JPH08236597A - Transfer device - Google Patents
Transfer deviceInfo
- Publication number
- JPH08236597A JPH08236597A JP3847995A JP3847995A JPH08236597A JP H08236597 A JPH08236597 A JP H08236597A JP 3847995 A JP3847995 A JP 3847995A JP 3847995 A JP3847995 A JP 3847995A JP H08236597 A JPH08236597 A JP H08236597A
- Authority
- JP
- Japan
- Prior art keywords
- transfer
- suction
- transfer arm
- glass substrate
- plate body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は移載装置に係り、特に液
晶表示素子や半導体素子の製造における液晶パネル用の
ガラス基板あるいは半導体ウエハに各種の処理を施す際
の当該ガラス基板あるいはウエハを処理装置間で搬送
し、処理ステージに載置または取り出すための移載装置
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer apparatus, and more particularly, to a glass substrate or a wafer for a liquid crystal panel in the manufacture of liquid crystal display elements or semiconductor elements, which is used to perform various treatments on the glass substrate or wafer. The present invention relates to a transfer device that is transported between devices and placed on or taken out from a processing stage.
【０００２】[0002]
【従来の技術】液晶表示素子や半導体素子の製造におけ
る液晶パネル用のガラス基板あるいは半導体ウエハに各
種の処理を施す際に、素材搬入ステージと当該ガラス基
板あるいはウエハを処理装置、および処理後の搬出ステ
ージ間で搬送するために、一般にロボットと称する移載
装置が使用されている。2. Description of the Related Art When performing various treatments on a glass substrate or a semiconductor wafer for a liquid crystal panel in the production of liquid crystal display elements or semiconductor elements, a material loading stage, the glass substrate or the wafer, and a unloading apparatus after the processing. A transfer device generally referred to as a robot is used for carrying between the stages.
【０００３】図７はこの種の移載装置を使用する製造工
程の一例としての液晶パネル処理装置におけるレジスト
塗布工程の移載装置の配置と動作を説明する概念図であ
って、１はカセットに収納したガラス基板、２は移載装
置を構成する移載アーム、４は移載装置、４ａ，４ｂは
移載装置を移動させるためのガイドレール、５はガラス
基板を供給するためのカセット、６はレジスト塗布装
置、６ａは塗布ステージ、７は乾燥装置、７ａは乾燥ス
テージである。FIG. 7 is a conceptual diagram for explaining the arrangement and operation of a transfer device in a resist coating process in a liquid crystal panel processing apparatus as an example of a manufacturing process using this type of transfer device. The stored glass substrate, 2 is a transfer arm that constitutes a transfer device, 4 is a transfer device, 4a and 4b are guide rails for moving the transfer device, 5 is a cassette for supplying the glass substrate, and 6 Is a resist coating device, 6a is a coating stage, 7 is a drying device, and 7a is a drying stage.
【０００４】同図において、移載装置４はガイドレール
４ａ，４ｂで矢印Ｄ方向に移動可能とされると共に水平
方向Ａに伸縮する移載アーム２を有し、かつこの移載ア
ーム２を水平面内で矢印Ｂ方向への旋回と垂直方向Ｃへ
の昇降させる機能を有している。In FIG. 1, the transfer device 4 has a transfer arm 2 which is movable by guide rails 4a and 4b in the direction of arrow D and expands and contracts in the horizontal direction A. It has the functions of turning in the direction of arrow B and moving up and down in the vertical direction C inside.
【０００５】移載アーム２の載置位置には、複数の真空
吸着器が取付けられており、この真空吸着器でガラス基
板を吸着して搬送するように構成されている。A plurality of vacuum suction devices are attached to the mounting position of the transfer arm 2, and the vacuum suction device is configured to suck and convey the glass substrate.
【０００６】まず、多数のガラス基板１は図示しない素
材搬入装置でカセット５に収納された状態で搬入され
る。First, a large number of glass substrates 1 are loaded in a cassette 5 by a material loading device (not shown).
【０００７】移載装置４は所定のカセットに対向した位
置においてその積載アーム２を伸ばしてカセット５から
ガラス基板１を一枚ずつ上記積載アーム２に載置して取
り出す。The transfer device 4 extends the stacking arm 2 at a position facing a predetermined cassette, mounts the glass substrates 1 from the cassette 5 one by one on the stacking arm 2 and takes them out.
【０００８】ガラス基板１は積載アーム２に載置された
まま矢印Ｂに沿ってレジスト塗布装置６方向に旋回し、
同時に移載装置４がガイドレール４ａ，４ｂで矢印Ｄに
沿ってレジスト塗布装置６方向に移動する。While the glass substrate 1 is placed on the loading arm 2, the glass substrate 1 is swung toward the resist coating device 6 along the arrow B,
At the same time, the transfer device 4 moves in the direction of the resist coating device 6 along the arrow D on the guide rails 4a and 4b.
【０００９】所定の移動後、移載アーム２はレジスト塗
布装置６の塗布ステージ６ａの位置と同一高さに昇降
し、塗布ステージ６ａにガラス基板１を載置する。After the predetermined movement, the transfer arm 2 moves up and down to the same height as the position of the coating stage 6a of the resist coating device 6, and the glass substrate 1 is mounted on the coating stage 6a.
【００１０】レジストを塗布したガラス基板１は上記と
同様の移載装置の動作により塗布ステージ６ａから取り
出され、乾燥装置７の乾燥ステージ７ａに搬入されてレ
ジストの乾燥が行われる。The glass substrate 1 coated with the resist is taken out from the coating stage 6a by the operation of the transfer device similar to the above, and is carried into the drying stage 7a of the drying device 7 to dry the resist.
【００１１】乾燥後のガラス基板１はカセット５に戻さ
れるか、あるいは図示しない搬出ステージに移載され
る。The dried glass substrate 1 is returned to the cassette 5 or transferred to a carry-out stage (not shown).
【００１２】図８は図７におけるカセットの説明図であ
って、（ａ）は側面図、（ｂ）は正面図である。FIG. 8 is an explanatory view of the cassette in FIG. 7, (a) is a side view and (b) is a front view.
【００１３】このカセット５は内部にもつ棚５ａ，５ｂ
に両端を支持した状態で多数のガラス基板１を間隙をも
って収納しており、この間隙に移載アーム２を挿入し、
上昇させて１枚ずつ取り出し、あるいは再収納するよう
になっている。The cassette 5 has shelves 5a and 5b inside.
A large number of glass substrates 1 are accommodated with a gap in a state where both ends are supported in the gap, and the transfer arm 2 is inserted into the gap,
It is designed to be raised and taken out one by one, or to be stored again.
【００１４】図９はガラス基板の処理ステージへのガラ
ス基板の移載動作の一例を説明する模式図であって、８
は処理ステージ、８ａは移載アームを挿入する溝であ
る。FIG. 9 is a schematic diagram for explaining an example of the transfer operation of the glass substrate on the glass substrate processing stage.
Is a processing stage, and 8a is a groove into which the transfer arm is inserted.
【００１５】同図において、ガラス基板１は移載アーム
２に載置されて処理ステージ８の溝８ａに進退して昇降
することでガラス基板１を処理ステージ８に載置しある
いはそこから取り出す。In FIG. 1, the glass substrate 1 is placed on the transfer arm 2 and is moved forward and backward in the groove 8a of the processing stage 8 to move up and down to place or take out the glass substrate 1 on the processing stage 8.
【００１６】[0016]
【発明が解決しようとする課題】移載装置で取り扱う薄
板は、特に、液晶パネル用のガラス基板は、その厚さが
例えば１．１ｍｍと薄く、サイズも大型になり、また最
近では０．７ｍｍのように極めて薄いものを用いるよう
になっているため、移載アーム２に載置したときに自重
で撓みが発生する。The thin plate handled by the transfer device, particularly the glass substrate for a liquid crystal panel, has a thin thickness of 1.1 mm, for example, and has a large size, and recently has a thickness of 0.7 mm. As described above, since an extremely thin one is used, when it is mounted on the transfer arm 2, bending occurs due to its own weight.
【００１７】図１０は移載アームにガラス基板を載置し
た状態の説明図であって、１はガラス基板、２は移載ア
ーム、３は吸着器である。FIG. 10 is an explanatory view showing a state in which a glass substrate is placed on the transfer arm. Reference numeral 1 is a glass substrate, 2 is a transfer arm, and 3 is a suction device.
【００１８】また、図１１は従来の移載アームに設けら
れている吸着器の各種の例の説明図であって、（ａ）は
移載アーム２の長手方向に２つのスリット状吸着器３を
取付けたもの、（ｂ）は円形の吸着器３を５個取付けた
もの、（ｃ）はガラス基板を浮かして保持するために移
載アーム２の表面から突出させた吸着器３を設けたもの
である。FIG. 11 is an explanatory view of various examples of the suction device provided in the conventional transfer arm. FIG. 11A shows two slit-shaped suction devices 3 in the longitudinal direction of the transfer arm 2. Attached, (b) has five circular adsorbers 3 attached, and (c) has an adsorber 3 protruding from the surface of the transfer arm 2 for holding the glass substrate in a floating state. It is a thing.
【００１９】上記図８、図９に示したように、移載アー
ム２の幅は上記した処理ステージ８の溝８ａの幅で制限
されると共に、自身の重さで撓むために十分な幅を持た
せることができない。As shown in FIGS. 8 and 9, the width of the transfer arm 2 is limited by the width of the groove 8a of the processing stage 8 described above, and has a sufficient width to bend due to its own weight. I can't let you.
【００２０】また、ガラス基板１はそれ自体で０．７ｍ
ｍ程度の反りを有し、また薄くなると自重で撓むため
に、吸着器３との間に間隙が生じて吸着保持ができなく
なってしまい、上記図１１に示した何れの吸着器でも十
分な保持ができず、移載途中で位置ずれや脱落が発生す
るという問題があった。Further, the glass substrate 1 itself has a length of 0.7 m.
Since it has a warp of about m, and when it becomes thin, it bends due to its own weight, a gap is created between it and the adsorber 3, making it impossible to adsorb and hold, and any of the adsorbers shown in FIG. However, there was a problem in that it could not be done, and that misalignment or dropout occurred during transfer.
【００２１】さらに、吸着力が低下するとガラス基板自
体の上記撓みが大きくなり、カセットに収納する際に下
に隣接するガラス基板との間で干渉が起こる場合があ
る。Further, when the suction force is lowered, the above-mentioned bending of the glass substrate itself becomes large, and when the glass substrate is accommodated in the cassette, interference may occur between the glass substrate and the adjacent glass substrate below.
【００２２】また、吸着器に真空を供給する系統も一系
統であるために、１つの吸着器に真空漏れが発生すると
全体の吸着力がなくなってしまい、確実な搬送、移載が
できなくなるという問題があった。Further, since there is only one system for supplying a vacuum to the adsorber, if a vacuum leak occurs in one adsorber, the entire adsorbing power is lost, and reliable transfer and transfer cannot be performed. There was a problem.
【００２３】本発明の目的は、自重で撓むような板体を
確実に吸着して処理ステージ間で搬送できるようにした
移載アームを備えた移載装置を提供することにある。It is an object of the present invention to provide a transfer device provided with a transfer arm capable of surely adsorbing a plate body that is bent by its own weight and transporting it between processing stages.
【００２４】[0024]
【課題を解決するための手段】上記目的を達成するため
に、本発明は、搬送する板体が完全に平坦でない、ある
いは自重による撓みをもつことを前提とした吸着器を備
えることによって達成される。In order to achieve the above object, the present invention is achieved by providing an adsorber which is premised on that the plate to be conveyed is not completely flat or has a deflection due to its own weight. It
【００２５】すなわち、請求項１に記載の第１の発明
は、本体に対して少なくとも水平方向に伸縮する移載ア
ームを備えた移載装置において、前記移載アームの板体
載置領域にデルタ配置した３個の吸着器を備えたことを
特徴とする。That is, a first aspect of the present invention is a transfer device including a transfer arm that expands and contracts in at least a horizontal direction with respect to a main body, and a delta is provided in a plate mounting area of the transfer arm. It is characterized by having three adsorbers arranged.
【００２６】また、請求項２に記載の第２の発明は、前
記吸着器の板体接触面に押圧変形する可撓パッドを備え
たことを特徴とする。なお、この吸着器の個数は３個に
限らない。A second invention according to claim 2 is characterized in that a flexible pad for pressing and deforming is provided on a plate contact surface of the suction device. The number of the adsorbers is not limited to three.
【００２７】さらに、請求項３に記載の第３の発明は、
前記吸着器が、その吸着開口に接して載置した板体の吸
着面の湾曲に倣って揺動する揺動機構を備えたことを特
徴とする。この吸着器の個数も３個に限らない。Further, a third invention according to claim 3 is
It is characterized in that the suction device is provided with a swinging mechanism that swings along the curvature of the suction surface of the plate body placed in contact with the suction opening. The number of the adsorbers is not limited to three.
【００２８】[0028]
【作用】上記第１の発明の構成において、デルタ状に配
置した３個の吸着器は、載置した板体の撓み量に係わら
ず全てが当該板体の面を受けて吸着するため、移載途上
での位置ずれや脱落が防止されると共に、吸着力によっ
て板体はその撓みが戻る方向に変形するので、カセット
収納時、あるいは処理ステージとの衝突が回避される。In the structure of the first aspect of the invention, all of the three adsorbers arranged in a delta shape receive and adsorb the surface of the plate body regardless of the amount of bending of the mounted plate body. Positional displacement and dropout during mounting are prevented, and the plate body is deformed in the direction in which its bending returns due to the suction force, so that collision during storage of the cassette or collision with the processing stage is avoided.
【００２９】また、上記第２の発明の構成において、吸
着器に設けた可撓パッドは載置した板体の撓みに沿って
変形するため、撓みによる真空力の漏れがなく吸着する
ので、移載途上での位置ずれや脱落が防止されると共
に、吸着力によって板体はその撓みが戻る方向に変形す
るので、カセット収納時、あるいは処理ステージとの衝
突が回避される。Further, in the structure of the second aspect of the invention, since the flexible pad provided on the suction device is deformed along the bending of the mounted plate member, the vacuum force due to the bending is absorbed without any leakage, so that the transfer is performed. Positional displacement and dropout during mounting are prevented, and the plate body is deformed in the direction in which its bending returns due to the suction force, so that collision during storage of the cassette or collision with the processing stage is avoided.
【００３０】そして、上記第３の発明の構成において、
吸着器に設けた揺動機構は板体の吸着面の湾曲に倣って
揺動して当該板体の吸着面に正対するため、撓みによる
真空力の漏れがなく吸着するので、移載途上での位置ず
れや脱落が防止されると共に、吸着力によって板体はそ
の撓みが戻る方向に変形するので、カセット収納時、あ
るいは処理ステージとの衝突が回避される。Then, in the configuration of the third invention,
Since the swing mechanism provided in the suction device swings according to the curve of the suction surface of the plate body and directly faces the suction surface of the plate body, suction is performed without leakage of the vacuum force due to bending, so during transfer. Is prevented from being displaced or dropped off, and the plate body is deformed in the direction in which the bending is returned by the suction force, so that the plate body can be prevented from colliding with the processing stage or the cassette stage.
【００３１】上記各発明は、液晶パネル用のガラス基
板、あるいは半導体ウエハの移載に適用して特に好適で
ある。Each of the above inventions is particularly suitable for transfer of a glass substrate for a liquid crystal panel or a semiconductor wafer.
【００３２】[0032]
【実施例】以下、本発明の実施例につき、図面を参照し
て詳細に説明する。Embodiments of the present invention will now be described in detail with reference to the drawings.
【００３３】図１は本発明の移載装置の第１実施例を構
成する移載アームと載置したガラス基板の吸着を説明す
る模式図、図２は図１のＸ−Ｘ線に沿った断面図であっ
て、１はガラス基板、２は移載アーム、２ａは真空路、
３は吸着器である。FIG. 1 is a schematic view for explaining adsorption of a transfer arm and a mounted glass substrate which constitute the first embodiment of the transfer device of the present invention, and FIG. 2 is taken along line XX of FIG. 1 is a cross-sectional view, 1 is a glass substrate, 2 is a transfer arm, 2a is a vacuum path,
3 is an adsorber.
【００３４】同各図において、移載アーム２の先端は凸
字状に形成されており、その突出領域に１個の吸着器３
−１を、また凸字の基部に２個の吸着器３−２，３−３
が設置され、これら３個の吸着器３（３−１、３−２、
３−３）をデルタ状に配置される。In each figure, the tip of the transfer arm 2 is formed in a convex shape, and one suction device 3 is provided in the protruding area.
-1, and two adsorbers 3-2 and 3-3 on the convex base.
Is installed, and these three adsorbers 3 (3-1, 3-2,
3-3) are arranged in a delta shape.
【００３５】吸着器は、その個数が増加するにつれ真空
力漏れが発生する可能性が増大する。上記したように、
３個の吸着器３をデルタ状に配置した構成により、上記
真空力漏れの危険性が最小限となり、更に、ガラス基板
１を安定して移載することができる。As the number of adsorbers increases, the possibility of vacuum force leakage increases. As mentioned above,
Due to the configuration in which the three suction devices 3 are arranged in a delta shape, the risk of the vacuum force leakage is minimized, and the glass substrate 1 can be stably transferred.
【００３６】吸着器３は図２に示したように移載アーム
２の表面から若干浮かせて設けられ、移載アーム２に形
成した真空路２ａに連接されて真空が供給される。As shown in FIG. 2, the suction device 3 is provided so as to be slightly floated from the surface of the transfer arm 2, and is connected to the vacuum passage 2a formed in the transfer arm 2 to supply a vacuum.
【００３７】この構成により、載置したガラス基板１は
３個の吸着器３−１、３−２、３−３の全てで吸着され
る。With this configuration, the placed glass substrate 1 is adsorbed by all of the three adsorbers 3-1, 3-2, 3-3.
【００３８】したがって、ガラス基板１は確実に保持さ
れ、移載途中で位置ずれや脱落が防止される。Therefore, the glass substrate 1 is securely held, and displacement and dropout during transfer are prevented.
【００３９】なお、この実施例では、吸着器３の上面
（ガラス基板１との接触面）を移載アーム２の表面から
浮かせた状態で設けているが、これに替えて両者が同一
表面となるようにしてもよいが、ガラス基板１が凹形に
反っている場合もあるため、吸着器３の上面はアームか
ら浮かせて設置した方が吸着効果がより大きくなる。In this embodiment, the upper surface (contact surface with the glass substrate 1) of the suction device 3 is provided in a state of being floated from the surface of the transfer arm 2. However, instead of this, both surfaces have the same surface. However, since the glass substrate 1 may be warped in a concave shape in some cases, if the upper surface of the suction device 3 is installed so as to be floated from the arm, the suction effect will be greater.
【００４０】図３は本発明の移載装置の第２実施例を構
成する移載アームと載置したガラス基板の吸着を説明す
る前記図２と同様の断面模式図であって、３ａは吸着ベ
ース、３ｂは可撓パッド、図２と同一符号は同一部分に
対応する。FIG. 3 is a schematic cross-sectional view similar to FIG. 2 for explaining suction of a transfer arm and a mounted glass substrate which constitute a second embodiment of the transfer apparatus of the present invention, and 3a is a suction. Bases 3b are flexible pads, and the same reference numerals as those in FIG. 2 correspond to the same portions.
【００４１】同図において、吸着器３は吸着ベース３ａ
を覆って可撓パッド３ｂが設けてあり、この可撓パッド
３ｂはガラス基板１の載置の押圧で変形し、また真空吸
着力で変形して当該ガラス基板１の吸着面に倣って吸着
する。In the figure, the adsorber 3 is an adsorption base 3a.
Is covered with a flexible pad 3b. The flexible pad 3b is deformed by pressing the glass substrate 1 when it is placed, and is also deformed by a vacuum suction force to be sucked along the suction surface of the glass substrate 1. .
【００４２】図４は図３で説明した吸着器を移載アーム
に設置した状態の説明図であって、この実施例では４個
の吸着器を設置している。FIG. 4 is an explanatory view showing a state in which the suction device described in FIG. 3 is installed on the transfer arm. In this embodiment, four suction devices are installed.
【００４３】本実施例によれば、ガラス基板１は更に確
実に保持され、移載途中で位置ずれや脱落が防止され
る。According to the present embodiment, the glass substrate 1 is held more reliably, and the positional displacement and the dropout are prevented during the transfer.
【００４４】なお、図３、図４では吸着器３の上面（ガ
ラス基板１との接触面）を移載アーム２の表面から浮か
せた状態で設けているが、これに替えて両者が同一表面
となるようにしてもよい。しかし、前記実施例での説明
と同様に、ガラス基板１が凹形に反っている場合もある
ため、吸着器３の上面はアームから浮かせて設置した方
が吸着効果がより大きくなる。In FIGS. 3 and 4, the upper surface (contact surface with the glass substrate 1) of the suction device 3 is provided in a state of being floated from the surface of the transfer arm 2. However, instead of this, both are on the same surface. May be However, as in the case of the above-described embodiment, the glass substrate 1 may be warped in a concave shape. Therefore, if the upper surface of the adsorber 3 is installed so as to be floated from the arm, the adsorption effect becomes larger.
【００４５】図５は本発明の移載装置の第３実施例を構
成する移載アームと載置したガラス基板の吸着を説明す
る模式図であって、３ｃは可撓膜、３ｄはコイルスプリ
ング、３ｅは吸着開口、前記実施例と同一符号は同一部
分に対応する。FIG. 5 is a schematic view for explaining adsorption of a transfer arm and a glass substrate placed thereon which constitutes a third embodiment of the transfer device of the present invention. 3c is a flexible film and 3d is a coil spring. Denoted at 3e is a suction opening, and the same reference numerals as those in the above embodiment correspond to the same portions.
【００４６】同図において、吸着器３は移載アーム２に
形成した凹部３ｆにスプリング３ｄと可撓膜３ｃとを介
して吸着ベース３ａを設置している。In the figure, the suction device 3 has a suction base 3a installed in a recess 3f formed in the transfer arm 2 via a spring 3d and a flexible film 3c.
【００４７】吸着ベース３ａはスプリング３ｄで移載ア
ームから上方に離れる方向に偏寄され、可撓膜３ｃで真
空が漏れないようにして全体が自由に動くような揺動機
構を構成している。また、吸着ベース３ａの吸着面には
漏斗状に形成された吸着開口３ｅが設けてある。The suction base 3a is biased upward by the spring 3d in a direction away from the transfer arm, and the flexible film 3c constitutes a swinging mechanism in which the whole is freely movable so that vacuum does not leak. . Further, the suction surface of the suction base 3a is provided with a suction opening 3e formed in a funnel shape.
【００４８】この漏斗状に形成された吸着開口３ｅによ
り吸着開口部の面積が大きくなり、ガラス基板１の吸着
力が向上する。The funnel-shaped suction opening 3e increases the area of the suction opening and improves the suction force of the glass substrate 1.
【００４９】本実施例のように吸着器３をガラス基板の
撓みに倣うように揺動可能としたことで、ガラス基板１
は更に確実に保持され、移載途中で位置ずれや脱落が防
止される。なお、前記したように吸着器３は３個に限ら
ないが、３個をデルタ状に配置した方がガラス基板１の
確実な保持と移載効果が大きい。As in the present embodiment, the suction device 3 can be swung so as to follow the bending of the glass substrate.
Is more reliably held, and displacement and dropout are prevented during transfer. As described above, the number of the adsorbers 3 is not limited to three, but if the three adsorbers 3 are arranged in a delta shape, the glass substrate 1 can be reliably held and transferred more effectively.
【００５０】図６は本発明の移載装置の第４実施例を構
成する移載アームと載置したガラス基板の吸着を説明す
る模式図であって、前記図１と同様に移載アーム２の先
端は凸字状に形成されており、その突出領域に１個の吸
着器３を、また凸字の基部にスリット状の吸着開口を有
する２個の吸着器３’が設置され、これら３個の吸着器
３（３、３’）をデルタ状に配置している。FIG. 6 is a schematic diagram for explaining the suction of the glass substrate placed and the transfer arm which constitutes the fourth embodiment of the transfer device of the present invention. The transfer arm 2 is the same as in FIG. Is formed in a convex shape, one adsorption device 3 is installed in the protruding region, and two adsorption devices 3'having slit-shaped adsorption openings are installed in the convex base portion. The individual adsorbers 3 (3, 3 ') are arranged in a delta shape.
【００５１】本実施例に用いる吸着器は上記した各実施
例で説明した各形式のものを適宜採用して組合せわせる
ことができる。As the adsorber used in this embodiment, the adsorbers of the types described in the above embodiments can be appropriately adopted and combined.
【００５２】本実施例によっても、ガラス基板１は確実
に保持され、移載途中で位置ずれや脱落が防止される。Also according to this embodiment, the glass substrate 1 is securely held, and displacement and dropout during transfer are prevented.
【００５３】[0053]
【発明の効果】以上説明したように、本発明によれば、
薄いガラス基板や半導体ウエハのように自重で撓むよう
な板体を確実の吸着して処理ステージ間で搬送できるよ
うにした移載アームを備えた移載装置において、その移
載アームに上記板体を確実に保持して位置ずれや脱落を
防止してカセットと処理ステージの間、あるいは処理ス
テージ間で搬送し移載することができる。As described above, according to the present invention,
In a transfer device equipped with a transfer arm capable of reliably adsorbing a plate body such as a thin glass substrate or a semiconductor wafer that bends under its own weight and transferring it between processing stages, the plate body is attached to the transfer arm. Can be reliably held to prevent positional displacement and dropout, and can be conveyed and transferred between the cassette and the processing stage or between the processing stages.
【図１】本発明の移載装置の第１実施例を構成する移載
アームと載置したガラス基板の吸着を説明する模式図で
ある。FIG. 1 is a schematic diagram illustrating a transfer arm that constitutes a first embodiment of a transfer device of the present invention and suction of a mounted glass substrate.
【図２】図１のＸ−Ｘ線に沿った断面図である。FIG. 2 is a cross-sectional view taken along line XX of FIG.
【図３】本発明の移載装置の第２実施例を構成する移載
アームと載置したガラス基板の吸着を説明する前記図２
と同様の断面模式図である。FIG. 3 is a diagram illustrating a transfer arm that constitutes a second embodiment of the transfer device of the present invention and adsorption of a mounted glass substrate.
It is a cross-sectional schematic diagram similar to FIG.
【図４】図３で説明した吸着器を移載アームに設置した
状態の説明図である。FIG. 4 is an explanatory diagram showing a state in which the suction device described in FIG. 3 is installed on a transfer arm.
【図５】本発明の移載装置の第３実施例を構成する移載
アームと載置したガラス基板の吸着を説明する模式図で
ある。FIG. 5 is a schematic diagram for explaining adsorption of a transfer arm and a mounted glass substrate that constitute a third embodiment of the transfer device of the present invention.
【図６】本発明の移載装置の第４実施例を構成する移載
アームと載置したガラス基板の吸着を説明する模式図で
ある。FIG. 6 is a schematic diagram for explaining adsorption of a transfer arm and a mounted glass substrate which constitute a fourth embodiment of the transfer device of the present invention.
【図７】移載装置を使用する製造工程の一例としての液
晶パネル処理装置におけるレジスト塗布工程の移載装置
の配置と動作を説明する概念図である。FIG. 7 is a conceptual diagram illustrating an arrangement and operation of a transfer device in a resist coating process in a liquid crystal panel processing apparatus as an example of a manufacturing process using the transfer device.
【図８】図７ディスペンス説明した移載装置におけるカ
セットの説明図である。FIG. 8 is an explanatory diagram of a cassette in the transfer device described in FIG.
【図９】ガラス基板の処理ステージへのガラス基板の移
載動作の一例を説明する模式図である。FIG. 9 is a schematic view for explaining an example of a glass substrate transfer operation on a glass substrate processing stage.
【図１０】移載アームにガラス基板を載置した状態の説
明図である。FIG. 10 is an explanatory diagram showing a state where a glass substrate is placed on a transfer arm.
【図１１】従来の移載アームに設けられている吸着器の
各種の例の説明図である。FIG. 11 is an explanatory view of various examples of suction devices provided in a conventional transfer arm.
１ ガラス基板 ２ 移載アーム ２ａ 真空路 ３ 吸着器 ３ａ 吸着ベース ３ｂ 可撓パッド ４ 移載装置 ５ カセット ６ レジスト塗布装置 ６ａ 塗布ステージ ７ 乾燥装置 ７ａ 乾燥ステージ。 1 glass substrate 2 transfer arm 2a vacuum path 3 suction device 3a suction base 3b flexible pad 4 transfer device 5 cassette 6 resist coating device 6a coating stage 7 drying device 7a drying stage.
Claims (3)
る移載アームを備えた移載装置において、前記移載アー
ムの板体載置領域にデルタ配置した３個の吸着器を備え
たことを特徴とする移載装置。1. A transfer device having a transfer arm that expands and contracts in at least a horizontal direction with respect to a main body, comprising three suction devices arranged in delta in a plate mounting area of the transfer arm. Characteristic transfer device.
る移載アームを備えた移載装置において、前記移載アー
ムの板体載置領域に複数個の吸着器を備え、前記吸着器
の板体接触面に押圧により変形する可撓パッドを設けた
ことを特徴とする移載装置。2. A transfer device having a transfer arm that expands and contracts in at least a horizontal direction with respect to a main body, wherein a plurality of suction devices are provided in a plate mounting region of the transfer arm, and a plate of the suction device. A transfer device, characterized in that a flexible pad that is deformed by pressing is provided on the body contact surface.
る移載アームを備えた移載装置において、前記移載アー
ムの板体載置領域に複数個の吸着器を備え、前記吸着器
が、その吸着開口に接して載置した板体の吸着面の湾曲
に倣って揺動する揺動機構を備えたことを特徴とする移
載装置。3. A transfer device including a transfer arm that expands and contracts in at least a horizontal direction with respect to a main body, wherein a plurality of suction devices are provided in a plate mounting region of the transfer arm, and the suction device comprises: A transfer device comprising a swinging mechanism that swings following the curve of the suction surface of a plate placed in contact with the suction opening.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3847995A JPH08236597A (en) | 1995-02-27 | 1995-02-27 | Transfer device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3847995A JPH08236597A (en) | 1995-02-27 | 1995-02-27 | Transfer device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08236597A true JPH08236597A (en) | 1996-09-13 |
Family
ID=12526400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3847995A Pending JPH08236597A (en) | 1995-02-27 | 1995-02-27 | Transfer device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08236597A (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100427164B1 (en) * | 1997-05-15 | 2004-07-01 | 동경 엘렉트론 주식회사 | Board Transfer Device and Board Transfer Method |
| WO2004100254A1 (en) * | 2003-05-06 | 2004-11-18 | Olympus Corporation | Substrate suction device |
| CN100362643C (en) * | 2003-05-06 | 2008-01-16 | 奥林巴斯株式会社 | Substrate suction device |
| US7597774B2 (en) | 2002-03-19 | 2009-10-06 | Fujitsu Limited | Apparatus and method for fabricating bonded substrate |
| JP2011228587A (en) * | 2010-04-22 | 2011-11-10 | Toppan Printing Co Ltd | Pad for placing substrate and pad mechanism using the same |
| JP2014036185A (en) * | 2012-08-10 | 2014-02-24 | Sinfonia Technology Co Ltd | Purge nozzle unit, purge device, load port |
| WO2016117095A1 (en) * | 2015-01-22 | 2016-07-28 | 株式会社島津製作所 | Substrate transfer system |
| JP2017112394A (en) * | 2017-02-21 | 2017-06-22 | シンフォニアテクノロジー株式会社 | Purge nozzle unit and load port |
| JP2017200712A (en) * | 2016-05-02 | 2017-11-09 | Ｔｏｗａ株式会社 | Suction unit, plate-like member transportation unit, resin encapsulation device, plate-like member transportation method and resin encapsulation method |
| JP2018129530A (en) * | 2018-04-10 | 2018-08-16 | シンフォニアテクノロジー株式会社 | Purge nozzle unit and load port |
| JP2019117955A (en) * | 2019-04-24 | 2019-07-18 | シンフォニアテクノロジー株式会社 | Purge nozzle unit and load port |
| JP2020202324A (en) * | 2019-06-12 | 2020-12-17 | 株式会社ディスコ | Robot hand |
-
1995
- 1995-02-27 JP JP3847995A patent/JPH08236597A/en active Pending
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100427164B1 (en) * | 1997-05-15 | 2004-07-01 | 동경 엘렉트론 주식회사 | Board Transfer Device and Board Transfer Method |
| US7597774B2 (en) | 2002-03-19 | 2009-10-06 | Fujitsu Limited | Apparatus and method for fabricating bonded substrate |
| US7704348B2 (en) | 2002-03-19 | 2010-04-27 | Fujitsu Limited | Apparatus and method for fabricating bonded substrate |
| US7963308B2 (en) | 2002-03-19 | 2011-06-21 | Fujitsu Limited | Apparatus and method for fabricating bonded substrate |
| US8268113B2 (en) | 2002-03-19 | 2012-09-18 | Fujitsu Limited | Apparatus and method for fabricating bonded substrate |
| WO2004100254A1 (en) * | 2003-05-06 | 2004-11-18 | Olympus Corporation | Substrate suction device |
| CN100362643C (en) * | 2003-05-06 | 2008-01-16 | 奥林巴斯株式会社 | Substrate suction device |
| JP2011228587A (en) * | 2010-04-22 | 2011-11-10 | Toppan Printing Co Ltd | Pad for placing substrate and pad mechanism using the same |
| JP2014036185A (en) * | 2012-08-10 | 2014-02-24 | Sinfonia Technology Co Ltd | Purge nozzle unit, purge device, load port |
| WO2016117095A1 (en) * | 2015-01-22 | 2016-07-28 | 株式会社島津製作所 | Substrate transfer system |
| JPWO2016117095A1 (en) * | 2015-01-22 | 2017-06-15 | 株式会社島津製作所 | Substrate transfer system |
| CN107210253A (en) * | 2015-01-22 | 2017-09-26 | 株式会社岛津制作所 | Substrate transfer system |
| JP2017200712A (en) * | 2016-05-02 | 2017-11-09 | Ｔｏｗａ株式会社 | Suction unit, plate-like member transportation unit, resin encapsulation device, plate-like member transportation method and resin encapsulation method |
| JP2017112394A (en) * | 2017-02-21 | 2017-06-22 | シンフォニアテクノロジー株式会社 | Purge nozzle unit and load port |
| JP2018129530A (en) * | 2018-04-10 | 2018-08-16 | シンフォニアテクノロジー株式会社 | Purge nozzle unit and load port |
| JP2019117955A (en) * | 2019-04-24 | 2019-07-18 | シンフォニアテクノロジー株式会社 | Purge nozzle unit and load port |
| JP2020202324A (en) * | 2019-06-12 | 2020-12-17 | 株式会社ディスコ | Robot hand |
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