JPH09124147A - Substrate conveying device - Google Patents
Substrate conveying deviceInfo
- Publication number
- JPH09124147A JPH09124147A JP7282908A JP28290895A JPH09124147A JP H09124147 A JPH09124147 A JP H09124147A JP 7282908 A JP7282908 A JP 7282908A JP 28290895 A JP28290895 A JP 28290895A JP H09124147 A JPH09124147 A JP H09124147A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mounting table
- arm
- roller
- substrate transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Specific Conveyance Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、基板搬送装置に関
し、特に液晶表示器のガラス基板、半導体ウエハ等を搬
送するのに適した基板搬送装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transfer device, and more particularly to a substrate transfer device suitable for transferring a glass substrate, a semiconductor wafer or the like of a liquid crystal display.
【0002】[0002]
【従来の技術】図8は従来の基板搬送装置の概略構成を
示す側面図、図9はその平面図である。これらの図にお
いて、基板搬送装置70は、搬送ローラ部71と基板受
渡し部72とから構成されている。2. Description of the Related Art FIG. 8 is a side view showing a schematic structure of a conventional substrate transfer apparatus, and FIG. 9 is a plan view thereof. In these figures, the substrate transfer device 70 is composed of a transfer roller unit 71 and a substrate transfer unit 72.
【0003】搬送ローラ部71は、水平面上で対向して
配置された一対の軸受部材73、74と、この軸受部材
73、74間で回転可能に軸支され、同一水平面上で所
定の間隔をおいて配置された複数の回転軸75乃至79
と、各回転軸75乃至79の両端であって、軸受部材7
3、74の直ぐ内側位置にそれぞれ共回り可能に支持さ
れた複数のローラ80乃至89とを備えると共に、搬送
ローラ部71の上流側に配置され、直立状に取り付けら
れたリフトピン90a乃至90dを有する基板昇降手段
90を備えている。上記回転軸75乃至79は、図略の
駆動手段によってそれぞれ同一方向に回転駆動されるよ
うになっており、ローラ80乃至89上に載置された基
板Bを矢印Aで示す下流側に搬送するようになってい
る。また、上記基板昇降手段90は、図略の駆動手段に
よって上下方向に移動するようになっている。The conveying roller portion 71 is rotatably supported between a pair of bearing members 73 and 74, which are arranged so as to face each other on a horizontal plane, and the bearing members 73 and 74 are rotatably supported at predetermined intervals on the same horizontal plane. A plurality of rotating shafts 75 to 79 arranged in advance
And the bearing member 7 at both ends of the rotary shafts 75 to 79.
A plurality of rollers 80 to 89 that are supported so as to be able to rotate together are provided in positions immediately inside 3 and 74, respectively, and lift pins 90a to 90d that are arranged on the upstream side of the conveying roller unit 71 and are mounted upright. A substrate elevating means 90 is provided. The rotating shafts 75 to 79 are rotationally driven in the same direction by unillustrated driving means, and convey the substrate B placed on the rollers 80 to 89 to the downstream side indicated by the arrow A. It is like this. Further, the substrate elevating means 90 is configured to move in the vertical direction by a driving means (not shown).
【0004】基板受渡し部72は、上記搬送ローラ部7
1の上流端に対向して配置されており、基部に対して水
平面上で旋回可能にされていると共に、先端側に基板載
置台91aを有するアーム91を備えて構成されてい
る。また、このアーム91は、図略の駆動手段によって
矢印X1、X2で示す水平方向に往復移動するようにな
っている。The substrate transfer section 72 is the transfer roller section 7 described above.
It is arranged so as to face the upstream end of No. 1, is rotatable on a horizontal plane with respect to the base, and is provided with an arm 91 having a substrate platform 91a on the tip side. Further, the arm 91 is adapted to reciprocate in the horizontal direction indicated by arrows X1 and X2 by an unillustrated drive means.
【0005】上記のように構成された基板搬送装置70
は、例えば、液晶表示器の製造工程において用いられ、
基板Bをカセットから一枚づつ取り出して矢印X2で示
す方向位置で基板載置台91a上に載置し、この状態で
アーム91を矢印X1方向に水平移動し、基板Bを搬送
ローラ部71上に給送する。基板Bが搬送ローラ部71
上に給送されてくると、図10に示すように、基板昇降
手段90が上昇してリフトピン90a乃至90dが基板
載置台91aの両側部において基板Bの下面に当接し、
基板Bを持ち上げる。この状態で、基板載置台91aは
搬送ローラ部71上から後退し、アーム91は矢印X2
方向の所定位置に戻る。基板載置台91aが搬送ローラ
部71上から後退すると、基板昇降手段90が下降し、
これにより基板Bがローラ80乃至85上に載置され
る。搬送ローラ部71の下流側に配置されている図外の
エッチング等の処理槽が基板Bの受入れ可能な状態にあ
るときには、回転軸75乃至79が回転駆動されて基板
Bを処理槽に給送する。そして、処理槽に基板Bを給送
し終わると、上記の動作が繰り返されて次の基板Bが順
次処理槽に給送される。The substrate transfer device 70 configured as described above
Is used, for example, in the manufacturing process of liquid crystal displays,
The substrates B are taken out from the cassette one by one and placed on the substrate platform 91a at the position indicated by the arrow X2. In this state, the arm 91 is horizontally moved in the direction of the arrow X1 to bring the substrates B onto the transport roller section 71. To send. The substrate B is the transport roller unit 71.
When fed upward, as shown in FIG. 10, the substrate elevating means 90 rises and the lift pins 90a to 90d come into contact with the lower surface of the substrate B on both sides of the substrate platform 91a.
Lift the substrate B. In this state, the substrate platform 91a is retracted from above the transport roller unit 71, and the arm 91 is moved to the arrow X2.
Return to a predetermined position in the direction. When the substrate platform 91a retracts from the transport roller unit 71, the substrate elevating means 90 descends,
As a result, the substrate B is placed on the rollers 80 to 85. When the processing tank for etching or the like (not shown) arranged on the downstream side of the transport roller unit 71 is in a state capable of receiving the substrate B, the rotating shafts 75 to 79 are rotationally driven to feed the substrate B to the processing tank. To do. When the substrate B is completely fed to the processing bath, the above operation is repeated and the next substrate B is sequentially fed to the processing bath.
【0006】上記のように構成された基板搬送装置70
は、最終の処理槽から送り出されてきた基板Bを一枚づ
つカセットに収納する最終工程においても採用されてい
る。この場合、基板搬送装置70は、基板昇降手段90
が搬送ローラ部71の下流側に取り付けられ、基板受渡
し部72が搬送ローラ部71の下流端に対向して配置さ
れることにより構成される。基板Bは処理槽から送り出
された後、ローラ80乃至89によって搬送ローラ部7
1の下流側の所定の位置にまで搬送される。そして、そ
の位置で、基板昇降手段90によって持ち上げられる。
次いで、基板受渡し部72の基板載置台91aが基板B
の下面に進入し、この状態で基板昇降手段90が下降す
ることによって基板Bが基板載置台91a上に載置され
る。そして、基板受渡し部72の基板載置台91aが搬
送ローラ部71上から後退し、アーム91が旋回された
後、この基板Bをカセットに収納する。The substrate transfer device 70 configured as described above
Is also used in the final step of storing the substrates B sent from the final processing tank in a cassette one by one. In this case, the substrate transfer device 70 includes the substrate lifting means 90.
Is attached to the downstream side of the transport roller section 71, and the substrate transfer section 72 is arranged to face the downstream end of the transport roller section 71. After the substrate B is sent out from the processing tank, it is conveyed by the rollers 80 to 89.
1 is conveyed to a predetermined position on the downstream side. Then, at that position, it is lifted by the substrate elevating means 90.
Next, the substrate platform 91a of the substrate transfer part 72 is set to the substrate B.
The substrate B is placed on the substrate platform 91a by entering the lower surface of the substrate and lowering the substrate elevating means 90 in this state. Then, after the substrate platform 91a of the substrate transfer part 72 is retracted from the transport roller part 71 and the arm 91 is rotated, the substrate B is stored in the cassette.
【0007】[0007]
【発明が解決しようとする課題】ところで、上記従来の
基板搬送装置70にあっては、搬送ローラ部71のロー
ラ80乃至89上と基板受渡し部72のアーム91の基
板載置台91a上との間での基板Bの受渡しに基板昇降
手段90が必要になるため、搬送ローラ部71の構造が
複雑になるという問題点を有している。In the conventional substrate transfer device 70, between the rollers 80 to 89 of the transfer roller unit 71 and the substrate mounting table 91a of the arm 91 of the substrate transfer unit 72. Since the substrate elevating means 90 is required for the delivery of the substrate B in this case, there is a problem that the structure of the transport roller section 71 becomes complicated.
【0008】また、基板昇降手段90の昇降位置を基板
受渡し部72のアーム91の位置に合うように調整する
必要が生じるという問題点を有している。Further, there is a problem that it is necessary to adjust the ascending / descending position of the substrate elevating / lowering means 90 so as to match the position of the arm 91 of the substrate transfer part 72.
【0009】さらに、基板昇降手段90の昇降動作によ
ってパーティクルが発生し易く、そのパーティクルが基
板Bに付着して基板表面が汚染される可能性があるとい
う問題点を有している。Further, there is a problem that particles are likely to be generated by the raising and lowering operation of the substrate raising and lowering means 90 and the particles may adhere to the substrate B to contaminate the substrate surface.
【0010】本発明は、上記のような問題点を解決する
ためになされたものであり、搬送ローラ部の構造を簡素
化すると共に、パーティクルの発生を抑えて基板表面の
汚染を可及的に防止するようにした基板搬送装置を提供
することを目的としている。The present invention has been made in order to solve the above problems, and simplifies the structure of the conveying roller portion and suppresses the generation of particles to contaminate the surface of the substrate as much as possible. It is an object of the present invention to provide a substrate transfer device which is designed to prevent the above.
【0011】[0011]
【課題を解決するための手段】請求項1記載の基板搬送
装置は、搬送方向に並設された複数のローラを有する搬
送ローラ部と、この搬送ローラ部に対して進退し、上記
ローラとの間で基板の受渡しを行なう基板受渡し部とを
有するものにおいて、上記基板受渡し部は、アーム先端
側に少なくとも載置する基板の幅以下の幅寸法と所定の
厚みを有する平板状の基板載置台を備え、上記搬送ロー
ラ部は、第1の半径寸法を有する回転軸を有し、かつ、
上記ローラは上記回転軸の両側に、少なくとも上記基板
載置台の幅寸法だけ離間して取り付けられると共に、上
記第1の半径寸法に比して、少なくとも上記所定の厚み
を加えた第2の半径寸法を有するものであることを特徴
とするものである。According to a first aspect of the present invention, there is provided a substrate transfer device including a transfer roller portion having a plurality of rollers arranged in parallel in a transfer direction, and a roller which moves forward and backward with respect to the transfer roller portion. And a substrate transfer unit for transferring the substrate between the substrate transfer units, wherein the substrate transfer unit is a flat substrate mounting table having a width dimension at least equal to or less than the width of the substrate to be mounted on the arm tip side and a predetermined thickness. The transport roller unit has a rotation shaft having a first radius dimension, and
The rollers are mounted on both sides of the rotary shaft at a distance of at least the width of the substrate mounting table, and have a second radius dimension that is at least the predetermined thickness in comparison with the first radius dimension. It is characterized by having.
【0012】この基板搬送装置によれば、基板受渡し部
の基板載置台と基板搬送部のローラとの間で基板の受渡
しを行なうとき、基板載置台は回転軸の周面上端とロー
ラの周面上端間に形成される空間内を進退する。According to this substrate transfer device, when the substrate is transferred between the substrate mounting table of the substrate transfer section and the roller of the substrate transfer section, the substrate mounting table has the upper end of the peripheral surface of the rotating shaft and the peripheral surface of the roller. Moves back and forth in the space formed between the upper ends.
【0013】請求項2記載の基板搬送装置は、請求項1
記載のものにおいて、基板受渡し部は、基板載置台に載
置された基板を真空吸着する吸着手段を有するものであ
ることを特徴とするものである。A substrate transfer device according to a second aspect of the present invention is the first aspect.
In the above description, the substrate transfer part has a suction means for vacuum-sucking the substrate mounted on the substrate mounting table.
【0014】この基板搬送装置によれば、基板載置台に
載置された基板が吸着手段により真空吸着されて基板の
受渡し部位間を移動する。According to this substrate transfer device, the substrate placed on the substrate platform is vacuum-sucked by the suction means and moved between the substrate transfer parts.
【0015】[0015]
【発明の実施の形態】図1は基板搬送装置の側面図、図
2はその平面図である。これらの図において、基板搬送
装置1は、搬送ローラ部2と基板受渡し部3とから構成
されている。1 is a side view of a substrate transfer device, and FIG. 2 is a plan view thereof. In these figures, the substrate transfer device 1 is composed of a transfer roller unit 2 and a substrate transfer unit 3.
【0016】搬送ローラ部2は、水平面上で対向して配
置された一対の軸受部材4、5を有しており、この軸受
部材4、5には、複数の回転軸6乃至10がベアリング
等を介して回転可能に軸支されている。これらの回転軸
6乃至10は、同一水平面に沿って所定の間隔をおいて
配置されており、それらの各両端部であって、軸受部材
4、5の直ぐ内側位置にはそれぞれローラ12乃至21
が共回り可能に取り付けられている。これらのローラ1
2乃至21は、厚み方向にそれぞれ小径部SKと大径部
DKの周面を有して形成されたもので、小径部SKが内
側に位置し、大径部DKが外側に位置するように取り付
けられている。ペアとなるローラの小径部SK間寸法は
基板Bの幅に略一致するように設定されており、これに
より基板Bは、ペアとなるローラの小径部SK間に跨っ
て載置されるようになっている。なお、ローラ12乃至
21の大径部DKは、基板Bの位置ずれを規制するもの
である。The conveying roller unit 2 has a pair of bearing members 4 and 5 arranged so as to face each other on a horizontal plane. The bearing members 4 and 5 have a plurality of rotating shafts 6 to 10 as bearings. It is rotatably supported via. These rotating shafts 6 to 10 are arranged along the same horizontal plane at a predetermined interval, and the rollers 12 to 21 are located at the respective ends of the rotating shafts 6 to 10 immediately inside the bearing members 4 and 5, respectively.
Are attached so that they can rotate together. These rollers 1
Nos. 2 to 21 are each formed with a peripheral surface of a small diameter portion SK and a large diameter portion DK in the thickness direction, so that the small diameter portion SK is located inside and the large diameter portion DK is located outside. It is installed. The dimension between the small diameter portions SK of the pair of rollers is set so as to substantially match the width of the substrate B, so that the substrate B is placed across the small diameter portions SK of the pair of rollers. Has become. The large-diameter portion DK of the rollers 12 to 21 regulates the positional deviation of the substrate B.
【0017】また、小径部SKの半径(以下、基板Bが
載置される小径部SKの半径をローラの半径とする。)
は、図3に示すように、回転軸6乃至10のそれぞれの
周面上端を含む第1平面HM1と、小径部SKの周面上
端を含む第2平面HM2との間隔Dが、基板受渡し部3
の後述するアームの基板載置台の厚みよりも大きくなる
ように設定されている。すなわち、回転軸6乃至10を
第1の半径寸法を有するものとし、ローラ12乃至21
を第2の半径寸法を有するものとすると、この第2の半
径寸法は第1の半径寸法に比して、少なくとも上記基板
載置台の厚みを加えた寸法となっている。なお、小径部
SKの周面には基板Bの滑り止め用のゴム製Oリングが
嵌合されている。Further, the radius of the small diameter portion SK (hereinafter, the radius of the small diameter portion SK on which the substrate B is placed is the radius of the roller).
3, the distance D between the first plane HM1 including the upper end of the peripheral surface of each of the rotating shafts 6 to 10 and the second plane HM2 including the upper end of the peripheral surface of the small diameter portion SK is equal to Three
The thickness is set to be larger than the thickness of the substrate mounting table of the arm, which will be described later. That is, the rotating shafts 6 to 10 have the first radius dimension, and the rollers 12 to 21
Has a second radius dimension, the second radius dimension is a dimension in which at least the thickness of the substrate mounting table is added to the first radius dimension. A rubber O-ring for preventing the substrate B from slipping is fitted on the peripheral surface of the small diameter portion SK.
【0018】上記の回転軸6乃至10には、これらの回
転軸6乃至10をそれぞれ同一方向に回転駆動する回転
軸駆動手段22が設けられている。すなわち、回転軸6
乃至10の一方の端部であって、一方の軸受部材4の外
側位置にそれぞれギヤ23乃至27が共回り可能に取り
付けられており、各ギヤ23乃至27にはチエン28が
架け渡されている。上流側の回転軸6には、ギヤ23の
外側にさらに別のギヤ29が取り付けられており、この
ギヤ29と、搬送ローラ部2の下部位置に配置されたモ
ータ30の回転軸のギヤ31とにチエン32が架け渡さ
れている。このように構成された回転軸駆動手段22
は、モータ30の回転駆動により回転軸6乃至10をそ
れぞれ同一方向に回転駆動し、それによってローラ12
乃至21が回転して基板Bを矢印Aで示す方向である下
流側に搬送する。The rotary shafts 6 to 10 are provided with rotary shaft drive means 22 for rotating and driving the rotary shafts 6 to 10 in the same direction. That is, the rotating shaft 6
Gears 23 to 27 are rotatably attached to the outer ends of one of the bearing members 4 at one end of the gears 10 to 10, and a chain 28 is bridged between the gears 23 to 27. . A further gear 29 is attached to the outer side of the gear 23 on the upstream rotary shaft 6, and this gear 29 and the gear 31 of the rotary shaft of the motor 30 arranged at the lower position of the conveying roller unit 2 are connected to each other. The chain 32 is laid over. The rotary shaft drive means 22 configured in this way
Drives the rotary shafts 6 to 10 to rotate in the same direction by the rotation drive of the motor 30.
21 to 21 rotate to convey the substrate B to the downstream side in the direction indicated by the arrow A.
【0019】基板受渡し部3は、上記の搬送ローラ部2
の上流端に対向するように配置されており、先端側に基
板Bの幅以下の幅寸法と所要の厚みを有する平板状の基
板載置台41aを有するアーム41を備えて構成されて
いる。アーム41の基板載置台41aは、その上に基板
Bが載置され、搬送ローラ部2のローラ12乃至17と
の間及び、基板Bを複数段に収納したカセット等の外部
の位置との間で基板Bの受渡しを行なう。アーム41の
内部には、後端面41bから基板載置台41aにかけて
有底状の真空吸引孔41cが形成されており、基板載置
台41aには、その上面に開口し、真空吸引孔41cに
連通する複数の吸着孔41d、41e、41fが形成さ
れている。また、アーム41の後端面41bには、管接
続部41gが取り付けられている。The substrate transfer section 3 is the above-mentioned transfer roller section 2.
The arm 41 is arranged so as to face the upstream end of the substrate 41 and has a flat plate-shaped substrate mounting table 41a having a width dimension equal to or less than the width of the substrate B and a required thickness on the front end side. The substrate placement table 41a of the arm 41 has a substrate B placed thereon and between the rollers 12 to 17 of the transport roller unit 2 and an external position such as a cassette in which the substrates B are stored in a plurality of stages. Then, the substrate B is delivered. Inside the arm 41, a bottomed vacuum suction hole 41c is formed from the rear end surface 41b to the substrate mounting table 41a. The substrate mounting table 41a has an opening on its upper surface and communicates with the vacuum suction hole 41c. A plurality of suction holes 41d, 41e, 41f are formed. A pipe connecting portion 41g is attached to the rear end surface 41b of the arm 41.
【0020】この基板受渡し部3は、図4及び図5に示
すように、アーム41が第1筐体40内に配置されたモ
ータ42、駆動力伝達部材43、ボールねじ44及びス
ライダ45から構成された第1移動手段46によって矢
印X1、X2で示す水平方向に移動するようになってい
る。すなわち、モータ42は両方向に回転可能とされた
もので、このモータ42が回転駆動すると、その回転力
が駆動力伝達部材43によってボールねじ44に伝達さ
れ、ボールねじ44が回転駆動することによってスライ
ダ45がボールねじ44上を移動し、アーム41がその
ホームポジションとその前方向である搬送ローラ部2等
との間を直線状に移動する。As shown in FIGS. 4 and 5, the substrate transfer section 3 comprises a motor 42 having an arm 41 arranged in the first housing 40, a driving force transmission member 43, a ball screw 44 and a slider 45. The first moving means 46 is moved in the horizontal direction indicated by arrows X1 and X2. That is, the motor 42 is rotatable in both directions, and when the motor 42 is rotationally driven, the rotational force is transmitted to the ball screw 44 by the driving force transmission member 43, and the ball screw 44 is rotationally driven to cause the slider to slide. 45 moves on the ball screw 44, and the arm 41 linearly moves between its home position and the conveyance roller unit 2 or the like in the front direction.
【0021】また、基板受渡し部3は、そのアーム41
が第2筐体47内に配置されたモータ48、駆動力伝達
部材49、ボールねじ50及びスライダ51aを備えた
軸受体51から構成された第2移動手段52によって矢
印Y1、Y2で示す垂直方向に移動するようになってい
る。すなわち、モータ48は両方向に回転可能とされて
おり、このモータ48が回転駆動すると、その回転力が
駆動力伝達部材49によってボールねじ50に伝達さ
れ、ボールねじ50が回転駆動することによって軸受体
51のスライダ51aがボールねじ50上を移動し、軸
受体51が上下動することによってアーム41が上下方
向に移動する。The substrate transfer section 3 has an arm 41.
Is a vertical direction indicated by arrows Y1 and Y2 by a second moving means 52 including a motor 48 arranged in the second housing 47, a driving force transmission member 49, a ball screw 50 and a bearing body 51 having a slider 51a. To move to. That is, the motor 48 is rotatable in both directions, and when the motor 48 is rotationally driven, the rotational force is transmitted to the ball screw 50 by the driving force transmission member 49, and the ball screw 50 is rotationally driven, so that the bearing body is rotated. The slider 51a of 51 moves on the ball screw 50, and the bearing body 51 moves up and down, whereby the arm 41 moves up and down.
【0022】さらに、基板受渡し部3は、そのアーム4
1が第2筐体47内に配置されたモータ54、駆動力伝
達ギヤ55、回転軸56及び上記軸受体51から構成さ
れた第3移動手段57によって矢印R1、R2で示す円
周方向に移動するようになっている。すなわち、モータ
54は両方向に回転可能とされており、このモータ54
が回転駆動すると、その回転力が駆動力伝達ギヤ55に
よって回転軸56に伝達され、軸受体51に軸受された
回転軸56が回転駆動することによってアーム41が円
周方向に移動する。Further, the substrate transfer part 3 has its arm 4
1 is moved in the circumferential direction indicated by arrows R1 and R2 by the third moving means 57 composed of the motor 54 arranged in the second housing 47, the driving force transmission gear 55, the rotating shaft 56 and the bearing body 51. It is supposed to do. That is, the motor 54 is rotatable in both directions.
When rotationally driven, the rotational force is transmitted to the rotary shaft 56 by the driving force transmission gear 55, and the rotary shaft 56 supported by the bearing body 51 is rotationally driven to move the arm 41 in the circumferential direction.
【0023】基板受渡し部3の第2筐体47の下部位置
には真空源接続部58が取り付けられており、基板受渡
し部3の外部に配置された真空ポンプ等の真空源59が
この真空源接続部58に接続されている。この真空源接
続部58の第2筐体47の内部側には、第2筐体47の
内部に配置された柔軟性を有するパイプ60の一端が接
続されている。パイプ60の他端は、第2筐体47の上
部側から外部に引き出されてアーム41の後端面41b
の管接続部41gに接続されている。すなわち、真空源
59、パイプ60、アーム41の真空吸引孔41c、基
板載置台41aの吸着孔41d、41e、41f等から
吸着手段61が構成されている。この吸着手段61にお
いて、真空源59が駆動されると、アーム41の基板載
置台41aの吸着孔41d、41e、41fから外部の
空気を吸引し、基板載置台41a上に基板Bが載置され
ているときにはその基板Bを真空吸着する。このように
基板Bを真空吸着する構造では、基板載置台41a上に
基板Bを位置決めするための位置決め突起を必要に応じ
て設ける他は、基板Bを機械的に固定するための固定手
段等が不要となるので、基板載置台41a部分の厚みを
薄くすることができる。A vacuum source connecting portion 58 is attached to a lower portion of the second housing 47 of the substrate transfer section 3, and a vacuum source 59 such as a vacuum pump arranged outside the substrate transfer section 3 is the vacuum source. It is connected to the connecting portion 58. One end of a flexible pipe 60 arranged inside the second housing 47 is connected to the inside of the second housing 47 of the vacuum source connecting portion 58. The other end of the pipe 60 is pulled out from the upper side of the second housing 47 to the rear end surface 41b of the arm 41.
Is connected to the pipe connecting portion 41g. That is, the suction means 61 is constituted by the vacuum source 59, the pipe 60, the vacuum suction hole 41c of the arm 41, the suction holes 41d, 41e, 41f of the substrate mounting table 41a, and the like. In the suction means 61, when the vacuum source 59 is driven, external air is sucked from the suction holes 41d, 41e, 41f of the substrate mounting table 41a of the arm 41, and the substrate B is mounted on the substrate mounting table 41a. In that case, the substrate B is vacuum-sucked. In the structure for vacuum-adsorbing the substrate B as described above, a positioning means for positioning the substrate B on the substrate mounting table 41a is provided as necessary, and a fixing means for mechanically fixing the substrate B is provided. Since it is unnecessary, the thickness of the substrate mounting table 41a can be reduced.
【0024】上記のように構成された基板搬送装置1
は、次のように動作する。すなわち、基板受渡し部3の
アーム41は、基板受渡し部3の側部に配置されている
基板Bの収納された図略のカセット側に旋回すると共
に、前方向のカセット側に移動し、カセット内に収納さ
れている基板Bを基板載置台41a上で真空吸着する。
この状態で、アーム41は、ホームポジション側に後退
すると共に、搬送ローラ部2側に旋回し、前方向の搬送
ローラ部2側に移動する。この搬送ローラ部2側への移
動時には、基板載置部41aの下面の上下方向の位置は
搬送ローラ部2のローラの小径部SKの周面上端よりも
高くなるように設定されているため、基板載置部41a
は、図6に示すようにローラの小径部SKの周面上方を
経由して搬送ローラ部2上に進入し、アーム41は所定
の位置で停止する。次いで、アーム41は下方向に移動
すると共に、真空吸着を解除して基板載置台41a上の
基板Bをローラ12乃至17の小径部SK上に載置す
る。アーム41は、さらに下方向に移動して回転軸6、
7、8に接する手前で停止する。その後、アーム41は
後退し、基板載置台41aは、図7に示すように、上記
第1平面HM1と第2平面HM2間に形成される空間内
を経由して搬送ローラ部2の外部に退出する。The substrate transfer device 1 configured as described above
Works as follows. That is, the arm 41 of the substrate transfer part 3 pivots to the cassette side (not shown) in which the substrates B arranged on the side part of the substrate transfer part 3 are accommodated, moves to the cassette side in the forward direction, and moves inside the cassette. The substrate B stored in the substrate is vacuum-sucked on the substrate platform 41a.
In this state, the arm 41 retracts to the home position side, turns to the transport roller unit 2 side, and moves to the transport roller unit 2 side in the forward direction. Since the vertical position of the lower surface of the substrate mounting portion 41a is set to be higher than the upper end of the peripheral surface of the small diameter portion SK of the roller of the transport roller portion 2 when moving to the transport roller portion 2 side. Substrate rest 41a
As shown in FIG. 6, passes over the peripheral surface of the small-diameter portion SK of the roller and enters the transport roller portion 2, and the arm 41 stops at a predetermined position. Next, the arm 41 moves downward, releases the vacuum suction, and mounts the substrate B on the substrate platform 41a on the small-diameter portion SK of the rollers 12 to 17. The arm 41 moves further downward to move the rotation shaft 6,
Stop before touching 7 and 8. After that, the arm 41 retracts, and the substrate mounting table 41a retracts to the outside of the transport roller unit 2 via the space formed between the first plane HM1 and the second plane HM2, as shown in FIG. To do.
【0025】搬送ローラ部2のローラ12乃至17上に
載置された基板Bは、搬送ローラ部2の下流側に配置さ
れている図外の処理槽が基板Bの受入れ可能な状態にあ
るとき、回転軸6乃至10の回転駆動により下流側に搬
送され、処理槽内に給送される。基板Bが処理槽内に給
送されると、回転軸6乃至10は回転を停止する。その
後、上記の動作が繰り返され、次の基板Bが順次処理槽
に給送される。The substrate B placed on the rollers 12 to 17 of the transport roller unit 2 is when the processing tank (not shown) disposed on the downstream side of the transport roller unit 2 is ready to receive the substrate B. The rotary shafts 6 to 10 are driven to rotate and are conveyed to the downstream side, and are fed into the processing tank. When the substrate B is fed into the processing bath, the rotation shafts 6 to 10 stop rotating. After that, the above operation is repeated, and the next substrate B is sequentially fed to the processing bath.
【0026】本発明の基板搬送装置1は上記のように構
成され作動するが、種々の変更が可能である。例えば、
ローラ12乃至21の中、基板受渡し部3の基板載置台
41aから基板Bを受け取る箇所のローラ12乃至17
以外のローラ18乃至21についてはその径を小さくす
るようにしてもよい。また、回転軸6乃至10の軸方向
に沿う中間位置に、ローラ12乃至21の小径部SKよ
りも若干径の小さい中間ローラを設けるようにしてもよ
い。このような中間ローラを設けると、搬送時に基板K
が撓むのを防止することができる。この場合には、アー
ム41の基板載置台41aにその中間ローラを受け入れ
るスリットを形成しておき、基板載置台41aが上記第
1平面HM1と第2平面HM2間に形成される空間で移
動できるようにしておく必要がある。さらに、ローラ1
2乃至21は、その大径部DKの存在しない形状にすこ
ともできる。また、アーム41は、直線運動により水平
方向に移動するようにしたものであるが、アームを多関
節式構造にして屈伸運動により水平方向に移動するよう
にしてもよい。The substrate transfer apparatus 1 of the present invention is constructed and operates as described above, but various modifications are possible. For example,
Of the rollers 12 to 21, the rollers 12 to 17 at the portion for receiving the substrate B from the substrate platform 41a of the substrate transfer section 3.
The diameters of the rollers 18 to 21 other than those may be reduced. Further, an intermediate roller having a diameter slightly smaller than the small diameter portion SK of the rollers 12 to 21 may be provided at an intermediate position along the axial direction of the rotary shafts 6 to 10. If such an intermediate roller is provided, the substrate K
Can be prevented from bending. In this case, a slit for receiving the intermediate roller is formed in the substrate mounting table 41a of the arm 41 so that the substrate mounting table 41a can move in the space formed between the first plane HM1 and the second plane HM2. Need to be kept. Furthermore, roller 1
Nos. 2 to 21 may have a shape without the large diameter portion DK. Further, although the arm 41 is configured to move in the horizontal direction by linear motion, the arm 41 may have a multi-joint structure to move in the horizontal direction by bending and stretching motion.
【0027】また、上記のように構成された基板搬送装
置1は、最終の処理槽から送り出されてきた基板Bを一
枚づつカセットに収納する最終工程においても採用され
る。この場合は、基板受渡し部3が搬送ローラ部2の下
流端に対向するように配置されて構成され、次のように
動作する。The substrate transfer apparatus 1 configured as described above is also used in the final step of storing the substrates B sent out from the final processing bath in a cassette one by one. In this case, the substrate transfer section 3 is arranged so as to face the downstream end of the transport roller section 2, and operates as follows.
【0028】すなわち、搬送ローラ部2は、処理槽から
送り出されてきた基板Bが搬送ローラ部2のローラ12
乃至17上に載置されると、回転軸6乃至10が回転駆
動され、基板Bはローラ12乃至21によって搬送ロー
ラ部2の下流側の所定の位置にまで搬送される。この状
態で、基板受渡し部3のアーム41は前方向に移動し、
それにより基板載置台41aが基板B下面の上記第1平
面HM1と第2平面HM2間に形成される空間内に進入
する。基板載置台41aが所定の位置にまで進入する
と、アーム41はその位置で移動を停止する。次いで、
アーム41が上方向に移動して基板載置台41aが基板
Bの下面に当接したとき、基板載置台41aは基板Bを
真空吸着する。この状態で、アーム41はさらに上方向
に移動した後、後退し、それにより基板載置台41aは
搬送ローラ部2の上方から外方に退出する。その後、ア
ーム41はカセットが配置されている方向に旋回した
後、前方向に移動して基板Bをカセットに収納する。That is, in the transport roller unit 2, the substrate B sent from the processing bath is the roller 12 of the transport roller unit 2.
When it is placed on Nos. 17 to 17, the rotary shafts 6 to 10 are rotationally driven, and the substrate B is conveyed by the rollers 12 to 21 to a predetermined position on the downstream side of the conveyance roller unit 2. In this state, the arm 41 of the substrate transfer part 3 moves forward,
As a result, the substrate mounting table 41a enters the space formed between the first plane HM1 and the second plane HM2 on the lower surface of the substrate B. When the substrate mounting table 41a reaches a predetermined position, the arm 41 stops moving at that position. Then
When the arm 41 moves upward and the substrate mounting table 41a comes into contact with the lower surface of the substrate B, the substrate mounting table 41a sucks the substrate B in vacuum. In this state, the arm 41 further moves upward and then retracts, whereby the substrate platform 41a retracts from above the transport roller unit 2 to the outside. After that, the arm 41 turns in the direction in which the cassette is arranged, and then moves in the forward direction to store the substrate B in the cassette.
【0029】[0029]
【発明の効果】請求項1又は2記載の基板搬送装置によ
れば、ローラの半径を回転軸の半径寸法に少なくとも基
板載置台の厚みを加えた寸法としたので、基板載置台
が、回転軸の周面上端とローラの周面上端間に形成され
る空間内で移動できるようになり、従来のようなリフト
ピンを備えた昇降手段が不要となることから搬送ローラ
部の構造が簡素化されると共に、パーティクルの発生が
抑制されて基板表面の汚染が可及的に防止できるように
なる。According to the substrate transfer apparatus of the first or second aspect of the present invention, the radius of the roller is set to be the dimension of the radius of the rotating shaft plus at least the thickness of the substrate mounting table. It becomes possible to move in the space formed between the upper end of the peripheral surface of the roller and the upper end of the peripheral surface of the roller, and the lifting means having the lift pin as in the prior art is not required, so that the structure of the conveying roller unit is simplified. At the same time, the generation of particles is suppressed, and the contamination of the substrate surface can be prevented as much as possible.
【0030】また、請求項2記載の基板搬送装置によれ
ば、基板載置台に載置された基板を真空吸着する吸着手
段を備えているため、基板載置台上に基板を確実に固定
でき、基板の受渡し動作の信頼性が向上する。また、基
板載置台上に基板を固定するための機械的な固定手段を
設ける必要がなくなり、基板載置台を薄くすることがで
きる。Further, according to the substrate transfer apparatus of the second aspect, since the substrate mounting apparatus is provided with the suction means for vacuum-sucking the substrate mounted on the substrate mounting table, the substrate can be securely fixed on the substrate mounting table. The reliability of the substrate transfer operation is improved. Further, it is not necessary to provide a mechanical fixing means for fixing the substrate on the substrate mounting table, and the substrate mounting table can be thinned.
【図1】本発明の基板搬送装置の側面図である。FIG. 1 is a side view of a substrate transfer device of the present invention.
【図2】図1に示す基板搬送装置の平面図である。2 is a plan view of the substrate transfer device shown in FIG. 1. FIG.
【図3】図1に示す基板搬送装置の搬送ローラ部の回転
軸とローラ部分を拡大して示す図である。3 is an enlarged view showing a rotary shaft and a roller portion of a carrying roller portion of the substrate carrying device shown in FIG.
【図4】図1に示す基板搬送装置の基板受渡し部の内部
構造を示す図である。FIG. 4 is a diagram showing an internal structure of a substrate transfer section of the substrate transfer device shown in FIG.
【図5】図1に示す基板搬送装置の基板受渡し部の平面
図である。5 is a plan view of a substrate transfer section of the substrate transfer device shown in FIG. 1. FIG.
【図6】図4及び図5に示す基板受渡し部の基板載置台
の動作を説明するための回転軸とローラ部分を拡大して
示す図である。FIG. 6 is an enlarged view showing a rotary shaft and a roller portion for explaining the operation of the substrate mounting table of the substrate transfer part shown in FIGS. 4 and 5;
【図7】図4及び図5に示す基板受渡し部の基板載置台
の動作を説明するための回転軸とローラ部分を拡大して
示す図である。FIG. 7 is an enlarged view of a rotary shaft and a roller portion for explaining the operation of the substrate mounting table of the substrate transfer unit shown in FIGS. 4 and 5.
【図8】従来の基板搬送装置の側面図である。FIG. 8 is a side view of a conventional substrate transfer device.
【図9】図7に示す基板搬送装置の平面図である。9 is a plan view of the substrate transfer device shown in FIG. 7. FIG.
【図10】図7に示す基板搬送装置の搬送ローラ部の要
部を拡大して示す図である。10 is an enlarged view showing a main part of a transfer roller portion of the substrate transfer device shown in FIG. 7.
1 基板搬送装置 2 搬送ローラ部 3 基板受渡し部 4、5 軸受部材 6、7、8、9、10 回転軸 12、13、14、15、16、17、18、19、2
0、21 ローラ 22 回転軸駆動手段 41 アーム 41a 基板載置台 61 吸着手段DESCRIPTION OF SYMBOLS 1 Substrate transport device 2 Transport roller part 3 Substrate passing part 4, 5 Bearing member 6, 7, 8, 9, 10 Rotating shaft 12, 13, 14, 15, 16, 17, 18, 19, 2
0, 21 roller 22 rotary shaft drive means 41 arm 41a substrate mounting table 61 suction means
───────────────────────────────────────────────────── フロントページの続き (72)発明者 小笠原 光雄 滋賀県彦根市高宮町480番地の1 大日本 スクリーン製造株式会社彦根地区事業所内 (72)発明者 松下 佳彦 滋賀県彦根市高宮町480番地の1 大日本 スクリーン製造株式会社彦根地区事業所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Mitsuo Ogasawara 1 at 480 Takamiya-cho, Hikone-shi, Shiga Dainippon Screen Mfg. Co., Ltd. Hikone district business office (72) Inventor Yoshihiko Matsushita, 480, Takamiya-cho, Hikone-shi, Shiga 1 Dainippon Screen Mfg. Co., Ltd. Hikone District Office
Claims (2)
する搬送ローラ部と、この搬送ローラ部に対して進退
し、上記ローラとの間で基板の受渡しを行なう基板受渡
し部とを有する基板搬送装置において、 上記基板受渡し部は、少なくとも載置する基板の幅以下
の幅寸法と所定の厚みを有する平板状の基板載置台を備
え、上記搬送ローラ部は、第1の半径寸法を有する回転
軸を有し、かつ、上記ローラは上記回転軸の両側に、少
なくとも上記基板載置台の幅寸法だけ離間して取り付け
られると共に、上記第1の半径寸法に比して、少なくと
も上記所定の厚みを加えた第2の半径寸法を有するもの
であることを特徴とする基板搬送装置。1. A substrate having a conveying roller portion having a plurality of rollers arranged in parallel in a conveying direction, and a substrate passing portion that moves forward and backward with respect to the conveying roller portion and delivers the substrate to the roller. In the transfer device, the substrate transfer part includes a flat plate-shaped substrate mounting table having a width dimension at least equal to or smaller than a width of a substrate to be mounted, and the transfer roller part has a rotation radius having a first radius dimension. The roller has a shaft, and the roller is mounted on both sides of the rotation shaft at a distance of at least the width dimension of the substrate mounting table, and has at least the predetermined thickness as compared with the first radius dimension. A substrate transfer apparatus having an added second radius dimension.
上記基板受渡し部は、基板載置台に載置された基板を真
空吸着する吸着手段を有するものであることを特徴とす
る基板搬送装置。2. The substrate transfer apparatus according to claim 1, wherein
The substrate transfer device is characterized in that the substrate transfer section has a suction means for vacuum-sucking a substrate placed on a substrate mounting table.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7282908A JPH09124147A (en) | 1995-10-31 | 1995-10-31 | Substrate conveying device |
KR1019960049970A KR100225771B1 (en) | 1995-10-31 | 1996-10-30 | Substrate transfer apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7282908A JPH09124147A (en) | 1995-10-31 | 1995-10-31 | Substrate conveying device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09124147A true JPH09124147A (en) | 1997-05-13 |
Family
ID=17658675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7282908A Pending JPH09124147A (en) | 1995-10-31 | 1995-10-31 | Substrate conveying device |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH09124147A (en) |
KR (1) | KR100225771B1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100493766B1 (en) * | 1998-04-30 | 2005-08-01 | 삼성전자주식회사 | Substrate transfer tool of etching facility for manufacturing LCD and substrate transfer method |
KR100822280B1 (en) * | 2007-02-13 | 2008-04-16 | 주식회사 에스에프에이 | Glass input system |
JP2009001358A (en) * | 2007-06-20 | 2009-01-08 | Shinko Electric Co Ltd | Conveying system |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3756402B2 (en) * | 2000-12-08 | 2006-03-15 | 富士写真フイルム株式会社 | Substrate transfer apparatus and method |
KR101553624B1 (en) | 2013-12-17 | 2015-09-16 | 주식회사 에스에프에이 | Transferring apparatus |
-
1995
- 1995-10-31 JP JP7282908A patent/JPH09124147A/en active Pending
-
1996
- 1996-10-30 KR KR1019960049970A patent/KR100225771B1/en not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100493766B1 (en) * | 1998-04-30 | 2005-08-01 | 삼성전자주식회사 | Substrate transfer tool of etching facility for manufacturing LCD and substrate transfer method |
KR100822280B1 (en) * | 2007-02-13 | 2008-04-16 | 주식회사 에스에프에이 | Glass input system |
JP2009001358A (en) * | 2007-06-20 | 2009-01-08 | Shinko Electric Co Ltd | Conveying system |
Also Published As
Publication number | Publication date |
---|---|
KR970023974A (en) | 1997-05-30 |
KR100225771B1 (en) | 1999-10-15 |
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