JPH0859299A - Heat radiation-reflecting glass and its production - Google Patents
Heat radiation-reflecting glass and its productionInfo
- Publication number
- JPH0859299A JPH0859299A JP6193455A JP19345594A JPH0859299A JP H0859299 A JPH0859299 A JP H0859299A JP 6193455 A JP6193455 A JP 6193455A JP 19345594 A JP19345594 A JP 19345594A JP H0859299 A JPH0859299 A JP H0859299A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- coating film
- glass
- nickel
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/217—FeOx, CoOx, NiOx
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/219—CrOx, MoOx, WOx
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/228—Other specific oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/112—Deposition methods from solutions or suspensions by spraying
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は建築用または自動車用・
車両用の熱線反射ガラスに関する。BACKGROUND OF THE INVENTION The present invention relates to a building or automobile.
The present invention relates to a heat ray reflective glass for vehicles.
【０００２】[0002]
【従来の技術】近年、建築用または自動車用・車両用ガ
ラスとして、プライバシー保護、冷房負荷軽減等の目的
で太陽光の流入を制御する被膜を形成したガラスが用い
られている。この種のガラスとしては、ガラス上に金属
膜または金属窒化物膜と誘電体膜からなる多層構造を有
する薄膜をスパッタリング法等により成膜したものも知
られているが、原料液を高温のガラス上に噴霧して金属
酸化物膜を形成する製造方法も製造コストの観点から優
れているために多用されている。2. Description of the Related Art In recent years, as a glass for buildings or automobiles / vehicles, a glass having a film for controlling the inflow of sunlight has been used for the purpose of protecting privacy, reducing the cooling load, and the like. As this type of glass, it is also known that a thin film having a multi-layer structure composed of a metal film or a metal nitride film and a dielectric film is formed on the glass by a sputtering method or the like. A manufacturing method in which a metal oxide film is formed by spraying on the above is also frequently used because it is excellent in terms of manufacturing cost.
【０００３】このいわゆる熱的成膜法により形成した被
膜としては、クロム酸化物、鉄酸化物及びコバルト酸化
物を含む金属酸化物被膜を形成した熱線反射ガラスが知
られている（例えば、特開昭５６−５３５３）。As a film formed by this so-called thermal film forming method, a heat-reflecting glass is known in which a metal oxide film containing chromium oxide, iron oxide and cobalt oxide is formed (see, for example, Japanese Patent Application Laid-Open No. 2000-242242). 56-5353).
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、上記従
来のクロム酸化物、鉄酸化物及びコバルト酸化物を含む
金属酸化物被膜をガラス基板上に形成した熱線反射ガラ
スは、上述の金属薄膜等と誘電体膜の多層構造体である
被膜を有する熱線反射ガラスよりも耐久性において優れ
ており、通常の使用時にはほとんど問題はないものの、
近年の環境汚染による酸性雨の影響等を考えるとさらな
る耐久性の向上が望まれていた。本発明は、上記のクロ
ム酸化物等を含む被膜を形成した熱線反射ガラスであっ
て耐久性がさらに優れた熱線反射ガラスを提供すること
を目的とする。However, heat-reflecting glass in which the above-mentioned conventional metal oxide coating containing chromium oxide, iron oxide, and cobalt oxide is formed on a glass substrate is not compatible with the above-mentioned metal thin film and the like. It is superior in durability to heat ray reflective glass having a coating that is a multilayer structure of body film, and although there is almost no problem in normal use,
Considering the influence of acid rain due to recent environmental pollution, further improvement in durability has been desired. It is an object of the present invention to provide a heat ray reflective glass having a coating film containing the above chromium oxide or the like, which is further excellent in durability.
【０００５】[0005]
【課題を解決しようとする手段】本発明による熱線反射
ガラスは、ガラス基板の主表面上に、銅酸化物及びニッ
ケル酸化物のうち少なくとも一種と、クロム酸化物、鉄
酸化物及びコバルト酸化物を含む被膜が形成されてなる
熱線反射ガラスである。The heat-reflecting glass according to the present invention comprises at least one of copper oxide and nickel oxide and chromium oxide, iron oxide and cobalt oxide on the main surface of a glass substrate. It is a heat ray reflective glass having a coating film formed thereon.
【０００６】この金属酸化物被膜中の銅及びニッケルの
濃度は、この被膜単位面積当たりの総金属量に対して、
０．１〜１０重量％含有されていることが好ましいが、
３〜６重量％であればさらに好ましい。The concentrations of copper and nickel in the metal oxide coating are based on the total amount of metal per unit area of the coating.
It is preferable that the content is 0.1 to 10% by weight,
It is more preferably 3 to 6% by weight.
【０００７】また、上記被膜の膜厚は、主として商品特
性（可視光透過率等の光学的性質、透過・反射光による
美観等）上の理由から０．０２〜０．１２μｍ程度が好
ましく、０．０４〜０．０７μｍの範囲であればさらに
好ましい。The thickness of the above-mentioned coating is preferably about 0.02 to 0.12 μm, mainly for reasons of product characteristics (optical properties such as visible light transmittance, aesthetics due to transmitted / reflected light). More preferably, it is in the range of 0.04 to 0.07 μm.
【０００８】一方、上記ガラス基板としては、建築用等
として多用される透明または着色されたソーダライムシ
リケートが最も一般的であるが、これに限ることなく、
その他組成を異にする各種ガラスであってもよい。On the other hand, as the above-mentioned glass substrate, transparent or colored soda lime silicate, which is often used for construction and the like, is the most general, but not limited to this.
Other types of glass having different compositions may be used.
【０００９】本発明に係る熱線反射ガラスの製造方法と
しては、被膜の形成に際して、高温のガラス基板の主表
面上に、銅化合物及びニッケル化合物のうち少なくとも
一種と、クロム化合物、鉄化合物及びコバルト化合物を
含む被膜形成溶液を供給する、いわゆる熱分解法が製造
コスト上の観点等から好ましいが、これに限ることな
く、スパッタリング法、ＣＶＤ法により被膜を形成して
もよい。As a method for producing the heat ray reflective glass according to the present invention, at the time of forming a film, at least one of a copper compound and a nickel compound, a chromium compound, an iron compound and a cobalt compound are formed on the main surface of a high temperature glass substrate. A so-called thermal decomposition method of supplying a film forming solution containing is preferable from the viewpoint of manufacturing cost and the like, but the present invention is not limited to this, and the film may be formed by a sputtering method or a CVD method.
【００１０】上記被膜形成溶液としては、上記の各種金
属化合物が溶媒中に溶解または分散しているものが一般
的である。ここで、銅化合物としては、アセチルアセト
ン銅、塩化銅等が、ニッケル化合物としては、アセチル
アセトンニッケル、塩化ニッケル等が、クロム化合物と
しては、アセチルアセトンクロム、塩化クロム等が、鉄
化合物としては、アセチルアセトン鉄、塩化鉄等が、コ
バルト化合物としては、アセチルアセトンコバルト、酢
酸コバルト、塩化コバルト等が挙げられる。また、上記
溶媒としては、芳香族化合物、ケトン、アルコール等を
用いることができる。尚、上記アセチルアセトンコバル
トは、二価塩、三価塩のどちらでもよい。The film forming solution is generally one in which the above various metal compounds are dissolved or dispersed in a solvent. Here, as the copper compound, acetylacetone copper, copper chloride and the like, as the nickel compound, acetylacetone nickel, nickel chloride and the like, as the chromium compound, acetylacetone chromium, chromium chloride and the like, as the iron compound, acetylacetone iron, Examples of the cobalt compound include iron chloride and the like, and examples of the cobalt compound include acetylacetone cobalt, cobalt acetate, and cobalt chloride. As the solvent, aromatic compounds, ketones, alcohols, etc. can be used. The acetylacetone cobalt may be a divalent salt or a trivalent salt.
【００１１】上記熱分解法において、被膜形成溶液をガ
ラス基板に噴霧する温度は、３５０〜８００℃程度が好
ましい。３５０℃以下では被膜が酸化物多結晶ではなく
非晶質となって熱線吸収能等が劣化し、８００℃以上で
は好ましい複合酸化物の組み合わせが得られず本発明の
効果が得にくいばかりかガラス基板も軟化溶融し基板と
しての役割を果たし得ないからである。In the above thermal decomposition method, the temperature at which the film forming solution is sprayed on the glass substrate is preferably about 350 to 800 ° C. At 350 ° C. or lower, the coating becomes amorphous rather than oxide polycrystal and the heat ray absorbing ability is deteriorated, and at 800 ° C. or higher, a preferable combination of complex oxides cannot be obtained, and the effect of the present invention is difficult to obtain. This is because the substrate also softens and melts and cannot serve as the substrate.
【００１２】また、上記熱分解法により本発明に係る熱
線反射ガラスを製造する際には、あらかじめ、被膜形成
溶液中の金属化合物含有量を使用装置に応じた最適範囲
となるように実験的に決定しておく必要がある。被膜形
成溶液中の金属化合物量の総量が少なすぎると十分な成
膜速度が得られず、一方、多すぎると良好な膜厚分布が
得られなくなるからである。金属化合物含有量の最適範
囲は、噴霧時の基板温度、噴霧に用いるノズル、ガスの
排気機構、成膜速度等各条件によって異なるため、上述
のように使用装置に応じて個別に定めることが好まし
い。Further, when the heat ray reflective glass according to the present invention is produced by the above-mentioned thermal decomposition method, the content of the metal compound in the film forming solution is experimentally adjusted in advance so as to be in the optimum range according to the apparatus used. You need to decide. This is because if the total amount of metal compounds in the film forming solution is too small, a sufficient film formation rate cannot be obtained, while if it is too large, a good film thickness distribution cannot be obtained. Since the optimum range of the metal compound content varies depending on each condition such as the substrate temperature during spraying, the nozzle used for spraying, the gas exhaust mechanism, the film formation rate, etc., it is preferable to determine it individually according to the apparatus used as described above. .
【００１３】[0013]
【作用】クロム酸化物、鉄酸化物及びコバルト酸化物を
含む金属酸化物被膜をこれらの酸化物の他に銅酸化物及
びニッケル酸化物のうち少なくとも一種をも含む金属酸
化物被膜とすることにより、耐久性をさらに向上させる
ことができる。[Function] By changing the metal oxide coating containing chromium oxide, iron oxide and cobalt oxide to a metal oxide coating containing at least one of copper oxide and nickel oxide in addition to these oxides The durability can be further improved.
【００１４】[0014]
【実施例】以下、実施例により本発明をより具体的に説
明する。 （実施例１）厚さ４ｍｍ、大きさ１５０×１５０ｍｍの
ソーダライムシリケートガラスを洗浄・乾燥させ基板と
した。一方、１００ミリリットルのトルエンに３価のク
ロムのアセチルアセトナート４．９ｇ、鉄のアセチルア
セトナート２．５ｇ、コバルトのアセチルアセトナート
７．４ｇ、銅のアセチルアセトナート０．１ｇを溶解ま
たは分散させて被膜形成溶液とした。The present invention will be described in more detail with reference to the following examples. Example 1 Soda lime silicate glass having a thickness of 4 mm and a size of 150 × 150 mm was washed and dried to obtain a substrate. On the other hand, 4.9 g of trivalent chromium acetylacetonate, 2.5 g of iron acetylacetonate, 7.4 g of cobalt acetylacetonate, and 0.1 g of copper acetylacetonate are dissolved or dispersed in 100 ml of toluene. To form a film-forming solution.
【００１５】次に、基板を吊り具によって固定し、６５
０℃の電気炉内に５分間保持した後に取り出し、その表
面上に被膜形成溶液を市販のスプレーガンを用いて約１
０秒間噴霧して金属酸化物被膜を形成し、熱線反射ガラ
スを作製した。このときの噴霧条件は、空気圧３．０ｋ
ｇ／ｃｍ2 、空気量９０リットル／分、噴霧量１００ミ
リリットル／分であった。Next, the substrate is fixed by a hanging tool, and 65
After holding it in an electric furnace at 0 ° C for 5 minutes, it was taken out, and the film-forming solution was applied to the surface of the solution using a commercially available spray gun for about 1 minute.
A metal oxide film was formed by spraying for 0 seconds to produce a heat ray reflective glass. The spraying condition at this time is air pressure of 3.0 k.
The amount was g / cm 2 , the air amount was 90 liters / minute, and the spray amount was 100 milliliters / minute.
【００１６】得られた被膜の厚さは約０．０５μｍであ
った。この被膜中の単位面積当たりの総金属量に対する
銅及びニッケル量の重量百分率を高周波プラズマ発光分
析により求めた結果と、ＪＩＳ Ｒ ３２２１−１９９
０に従って耐薬品試験を実施した結果を表１に示す。但
し、薬品への浸漬時間は３日間とした。The thickness of the resulting coating was about 0.05 μm. The weight percentage of the amount of copper and nickel with respect to the total amount of metal per unit area in this coating was determined by high frequency plasma emission spectrometry, and JIS R 3221-199 was used.
Table 1 shows the results of the chemical resistance test conducted according to No. 0. However, the immersion time in the chemical was 3 days.
【００１７】[0017]
【表１】 [Table 1]
【００１８】（実施例２）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．２ｇ、鉄
のアセチルアセトナート３．１ｇ、コバルトのアセチル
アセトナート７．６ｇ、銅のアセチルアセトナート０．
３ｇを溶解または分散させて被膜形成溶液とした以外
は、実施例１と同様にして熱線反射ガラスを作製した。
得られた被膜の厚さは約０．０５μｍであった。この被
膜を実施例１と同様の方法により評価した結果を表１に
併せて示す。Example 2 In 100 ml of toluene, 4.2 g of trivalent chromium acetylacetonate, 3.1 g of iron acetylacetonate, 7.6 g of cobalt acetylacetonate, and 0.1 g of copper acetylacetonate.
A heat ray reflective glass was produced in the same manner as in Example 1 except that 3 g was dissolved or dispersed to form a film forming solution.
The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００１９】（実施例３）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．９ｇ、鉄
のアセチルアセトナート３．１ｇ、コバルトのアセチル
アセトナート６．８ｇ、銅のアセチルアセトナート０．
３ｇを溶解または分散させて被膜形成溶液とした以外
は、実施例１と同様にして熱線反射ガラスを作製した。
得られた被膜の厚さは約０．０５μｍであった。この被
膜を実施例１と同様の方法により評価した結果を表１に
併せて示す。(Example 3) In 100 ml of toluene, 4.9 g of trivalent chromium acetylacetonate, 3.1 g of iron acetylacetonate, 6.8 g of cobalt acetylacetonate, and 0.1 g of copper acetylacetonate.
A heat ray reflective glass was produced in the same manner as in Example 1 except that 3 g was dissolved or dispersed to form a film forming solution.
The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００２０】（実施例４）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．９ｇ、鉄
のアセチルアセトナート２．５ｇ、コバルトのアセチル
アセトナート７．４ｇ、銅のアセチルアセトナート０．
７ｇを溶解または分散させて被膜形成溶液とした以外
は、実施例１と同様にして熱線反射ガラスを作製した。
得られた被膜の厚さは約０．０５μｍであった。この被
膜を実施例１と同様の方法により評価した結果を表１に
併せて示す。(Example 4) 4.9 g of trivalent chromium acetylacetonate, 2.5 g of iron acetylacetonate, 7.4 g of cobalt acetylacetonate and 0.1 g of copper acetylacetonate in 100 ml of toluene.
A heat ray reflective glass was produced in the same manner as in Example 1 except that 7 g was dissolved or dispersed to form a film forming solution.
The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００２１】（実施例５）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．９ｇ、鉄
のアセチルアセトナート２．５ｇ、コバルトのアセチル
アセトナート７．４ｇ、ニッケルのアセチルアセトナー
ト０．２ｇを溶解または分散させて被膜形成溶液とした
以外は、実施例１と同様にして熱線反射ガラスを作製し
た。得られた被膜の厚さは約０．０５μｍであった。こ
の被膜を実施例１と同様の方法により評価した結果を表
１に併せて示す。Example 5 In 100 ml of toluene, 4.9 g of trivalent chromium acetylacetonate, 2.5 g of iron acetylacetonate, 7.4 g of cobalt acetylacetonate, and 0.1 g of nickel acetylacetonate. A heat ray reflective glass was produced in the same manner as in Example 1 except that 2 g was dissolved or dispersed to form a film forming solution. The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００２２】（実施例６）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．２ｇ、鉄
のアセチルアセトナート３．１ｇ、コバルトのアセチル
アセトナート７．６ｇ、ニッケルのアセチルアセトナー
ト０．４ｇを溶解または分散させて被膜形成溶液とした
以外は、実施例１と同様にして熱線反射ガラスを作製し
た。得られた被膜の厚さは約０．０５μｍであった。こ
の被膜を実施例１と同様の方法により評価した結果を表
１に併せて示す。Example 6 In 100 ml of toluene, 4.2 g of trivalent chromium acetylacetonate, 3.1 g of iron acetylacetonate, 7.6 g of cobalt acetylacetonate, and 0.1 g of nickel acetylacetonate. A heat ray reflective glass was produced in the same manner as in Example 1 except that 4 g was dissolved or dispersed to form a film forming solution. The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００２３】（実施例７）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．９ｇ、鉄
のアセチルアセトナート３．１ｇ、コバルトのアセチル
アセトナート６．８ｇ、ニッケルのアセチルアセトナー
ト０．４ｇを溶解または分散させて被膜形成溶液とした
以外は、実施例１と同様にして熱線反射ガラスを作製し
た。得られた被膜の厚さは約０．０５μｍであった。こ
の被膜を実施例１と同様の方法により評価した結果を表
１に併せて示す。Example 7 In 100 ml of toluene, 4.9 g of trivalent chromium acetylacetonate, 3.1 g of iron acetylacetonate, 6.8 g of cobalt acetylacetonate, and nickel acetylacetonate of 0.1 g. A heat ray reflective glass was produced in the same manner as in Example 1 except that 4 g was dissolved or dispersed to form a film forming solution. The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００２４】（実施例８）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．９ｇ、鉄
のアセチルアセトナート２．５ｇ、コバルトのアセチル
アセトナート７．４ｇ、ニッケルのアセチルアセトナー
ト１．４ｇを溶解または分散させて被膜形成溶液とした
以外は、実施例１と同様にして熱線反射ガラスを作製し
た。得られた被膜の厚さは約０．０５μｍであった。こ
の被膜を実施例１と同様の方法により評価した結果を表
１に併せて示す。Example 8 4.9 g of trivalent chromium acetylacetonate, 2.5 g of iron acetylacetonate, 7.4 g of cobalt acetylacetonate and 100 g of nickel acetylacetonate in 100 ml of toluene. A heat ray reflective glass was produced in the same manner as in Example 1 except that 4 g was dissolved or dispersed to form a film forming solution. The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００２５】（比較例１）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．９ｇ、鉄
のアセチルアセトナート２．５ｇ、コバルトのアセチル
アセトナート７．４ｇを溶解または分散させて被膜形成
溶液とした以外は、実施例１と同様にして熱線反射ガラ
スを作製した。得られた被膜の厚さは約０．０５μｍで
あった。この被膜を実施例１と同様の方法により評価し
た結果を表１に併せて示す。Comparative Example 1 4.9 g of trivalent chromium acetylacetonate, 2.5 g of iron acetylacetonate and 7.4 g of cobalt acetylacetonate were dissolved or dispersed in 100 ml of toluene to form a film. A heat ray reflective glass was produced in the same manner as in Example 1 except that the solution was used. The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００２６】（比較例２）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．２ｇ、鉄
のアセチルアセトナート３．１ｇ、コバルトのアセチル
アセトナート７．６ｇを溶解または分散させて被膜形成
溶液とした以外は、実施例１と同様にして熱線反射ガラ
スを作製した。得られた被膜の厚さは約０．０５μｍで
あった。この被膜を実施例１と同様の方法により評価し
た結果を表１に併せて示す。Comparative Example 2 A film was formed by dissolving or dispersing 4.2 g of trivalent chromium acetylacetonate, 3.1 g of iron acetylacetonate, and 7.6 g of cobalt acetylacetonate in 100 ml of toluene. A heat ray reflective glass was produced in the same manner as in Example 1 except that the solution was used. The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００２７】（比較例３）１００ミリリットルのトルエ
ンに３価のクロムのアセチルアセトナート４．９ｇ、鉄
のアセチルアセトナート３．１ｇ、コバルトのアセチル
アセトナート６．８ｇを溶解または分散させて被膜形成
溶液とした以外は、実施例１と同様にして熱線反射ガラ
スを作製した。得られた被膜の厚さは約０．０５μｍで
あった。この被膜を実施例１と同様の方法により評価し
た結果を表１に併せて示す。Comparative Example 3 4.9 g of trivalent chromium acetylacetonate, 3.1 g of iron acetylacetonate, and 6.8 g of cobalt acetylacetonate were dissolved or dispersed in 100 ml of toluene to form a film. A heat ray reflective glass was produced in the same manner as in Example 1 except that the solution was used. The thickness of the obtained coating was about 0.05 μm. The results of evaluation of this coating film by the same method as in Example 1 are also shown in Table 1.
【００２８】表１より、被膜の耐酸性は、被膜中に銅ま
たはニッケルの酸化物を含まない比較例１〜３に対し、
被膜中に銅またはニッケルの酸化物を含む実施例１〜８
が優れており、特に、実施例１〜３、実施例４〜７が優
れていることがわかる。From Table 1, it can be seen that the acid resistance of the coating is as compared with Comparative Examples 1 to 3 in which the coating contains no oxide of copper or nickel.
Examples 1 to 8 containing copper or nickel oxide in the coating
Is excellent, and in particular, Examples 1 to 3 and Examples 4 to 7 are excellent.
【００２９】[0029]
【発明の効果】本発明によれば、クロム酸化物、鉄酸化
物及びコバルト酸化物を含む被膜に銅酸化物及びニッケ
ル酸化物のうち少なくとも一種を加えることにより、被
膜耐久性がさらに向上した熱線反射ガラスを得ることが
できる。According to the present invention, by adding at least one of copper oxide and nickel oxide to a coating containing chromium oxide, iron oxide and cobalt oxide, the heat resistance of the coating is further improved. A reflective glass can be obtained.
【００３０】また、高温のガラス基板上に被膜形成溶液
を噴霧する熱分解法により本発明に係る熱線反射ガラス
を製造することにより、耐久性に優れた熱線反射ガラス
を低コストで製造することが可能である。Further, by producing the heat ray-reflecting glass according to the present invention by a thermal decomposition method in which a film forming solution is sprayed on a high temperature glass substrate, a heat ray-reflecting glass having excellent durability can be produced at low cost. It is possible.
Claims (3)
た、銅酸化物及びニッケル酸化物のうち少なくとも一種
と、クロム酸化物、鉄酸化物及びコバルト酸化物を含む
被膜からなる熱線反射ガラス。1. A heat-reflecting glass comprising a glass substrate and a film formed on its main surface and containing at least one of copper oxide and nickel oxide and chromium oxide, iron oxide and cobalt oxide.
占める銅及びニッケルの割合が０．１〜１０重量％であ
ることを特徴とする請求項１記載の熱線反射ガラス。2. The heat ray reflective glass according to claim 1, wherein the proportion of copper and nickel in the total amount of metal per unit area of the coating film is 0.1 to 10% by weight.
物及びニッケル化合物のうち少なくとも一種と、クロム
化合物、鉄化合物及びコバルト化合物を含む被膜形成溶
液を供給することを特徴とする熱線反射ガラスの製造方
法。3. A heat-reflecting glass comprising supplying a film forming solution containing at least one of a copper compound and a nickel compound and a chromium compound, an iron compound and a cobalt compound onto the main surface of a high temperature glass substrate. Manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6193455A JPH0859299A (en) | 1994-08-18 | 1994-08-18 | Heat radiation-reflecting glass and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6193455A JPH0859299A (en) | 1994-08-18 | 1994-08-18 | Heat radiation-reflecting glass and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0859299A true JPH0859299A (en) | 1996-03-05 |
Family
ID=16308291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6193455A Pending JPH0859299A (en) | 1994-08-18 | 1994-08-18 | Heat radiation-reflecting glass and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0859299A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998052881A1 (en) * | 1997-05-22 | 1998-11-26 | Nippon Electric Glass Co., Ltd. | Solar reflective glass block and method of producing the same |
| SG81880A1 (en) * | 1993-12-28 | 2001-07-24 | Nippon Shaat Glass Co Ltd | Heat ray-reflecting glass |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51112824A (en) * | 1975-03-29 | 1976-10-05 | Central Glass Co Ltd | Glass which reflects heat rays and method of producing it |
| JPS5622656A (en) * | 1979-07-25 | 1981-03-03 | Ppg Industries Inc | Improvement of metal oxide film against alkali |
| JPS5641858A (en) * | 1973-09-07 | 1981-04-18 | Ppg Industries Inc | Coated glass |
| JP2910538B2 (en) * | 1993-12-14 | 1999-06-23 | 日本板硝子株式会社 | Method for manufacturing heat ray reflective glass |
-
1994
- 1994-08-18 JP JP6193455A patent/JPH0859299A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5641858A (en) * | 1973-09-07 | 1981-04-18 | Ppg Industries Inc | Coated glass |
| JPS51112824A (en) * | 1975-03-29 | 1976-10-05 | Central Glass Co Ltd | Glass which reflects heat rays and method of producing it |
| JPS5622656A (en) * | 1979-07-25 | 1981-03-03 | Ppg Industries Inc | Improvement of metal oxide film against alkali |
| JP2910538B2 (en) * | 1993-12-14 | 1999-06-23 | 日本板硝子株式会社 | Method for manufacturing heat ray reflective glass |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG81880A1 (en) * | 1993-12-28 | 2001-07-24 | Nippon Shaat Glass Co Ltd | Heat ray-reflecting glass |
| WO1998052881A1 (en) * | 1997-05-22 | 1998-11-26 | Nippon Electric Glass Co., Ltd. | Solar reflective glass block and method of producing the same |
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