JPH08329454A - Production of glass substrate for magnetic disk - Google Patents
Production of glass substrate for magnetic diskInfo
- Publication number
- JPH08329454A JPH08329454A JP7276296A JP7276296A JPH08329454A JP H08329454 A JPH08329454 A JP H08329454A JP 7276296 A JP7276296 A JP 7276296A JP 7276296 A JP7276296 A JP 7276296A JP H08329454 A JPH08329454 A JP H08329454A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- magnetic disk
- etching
- lapping
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Surface Treatment Of Glass (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、表面の傷の発生率
を低減させる磁気ディスク用ガラス基板の製法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a glass substrate for a magnetic disk which reduces the occurrence rate of scratches on the surface.
【０００２】[0002]
【従来の技術】従来の磁気ディスク用ガラス基板の製法
では、ガラス基板を同心円状に円形加工した後、すなわ
ちドーナツ状に円形加工した後、金属定盤に遊離砥粒を
用いて研磨するラッピング処理（lapping process ）が
行われ、続いて合成樹脂製の研磨パッドと粒径がさらに
細かい遊離砥粒とを用いてラッピング処理された面をさ
らに研磨処理（polishing process ）する方法が行われ
ていた。2. Description of the Related Art In a conventional method of manufacturing a glass substrate for a magnetic disk, a glass substrate is concentrically circularly processed, that is, a donut is circularly processed, and then lapping is performed by using free abrasive grains on a metal surface plate. (Lapping process), followed by a method of further polishing the lapping-processed surface using a polishing pad made of synthetic resin and loose abrasive grains having a finer grain size.
【０００３】ラッピング処理工程と研磨処理工程との間
では、通常洗浄が行われるのみで、ディスク用ガラス基
板の表面の異物除去を目的としたエッチング処理は行わ
れていなかった。その結果、ラッピング処理工程の次の
研磨処理工程に、ラッピング処理工程による粒径がより
大きい砥粒やラッピング処理用金属定盤から生ずる金属
粒子を持ち込むことになり、これらがディスク用ガラス
基板表面の傷の発生および研磨パッドの損傷の原因とな
っていた。Between the lapping process and the polishing process, only the normal cleaning is performed, and the etching process for removing foreign matters on the surface of the disk glass substrate is not performed. As a result, in the polishing processing step subsequent to the lapping processing step, the abrasive particles having a larger particle diameter due to the lapping processing step and the metal particles generated from the lapping processing metal surface plate are brought in, and these are the surface of the glass substrate for the disk. This caused scratches and damage to the polishing pad.
【０００４】エッチング処理を行う方法としては、例え
ば、特開平７−２３０６２１が知られている。この方法
は、ディスク用ガラス基板の内周部に存在する傷の深さ
を低減させることにより、ディスク用ガラス基板の機械
的強度を高めることを主たる目的とし、そのために、ガ
ラス基板表面のエッチングを深さ３μｍより深く行うこ
とが条件づけられている。As a method of performing the etching process, for example, Japanese Patent Laid-Open No. 7-230621 is known. This method has the main purpose of increasing the mechanical strength of the glass substrate for a disc by reducing the depth of scratches existing on the inner peripheral portion of the glass substrate for a disc, and for that purpose, the etching of the surface of the glass substrate is performed. It is conditioned that the depth should be deeper than 3 μm.
【０００５】さらに別の例としては、磁気ヘッドとの摩
擦・摺動特性を改善するためのテクスチャー（磁気ディ
スク表面の微小凹凸）形成手段としてエッチング処理を
行う場合がある。As still another example, there is a case where an etching process is performed as a means for forming a texture (fine irregularities on the surface of a magnetic disk) for improving friction and sliding characteristics with respect to a magnetic head.
【０００６】しかし、この方法では、エッチング処理後
に研磨処理を行わないため、ディスク用ガラス基板表面
上で、ダスト等の付着物によりマスクされた部分で周囲
のテクスチャー高さを上回る異常突起が形成される。こ
のようなガラス基板を用いて製造された磁気ディスクを
３０００ｒｐｍ以上の高速で回転させ、このディスク表
面上を例えば高さ３５０Åで磁気ヘッドを飛行させた場
合、磁気ヘッドのヘッド・クラッシュおよび磁気ディス
クの表面の局所破壊を起こす問題があった。However, in this method, since the polishing process is not performed after the etching process, an abnormal protrusion exceeding the surrounding texture height is formed on the surface of the disk glass substrate at the portion masked by the deposits such as dust. It When a magnetic disk manufactured by using such a glass substrate is rotated at a high speed of 3000 rpm or more and the magnetic head is flown on the surface of the disk at a height of 350 Å, for example, a head crash of the magnetic head and a magnetic disk There was a problem of causing local destruction of the surface.
【０００７】したがって、この場合にはエッチング深さ
を例えば３５０Å以下に抑える必要があるが、このよう
な僅かな深さのエッチング量では砥粒等の除去が充分に
行われないだけでなく、通常の液相エッチングでは、エ
ッチング深さの管理が不可能に近かった。Therefore, in this case, it is necessary to suppress the etching depth to, for example, 350 Å or less, but not only the removal of the abrasive grains is not sufficiently performed with such a small etching amount, but usually, It was almost impossible to control the etching depth in the liquid phase etching.
【０００８】[0008]
【発明が解決しようとする課題】本発明は、従来方法で
問題となっていた、ラッピング処理工程で磁気ディスク
用ガラス基板表面に付着した砥粒およびラッピング処理
用金属定盤から生ずる金属粒子を次工程の研磨工程に持
ち込むことを防ぎ、研磨工程での傷の発生率を低減させ
ることを目的とする。SUMMARY OF THE INVENTION According to the present invention, the abrasive particles adhered to the surface of the glass substrate for a magnetic disk in the lapping process and the metal particles generated from the metal surface plate for the lapping process, which have been problems in the conventional method, are described below. It is an object of the present invention to prevent the scratches from being brought into the polishing process and reduce the occurrence rate of scratches in the polishing process.
【０００９】[0009]
【課題を解決するための手段】本発明は、磁気ディスク
用ガラス基板の主表面をラッピング処理した後、そのガ
ラス基板の表面に深さ０．１〜３μｍのエッチング処理
を施し、その後エッチング処理が施されたガラス基板の
主表面を研磨処理することを特徴とする磁気ディスク用
ガラス基板の製法を提供する。According to the present invention, after lapping the main surface of a glass substrate for a magnetic disk, the surface of the glass substrate is subjected to an etching treatment with a depth of 0.1 to 3 μm, and then the etching treatment is performed. Provided is a method for manufacturing a glass substrate for a magnetic disk, which comprises polishing the main surface of the glass substrate.
【００１０】本発明は、ラッピング処理工程後と研磨工
程前との間で、エッチング溶液によりエッチング処理を
行うことで、ラッピング処理工程でディスク用ガラス基
板の主表面および内外周端面の部分に付着した砥粒およ
び金属定盤から生じた微粒子を完全に除去できることを
見出したことによる。According to the present invention, etching treatment is performed with an etching solution between the lapping treatment step and the polishing step, so that the lapping treatment step adheres to the main surface and the inner and outer peripheral end surfaces of the glass substrate. This is because it was found that the fine particles generated from the abrasive grains and the metal surface plate can be completely removed.
【００１１】この場合、エッチングを深さ３μｍより深
く行えば、同時に機械的強度も大幅に改善できるが、主
目的をディスク用ガラス基板表面の異物除去とした場合
には、エッチング処理の深さは０．１〜３μｍ程度で充
分な効果を有する。さらに、本発明では、エッチング処
理後に研磨処理を行うことにより、エッチング処理で形
成されたディスク用ガラス基板表面の微小な突起を除去
できる。In this case, if the etching is performed deeper than 3 μm, the mechanical strength can be greatly improved at the same time. However, if the main purpose is to remove foreign matters on the surface of the glass substrate for the disk, the depth of the etching process will be small. A sufficient effect is obtained with a thickness of about 0.1 to 3 μm. Furthermore, in the present invention, by performing a polishing process after the etching process, it is possible to remove minute protrusions on the surface of the glass substrate for a disk formed by the etching process.
【００１２】本発明におけるエッチング溶液としては、
ガラス表面のエッチング処理に使用される各種エッチン
グ溶液、例えばフッ酸水溶液、ＨＦ−Ｈ2 ＳＯ4 溶液、
ＮＨ4 Ｆ水溶液、Ｈ2 ＳｉＦ6 水溶液やその他の各種の
ガラスエッチング溶液が使用できる。As the etching solution in the present invention,
Various etching solutions used for etching the glass surface, for example, aqueous solution of hydrofluoric acid, HF-H 2 SO 4 solution,
NH 4 F aqueous solution, H 2 SiF 6 aqueous solution, and various other glass etching solutions can be used.
【００１３】本発明において、ラッピング処理とは、前
述したように金属定盤を用い水等に分散させた遊離砥粒
を使用して研磨処理する方法をいい、単にラッピング処
理ともいうものである。一方、本発明におけるラッピン
グ処理工程の後の研磨処理とは、合成樹脂製の研磨パッ
ドを用い水等に分散させた遊離砥粒（ラッピング処理用
の砥粒よりも細かく、硬度の低いものが使用される。）
を使用して研磨する方法をいい、単に研磨またはポリッ
シングともいうものである。In the present invention, the lapping treatment means a method of polishing using free abrasive grains dispersed in water or the like using a metal plate as described above, and is also simply called lapping treatment. On the other hand, the polishing treatment after the lapping treatment step in the present invention means loose abrasive grains dispersed in water etc. using a polishing pad made of synthetic resin (fine abrasive grains for lapping treatment, those having a low hardness are used. Will be done.)
Is used for polishing, and is also simply referred to as polishing or polishing.
【００１４】本発明では、従来の洗浄では完全に取り除
けなかったガラス基板表面に付着した砥粒および金属粒
子を、ラッピング処理工程の後にエッチング処理を行
い、ガラス基板表面の一部とともに溶解させることによ
り、ガラス基板表面からの異物を容易に取り除ける。In the present invention, the abrasive grains and the metal particles adhered to the surface of the glass substrate, which cannot be completely removed by the conventional cleaning, are subjected to the etching treatment after the lapping treatment step to dissolve them together with a part of the glass substrate surface. , Foreign matter from the surface of the glass substrate can be easily removed.
【００１５】[0015]
［例１］アルミノボロシリケートガラスからなる厚さ約
１．１ｍｍの板状ガラスを用いて、外径６５ｍｍ、内径
２０ｍｍの同心円状円板ガラス基板（ドーナツ形状）を
各１００枚加工し、これら円板ガラス基板の主表面を鋳
鉄製定盤を用いた研磨機を使用し、平均粒径４０μｍの
遊離砥粒を供給することにより板厚変化量（研磨量）で
約４００μｍのラッピング処理をした。[Example 1] Using a plate glass made of aluminoborosilicate glass with a thickness of about 1.1 mm, 100 concentric circular disk glass substrates (donut shape) each having an outer diameter of 65 mm and an inner diameter of 20 mm were processed, and these glass disks were processed. The main surface of the substrate was lapped by a plate thickness change amount (polishing amount) of about 400 μm by using a polishing machine using a cast iron surface plate and supplying free abrasive grains having an average particle diameter of 40 μm.
【００１６】この後、濃度２％のフッ酸溶液からなるエ
ッチング溶液を用い、上記ガラス基板に対し深さ０．１
μｍのエッチング処理を施し、次いで弱アルカリ性の洗
剤を用い、ブラシ洗浄および純水による超音波洗浄を行
った。After that, an etching solution consisting of a hydrofluoric acid solution having a concentration of 2% was used and the depth of the glass substrate was set to 0.1.
After performing an etching treatment of μm, brush cleaning and ultrasonic cleaning with pure water were performed using a weak alkaline detergent.
【００１７】さらにその後、合成樹脂製の研磨パッドに
平均粒径約１μｍの酸化セリウムを供給して研磨する方
法により、板厚変化量で約６０μｍの研磨を行い、次い
で弱アルカリ性の洗剤を用いたブラシ洗浄および超純水
による超音波洗浄を行って磁気ディスク用ガラス基板の
サンプルを製造した。After that, a polishing pad made of synthetic resin was supplied with cerium oxide having an average particle diameter of about 1 μm to perform polishing to a polishing amount of about 60 μm with a change in plate thickness, and then a weak alkaline detergent was used. Brush cleaning and ultrasonic cleaning with ultrapure water were performed to manufacture a sample of a glass substrate for a magnetic disk.
【００１８】得られた磁気ディスク用ガラス基板を１万
ルックスの光源下で目視検査したところ、目視による傷
の発生したガラス基板の全体に対する割合（傷発生率）
は５％であった。When the obtained glass substrate for magnetic disk was visually inspected under a light source of 10,000 lux, the ratio of scratches to the entire glass substrate (scratch occurrence rate) was visually observed.
Was 5%.
【００１９】［例２］ラッピング処理した後のエッチン
グ量を深さ２．８μｍとした以外は、例１と同じ方法に
より磁気ディスク用ガラス基板のサンプルを製造した。
得られた磁気ディスク用ガラス基板につき同様に目視検
査したところ、傷発生率は２％であった。Example 2 A sample of a glass substrate for a magnetic disk was manufactured by the same method as in Example 1 except that the depth of etching after lapping was 2.8 μm.
When the obtained glass substrate for magnetic disk was similarly visually inspected, the scratch occurrence rate was 2%.
【００２０】［例３（比較例）］ラッピング処理後のエ
ッチング処理を行わない以外は例１と同じ方法により磁
気ディスク用ガラス基板のサンプルのサンプルを製造し
た。得られた磁気ディスク用ガラス基板につき同様に目
視検査したところ、傷発生率は１５％であった。Example 3 (Comparative Example) A sample of a glass substrate for a magnetic disk was manufactured by the same method as in Example 1 except that the etching process after the lapping process was not performed. When the obtained glass substrate for magnetic disk was similarly visually inspected, the scratch occurrence rate was 15%.
【００２１】［例４（比較例）］ラッピング処理後のエ
ッチング量を深さ６００Åとした以外は例１と同じ方法
により磁気ディスク用ガラス基板のサンプルを製造し
た。得られた磁気ディスク用ガラス基板につき同様に目
視検査したところ、傷発生率は１２％であった。Example 4 (Comparative Example) A magnetic disk glass substrate sample was manufactured in the same manner as in Example 1 except that the etching amount after lapping was 600 Å. When the obtained glass substrate for magnetic disk was visually inspected in the same manner, the scratch occurrence rate was 12%.
【００２２】［例５］ソーダライムシリカガラスからな
る厚さ約１．１ｍｍの板状ガラスを用いて、外径６５ｍ
ｍ、内径２０ｍｍの同心円状円板ガラス基板（ドーナツ
形状）を各１００枚加工し、これら円板ガラス板の主表
面を金属定盤を用いた研磨機を使用し、平均粒径４０μ
ｍの遊離砥粒を供給することにより板厚変化量（研磨
量）で約４００μｍのラッピング処理をした。[Example 5] Using a plate glass made of soda lime silica glass and having a thickness of about 1.1 mm, an outer diameter of 65 m
m, an inner diameter of 20 mm, concentric circular disk glass substrates (donut shape) 100 each, and the main surface of these circular glass plates was polished using a metal surface plate, and the average particle size was 40 μm.
By lapping m loose abrasive grains, lapping treatment of about 400 μm was carried out with a variation in plate thickness (polishing amount).
【００２３】この後、濃度２％のフッ酸溶液からなるエ
ッチング溶液を用い、上記ガラス基板に対し深さ０．１
μｍのエッチング処理を施し、次いで弱アルカリ性の洗
剤を用いブラシ洗浄および純水による超音波洗浄を行っ
た。After that, an etching solution consisting of a hydrofluoric acid solution having a concentration of 2% was used, and a depth of 0.1 was applied to the glass substrate.
After performing an etching treatment of μm, brush cleaning using a weak alkaline detergent and ultrasonic cleaning with pure water were performed.
【００２４】さらにこの後、合成樹脂製の研磨パッドに
平均粒径約１μｍの酸化セリウムを供給して研磨する方
法により、板厚変化量で約６０μｍの研磨を行い、次い
で弱アルカリ性の洗剤を用いたブラシ洗浄および超純水
による超音波洗浄を行って磁気ディスク用ガラス基板の
サンプルを製造した。After that, a cerium oxide having an average particle size of about 1 μm is supplied to a polishing pad made of a synthetic resin to perform polishing to a polishing amount of about 60 μm with a change in plate thickness, and then a weak alkaline detergent is used. Brush cleaning and ultrasonic cleaning with ultrapure water were performed to manufacture a sample glass substrate for a magnetic disk.
【００２５】得られた磁気ディスク用ガラス基板につき
同様に目視検査したところ、傷発生率は７％であった。When the obtained glass substrate for a magnetic disk was visually inspected in the same manner, the scratch occurrence rate was 7%.
【００２６】［例６］ラッピング処理後のエッチング量
を深さ２．５μｍとした以外は例５と同じ方法により磁
気ディスク用ガラス基板のサンプルを製造した。得られ
たガラス基板につき同様に目視検査をしたところ、傷発
生率は５％であった。Example 6 A glass substrate sample for a magnetic disk was manufactured by the same method as in Example 5 except that the etching amount after lapping was 2.5 μm in depth. When the obtained glass substrate was subjected to the same visual inspection, the scratch occurrence rate was 5%.
【００２７】［例７（比較例）］ラッピング処理のエッ
チング処理を行わない以外は例５と同じ方法により磁気
ディスク用ガラス基板のサンプルを製造した。得られた
ガラス基板につき同様に目視検査をしたところ、傷発生
率は２０％であった。[Example 7 (Comparative Example)] A sample of a glass substrate for a magnetic disk was manufactured by the same method as in Example 5 except that the lapping etching treatment was not performed. When the obtained glass substrate was visually inspected in the same manner, the scratch occurrence rate was 20%.
【００２８】［例８（比較例）］ラッピング処理のエッ
チング量を深さ５００Åとした以外は例５と同じ方法に
より磁気ディスク用ガラス基板のサンプルを製造した。
得られたガラス基板につき同様に目視検査をしたとこ
ろ、傷発生率は１８％であった。Example 8 (Comparative Example) A sample of a glass substrate for a magnetic disk was manufactured by the same method as in Example 5 except that the etching amount in the lapping process was 500 Å.
When the obtained glass substrate was subjected to the same visual inspection, the scratch occurrence rate was 18%.
【００２９】[0029]
【発明の効果】本発明によれば、従来の洗浄では完全に
は除去できなかった、磁気ディスク用ガラス基板の表面
に付着した砥粒および研磨用金属定盤から生じる金属粒
子を、ラッピング処理工程の後にエッチング処理を行
い、ガラス基板表面の一部とともに溶解させることによ
り、磁気ディスク用ガラス基板表面の上記異物を容易に
除去できる。したがって、ラッピング処理工程で磁気デ
ィスク用ガラス基板表面に付着した砥粒およびラッピン
グ処理用金属定盤から生ずる金属粒子を次工程の研磨工
程に持ち込むことを防止でき、研磨後の磁気ディスク用
ガラス基板表面の傷の発生率を低減できる。According to the present invention, the lapping treatment step is carried out for the abrasive particles adhered to the surface of the glass substrate for a magnetic disk and the metal particles generated from the polishing metal surface plate, which cannot be completely removed by the conventional cleaning. After that, the foreign matter on the surface of the glass substrate for a magnetic disk can be easily removed by performing an etching treatment and dissolving it together with a part of the surface of the glass substrate. Therefore, it is possible to prevent the abrasive grains adhered to the surface of the magnetic disk glass substrate in the lapping process and the metal particles generated from the metal plate for the lapping process from being brought into the polishing process of the next process, and the surface of the glass substrate for the magnetic disk after polishing The occurrence rate of scratches can be reduced.
Claims (2)
ピング処理した後、そのガラス基板の表面に深さ０．１
〜３μｍのエッチング処理を施し、その後エッチング処
理が施されたガラス基板の主表面を研磨処理することを
特徴とする磁気ディスク用ガラス基板の製法。1. A main surface of a glass substrate for a magnetic disk is lapped, and then a depth of 0.1 is formed on the surface of the glass substrate.
A method for producing a glass substrate for a magnetic disk, which comprises subjecting the glass substrate to an etching treatment of ˜3 μm and then polishing the main surface of the etched glass substrate.
り磁気ディスク用ガラス基板の主表面をエッチング処理
する請求項１記載の磁気ディスク用ガラス基板の製法。2. The method for producing a glass substrate for a magnetic disk according to claim 1, wherein the main surface of the glass substrate for a magnetic disk is etched with an etching solution containing hydrofluoric acid as a main component.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7276296A JPH08329454A (en) | 1995-03-30 | 1996-03-27 | Production of glass substrate for magnetic disk |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7362695 | 1995-03-30 | ||
| JP7-73626 | 1995-03-30 | ||
| JP7276296A JPH08329454A (en) | 1995-03-30 | 1996-03-27 | Production of glass substrate for magnetic disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08329454A true JPH08329454A (en) | 1996-12-13 |
Family
ID=26413898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7276296A Pending JPH08329454A (en) | 1995-03-30 | 1996-03-27 | Production of glass substrate for magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08329454A (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10209063A (en) * | 1997-01-27 | 1998-08-07 | Mitsubishi Materials Shilicon Corp | Quartz boat and manufacturing method of the same |
| JP2008021399A (en) * | 2006-06-15 | 2008-01-31 | Toyo Kohan Co Ltd | Method of polishing glass material for information recording glass substrate, information recording glass substrate, information recording disk, and hard disk drive |
| US7727407B2 (en) | 2000-09-13 | 2010-06-01 | Nippon Sheet Glass Co., Ltd. | Amorphous material processing method |
| JP2010163352A (en) * | 2008-12-19 | 2010-07-29 | Asahi Glass Co Ltd | Method of glass surface fine processing |
| JP2010238272A (en) * | 2009-03-30 | 2010-10-21 | Hoya Corp | Method for manufacturing glass substrate for magnetic disk |
| JP2011129232A (en) * | 2009-12-21 | 2011-06-30 | Asahi Glass Co Ltd | Process for producing glass substrate |
| JP2012089221A (en) * | 2010-10-22 | 2012-05-10 | Showa Denko Kk | Method for manufacturing glass substrate for magnetic recording medium |
| JP2013012280A (en) * | 2011-06-30 | 2013-01-17 | Konica Minolta Advanced Layers Inc | Method for manufacturing glass substrate for hdd |
| JP2013012279A (en) * | 2011-06-30 | 2013-01-17 | Konica Minolta Advanced Layers Inc | Method for manufacturing glass substrate for hdd |
| JP2013012281A (en) * | 2011-06-30 | 2013-01-17 | Konica Minolta Advanced Layers Inc | Method for manufacturing glass substrate for hdd |
| JP2020110830A (en) * | 2019-01-15 | 2020-07-27 | 株式会社ディスコ | Manufacturing method for molded article |
-
1996
- 1996-03-27 JP JP7276296A patent/JPH08329454A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10209063A (en) * | 1997-01-27 | 1998-08-07 | Mitsubishi Materials Shilicon Corp | Quartz boat and manufacturing method of the same |
| US7727407B2 (en) | 2000-09-13 | 2010-06-01 | Nippon Sheet Glass Co., Ltd. | Amorphous material processing method |
| JP2008021399A (en) * | 2006-06-15 | 2008-01-31 | Toyo Kohan Co Ltd | Method of polishing glass material for information recording glass substrate, information recording glass substrate, information recording disk, and hard disk drive |
| JP2010163352A (en) * | 2008-12-19 | 2010-07-29 | Asahi Glass Co Ltd | Method of glass surface fine processing |
| JP2010238272A (en) * | 2009-03-30 | 2010-10-21 | Hoya Corp | Method for manufacturing glass substrate for magnetic disk |
| JP2011129232A (en) * | 2009-12-21 | 2011-06-30 | Asahi Glass Co Ltd | Process for producing glass substrate |
| JP2012089221A (en) * | 2010-10-22 | 2012-05-10 | Showa Denko Kk | Method for manufacturing glass substrate for magnetic recording medium |
| JP2013012280A (en) * | 2011-06-30 | 2013-01-17 | Konica Minolta Advanced Layers Inc | Method for manufacturing glass substrate for hdd |
| JP2013012279A (en) * | 2011-06-30 | 2013-01-17 | Konica Minolta Advanced Layers Inc | Method for manufacturing glass substrate for hdd |
| JP2013012281A (en) * | 2011-06-30 | 2013-01-17 | Konica Minolta Advanced Layers Inc | Method for manufacturing glass substrate for hdd |
| JP2020110830A (en) * | 2019-01-15 | 2020-07-27 | 株式会社ディスコ | Manufacturing method for molded article |
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