JPH08337296A - Chemical-feeding device - Google Patents
Chemical-feeding deviceInfo
- Publication number
- JPH08337296A JPH08337296A JP16826495A JP16826495A JPH08337296A JP H08337296 A JPH08337296 A JP H08337296A JP 16826495 A JP16826495 A JP 16826495A JP 16826495 A JP16826495 A JP 16826495A JP H08337296 A JPH08337296 A JP H08337296A
- Authority
- JP
- Japan
- Prior art keywords
- chemical liquid
- storage tank
- chemical
- pipe
- vacuum suction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は、半導体ウエハ、液晶
表示装置（ＬＣＤ）用或いはフォトマスク用のガラス基
板、光ディスク用の基板などの各種基板の表面に現像
液、フォトレジスト液、洗浄液等の薬液を供給するのに
使用される薬液供給装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing solution, a photoresist solution, a cleaning solution, etc. on the surface of various substrates such as semiconductor wafers, glass substrates for liquid crystal display devices (LCD) or photomasks, substrates for optical disks and the like. The present invention relates to a chemical liquid supply device used for supplying a chemical liquid.
【０００２】[0002]
【従来の技術】この種の薬液供給装置において、現像処
理部や塗布処理部などの処理部、例えばスピンデベロッ
パやスピンコータなどのスピンナーへ供給される現像液
やフォトレジスト液などの薬液中に気体が溶存している
と、それが薬液中で気泡となって、気泡が混入された薬
液が半導体ウエハ等の基板の表面に供給されることとな
る。そして、基板表面に供給された薬液中の気泡は、そ
のまま消えずに残り、現像むらや塗布むらなどの欠陥の
原因となる。また、スピンコータにおいてエッジリンス
処理するような場合にも、溶剤中に気泡が存在している
と、リンス液の吐出時に溶剤中の気泡が弾け飛び、その
気泡がデバイス面に付着し、これも欠陥の原因となる。2. Description of the Related Art In this type of chemical liquid supply apparatus, gas is contained in a chemical liquid such as a developer or a photoresist liquid which is supplied to a processing unit such as a development processing unit or a coating processing unit, for example, a spinner such as a spin developer or a spin coater. When dissolved, it becomes bubbles in the chemical liquid, and the chemical liquid containing the bubbles is supplied to the surface of the substrate such as a semiconductor wafer. Then, the air bubbles in the chemical solution supplied to the substrate surface remain as they are, and cause defects such as uneven development and uneven application. Also, when bubbles are present in the solvent even when edge rinse processing is performed in a spin coater, the bubbles in the solvent fly off when the rinse liquid is discharged, and the bubbles adhere to the device surface, which also causes defects. Cause of.
【０００３】ここで、薬液供給装置は、密閉された貯留
タンクを備えており、その貯留タンク内へ薬液供給源か
ら薬液を送給して、貯留タンク内に薬液を貯留する。そ
して、貯留タンク内へ窒素ガスなどの不活性ガスを送り
込むことにより、貯留タンク内部の薬液の液面を加圧
し、薬液中に挿入された送出管を通して貯留タンクから
薬液を送り出すようにしている。このような構成の薬液
供給装置において、薬液が空気と接触しまた気泡が発生
する機会が最も大きいのは貯留タンク内部である。そこ
で、貯留タンク内に脱気装置を設け、貯留タンク内部に
貯留されている薬液を脱気して、貯留タンクから送り出
される薬液中に気泡が混入しないようにする薬液供給装
置が、例えば特開平４−１９７４３４号公報等に開示さ
れている。Here, the chemical liquid supply device is provided with a sealed storage tank, and the chemical liquid is fed from the chemical liquid supply source into the storage tank to store the chemical liquid in the storage tank. Then, by feeding an inert gas such as nitrogen gas into the storage tank, the liquid surface of the chemical liquid inside the storage tank is pressurized, and the chemical liquid is sent out from the storage tank through a delivery pipe inserted in the chemical liquid. In the chemical liquid supply device having such a structure, it is inside the storage tank that the chemical liquid comes into contact with air and bubbles are most likely to occur. Therefore, a degassing device is provided in the storage tank to degas the drug solution stored in the storage tank so that bubbles are not mixed in the drug solution sent from the storage tank. It is disclosed in Japanese Patent Laid-Open No. 4-197434.
【０００４】同号公報に開示された薬液供給装置の主要
部の概略構成を図６に基づいて説明すると、密閉された
貯留タンク１に薬液導入管２及び薬液送出管３をそれぞ
れ挿入し、それぞれの先端が貯留タンク１の内底面近く
に配置されるようにして常に薬液４の液面下に位置する
ようにする。薬液導入管２は、エア開閉弁６が介挿され
た配管５を介して薬液供給源に流路接続され、薬液送出
管３は、エア開閉弁８０が介挿された配管７を介して図
示しない処理部、例えばスピンデベロッパやスピンコー
タに配設された吐出ノズルに流路接続されている。ま
た、貯留タンク１には、エア開閉弁９が介挿され窒素ガ
ス供給源に流路接続された窒素ガス供給配管８が薬液４
の液面上の空間に連通しており、また、エア開閉弁８１
が介挿され大気に流路接続された大気開放配管８２が、
薬液４の液面上の空間に連通しており、さらに、エア開
閉弁１１が介挿され図示しない真空排気装置に流路接続
された真空吸引配管１０が薬液４の液面上の空間に連通
している。A schematic structure of a main part of the chemical liquid supply device disclosed in the above publication will be described with reference to FIG. 6, in which a chemical liquid introduction pipe 2 and a chemical liquid delivery pipe 3 are inserted into a closed storage tank 1 respectively. The front end of the chemical solution 4 is arranged near the inner bottom surface of the storage tank 1 so that it is always positioned below the liquid surface of the chemical solution 4. The chemical liquid introduction pipe 2 is connected to the chemical liquid supply source through a pipe 5 in which an air on-off valve 6 is inserted, and the chemical liquid delivery pipe 3 is illustrated via a pipe 7 in which an air on-off valve 80 is inserted. A flow path is connected to a discharge nozzle provided in a processing unit such as a spin developer or a spin coater. Further, in the storage tank 1, an air opening / closing valve 9 is inserted and a nitrogen gas supply pipe 8 is connected to the nitrogen gas supply source in a flow path.
Of the air opening / closing valve 81.
Is connected to the atmosphere by an air opening pipe 82,
A vacuum suction pipe 10 communicating with the space above the liquid level of the chemical liquid 4 and further having an air opening / closing valve 11 interposed and a flow path connection to a vacuum exhaust device (not shown) communicates with the space above the liquid level of the chemical liquid 4. are doing.
【０００５】図６に示したような構成の薬液供給装置で
は、貯留タンク１内へ薬液を導入するときは、窒素ガス
供給配管８、真空吸引配管１０及び配管７に介挿された
各エア開閉弁９、１１、８０をそれぞれ閉成した状態
で、配管５及び大気開放配管８２に介挿された各エア開
閉弁６、８１をそれぞれ開き、薬液供給源から配管５及
び薬液導入管２を通して貯留タンク１内へ薬液を送給す
る。次に、貯留タンク１の内部に貯留された薬液４を脱
気するときは、配管５及び大気開放配管８２に介挿され
た各エア開閉弁６、８１を閉じるとともに、窒素ガス供
給配管８及び配管７に介挿されたエア開閉弁９、８０を
閉成した状態で、真空吸引管１０に介挿されたエア開閉
弁１１を開く。そして、真空排気装置により真空吸引配
管１０を通して貯留タンク１の内部を排気し、貯留タン
ク１の内部空間を減圧状態にする。これにより、貯留タ
ンク１内の薬液４中に混入していた気泡が液面を通して
放出され、また、薬液４中に溶存していた気体の一部も
薬液から抜け出す。このようにして脱気された薬液４を
貯留タンク１から送出して処理部へ供給するときは、真
空吸引配管１０に介挿されたエア開閉弁１１を閉じると
ともに、配管５及び大気開放配管８２に介挿された各エ
ア開閉弁６、８１を閉成した状態で、窒素ガス供給配管
８及び配管７に介挿された各エア開閉弁９、８０を開
く。そして、窒素ガス供給源から窒素ガス供給配管８を
通して貯留タンク１内へ窒素ガスを供給し、貯留タンク
１の内部に貯留された薬液４の液面を加圧する。これに
より、貯留タンク１内の薬液４が薬液送出管３を通って
貯留タンク１から送出され、配管７を通って処理部へ圧
送されることとなる。In the chemical liquid supply device having the structure as shown in FIG. 6, when introducing the chemical liquid into the storage tank 1, each air opening and closing of the nitrogen gas supply pipe 8, the vacuum suction pipe 10 and the pipe 7 is opened and closed. With the valves 9, 11, and 80 closed, open the air on-off valves 6 and 81 inserted in the pipe 5 and the atmosphere open pipe 82, respectively, and store from the chemical liquid supply source through the pipe 5 and the chemical liquid introduction pipe 2. The chemical solution is fed into the tank 1. Next, when degassing the chemical liquid 4 stored in the storage tank 1, the air on-off valves 6 and 81 inserted in the pipe 5 and the atmosphere open pipe 82 are closed, and the nitrogen gas supply pipe 8 and With the air on-off valves 9 and 80 inserted in the pipe 7 closed, the air on-off valve 11 inserted in the vacuum suction pipe 10 is opened. Then, the inside of the storage tank 1 is exhausted through the vacuum suction pipe 10 by the vacuum exhaust device, and the internal space of the storage tank 1 is depressurized. Thereby, the bubbles mixed in the chemical liquid 4 in the storage tank 1 are discharged through the liquid surface, and a part of the gas dissolved in the chemical liquid 4 also escapes from the chemical liquid. When the degassed chemical liquid 4 is sent from the storage tank 1 and supplied to the processing section, the air on-off valve 11 inserted in the vacuum suction pipe 10 is closed, and the pipe 5 and the atmosphere open pipe 82 are closed. The air on-off valves 9 and 80 inserted in the nitrogen gas supply pipe 8 and the pipe 7 are opened in a state in which the air on-off valves 6 and 81 inserted in the above are closed. Then, nitrogen gas is supplied from the nitrogen gas supply source to the inside of the storage tank 1 through the nitrogen gas supply pipe 8 to pressurize the liquid surface of the chemical liquid 4 stored inside the storage tank 1. As a result, the chemical liquid 4 in the storage tank 1 is delivered from the storage tank 1 through the chemical liquid delivery pipe 3 and is delivered under pressure through the pipe 7 to the processing section.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、図６に
示したような構成の薬液供給装置では、脱気時と薬液圧
送時とにおいて、窒素ガス供給配管８及び真空吸引配管
１０にそれぞれ介挿された両エア開閉弁９、１１を切換
え操作しなければならず、その流路切換えのための流体
回路や制御機構が必要となり、装置構成が複雑となると
ともに、機器全体の占める占有スペースも大きくなる。
また、薬液の脱気が連続的に行なわれるのではなく、脱
気と薬液圧送とが択一的に繰り返し行なわれることにな
るので、脱気効率がそれほど高くならない。さらに、貯
留タンク１の内部に貯留された薬液４の液面近くの部分
だけが脱気され易く、一方、圧力変化によって発泡が起
こり易い薬液導入管２の先端と、薬液が流入する薬液送
出管３の先端とは貯留タンク１の内底面近くに配置され
ているため、貯留タンク１内部に貯留されている薬液４
のうちの主として脱気され難く、気泡が一番多く存在し
うる部分が、薬液送出管３を通って貯留タンク１から送
出されることとなる。この結果、実際に処理部へ供給さ
れて基板の表面へ吐出される薬液についてみた実質的脱
気効率は、さらに低くなる、といった問題点がある。However, in the chemical liquid supply device having the structure as shown in FIG. 6, the nitrogen gas supply pipe 8 and the vacuum suction pipe 10 are respectively inserted at the time of degassing and at the time of chemical liquid pressure feeding. In addition, both air opening / closing valves 9 and 11 must be switched, and a fluid circuit and a control mechanism for switching the flow paths are required, which complicates the device configuration and increases the space occupied by the entire device. .
In addition, the degassing of the chemical liquid is not performed continuously, but the degassing and the pressure feeding of the chemical liquid are selectively repeated, so that the degassing efficiency is not so high. Further, only the portion near the liquid surface of the chemical liquid 4 stored in the storage tank 1 is easily degassed, while the tip of the chemical liquid introduction pipe 2 in which foaming easily occurs due to the pressure change and the chemical liquid delivery pipe into which the chemical liquid flows. Since the tip of 3 is arranged near the inner bottom surface of the storage tank 1, the chemical liquid 4 stored inside the storage tank 1
Of these, the part that is mainly hard to be degassed and has the largest number of bubbles is delivered from the storage tank 1 through the drug solution delivery pipe 3. As a result, there is a problem that the substantial degassing efficiency of the chemical liquid actually supplied to the processing unit and discharged onto the surface of the substrate is further lowered.
【０００７】この発明は、以上のような事情に鑑みてな
されたものであり、簡易な構成で、薬液の脱気効率が高
く、さらに処理部へ供給される薬液についての実質的な
脱気効率も高くなるような薬液供給装置を提供すること
を目的とする。The present invention has been made in view of the above circumstances, and has a simple structure and a high degassing efficiency of a chemical liquid, and a substantial degassing efficiency of the chemical liquid supplied to the processing section. It is an object of the present invention to provide a chemical liquid supply device that also increases the cost.
【０００８】[0008]
【課題を解決するための手段】請求項１に係る発明は、
密閉され、内部に薬液を貯留する貯留タンクと、薬液供
給源に流路接続されるとともに、先端が前記貯留タンク
内に臨んで薬液を貯留タンクに導入する薬液導入用配管
と、先端が、前記貯留タンクに貯留された薬液の液面よ
り常に下方の位置で貯留タンク内を臨むように配置さ
れ、薬液を前記貯留タンクから送出する薬液送出用配管
と、前記貯留タンクに貯留された薬液を圧送する薬液圧
送手段とからなる薬液供給装置において、前記貯留タン
クの内部の、貯留タンクに貯留された薬液の常に液面下
となる位置に、気体透過膜材によって形成された隔壁を
配設し、その隔壁によって貯留タンク内部を薬液貯留部
と真空吸引室とに区画するとともに、前記真空吸引室を
真空吸引手段に接続したことを特徴とする。The invention according to claim 1 is
A storage tank that is hermetically sealed and stores a chemical solution inside, and a flow path connection to a chemical solution supply source, and a tip for facing the inside of the storage tank to introduce a chemical solution into the storage tank, and a tip, A chemical liquid delivery pipe that is arranged so as to always face the inside of the storage tank at a position lower than the liquid level of the chemical liquid stored in the storage tank, and that pumps the chemical liquid stored in the storage tank. In the chemical liquid supply device comprising the chemical liquid pressure-feeding means, a partition wall formed of a gas permeable membrane material is provided inside the storage tank, at a position always below the liquid surface of the chemical liquid stored in the storage tank, The partition wall divides the inside of the storage tank into a chemical liquid storage portion and a vacuum suction chamber, and the vacuum suction chamber is connected to a vacuum suction means.
【０００９】請求項２に係る発明では、上記隔壁を平面
状に形成し、その平面状隔壁を上記貯留タンクの内底部
近くに配設した。In the invention according to claim 2, the partition wall is formed in a planar shape, and the planar partition wall is arranged near the inner bottom portion of the storage tank.
【００１０】請求項３に係る発明では、上記貯留タンク
の内部に、上端開口部が貯留タンクに貯留された薬液の
液面より常に下方に位置するように有底筒状体を配設
し、その有底筒状体の内部へ上記薬液送出用配管の先端
部分を挿入した。In the invention according to claim 3, a cylindrical body having a bottom is disposed inside the storage tank such that the upper end opening is always located below the liquid surface of the chemical liquid stored in the storage tank. The tip portion of the chemical solution delivery pipe was inserted into the bottomed tubular body.
【００１１】[0011]
【作用】上記構成の請求項１に係る発明の薬液供給装置
では、真空吸引手段によって貯留タンクの真空吸引室内
を真空排気すると、薬液貯留部に貯留された薬液中に混
入している気泡や薬液中に溶存している気体が、薬液貯
留部と真空吸引室とを仕切っている気体透過膜材からな
る隔壁を透過して真空吸引室内へ放出され、薬液貯留部
に貯留された薬液が脱気される。そして、気泡が混入し
たり気体が溶存したりしていない状態の薬液が、薬液送
出用配管を通って貯留タンクから送出され、処理部へ供
給される。In the chemical liquid supply device of the invention according to claim 1 having the above structure, when the vacuum suction chamber of the storage tank is evacuated by the vacuum suction means, air bubbles and chemical liquid mixed in the chemical liquid stored in the chemical liquid storage portion are evacuated. The gas dissolved therein passes through the partition made of a gas permeable membrane material that separates the chemical liquid storage part and the vacuum suction chamber and is released into the vacuum suction chamber, and the chemical liquid stored in the chemical liquid storage part is degassed. To be done. Then, the chemical liquid in which air bubbles are not mixed and gas is not dissolved is delivered from the storage tank through the chemical delivery pipe and supplied to the processing unit.
【００１２】この場合、気体透過膜材からなる隔壁は、
貯留タンク内部に貯留された薬液の液面より常に下方に
位置して、薬液貯留部側の全面が常に薬液と接触してい
るので、貯留タンク内部の、薬液の液面上の空間と真空
吸引室との間には常に薬液が介在することとなる。この
ため、貯留タンクに貯留された薬液を圧送しないときは
勿論、薬液圧送手段によって薬液を圧送している時で
も、真空吸引手段によって真空吸引室内を真空排気する
ことができ、薬液の脱気処理を連続して行なうことがで
きる。In this case, the partition wall made of the gas permeable membrane material is
It is always located below the liquid surface of the drug solution stored inside the storage tank, and the entire surface of the drug solution storage side is always in contact with the liquid solution. The chemical solution is always present between the chamber and the room. Therefore, not only when the chemical solution stored in the storage tank is not pressure-fed, but also when the chemical solution is pressure-fed by the chemical solution pressure-feeding means, it is possible to evacuate the vacuum suction chamber by the vacuum suction means, so that the chemical solution is degassed. Can be performed continuously.
【００１３】請求項２に係る発明の薬液供給装置では、
貯留タンクに貯留された薬液の、薬液貯留部の底面付近
の部分が脱気され易く、薬液送出用配管の先端が貯留タ
ンクの内底面近くに配置されるような場合には特に、こ
の薬液送出用配管を通り、最も良好な状態に脱気された
薬液が貯留タンクから送出される。In the chemical liquid supply device of the invention according to claim 2,
Particularly when the portion of the chemical solution stored in the storage tank near the bottom surface of the chemical solution storage portion is easily degassed and the tip of the chemical solution delivery pipe is located near the inner bottom surface of the storage tank, this chemical solution delivery The chemical solution that has been degassed to the best condition through the service pipe is delivered from the storage tank.
【００１４】貯留タンク内の薬液中において薬液導入用
配管の先端と薬液送出用配管の先端とが近接している
と、上記したようにして薬液の脱気が行なわれるとして
も、薬液導入用配管の先端から貯留タンク内部へ流出し
た薬液が直ぐに薬液送出用配管の先端へ流入して、十分
に脱気されていない状態の薬液が薬液送出用配管を通っ
て貯留タンクから送出される心配がある。また、薬液導
入用配管の先端付近において圧力変化のために最も発泡
が起こり易いが、薬液導入用配管の先端と薬液送出用配
管の先端とが近接していると、気泡が混入した薬液が薬
液送出用配管を通って貯留タンクから送出される心配も
ある。しかし、請求項３に係る発明の薬液供給装置で
は、薬液導入用配管の先端から流出した薬液は、有底筒
状体の上端開口部から有底筒状体内へ流入し、有底筒状
体内を下方へ向かって流動した後、薬液送出用配管の先
端へ流入することになるので、上記した心配が無い。When the tip of the chemical solution introduction pipe and the tip of the chemical solution delivery pipe are close to each other in the chemical solution in the storage tank, even if the chemical solution is degassed as described above, the chemical solution introduction tube There is a concern that the chemical liquid that has flowed out from the tip of the inside of the storage tank will immediately flow into the tip of the chemical liquid delivery pipe and the chemical liquid that has not been sufficiently degassed will be delivered from the storage tank through the chemical liquid delivery pipe. . Further, foaming is most likely to occur near the tip of the chemical introduction pipe due to the pressure change, but if the tip of the chemical introduction pipe and the tip of the chemical delivery pipe are close to each other, the chemical liquid containing air bubbles becomes There is also a concern that it will be delivered from the storage tank through the delivery pipe. However, in the chemical liquid supply device according to the third aspect of the present invention, the chemical liquid flowing out from the tip of the chemical liquid introduction pipe flows into the bottomed cylindrical body from the upper end opening of the bottomed cylindrical body, After flowing downward, it will flow into the tip of the chemical solution delivery pipe, so there is no concern as described above.
【００１５】[0015]
【実施例】以下、この発明の好適な実施例について図１
ないし図５を参照しながら説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described below with reference to FIG.
It will be described with reference to FIGS.
【００１６】図１は、この発明の１実施例を示し、薬液
供給装置の主要部の概略構成を示す模式図である。この
薬液供給装置は、密閉された貯留タンク１２を備え、貯
留タンク１２の内部が、その内底部近くに水平に配設さ
れた平面状の隔壁１４によって薬液貯留部１６と真空吸
引室１８とに区画されている。隔壁１４は、気体だけを
通して薬液を通さない気体透過膜材（例えばゴアテック
ス（ジャパンゴアテックス（株）の登録商標））によっ
て膜状に形成されている。現像液、フォトレジスト液、
洗浄液等の薬液２０は、貯留タンク１２の薬液貯留部１
６に貯留され、隔壁１４を通過して真空吸引室１８側へ
流入しないようになっている。そして、薬液貯留部１６
に薬液導入管２２及び薬液送出管２４がそれぞれ挿入さ
れ、それぞれの先端が薬液貯留部１６の底面近くに配置
されている。また、薬液導入管２２は、エア開閉弁２８
が介挿された配管２６を介して薬液供給源に流路接続さ
れ、薬液送出管２４は、エア開閉弁８５が介挿された配
管３０を介して図示しないスピンデベロッパ、スピンコ
ータ等の処理部の吐出ノズルに流路接続されている。FIG. 1 shows one embodiment of the present invention and is a schematic view showing a schematic structure of a main part of a chemical liquid supply apparatus. This chemical solution supply device includes a sealed storage tank 12, and the inside of the storage tank 12 is divided into a chemical solution storage section 16 and a vacuum suction chamber 18 by a flat partition wall 14 horizontally arranged near the inner bottom portion thereof. It is partitioned. The partition wall 14 is formed in a film shape by a gas permeable membrane material (for example, Gore-Tex (registered trademark of Japan Gore-Tex Co., Ltd.)) that allows only gas to pass and does not pass drug solution. Developer, photoresist solution,
The chemical liquid 20 such as the cleaning liquid is stored in the chemical liquid reservoir 1 of the storage tank 12.
It is stored in No. 6 and does not flow into the vacuum suction chamber 18 side through the partition wall 14. Then, the drug solution storage unit 16
The chemical liquid introduction pipe 22 and the chemical liquid delivery pipe 24 are inserted into the respective pipes, and their respective tips are arranged near the bottom surface of the chemical liquid reservoir 16. Further, the chemical liquid introducing pipe 22 is provided with an air opening / closing valve 28.
Is connected to a chemical liquid supply source via a pipe 26 in which the air is inserted, and the chemical liquid delivery pipe 24 is connected to a processing unit such as a spin developer or a spin coater (not shown) via a pipe 30 in which an air opening / closing valve 85 is inserted. A flow path is connected to the discharge nozzle.
【００１７】本実施例における薬液導入管２２及び配管
２６からなる構成が、特許請求の範囲に記載の「薬液導
入用配管」に相当し、薬液送出管２４及び配管３０から
なる構成が特許請求の範囲に記載の「薬液送出用配管」
に相当する。The constitution of the chemical liquid introducing pipe 22 and the pipe 26 in this embodiment corresponds to the "chemical liquid introducing pipe" in the claims, and the constitution of the chemical liquid delivering pipe 24 and the pipe 30 is claimed. "Pipes for chemical delivery" in the range
Equivalent to.
【００１８】また、貯留タンク１２の薬液貯留部１６に
は、エア開閉弁３４が介挿され窒素ガス供給源に流路接
続された窒素ガス供給配管３２が薬液２０の液面上の空
間に連通しており、またエア開閉弁８６が介挿され大気
に流路接続された大気開放配管８７が薬液２０の液面上
の空間に連通している。一方、真空吸引室１８には、図
示しない真空排気装置に流路接続された真空吸引配管３
６が連通しており、真空吸引配管３６の途中にドレン管
３８が分岐接続されている。A nitrogen gas supply pipe 32, in which an air opening / closing valve 34 is inserted and a flow path is connected to a nitrogen gas supply source, is connected to the space above the liquid surface of the chemical liquid 20 in the chemical liquid storage portion 16 of the storage tank 12. Further, the air opening / closing valve 86 is inserted and the atmosphere opening pipe 87, which is connected to the atmosphere by a flow path, communicates with the space above the liquid surface of the chemical liquid 20. On the other hand, in the vacuum suction chamber 18, a vacuum suction pipe 3 is connected to the vacuum exhaust device (not shown) through a flow path.
6 communicates with each other, and a drain pipe 38 is branched and connected in the middle of the vacuum suction pipe 36.
【００１９】貯留タンク１２は、各構成部品に分離した
状態の斜視図を図２に示すように、薬液導入管用、薬液
送出管用、窒素ガス供給配管用及び大気開放配管用の各
挿通孔４２、４４、４６、９０が形設された密閉蓋４
０、円筒状のタンク本体４８、隔壁１４となる気体透過
膜５２が溶着されたリング５０、有底円筒状をなし管５
６が連通接続された底部容器５４、及び複数のパッキン
５８から構成されており、パッキン５８を介挿してタン
ク本体４８の上部フランジと密閉蓋４０とを密着させて
ボルト止めするとともに、それぞれパッキン５８を介挿
してタンク本体４８の下部フランジとリング５０と底部
容器５４のフランジとを互いに密着させてボルト止めす
ることにより、組み立てられる。尚、気体透過膜５２の
厚みを大きくすると、気体透過膜５２は、有る程度の圧
力に耐え得るが、厚みを大きくすると、気体透過膜５２
の気体透過性能が低下することになるので、気体透過膜
５２を薄くして、図３に縦断面図を示すように、多数の
孔６２が形成された補強板６０を底部容器５４の内部に
配設し、その補強板６０の上面によって気体透過膜５２
の部分を支持するような構成としてもよい。As shown in FIG. 2 which is a perspective view of the storage tank 12 in a state in which it is separated into each component, each insertion hole 42 for a chemical introduction pipe, a chemical delivery pipe, a nitrogen gas supply pipe and an atmosphere open pipe, Sealing lid 4 in which 44, 46 and 90 are formed
0, a cylindrical tank body 48, a ring 50 to which a gas permeable film 52 to be the partition wall 14 is welded, a bottomed cylindrical tube 5,
6 is composed of a bottom container 54 connected in communication with each other and a plurality of packings 58. The packing 58 is inserted to bring the upper flange of the tank main body 48 and the sealing lid 40 into close contact with each other and bolt them together. The lower flange of the tank body 48, the ring 50, and the flange of the bottom container 54 are closely attached to each other and bolted together for assembly. It should be noted that if the thickness of the gas permeable film 52 is increased, the gas permeable film 52 can withstand a certain pressure, but if the thickness is increased, the gas permeable film 52 is increased.
Therefore, the gas permeable membrane 52 is thinned, and the reinforcing plate 60 having a large number of holes 62 is provided inside the bottom container 54 as shown in the vertical sectional view of FIG. The gas permeable membrane 52 is provided by the upper surface of the reinforcing plate 60.
It may be configured to support the portion of.
【００２０】図１に示した薬液供給装置では、真空排気
装置により、貯留タンク１２の真空吸引室１８内を連続
して真空排気するようにする。これにより、薬液貯留部
１６に貯留された薬液２０中に混入している気泡や溶存
している気体が、薬液貯留部１６と真空吸引室１８とを
仕切っている気体透過膜材からなる隔壁１４を透過して
真空吸引室１８内へ放出され、薬液２０の脱気が常時行
なわれる。このとき、貯留タンク１２に貯留された薬液
２０は、薬液貯留部１６の底面付近の部分が脱気され易
く、特に、薬液導入管２２及び薬液送出管２４の各先端
が薬液貯留部の底面近くに配置されている関係で、薬液
の流動が激しくなる。薬液貯留部１６の底面付近におい
てより効率良く脱気が行なわれる。そして、貯留タンク
１２内へ薬液を導入するときは、窒素ガス供給配管３２
及び配管３０に介挿された各エア開閉弁３４、８５を閉
成した状態で、配管２６及び大気開放配管８７に介挿さ
れた各エア開閉弁２８、８６を開き、薬液供給源から配
管２６及び薬液導入管２２を通して貯留タンク１２内へ
薬液を送給する。また、薬液２０を貯留タンク１２から
処理部へ供給するときは、配管２６及び大気開放配管８
７に介挿された各エア開閉弁２８、８６を閉じるととも
に、窒素ガス供給配管３２及び配管３０に介挿された各
エア開閉弁３４、８５を開く。そして、窒素ガス供給源
から窒素ガス供給配管３２を通して貯留タンク１２内へ
窒素ガスを供給し、貯留タンク１２の内部に貯留された
薬液２０の液面を加圧する。これにより、脱気された薬
液が、薬液送出管２４を通って貯留タンク１２から送出
され、配管３０を通って処理部へ圧送される。In the chemical liquid supply apparatus shown in FIG. 1, the inside of the vacuum suction chamber 18 of the storage tank 12 is continuously evacuated by the vacuum exhaust apparatus. As a result, the bubbles 14 and the dissolved gas mixed in the chemical liquid 20 stored in the chemical liquid storage portion 16 partition the chemical liquid storage portion 16 and the vacuum suction chamber 18 from each other. And is discharged into the vacuum suction chamber 18, and the chemical solution 20 is constantly degassed. At this time, the chemical solution 20 stored in the storage tank 12 is easily degassed in the vicinity of the bottom surface of the chemical solution storage section 16, and in particular, the respective tip ends of the chemical solution introduction tube 22 and the chemical solution delivery tube 24 are near the bottom surface of the chemical solution storage section. Due to the fact that it is placed in, the flow of the drug solution becomes violent. Degassing is performed more efficiently near the bottom surface of the chemical liquid storage section 16. Then, when introducing the chemical liquid into the storage tank 12, the nitrogen gas supply pipe 32
And the air opening / closing valves 34, 85 inserted in the pipe 30 are closed, the air opening / closing valves 28, 86 inserted in the pipe 26 and the atmosphere opening pipe 87 are opened to open the pipe 26 from the chemical supply source. And, the chemical liquid is fed into the storage tank 12 through the chemical liquid introduction pipe 22. Further, when the chemical liquid 20 is supplied from the storage tank 12 to the processing section, the pipe 26 and the atmosphere open pipe 8
The air opening / closing valves 28, 86 inserted in the valve 7 are closed, and the air opening / closing valves 34, 85 inserted in the nitrogen gas supply pipe 32 and the pipe 30 are opened. Then, nitrogen gas is supplied from the nitrogen gas supply source to the inside of the storage tank 12 through the nitrogen gas supply pipe 32, and the liquid surface of the chemical liquid 20 stored inside the storage tank 12 is pressurized. As a result, the degassed drug solution is delivered from the storage tank 12 through the drug solution delivery pipe 24, and is delivered under pressure through the pipe 30 to the processing unit.
【００２１】次に、貯留タンク１２内の薬液２０中にお
いて薬液導入管２２の先端と薬液送出管２４の先端とが
近接していると、薬液導入管２２の先端から薬液貯留部
１６へ流出した薬液が、十分に脱気されないまま直ぐに
薬液送出管２４の先端へ流入する、といった心配があ
る。また、薬液中の発泡は、薬液導入管２２の先端付近
において圧力変化のために最も起こり易いが、薬液導入
管２２の先端と薬液送出管２４の先端とが近接している
と、脱気されないまま気泡が混入した状態の薬液が薬液
送出管２４を通って貯留タンク１２から送出される心配
もある。このような心配があるときは、図４に示すよう
に、貯留タンク１２の薬液貯留部１６の内部に有底筒状
体６４を配設し、その有底筒状体６４の上端開口部が常
に薬液２０の液面下に位置するように配置する。そし
て、有底筒状体６４の内部へ薬液送出管２４の先端部分
を挿入した構成とすればよい。このような構成の装置で
は、薬液導入管２２の先端から流出した薬液は、有底筒
状体６４の上端開口部から有底筒状体内６４へ流入し、
有底筒状体６４内を下方へ向かって流動した後、薬液送
出管２４の先端へ流入することになり、薬液導入管２２
の先端から薬液送出管２４の先端までの経路が湾曲され
て長くなるため、泡が直接薬液送出管２４に入り込むこ
とがなく、十分に脱気され気泡の混入が無い状態の薬液
が、薬液送出管２４を通って貯留タンク１２から送出さ
れることとなる。Next, when the tip of the drug solution introducing pipe 22 and the tip of the drug solution delivering pipe 24 in the drug solution 20 in the storage tank 12 are close to each other, the solution flows out from the tip of the drug solution introducing pipe 22 to the drug solution reservoir 16. There is a concern that the drug solution may flow into the tip of the drug solution delivery pipe 24 immediately without being sufficiently deaerated. Further, the foaming in the chemical liquid is most likely to occur near the tip of the chemical liquid introducing pipe 22 due to the pressure change, but if the tip of the chemical liquid introducing pipe 22 and the tip of the chemical liquid delivering pipe 24 are close to each other, it is not deaerated. There is a concern that the chemical liquid in which air bubbles are still mixed is discharged from the storage tank 12 through the chemical liquid discharge pipe 24. When there is such a concern, as shown in FIG. 4, the bottomed tubular body 64 is disposed inside the chemical liquid reservoir 16 of the storage tank 12, and the upper end opening of the bottomed tubular body 64 is It is arranged so as to always be located below the liquid surface of the chemical liquid 20. Then, the tip portion of the drug solution delivery pipe 24 may be inserted into the bottomed tubular body 64. In the apparatus having such a configuration, the chemical liquid flowing out from the tip of the chemical liquid introducing pipe 22 flows into the bottomed cylindrical body 64 from the upper end opening of the bottomed cylindrical body 64,
After flowing downward in the bottomed tubular body 64, it flows into the tip of the chemical liquid delivery pipe 24, and the chemical liquid introduction pipe 22
Since the path from the tip of the to the tip of the drug delivery pipe 24 is curved and lengthened, bubbles do not directly enter the drug delivery pipe 24, and the drug solution is sufficiently degassed and bubbles are not mixed in It will be delivered from the storage tank 12 through the pipe 24.
【００２２】尚、気体透過膜材によって形成された隔壁
により貯留タンクの内部を薬液貯留部と真空吸引室とに
区画する形態は、図１及び図４に示したように平面状の
隔壁１４を貯留タンク１２の内底部近くに水平に配設す
る、といったものに限らず、隔壁が、貯留タンクに貯留
された薬液の常に液面下となる位置に配置されておれ
ば、どのような形態であってもよい。例えば、図５に示
すように、気体透過膜材からなる隔壁６８を、上面が閉
塞した円筒状に形成し、この円筒状隔壁６８によって貯
留タンク６６の内部を薬液貯留部７０と真空吸引室７２
とに区画し、真空吸引室７２に、図示しない真空排気装
置に流路接続され途中にドレン管７６が分岐接続された
真空吸引配管７４を連通接続するような構成であっても
よい。Incidentally, in the form in which the inside of the storage tank is divided into the chemical solution storage portion and the vacuum suction chamber by the partition wall formed of the gas permeable film material, the planar partition wall 14 as shown in FIGS. 1 and 4 is used. It is not limited to horizontally disposing near the inner bottom of the storage tank 12, but in any form as long as the partition wall is disposed at a position always below the liquid surface of the chemical solution stored in the storage tank. It may be. For example, as shown in FIG. 5, a partition wall 68 made of a gas permeable membrane material is formed in a cylindrical shape with an upper surface closed, and the inside of the storage tank 66 is formed inside the storage tank 66 by the cylindrical partition wall 68 and the vacuum suction chamber 72.
Alternatively, the vacuum suction chamber 72 may be connected to the vacuum suction chamber 72 through which a vacuum suction pipe 74 is connected to a vacuum exhaust device (not shown) and a drain pipe 76 is branched.
【００２３】また、上記実施例では、貯留タンク１２内
へ窒素ガスを供給し、貯留タンク１２の内部に貯留され
た薬液２０の液面を加圧して薬液２０を圧送する構成と
したが、その代わりに配管３０に圧送ポンプを介在さ
せ、圧送ポンプにより薬液２０を圧送するようにしても
よい。In the above embodiment, the nitrogen gas is supplied into the storage tank 12 to pressurize the liquid surface of the chemical liquid 20 stored in the storage tank 12 to pump the chemical liquid 20. Alternatively, a pressure pump may be interposed in the pipe 30, and the chemical liquid 20 may be pressure-fed by the pressure pump.
【００２４】また、上記実施例では、薬液貯留部１６に
薬液導入管２２及び薬液送出管２４をそれぞれ挿入し
て、薬液の導入又は薬液の送出を行なうように構成した
が、これに限らず、例えば薬液の液面より下の位置の貯
留タンクの側壁側から薬液導入用配管の先端或いは薬液
送出用配管の先端が、貯留タンク内に臨むように配置す
るように構成することもできる。この際、薬液導入用配
管、薬液送出用配管の先端が薬液貯留部の底面付近に配
置するようにすれば、薬液送出用配管を通って貯留タン
クから処理部へ供給される薬液についての実質的な脱気
効果が、より一層高くなる。In the above embodiment, the chemical liquid introducing pipe 22 and the chemical liquid delivering pipe 24 are respectively inserted into the chemical liquid storing portion 16 to introduce the chemical liquid or deliver the chemical liquid. However, the present invention is not limited to this. For example, the tip of the chemical liquid introduction pipe or the tip of the chemical liquid delivery pipe may be arranged so as to face the inside of the storage tank from the side wall side of the storage tank below the liquid surface of the chemical liquid. At this time, if the tip of the chemical introduction pipe and the tip of the chemical delivery pipe are arranged in the vicinity of the bottom surface of the chemical storage part, the chemical liquid supplied from the storage tank to the processing part through the chemical delivery pipe is substantially The deaeration effect is even higher.
【００２５】[0025]
【発明の効果】請求項１に係る発明の薬液供給装置で
は、貯留タンクに貯留された薬液の脱気処理を連続して
常時行なうことができるため、薬液の脱気効率が高くな
る。また、この薬液供給装置は、脱気時と薬液圧送時と
において流路の切換え操作を必要としないため、装置構
成が簡易であり、機器全体の占める占有スペースも比較
的小さくて済むこととなる。In the chemical liquid supply device according to the first aspect of the present invention, since the chemical liquid stored in the storage tank can be continuously degassed continuously, the chemical liquid can be efficiently degassed. Further, since this chemical liquid supply device does not require the switching operation of the flow path at the time of degassing and at the time of chemical liquid pressure feeding, the device configuration is simple and the space occupied by the entire device can be relatively small. .
【００２６】請求項２に係る発明の薬液供給装置では、
貯留タンクの薬液貯留部の底面において脱気が行なわれ
ることにより、薬液貯留部の底面付近の薬液が脱気され
易くなり、薬液送出用配管を通って貯留タンクから処理
部へ供給される薬液についての実質的な脱気効率が、よ
り一層高くなる。In the chemical liquid supply device of the invention according to claim 2,
Degassing is performed on the bottom surface of the chemical solution storage section of the storage tank, so that the chemical solution near the bottom surface of the chemical solution storage section is easily degassed, and the chemical solution supplied from the storage tank to the processing section through the chemical solution delivery pipe The substantial degassing efficiency of is even higher.
【００２７】請求項３に係る発明の薬液供給装置では、
貯留タンク内の薬液中において薬液導入用配管の先端と
薬液送出用配管の先端とが例え近接していても、薬液導
入用配管の先端から薬液送出用配管の先端までの薬液の
流動経路が長くなるため、気泡が直接薬液送出用配管に
入り込むことがなく、十分に脱気され気泡の混入が無い
状態の薬液が、薬液送出用配管を通って貯留タンクから
処理部へ供給されることとなる。In the chemical liquid supply device of the invention according to claim 3,
Even if the tip of the chemical liquid introduction pipe and the tip of the chemical liquid delivery pipe are close to each other in the chemical liquid in the storage tank, the flow path of the chemical liquid from the tip of the chemical liquid introduction pipe to the tip of the chemical liquid delivery pipe is long. Therefore, the air bubbles do not directly enter the liquid medicine delivery pipe, and the liquid medicine that is sufficiently degassed and free of air bubbles is supplied from the storage tank to the processing unit through the liquid medicine delivery pipe. .
【図１】請求項２に係る発明の１実施例を示し、薬液供
給装置の主要部の概略構成を示す模式図である。FIG. 1 is a schematic view showing an embodiment of the invention according to claim 2 and showing a schematic configuration of a main part of a chemical liquid supply device.
【図２】図１に示した薬液供給装置の貯留タンクを各構
成部品に分離した状態で示す斜視図である。FIG. 2 is a perspective view showing a storage tank of the chemical liquid supply device shown in FIG. 1 in a state in which each component is separated.
【図３】図１に示した薬液供給装置の貯留タンクの底部
のみを各構成部品に分離した状態で示す縦断面図であ
る。3 is a vertical cross-sectional view showing only a bottom portion of a storage tank of the chemical liquid supply device shown in FIG.
【図４】請求項３に係る発明の１実施例を示し、薬液供
給装置の主要部の概略構成を示す模式図である。FIG. 4 is a schematic view showing an embodiment of the invention according to claim 3 and showing a schematic configuration of a main part of the chemical liquid supply device.
【図５】請求項１に係る発明の実施例を示し、薬液供給
装置の主要部の概略構成を示す模式図である。FIG. 5 is a schematic view showing an embodiment of the invention according to claim 1 and showing a schematic configuration of a main part of a chemical liquid supply device.
【図６】従来の薬液供給装置の主要部の概略構成を示す
模式図である。FIG. 6 is a schematic diagram showing a schematic configuration of a main part of a conventional chemical liquid supply device.
１２、６６ 貯留タンク １４、６８ 気体透過膜材によって形成された隔壁 １６、７０ 薬液貯留部 １８、７２ 真空吸引室 ２０ 薬液 ２２ 薬液導入管 ２４ 薬液送出管 ３２ 窒素ガス供給配管 ３６、７４ 真空吸引配管 ６４ 有底筒状体 12, 66 Storage tank 14, 68 Partition wall formed by gas permeable membrane material 16, 70 Chemical liquid storage portion 18, 72 Vacuum suction chamber 20 Chemical liquid 22 Chemical liquid introduction pipe 24 Chemical liquid delivery pipe 32 Nitrogen gas supply pipe 36, 74 Vacuum suction pipe 64 Bottomed tubular body
Claims (3)
ンクと、 薬液供給源に流路接続されるとともに、先端が前記貯留
タンク内に臨んで薬液を貯留タンクに導入する薬液導入
用配管と、 先端が、前記貯留タンクに貯留された薬液の液面より常
に下方の位置で貯留タンク内を臨むように配置され、薬
液を前記貯留タンクから送出する薬液送出用配管と、 前記貯留タンクに貯留された薬液を圧送する薬液圧送手
段とからなる薬液供給装置において、 前記貯留タンクの内部の、貯留タンクに貯留された薬液
の常に液面下となる位置に、気体透過膜材によって形成
された隔壁を配設し、その隔壁によって貯留タンク内部
を薬液貯留部と真空吸引室とに区画するとともに、 前記真空吸引室を真空吸引手段に接続したことを特徴と
する薬液供給装置。1. A storage tank which is hermetically sealed and stores a chemical liquid therein, and a chemical liquid introducing pipe which is connected to a chemical liquid supply source in a flow path and which introduces the chemical liquid into the storage tank with its tip facing the storage tank. , The tip is arranged so as to face the inside of the storage tank at a position which is always below the liquid surface of the chemical solution stored in the storage tank, and the chemical solution delivery pipe for delivering the chemical solution from the storage tank; In the chemical liquid supply device comprising a chemical liquid pressure-feeding means for pressure-transmitting the chemical liquid, the partition formed by the gas permeable membrane material in the storage tank, at a position always below the liquid surface of the chemical liquid stored in the storage tank. And a partition for partitioning the inside of the storage tank into a chemical solution storage part and a vacuum suction chamber, and the vacuum suction chamber is connected to a vacuum suction means.
貯留タンクの内底部近くに配設された請求項１記載の薬
液供給装置。2. The chemical liquid supply apparatus according to claim 1, wherein the partition wall has a planar shape, and the planar partition wall is arranged near the inner bottom portion of the storage tank.
タンクに貯留された薬液の液面より常に下方に位置する
ように有底筒状体を配設し、その有底筒状体の内部へ薬
液送出用配管の先端部分を挿入した請求項１又は請求項
２記載の薬液供給装置。3. A bottomed cylindrical body is disposed inside the storage tank such that the upper end opening is always located below the liquid surface of the chemical liquid stored in the storage tank. The chemical liquid supply device according to claim 1 or 2, wherein a tip portion of a chemical liquid delivery pipe is inserted into the inside.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16826495A JPH08337296A (en) | 1995-06-09 | 1995-06-09 | Chemical-feeding device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16826495A JPH08337296A (en) | 1995-06-09 | 1995-06-09 | Chemical-feeding device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08337296A true JPH08337296A (en) | 1996-12-24 |
Family
ID=15864795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16826495A Pending JPH08337296A (en) | 1995-06-09 | 1995-06-09 | Chemical-feeding device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08337296A (en) |
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| JP2001032081A (en) * | 1999-07-19 | 2001-02-06 | Electroplating Eng Of Japan Co | Additive feeding device |
| JP2008091378A (en) * | 2006-09-29 | 2008-04-17 | Token Kin | Apparatus and method of substrate processing as well as apparatus and method of supplying power to the substrate processing apparatus |
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-
1995
- 1995-06-09 JP JP16826495A patent/JPH08337296A/en active Pending
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| JP2001032081A (en) * | 1999-07-19 | 2001-02-06 | Electroplating Eng Of Japan Co | Additive feeding device |
| JP2008091378A (en) * | 2006-09-29 | 2008-04-17 | Token Kin | Apparatus and method of substrate processing as well as apparatus and method of supplying power to the substrate processing apparatus |
| JP2010173660A (en) * | 2009-01-27 | 2010-08-12 | Air Liquide Japan Ltd | Device for supplying liquid material in filling vessel and method for controlling liquid level in filling vessel in the device of supplying liquid material |
| JP2011025104A (en) * | 2009-07-21 | 2011-02-10 | Air Liquide Japan Ltd | Liquid-material container, apparatus for supplying liquid material, and method of supplying liquid material |
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| CN102861521A (en) * | 2011-07-07 | 2013-01-09 | 芝浦机械电子株式会社 | Gas-liquid mixed fluid generation apparatus, gas-liquid mixed fluid generation method, processing apparatus and processing method |
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| CN103939739A (en) * | 2014-04-18 | 2014-07-23 | 无锡尚德太阳能电力有限公司 | Concentrated strong acid feeding system |
| CN105314576A (en) * | 2014-07-29 | 2016-02-10 | 盛美半导体设备（上海）有限公司 | Solvent supply system |
| CN104383853A (en) * | 2014-09-23 | 2015-03-04 | 云南华香源香料有限公司 | Continuous liquid feeding system |
| KR20190053816A (en) | 2016-09-20 | 2019-05-20 | 쿠리타 고교 가부시키가이샤 | Diluent liquid manufacturing apparatus and diluting liquid manufacturing method |
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