C. and a pressure of 10 −5 torr before the continuous vacuum heat treatment furnace, and finally a temperature of 2000 ° C. and a pressure of 10 −6 t.
The atmosphere is about orr. However, in the conventional continuous vacuum heat treatment furnace, it is difficult to obtain temperature uniformity, and there are problems such as energy loss and large consumption of heat insulating material.
【０００３】図８は従来例としての代表的なローラハー
ス式熱処理炉１００における焼結室１０３の搬送方向に
直角な断面を示す断面図である。角筒状の焼結室１０３
は左右の側壁から張り出された支持部材１０４上に底板
１０５を設けて底部リフレクタ１０６を固定し、それら
を跨いで半円筒状の上部リフレクタ１０７がトンネル状
に設けられている。また、図示しない端子を経て上部リ
フレクタ１０７の一方の外部から内部へ帯状の電熱ヒー
タ１０８が導入され、上部リフレクタ１０７内の下面側
に張設されて他方の外部へ導出されている。更には焼結
室１０３には拡散ポンプ１０９を主体とする真空排気系
が接続されている。FIG. 8 is a cross-sectional view showing a cross section perpendicular to the conveying direction of the sintering chamber 103 in a typical roller hearth type heat treatment furnace 100 as a conventional example. Square cylindrical sintering chamber 103
Is provided with a bottom plate 105 on a support member 104 protruding from the left and right side walls to fix a bottom reflector 106, and a semi-cylindrical upper reflector 107 is provided in a tunnel shape straddling them. Further, a belt-shaped electric heater 108 is introduced from the outside to the inside of the upper reflector 107 through a terminal (not shown), is stretched on the lower surface side inside the upper reflector 107, and is led to the outside of the other. Further, a vacuum evacuation system including a diffusion pump 109 as a main component is connected to the sintering chamber 103.
【０００４】一方、支持部材１０４の下方には左右の軸
受１１１に軸支され、焼結室１０３外の図示しない電動
機によってシール機構１１２を介して回転される回転軸
１１３に搬送ローラ１１４が取り付けられており、移送
方向に並置された搬送ローラ１１４によって被処理物Ｓ
を載置した搬送台１２１が左右の支持部材１０４の間、
および左右の底部リフレクタ１０６の間を搬送されるよ
うになっている。On the other hand, below the supporting member 104, a conveying roller 114 is attached to a rotary shaft 113 which is axially supported by left and right bearings 111 and which is rotated by a motor (not shown) outside the sintering chamber 103 via a seal mechanism 112. And the object to be processed S is conveyed by the conveyance rollers 114 juxtaposed in the transfer direction.
Between the support members 104 on the left and right,
And between the left and right bottom reflectors 106.
【０００５】すなわち、搬送台１２１は搬送台底板１２
７上において左右の底部リフレクタ１０６を挟む上下の
断熱板１２３、１２４を支柱１２５で結合し、支柱１２
５には左右の底部リフレクタ１０６に対応する高さレベ
ルに搬送台リフレクタ１２６を設けた台座が固定されて
おり、被処理物Ｓは上方の断熱板１２３上にトレイ１２
２と共に載置される。That is, the carrier 121 is the bottom plate 12 of the carrier.
7, upper and lower heat insulating plates 123 and 124 sandwiching the left and right bottom reflectors 106 are joined by a pillar 125 to form a pillar 12.
5, a pedestal provided with a carrier base reflector 126 at a height level corresponding to the left and right bottom reflectors 106 is fixed, and the object S to be processed is placed on the upper heat insulating plate 123 in the tray 12.
Placed with 2.
【０００６】この従来例のローラハース式熱処理炉１０
０では電熱ヒータ１０８と、下方の搬送台底板１２７、
搬送ローラ１１４を含む搬送系とが近接しているので、
搬送系を保護し、かつ熱エネルギ・ロスを少なくするた
めに搬送台１２１には断熱板１２３、１２４を設け、搬
送台リフレクタ１２６を取り付けており、高融点金属の
タングステン（Ｗ）、モリブデン（Ｍｏ）等が断熱材と
して多用されている。しかし、被処理物Ｓを半円筒状の
上部リフレクタ１０７内に置いたままの状態で搬送台１
２１が回転するローラ１１４によって搬送される関係
上、断熱板１２３、１２４と底部リフレクタ１０６との
間、搬送台リフレクタ１２６と底部リフレクタ１０６と
の間は余裕を持った間隔とせざるを得ず、従ってローラ
１１４等の搬送系も加熱されて熱エネルギ・ロスが大き
く、また温度２０００℃の焼結を行なう場合に±１０℃
の温度維持が困難であり、加熱温度の均一性は十分でな
い。更には、多用されている高融点金属は高温に晒され
ることによって再結晶化が進み脆化するので一定期間経
過後には交換を必要とする。これらのことによって従来
のローラハース式熱処理炉１００は多大のランニングコ
ストを要している。また、焼結の完了し冷却された後、
被処理物Ｓはトレイ１２２、断熱板１２３、１２４、支
柱１２５、搬送台リフレクタ１２６、搬送台底板１２７
と共に炉外の大気中に搬出されるが、その時に水分を吸
着し、再度、焼結室１０３へ搬入され真空下に加熱され
た時に大量のガスを放出するので、１０-6ｔｏｒｒの高
真空度が要求される焼結には満足に対応し得ないもので
ある。This conventional roller hearth type heat treatment furnace 10
At 0, the electric heater 108 and the lower carrier table 127,
Since the conveyance system including the conveyance rollers 114 is close to each other,
In order to protect the transfer system and reduce heat energy loss, heat insulating plates 123 and 124 are provided on the transfer stand 121, and a transfer stand reflector 126 is attached, and tungsten (W) and molybdenum (Mo), which are refractory metals, are attached. ) Is often used as a heat insulating material. However, the object S to be processed is left in the semi-cylindrical upper reflector 107 and the carrier 1
Due to the fact that 21 is conveyed by the rotating roller 114, there is no choice but to allow a sufficient space between the heat insulating plates 123 and 124 and the bottom reflector 106 and between the carrier table 126 and the bottom reflector 106. The transport system such as the roller 114 is also heated, resulting in a large heat energy loss, and ± 10 ° C when sintering at a temperature of 2000 ° C.
Is difficult to maintain, and the heating temperature is not uniform. Furthermore, the frequently used refractory metal is recrystallized and becomes brittle when exposed to high temperatures, so that it needs to be replaced after a certain period of time. For these reasons, the conventional roller hearth type heat treatment furnace 100 requires a great running cost. Also, after sintering is completed and cooled,
The processing object S includes a tray 122, heat insulating plates 123 and 124, columns 125, a carrier reflector 126, and a carrier bottom plate 127.
Along with this, it is carried out to the atmosphere outside the furnace, but at that time it adsorbs moisture and again releases a large amount of gas when carried into the sintering chamber 103 and heated under vacuum, so a high vacuum of 10 −6 torr is obtained. It is not possible to satisfactorily deal with sintering, which requires high degree.
【０００７】[0007]
【発明が解決しようとする問題点】本発明は上述の問題
に鑑みてなされ、熱処理時において加熱温度の均一性に
優れ、かつ熱エネルギ・ロスおよび断熱材の消耗が小さ
くランニング・コストの低い連続式真空焼結炉、更には
熱処理時にガス放出量が小さく、高品質の熱処理が可能
な連続式真空熱処理炉を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and is excellent in the uniformity of the heating temperature during the heat treatment, and the heat energy loss and the heat insulating material consumption are small, and the running cost is low. It is an object of the present invention to provide a continuous vacuum heat treatment furnace, and further, a continuous vacuum heat treatment furnace capable of performing high-quality heat treatment with a small amount of gas released during heat treatment.
【０００８】[0008]
【問題点を解決するための手段】以上の目的は、熱処理
室と搬送室とからなり、前記熱処理室は下方の連通用開
口を介して前記搬送室と連通し、内部には下方を挿入用
開口とした加熱区画が設けられており、前記搬送室は一
方の側端に被処理物の搬入口、他方の側端に搬出口を有
してそれぞれ仕切扉により開閉可能に密閉され、内部に
は前記被処理物の搬送機構と、該搬送機構上にある前記
被処理物を上昇させて前記挿入用開口から前記加熱区画
内へ挿入すると共に前記挿入用開口または前記連通用開
口を塞ぐ昇降機構とが配設されている真空熱処理炉が複
数連設された連続式真空熱処理炉において、前記昇降機
構は前記搬送室内または外の駆動源と、該駆動源によっ
て昇降されその先端が前記搬送室内にあるロッドと、該
ロッドの先端部に固定された断熱昇降蓋とからなり、該
断熱昇降蓋は前記被処理物を載置するトレイを支持する
ための上面部に立設された支柱と側面部に設けられた鍔
とを備え、前記搬送機構は前記断熱昇降蓋の前記鍔が挿
通可能に形成された比較的大きい開口を有する搬送台、
該搬送台の前記比較的大きい開口上に置かれ前記支柱と
前記断熱昇降蓋とが挿通可能に形成された比較的小さい
開口を有するトレイ受け用断熱板、および該トレイ受け
用断熱板の前記比較的小さい開口上に重ねて置かれる前
記トレイとからなる載置系と、該載置系を搬送するため
の前記搬入口から前記搬出口にわたって配設された搬送
系と、搬送されてくる前記搬送台を検知して前記加熱区
画の直下に停止させるためのセンサと前記搬送台を停止
位置に停止させて固定するストッパとからなる停止位置
制御系とからなり、前記搬送台が前記被処理物と共に前
記搬送系によって搬送され、前記停止位置制御系により
前記加熱区画の直下の前記停止位置に停止固定され、前
記昇降機構の前記駆動源によって前記昇降蓋が上昇され
て前記支柱が前記被処理物を前記トレイと共に支持して
前記挿入用開口から前記加熱区画内へ挿入し、同時に前
記鍔に伴われて上昇する前記トレイ受け用断熱板と前記
断熱昇降蓋とによって前記挿入用開口または前記連通用
開口が断熱的に密閉され、前記被処理物が加熱されて熱
処理されることを特徴とする連続式真空熱処理炉、によ
って達成される。[Means for Solving the Problems] The above object is composed of a heat treatment chamber and a transfer chamber, the heat treatment chamber communicates with the transfer chamber through a lower communication opening, and the lower part is inserted inside. A heating compartment with an opening is provided, and the transfer chamber has an inlet for the object to be processed at one side end and an outlet at the other side end, each of which is opened and closed by a partition door, and is internally closed. Is a transfer mechanism for the object to be processed, and an elevating mechanism for raising the object to be processed on the transfer mechanism to insert the object from the insertion opening into the heating section and closing the insertion opening or the communication opening. In a continuous vacuum heat treatment furnace in which a plurality of vacuum heat treatment furnaces are installed, the elevating mechanism is moved up and down by the drive source inside or outside the transfer chamber, and its tip is moved to the inside of the transfer chamber. A rod and the tip of the rod A heat insulating lift lid that is fixed, the heat insulating lift lid includes a pillar that is erected on an upper surface portion for supporting a tray on which the object to be processed is placed, and a collar provided on a side surface portion, The transfer mechanism has a transfer table having a relatively large opening formed so that the flange of the heat insulating lift cover can be inserted therethrough,
A tray receiving heat insulating plate having a relatively small opening placed on the relatively large opening of the carrier so that the pillar and the heat insulating lift cover can be inserted therethrough, and the comparison of the tray receiving heat insulating plate A loading system configured by stacking the trays on a small opening, a transport system for transporting the loading system from the carry-in port to the carry-out port, and the transport being carried. A stop position control system including a sensor for detecting a table and stopping it immediately below the heating section and a stopper for stopping and fixing the transfer table at a stop position, and the transfer table together with the object to be processed. It is transported by the transport system, stopped and fixed at the stop position directly below the heating section by the stop position control system, the drive lid of the lift mechanism raises the lift lid, and The processed product is supported together with the tray and is inserted into the heating compartment from the insertion opening, and at the same time, the tray receiving heat insulating plate and the heat insulating lift lid that rise together with the flange and the insertion opening or the heat insulating cover. This is achieved by a continuous vacuum heat treatment furnace, characterized in that the communication opening is adiabatically sealed and the object to be treated is heated and heat treated.
【０００９】[0009]
【作用】搬送系によって被処理物と共に搬送されてくる
搬送台はセンサによって検知されストッパによって熱処
理室の直下の停止位置に停止され固定される。次いで昇
降機構の駆動源がロッドを上昇させ、その先端部の断熱
昇降蓋の上面部に立設されている支柱が搬送台上の被処
理物をトレイと共に押し上げて挿入用開口から熱処理室
内へ挿入する。この時、断熱昇降蓋と、その側面部の鍔
に伴われて上昇してきたトレイ受け用断熱板とによって
挿入用開口または連通用開口が断熱的に密閉され、被処
理物が真空下に加熱されて熱処理される。The transport table, which is transported by the transport system together with the object to be processed, is detected by the sensor and stopped and fixed at the stop position immediately below the heat treatment chamber by the stopper. Next, the drive source of the elevating mechanism raises the rod, and the column at the tip of the heat insulating elevating lid, which stands upright, pushes up the workpiece on the carrier with the tray and inserts it into the heat treatment chamber through the insertion opening. To do. At this time, the insertion opening or the communication opening is adiabatically sealed by the heat-insulating lifting lid and the heat-receiving plate for receiving the tray that has risen along with the flange of the side surface, and the object to be processed is heated under vacuum. Heat treated.
【００１０】[0010]
【実施例】以下、本発明の実施例による連続式真空熱処
理炉について、図面を参照して具体的に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A continuous vacuum heat treatment furnace according to embodiments of the present invention will be specifically described below with reference to the drawings.
【００１１】図１は実施例の連続式真空熱処理炉１０の
縦断面図である。左側から脱ワックス部１、第１焼結部
２、第２焼結部３、冷却部４が連設されており、左端に
搬入扉５、右端に搬出扉９が密閉可能に設けられてい
る。脱ワックス部１は熱処理室としての脱ワックス室１
１1 、搬送室３１1 、昇降機室６１1 からなり、同様に
第１焼結部２は熱処理室としての焼結室１１2 、搬送室
３１2 、昇降機室６１2、第２焼結部３は熱処理室とし
ての焼結室１１3 、搬送室３１3 、昇降機室６１3 から
構成されている。第２焼結部３について説明すれば、焼
結室１１3 内には複数の熱反射板からなるリフレクタ２
３3 で囲われた加熱区画２５3 が設けられ、加熱区画２
５3 の内面側には電熱ヒータ２９3 が張設されている。
また搬送室３１3 には被処理物Ｓを搬送するためのチェ
インベルト３４3 が配設され、昇降機室６１3 内には被
処理物Ｓを昇降させるための昇降機６２3 とその先端部
の断熱昇降蓋７３3 とが配置されている。細部は異なる
もののこれらのことは脱ワックス部１、第１焼結部２に
おいても同様であるので、同じ構成要素には添字を変え
て（脱ワックス部１は添字１、第１焼結部２は添字２）
同一の符号を付し、それぞれについての説明は省略す
る。FIG. 1 is a vertical sectional view of a continuous vacuum heat treatment furnace 10 of the embodiment. A dewaxing unit 1, a first sintering unit 2, a second sintering unit 3, and a cooling unit 4 are continuously provided from the left side, and a carry-in door 5 is provided at the left end and a carry-out door 9 is provided at the right end so as to be hermetically sealed. . The dewaxing unit 1 is a dewaxing chamber 1 as a heat treatment chamber.
11 1 , a transfer chamber 31 1 and an elevator chamber 61 1 ; similarly, the first sintering section 2 includes a sintering chamber 11 2 , which is a heat treatment chamber, a transfer chamber 31 2 , an elevator chamber 61 2 , and a second sintering section 3. Is composed of a sintering chamber 11 3 as a heat treatment chamber, a transfer chamber 31 3 and an elevator chamber 61 3 . Explaining the second sintering section 3, the reflector 2 including a plurality of heat reflection plates is provided in the sintering chamber 11 3 .
3 heating zone 25 3 surrounded by 3 is provided, the heating compartment 2
An electric heater 29 3 is stretched on the inner surface side of 5 3 .
Also the transfer chamber 31 3 is chain belt 34 3 disposed for conveying the object to be treated S, the elevator chamber 61 3 and elevator 62 3 for raising and lowering the object to be processed S insulation of its distal end An elevating lid 73 3 is arranged. Although the details are different, the same applies to the dewaxing section 1 and the first sintering section 2. Therefore, the subscripts are changed to the same components (the dewaxing section 1 is the subscript 1, the first sintering section 2 is the same). Is a subscript 2)
The same reference numerals are given and the description of each is omitted.
【００１２】また、冷却部４は冷却搬送室４１と冷却機
器室４２とからなっており、冷却機器室４２には外部の
電動機４３で駆動されるファン４５、および循環される
加圧ガスを冷却するための冷凍器４６が設けられ冷却搬
送室４１には搬送用のチェインベルト４４が配設されて
いる。The cooling unit 4 is composed of a cooling transfer chamber 41 and a cooling device chamber 42. The cooling device chamber 42 cools a fan 45 driven by an external electric motor 43 and a circulated pressurized gas. A freezer 46 for cooling is provided, and a chain belt 44 for carrying is provided in the cooling carrying chamber 41.
【００１３】そして、脱ワックス部１、第１焼結部２、
第２焼結部３の各搬送室３１1 、３１2 、３１3 および
冷却部４の冷却搬送室４１は同一高さレベルとしてそれ
ぞれの間はフランジで接合されており、密閉可能な仕切
扉６、７、８が設けられている。更には、脱ワックス室
１１1 、第１焼結室１１2 、第２焼結室１１3 、冷却搬
送室４１にはそれぞれに対応する真空排気系Ａ、Ｂ、
Ｃ、Ｄが接続されており、第１焼結室１１2 、第２焼結
室１１3 にはアルゴン（Ａｒ）ガス、脱ワックス室１１
1 、冷却搬送室４１にはＡｒガスと窒素（Ｎ2 ）ガスを
導入し得るようになっている。Then, the dewaxing section 1, the first sintering section 2,
The transfer chambers 31 1 , 31 2 , 31 3 of the second sintering unit 3 and the cooling transfer chamber 41 of the cooling unit 4 are joined to each other with a flange at the same height level, and the sealable partition door 6 is provided. , 7, 8 are provided. Further, the dewaxing chamber 11 1 , the first sintering chamber 11 2 , the second sintering chamber 11 3 and the cooling transfer chamber 41 are respectively provided with vacuum exhaust systems A and B,
C, D are connected, the first sintering chamber 11 2, the second sintering chamber 11 3 argon (Ar) gas, dewaxing chamber 11
1. Ar gas and nitrogen (N 2 ) gas can be introduced into the cooling transfer chamber 41.
【００１４】上述した様に脱ワックス部１、第１焼結部
２、第２焼結部３はほぼ同様に構成されているので第２
焼結部３について詳しく説明する（なお以降、添字は省
略する）。図２は第２焼結部３の拡大縦断面図であり、
図３は図２における［３］−［３］線方向の矢視図であ
る。As described above, the dewaxing section 1, the first sintering section 2 and the second sintering section 3 have substantially the same structure, so
The sintered part 3 will be described in detail (subscripts will be omitted hereinafter). FIG. 2 is an enlarged vertical sectional view of the second sintered portion 3,
FIG. 3 is a view taken along the line [3]-[3] in FIG.
【００１５】熱処理室としての焼結室１１は鋼板で２重
に作製された鏡板１２と側壁１３とがフランジで気密に
接合されて形成され、２重の鋼板の間は冷却水が循環さ
れて冷却され、下方の搬送室３１の連通用開口１９上に
気密に固定されている。また、焼結室１１には真空排気
系Ｃに対応する拡散ポンプ１４、メカニカルブースタポ
ンプ１５および油回転ポンプ１６からなる真空排気系が
接続されている。焼結室１１の内部には側壁１３内面の
支持部材２２に固定したリフレクタ（熱線反射板）２３
で囲われて下方を挿入用開口２４とした加熱区画２５が
形成されており、挿入用開口２４の周囲のリフレクタ２
３の下面にはシールのためにメタルＯ−リング２６が設
けられいる。加熱区画２５内の天井側は均熱化のため、
吊具２７で支えたリフレクタ２３’を付加して２重とさ
れ、その中央には温度測定端子２８が取り付けられてい
る。加熱区画２５の内面側には図示しない導入端子を経
由して帯状の電熱ヒータ２９が円筒形状に張設されてお
り３相交流が印加される。The sintering chamber 11 as the heat treatment chamber is formed by hermetically joining the end plate 12 and the side wall 13 which are made of double steel plates with a flange, and cooling water is circulated between the double steel plates. It is cooled and airtightly fixed on the communication opening 19 of the lower transfer chamber 31. Further, the sintering chamber 11 is connected to a vacuum exhaust system including a diffusion pump 14, a mechanical booster pump 15, and an oil rotary pump 16 corresponding to the vacuum exhaust system C. Inside the sintering chamber 11, a reflector (heat ray reflector) 23 fixed to a support member 22 on the inner surface of the side wall 13.
A heating section 25 surrounded by an opening 24 for insertion is formed below, and the reflector 2 around the opening 24 for insertion is formed.
A metal O-ring 26 is provided on the lower surface of 3 for sealing. Because the ceiling side in the heating section 25 is soaked,
A reflector 23 'supported by a hanging tool 27 is added to make a double layer, and a temperature measuring terminal 28 is attached to the center thereof. A strip-shaped electrothermal heater 29 is stretched in a cylindrical shape on the inner surface side of the heating section 25 via an introduction terminal (not shown), and a three-phase alternating current is applied.
【００１６】搬送室３１は両端面に接続用のフランジ３
２、３３を備え、それぞれに密閉可能な仕切扉７、８が
設けられている。また、焼結室１１の直下において、後
述のトレイ受け用断熱板５３が挿通可能な直径の開口を
有する円環部４６ａとその開口から、同じく後述の搬送
台５２に近接するまで垂下された円筒部４６ｂとからな
る遮熱板４６が焼結室１１とは反対側の面に水冷パイプ
４７を抱いて設けられている。なお、円筒部４６ｂには
後述の被処理物Ｓの通路としての切欠き４６ｃが設けら
れている。The transfer chamber 31 has flanges 3 for connection on both end surfaces.
2 and 33 are provided with partition doors 7 and 8 that can be sealed. Further, directly below the sintering chamber 11, a circular ring portion 46a having an opening having a diameter through which a tray-receiving heat insulating plate 53, which will be described later, can be inserted, and a cylinder that hangs from the opening until it comes close to a carrier table 52, which is also described later. A heat shield plate 46 including a portion 46b is provided on the surface opposite to the sintering chamber 11 so as to hold a water cooling pipe 47. In addition, the cylindrical portion 46b is provided with a notch 46c as a passage for an object to be processed S described later.
【００１７】また、図３も参照して搬送室３１の下方に
は２本のチェインベルト３４が駆動スプロケット３５と
従動スプロケット３６に巻装されており、電動機３７で
駆動され、搬送台５２を係合して搬送する。また、フラ
ンジ３２、３３の内側には搬送台５２の搬入と搬出を介
助するロール３８、３９が設けられおり、それぞれ駆動
スプロケット３５の回転軸、従動スプロケット３６の回
転軸によってチエイン駆動される。鋼製で平厚板状の搬
送台５２に設けられた中央部の開口５２ｈの周囲の座ぐ
りにタングステン（Ｗ）を断熱材とするトレイ受け用断
熱板５３が置かれ、トレイ受け用断熱板５３に設けた中
央部の開口５３ｈの周囲の座ぐりに同じくタングステン
製のトレイ５４が重ねて置かれ、そのトレイ５４上に被
処理物Ｓが載置される。そして、搬送台５２の開口５２
ｈは後述する断熱昇降蓋７３の側面部の鍔７５が挿通可
能な直径とされ、トレイ受け用断熱板５３の開口５３ｈ
は断熱昇降蓋７３の台部７４が挿通可能な直径とされて
いる。Further, referring also to FIG. 3, below the transfer chamber 31, two chain belts 34 are wound around a drive sprocket 35 and a driven sprocket 36, driven by an electric motor 37 and engaged with the transfer table 52. Combine and transport. Further, inside the flanges 32 and 33, rolls 38 and 39 for assisting in loading and unloading of the carrier table 52 are provided, and are chain-driven by the rotary shaft of the drive sprocket 35 and the rotary shaft of the driven sprocket 36, respectively. A tray receiving heat insulating plate 53 having tungsten (W) as a heat insulating material is placed around a counterbore around an opening 52h at a central portion provided on a steel-made flat plate-shaped carrier 52, and the tray receiving heat insulating plate is provided. Similarly, a tungsten tray 54 is placed on the counterbore around the central opening 53h provided in 53, and the processing object S is placed on the tray 54. Then, the opening 52 of the carrier table 52
h has a diameter such that a flange 75 on a side surface of a heat insulating lift cover 73, which will be described later, can be inserted, and an opening 53h of the tray receiving heat insulating plate 53 is formed.
Has a diameter such that the base portion 74 of the heat insulating lift lid 73 can be inserted therethrough.
【００１８】更には、チェインベルト３４の両側に近接
してガイド板５１が設けられ、搬送される搬送台５２の
チェインベルト３４からの横ずれを規制しており、かつ
チェインベルト３４の近傍の概略断面図である図４も参
照して、ガイド板５１の上流側には搬送されてくる搬送
台５２を検知して搬送速度を減速させる光センサ５５が
設置されている。光センサ５５は発光ダイオード５５ａ
フォトトランジスタ５５ｂとが搬送台５２を挟んで設け
られ、搬送台５２が発光ダイオード５５ａとフォトトラ
ンジスタ５５ｂとの間の光を遮断すると、その遮断信号
の入力される図示しないコントローラが電動機３７によ
るチェインベルト３４の走行を減速させる。同様な光セ
ンサ５６がガイド板５１の下流側に設けられており、発
光ダイオード５６ａからフォトトランジスタ５６ｂに至
る光が搬送台５２によって遮断されるとチェインベルト
３４の走行が停止されると共に、駆動源５９ａによって
回動される回動軸５８ａに取り付けた停止ストッパ５７
ａが立ち上げられ、搬送台５２はその前端部が当接して
停止される。次いで駆動源５９ｂによって回動される回
動軸５８ｂに取り付けた位置出し用ストッパ５７ｂが立
ち上げられて搬送台５２の後端部を押さえ位置決めす
る。Further, guide plates 51 are provided close to both sides of the chain belt 34 to prevent lateral displacement of the carrier table 52 to be conveyed from the chain belt 34, and a schematic cross section near the chain belt 34. Referring also to FIG. 4 which is a drawing, an optical sensor 55 is installed upstream of the guide plate 51 to detect the carrying table 52 being carried and reduce the carrying speed. The optical sensor 55 is a light emitting diode 55a.
The phototransistor 55b is provided so as to sandwich the carrier 52, and when the carrier 52 shuts off the light between the light emitting diode 55a and the phototransistor 55b, a controller (not shown) to which the shutoff signal is input is a chain belt driven by the electric motor 37. Decelerate the running of 34. A similar optical sensor 56 is provided on the downstream side of the guide plate 51, and when the light from the light emitting diode 56a to the phototransistor 56b is blocked by the carrier table 52, the traveling of the chain belt 34 is stopped and the drive source is driven. The stop stopper 57 attached to the rotating shaft 58a rotated by 59a.
a is raised, and the carrier table 52 is stopped by abutting its front end. Next, the positioning stopper 57b attached to the rotary shaft 58b rotated by the drive source 59b is raised to press and position the rear end of the carrier table 52.
【００１９】図２へ戻り、昇降機室６１には固定スライ
ダ・クランク機構による昇降機６２が設置されている。
昇降機室６１内の一対のレール６３上を走行する車輪６
４を備えた昇降台６５が設けられ、図示しない駆動源に
よって中心Ｏの回りに回動されるクランク６６の先端部
のスライダ６７が昇降台６５内で左右にスライドするよ
うになっている。すなわち、クランク６６が回動するこ
とにより昇降台６５が上昇され下降される。なお、レー
ル６３に添って冷却水配管６８が設けられ、昇降機室６
１の底面外部に取り付けた給排水ユニット６９を経由す
る冷却水が通水される。Returning to FIG. 2, an elevator 62 using a fixed slider / crank mechanism is installed in the elevator chamber 61.
Wheels 6 traveling on a pair of rails 63 in the elevator room 61
An elevating table 65 provided with 4 is provided, and a slider 67 at the tip of a crank 66 rotated around a center O by a drive source (not shown) slides left and right in the elevating table 65. That is, as the crank 66 rotates, the elevating table 65 is raised and lowered. A cooling water pipe 68 is provided along the rail 63, and the elevator room 6
Cooling water is passed through the water supply / drainage unit 69 attached to the outside of the bottom surface of 1.
【００２０】また、昇降台６５にはロッド７１が立てら
れており、その先端部の固定台７２には台部７４と鍔部
７５とからなる断熱昇降蓋７３が取り付けられている。
断面昇降蓋７３の底面には冷却水ジャケット７８が設け
られ、鍔部７５は冷却水ジャケット７８の表面にピンで
固定されている。断熱昇降蓋７３は台部７４、鍔部７５
の何れもタングステンを断熱材として作製されている。
固定台７２に立設された中央のガイド柱７６とその周囲
の４本の支柱７７が断熱昇降蓋７３の台部７４を貫通し
て上方へ延在している。ガイド柱７６の先端にはテーパ
部分が形成されており、トレイ５４の中央部に挿入され
てトレイ５４のずれを抑えて位置決めし、トレイ５４の
底面に当接して支持する支柱７７と共にトレイ５４を安
定に昇降させる。なお、冷却水ジャケット７８へは図示
しない導入導出用端子を経由するベロータイプの給排水
管７９によって行われる。A rod 71 is erected on the elevating table 65, and a heat insulating elevating lid 73 consisting of a table portion 74 and a flange portion 75 is attached to a fixed table 72 at the tip of the rod 71.
A cooling water jacket 78 is provided on the bottom surface of the cross-section lifting lid 73, and the flange portion 75 is fixed to the surface of the cooling water jacket 78 with a pin. The heat-insulating lifting lid 73 includes a base portion 74 and a collar portion 75.
Both of them are manufactured using tungsten as a heat insulating material.
A central guide column 76 erected on the fixed base 72 and four columns 77 around the central guide column 76 penetrate through the base 74 of the heat insulating lift cover 73 and extend upward. A tapered portion is formed at the tip of the guide column 76, and is inserted into the central portion of the tray 54 to position the tray 54 while suppressing the displacement thereof, and to support the tray 54 together with the column 77 that abuts and supports the bottom surface of the tray 54. Move up and down stably. The cooling water jacket 78 is supplied by a bellows type water supply / drainage pipe 79 passing through a lead-in / out terminal not shown.
【００２１】本実施例の連続式真空熱処理炉１０は以上
のような第２焼結部３、およびその上流側の同様な脱ワ
ックス部１、第１焼結部２と、下流側の冷却部４とから
構成されるが、次にその作用を説明する。なお、同様に
構成されている脱ワックス部１、第１焼結部２、第２焼
結部３はほぼ同様に作用するので、以降においては第２
焼結部３の作用を主体に説明する。The continuous vacuum heat treatment furnace 10 of the present embodiment has the above-mentioned second sintering section 3, the same dewaxing section 1 on the upstream side, the first sintering section 2, and the cooling section on the downstream side. 4, and their operation will be described below. Since the dewaxing section 1, the first sintering section 2 and the second sintering section 3 which have the same structure operate in substantially the same manner, the second section will be described later.
The operation of the sintering part 3 will be mainly described.
【００２２】図１を参照し、被処理物Ｓは搬入扉５から
連続式真空焼結炉１０内へ搬入される。脱ワックス部１
の脱ワックス室１１1 内で温度５００〜６００℃、圧力
１〜１０-3ｔｏｒｒ程度の雰囲気下に脱ワックスされ
る。次いで第１焼結部２の焼結室１１2 内で温度１４０
０〜１５００℃、圧力１０-5ｔｏｒｒ程度の雰囲気下に
一次焼結された後、仕切扉７から第２焼結部３の搬送室
３１3 へ搬入される。Referring to FIG. 1, the object S to be processed is carried into the continuous vacuum sintering furnace 10 through the carry-in door 5. Dewaxing part 1
In the dewaxing chamber 11 1 described above, the dewaxing is performed in an atmosphere of a temperature of 500 to 600 ° C. and a pressure of 1 to 10 −3 torr. Then, in the sintering chamber 11 2 of the first sintering section 2, a temperature of 140
After primary sintering in an atmosphere of 0 to 1500 ° C. and a pressure of about 10 −5 torr, it is carried into the transfer chamber 31 3 of the second sintering section 3 from the partition door 7.
【００２３】図２、図３を参照して、被処理物Ｓは搬送
台５２、トレイ受け用断熱板５３、トレイ５４と３段に
重ねられた最上段のトレイ５４に載置され、仕切扉７か
ら搬送室３１へ搬入される。搬送台５２はロール３８に
介助されてチェインベルト３４に乗り係止され、両側を
ガイド板５１によって位置規制されて搬送され始める。
図４のＡも参照して、搬送台５２が減速用光センサ５５
の発光ダイオード５５ａからフォトトランジスタ５５ｂ
へ至る光を遮断すると、その信号の入力される図示しな
いコントローラはチェインベルト３４を駆動する電動機
３７の回転数を低下させるのでチェインベルト３４の走
行は減速される。次いで図４のＢを参照し、搬送台５２
が停止用光センサ５６の発光ダイオード５６ａからフォ
トトランジスタ５６ｂに至る光を遮断すると、電動機３
７は停止されチェインベルト３４の走行が停止されると
共に回動軸５８ａに固定されている停止ストッパ５７ａ
が駆動源５９ａによって立ち上げられ、これに前端が当
接して搬送台５２は停止される。同時に、回動軸５８ｂ
に固定されている位置出しストッパ５７ｂが駆動源５９
ｂによって立ち上げられ、搬送台５２の後端を押える。
そして、図２に示すように、搬送台５２は焼結室１１の
下方の所定位置、被処理物Ｓが加熱区画２５の直下とな
る位置に停止され固定される。With reference to FIGS. 2 and 3, the object S to be processed is placed on the transfer table 52, the heat insulating plate 53 for receiving the tray, and the tray 54 at the uppermost stage which is stacked in three stages with the tray 54, and the partition door. It is carried into the carrier chamber 31 from 7. The transport table 52 is supported by the rolls 38, rides on and is locked by the chain belt 34, and both sides thereof are positionally regulated by the guide plates 51 to be transported.
Also referring to FIG. 4A, the carrier table 52 has a deceleration optical sensor 55.
From the light emitting diode 55a to the phototransistor 55b
When the light reaching the chain belt 34 is cut off, a controller (not shown) to which the signal is input lowers the rotation speed of the electric motor 37 that drives the chain belt 34, so that the traveling of the chain belt 34 is decelerated. Next, referring to B of FIG.
When the light from the light emitting diode 56a of the stop light sensor 56 to the phototransistor 56b is blocked, the motor 3
7 is stopped to stop the traveling of the chain belt 34, and a stop stopper 57a fixed to the rotating shaft 58a.
Is driven by the drive source 59a, and the front end thereof abuts against the drive source 59a to stop the carrier table 52. At the same time, the rotating shaft 58b
The positioning stopper 57b fixed to the drive source 59
It is started by b and presses the rear end of the carrier table 52.
Then, as shown in FIG. 2, the transfer table 52 is stopped and fixed at a predetermined position below the sintering chamber 11 and at a position where the processing object S is directly below the heating section 25.
【００２４】図５、図６は図２の位置から断熱昇降蓋７
３が上昇される過程を示す同様な断面図であるが、上述
の搬送台５２の停止のあと、図２において昇降機室６１
内の昇降機６２のクランク６６が中心Ｏの回りに上方へ
回動され、スライダ６７が昇降台６５内を左方へ移動し
て昇降台６５が上昇される。この上昇によってガイド柱
７６の先端のテーパ部分がトレイ５４の中央に挿入さ
れ、支柱７７がトレイ５４の底面を支持し、次いでガイ
ド柱７６と支柱７７とはトレイ受け用断熱板５３の開口
５３ｈを下方から通り抜けることにより、トレイ５４は
トレイ受け用断熱板５３と分離され、被処理物Ｓはトレ
イ５４と共に図５に示すように押し上げられる。FIG. 5 and FIG. 6 show the heat insulating lift lid 7 from the position of FIG.
FIG. 3 is a similar sectional view showing a process in which 3 is raised, but after the carriage 52 is stopped as described above, the elevator chamber 61 in FIG.
The crank 66 of the elevator 62 inside is rotated upward around the center O, the slider 67 moves leftward in the elevator 65, and the elevator 65 is raised. By this rise, the tapered portion of the tip of the guide pillar 76 is inserted into the center of the tray 54, and the support pillar 77 supports the bottom surface of the tray 54. Then, the guide pillar 76 and the support pillar 77 form the opening 53h of the tray receiving heat insulating plate 53. By passing through from below, the tray 54 is separated from the tray-receiving heat insulating plate 53, and the workpiece S is pushed up together with the tray 54 as shown in FIG.
【００２５】更に昇降機６２のクランク６６が上方へ回
動されることにより断熱昇降蓋７３は上昇されるが、そ
の台部７４はトレイ受け用断熱板５３の開口５３ｈを通
り抜けるものの、鍔部７５は通り抜けられないのでトレ
イ受け用断熱板５３を伴って上昇し、断熱昇降蓋７３は
図６に示す上限位置まで上昇して停止される。すなわ
ち、被処理物Ｓは加熱区画２５内へ挿入され、断熱昇降
蓋７３の台部７４が加熱区画２５の挿入用開口２４へ挿
入されると共に、鍔部７５が伴って持ち上げてきたトレ
イ受け用断熱板５３がメタルＯ−リング２６を介して開
口２４の周囲のリフレクタ２３の下面に当接し、加熱区
画２５は断熱的に密閉される。Further, as the crank 66 of the elevator 62 is further rotated upward, the heat insulating lift cover 73 is lifted up, but the base 74 thereof passes through the opening 53h of the tray receiving heat insulating plate 53, but the flange 75 is Since it cannot pass through, it rises together with the tray receiving heat insulating plate 53, and the heat insulating lift lid 73 moves up to the upper limit position shown in FIG. 6 and is stopped. That is, the processing object S is inserted into the heating compartment 25, the base portion 74 of the heat insulating lift lid 73 is inserted into the insertion opening 24 of the heating compartment 25, and the tray 75 is lifted together with the flange portion 75 for receiving the tray. The heat insulating plate 53 abuts the lower surface of the reflector 23 around the opening 24 via the metal O-ring 26, and the heating section 25 is hermetically sealed.
【００２６】この加熱区画２５内において、被処理物Ｓ
は温度１８００〜２０００℃、圧力１０-6ｔｏｒｒの雰
囲気下に焼結される。この時、加熱区画２５の挿入用開
口２４は断熱昇降蓋７３とトレイ受け用断熱板５３とに
よって密閉されているので、加熱エネルギのロスは極め
て小さく、加熱温度は２０００℃において±４℃の範囲
に精度高く維持される。また、高温に晒される断熱昇降
蓋７３が冷却水ジャケット７８で水冷されているので、
これらの材料であるタングステンの再結晶化が抑制され
寿命が長期化する。更には、被処理物Ｓの焼結は搬送台
５２、チェインベルト３４とは上方に離れた加熱区画２
５内で行われ、遮熱板４６によっても保護されている搬
送台５２、チェインベルト３４等は加熱の影響を受けに
くいのでタングステンの如き高融点金属を必要とせず通
常の鋼材で作製し得る。In the heating section 25, the object S to be treated is
Is sintered in an atmosphere having a temperature of 1800 to 2000 ° C. and a pressure of 10 −6 torr. At this time, since the insertion opening 24 of the heating section 25 is closed by the heat insulating lift cover 73 and the tray receiving heat insulating plate 53, the loss of heating energy is extremely small, and the heating temperature is in the range of ± 4 ° C. at 2000 ° C. Maintained with high accuracy. Further, since the heat insulating lift lid 73 exposed to high temperature is water-cooled by the cooling water jacket 78,
Recrystallization of tungsten, which is one of these materials, is suppressed and the life is extended. Further, the sintering of the processing object S is performed by heating the heating stage 2 separated from the carrier table 52 and the chain belt 34.
The transfer table 52, the chain belt 34, and the like, which are carried out in the inside of FIG. 5 and are also protected by the heat shield plate 46, are not easily affected by heating, and therefore can be made of a normal steel material without requiring a high melting point metal such as tungsten.
【００２７】所定の焼結時間が経過した後、昇降機６２
のクランク６６は下方へ回動され、断熱昇降蓋７３は被
処理物Ｓと共に図６の位置から下降され、先ず、トレイ
受け用断熱板５３が搬送台５２に降ろされる。図５の位
置から断熱昇降蓋７３は更に下降され、次いでトレイ５
４と被処理物Ｓとを搬送台５２上のトレイ受け用断熱板
５３上へ降ろした後、図２の位置まで下降される。After the predetermined sintering time has elapsed, the elevator 62
The crank 66 is rotated downward, the heat insulating lift cover 73 is lowered from the position of FIG. 6 together with the object S to be processed, and first, the tray receiving heat insulating plate 53 is lowered onto the carrier table 52. From the position shown in FIG. 5, the heat insulating lift lid 73 is further lowered, and then the tray 5
4 and the object S to be processed are lowered onto the tray-receiving heat insulating plate 53 on the carrier 52, and then lowered to the position shown in FIG.
【００２８】トレイ５４と被処理物Ｓとが搬送台５２上
へ降ろされると停止ストッパ５７ａ、及び位置出しスト
ッパ５７ｂによる搬送台５２の係止が解除され、同時に
起動される電動機３７によってチェインベルト３４の走
行が再開されて、搬送台５２は開かれた仕切り扉８を経
て冷却部４の冷却搬送室４１へ送り込まれる。When the tray 54 and the object S to be processed are lowered onto the carrier table 52, the stop stopper 57a and the positioning stopper 57b unlock the carrier table 52, and the chain belt 34 is driven by the electric motor 37 which is simultaneously activated. Is restarted, and the transfer table 52 is sent to the cooling transfer chamber 41 of the cooling unit 4 through the partition door 8 which is opened.
【００２９】冷却部４において、被処理物Ｓは圧力１０
-5ｔｏｒｒ程度の中で温度約１００℃まで冷却されてか
ら圧力０．５ｋｇ／ｃｍ2 Ｇ程度のアルゴン・ガスが導
入される。ファン４５で攪拌され冷凍機４６で冷却され
た加圧アルゴン・ガスが被処理物Ｓに吹き付けられ、５
０〜６０℃の温度まで冷却された後、搬出扉９が開放さ
れ、被処理物Ｓは搬送台５２、トレイ受け用断熱板５
３、トレイ５４と共に大気中へ取り出される。In the cooling section 4, the pressure on the workpiece S is 10
After cooling to a temperature of about 100 ° C. in about −5 torr, argon gas having a pressure of about 0.5 kg / cm 2 G is introduced. The pressurized argon gas, which is agitated by the fan 45 and cooled by the refrigerator 46, is blown onto the object S to be treated, and
After being cooled to a temperature of 0 to 60 ° C., the carry-out door 9 is opened, and the object S to be processed is transported by the carrier table 52 and the tray-receiving heat insulating plate 5.
3, taken out into the atmosphere together with the tray 54.
【００３０】これら大気中へ取り出される部品は水分を
吸着するが、繰り返して使用されるこれら部品の中で、
加熱区画２５内へ挿入される部品、加熱区画２５の挿入
用開口２４の蓋として使用される部品はトレイ５４とト
レイ受け用断熱板５３のみであり、その吸着面積は小さ
く、かつタングステンで作製されており本質的に水分を
吸着しにくい。従って、加熱区画２５内で再度、高真空
下に加熱されてもガス放出は僅かであり、圧力１０-6ｔ
ｏｒｒの高真空度が容易に達せられ高品質の焼結が可能
となる。また、この高真空度は中程度の排気速度の拡散
ポンプによって到達可能である。The parts taken out into the atmosphere adsorb moisture, but among these parts used repeatedly,
The parts to be inserted into the heating section 25 and the parts used as the lids of the insertion openings 24 of the heating section 25 are only the tray 54 and the tray-receiving heat insulating plate 53, which have a small adsorption area and are made of tungsten. Therefore, it is essentially difficult to absorb water. Therefore, even if the heating section 25 is heated again under a high vacuum, gas is slightly released, and the pressure is 10 −6 t.
The high vacuum degree of orr can be easily achieved, and high quality sintering becomes possible. Also, this high degree of vacuum can be reached by diffusion pumps with medium pumping speeds.
【００３１】以上、本発明の実施例について説明した
が、勿論、本発明はこれに限られることなく、本発明の
技術的思想に基づいて種々の変形が可能である。Although the embodiment of the present invention has been described above, the present invention is not limited to this, and various modifications can be made based on the technical idea of the present invention.
【００３２】例えば本実施例においては、熱処理室とし
ての焼結室１１内の加熱区画２５に設けた挿入用開口２
４を断熱昇降蓋７３とトレイ受け用断熱板５３とで断熱
的に密閉するようにしたが、変形例の第２焼結部３’の
縦断面図である図７に示すように、焼結室１１と搬送室
３１との間に設けた底板１８の連通用開口１９’を断熱
昇降蓋７３とトレイ受け用断熱板５３とで断熱的に密閉
するようにしてもよい。図７における他の構成要素は図
２と全く同様であるので同じ符号を付して説明は省略す
る。For example, in the present embodiment, the insertion opening 2 provided in the heating section 25 in the sintering chamber 11 as the heat treatment chamber.
4 is adiabatically sealed by the heat insulating lift cover 73 and the tray receiving heat insulating plate 53. As shown in FIG. 7, which is a vertical cross-sectional view of the second sintering section 3 ′ of the modification, the sintering is performed. The communication opening 19 ′ of the bottom plate 18 provided between the chamber 11 and the transfer chamber 31 may be adiabatically sealed by the heat insulating lift cover 73 and the tray receiving heat insulating plate 53. The other components in FIG. 7 are the same as those in FIG.
【００３３】また、本実施例においては、トレイ５４、
トレイ受け用断熱板５３、および断熱昇降蓋７３をタン
グステンで作製したが、これに代えてタングステン以外
の高融点金属、例えばモリブデン（Ｍｏ）、タンタル
（Ｔａ）を使用してもよい。In the present embodiment, the tray 54,
Although the tray receiving heat insulating plate 53 and the heat insulating lift cover 73 are made of tungsten, a refractory metal other than tungsten, for example, molybdenum (Mo) or tantalum (Ta) may be used instead.
【００３４】また、本実施例においては、断熱昇降蓋７
３をタングステン製としたが、黒鉛、窒化ボロンなどで
作製してもよい。断熱昇降蓋７３は高温に晒されるが、
常に真空雰囲気下にあり、外部の大気中へ搬出されて水
分を吸着する機会はないからである。Further, in this embodiment, the heat insulating lift lid 7 is used.
Although 3 is made of tungsten, it may be made of graphite, boron nitride or the like. The heat insulation lid 73 is exposed to high temperature,
This is because it is always in a vacuum atmosphere, and there is no opportunity to carry it out to the outside air to adsorb moisture.
【００３５】また、本実施例においては被処理物Ｓの昇
降に固定スライド・クランク方式の昇降機６２を採用し
たが、エヤシリンダを用いてもよく、またボールねじ方
式の昇降機としてもよい。In this embodiment, the fixed slide / crank type elevator 62 is used for raising and lowering the workpiece S, but an air cylinder may be used, or a ball screw type elevator may be used.
【００３６】また、本実施例においては、搬送台５２の
搬送にチェインベルト３４を採用したが、ローラで搬送
することも可能である。Further, in the present embodiment, the chain belt 34 is used for carrying the carrying table 52, but it is also possible to carry it by rollers.
【００３７】また、本実施例においては、搬送されてい
る搬送台５２を停止させるための減速用光センサ５５、
停止用光センサ５６に発光ダイオードとフォトトランジ
スタとの組み合わせを使用し、光線の遮断の有無によっ
て搬送台５２の近接を捉えたが、これ以外の各種の近接
検知センサを使用し得る。Further, in this embodiment, a deceleration optical sensor 55 for stopping the carrying table 52 being carried,
A combination of a light emitting diode and a phototransistor is used as the stop light sensor 56, and the proximity of the carrier table 52 is detected depending on whether or not the light beam is blocked. However, various proximity detection sensors other than this can be used.
【００３８】また、本実施例においては、断熱昇降蓋７
３を水冷したが、例えば脱ワックス部１の如き加熱温度
が比較的低い熱処理においては水冷は必ずしも必要とし
ない。また、本実施例においては予熱部を設けていない
が脱ワックス部１の上流側に予熱部を設けてもよい。ま
た、第１焼結部２を省略し、第２焼結部３のみで焼結す
るようにしてもよい。In addition, in this embodiment, the heat insulating lift lid 7 is used.
3 was water-cooled, but water-cooling is not always necessary in the heat treatment such as the dewaxing section 1 where the heating temperature is relatively low. Further, although the preheating part is not provided in this embodiment, a preheating part may be provided on the upstream side of the dewaxing part 1. Alternatively, the first sintering section 2 may be omitted and only the second sintering section 3 may be used for sintering.
【００３９】[0039]
【発明の効果】以上述べたように、本発明の連続式真空
熱処理炉によれば、加熱区画の挿入用開口、または熱処
理室の連通用開口を断熱昇降蓋とトレイ受け用断熱板と
で断熱的に密閉して被処理物を熱処理するので、熱エネ
ルギのロスが極度に抑制され、かつ熱処理の温度も２０
００℃で±４℃の範囲に精度高く維持される。従って、
加熱温度の均一性が直接に性能に影響する焼結製品の製
造、例えばタンタル電解コンデンサの製造に、本発明の
連続式真空熱処理炉は好適である。As described above, according to the continuous vacuum heat treatment furnace of the present invention, the insertion opening of the heating compartment or the communication opening of the heat treatment chamber is insulated by the heat insulating lift cover and the tray receiving heat insulating plate. Since the object to be processed is heat-treated by hermetically sealing it, loss of heat energy is extremely suppressed, and the heat-treatment temperature is 20
The accuracy is maintained within a range of ± 4 ° C at 00 ° C. Therefore,
The continuous vacuum heat treatment furnace of the present invention is suitable for the production of a sintered product in which the uniformity of the heating temperature directly affects the performance, for example, the production of a tantalum electrolytic capacitor.
【００４０】また、昇降機構によって被処理物を昇降さ
せ、熱処理室と搬送室との間に距離をあけたことによ
り、従来例のローラハース式熱処理炉に比較して搬送機
構に耐熱性を必要とせず、全体的に高融点金属を使用す
る部品点数も少なくなっている。また、断熱昇降蓋７３
を水冷して長寿命化が計られている。従って、これらの
交換に要するメンテナンス費用は従来例の場合に比して
１／１０程度になっている。Further, since the object to be processed is moved up and down by the elevating mechanism and a distance is provided between the heat treatment chamber and the transfer chamber, the transfer mechanism requires heat resistance as compared with the conventional roller hearth type heat treatment furnace. In addition, the number of parts that use refractory metals is decreasing as a whole. In addition, the heat insulating lid 73
It is designed to have a long life by water cooling. Therefore, the maintenance cost required for these replacements is about 1/10 of that of the conventional example.
【００４１】また、連続式真空熱処理炉から大気側へ取
り出されて水分を吸着し、再び熱処理室で高真空度下に
高温に加熱された時に水分を放出することになる部品は
トレイとトレイ受け用断熱板のみとし、かつ、その材料
も高融点金属としているので熱処理室内でガスを殆ど放
出せず、焼結時における１０-6ｔｏｒｒの真空度に容易
に到達し得る。従って焼結製品の品質低下を招かず、真
空ポンプにも大容量のものを必要としない。Further, the parts which are taken out from the continuous vacuum heat treatment furnace to the atmosphere side to adsorb moisture and release moisture when heated again to a high temperature in a heat treatment chamber at a high vacuum degree are trays and tray receivers. Since only the heat insulating plate is used and the material is a high melting point metal, almost no gas is released in the heat treatment chamber, and a vacuum degree of 10 −6 torr during sintering can be easily reached. Therefore, the quality of the sintered product is not deteriorated and the vacuum pump does not need a large capacity.
【００４２】また、鋼製の搬送台と被処理物との間にト
レイ受け用断熱板を介在させたので、鋼と被処理物との
反応が防止される。Further, since the tray receiving heat insulating plate is interposed between the steel carrier and the object to be processed, the reaction between the steel and the object to be processed is prevented.
【図１】実施例の連続式真空熱処理炉の縦断面図であ
る。FIG. 1 is a vertical cross-sectional view of a continuous vacuum heat treatment furnace of an example.
【図２】同熱処理炉の第２焼結部の縦断面図である。FIG. 2 is a vertical cross-sectional view of a second sintered portion of the heat treatment furnace.
【図３】図２における［３］−［３］線方向の断面図で
ある。FIG. 3 is a sectional view taken along line [3]-[3] in FIG.
【図４】同焼結部における搬送台の位置決め系を示す概
略側面図であり、Ａは搬送の減速過程、Ｂは搬送の停止
過程を示す。FIG. 4 is a schematic side view showing a positioning system of a transfer table in the sintering section, where A is a deceleration process of transfer and B is a stop process of transfer.
【図５】図２に対応する縦断面図であり、同焼結部にお
ける断熱昇降蓋と被処理物との上昇過程を示す。5 is a vertical cross-sectional view corresponding to FIG. 2, showing a rising process of the heat insulating lid and the object to be processed in the same sintered portion.
【図６】図５に続く縦断面図であり、断熱昇降蓋と被処
理物との上限位置を示す。FIG. 6 is a vertical cross-sectional view following FIG. 5, showing the upper limit positions of the adiabatic elevating lid and the object to be processed.
【図７】変形例の第２焼結部の縦断面図である。FIG. 7 is a vertical cross-sectional view of a second sintered portion of a modified example.
【図８】従来例のローラハース式連続熱処理機の搬送方
向と直角な断面図である。FIG. 8 is a cross-sectional view of a roller hearth type continuous heat treatment machine of a conventional example, which is perpendicular to the transport direction.
１ 脱ワックス部 ２ 第１焼結部 ３ 第２焼結部 ４ 冷却部 １０ 連続式真空熱処理炉 １１ 熱処理室（焼結室） ２３ リフレクタ ２５ 加熱区画 ３１ 搬送室 ３４ チェインベルト ５２ 搬送台 ５３ トレイ受け用断熱板 ５４ トレイ ５５ 減速用光センサ ５６ 停止用光センサ ５７ ストッパ ６１ 昇降機室 ６２ 昇降機 ７３ 断熱昇降蓋 ７６ ガイド柱 ７７ 支柱 Ｓ 被処理物 1 Dewaxing Part 2 1st Sintering Part 3 2nd Sintering Part 4 Cooling Part 10 Continuous Vacuum Heat Treatment Furnace 11 Heat Treatment Room (Sintering Room) 23 Reflector 25 Heating Section 31 Transfer Chamber 34 Chain Belt 52 Transfer Stand 53 Tray Receiver Heat insulating plate 54 Tray 55 Optical sensor for deceleration 56 Optical sensor for stopping 57 Stopper 61 Elevator room 62 Elevator 73 Insulating elevating lid 76 Guide column 77 Prop S Object to be processed
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｂ２２Ｆ 3/10 Ｃ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location B22F 3/10 C
Claims (6)
理室は下方の連通用開口を介して前記搬送室と連通し、
内部には下方を挿入用開口とした加熱区画が設けられて
おり、前記搬送室は一方の側端に被処理物の搬入口、他
方の側端に搬出口を有してそれぞれ仕切扉により開閉可
能に密閉され、内部には前記被処理物の搬送機構と、該
搬送機構上にある前記被処理物を上昇させて前記挿入用
開口から前記加熱区画内へ挿入すると共に前記挿入用開
口または前記連通用開口を塞ぐ昇降機構とが配設されて
いる真空熱処理炉が複数連設された連続式真空熱処理炉
において、前記昇降機構は前記搬送室内または外の駆動
源と、該駆動源によって昇降されその先端が前記搬送室
内にあるロッドと、該ロッドの先端部に固定された断熱
昇降蓋とからなり、該断熱昇降蓋は前記被処理物を載置
するトレイを支持するための上面部に立設された支柱と
側面部に設けられた鍔とを備え、前記搬送機構は前記断
熱昇降蓋の前記鍔が挿通可能に形成された比較的大きい
開口を有する搬送台、該搬送台の前記比較的大きい開口
上に置かれ前記支柱と前記断熱昇降蓋とが挿通可能に形
成された比較的小さい開口を有するトレイ受け用断熱
板、および該トレイ受け用断熱板の前記比較的小さい開
口上に重ねて置かれる前記トレイとからなる載置系と、
該載置系を搬送するための前記搬入口から前記搬出口に
わたって配設された搬送系と、搬送されてくる前記搬送
台を検知して前記加熱区画の直下に停止させるためのセ
ンサと前記搬送台を停止位置に停止させて固定するスト
ッパとからなる停止位置制御系とからなり、前記搬送台
が前記被処理物と共に前記搬送系によって搬送され、前
記停止位置制御系により前記加熱区画の直下の前記停止
位置に停止固定され、前記昇降機構の前記駆動源によっ
て前記昇降蓋が上昇されて前記支柱が前記被処理物を前
記トレイと共に支持して前記挿入用開口から前記加熱区
画内へ挿入し、同時に前記鍔に伴われて上昇する前記ト
レイ受け用断熱板と前記断熱昇降蓋とによって前記挿入
用開口または前記連通用開口が断熱的に密閉され、前記
被処理物が加熱されて熱処理されることを特徴とする連
続式真空熱処理炉。1. A heat treatment chamber and a transfer chamber, wherein the heat treatment chamber communicates with the transfer chamber through a lower opening for communication,
A heating compartment with an insertion opening on the lower side is provided inside, and the transfer chamber has a loading port at one side end and a loading port at the other side end and is opened and closed by a partition door. It is hermetically sealed so that the object to be processed is conveyed to the inside thereof, and the object to be processed on the conveying mechanism is raised to be inserted into the heating section from the insertion opening and the insertion opening or the In a continuous vacuum heat treatment furnace in which a plurality of vacuum heat treatment furnaces are provided, in which an elevating mechanism that closes a communication opening is arranged, the elevating mechanism is moved up and down by the drive source inside or outside the transfer chamber and the drive source. The tip is composed of a rod located inside the transfer chamber and an adiabatic elevating lid fixed to the tip of the rod. The adiabatic elevating lid stands on an upper surface for supporting a tray on which the object to be processed is placed. It is installed on the pillar and the side part A carrier, the carrier mechanism having a relatively large opening through which the collar of the heat insulating lift lid can be inserted; the pillar placed on the relatively large opening of the carrier table; A mounting system including a tray-receiving heat insulating plate having a relatively small opening formed so that an elevating lid can be inserted therethrough, and the tray stacked on the relatively small opening of the tray receiving heat insulating plate. ,
A transport system arranged from the carry-in port to the carry-out port for transporting the placement system, a sensor for detecting the transport table being transported, and stopping the sensor immediately below the heating section, and the transport system. A stop position control system including a stopper that stops and fixes the table at a stop position, the transfer table is transferred together with the object to be processed by the transfer system, and the stop position control system directly below the heating section. Stopped and fixed at the stop position, the elevating lid is raised by the drive source of the elevating mechanism, the support supports the object to be processed together with the tray, and is inserted into the heating section from the insertion opening, At the same time, the insertion opening or the communication opening is adiabatically sealed by the tray-receiving heat insulating plate that rises along with the brim and the heat insulating lift cover, and the object to be processed is heated. Continuous vacuum heat treatment furnace, characterized in that it is heat-treated Te.
られた減速用センサと下流側に設けられた停止用センサ
とからなる請求項１に記載の連続式真空熱処理炉。2. The continuous vacuum heat treatment furnace according to claim 1, wherein the sensor comprises a deceleration sensor provided on the upstream side of the transport system and a stopping sensor provided on the downstream side.
台の前端部を当接させて停止させる停止ストッパと、前
記搬送台の後端部を押さえる位置出しストッパとからな
る請求項１または請求項２に記載の連続式真空熱処理
炉。3. The stopper according to claim 1 or 2, wherein the stopper comprises a stop stopper for abutting and stopping the front end portion of the carrier table to be transported, and a positioning stopper for pressing the rear end portion of the carrier table. 2. A continuous vacuum heat treatment furnace as described in 2.
するチェインベルトである請求項１から請求項３までの
何れかに記載の連続式真空熱処理炉。4. The continuous vacuum heat treatment furnace according to claim 1, wherein the transport system is a chain belt that locks and transports the transport base.
１から請求項４までの何れかに記載の連続式真空熱処理
炉。5. The continuous vacuum heat treatment furnace according to claim 1, wherein the adiabatic elevating lid is water-cooled.
板がタングステン、モリブデン、タンタルの如き高融点
金属で作製されている請求項１から請求項５までの何れ
かに記載の連続式真空熱処理炉。6. The continuous vacuum heat treatment furnace according to claim 1, wherein the tray and the tray receiving heat insulating plate are made of a refractory metal such as tungsten, molybdenum, or tantalum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30694495A JP3524243B2 (en) | 1995-10-31 | 1995-10-31 | Continuous vacuum heat treatment furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30694495A JP3524243B2 (en) | 1995-10-31 | 1995-10-31 | Continuous vacuum heat treatment furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09126660A true JPH09126660A (en) | 1997-05-16 |
| JP3524243B2 JP3524243B2 (en) | 2004-05-10 |
Family
ID=17963162
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30694495A Expired - Lifetime JP3524243B2 (en) | 1995-10-31 | 1995-10-31 | Continuous vacuum heat treatment furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3524243B2 (en) |
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| JP2001343290A (en) * | 2000-06-05 | 2001-12-14 | Ulvac Japan Ltd | Vacuum heating device |
| JP2007262434A (en) * | 2006-03-27 | 2007-10-11 | Denso Corp | Cvd system |
| JP2008002747A (en) * | 2006-06-22 | 2008-01-10 | Kanto Yakin Kogyo Co Ltd | Atmospheric gas sealing method and device for heating furnace, and heating furnace comprising the same |
| WO2009060842A1 (en) * | 2007-11-05 | 2009-05-14 | Toyota Jidosha Kabushiki Kaisha | Method of positioning conveyance section, and conveyance device |
| WO2010029430A1 (en) * | 2008-09-10 | 2010-03-18 | Toyota Jidosha Kabushiki Kaisha | Carrier positioning method and carrier transport system |
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|---|---|---|---|---|
| JP2001343290A (en) * | 2000-06-05 | 2001-12-14 | Ulvac Japan Ltd | Vacuum heating device |
| JP2007262434A (en) * | 2006-03-27 | 2007-10-11 | Denso Corp | Cvd system |
| JP2008002747A (en) * | 2006-06-22 | 2008-01-10 | Kanto Yakin Kogyo Co Ltd | Atmospheric gas sealing method and device for heating furnace, and heating furnace comprising the same |
| US8297429B2 (en) | 2007-11-05 | 2012-10-30 | Toyota Jidosha Kabushiki Kaisha | Method of positioning conveyance section, and conveyance device |
| WO2009060842A1 (en) * | 2007-11-05 | 2009-05-14 | Toyota Jidosha Kabushiki Kaisha | Method of positioning conveyance section, and conveyance device |
| DE112008000599B4 (en) * | 2007-11-05 | 2014-10-16 | Hirata Corp. | Method for positioning a transport section and conveyor |
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| KR101149844B1 (en) * | 2010-04-30 | 2012-05-24 | (주) 대홍기업 | ceramics sintering apparatus |
| CN103030006A (en) * | 2013-01-10 | 2013-04-10 | 上海圣懋控制设备有限公司 | Conveying fixture and material feeding and conveying system of heat treatment industrial furnace |
| CN103030006B (en) * | 2013-01-10 | 2015-12-16 | 上海圣懋控制设备有限公司 | Transmit charging and the transfer system of tool and heat treatment industrial furnace |
| CN108195193A (en) * | 2018-02-02 | 2018-06-22 | 佛山高砂工业窑炉有限公司 | A kind of air hermetic roller kilns heating of displacement room and drain structure |
| CN108195193B (en) * | 2018-02-02 | 2024-02-13 | 佛山高砂工业窑炉有限公司 | Air-tight type displacement chamber heating and draining structure for roller kiln |
| CN109764360A (en) * | 2019-01-31 | 2019-05-17 | 五莲县光润模具制造有限公司 | Environmental heating stoves |
| CN115505688A (en) * | 2022-09-28 | 2022-12-23 | 何一峰 | Heat treatment equipment and process for stainless steel flange casting |
| CN117144108A (en) * | 2023-10-30 | 2023-12-01 | 山西铱倍力科技有限公司 | Heat treatment furnace for titanium anode production |
| CN117144108B (en) * | 2023-10-30 | 2024-01-23 | 山西铱倍力科技有限公司 | Heat treatment furnace for titanium anode production |
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